CN103376665A - Masking platform horizontal measuring device and method - Google Patents
Masking platform horizontal measuring device and method Download PDFInfo
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- CN103376665A CN103376665A CN2012101192921A CN201210119292A CN103376665A CN 103376665 A CN103376665 A CN 103376665A CN 2012101192921 A CN2012101192921 A CN 2012101192921A CN 201210119292 A CN201210119292 A CN 201210119292A CN 103376665 A CN103376665 A CN 103376665A
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Abstract
The invention relates to the field of photoetching scanning, and in particular relates to a masking platform horizontal measuring device and method. The masking platform horizontal measuring device comprises an X-direction interferometer system and a Y-direction interferometer system, wherein a mask of a masking platform is provided with a mask which moves in a scanning way along the Y direction and moves in a fine tuning way along the X direction, the X-direction interferometer system comprises an X-direction interferometer, a deflecting reflector and an X-direction measurement mirror, the deflecting reflector is arranged on the mask, the X-direction measurement mirror is arranged outside the masking platform along the scanning direction, and positioned on one side of the masking platform along the fine tuning direction, the X-direction interferometer is arranged outside the masking platform, and positioned on one side of the masking platform along the scanning direction, an emergent light path of the X-direction interferometer is reflected to the X-direction measurement mirror through the deflecting reflector, and returns along the original path, so as to obtain position information of the mask along the X direction. With the adoption of the masking platform horizontal measuring device and method, the problem that the size of the X-direction measurement mirror fixed on the masking platform is continuously increased along with increment of the stroke of the masking platform is solved, and in addition, an optical path is simple, and the cost is low.
Description
Technical field
The present invention relates to photoetching scanning field, relate in particular to a kind of mask platform level to measurement mechanism and method.
Background technology
Lithographic equipment of the prior art is mainly used in the manufacturing of integrated circuit (IC) or flat pannel display field and other microdevice.By lithographic equipment, the multilayer mask with different mask patterns is imaged on the wafer that is coated with photoresist under accurately aiming at successively, for example semiconductor wafer or LCD plate.Lithographic equipment is divided into two classes substantially, one class is the stepping lithographic equipment, the mask pattern single exposure is imaged on an exposure area of wafer, wafer moves with respect to mask subsequently, next exposure area is moved to mask pattern and projection objective below, again with mask pattern exposure in another exposure area of wafer, repeat this process until on the wafer all exposure areas all have the picture of mask pattern; Another kind of is the step-scan lithographic equipment, and in said process, mask pattern is not the single exposure imaging, but the scanning mobile imaging by the projection light field.In the mask pattern imaging process, mask and wafer move with respect to optical projection system and projected light beam simultaneously.In above-mentioned lithographic equipment, need have corresponding device as the carrier of mask and silicon chip, the carrier that is mounted with mask/silicon chip produces accurate mutually motion and satisfies the photoetching needs.The carrier of aforementioned mask version is referred to as and holds bed, and the described bed that holds is fixed in described mask platform with described mask plate support, and the carrier of silicon chip/substrate is referred to as wafer-supporting platform.
Fig. 1 be the level of traditional scanning mask platform to measurement mechanism, comprise that X-direction interferometer 1, X-direction are measured mirror 2, held bed 3, Y-direction interferometer 4 and Y-direction measure mirror 5, described X-direction is measured mirror 2 and Y-direction and is measured mirror 5 and all be fixed on described holding on the bed 3.When mask platform is done the Y-direction scanning motion, measure mirror 5 and read the X-direction signal from being fixed on the X-direction of holding on the bed 3 by X-direction interferometer 1, measure mirror 5 and read the Y-direction signal from being fixed on the Y-direction of holding on the bed 3, for the scanning motion of mask platform provides closed-loop control.But along with technical field developments such as IC litho machine, flat pannel display litho machines, the object size of sports platform location constantly increases, and especially in flat pannel display litho machine field, the size of mask is continuing to increase, so that the swash width of mask platform constantly increases.This length that just requires X-direction to measure mirror 2 also lengthens thereupon, also can affect the design of holding bed 3 sizes simultaneously, has increased mask platform and has driven quality.In addition, X-direction is measured the increase of mirror 2 sizes, and design, processing, the assembling that can cause X-direction to measure mirror 2 all face a difficult problem.
