CN103376343A - Electronic gun system capable of moving inter-electrode distances for high current electron beam analysis meter - Google Patents
Electronic gun system capable of moving inter-electrode distances for high current electron beam analysis meter Download PDFInfo
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- CN103376343A CN103376343A CN2012101325726A CN201210132572A CN103376343A CN 103376343 A CN103376343 A CN 103376343A CN 2012101325726 A CN2012101325726 A CN 2012101325726A CN 201210132572 A CN201210132572 A CN 201210132572A CN 103376343 A CN103376343 A CN 103376343A
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Abstract
The invention discloses an electronic gun system capable of moving inter-electrode distances for a high current electron beam analysis meter. The electronic gun system capable of moving the inter-electrode distances for the high current electron beam analysis meter comprises a main vacuum chamber and an electronic gun located in the main vacuum chamber, and the main vacuum chamber is arranged in a transverse horizontal mode. The electronic gun system further comprises a concentric shaft component, the concentric shaft component is horizontally inserted into the main vacuum chamber from the rear end of the main vacuum chamber, one end of the concentric shaft component is located in the main vacuum chamber, and the other end of the concentric shaft component extends out of the main vacuum chamber. The electronic gun comprises a positive electrode, a negative electrode and a grid electrode, and the negative electrode and the grid electrode are mounted on the concentric shaft component. According to the electronic gun system capable of moving the inter-electrode distances for the high current electron beam analysis meter, independent adjustment of the distances among all the electrodes of the high current electron electronic gun system in a hot test process can be realized, optimum electronic gun system geometrical parameters can be obtained through optimal experiments, and compared with a current electronic gun system of an analysis meter, the electronic gun system can save time, manpower and material resources by hundred times. The electronic gun system capable of moving the inter-electrode distances for the high current electron beam analysis meter can be charged to 100kV, and can be connected to and used in a large-scale high current electron beam analysis meter in a transverse mode.
Description
Technical field
The invention belongs to analysis and the field of measuring technique of microwave vacuum device electro-optic structure, be specifically related to a kind of experimental apparatus, particularly a kind of removable die opening electron gun system for high current electron beam analyser of the analysis for microwave vacuum device electro-optic structure.
Background technology
Microwave device refers to be operated in the device of microwave region (300～30000 megahertz).Microwave device is by different microwave electron tube, microwave semiconductor device, microwave integrated circuit and the Microwave Power Modules of being divided into of its principle of work and power, material therefor and technique.The microwave electron tube comprises klystron, travelling-wave tube, magnetron, carcinotron, convolution visitor, Virtual Cathode Oscillators etc., and it utilizes electronics to move in a vacuum and produces the various functions such as vibration, amplification, mixing with the peripheral circuit interaction.High current electron beam the Electron-Optics Analysis instrument is for the great significance for design of microwave electron tube, and the electron gun system of this analyser is its important component part.
Fig. 1 is traditional part-structure figure that is used for the high current electron beam the Electron-Optics Analysis instrument of microwave electron tube.As seen from Figure 1, described high current electron stream the Electron-Optics Analysis instrument comprises electron gun system 1, and electron gun system 1 is for generation of the high current electron beam, and incides electron drift pipe 2.And electron gun system 1 and electron drift pipe 2 are vertical setting setting, and electron drift pipe 2 is installed in the top of electron gun system 1, and electron gun system 1 is to top emission high current electron beam.
As shown in Figure 2, electron gun system 1 comprises electron gun, main vacuum cavity, pumped vacuum systems, external tapping, high-voltage feedback power head, heater, ceramic ring, cathode heater lead-in wire etc.Electron gun comprises grid, negative electrode, anode, and ceramic ring is fixed on the bottom of main vacuum chamber with negative electrode, heater, grid, and makes it to insulate with the locular wall of main vacuum chamber.The cathode heater lead-in wire is drawn main vacuum cavity by the high-voltage feedback power head of main vacuum cavity bottom, and grid and negative electrode are idiostatic structures.The high-voltage feedback power head only can withstand voltage 10kV about; Anode head component is to be placed on another large ring flange at main vacuum cavity top.Negative electrode Zhiyang pole span from, grid to cathode distance is all fixed, and is supported by the transition of negative electrode, grid that the length of ring determines.
