KR100637639B1 - A laser interferometer, a position measuring apparatus and measuring method, an exposure apparatus, and a method of manufacturing thereof - Google Patents

Abstract

The laser interferometer for detecting the Y-direction position of the moving object moving in the X direction has a separation optical system moving at a different speed from the moving object in the X direction. The laser beam is separated into a reference beam and a measurement beam by a separation optical system, and irradiated with a reference mirror and a moving mirror on the movable body, respectively. Then, the reflected light from the moving mirror of the measuring beam and the reflected light from the reference mirror of the reference beam are received by the photodetector through the separation optical system, and the photoelectric conversion signals of these interfering light are output as position information in the Y direction of the moving object. Since the separation optical system also moves in the X direction, a fixed diameter shorter than the movable body is sufficient.

Description

LASER INTERFERFERTER, A POSITION MEASURING APPARATUS AND MEASURING METHOD, AN EXPOSURE APPARATUS, AND A METHOD OF MANUFACTURING THEREOF

BRIEF DESCRIPTION OF THE DRAWINGS The figure which showed schematically the structure of the principal part of the scanning type exposure apparatus of 1st Embodiment,

FIG. 2 is a view showing components of a Y interferometer for measuring positions in the non-scanning direction of the mask stage and the plate stage of FIG. 1; FIG.

3 is a view showing a positional relationship between a mask stage and a beam splitter stage at the start of scanning;

4 is a view showing a positional relationship between a mask stage and a beam splitter stage at the end of scanning;

5 is a plan view showing the configuration of a Y interferometer according to a second embodiment;

6 is a plan view showing the configuration of a Y interferometer according to another embodiment;

7 is a perspective view illustrating a configuration of a Y interferometer according to another embodiment;

8 is a perspective view illustrating a modification of the interferometer of FIG. 7.

* Description of the symbols for the main parts of the drawings *

1: projection optical system 2: mask

3: plate 4: mask stage

5: plate stage 100: exposure apparatus

The present invention relates to a laser interferometer, a position measuring device and an exposure apparatus, and more particularly, a laser interferometer and a position measuring device for measuring the position of the moving object by interfering the measurement beam reflected from the moving mirror and the reference beam reflected from the reference mirror And an exposure apparatus provided with the interferometer or position measuring device as at least one position measuring device of the mask stage and the substrate stage. The present invention also relates to a position measuring method and a manufacturing method of a laser interferometer, a position measuring device and an exposure apparatus. The laser interferometer and the position measuring device according to the present invention are particularly applicable to a scanning type exposure apparatus for manufacturing display elements such as a liquid crystal display panel or a plasma display panel.

Recently, in the lithography process for manufacturing a liquid crystal display panel or the like, in order to cope with the increase in size of a liquid crystal substrate, a scanning exposure window capable of exposing a large area at a time is relatively used. As a scanning type exposure apparatus for this type of liquid crystal, for example, as disclosed in Japanese Patent Application Laid-Open No. 7-57986, an equi-array composed of two partial optical systems each including a refractometer and a concave reflector is used. It is known to construct a projection optical system using a plurality of pairs of projection optical system units, and to collectively move the mask and the plate (substrate) with respect to the projection optical system and to perform scanning exposure collectively.

However, when the liquid crystal substrate is enlarged, the scanning distance between the mask stage and the substrate stage inevitably becomes long in the liquid crystal scanning exposure apparatus. Therefore, in order to measure the non-scanning position of the mask stage and the substrate stage with high accuracy using a laser interferometer, the reflecting mirror having a reflecting surface in the scanning direction having a length exceeding the scanning direction length of these stages is a movable mirror or a fixed mirror. It is necessary as. For example, Japanese Patent Application Laid-open No. Hei 10-74692 and the like disclose a scanning exposure apparatus having a fixed diameter extending in such a scanning direction. In this publication, a beam splitter, a mirror, a corner cube, etc., in which a laser beam is separated into a reference beam and a measurement beam, are fixed to the stage, and as a reference mirror, a non-scanning position of the stage is determined by using a fixed mirror made of a planar mirror longer than the stage. A double pass laser interferometer for measuring with high accuracy is disclosed.

However, in recent years, liquid crystal substrates have become larger in size, and since the technique described in JP-A-10-74692 has been applied as it is, it is difficult to measure the position of the stage in the non-scanning direction with high precision. This is because, with the recent increase in the size of the substrate, the stage has been enlarged, so that the length of the fixed diameter is increased, and it is difficult to process and polish the reflective surface with sufficient precision. Liquid crystal substrates, etc. will be larger in the future, so it is urgent to develop new technologies that can cope with such a situation.

SUMMARY OF THE INVENTION The present invention has been made to solve the problem of tolerance technology, and a first object thereof is to use a reflector shorter than the total length of the movable body and to orthogonally intersect the long stroke in the entire stroke of the movable body exceeding the total length of the movable body. The present invention provides a laser interferometer and a position measuring device capable of measuring a position, and a manufacturing method thereof.

A second object of the present invention is to provide an exposure window that can control the position of a mask stage or a substrate stage with high precision even when the substrate is enlarged, and a manufacturing method thereof.

A third object of the present invention is to provide a position measuring method capable of measuring the position in the direction orthogonal to the long stroke direction in the entire region of the moving stroke exceeding the overall length of the moving object using a reflector shorter than the total length of the moving object. have.

According to the first aspect of the present invention, a laser interferometer for measuring a position in a first direction (Y direction) orthogonal to a second direction of a moving body moving in a second direction (X axis direction) using a laser beam,

A separation optical system 21 or 21 'for separating the laser beam into a measurement beam and a reference beam,

A moving mirror 22 or 22 'mounted on the moving body 4 or 5, the moving mirror reflecting a measurement beam,

A reference mirror 26 or 26 'formed independently of a moving object, the reference mirror reflecting a reference beam,

A moving device (6 or 6 ') for moving the separation optical system in a second direction at a speed different from the moving speed of the moving object,

A laser interferometer is provided having a detector that detects a measurement beam reflected from a moving mirror and a reference beam reflected from a reference mirror and obtains a position in the first direction of the moving body based on the interference effects of the beams.

According to the present invention, the laser beam emitted from the light source is separated into the reference beam and the measurement beam by the separation optical system. The measuring beam is irradiated to the reflecting surface of the movable mirror formed on the movable body and the reference beam is irradiated to the reference mirror. Then, the position in the first direction of the moving object is measured based on the photoelectric conversion signal of the reflected light from the moving mirror of the measuring beam and the interference light of the reflected light from the reference mirror of the reference beam.