Fig. 2 is patent that addresses this problem of Japanese Nikon company.In this patent, holding two flat interferometer 239A of bed (not shown in FIG.) side installation, 239B, install and measure mirror 226X at mask platform support (not shown in FIG.), scanning to a flat interferometer 222X and receiver are installed again, by the design of light path, can read the X-direction position that the displacement signal of measuring mirror 226X draws mask platform by three groups of interferometer 222X, 239A, 239B.One of them interferometer of interferometer 239A, 239B carries out the compensation of minute surface face type to the face type degree of measuring mirror 226X.This patent has well solved to be fixed on to hold measures mirror along with stroke increases and the problems such as continuous increase on the bed, but the light path layout more complicated, cost is higher.
Therefore, how to provide a kind of can the solution to measure that mirror increases along with stroke and ever-increasing problem can be simplified light path, the level that reduces the scanning mask platform of cost is the technical matters that those skilled in the art need to be resolved hurrily to measurement mechanism and method.
Summary of the invention
The object of the present invention is to provide a kind of scanning mask platform level to measurement mechanism and method, measure mirror in the existing mask platform measurement mechanism along with stroke increases and ever-increasing problem to solve.
For solving the problems of the technologies described above, the invention provides a kind of mask platform level to measurement mechanism, comprise X-direction interferometer system and Y-direction interferometer system, the holding of described mask platform is provided with mask and along the Y-direction scanning motion on the bed, move along the X-direction fine setting, described X-direction interferometer system comprises the X-direction interferometer, be folded to catoptron and X-direction and measure mirror, the described catoptron that is folded to is arranged at described holding on the bed, described X-direction is measured mirror outside the direction of scanning is arranged at described mask platform, and be positioned at a side of mask platform fine setting direction, described X-direction interferometer is arranged at outside the mask platform, and is positioned at a side of mask bench scanning direction; The emitting light path of described X-direction interferometer is measured on the mirror through being folded to mirror reflects to X-direction, and returns along former road, obtains the described bed that holds along the positional information of X-direction.
Preferably, described Y-direction interferometer system comprises two groups of Y-directions measurement mirrors and two groups of Y-direction interferometers, described two groups of Y-directions are measured mirror and are individually fixed in described holding on the bed as described two groups of Y-direction interferometers provide respectively position data, be used for obtaining described hold bed along Y-direction and Rz to positional information.
Preferably, described X-direction interferometer system also comprises other one group of X-direction interferometer and is folded to catoptron, at this group X-direction interferometer and being folded in the catoptron, described X-direction interferometer is arranged at outside the mask platform, and being positioned at the opposite side of mask bench scanning direction, the described catoptron that is folded to is arranged at described holding on the bed, so that measure mirror from the light beam of this group X-direction interferometer through being folded to mirror reflects to X-direction, and return along former road, obtain the minute surface face type compensated information that described X-direction is measured mirror.
Preferably, described every group of X-direction interferometer comprises two-frequency laser, spectroscope, reference mirror and optical fiber collimator, described two-frequency laser sends the laser that comprises two kinds of frequencies, through described spectroscope light splitting, form and measure light and reference light, described measurement light successively through described be folded to catoptron and described X-direction and measure the mirror reflection after former road return, described reference light returns through described reference mirror reflection, the measurement light and the reference light that return are coupled to described optical fiber collimator, interfere through described optical fiber collimator, form the fine motion position measurement signal of mask platform X-direction.
Preferably, described spectroscope is polarization splitting prism, and the described laser that comprises two kinds of frequencies is orthogonal two the linearly polarized light f in polarization direction
a, f
b, described two linearly polarized light f
a, f
bLight splitting surface at described polarization splitting prism is separated, and wherein the polarization direction is parallel to the linearly polarized light f of the light splitting surface of polarization splitting prism
aBy described polarization splitting prism transmission, form described measurement light; And the polarization direction is perpendicular to the linearly polarized light f of the light splitting surface of polarization splitting prism
bThen reflected by described polarization splitting prism, form described reference light.
Preferably, every group of X-direction interferometer also comprises the pyramid mirror, two groups of quarter wave plates and plane mirror, measurement light after described polarization splitting prism transmission is after the quarter wave plate of correspondence becomes circularly polarized light, returned by former road after catoptron and described X-direction are measured the mirror reflection through being folded to successively, again again become linearly polarized light behind the quarter wave plate through correspondence when measuring light, at this moment, measure the polarisation of light direction and rotated 90 degree, when measurement light runs into described polarization splitting prism again, reflected by described polarization splitting prism, then, measure light and behind described pyramid mirror two secondary reflections, turn back to described polarization splitting prism, by described polarization splitting prism again behind the secondary reflection, quarter wave plate through correspondence becomes circularly polarized light again, returned by former road after catoptron and described X-direction are measured the mirror reflection through described being folded to successively again, after measurement light is again through corresponding quarter wave plate, again become again 90-degree rotation of linearly polarized light and polarization direction, measure light finally by described polarization splitting prism transmission after, be coupled to described optical fiber collimator.