The shortcoming of traditional electron gun system is:
One, the anode-cathode distance that change any one electrode all must stop to test wait and ressemble the transition member that is fit to length under heat survey state.This process will reach more than three days, need to devote considerable time human and material resources and will finish the test of optimizing the electron gun system electro-optical performance;
They are two years old, it can not access large-scale high current electron beam the Electron-Optics Analysis instrument as parts, directly on it, assemble again large-scale electromagnetic focusing system and electron beam energy-dispersive analysis system just is difficult to realize, so that high current electron beam the Electron-Optics Analysis instrument does not for a long time carry out all to the electron beam transmission performance of electron beam in the electromagnetic focusing situation, the analysis that can fall apart;
They are three years old, because original electron beam analyser can only use under the condition below the modulator high pressure 10kV, and the development of novel large power microwave vacuum device is all to high voltage, high power future development, old like this analyzer just can not be simulated the state that 20-100kV left and right sides electron beam has obvious relativistic effect, the authenticity of its simulation is just had a greatly reduced quality, and just has a strong impact on the quality of electro-optic structure (comprising electron gun system) designed reliability and microwave vacuum device.
Summary of the invention
The technical matters that (one) will solve
Technical matters to be solved by this invention is to remedy traditional use vertically to erect fixedly above-mentioned three defectives of the high current electron beam the Electron-Optics Analysis instrument of electron gun system, changes the electrode separation difficulty, time and effort consuming that is:; Can not be as sink analyser as the large-scale high current electron beam electronic light of parts access; Can not simulate the high current electron beam of 20～100kV.
(2) technical scheme
For solving the problems of the technologies described above, the present invention proposes a kind of electron gun system for high current electron beam analyser, comprise a main vacuum cavity and the electron gun that is positioned at this main vacuum cavity, described main vacuum cavity transverse horizontal is settled, and comprising in the horizontal direction a front end and a rear end, the high current electron beam that described electron gun produces is from the described rear end of described main vacuum cavity to described front end emission.
According to a specific embodiment of the present invention, described electron gun system also comprises a concentric shafts assembly, and its rear end level from described main vacuum cavity is inserted, and the one end is positioned at described main vacuum cavity, and the other end extends outside the described main vacuum cavity.
Described electron gun comprises an anode, a negative electrode and a grid, and described negative electrode and described grid are installed on the described concentric shafts assembly.
According to a specific embodiment of the present invention, described anode is fixed in the front end of described main vacuum cavity by an anode stationary installation.
According to a specific embodiment of the present invention, described concentric shafts assembly can make respectively axially the moving and locating along the concentric shafts assembly of described negative electrode and described grid.
According to a specific embodiment of the present invention, described main vacuum cavity comprises a view window, and it is used for observing and measuring the distance of described negative electrode and grid.
According to a specific embodiment of the present invention, described concentric shafts assembly comprises concentric shafts and the outer concentric shafts of grid in the negative electrode, is nested inside and outside the outer concentric shafts of concentric shafts and described grid in the described negative electrode.
According to a specific embodiment of the present invention, concentric shafts is positioned at an end of main vacuum cavity in the described negative electrode, is used for settling described negative electrode; The outer concentric shafts of described grid is positioned at an end of main vacuum cavity, is used for settling described grid.
According to a specific embodiment of the present invention, described negative electrode is fixed in concentric shafts in the negative electrode by a negative electrode ceramic ring, and described grid is fixed on the outer concentric shafts of grid by a grid ceramic ring.
According to a specific embodiment of the present invention, described electron gun system also comprises an optical table, and described optical table is positioned at the outside of described main vacuum cavity, and is positioned at the below of described concentric shafts assembly, is used for supporting and locating described concentric shafts assembly.
