CN103377748B - Electro-conductive glass and preparation method thereof - Google Patents

Electro-conductive glass and preparation method thereof Download PDF

Info

Publication number
CN103377748B
CN103377748B CN201210116217.XA CN201210116217A CN103377748B CN 103377748 B CN103377748 B CN 103377748B CN 201210116217 A CN201210116217 A CN 201210116217A CN 103377748 B CN103377748 B CN 103377748B
Authority
CN
China
Prior art keywords
wire netting
glass
electro
conductive glass
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201210116217.XA
Other languages
Chinese (zh)
Other versions
CN103377748A (en
Inventor
程志政
蔡荣军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OFilm Group Co Ltd
Anhui Jingzhuo Optical Display Technology Co Ltd
Original Assignee
Shenzhen OFilm Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen OFilm Tech Co Ltd filed Critical Shenzhen OFilm Tech Co Ltd
Priority to CN201210116217.XA priority Critical patent/CN103377748B/en
Priority to JP2014510653A priority patent/JP2014513845A/en
Priority to US14/000,152 priority patent/US20140216803A1/en
Priority to PCT/CN2012/087195 priority patent/WO2013155854A1/en
Publication of CN103377748A publication Critical patent/CN103377748A/en
Application granted granted Critical
Publication of CN103377748B publication Critical patent/CN103377748B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

A kind of electro-conductive glass, including glass baseplate and the wire netting being layed on described glass baseplate, described wire netting has the hole of multiple array arrangement.Above-mentioned electro-conductive glass is by laying wire netting at glass substrate surface, during use can as required by wire netting exposure imaging again thus on the glass substrate formed pattern inductive layer and be applied in touch screen, electro-conductive glass is avoided using tin indium oxide, thus the cost of electro-conductive glass is relatively low.The present invention also provides the preparation method of a kind of electro-conductive glass.