Preferably, reference light after described polarization splitting prism reflection is first after described plane mirror reflects, quarter wave plate through correspondence becomes circularly polarized light, return through the former road of described reference mirror again, again become linearly polarized light through behind this corresponding quarter wave plate, again run into described polarization splitting prism through described plane mirror, after described polarization splitting prism transmission, through behind two secondary reflections of described pyramid mirror, again by after the described polarization splitting prism transmission, become circularly polarized light through corresponding quarter wave plate, return through the former road of reference mirror, after again becoming linearly polarized light through corresponding quarter wave plate, reference light is coupled to described optical fiber collimator after reflecting finally by described polarization splitting prism.
Preferably, described two groups are folded to 45 ° of catoptrons of catoptron employing or adopt three-dimensional vertical angle measurement mirror.
Preferably, described two groups are folded to catoptron and are made of one the formula structure and measure microscope base by one and be fixed in described holding on the bed, and perhaps described two groups are folded to catoptron and measure microscope base by one separately respectively and be fixed in described holding on the bed.
The present invention also provides a kind of mask platform level to measuring method, adopt aforesaid mask platform level to measurement mechanism, from the measuring beam of X-direction interferometer successively through correspondence be folded to mirror reflects and X-direction to measure the mirror reflection after former road turn back to corresponding X-direction interferometer.
Mask platform level provided by the invention is to measurement mechanism and method, be folded to catoptron by fix two groups in mask platform, and pass through two groups of X-direction interferometers, two groups of location layouts that are folded to catoptron and X-direction measurement mirror, so that pass through the processing of light path from the light beam of X-direction interferometer, the final fine motion position measurement signal that forms the mask platform X-direction, cancel traditional X-direction and measured mirror fixed form and light path layout, well solved along with the increase of mask platform stroke is fixed on the mask platform X-direction and measured the mirror size also in ever-increasing problem, effectively reduced the driving quality of mask platform, and light path is simple, and is with low cost.
Description of drawings
Fig. 1 is that existing mask platform level is to the measurement mechanism structural representation;
Fig. 2 is the structural representation of patent JP2008166614A;
Fig. 3 is the scanning-exposure apparatus structural representation;
Fig. 4 is that the embodiment of the invention 1 mask platform level is to the measurement mechanism structural representation;
Fig. 5 is X-direction interferometer structure synoptic diagram embodiment illustrated in fig. 4;
Fig. 6 is that the embodiment of the invention 2 mask platform levels are to the measurement mechanism structural representation;
Fig. 7 is X-direction interferometer structure synoptic diagram embodiment illustrated in fig. 6.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.
Mask platform level provided by the invention is used for scanning-exposure apparatus to measurement mechanism, has level to the three-freedom degree precision measurement function.Described scanning-exposure apparatus structure as shown in Figure 3, comprise illuminator 101, mask platform 102, projection objective 103, work stage 104 and interfering meter measuring device 105, described illuminator 101 provides exposure light source for exposure device, described mask platform 102 supports and location mask version 106, projection objective 103 is with the substrate 107 of the graphic projection on the described mask 106 in described work stage 104, for example on the silicon chip, the described substrate 107 of described work stage 104 carryings is for described substrate 107 provides support and positioning function.
Embodiment 1
Please refer to Fig. 4, mask platform level provided by the invention is to measurement mechanism, comprise X-direction interferometer system and Y-direction interferometer system, the holding of described mask platform is provided with mask and along Y-direction scanning motion (arrow shown in 208 is the mask bench scanning direction among the figure) on the bed 205, move along the X-direction fine setting, described X-direction interferometer system comprises X-direction interferometer 201a, be folded to catoptron and X-direction and measure mirror 203, particularly, the described catoptron that is folded to adopts 45 ° of catoptron 202a, described 45 ° of catoptron 202a are arranged at described holding on the bed 205, described X-direction is measured mirror 203 outside the direction of scanning is arranged at described mask platform, and be positioned at a side of mask platform fine setting direction, described X-direction interferometer 201a is arranged at outside the mask platform, and is positioned at a side of mask bench scanning direction; The emitting light path of described X-direction interferometer 201a reflexes to X-direction through two groups of 45 ° of catoptron 202a and measures on the mirror 203, and returns along former road, obtains the described bed 205 that holds along the positional information of X-direction.Mask platform level provided by the invention is to measurement mechanism, by fixing 45 ° of catoptron 202a holding bed 205, and pass through described X-direction interferometer 201a, described 45 ° of catoptron 202a and X-direction are measured the location layout of mirror 203, so that pass through the processing of light path from the light beam of X-direction interferometer 201a, the final fine motion position measurement signal that forms the mask platform X-direction, cancel traditional X-direction and measured mirror fixed form and light path layout, well solved along with the increase of mask platform stroke is fixed on the mask platform X-direction and measured the mirror size also in problems such as continuous increases, effectively reduced the driving quality of mask platform, and light path is simple, and is with low cost.