According to a specific embodiment of the present invention, this optical table comprises negative electrode optical table and grid optical table, it is respectively applied to support concentric shafts and the outer concentric shafts of grid in the described negative electrode, and make it axially to move horizontally respectively, and described negative electrode optical table is installed on the described grid optical table.
(3) beneficial effect
One, electron gun system of the present invention go for dissimilar high current electron beam the Electron-Optics Analysis instrument, so versatility of the present invention is wide;
They are two years old, electron gun system of the present invention adopts transversary except independent use, can also access large-sized transversal high current electron beam analyser further to the electron beam formation of electron gun system as parts, transmission course is carried out global test, and can test the electron beam energy distribution;
Its three, electron gun system of the present invention can reach 1 * 10
-6Pa condition of high vacuum degree, and testing under ten thousand volts of high voltage modulator voltages of several hectovolts to ten can detect in the present development microwave vacuum device relativistic effect to the situation that affects of electron beam performance;
They are four years old, the present invention can realize distance independent regulation in heat survey process between each electrode of high current electron gun system, can obtain optimized electronic gun system geometric parameter by the Optimal Experimental design, this becomes than present analysis device electron gun system, and save time in hundred times of ground, human and material resources;
Its five, the electro-optical performance defective that the present invention can exist some microwave vacuum device of producing and the process structure problem of unstable properties carry out that heat is surveyed experiment and dynamic system is simulated, so that definite solution and measures.
Description of drawings
Fig. 1 is the part-structure synoptic diagram of traditional high current electron beam the Electron-Optics Analysis instrument;
Fig. 2 is the electron gun system synoptic diagram of traditional high current electron beam the Electron-Optics Analysis instrument;
Fig. 3 is the structural representation of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 4 is that synoptic diagram is looked on the left side of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 5 is the synoptic diagram of concentric shafts assembly of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 6 is the local enlarged diagram of concentric shafts assembly of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention;
Fig. 7 is the local enlarged diagram of anode stationary installation of the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention.
Description of reference numerals in Fig. 3～7 is as follows:
1. view window, 2. high-voltage feedback power system, 3. high-vacuum exhaust system, 4. concentric shafts in the negative electrode, 5. outer concentric shafts, the 6. large ring flange of rear port of grid, 7. anode, 8. negative electrode, 9. grid, 10. negative electrode ceramic ring, 11. grid ceramic rings, 12. front large ring flanges, 13. the negative electrode optical table, concentric shafts servomotor in the 14. grid optical tables, 15. negative electrodes, 16. the outer concentric shafts motion servo motor of grid, 17. low voltage feeder heads, 18. front ports, 19. the anodized insulation ceramic ring, 20. 3 extra-high voltage feed heads, 21. 4 extra-high voltage feed heads, 22. high vacuum valve, 23. vacuum pipes, 24. mechanical pumps, 25. molecular pump, 26. ionic pump, 301. main vacuum cavities, 302. concentric shafts assemblies, 303. anode stationary installation, 304. support, 305. optical tables, 306. external tappings.
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in further detail.
Fig. 3 is the structural representation of electron gun system of the high current electron beam the Electron-Optics Analysis instrument of one embodiment of the present of invention, Fig. 4 is that synoptic diagram is looked on the left side of this electron gun system, Fig. 5 is the synoptic diagram of the concentric shafts assembly of this electron gun system, Fig. 6 is the local enlarged diagram of the concentric shafts assembly of this electron gun system, and Fig. 7 is the local enlarged diagram of the anode stationary installation of this electron gun system.