Description

Electro-conductive glass and preparation method thereof
Technical field
The present invention relates to a kind of electro-conductive glass and preparation method thereof.
Background technology
The advantages in the majority such as capacitance touch screen is high with its transparency, multiple point touching, life-span length, in recent years, more next More favored by market.At present, generally use vacuum evaporation or magnetron sputtering mode by electrically conducting transparent material Material tin indium oxide (ITO) is coated with and forms electro-conductive glass on the glass substrate to be applied to capacitance touch screen.
But, phosphide element is a kind of rare earth element, and in the Nature, reserves are smaller, and price comparison is expensive, So that electro-conductive glass is relatively costly.
Content of the invention
Based on this, it is necessary to provide a kind of lower-cost electro-conductive glass and preparation method thereof.
A kind of electro-conductive glass includes glass baseplate and the wire netting being layed on described glass baseplate, described metal Net has the hole of multiple array arrangement.
Wherein in an embodiment, described hole is square or rhombus, described wire netting include multiple mutually The first parallel metal wire and multiple the second metal wire being parallel to each other, described first metal wire and described second Metal wire is crossed to form described hole.
Wherein in an embodiment, the hole of described wire netting is the regular hexagon of the arrangement in honeycomb.
Wherein in an embodiment, the hole of described wire netting is triangle, and described wire netting includes multiple The first metal wire, multiple the second metal wire being parallel to each other and multiple the 3rd gold medal being parallel to each other being parallel to each other Belonging to line, the second metal wire and the first metal wire tilt to be crossed to form the diamond hole of multiple array arrangement, the 3rd gold medal Belong to line to intersect with the two of diamond hole relative end points thus the hole by described for diamond hole segmentation formation triangle Hole.
Wherein in an embodiment, the surface of described wire netting is formed with anti-oxidant coating, described anti-oxidant The material of coating is gold, platinum, nickel or nickel billon.
The preparation method of a kind of electro-conductive glass, comprises the following steps:
Form metal level on the glass substrate;And
Utilize exposure imaging method that described metal level processes grid and be layed in described glass baseplate to be formed Wire netting, described wire netting has the hole of multiple array arrangement.
Wherein in an embodiment, the surface of described wire netting is formed with anti-oxidant coating, described anti-oxidant The material of coating is gold, platinum, nickel or nickel billon.
Wherein in an embodiment, the surface of described glass baseplate also formed have anti-dazzle, hardening, anti-reflection Or the functional layer of atomizing functions, described metal level is formed at described functional layer surface.
Wherein in an embodiment, described hole is square or rhombus, described wire netting include multiple mutually The first parallel metal wire and multiple the second metal wire being parallel to each other, described first metal wire and described second Metal wire is crossed to form described hole.
Wherein in an embodiment, the hole of described wire netting is the regular hexagon of the arrangement in honeycomb.
Above-mentioned electro-conductive glass and preparation method thereof, by laying wire netting at glass substrate surface, can during use With as required by wire netting exposure imaging again thus on the glass substrate formed pattern inductive layer and be applied to In touch screen, electro-conductive glass is avoided using tin indium oxide, thus the cost of electro-conductive glass is relatively low.
Brief description
Fig. 1 is the structural representation of the electro-conductive glass of an embodiment;
Fig. 2 is the structural representation of the wire netting of electro-conductive glass in Fig. 1;
Fig. 3 is the structural representation of the wire netting of electro-conductive glass in another embodiment;
Fig. 4 is the structural representation of the wire netting of electro-conductive glass in another embodiment;
Fig. 5 is the structural representation of the wire netting of electro-conductive glass in another embodiment;
Fig. 6 is the flow chart of the preparation method of the electro-conductive glass of an embodiment.
Detailed description of the invention
For the ease of understanding the present invention, below with reference to relevant drawings, the present invention is described more fully. Accompanying drawing gives the first-selected embodiment of the present invention.But, the present invention can come real in many different forms Existing, however it is not limited to embodiment described herein.On the contrary, provide the purpose of these embodiments to be to make to this Disclosure of the invention content is more thorough comprehensively.
It should be noted that when element is referred to as " being fixedly arranged on " another element, it can be directly at another On individual element or also can there is element placed in the middle.When an element is considered as " connection " another yuan Part, it can be directly to another element or may be simultaneously present centering elements.Used herein Term " vertical ", " level ", "left", "right" and similar statement simply to illustrate that mesh 's.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention The implication that the technical staff in field is generally understood that is identical.The art being used in the description of the invention herein Language is intended merely to describe the purpose of specific embodiment, it is not intended that in the restriction present invention.Used herein Term " and/or " include the arbitrary and all of combination of one or more related Listed Items.
Referring to Fig. 1, the electro-conductive glass 10 of an embodiment includes glass baseplate 110 and is layed in glass base Wire netting 120 on material 110.
The material of glass baseplate 110 is inorganic silicate glass or PMMA glass (PMMA).
Glass baseplate 110 generally sheet.The surface of glass baseplate 110 be also formed with having anti-dazzle, hardening, The functional layer (not shown) of anti-reflection or atomizing functions.Wherein, there is anti-dazzle or atomizing functions functional layer, by There is anti-dazzle or atomizing functions applying coating formed, inside coating, have metal oxide particle;There is hardening The functional layer of function is applied by the high-molecular coating with hardening function and is formed;There is the functional layer of anti-reflection function For titanium dioxide coating, magnesium fluoride coating or calcirm-fluoride coating.
Functional layer can be optionally provided at a side surface of glass baseplate 110 or the surface that both sides are relative. Preferably, functional layer is formed at a side surface away from wire netting 120 for the glass baseplate 110, i.e. wire netting 120 And functional layer is layed in two relative surfaces of glass baseplate 110 respectively.It should be noted that work as glass When the surface of base material 110 has functional layer, wire netting 120 is formed at the surface of functional layer.
Please refer to Fig. 2, wire netting 120 is formed at the surface of glass baseplate 110.Wire netting 120 has The hole 121 of multiple array arrangements.It should be noted that when the surface of glass baseplate 110 has functional layer, Wire netting 120 is formed at the surface of functional layer.
In present embodiment, the form and dimension of multiple holes 121 is all identical.In present embodiment, hole 121 is square, multiple hole 121 array arrangements.Wire netting 120 includes multiple the first gold medal being parallel to each other Belong to line 123 and multiple the second metal wire 125 being parallel to each other, the first metal wire 123 and the second metal wire 125 Intersect vertically and form the foursquare hole 121 of multiple array arrangements.