Preferably, please refer to Fig. 4, described Y-direction interferometer system comprises two groups of Y- directions measurement mirror 207a, 207b and two groups of Y- direction interferometer 206a, 206b, described two groups of Y-directions are measured mirror 207a, 207b and are individually fixed in described holding on the bed 205 as described two groups of Y- direction interferometer 206a, 206b provide respectively position data, be used for obtaining described hold bed 205 along Y-direction and Rz to positional information.
Preferably, please refer to Fig. 4, described X-direction interferometer system also comprises other one group of X-direction interferometer 201b and is folded to catoptron, particularly, the described catoptron that is folded to adopts 45 ° of catoptron 202b, in this group X-direction interferometer 201b and 45 ° of catoptron 202b, described X-direction interferometer 201b is arranged at outside the mask platform, and be positioned at the opposite side of mask bench scanning direction, particularly, two groups of X-direction interferometer 201a, 201b lays respectively at the positive negative sense of described direction of scanning, described 45 ° of catoptron 202b are arranged at described holding on the bed 205, so that reflex to X-direction measurement mirror 203 from the light beam of this group X-direction interferometer 201b through 45 ° of catoptron 202b, and return along former road, the minute surface face type compensated information that described X-direction is measured mirror 203 obtained.
Below, because two groups of X-direction interferometer 201a, 201b and two groups of 45 ° of catoptron 202a, 202b structure are identical, symmetrical, so only introduce wherein one group structure and light path trend, represent wherein one group of X-direction interferometer with label 201a, miscellaneous part the like.
Preferably, please refer to Fig. 3, Fig. 4 and Fig. 5, described every group of X-direction interferometer 201a comprises the two-frequency laser (not shown), spectroscope, with reference to 45 ° of catoptron 305a, reference mirror 306a and optical fiber collimator (not shown), 45 ° of catoptron 305a of described reference and reference mirror 306a all are arranged at projection objective 103 tops, so that be consistent by optical path direction and the displacement measurement direction (X-direction) of reference mirror 306a, described two-frequency laser sends the laser that comprises two kinds of frequencies, through described spectroscope light splitting, form and measure light and reference light, described measurement light returns through former road after described 45 ° of catoptron 202a and 203 reflections of described X-direction measurement mirror successively, described reference light returns through 45 ° of catoptron 305a of described reference and reference mirror 306a reflection, the measurement light and the reference light that return are coupled to described optical fiber collimator, interfere through described optical fiber collimator, form the fine motion position measurement signal of mask platform X-direction.Particularly, described spectroscope is polarization splitting prism 304a, and the described laser that comprises two kinds of frequencies is orthogonal two the linearly polarized light f in polarization direction
a, f
b, described two linearly polarized light f
a, f
bLight splitting surface at described polarization splitting prism 304a is separated, and wherein the polarization direction is parallel to the linearly polarized light f of the light splitting surface of polarization splitting prism 304a
aBy described polarization splitting prism 304a transmission, form described measurement light; And the polarization direction is perpendicular to the linearly polarized light f of the light splitting surface of polarization splitting prism 304a
bThen by described polarization splitting prism 304a reflection, form described reference light.
Preferably, please continue with reference to figure 5, described X-direction interferometer 201a also comprises pyramid mirror 301a, two groups of quarter wave plate 302a, 302b and plane mirror 303a, through the measurement light after the described polarization splitting prism 304a transmission after the quarter wave plate 302a of correspondence becomes circularly polarized light, after 45 ° of catoptron 202a and 203 reflections of described X-direction measurement mirror, returned by former road successively, again again become linearly polarized light behind the quarter wave plate 302a through correspondence when measuring light, at this moment, measure the polarisation of light direction and rotated 90 degree, when measurement light runs into described polarization splitting prism 304a again, by described polarization splitting prism 304a reflection, then, measure light and behind described pyramid mirror 301a two secondary reflections, turn back to described polarization splitting prism 304a, but separated a segment distance, be described polarization splitting prism 304a eye point with this moment incidence point at X, certain displacement appears in Y-direction, again by described polarization splitting prism 304a again behind the secondary reflection, quarter wave plate 302a through correspondence becomes circularly polarized light again, after 45 ° of catoptron 202a and 203 reflections of described X-direction measurement mirror, returned by former road successively again, after measurement light is again through corresponding quarter wave plate 302a, again become again 90-degree rotation of linearly polarized light and polarization direction, measure light finally by described polarization splitting prism 304a transmission after, be coupled to described optical fiber collimator.