By Fig. 3～7 as seen, the electron gun system of high current electron beam the Electron-Optics Analysis instrument of the present invention comprises a main vacuum cavity 301 and is positioned at the electron gun of main vacuum cavity 301, described main vacuum cavity 301 is circular cylindrical cavities, and transverse horizontal is settled, the two ends in the horizontal direction of circular cylindrical cavity are called front-end and back-end, in Fig. 3, left part is front end, and right part is the rear end.Described concentric shafts assembly 302 inserts from the rear end level of described main vacuum cavity 301, and the axle center of concentric shafts assembly 302 is concentric with the axle center of main vacuum cavity 301.
According to the present invention, the front end of main vacuum cavity 301 comprises an anode 7, and described anode 7 is fixed in the front end of described main vacuum cavity by an anode stationary installation 303.
According to the present invention, described main vacuum cavity 301 comprises a view window 1, and it is used for observing and measuring the distance of described negative electrode 8 and grid 9.
Described main vacuum cavity 301 inside also comprise a high-voltage feedback power device 2, according to a preferred embodiment of the present invention, its by two three utmost points or four extremely the high-voltage feedback power head of the voltage of anti-high frequency modulated the (for example 100kV) form.
In addition, the inwall of described main vacuum cavity 301 also is provided with circulating water cooling system, and it is used for electron gun system is carried out temperature control, and is overheated when making it not in working order.
Described main vacuum cavity 301 also comprises a front port 18, and it is used for linking to each other with measurement or the analytic system of electron gun system outside, and it is positioned at the front end of described main vacuum cavity 301.
Described main vacuum cavity 301 also comprises a large ring flange 12 of front port, and it is used for described anode stationary installation 303 is fixed on the front end of described main vacuum cavity 301.
The true cavity 301 of described master also comprises a large ring flange 6 of rear port, but it is used for described concentric shafts assembly 302 horizontal axis are fixed in movably the rear end of described main vacuum cavity 301.
At described concentric shafts assembly 302 negative electrode 8 and a grid 9 are installed, described anode 7, negative electrode 8, grid 9 consist of electron gun, for generation of the high current electron beam, and the forward end emission.According to the present invention, described concentric shafts assembly 302 can make respectively axially the moving and locating along concentric shafts assembly 302 of negative electrode 8 and grid 9.
Specifically, described concentric shafts assembly 302 comprises concentric shafts 4 in the negative electrode, the outer concentric shafts 5 of grid.Be nested inside and outside the outer concentric shafts 5 of concentric shafts 4 and grid in the described negative electrode, namely such as Fig. 3 and shown in Figure 5, the outer concentric shafts 5 of grid is enclosed within the outside of concentric shafts 4 in the negative electrode.The outer concentric shafts 5 of concentric shafts 4 and grid all has two ends in the horizontal direction in the described negative electrode as previously mentioned, and an end inserts in the described main vacuum cavity 301, the other end extends outside the described main vacuum cavity, and the end that concentric shafts 4 is positioned at main vacuum cavity 301 in the described negative electrode is for settling described negative electrode 8, and the end that the outer concentric shafts 5 of described grid is positioned at main vacuum cavity 301 is used for settling described grid 9.
Use the high vacuum wavy metal seal of tube between the large ring flange 6 of described rear port of the outer concentric shafts 5 of described grid and described main vacuum cavity 301, also use the high vacuum wavy metal seal of tube between the outer concentric shafts 5 of concentric shafts 4 and described grid in the described negative electrode.
According to a preferred embodiment of the present invention, described negative electrode 8 is fixed in an end of concentric shafts 4 in the negative electrode by a negative electrode ceramic ring 10; Described grid 9 is fixed on an end of the outer concentric shafts 5 of grid by a grid ceramic ring 11.Described negative electrode 8 and grid 9 all are connected on the respective electrode of high-voltage feedback power device of described main vacuum cavity 301 by lead-in wire, and described lead-in wire periphery all is coated with the vacuum ceramic material.The external diameter of described grid ceramic ring 11 is greater than described negative electrode ceramic ring 10, and two vacuum ceramic rings can both withstand voltage high pressure (for example 100kV).
