CN103364853A - Black film structure and manufacturing method thereof - Google Patents
Black film structure and manufacturing method thereof Download PDFInfo
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- CN103364853A CN103364853A CN201210141514XA CN201210141514A CN103364853A CN 103364853 A CN103364853 A CN 103364853A CN 201210141514X A CN201210141514X A CN 201210141514XA CN 201210141514 A CN201210141514 A CN 201210141514A CN 103364853 A CN103364853 A CN 103364853A
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- absorbing zone
- light absorbing
- film structure
- thickness
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 238000002310 reflectometry Methods 0.000 claims abstract description 27
- 239000000463 material Substances 0.000 claims description 56
- 238000000034 method Methods 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 9
- 239000011651 chromium Substances 0.000 claims description 9
- 239000011521 glass Substances 0.000 claims description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims description 3
- 238000005137 deposition process Methods 0.000 claims description 3
- 238000005234 chemical deposition Methods 0.000 claims 1
- 238000009713 electroplating Methods 0.000 claims 1
- 238000004062 sedimentation Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 16
- 230000031700 light absorption Effects 0.000 abstract 3
- 238000010586 diagram Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
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Abstract
The invention discloses a black film structure and a manufacturing method thereof, wherein the black film structure is provided with a first light-tight light absorption layer, a light-tight connecting layer is positioned on the first light absorption layer, and a second light absorption layer is positioned on the connecting layer, so that an optical structure for reducing reflectivity is formed. The adjusting layer can adjust the reflectivity of light with each wavelength to reduce the difference of the reflectivity of each wavelength in a visible light section, avoid the phenomenon that the color of the black film structure is reddish or bluish, and increase the uniformity and the color of the black film.
Description
Technical field
The present invention relates to device and decorate the field, particularly a kind of have the optical texture that reduces reflectivity, black film structure and a manufacture method thereof that reduces each wavelength difference in reflectivity of visible light.
Background technology
Many mobile phones, household electrical appliances or picture frame etc. are liked highlighting its stylishness with black mostly now, are worth to increase its technique.Especially with information products for very, for example computing machine, communication product and consumer.For example, for example design of mobile computer housing, camera lens frame, LCD screen housing, TV housing, flat computer and all common this type of mobile phone housing.
At present, the method for dying black such as mobile phone, household electrical appliances or picture frame mostly is japanning, baking vanish or affixes one deck black glued membrane.The distinctive stylishness of wherein bright effect of pitch-dark most shortage, thereby minimizing black.Baking vanish or black glued membrane have been easier to bright effect, and produce more stylishnesss, but baking vanish or black glued membrane easily because of collision or scratch so that color comes off, cause depreciation and reduce its value.Therefore need a kind of nonabradable black film, to keep outward appearance.
Summary of the invention
In view of the prior art problem, the object of the invention just provides a kind of black film structure and manufacture method thereof, to solve existing black film structure easily wearing and tearing and the too high problem of reflectivity.
For reaching above-mentioned purpose, black film structure of the present invention, it comprises:
The first light absorbing zone;
And transparent articulamentum, this articulamentum is positioned on the first light absorbing zone;
The second light absorbing zone with first thickness, this second light absorbing zone is positioned on the articulamentum, and the size of the first thickness and visible reflectance are corresponding relation;
Adjustment layer with second thickness, this adjusts layer and is positioned on the second light absorbing zone, and this adjusts layer can make the otherness of each wavelength reflectivity of visible light diminish;
And base material, this base material is positioned on the adjustment layer or under the first light absorbing zone.
Wherein, black film structure of the present invention is formed by the first light absorbing zone, articulamentum and the second light absorbing zone, has the optical texture that reduces visible reflectance, and the first thickness of the visible reflectance of this optical texture and the second light absorbing zone is corresponding relation.For example, the visible reflectance of this optical texture is directly proportional with the first thickness of the second light absorbing zone.In addition, black film structure of the present invention diminishes the otherness of each wavelength reflectivity of visible light by changing the second thickness of adjusting layer, produces the phenomenon of skew to reduce the black film structure color.This is can so that the reflectivity crest in the visible light section, is avoided producing toward long wavelength shifted or short wavelength's skew, and then be avoided the black film structure color to produce partially red or partially blue phenomenon because change to adjust the second thickness of layer.