Preferably, please continue with reference to figure 5, reference light after described polarization splitting prism 304a reflection is first after described plane mirror 303a reflects, quarter wave plate 302b through correspondence becomes circularly polarized light, return through former road behind 45 ° of catoptron 305a of described reference and the reference mirror 306a again, again become linearly polarized light through behind this corresponding quarter wave plate 302b, again run into described polarization splitting prism 304a through described plane mirror 303a, after described polarization splitting prism 304a transmission, through behind two secondary reflections of described pyramid mirror 301a, but separated a segment distance, be described polarization splitting prism 304a eye point with this moment incidence point at X, certain displacement appears in Y-direction, after again by described polarization splitting prism 304a transmission, become circularly polarized light through corresponding quarter wave plate 302b, through returning with reference to former road behind 45 ° of catoptron 305a and the reference mirror 306a, after again becoming linearly polarized light through corresponding quarter wave plate 302b, reference light is coupled to described optical fiber collimator after reflecting finally by described polarization splitting prism 304a equally.
Preferably, please continue with reference to figure 5, described two groups of 45 ° of catoptron 202a, 202b are made of one the formula structure and measure microscope base 204 by one and are fixed in described holding on the bed 205.Certainly, described two groups of 45 ° of catoptron 202a, 202b also can be fixed in described holding on the bed 205 by a measurement microscope base separately respectively.
Mask platform level provided by the invention is to the measurement mechanism method, adopt aforesaid mask platform level to measurement mechanism, from the light beam of X-direction interferometer 201a, 201b successively after 45 ° of catoptron 202a, 202b reflections of correspondence and X-direction are measured mirror 203 reflections former road turn back to corresponding X-direction interferometer 201a, 201b.
Preferably, as shown in Figure 6 and Figure 7, the difference of present embodiment and embodiment 1 is: described two groups are folded to catoptron employing three-dimensional vertical angle measurement mirror 402a, 402b.
Please refer to Fig. 6, mask platform level provided by the invention is to measurement mechanism, comprise X-direction interferometer system and Y-direction interferometer system, the holding of described mask platform is provided with mask and along Y-direction scanning motion (arrow shown in 408 is the mask bench scanning direction among the figure) on the bed 405, move along the X-direction fine setting, described X-direction interferometer system comprises X-direction interferometer 401a, be folded to catoptron and X-direction and measure mirror 403, particularly, the described catoptron that is folded to adopts three-dimensional vertical angle measurement mirror 402a, described three-dimensional vertical angle measurement mirror 402a is arranged at described holding on the bed 405, described X-direction is measured mirror 403 outside the direction of scanning is arranged at described mask platform, and be positioned at a side of mask platform fine setting direction, described X-direction interferometer 401a is arranged at outside the mask platform, and is positioned at a side of mask bench scanning direction; The emitting light path of described X-direction interferometer 401a reflexes to X-direction through three-dimensional vertical angle measurement mirror 402a and measures on the mirror 403, and returns along former road, obtains the described bed 405 that holds along the positional information of X-direction.Mask platform level provided by the invention is to measurement mechanism, by holding fixedly three-dimensional vertical angle measurement mirror 402a of bed 405, and pass through described X-direction interferometer 401a, described three-dimensional vertical angle measurement mirror 402a and X-direction are measured the location layout of mirror 403, so that pass through the processing of light path from the light beam of X-direction interferometer 401a, the final fine motion position measurement signal that forms the mask platform X-direction, cancel traditional X-direction and measured mirror fixed form and light path layout, well solved along with the increase of mask platform stroke is fixed on the mask platform X-direction and measured the mirror size also in problems such as continuous increases, effectively reduced the driving quality of mask platform, and light path is simple, and is with low cost.