Described anode stationary installation 303 is used for anode 7 is fixed on with insulating the device of the front end inboard of described main vacuum cavity 301.According to the present invention, as shown in Figure 5, anode stationary installation 303 comprises anodized insulation ceramic ring 19, and it is used for anode 7 and front large ring flange 12 insulation.In addition, by string the vacuum wire of little vacuum ceramic pipe is arranged, and by low voltage feeder head 17 anode 7 is drawn from main vacuum chamber.
Electron gun system of the present invention also comprises an optical table 305, and described optical table 305 is positioned at the outside of described main vacuum cavity 301, and is positioned at the below of described concentric shafts assembly 302, is used for supporting and locating described concentric shafts assembly 302.This optical table 305 comprises negative electrode optical table 13 and grid optical table 14, and it is respectively applied to support concentric shafts 4 and the outer concentric shafts 5 of grid in the described negative electrode, and makes it can axially move horizontally respectively.
Wherein, described negative electrode optical table 13 is installed on the described grid optical table 14, negative electrode optical table 13 comprises concentric shafts servomotor 15 in the negative electrode, grid optical table 14 comprises the outer concentric shafts servomotor 16 of grid, and the outer concentric shafts servomotor 16 of concentric shafts servomotor 15 and grid lays respectively on described negative electrode optical table 13 and the described grid optical table 14 in the negative electrode.
Moving horizontally by concentric shafts servomotor 15, the outer concentric shafts servomotor 16 of grid in the negative electrode of described optical table 305 of the outer concentric shafts 5 of concentric shafts 4 and grid controlled respectively in the described negative electrode, according to preferred implementation of the present invention, the precision of its running fix is 0.05 millimeter.
In addition, according to electron gun system of the present invention Bao Shouyi support also, it is positioned at the below of described main vacuum cavity 301 and described optical table 305, and is used for supporting described main vacuum cavity 301 and described optical table 305.
Described electron gun system also comprises a high-vacuum exhaust system 3, and it is connected in described main vacuum cavity, and is used for described main vacuum cavity 301 is vacuumized.According to a preferred embodiment of the present invention, it is comprised of mechanical pump 24, molecular pump 25, ionic pump 26, high vacuum gate 22 and high vacuum pipe 23;
The one-piece construction of electron gun system of high current electron beam the Electron-Optics Analysis instrument of one embodiment of the present of invention and the concrete structure of parts thereof have more than been described, the below also illustrates according to said structure and is beneficial to the principle of work of the electron gun system of this embodiment of the present invention those skilled in the art and more is expressly understood the present invention.
According to the abovementioned embodiments of the present invention, external tapping 306 connecting electronic drift tubes and electron beam cross section X ray bremstrahlen detecting device at the electron gun system of high current electron beam the Electron-Optics Analysis instrument, perhaps three-dimensional Faraday cylinder aperture scanner, and after carrying out sealed vacuum, start high vacuum exhausting apparatus 3, make the vacuum tightness of main vacuum cavity 301 reach 1 * 10
-6Behind the pa order of magnitude, give negative electrode 8 heating, make it progressively to be added to the rated temperature value;
Then, measure negative electrode 8, the swell increment of grid 9 after thermal expansion is stable by the view window 1 of described main vacuum cavity 301 first, by the outer concentric shafts servomotor 16 of grid of concentric shafts servomotor 15, the outer concentric shafts 5 of grid in the negative electrode of concentric shafts in the control cathode 4 negative electrode 8 and distance, the negative electrode 8 of anode 7 are adjusted with the distance of grid 9 again, made it to reach former Computer Design value or desirable design load.In this embodiment, adjust the range accuracy of location at 0.05 millimeter.
Then, will modulate by the high-voltage feedback power head and receive on the grid 9 after the monopulse negative high voltage is received respectively negative electrode 8 and corresponding dividing potential drop; Detect electron beam electro-optical performance this moment by described X ray bremstrahlen detecting device or three-dimensional Faraday cylinder aperture scanister, make many group results by adjustment Anode-cathode Distance, grid cathode distance, find out again best experiment size under this state, the structure that further changes on this basis electron gun is optimized experiment, the electron gun that is optimized and electron-optical system optimal design structure.