The above measurement is performed during the movement of the movable body, but since the separation optical system is also moving in the second direction at a different speed from the movable body, the length of the second direction (long stroke direction) orthogonal to the first direction, which is the measuring direction of the movable mirror, is measured. When L1 and the moving speed in the second direction of the moving body are V1 and the moving speed in the second direction of the separation optical system are V2, the moving stroke in the second direction of the moving body is S, and S = | V1 / (V1-V2 As long as L1> L1 is satisfied, i.e., 0 <V2 <2V1 (where V1 ≠ V2), the measuring beam separated by the separation optical system continuously touches another position on the mirror reflecting surface, so that the first direction of the moving object The position of can be measured. Therefore, it is possible to measure the position in the direction orthogonal to the long stroke direction in the entire area of the moving stroke exceeding the overall length of the moving object by using a reflecting mirror shorter than the total length of the moving object (measurement object).

Here, the position measurement by the laser interferometer is known to have a very high precision compared to other measuring devices, and in particular the method of detecting heterodyne can detect the position with a particularly high precision.

According to a second aspect of the present invention, there is provided a position measuring device for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using light from a light source,

A separation optical system that separates light from the light source into a measurement beam and a reference beam,

A moving mirror mounted on the moving body, the moving mirror reflecting a measurement beam;

A fixed diameter formed independently of the moving body, the fixed diameter forming a part of the optical path of the measuring beam between the moving diameters;

A moving device which moves the separation optical system in a second direction at a speed different from the moving speed of the moving object,

A position measuring device having a detection system for detecting the measuring beam and the reference beam and finding a position in the first direction of the moving body based on the interference effects of the beams is provided.

In the position measuring device of the present invention, the optical path length between the movable mirror and the fixed mirror is measured by the measuring beam. Since the separation optical system also moves in accordance with the movement of the moving object, the irradiation point of the moving mirror to which the measuring beam is irradiated and the irradiation point of the fixed mirror also move. By adjusting the moving speed of the separation optical system, the length of the fixed mirror can be made less than the length of the moving direction of the moving object. By placing the separation optical system in the optical path between the moving mirror and the fixed mirror, information regarding the optical path length between the moving mirror and the fixed mirror and its change can be obtained from the measuring beam, regardless of the moving path of the separating optical system. A reference mirror may be provided to reflect a reference beam toward the detection system. The reference mirror may be disposed to face the detection system with the separation optical system interposed therebetween, and may form a reference mirror on a moving device, for example, a moving stage. The fixed mirror may be disposed to face the fixed mirror with the separation optical system therebetween.

According to a third aspect of the present invention, there is provided an exposure apparatus for transferring a pattern formed on a mask onto a substrate,

A mask stage supporting the mask and moving in a second direction;

A substrate stage supporting the substrate and moving in a second direction;

A laser interferometer for measuring a position in a first direction orthogonal to a second direction of at least one stage using a laser beam,

The laser interferometer,

A separation optical system for separating the laser beam into a measurement beam and a reference beam;

A moving mirror mounted on the at least one stage, the moving mirror reflecting a measurement beam;

A reference mirror formed independently of the at least one stage, the reference mirror reflecting a reference beam,

A moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one stage;

And a detector for detecting the measurement beam reflected from the moving mirror and the reference beam reflected from the reference mirror and finding a position in the first direction of the at least one stage based on the interference effect of the beams. Is provided.

According to a fourth aspect of the present invention, there is provided an exposure apparatus which transfers a pattern formed on a mask onto a substrate.

A mask stage supporting the mask and moving in a second direction;

A substrate stage supporting the substrate and moving in a second direction;

A position measuring device for measuring a position in a first direction orthogonal to a second direction of at least one stage using a light beam,

The position measuring device,

A separation optical system that separates the light beam into a measurement beam and a reference beam;

A moving mirror mounted on the at least one stage, the moving mirror reflecting a measurement beam;

A reference mirror formed independently of the at least one stage, the fixed mirror forming a part of the optical path of the measurement beam between the moving mirrors;

A moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one stage;

An exposure apparatus is provided that includes a detection system that detects the measurement beam and the reference beam and obtains a position in the first direction of the at least one stage based on the interference effects of the beams.

The exposure apparatus according to the third and fourth aspects of the present invention uses a reflector shorter than the total length of the mask stage or substrate stage to extend the length of these stages over the entire range of movement strokes exceeding the total length of the mask stage or substrate stage. The position regarding the direction orthogonal to a stroke direction can be detected with high precision. In this case, the position in the long stroke direction of the stage can be performed with high accuracy by an interferometer having the measuring beam in the long stroke direction as in the prior art. Therefore, even when the substrate is enlarged, the position of the stage can be controlled with high precision, and as a result, the mask and the substrate can be superimposed with high precision. Further, the exposure apparatus can be miniaturized and the manufacturing cost can be lowered.

According to a fifth aspect of the present invention, a laser beam is irradiated to a fixed mirror and a movable mirror mounted on a movable member moving in a second direction to measure a position in a first direction orthogonal to a second direction of the movable body using an interference effect. As a position measuring method,

Splitting the laser beam into a measurement beam and a reference beam,

The measuring beam is irradiated to the moving mirror while moving in the second direction at a speed different from that of the moving body, and the reflected light from the moving mirror passes between the moving mirror and the fixed mirror,

The above method is provided, including obtaining the position of the moving body in the first direction by comparing the phase of the measuring beam passed between the moving mirror and the fixed mirror with the phase of the reference beam.

According to the position measuring method of the present invention, the position of the movable body can be measured by effectively using the lengths of the movable mirror and the fixed mirror by moving the measuring beam in a second direction at a speed different from that of the movable mirror, for example, 1/2 of the movable mirror. To be able. As a result, the length of the fixed mirror irradiated with the reference beam can be equal to or less than the length in the second direction of the movable body. Therefore, the method of the present invention becomes very effective when the processing precision of the fixed mirror (or the movable mirror) is required or when the installation space of the mirrors cannot be taken.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a laser interferometer according to the first aspect of the present invention.

According to a seventh aspect of the present invention, there is provided a method of manufacturing a position measuring device according to the second aspect of the present invention.

According to an eighth aspect of the present invention, there is provided a method of manufacturing an exposure apparatus according to the third aspect of the present invention.

According to a ninth aspect of the present invention, there is provided a method of manufacturing an exposure apparatus according to the fourth aspect of the present invention.

According to a tenth aspect of the present invention, there is provided a position measuring apparatus for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using a light beam from a light source,

A movable diameter mounted to the movable body and a fixed diameter formed separately from the movable body,

An optical system that splits the light beam from the light source and directs the moving mirror and the fixed mirror, respectively;

A moving device for moving the optical system in a second direction at a speed different from the moving speed of the moving object,

A position measuring device is provided that includes a detector that detects reflected light beams from a moving mirror and a fixed mirror and obtains a position in the first direction of the moving body based on the interference effects of the beams.