Preferably, please refer to Fig. 6, described Y-direction interferometer system comprises two groups of Y- directions measurement mirror 407a, 407b and two groups of Y- direction interferometer 406a, 406b, described two groups of Y-directions are measured mirror 407a, 407b and are individually fixed in described holding on the bed 405 as described two groups of Y- direction interferometer 406a, 406b provide respectively position data, be used for obtaining described hold bed 405 along Y-direction and Rz to positional information.
Preferably, please refer to Fig. 6, described X-direction interferometer system also comprises other one group of X-direction interferometer 401b and is folded to catoptron, particularly, the described catoptron that is folded to adopts three-dimensional vertical angle measurement mirror 402b, in this group X-direction interferometer 401b and three-dimensional vertical angle measurement mirror 402b, described X-direction interferometer 401b is arranged at outside the mask platform, and be positioned at the opposite side of mask bench scanning direction, particularly, two groups of X-direction interferometer 401a, 401b lays respectively at the positive negative sense of described direction of scanning, described three-dimensional vertical angle measurement mirror 402b is arranged at described holding on the bed 405, so that reflex to X-direction measurement mirror 403 from the light beam of this group X-direction interferometer 401b through three-dimensional vertical angle measurement mirror 402b, and return along former road, the minute surface face type compensated information that described X-direction is measured mirror 403 obtained.
Below, because two groups of X-direction interferometer 401a, 401b and three-dimensional vertical angle measurement mirror 402a, 402b structure are identical, symmetrical, so only introduce wherein one group structure and light path trend, represent wherein one group of X-direction interferometer with label 401a, miscellaneous part the like.
Preferably, please refer to Fig. 3, Fig. 6 and Fig. 7, described every group of X-direction interferometer 401a comprises the two-frequency laser (not shown), spectroscope, with reference to 45 ° of catoptron 505a, reference mirror 506a and optical fiber collimator (not shown), 45 ° of catoptron 505a of described reference and reference mirror 506a are arranged at projection objective 103 tops, described two-frequency laser sends the laser that comprises two kinds of frequencies, through described spectroscope light splitting, form and measure light and reference light, described measurement light returns through former road after described three-dimensional vertical angle measurement mirror 402a and 403 reflections of described X-direction measurement mirror successively, described reference light returns through 45 ° of catoptron 505a of described reference and reference mirror 506a reflection, the measurement light and the reference light that return are coupled to described optical fiber collimator, interfere through described optical fiber collimator, form the fine motion position measurement signal of mask platform X-direction.Particularly, described spectroscope is polarization splitting prism 504a, and the described laser that comprises two kinds of frequencies is orthogonal two the linearly polarized light f in polarization direction
a, f
b, described two linearly polarized light f
a, f
bLight splitting surface at described polarization splitting prism 504a is separated, and wherein the polarization direction is parallel to the linearly polarized light f of the light splitting surface of polarization splitting prism 504a
aBy described polarization splitting prism 504a transmission, form described measurement light; And the polarization direction is perpendicular to the linearly polarized light f of the light splitting surface of polarization splitting prism 504a
bThen by described polarization splitting prism 504a reflection, form described reference light.
Preferably, please continue with reference to figure 7, described X-direction interferometer 401a also comprises polarization splitting prism 504a, and the described laser that comprises two kinds of frequencies has orthogonal two the linearly polarized light f in polarization direction
a, f
b, described two linearly polarized light f
a, f
bLight splitting surface at described polarization splitting prism 504a is separated, and wherein the polarization direction is parallel to the linearly polarized light f of the light splitting surface of polarization splitting prism 504a
aBy described polarization splitting prism 504a transmission, form described measurement light; And the polarization direction is perpendicular to the linearly polarized light f of the light splitting surface of polarization splitting prism 504a
bThen by described polarization splitting prism 504a reflection, form described reference light.
Preferably, please continue with reference to figure 7, described X-direction interferometer 401a also comprises pyramid mirror 501a, two groups of quarter wave plate 502a, 502b and plane mirror 503a, through the measurement light after the described polarization splitting prism 504a transmission after the quarter wave plate 502a of correspondence becomes circularly polarized light, after three-dimensional vertical angle measurement mirror 402a and 403 reflections of described X-direction measurement mirror, returned by former road successively, again again become linearly polarized light behind the quarter wave plate 502a through correspondence when measuring light, at this moment, measure the polarisation of light direction and rotated 90 degree, when measurement light runs into described polarization splitting prism 504a again, by described polarization splitting prism 504a reflection, then, measure light and behind described pyramid mirror 501a two secondary reflections, turn back to described polarization splitting prism 504a, but separated a segment distance, be described polarization splitting prism 504a eye point with this moment incidence point at X, certain displacement appears in Y-direction, again by described polarization splitting prism 504a again behind the secondary reflection, quarter wave plate 502a through correspondence becomes circularly polarized light again, after three-dimensional vertical angle measurement mirror 402a and 403 reflections of described X-direction measurement mirror, returned by former road successively again, after measurement light is again through corresponding quarter wave plate 502a, again become again 90-degree rotation of linearly polarized light and polarization direction, measure light finally by described polarization splitting prism 504a transmission after, be coupled to described optical fiber collimator.