In present embodiment, the material of wire netting 120 is copper, silver, molybdenum aluminium molybdenum alloys or corronil.For Prevent the wire netting 120 from aoxidizing, anti oxidation layer, anti oxidation layer can also be formed on the surface of wire netting 120 Material be gold, platinum, the inert metal such as nickel or nickel billon.
The thickness of wire netting 120 is more than or equal to 45nm and is less than or equal to 40000nm.
Netting twine (the i.e. first metal wire 123 and the second metal wire 125) width D of wire netting 120 is more than In 45nm and less than or equal to 40000nm.It should be noted that the width D pair of the netting twine of wire netting 120 The resolution ratio of touch screen 10 can have an impact, and when the netting twine width D of wire netting 120 is excessive, naked eyes can be seen To netting twine, thus the resolution ratio of touch screen 10 can be affected.Preferably, the netting twine width of wire netting 120 is more than Equal to 45nm and less than or equal to 5000nm.
In order to ensure the sensitiveness to signal for the touch screen 10, then the aperture opening ratio K of wire netting 120 and electro-conductive glass Transmitance T of 101And transmitance T of glass baseplate2Between there is following relation: T1=T2*K.Thus may be used Calculate the aperture opening ratio of the wire netting 120 meeting condition with the design optical transmittance according to electro-conductive glass 10.
Illustrate as a example by square by the hole 121 of wire netting 120 below.The netting twine of wire netting 120 Width is D, and the A/F of the hole 121 of wire netting 120 is L.Wire netting 120 is considered as by multiple The length of side is the structure cell composition of D+L, and the area of the aperture opening ratio K=hole 121 of wire netting 120 is divided by structure cell Area.Specifically in the present embodiment, K=L2/(L+D)2
In above-mentioned electro-conductive glass 10, lay wire netting 120 on glass baseplate 110 surface, can root during use By wire netting exposure imaging again according to needs thus on glass baseplate 110, form pattern inductive layer and be applied to In touch screen, electro-conductive glass 10 is avoided using tin indium oxide, thus the cost of electro-conductive glass 10 is relatively low;With When, the transmitance of wire netting 120 is higher;The square resistance of electro-conductive glass 10 is relatively low, can reach 1 ohm /□;The transmitance of electro-conductive glass 10 can be by controlling the aperture opening ratio of wire netting 120 and glass baseplate 110 Transmitance controls, more flexibly.
It should be noted that the hole 121 of wire netting 120 is not limited to the square shown in Fig. 2, it is possible to For polygon.
Refer to Fig. 3, the rhombus that the hole 321 of the wire netting 320 of another embodiment is array arrangement.Gold Belong to net 320 and include multiple the first metal wire 323 being parallel to each other and multiple the second metal wire being parallel to each other 325, the first metal wire 323 intersects with the second metal wire 325 and the first metal wire 323 and the second metal wire 325 It is mutually inclined the hole 321 of the rhombus forming multiple array arrangements.
Refer to Fig. 4, the triangle that the hole 421 of the wire netting 420 of another embodiment is array arrangement. Wire netting 420 includes multiple the first metal wire being parallel to each other the 423rd, multiple the second metal wires being parallel to each other 425 and multiple the 3rd metal wire 427 being parallel to each other, the second metal wire 425 tilts with the first metal wire 423 It is crossed to form the diamond hole of multiple array arrangement, the 3rd metal wire 427 and the two of diamond hole relative end points Intersect thus diamond hole is divided into the hole 421 of the triangle of array distribution.
Referring to Fig. 5, the hole 521 of the wire netting 520 of another embodiment is positive six of the arrangement in honeycomb Limit shape.
Please refer to Fig. 1, Fig. 2 and Fig. 6, the preparation method of above-mentioned electro-conductive glass 10, including following step Rapid:
Step S101, at glass baseplate 110 forming metal layer on surface.
The material of glass baseplate 110 is inorganic silicate glass or PMMA glass (PMMA).
The thickness of metal level is more than or equal to 45nm and is less than or equal to 40000nm.
The surface of glass baseplate 110 also can be formed as required have anti-dazzle, hardening, anti-reflection or atomizing functions Functional layer (not shown).Functional layer can be optionally provided at a side surface or two of glass baseplate 110 The relative surface in side.
Wherein, there is anti-dazzle or atomizing functions functional layer, by the applying coating with anti-dazzle or atomizing functions Formed, inside coating, have metal oxide particle;There is the functional layer of hardening function by having hardening function High-molecular coating coating is formed;The functional layer with anti-reflection function is the dioxy being formed by evaporation or magnetron sputtering Change titanium coating, magnesium fluoride coating or calcirm-fluoride coating.
In present embodiment, metal level is deposited by vacuum evaporation, chemical gaseous phase or sol-gal process is formed.Gold The material belonging to layer is copper, silver, molybdenum aluminium molybdenum alloys or corronil.It should be noted that work as glass baseplate 110 Surface when there is functional layer, metal level is formed at the surface of functional layer.
In order to prevent metal layer, can also be formed anti-at the surface vacuum evaporation of metal level or magnetron sputtering Oxide layer, the material of anti oxidation layer is the inert metals such as gold, platinum, nickel or nickel billon.
Step S102, exposure imaging method is utilized metal level to process grid to form wire netting 120 with shape Becoming the wire netting 120 being layed on glass baseplate 110, wire netting 120 has the hole of multiple array arrangement 121。
In present embodiment, the form and dimension of multiple holes 121 is all identical.The hole of wire netting 120 can Think square, rhombus, triangle or the regular hexagon of array arrangement.
The netting twine width D of wire netting 120 is more than or equal to 45nm and is less than or equal to 40000nm.Need explanation , the resolution ratio to touch screen 10 for the width D of the netting twine of wire netting 120 can have an impact, and works as wire netting When the netting twine width D of 120 is excessive, naked eyes are it can be seen that netting twine, thus can affect the resolution ratio of touch screen 10. Preferably, the netting twine width of wire netting 120 is more than or equal to 45nm and is less than or equal to 5000nm.
The aperture opening ratio K of wire netting 120 and transmitance T of electro-conductive glass 101And the transmitance of glass baseplate T2Between there is following relation: K=T1/T2
Wire netting 120 laid by above-mentioned electro-conductive glass 10 on glass baseplate 110 surface, can be according to need during use Will by wire netting 120 exposure imaging again thus on glass baseplate 110 formed pattern inductive layer and be applied to In touch screen, electro-conductive glass 10 is avoided using tin indium oxide, thus the cost of electro-conductive glass 10 is relatively low, and Can prepare wire netting 120 by the method for exposure imaging, technique is simple, and efficiency is higher.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed, But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area Those of ordinary skill for, without departing from the inventive concept of the premise, can also make some deformation and Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended Claim is as the criterion.