The position measuring device according to the tenth aspect of the present invention is represented by, for example, the device shown in Fig. 7 or 8. In this position measuring device, since the optical system is moved slower than the moving body by the moving device, the length of the fixed mirror can be made shorter than the length in the second direction of the moving body.

[First Embodiment]

EMBODIMENT OF THE INVENTION Below, 1st Embodiment of this invention is described based on FIGS.

1, the exposure apparatus of 1st Embodiment provided with the laser interferometer which concerns on this invention as a position measuring apparatus of the mask stage 4 and the plate stage 5 as a movable body in the 1st predetermined direction (Y direction). The configuration of the main part of 100 is shown. The exposure apparatus 100 is for producing a liquid crystal display panel in which the mask 2 and the plate 3 serving as the substrate are scanned relative to the projection optical system 1 so as to collectively transfer the pattern formed on the mask 2 onto the plate 3. Scan type exposure apparatus. A scanning exposure apparatus of this type is disclosed, for example, in US Pat. No. 5,715,037, and details of the scanning exposure apparatus can be referred to this US patent. Hereinafter, the optical axis direction of the projection optical system 1 is made into the Z-axis direction, and the scanning direction which carries out the relative scan of the mask 2 and the plate 3 in the surface orthogonal to this Z-axis is the X-axis direction (2nd direction) The non-scanning direction orthogonal to the X axis direction will be described as the Y axis direction (the first direction).

The exposure apparatus 100 includes an illumination optical system (not shown) which uniformly illuminates the rectangular slit-shaped illumination region IMA on the mask 2 by the exposure illumination light IL, and the mask 2 below the illumination optical system. A mask stage 4 for supporting the substrate, a projection optical system 1 disposed below the mask stage 4, and a plate stage 5 as a substrate stage for supporting the plate 3 below the projection optical system 1. Etc. are provided.

As said projection optical system 1, what projects the upright image of equal magnification is used here. Therefore, when the illumination region IMA on the mask 2 is illuminated by the exposure illumination light IL from the illumination optical system, the equal pattern of the circuit pattern of the illumination region IMA portion (partial upright phase) ) Is projected onto the exposure area IA conjugated to the illumination area IMA on the plate 3. Moreover, as disclosed, for example, in Unexamined-Japanese-Patent No. 7-57986, the projection optical system 1 can also be comprised by the projection optical system unit of multiple pairs of equal magnifications. Such a projection optical system unit may be referred to Japanese Laid-Open Patent Publication No. 7-57986 and its corresponding US Pat. No. 5,729,331.

The mask stage 4 and the plate stage 5 are mounted in the carriage of U-shaped cross section which is not shown in figure. In more detail, the mask stage 4 is actually mounted on the upper plate of the carriage, and is configured to allow a small drive in the XY plane by a driving device such as a motor (not shown). The mask 2 is horizontally supported on the mask stage 4 by vacuum suction or the like. The XY position of this mask stage 4 is measured by the mask side interferometer system by predetermined | prescribed resolution, for example, about 0.5-1 nm. This mask side interferometer system will be described later.

In addition, the plate stage 5 is actually mounted on the bottom plate part of the said carriage, and is comprised so that a micro drive can be performed in XY plane by the drive apparatus, such as a motor which is not shown in figure. The plate 3 to which the resist (photosensitive agent) was apply | coated on the surface of this plate stage 5 is horizontally supported by vacuum suction etc. The XY position of this plate stage 5 is measured by the plate-side interferometer system with predetermined | prescribed resolution, for example, about 0.5-1 nm. In addition, either of the mask stage 4 and the plate stage 5 can be fixed on the carriage.

In this exposure apparatus 100, by driving the carriage in the X-axis direction, the mask stage 4 and the plate stage 5 are integrally scanned relative to the projection optical system 1, whereby on the mask 2 Circuit patterns throughout the pattern region are transferred onto the plate 3 on which the resist is applied on its surface.

Next, the mask side interferometer system will be described in detail with reference to FIGS. 1 and 2. In addition, since the plate-side interferometer system is configured in the same manner as the mask-side interferometer system, in Fig. 1 and Fig. 2, the same reference numerals are given to the corresponding components to distinguish them, and the detailed description thereof will be omitted.

The mask side interferometer system includes an X interferometer for measuring the position in the X-axis direction in the scanning direction of the mask stage 4 as a moving object, and a Y interferometer for measuring the position in the Y-axis direction in the non-scanning direction. As these X interferometers and Y interferometers, Michaelson-Mori type heterodyne laser interferometers, which are actually most widely used, are used. These interferometers are disclosed, for example, in US Pat. No. 5,767,971, to which reference may be made.

The X interferometer is a laser head 10, a polarizing beam splitter 11, a movable mirror 12, a fixed mirror 13, a quarter wave plate (hereinafter referred to as a "1/4 λ plate") shown in FIG. 14, 15, and the receiver 16 and the like.

The laser head 10 includes a light source and a detection unit therein. As a light source, a two-frequency laser using the Zeman effect is used. This light source has a stabilized frequency, and includes a first deflection component and a second deflection component having only two to three MHz of vacuum number (hence wavelength) and a polarization direction orthogonal to each other using the Zeeman effect. A laser beam consisting of a circular beam of Gaussian distribution is output. The first polarization component is a polarization component parallel to the light incidence plane of the polarization beam splitter 11 (see 21a in FIG. 2), that is, the plane including the normal light of the light separation plane and incident light on the light separation plane ( also referred to as p-polarized light), hereinafter referred to as H component. The second polarization component is a polarization component (referred to as s polarization) perpendicular to the light incidence plane with respect to the light separation plane of the polarization beam splitter 11, hereinafter referred to as a V component.

The detection unit is formed inside the laser head 10 and monitors the phase change by interfering the components of the two oscillation wavelengths, that is, the V component and the H component, which are output from the light source. The signal is sent to a signal processing system (not shown) as a reference signal.

The polarizing beam splitter 11 is an optical element that passes a predetermined polarization component and reflects a polarization component orthogonal thereto. Herein, the polarization beam splitter 11 transmits the H component from the laser head 10 as it is and reflects the V component. Separate the H and V components.

The moving mirror 12 is a mirror fixed to the cross section of one side (-X side) of the X-axis direction of the mask stage 4, and moving with a mask stage with respect to a projection optical system. The fixed mirror 13 is fixed to a predetermined position (for example, the projection optical system 1) in the apparatus.

Here, the operation of each component of the X interferometer will be described. The laser light emitted from the laser head 10 is incident on the polarizing beam splitter 11, and the incident laser light is separated into an H component (measurement beam) and a V component (reference beam).