Advantage of the present invention is: above-mentioned whole process than the vertical setting of traditional use fixedly the high current electron beam the Electron-Optics Analysis instrument of electron gun system become hundred, on save time thousandfold, human and material resources.
The present invention can be used as parts from the dynamic high current electron beam of described external tapping 306 access large-sized transversal high vacuum the Electron-Optics Analysis instrument, has electromagnetic focusing system and the electron beam detection system of faling apart to go to measure the transmission performance of high current electron beam and the electron beam characteristic of faling apart; Electron-optical system design when the present invention can use modulation high frequency or monopulse voltage can have obvious relativistic effect to affect from ten thousand volts of several hectovolts to ten; These be traditional use vertically fixedly electron gun system high current electron beam the Electron-Optics Analysis device can't accomplish.
Above-described specific embodiment; purpose of the present invention, technical scheme and beneficial effect are further described; be understood that; the above only is specific embodiments of the invention; be not limited to the present invention; within the spirit and principles in the present invention all, any modification of making, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. electron gun system that is used for high current electron beam analyser, comprise a main vacuum cavity (301) and be positioned at the electron gun of this main vacuum cavity (301), described electron gun comprises an anode (7), a negative electrode (8) and a grid (9), described main vacuum cavity (301) comprises that one is used for described anode (7) is drawn the outer low voltage feeder head (17) of described main vacuum cavity (301), is characterized in that:
Described main vacuum cavity (301) transverse horizontal is settled;
Described electron gun system also comprises a concentric shafts assembly (302), its level is inserted described main vacuum cavity (301), and the one end is positioned at described main vacuum cavity (301), and the other end extends outside the described main vacuum cavity (301); And
Described negative electrode (8) and described grid (9) are installed on the described concentric shafts assembly (302).
2. the electron gun system of high current electron beam analyser as claimed in claim 1 is characterized in that, the vacuum tightness of described main vacuum cavity (301) is 1 * 10
-6Pa.
3. the electron gun system for high current electron beam analyser as claimed in claim 2 is characterized in that, described anode (7) is fixed in the front end of described main vacuum cavity (301) by an anode stationary installation (303).
4. the electron gun system for high current electron beam analyser as claimed in claim 2, it is characterized in that described concentric shafts assembly (302) is used for making respectively axially the moving and locating along concentric shafts assembly (302) of described negative electrode (8) and described grid (9).
5. the electron gun system for high current electron beam analyser as claimed in claim 4, it is characterized in that, described main vacuum cavity (301) comprises a view window (1), and it is used for observing and measuring the distance of described negative electrode (8) and grid (9).
6. the electron gun system for high current electron beam analyser as claimed in claim 4, it is characterized in that, described concentric shafts assembly (302) comprises concentric shafts (4) and the outer concentric shafts (5) of grid in the negative electrode, is nested inside and outside the outer concentric shafts (5) of concentric shafts (4) and described grid in the described negative electrode.
7. the electron gun system for high current electron beam analyser as claimed in claim 6 is characterized in that, concentric shafts (4) is positioned at an end of main vacuum cavity (301) in the described negative electrode, is used for settling described negative electrode (8); The outer concentric shafts (5) of described grid is positioned at an end of main vacuum cavity (301), is used for settling described grid (9).
8. the electron gun system for high current electron beam analyser as claimed in claim 7, it is characterized in that, described negative electrode (8) is fixed in concentric shafts (4) in the negative electrode by a negative electrode ceramic ring (10), and described grid (9) is fixed on the outer concentric shafts (5) of grid by a grid ceramic ring (11).