Claims (2)

1. an electro-conductive glass, including glass baseplate, it is characterised in that described electro-conductive glass also includes laying Wire netting on described glass baseplate, described wire netting has the hole of multiple array arrangement, wire netting Aperture opening ratio K and transmitance T of electro-conductive glass1And transmitance T of glass baseplate2Between there is following relation: T1=T2*K;The surface of glass baseplate (110) is also formed with the functional layer with anti-reflection function, metal net form Become the surface of functional layer;The hole of described wire netting is the regular hexagon of the arrangement in honeycomb, described metal The surface of net is formed with anti-oxidant coating, and the material of described anti-oxidant coating is gold, platinum, nickel or nickel billon, The functional layer with anti-reflection function is magnesium fluoride coating or calcirm-fluoride coating;As required by wire netting during use Exposure imaging thus on the glass substrate formed pattern inductive layer and be applied in touch screen.
2. the preparation method of an electro-conductive glass, it is characterised in that comprise the following steps:
Form metal level on the glass substrate;And
Utilize exposure imaging method that described metal level processes grid and be layed in described glass baseplate to be formed Wire netting, described wire netting has the hole of multiple array arrangement, the aperture opening ratio K of wire netting and electro-conductive glass Transmitance T1And transmitance T of glass baseplate2Between there is following relation: K=T1/T2, glass baseplate (110) surface is also formed with the functional layer with anti-reflection function, and wire netting is formed at the surface of functional layer, The hole of described wire netting is the regular hexagon of the arrangement in honeycomb, and the surface of described wire netting is formed with antioxygen Changing coating, the material of described anti-oxidant coating is gold, platinum, nickel or nickel billon, has the work(of anti-reflection function Ergosphere is magnesium fluoride coating or calcirm-fluoride coating, as required by wire netting exposure imaging thus at glass during use Form pattern inductive layer on glass base material and be applied in touch screen.
CN201210116217.XA 2012-04-19 2012-04-19 Electro-conductive glass and preparation method thereof Active CN103377748B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201210116217.XA CN103377748B (en) 2012-04-19 2012-04-19 Electro-conductive glass and preparation method thereof
JP2014510653A JP2014513845A (en) 2012-04-19 2012-12-21 Conductive component and preparation method thereof
US14/000,152 US20140216803A1 (en) 2012-04-19 2012-12-21 Conductive component and preparation method thereof
PCT/CN2012/087195 WO2013155854A1 (en) 2012-04-19 2012-12-21 Electrically conductive component and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210116217.XA CN103377748B (en) 2012-04-19 2012-04-19 Electro-conductive glass and preparation method thereof

Publications (2)

Publication Number Publication Date
CN103377748A CN103377748A (en) 2013-10-30
CN103377748B true CN103377748B (en) 2016-11-09