The reference beam (V component) reflected by the beam splitter 11 is transmitted through the 1/4 lambda plate 15 to be converted into circularly polarized light, and after being reflected by the fixed mirror 13, the 1/4 lambda plate 15 is obtained. ) Is transmitted back and forth in the reverse direction. As a result, the reference beam is converted into a direction (polarization direction equal to the H component) orthogonal to the initial incidence of the incident light on the quarter-wave plate 15 and transmitted through the polarization beam splitter 11 to receive the receiver (16). Is incident on

On the other hand, the measurement beam (H component) transmitted through the beam splitter 11 is transmitted through the 1/4 λ plate 14 to be converted into circularly polarized light, and is reflected by the moving mirror 12, and then the 1/4 λ plate 14 ) Is transmitted back and forth in the reverse direction. As a result, the measuring beam is converted to a direction (the same polarization direction as the V component) orthogonal to the incident light on the quarter wave plate 14 and reflected by the polarizing beam splitter 11, which is the same as the reference beam. They are superimposed on the axis and travel on the same optical path and enter the receiver 16.

The receiver 16 includes a polarizer and a photoelectric conversion element not shown therein, and the polarizer has a polarization angle of 45 with respect to the V component and the H component (ie, the measurement beam and the reference beam) from the polarization beam splitter 11. It is set so that it may become a direction of FIG. Therefore, the polarizer passes only the vector component of the deflection angle direction of the V component and simultaneously passes only the vector component of the deflection direction angle of the H component. And the interference light of the vector component (VV) of the V component and the vector component (VH) of the H component which have passed through the polarizer is incident on the photoelectric conversion element. This photoelectric conversion element photoelectrically converts interference light of both vector components and supplies the electric signal (interference signal) to a signal processing system (not shown).

The signal processing system is supplied with a reference signal for phase detection by the laser head 10 as described above, and the signal processing system calculates using the reference signal, and performs an X position (mask stage) of the moving mirror 12. The amount of movement in the X-axis direction of (2)) is obtained with high accuracy. In addition, since the signal processing system processes the heterodyne interferometer according to the known method, the detailed description thereof will be omitted.

The Y interferometer includes a laser head 20 as a light source unit, a polarizing beam splitter 21 as a separation optical system, a moving mirror 22, a fixed mirror 23 as a reflecting optical member, 1/4 λ plates 24 and 25, and an optical path fold ( and a corner cube 26, a receiver 27, and the like as the fold member. This Y interferometer is the laser interferometer which concerns on this invention which measures the position of the mask stage 4 as a movable body in the Y-axis direction. In FIG. 2, the top view of this Y interferometer is shown.

The laser head 10, the polarization beam splitter 21, and the receiver 27 are the same as the laser head 10, the polarization beam splitter 11, and the receiver 16 described above.

The movable mirror 22 is formed at the end of one side (-Y side) in the Y-axis direction of the mask stage 4 in the first length L1 along the X-axis direction, and -Y of the movable mirror 22. The side surface of the side is the reflecting surface 22a. L1 is shorter than the length (total length) of the mask stage 4 in the X-axis direction.

The corner cube 26 constitutes a reference mirror here, and is fixed on the beam splitter stage 6 as a moving device in a predetermined positional relationship with the polarizing beam splitter 21 and the quarter-lambda plates 24 and 25. It is. This beam splitter stage 6 is driven in the X-axis direction on the substantially same surface as the mask stage 4 by a drive system such as a linear motor (not shown).

The fixed mirror 23 is fixed to the predetermined position on the opposite side to the movable mirror 22 via the beam splitter stage 6. The other side (+ Y side) surface of the fixed diameter 23 in the Y-axis direction is a reflecting surface 23a extending in the second length L2 along the X-axis direction.

Here, the operation of each component of the Y interferometer will be described with reference to FIG. The laser light emitted from the laser head 20 is incident on the polarization beam splitter 21, and the incident laser light is separated into an H component (reference beam) and a V component (measurement beam) on the optical separation surface 21a.

The reference beam (H component, linearly polarized light having a vibration direction parallel to the ground of FIG. 2) transmitted through the optical separation surface 21a is transmitted through the polarization beam splitter 21 and reflected by the corner cube 26 as a reference mirror. And folds along the optical path parallel to the incident optical path, and passes through the polarizing beam splitter 21 again and enters the receiver 27.

On the other hand, the measurement beam reflected by the optical separation surface 21a (V component: linearly polarized light having a vibration direction perpendicular to the ground of FIG. 2) is transmitted through the 1/4 lambda plate 24 to be converted into circularly polarized light, After being reflected by the reflecting surface 22a of the movable mirror 22, it passes through the 1/4 lambda plate 24 again. Thereby, the polarization direction of the measuring beam is converted again from circularly polarized light to linearly polarized light, but the polarization direction of the linearly polarized light is the direction orthogonal to the time of incidence on the first 1/4? Plate 25 (the same direction as the H component). Is converted to. Subsequently, the polarizing beam splitter 21 is transmitted, and the 1/4 lambda plate 25 is transmitted to be converted into circularly polarized light. This measuring beam is reflected by the reflecting surface 23a of the fixed mirror 23 and passes through the 1/4 lambda plate 25 again. Thus, as described above, the measuring beam is converted in the reverse direction (in the same direction as the H component) at the time of initial incidence into the 1/4 lambda wavelength plate 25 and reflected by the polarizing beam splitter 21 to be a corner. Head to the cube (26). Then, the measuring beam is folded along the optical path parallel to the incident optical path by the corner cube 26, reflected by the polarization beam splitter 21, and transmitted through the 1/4? Plate 25 to fix the fixed diameter ( Reflected on the reflecting surface 22a of 23. Then, the measurement beam passes through the 1/4 lambda plate 25 again, the polarization direction is reversed in the same direction as the H component, passes through the polarization beam splitter 21, passes through the 1/4 lambda plate 24, and passes through the movable mirror. Reflected at (22), the light is transmitted through the 1/4 lambda plate 24, and the polarization direction thereof is converted again (in the same direction as the V component). Subsequently, after being reflected by the polarizing beam splitter 21, it is superimposed on the same axis as the reference beam, and travels on the same optical path and is incident on the receiver 27.

In the receiver 27, in the same way as in the receiver 16, the interference light of the vector component of both components is given to the photoelectric conversion element, and the electrical signal which photoelectrically converts the interference light of both components by this photoelectric conversion element. (Interference signal) is supplied to a signal processing system (not shown), and the distance in the Y-axis direction between the fixed mirror 23 and the movable mirror 22 (Y of the movable mirror 22) in the same manner as described above by the preferred processing system. Axial position) is detected.