Preferably, please continue with reference to figure 7, reference light after described polarization splitting prism 504a reflection is first after described plane mirror 503a reflects, quarter wave plate 502b through correspondence becomes circularly polarized light, return through 45 ° of catoptron 505a of described reference and the former road of reference mirror 506a again, again become linearly polarized light through behind this corresponding quarter wave plate 502b, again run into described polarization splitting prism 504a through described plane mirror 503a, after described polarization splitting prism 504a transmission, through behind two secondary reflections of described pyramid mirror 501a, but separated a segment distance, be described polarization splitting prism 504a eye point with this moment incidence point at X, certain displacement appears in Y-direction, after again by described polarization splitting prism 504a transmission, become circularly polarized light through corresponding quarter wave plate 502b, through returning with reference to 45 ° of catoptron 505a and the former road of reference mirror 506a, after again becoming linearly polarized light through corresponding quarter wave plate 502b, reference light is coupled to described optical fiber collimator after reflecting finally by described polarization splitting prism 504a equally.
Preferably, described three-dimensional vertical angle measurement mirror 402a, 402b are made of one the formula structure and measure microscope base 404 by one and be fixed in described holding on the bed 405, and perhaps described three-dimensional vertical angle measurement mirror 402a, 402b are fixed in described holding on the bed 405 by a measurement microscope base 404 separately respectively.
Mask platform level of the present invention is to the measurement mechanism method, adopt aforesaid mask platform level to measurement mechanism, from the light beam of X-direction interferometer 401a, 401b successively after three-dimensional vertical angle measurement mirror 402a, the 402b of correspondence and X-direction are measured mirror 403 reflections former road turn back to corresponding X-direction interferometer 401a, 401b.
In sum, mask platform level provided by the invention has well solved to measurement mechanism and method and has been fixed on the mask platform X-direction and measures mirror and increase and constantly increase along with stroke, the mask platform size is limited by the problems such as size that are fixed on X-direction measurement mirror on the mask platform, effectively reduced the driving quality of mask platform, and light path is simple, and is with low cost.
Obviously, those skilled in the art can carry out various changes and modification to the present invention and not break away from the spirit and scope of the present invention.Like this, if of the present invention these are revised and modification belongs within the scope of claim of the present invention and equivalent technologies thereof, then the present invention also is intended to comprise these changes and modification interior.
Claims (10)
1. a mask platform level is to measurement mechanism, comprise X-direction interferometer system and Y-direction interferometer system, the holding of described mask platform is provided with mask and along the Y-direction scanning motion on the bed, move along the X-direction fine setting, it is characterized in that, described X-direction interferometer system comprises the X-direction interferometer, be folded to catoptron and X-direction and measure mirror, the described catoptron that is folded to is arranged at described holding on the bed, described X-direction is measured mirror outside the direction of scanning is arranged at described mask platform, and be positioned at a side of mask platform fine setting direction, described X-direction interferometer is arranged at outside the mask platform, and is positioned at a side of mask bench scanning direction; The emitting light path of described X-direction interferometer is measured on the mirror through being folded to mirror reflects to X-direction, and returns along former road, obtains the described bed that holds along the positional information of X-direction.
2. mask platform level as claimed in claim 1 is to measurement mechanism, it is characterized in that, described Y-direction interferometer system comprises two groups of Y-directions measurement mirrors and two groups of Y-direction interferometers, described two groups of Y-directions are measured mirror and are individually fixed in described holding on the bed as described two groups of Y-direction interferometers provide respectively position data, be used for obtaining described hold bed along Y-direction and Rz to positional information.
3. mask platform level as claimed in claim 1 is to measurement mechanism, it is characterized in that, described X-direction interferometer system also comprises other one group of X-direction interferometer and is folded to catoptron, at this group X-direction interferometer and being folded in the catoptron, described X-direction interferometer is arranged at outside the mask platform, and be positioned at the opposite side of mask bench scanning direction, the described catoptron that is folded to is arranged at described holding on the bed, so that measure mirror from the light beam of this group X-direction interferometer through being folded to mirror reflects to X-direction, and return along former road, obtain the minute surface face type compensated information that described X-direction is measured mirror.