9. the electron gun system for high current electron beam analyser as claimed in claim 6, it is characterized in that, described electron gun system also comprises an optical table (305), described optical table (305) is positioned at the outside of described main vacuum cavity (301), and be positioned at the below of described concentric shafts assembly (302), be used for supporting and locating described concentric shafts assembly (302).
10. the electron gun system for high current electron beam analyser as claimed in claim 9, it is characterized in that, this optical table (305) comprises negative electrode optical table (13) and grid optical table (14), it is respectively applied to support concentric shafts (4) and the outer concentric shafts (5) of grid in the described negative electrode, and make it axially to move horizontally respectively, and described negative electrode optical table (13) is installed on the described grid optical table (14).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210132572.6A CN103376343B (en) | 2012-04-28 | 2012-04-28 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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| CN201210132572.6A CN103376343B (en) | 2012-04-28 | 2012-04-28 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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| CN103376343A true CN103376343A (en) | 2013-10-30 |
| CN103376343B CN103376343B (en) | 2015-11-04 |
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| CN201210132572.6A Expired - Fee Related CN103376343B (en) | 2012-04-28 | 2012-04-28 | A kind of removable die opening electron gun system for high current electron beam analyzer |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103760452A (en) * | 2014-02-20 | 2014-04-30 | 中国科学院电子学研究所 | Electronic gun heat measurement system for electron beam analyzer and monitoring and correction method thereof |
| CN104142225A (en) * | 2014-08-06 | 2014-11-12 | 中国科学院电子学研究所 | High current electron beam small-section optical fiber YAG probe detection device |
| CN105977119A (en) * | 2016-07-12 | 2016-09-28 | 电子科技大学 | Method for determining virtual anode position of grid control electron gun |
| CN106770430A (en) * | 2017-01-20 | 2017-05-31 | 中国科学院电子学研究所 | A kind of microwave tube electron gun swell increment measurement apparatus and method |
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| CN1235366A (en) * | 1998-05-09 | 1999-11-17 | Eev有限公司 | Electron gun arrangements |
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| CN1507001A (en) * | 2002-12-09 | 2004-06-23 | 中华映管股份有限公司 | CRT electron gun with gradually reduced electron beam hole size |
| CN2735536Y (en) * | 2004-09-24 | 2005-10-19 | 中国科学院上海应用物理研究所 | Cathode arrangement for strong current electronic gun |
| CN201877391U (en) * | 2010-12-10 | 2011-06-22 | 安徽华东光电技术研究所 | Millimeter wave travelling wave tube electron gun structure |
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| CN1235366A (en) * | 1998-05-09 | 1999-11-17 | Eev有限公司 | Electron gun arrangements |
| US20030214261A1 (en) * | 2002-05-15 | 2003-11-20 | Ji Hyun Kim | Color image display device |
| CN1507001A (en) * | 2002-12-09 | 2004-06-23 | 中华映管股份有限公司 | CRT electron gun with gradually reduced electron beam hole size |
| CN2735536Y (en) * | 2004-09-24 | 2005-10-19 | 中国科学院上海应用物理研究所 | Cathode arrangement for strong current electronic gun |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103760452A (en) * | 2014-02-20 | 2014-04-30 | 中国科学院电子学研究所 | Electronic gun heat measurement system for electron beam analyzer and monitoring and correction method thereof |
| CN104142225A (en) * | 2014-08-06 | 2014-11-12 | 中国科学院电子学研究所 | High current electron beam small-section optical fiber YAG probe detection device |
| CN104142225B (en) * | 2014-08-06 | 2016-11-09 | 中国科学院电子学研究所 | The small area fiber YAG probe detection device of high current electronics note |
| CN105977119A (en) * | 2016-07-12 | 2016-09-28 | 电子科技大学 | Method for determining virtual anode position of grid control electron gun |
| CN106770430A (en) * | 2017-01-20 | 2017-05-31 | 中国科学院电子学研究所 | A kind of microwave tube electron gun swell increment measurement apparatus and method |
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| Publication number | Publication date |
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| CN103376343B (en) | 2015-11-04 |
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