In the Y interferometer of this embodiment, it is understood that the optical path length of the reference beam is completely included in the total optical path length of the measurement beam, and the difference between them is (the optical path length between the fixed diameter and the moving diameter) x 2. That is, it can be seen that the variation in the interference effect detected by the detector when the moving mirror moves indicates a change in the optical path length between the fixed mirror and the moving mirror, and furthermore, a position change in the Y direction of the moving mirror.

Furthermore, in this embodiment, the beam splitter interferometer which measures the position of the beam splitter stage 6 in the X-axis direction is formed. The interferometer for the beam splitter is similar to the X interferometer described above, and the laser head 30, the polarizing beam splitter 31, the movable mirror 32, the fixed mirror 33, and the 1/4 lambda plate 34, 35), and the receiver 36, etc., and in the same manner as in the case of the X interferometer described above, the X position of the movable mirror 32 fixed to the beam splitter stage 6 is finally detected by the signal processing system. It is supposed to be. Thus, when the beam splitter stage 6 is moved in the X direction, its position can be controlled.

In the Y interferometer shown in this embodiment, the beam splitter 21 is located in the optical path of the measuring beam between the movable mirror 22 and the fixed mirror 23. Therefore, even if the beam splitter 21 slightly deviates in the Y direction, the optical path lengths of the movable mirror 22 and the fixed mirror 23 that pass through the beam splitter 21 are not affected. As described above, the observation with the Y interferometer is the optical path length of the light irradiation point in the movable mirror 22 and the fixed mirror 23, and the optical path length when the stage, i.e., the movable mirror attached thereto, is moved in the X direction, That is, it is a change of the position of the moving mirror in the Y direction. Therefore, in the present embodiment, the movement (moving precision) of the beam splitter stage 6 does not affect the positional change in the Y direction of the moving mirror to be observed.

In addition, the signal processing system can be configured using an amplifier, an A / D converter or a microprocessor (not shown).

Next, an example of the method of driving the mask stage 4 and the beam splitter stage 6 during scanning exposure in the scanning type exposure apparatus 100 of the first embodiment configured as described above is described. Let's explain. It is assumed here that the movement stroke in the scanning direction of the mask stage 4 is 2L, and the length L1 of the movable mirror 22 and the length L2 of the fixed mirror are both length L + α. Here, α is a predetermined margin and is actually a small amount. In addition, since the operation | movement on the plate stage side is the same as that of the mask stage side, the description is abbreviate | omitted.

3 shows the positional relationship between the mask stage 4 and the beam splitter stage 6 at the start of scanning. In the state of FIG. 3, the controller (not shown) starts driving the unshown carriage on which the mask stage 4 and the plate stage 5 are mounted in the + X direction at the speed V, and at the same time, the beam splitter stage ( 6) Start driving in the direction of + X at speed (V / 2). Then, after the predetermined time t has elapsed, it is assumed that the positional relationship between the mask stage 4 and the beam splitter stage 6 is as shown in FIG. 4 at the end of scanning.

In this case, the moving distance of the mask stage 4 is clearly 2L, and the moving time is t = 2L / V. The moving distance of the beam splitter stage 6 between these times t is V / 2 x t = L. Therefore, according to the present embodiment, as also shown in Figs. 3 and 4, since the measuring beam of the Y interferometer continuously touches the movable mirror 22 and the fixed mirror 23 from the scanning start position to the scanning end position, the mask stage ( 4) the whole area of the scanning range (range of stroke 2L) of the mask stage 4 longer than the total length of the mask stage 4 using the moving mirror 22 and the fixed diameter 23 having a length shorter than the total length of 4). In the non-scanning direction (Y-axis direction), the position can be detected with high accuracy. Similarly with respect to the plate stage 5, the position of the non-scanning direction (Y-axis direction) can be detected with high precision in the whole region of the scanning range of the stroke 2L.

As described above, according to the Y interferometer of the present embodiment, a reflector (moving mirror) having a length shorter than the length of the mask stage 4 and the plate stage 5 in the X-axis direction and about half the length of the movement stroke 2L. The position in the Y-axis direction orthogonal to the X-axis direction of the mask stage 4 and the plate stage 5 is increased by using the 22 and the fixed diameter 23, the movable diameter 22 'and the fixed diameter 23'. Can be measured with precision.

Therefore, according to the exposure apparatus 100 of this embodiment, even when the plate 3 as a board | substrate becomes large, the position of the mask stage 4 and the plate scanning direction of the non-scanning direction can be detected with high precision. have. In addition, the position of the mask stage 4 and the plate stage 5 in the scanning direction can be detected with high precision similarly to the prior art by irradiating the small moving mirrors 12 and 12 'with the interferometer beam in this scanning direction. Therefore, the position of the mask 2 and the plate 3 can be controlled with high precision, and as a result, a mask and a board | substrate can be superimposed with high precision.

In addition, in the said embodiment, although both the length of the mask side, the plate side moving mirror, and the fixed diameter in the scanning direction were made into L, of course, this invention is not limited to this. For example, when the length of the mask side and plate side moving mirrors is approximately L1, and the length of the mask side and plate side fixing mirrors is approximately L2, the scanning speed V1 of the mask stage 4 and the plate stage 5 is shown. With respect to the scanning stage of the beam splitter stage 6 (6 ') at approximately L2 / (L1 + L2) x V, the mask stage 4 and the plate stage 5 are roughly (L1 + L2) in the scanning direction. Can be scanned with a stroke.

In addition, in the above embodiment, the case where the mask stage 4 and the plate stage 5 are mounted on the U-shaped carriage and moves integrally has been described. However, the present invention is not limited thereto, and of course, the mask stage and the plate stage are independent. It may be configured to move in the scanning direction.

In the first embodiment described above, the case where only the Y interferometer is a double pass interferometer using a corner cube has been described, but of course, the interferometer for the X interferometer or the beam splitter can also be configured in a double pass configuration. As with the Y interferometer, the position can be measured with high accuracy even if there is a rotational error of the measurement object.

Second Embodiment

Next, 2nd Embodiment of this invention is described based on FIG. Here, the same or equivalent components as those in the above-described first embodiment are denoted by the same reference numerals, and the description thereof will be simplified or omitted.

This second embodiment differs from the first embodiment described above in that the configuration of the Y interferometer for measuring the non-scanning position of the mask stage and the plate stage is different from that of the first embodiment described above. Let's explain. Also in this embodiment, since the plate side interferometer is comprised similarly to the mask side, the detailed description is abbreviate | omitted.

5, the structure of the Y interferometer of the mask side which concerns on 2nd Embodiment is shown schematically. This Y interferometer includes a laser head 20 as a light source portion, a polarizing beam splitter 21 as a separation optical system, a moving mirror 22, a 1/4 lambda plate 24 and 25, a mirror 40, a corner cube 41 and a receiver. (27) and the like.