Family

ID=49462741

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210116217.XA Active CN103377748B (en) 2012-04-19 2012-04-19 Electro-conductive glass and preparation method thereof

Country Status (1)

Country Link
CN (1) CN103377748B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI534677B (en) * 2014-10-03 2016-05-21 群創光電股份有限公司 Touch panel
CN104297988B (en) 2014-10-21 2017-05-03 合肥鑫晟光电科技有限公司 Display device
CN107274970A (en) * 2017-06-19 2017-10-20 合肥市惠科精密模具有限公司 A kind of TFT LCD electro-conductive glass

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101002519A (en) * 2004-06-23 2007-07-18 富士胶片株式会社 Transparent electromagnetic shielding film and method for producing same
CN101577148A (en) * 2009-06-23 2009-11-11 中国乐凯胶片集团公司 Transparent conducting film and preparation method thereof
CN102027801A (en) * 2008-05-16 2011-04-20 富士胶片株式会社 Conductive film, and transparent heating element
CN202534373U (en) * 2012-04-19 2012-11-14 深圳欧菲光科技股份有限公司 Conductive glass

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006252886A (en) * 2005-03-09 2006-09-21 Bridgestone Corp Low reflectance conductive film, electromagnetic wave shielding film and electromagnetic wave shielding light transmission window material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101002519A (en) * 2004-06-23 2007-07-18 富士胶片株式会社 Transparent electromagnetic shielding film and method for producing same
CN102027801A (en) * 2008-05-16 2011-04-20 富士胶片株式会社 Conductive film, and transparent heating element
CN101577148A (en) * 2009-06-23 2009-11-11 中国乐凯胶片集团公司 Transparent conducting film and preparation method thereof
CN202534373U (en) * 2012-04-19 2012-11-14 深圳欧菲光科技股份有限公司 Conductive glass

Also Published As

Publication number Publication date
CN103377748A (en) 2013-10-30

Similar Documents

Publication Publication Date Title
CN202632793U (en) Conductive film
CN105225728B (en) A kind of low resistance transparent conductive film and preparation method thereof
KR20140002044A (en) Patterned transparent conductive film based on random grid
CN108089748A (en) Flexible touch panel and flexible OLED display panel
CN103377747B (en) Conductive film and preparation method thereof
CN202534373U (en) Conductive glass
CN103377748B (en) Electro-conductive glass and preparation method thereof
CN202623390U (en) Conductive glass
CN104281313A (en) Touch panel
US20150324047A1 (en) Touch panel including patterns of mesh structures
CN103373022B (en) Conductive glass and preparation method thereof
CN103376958A (en) Capacitive sensing component, preparing method thereof, and touch control screen with capacitive sensing component
KR20160082711A (en) Metal mesh type touch screen panel and method of manufacturing the same
CN103377754B (en) Conductive film and preparation method thereof
JPWO2020149113A1 (en) Transparent conductive film
CN202632794U (en) Conductive film
WO2013155854A1 (en) Electrically conductive component and manufacturing method therefor
CN109545436A (en) Transparent conductive film, touch screen and preparation method thereof
CN104516587B (en) Conducting film and touch-screen
CN104176947B (en) ITO electro-conductive glass and preparation method thereof
JP5701450B2 (en) Conductive component and preparation method thereof
CN109545445A (en) Transparent conductive film, touch screen and preparation method thereof
CN109545444A (en) Transparent conductive film, touch screen and preparation method thereof
CN202632261U (en) Capacitive sensing component and touch screen employing same
CN114388173A (en) Superconducting narrow-frame conducting device and directional ultrasonic transparent screen

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: Ophiguang Group Co.,Ltd.

Address before: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: OFilm Tech Co.,Ltd.

CP03 Change of name, title or address
CP03 Change of name, title or address

Address after: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee after: OFilm Tech Co.,Ltd.

Address before: Baoan District Gongming town of Shenzhen City, Guangdong province 518106 White Pine Road HUAFA Road Light Technology Park

Patentee before: Shenzhen OFilm Tech Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20210219

Address after: 231323 Building 1, precision electronics industrial park, Hangbu Town, Shucheng County, Lu'an City, Anhui Province

Patentee after: Anhui jingzhuo optical display technology Co.,Ltd.

Address before: 518106 oufeiguang Science Park, HUAFA section of Songbai highway, Gongming street, Guangming New District, Shenzhen City, Guangdong Province

Patentee before: Ophiguang Group Co.,Ltd.