4. mask platform level as claimed in claim 3 is to measurement mechanism, it is characterized in that, every group of X-direction interferometer comprises two-frequency laser, spectroscope, reference mirror and optical fiber collimator, described two-frequency laser sends the laser that comprises two kinds of frequencies, through described spectroscope light splitting, form and measure light and reference light, described measurement light successively through described be folded to catoptron and described X-direction and measure the mirror reflection after former road return, described reference light returns through described reference mirror reflection, the measurement light and the reference light that return are coupled to described optical fiber collimator, interfere through described optical fiber collimator, form the fine motion position measurement signal of mask platform X-direction.
5. mask platform level as claimed in claim 4 is characterized in that to measurement mechanism, and described spectroscope is polarization splitting prism, and the described laser that comprises two kinds of frequencies is orthogonal two the linearly polarized light f in polarization direction
a, f
b, described two linearly polarized light f
a, f
bLight splitting surface at described polarization splitting prism is separated, and wherein the polarization direction is parallel to the linearly polarized light f of the light splitting surface of polarization splitting prism
aBy described polarization splitting prism transmission, form described measurement light; And the polarization direction is perpendicular to the linearly polarized light f of the light splitting surface of polarization splitting prism
bThen reflected by described polarization splitting prism, form described reference light.
6. mask platform level as claimed in claim 5 is to measurement mechanism, it is characterized in that, every group of X-direction interferometer also comprises the pyramid mirror, two groups of quarter wave plates and plane mirror, measurement light after described polarization splitting prism transmission is after the quarter wave plate of correspondence becomes circularly polarized light, returned by former road after catoptron and described X-direction are measured the mirror reflection through being folded to successively, again again become linearly polarized light behind the quarter wave plate through correspondence when measuring light, at this moment, measure the polarisation of light direction and rotated 90 degree, when measurement light runs into described polarization splitting prism again, reflected by described polarization splitting prism, then, measure light and behind described pyramid mirror two secondary reflections, turn back to described polarization splitting prism, by described polarization splitting prism again behind the secondary reflection, quarter wave plate through correspondence becomes circularly polarized light again, returned by former road after catoptron and described X-direction are measured the mirror reflection through described being folded to successively again, after measurement light is again through corresponding quarter wave plate, again become again 90-degree rotation of linearly polarized light and polarization direction, measure light finally by described polarization splitting prism transmission after, be coupled to described optical fiber collimator.
7. mask platform level as claimed in claim 5 is to measurement mechanism, it is characterized in that, reference light after described polarization splitting prism reflection is first after described plane mirror reflects, quarter wave plate through correspondence becomes circularly polarized light, return through the former road of described reference mirror again, again become linearly polarized light through behind this corresponding quarter wave plate, again run into described polarization splitting prism through described plane mirror, after described polarization splitting prism transmission, through behind two secondary reflections of described pyramid mirror, again by after the described polarization splitting prism transmission, become circularly polarized light through corresponding quarter wave plate, return through the former road of reference mirror, after quarter wave plate corresponding to process becomes linearly polarized light again, reference light is coupled to described optical fiber collimator after reflecting finally by described polarization splitting prism.
8. mask platform level as claimed in claim 3 is characterized in that to measurement mechanism, and described two groups are folded to 45 ° of catoptrons of catoptron employing or adopt three-dimensional vertical angle measurement mirror.
9. mask platform level as claimed in claim 3 is to measurement mechanism, it is characterized in that, described two groups are folded to catoptron and are made of one the formula structure and measure microscope base by one and be fixed in described holding on the bed, and perhaps described two groups are folded to catoptron and measure microscope base by one separately respectively and be fixed in described holding on the bed.
10. a mask platform level is to measuring method, it is characterized in that, adopt as 1～9 in the described mask platform level of any one to measurement mechanism, from the measuring beam of X-direction interferometer successively through correspondence be folded to mirror reflects and X-direction to measure the mirror reflection after former road turn back to corresponding X-direction interferometer.
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| CN2012101192921A CN103376665A (en) | 2012-04-20 | 2012-04-20 | Masking platform horizontal measuring device and method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012101192921A CN103376665A (en) | 2012-04-20 | 2012-04-20 | Masking platform horizontal measuring device and method |
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| WO2017114415A1 (en) * | 2015-12-31 | 2017-07-06 | 上海微电子装备（集团）股份有限公司 | Interferometer measurement device and control method therefor |
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