The mirror 40 constitutes a reference mirror, and is fixed on the beam splitter stage 6 in a predetermined positional relationship with the polarizing beam splitter 21, the 1/4 lambda plates 24, 25, and the corner cube 26. have.

Here, the operation of each component of the Y interferometer will be described. The laser light emitted from the laser head 20 is incident on the polarization beam splitter 21, and the incident laser light is linearly polarized light having an oscillation direction parallel to the H component (the plane of Fig. 5) by the optical separation surface 21a. For example, the reference mirror is divided into two components: a reference mirror) and a V component (a linearly polarized light having a vibration direction perpendicular to the ground of FIG. 5, which means a measurement beam here).

Then, the reference beam passing through the optical separation surface 21a is transmitted through the 1/4 lambda plate 25 to be converted into circularly polarized light, and after being reflected by the mirror 40, passes through the 1/4 lambda plate 25 again. do. As a result, the reference beam is converted into a direction in which its polarization direction is orthogonal to the first incident time on the 1/4 lambda wavelength plate 25 (that is, the same polarization direction as the V component), and is reflected by the polarization beam splitter 21. To the corner cube 41. Then, the reference beam is folded along the optical path parallel to the incident optical path by the corner cube 41, reflected by the polarization beam splitter 21, and transmitted through the 1/4? Plate 25 to the mirror 40 Reflected from). Then, the reference beam passes through the quarter-lambda plate 25 again, and the polarization direction thereof is converted again (in the same polarization direction as the H component), and passes through the polarization beam splitter 21 and enters the receiver 27. do.

On the other hand, the measurement beam (V component) reflected by the optical separation surface 21a is converted into circularly polarized light through the 1/4? Plate 24, and after being reflected by the reflective surface 22a of the moving mirror 22, 1 / The 4 lambda plate 24 is transmitted again. Thereby, the polarization direction is changed by the quarter-lambda plate 24, and the measurement beam passes through the polarization beam splitter 21 to face the corner cube 41. Then, the measuring beam is folded along the optical path parallel to the incident optical path by the corner cube 41, and then passes through the polarization beam splitter 21, passes through the 1/4? Plate 24, and is converted into circularly polarized light. do. And this measuring beam is reflected by the reflecting surface 22a of the moving mirror 22, and it passes through the 1/4 (lambda) plate 24, The polarization direction at the time of the first incidence to the 1/4 (lambda) plate 24 is carried out. It is converted in the opposite direction to the direction, and is reflected by the polarization beam splitter 21 and is coaxially overlapped with the reference beam to travel on the same optical path and enter the receiver 27.

In the receiver 27, as described above, the interfering light of the vector components of both components with respect to the predetermined change component is given to the photoelectric conversion element, and the interfering light of the both components is photoelectrically converted by the photoelectric conversion element. An electric signal (interference signal) is supplied to a signal processing system (not shown), whereby the position in the Y axis direction of the movable mirror 22 is detected.

According to the exposure apparatus of the second embodiment provided with the Y interferometer configured as described above, since the fixed mirror does not exist, the position in the non-scanning direction of the mask stage 4 can be measured without being limited by the length thereof.

In this case, when the length of the moving mirror 22 is set to L1, the moving speed of the mask stage 4 is set to V1, and the moving speed of the beam splitter stage 6 is set to V2, the mask stage 4 moves in the X axis direction. If the stroke (scan length) is set to S, the measuring beam is a moving mirror (22) as long as S = | V1 / (V1-V2) | L1> L1 is satisfied, that is, 0 <V2 <2V1 (V1 ≠ V2). Since it continuously touches the other position of the reflective surface 22a of), the position of the mask stage 4 in the Y-axis direction can be measured.

For example, when V2 = V1 / 2, S = 2L1. For example, S = 10L1 when V2 = 9/10 × V1. In the first and second embodiments, the Y interferometer has been described only as a double pass interferometer having a corner cube. However, the present invention is not limited thereto, and the configuration is such that the rotation of the mask stage as a measurement target hardly occurs during scanning. It can also be configured as a single pass. 6 shows an example of an interferometer in the case where the Y interferometer according to the second embodiment is configured in a single pass. The interferometer of FIG. 6 fixes the receiver 27 on the beam splitter stage 6 in place of the corner cube 41 in FIG. Also with this laser interferometer, the same effect as in the second embodiment can be obtained. In addition, instead of the receiver 27 in FIG. 6, the reflection mirror may be fixed on the beam splitter stage 6 at an angle of 45 in the X axis direction, and the receiver 27 may be disposed on the reflection light path of the reflection mirror.

In addition, although the said 1st Embodiment demonstrated the case where the movable mirror 22 and the fixed mirror 23 were arrange | positioned facing in the same horizontal plane, it is not limited to this, For example, as shown in FIG. ) And the fixed mirror 42 constituting the reference mirror may be disposed at positions of different heights in parallel with each other. In the interferometer of this FIG. 7, the fixed mirror 42 is attached to the barrel part of a projection optical system, for example. Further, the half mirror 44 is fixed to the XZ plane at an angle of 45 degrees on the beam splitter stage 6 on which the polarization beam splitter 21 is mounted. Further, a total reflection mirror 45 is formed on the reflection optical path by the polarization beam splitter 21 to reflect the V component reflected by the polarization beam splitter 21 toward the moving mirror 22. The total reflection mirror 45 is configured to move in the X axis direction integrally with the polarizing beam splitter 21 and the half mirror 44 on the beam splitter stage 6.

The modification of FIG. 7 is shown again in FIG. 8 differs in the configuration example shown in FIG. 8 in that the position of the receiver 42 is changed using the reflecting mirrors 44a and 44b and the quarter wave plates 24 and 25 are used. . The whole optical system enclosed by the dashed lines lies on a movable member such as a stage not shown, and is moved at V2 (for example, V / 2) with respect to the speed V1 of the movable stage.

When the laser interferometer of Fig. 7 or 8 is combined with the exposure apparatus, the same effects as those of the first embodiment described above can be obtained.

In each of the above embodiments, a case has been described in which the laser interferometer according to the present invention is applied to a scanning type exposure apparatus for liquid crystal. However, the present invention is not limited to this. It can be preferably applied to an exposure apparatus such as a miti aligner, and an apparatus having other one-dimensional moving stages. The present invention can also be applied to an exposure apparatus having a plurality of projection optical systems (multi lenses) as an exposure apparatus for forming a liquid crystal display panel.

In addition, even if the laser interferometer according to the present invention is applied to an XY two-dimensional moving stage, by using a reflector shorter than the overall stage length, the position of the laser interferometer in the direction orthogonal to the longest stroke direction in the entire stroke range longer than the stage overall length is increased. It can be detected with accuracy. In this sense, the present invention can also be applied to a wafer stage position measuring device such as a stepper. In addition, the plate as a board | substrate can be used as the glass substrate for masks used for the exposure apparatus as well as the board | substrate for liquid crystals.

As described above, according to the laser interferometer, the position measuring device, and the position measuring method according to the present invention, by using a reflector shorter than the total length of the movable body, it is orthogonal to the long stroke direction in the entire region of the moving stroke longer than the total length of the movable body. There is an excellent effect that can measure the position of the direction. The exposure apparatus according to the present invention has the effect that the position of the storage can be controlled with high precision even when the substrate is enlarged. The manufacturing method of the present invention is a preferred method for manufacturing the novel laser interferometer, position measuring device and exposure device according to the present invention.

Claims (57)

A laser interferometer for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using a laser beam, A separation optical system that separates the laser beam into a measurement beam and a reference beam; A moving mirror attached to a moving body, the moving mirror reflecting a measuring beam; A reference mirror provided independently of a moving object, the reference mirror reflecting a reference beam; A moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the moving object; And And a detector for detecting the measurement beam reflected from the moving mirror and the reference beam reflected from the reference mirror and obtaining a position in the first direction of the moving body based on the interference effect of those beams. The method of claim 1, And the moving device moves the reference mirror together with the separation optical system. The method of claim 1, Further provided with a fixed diameter, A laser interferometer, wherein a fixed mirror is arranged to allow a measurement beam to pass between a moving mirror and a fixed mirror. The method of claim 1, And the moving speed of the separation optical system is slower than the moving speed of the moving mirror. The method of claim 3, wherein The moving mirror has a reflecting surface of length L1 extending in the second direction, The fixed diameter has a reflective surface of length L2 extending in the second direction, When the moving speed in the second direction of the moving object is V1 and the moving speed in the second direction of the separation optical system is V2, A laser interferometer, in which a relation of (L1 + L2) / V1 = L2 / V2 holds. The method of claim 1, The separation optical system is a beam splitter, A laser interferometer, wherein the measuring beam and the reference beam are s polarization and p polarization, respectively, separated by a beam splitter. The method of claim 1, A laser interferometer, wherein the reference diameter comprises a corner cube. A position measuring device for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction by using light from a light source, A separation optical system that separates light from the light source into a measurement beam and a reference beam; A movable mirror attached to the movable body, the movable mirror reflecting a measurement beam; A fixed diameter provided independently of the moving body, the fixed diameter forming a part of the optical path of the measuring beam between the moving diameter; A moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the moving object; And And a detection system that detects the measurement beam and the reference beam and obtains a position in the first direction of the moving body based on the interference effect of those beams. The method of claim 8, And a reference mirror for reflecting a reference beam toward the detection system. The method of claim 9, And the reference mirror is disposed to face the detection system with the separation optical system therebetween. The method of claim 10, And the fixing mirror is disposed to face the moving mirror with the separation optical system therebetween. The method of claim 11, A position measuring device, wherein, when the moving body moves, a change in the optical path length between the moving mirror and the fixed mirror is obtained by a detection system. The method of claim 8, And the moving speed of the separation optical system is slower than the moving speed of the moving mirror. The method of claim 8, The movable mirror has a reflective surface of length L1 extending in the second direction, The fixed diameter has a reflective surface of length L2 extending in the second direction, When the moving speed in the second direction of the moving object is V1 and the moving speed in the second direction of the separation optical system is V2, Position measuring device which holds the relation (L1 + L2) / V1 = L2 / V2. The method of claim 8, The separation optical system is a beam splitter, Wherein the measuring beam and the reference beam are s-polarized and p-polarized light, each separated by a beam splitter. The method of claim 9, The moving device is a moving stage having a separation optical system disposed thereon, A position measuring device, wherein a reference diameter is disposed on the moving stage. The method of claim 8, And a phase adjusting optical system disposed between the moving mirror and the separating optical system and between the fixed mirror and the separating optical system, respectively. The method of claim 8, The moving mirror is formed so as to extend in the first direction. An exposure apparatus for transferring a pattern formed on a mask onto a substrate, A mask stage supporting the mask and moving in a second direction; A substrate stage supporting the substrate and moving in a second direction; And A laser interferometer for measuring a position in a first direction orthogonal to a second direction of at least one stage using a laser beam, The laser interferometer, A separation optical system that separates the laser beam into a measurement beam and a reference beam; A moving mirror attached to the at least one stage, the moving mirror reflecting a measurement beam; A reference mirror provided independently of the at least one stage, the reference mirror reflecting a reference beam; A moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one stage; And And a detector for detecting the measurement beam reflected from the moving mirror and the reference beam reflected from the reference mirror to obtain a position in the first direction of the at least one stage based on the interference effect of those beams. The method of claim 19, And the moving device moves the reference mirror together with a separate optical system. The method of claim 19, Further provided with a fixed diameter, An exposure apparatus in which a fixed mirror is disposed so that a measuring beam passes between a moving mirror and a fixed mirror. The method of claim 21, The movable mirror has a reflective surface of length L1 extending in the second direction, The fixed diameter has a reflective surface of length L2 extending in the second direction, When the moving speed in the second direction of the at least one stage is V1 and the moving speed in the second direction of the separation optical system is V2, An exposure apparatus in which a relational expression of (L1 + L2) / V1 = L2 / V2 holds. The method of claim 19, The separation optical system is a beam splitter, An exposure apparatus, wherein the measuring beam and the reference beam are s-polarized light and p-polarized light, respectively, separated by a beam splitter. The method of claim 19, An exposure apparatus, wherein the reference diameter is a corner cube. The method of claim 19, And the moving mirror has a first moving mirror attached to the mask stage and a second moving mirror attached to the substrate stage. The method of claim 19, Further comprising a carriage and a projection optical system for mounting the mask stage and the substrate stage, The carriage moves the mask stage and the substrate stage with respect to the projection optical system. An exposure apparatus for transferring a pattern formed on a mask onto a substrate, A mask stage supporting the mask and moving in a second direction; A substrate stage supporting the substrate and moving in a second direction; And A position measuring device for measuring a position in a first direction orthogonal to a second direction of at least one stage using a light beam, The position measuring device, A separation optical system that separates the light beam into a measurement beam and a reference beam; A moving mirror attached to the at least one stage, the moving mirror reflecting a measurement beam; A fixed mirror provided independently of said at least one stage, said fixed mirror forming a part of the optical path of the measurement beam between said moving mirror; A moving device for moving the split optical system in a second direction at a speed different from the moving speed of the at least one stage; And And a detection system that detects the measurement beam and the reference beam and obtains a position in the first direction of the at least one stage based on the interference effects of those beams. The method of claim 27, And a reference mirror for reflecting the reference beam toward the detection system. The method of claim 28, And the reference mirror is disposed to face the detection system with the separation optical system therebetween. The method of claim 29, And the fixing mirror is disposed to face the moving mirror with the separation optical system interposed therebetween. The method of claim 27, The exposure apparatus in which the fluctuation of the optical path length between the moving mirror and the fixed mirror is obtained by the detection system when the at least one stage moves. The method of claim 27, The movable mirror has a reflective surface of length L1 extending in the second direction, The fixed diameter has a reflective surface of length L2 extending in the second direction, When the moving speed in the second direction of the at least one stage is V1 and the moving speed in the second direction of the separation optical system is V2, An exposure apparatus in which a relational expression of (L1 + L2) / V1 = L2 / V2 holds. The method of claim 27, The separation optical system is a beam splitter, An exposure apparatus in which the measuring beam and the reference beam are p polarized light and s polarized light, respectively, separated by a beam splitter. The method of claim 28, The moving device is a moving stage in which a separation optical system is disposed thereon, An exposure apparatus in which a reference mirror is arranged on this moving stage. The method of claim 27, And a phase adjusting optical system disposed between the moving mirror and the separating optical system and between the fixed mirror and the separating optical system, respectively. The method of claim 27, And the moving mirror has a first moving mirror attached to the mask stage and a second moving mirror attached to the substrate stage. The method of claim 27, Further comprising a carriage and a projection optical system mounted on the mask stage and the substrate stage, The carriage moves the mask stage and the substrate stage with respect to the projection optical system. A position measuring method of measuring a position in a first direction orthogonal to a second direction of a moving body by using an interference effect by irradiating a laser beam to a fixed mirror and a moving mirror attached to the moving body moving in a second direction, Splitting the laser beam into a measurement beam and a reference beam, The measuring beam is irradiated to the moving mirror while moving in the second direction at a speed different from that of the moving body, and the reflected light from the moving mirror passes between the moving mirror and the fixed mirror, A position measuring method comprising obtaining a position in a first direction of a moving object by comparing a phase of a measuring beam passed between a moving mirror and a fixed mirror with a phase of a reference beam. The method of claim 38, And the optical path of the measurement beam comprises the optical path of the reference beam. The method of claim 38, The movable mirror has a reflective surface of length L1 extending in the second direction, The fixed diameter has a reflective surface of length L2 extending in the second direction, When the moving speed in the second direction of the moving object is V1 and the moving speed in the second direction of the separation optical system is V2, A position measuring method in which a relation of (L1 + L2) / V1 = L2 / V2 is established. The method of claim 38, And moving the measuring beam in the second direction at a speed different from that of the moving object by moving the beam splitter dividing the laser beam into the measuring beam and the reference beam at a different speed from the moving object in the second direction. The method of claim 38, And a measuring beam and a reference beam are merged after the measuring beam is irradiated to the moving mirror to reflect toward the fixed mirror. A method of manufacturing a laser interferometer for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using a laser beam, Providing a separation optical system for separating the laser beam into a measurement beam and a reference beam, A moving mirror reflecting the measuring beam is provided on the moving object, As a reference mirror provided independent of the moving object, providing a reference mirror reflecting the reference beam, Providing a moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the moving object, And a detector for detecting the measurement beam reflected from the moving mirror and the reference beam reflected from the reference mirror to obtain a position in the first direction of the moving body based on the interference effect of those beams. The method of claim 43, The moving device is a moving stage, The manufacturing method of a laser interferometer which provides a separation optical system on a moving stage. The method of claim 44, A method for manufacturing a laser interferometer, wherein the reference mirror is provided on the moving stage. The method of claim 43, And providing a laser light source for irradiating laser light to the separation optical system. A manufacturing method of a position measuring device for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using light from a light source, Providing a separation optical system for separating light from the light source into a measurement beam and a reference beam, A moving mirror reflecting the measuring beam is provided on the moving object, Providing a fixing mirror which forms a part of the optical path of the measuring beam between the moving mirror and It provides a moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the moving object, And providing a detection system for detecting the measurement beams and the reference beams and obtaining a position in the first direction of the moving body based on the interference effect of those beams. The method of claim 47, A method of manufacturing a position measuring device further comprising providing a reference mirror for reflecting the reference beam toward the detection system. 49. The method of claim 48 wherein And the reference mirror is provided to face the detection system with the separation optical system therebetween. The method of claim 49, And the fixing mirror is disposed so as to face the moving mirror with the separation optical system therebetween. A manufacturing method of an exposure apparatus for transferring a pattern formed on a mask onto a substrate, Providing a mask stage that supports the mask and moves in a second direction, Providing a substrate stage that supports the substrate and moves in a second direction, Providing a separation optical system for separating the laser beam into a measurement beam and a reference beam, A moving mirror reflecting the measurement beam is provided on at least one of the mask stage and the substrate stage, Providing a reference mirror reflecting the reference beam, Providing a moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one stage; And detecting a measurement beam reflected from the moving mirror and a reference beam reflected from the reference mirror and providing a detector for obtaining a position in the first direction of the at least one stage based on the interference effect of those beams. Method of manufacturing the device. The method of claim 51, wherein A method of manufacturing an exposure apparatus, further comprising: providing a fixed mirror to allow a measurement beam to pass between the movable mirror and the fixed mirror. A manufacturing method of an exposure apparatus for transferring a pattern formed on a mask onto a substrate, Providing a mask stage that supports the mask and moves in a second direction, Providing a substrate stage that supports the substrate and moves in a second direction, Providing a separation optical system for separating the laser beam into a measurement beam and a reference beam, Providing a moving mirror reflecting the measurement beam to at least one of the mask stage and the substrate stage, Providing a fixing mirror which forms a part of the optical path of the measuring beam between the moving mirror and Providing a moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one stage; And a detection system for detecting the measurement beam and the reference beam and finding a position in the first direction of the at least one stage based on the interference effects of those beams. The method of claim 53 wherein And providing a reference mirror for reflecting a reference beam toward the detection system. The method of claim 54, wherein And the reference mirror is provided so as to face the detection system with the separation optical system therebetween. The method of claim 55, And the fixing mirror is provided so as to face the moving mirror with the separation optical system interposed therebetween. A position measuring device for measuring a position in a first direction orthogonal to a second direction of a moving body moving in a second direction using a light beam from a light source, A movable mirror attached to the movable body and a fixed mirror separately installed from the movable body; An optical system for dividing a light beam from a light source and directing the light beam to a moving mirror and a fixed mirror, respectively; A moving device for moving the optical system in a second direction at a speed different from the moving speed of the moving body; And And a detector which detects the reflected light beams from the moving mirror and the fixed mirror and obtains a position in the first direction of the moving body based on the interference effect of those beams.

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