Wherein, the material of the first light absorbing zone and the second light absorbing zone can be chromium, titanium or other has low-reflectivity metal, and the second light absorbing zone the first thickness is less than 30nm, and the first thickness is preferably in the interval of 6nm to 16.5nm, the second thickness of adjusting layer is between about 50nm extremely between about 150nm, and the second thickness is preferably 65nm.
Wherein, the adjustment layer is the low-index materials such as Si oxide, nitride or aluminum oxide with the material of articulamentum, and base material is glass, metal or macromolecular material.
Another purpose of the present invention just provides a kind of manufacture method of black film.
The manufacture method of this black film structure comprises the following step: form the first light absorbing zone; Form articulamentum at described the first light absorbing zone; Form the second light absorbing zone with first thickness at described articulamentum, described the first thickness and visible reflectance are corresponding relation.Corresponding relation can be proportional relation.And, forming the adjustment layer with second thickness at described the second light absorbing zone, described adjustment layer diminishes the otherness of each wavelength reflectivity of visible light.Wherein, this base material is positioned on the adjustment layer or under the first light absorbing zone.
Wherein, the first light absorbing zone, articulamentum, the second light absorbing zone and adjustment layer are with sputter, plating, evaporation, chemogenic deposit (Chemical Vapor Deposition, the deposition processs such as CVD), electric pulp vapour deposition (Plasma enhanced Chemical Vapor Deposition, PECVD) or coating form.In addition, the first light absorbing zone and the second light absorbing zone form with chromium, titanium or other low-reflectivity metal.
Wherein, the first thickness of the second light absorbing zone must be less than 30nm, and the first thickness is preferably in 6nm to the 16.5nm interval, and described the second thickness of described adjustment layer is between between the 50nm to 150nm, and described the second thickness is preferably 65nm.
Wherein, the adjustment layer is the low-index materials such as Si oxide, nitride or aluminum oxide with the material of articulamentum, and base material is glass, metal or macromolecular material.
In sum, black film structure of the present invention and manufacture method thereof have following advantage:
(1) by adjusting layer protection black film structure, reduces external wearing and tearing.
(2) by adjusting the otherness of each wavelength reflectivity of layer minimizing visible light, avoid the black film structure color and luster to produce partially red or partially blue phenomenon.
(3) by adjusting the otherness of each wavelength reflectivity of layer minimizing visible light, increase the uniformity coefficient of black film structure.
(4) this black film structure reduces reflectivity by the optical texture that the first light absorbing zone, articulamentum and the second light absorbing zone form, and increases the black hues of black film structure.
Description of drawings
Fig. 1 is black film structure synoptic diagram of the present invention.
Fig. 2 is the optical schematic diagram of black film structure of the present invention.
Fig. 3 is that the first thickness of the present invention's the second light absorbing zone is to visible light average reflectance synoptic diagram.
Fig. 4 is black film structure manufacture method process flow diagram of the present invention.
Fig. 5 is the corresponding relation figure of black film structure visible reflectance of the present invention and visible wavelength.
The element numbers explanation:
1: base material a4: the first reflected light
2: the first light absorbing zone b1: the second refract light
3: articulamentum b2: the second reflected light
4: the second light absorbing zone b3: third reflect light
5: adjust layer c1: fourth reflect light
A: the first thickness c2: the 3rd reflected light
B: the second thickness c3: the 4th reflected light
A1: light d: the 5th refract light
A2: reflected light e: visible reflectance maximum different value
A3: first refractive light
Embodiment
The present invention is further described below in conjunction with accompanying drawing.
See also Fig. 1, it is black film structure synoptic diagram of the present invention.Among the figure, black film structure comprises the first light absorbing zone 2, and this first light absorbing zone 2 produces the bottoming effect.Form articulamentum 3 on this first light absorbing zone 2, form the second light absorbing zone 4 on the articulamentum 3, wherein this articulamentum 3 is in order to connect the first light absorbing zone 2 and the second light absorbing zone 4.Form on the second light absorbing zone 4 and adjust layer 5, in order to produce protective effect, reduce external wearing and tearing.Wherein, the first light absorbing zone 2 and the second light absorbing zone 4 materials are chromium or the titanium of antiradar reflectivity, and articulamentum 3 is the low-index materials such as Si oxide, nitride or aluminum oxide of light-permeable with the material of adjusting layer 5.In addition, black film structure more can comprise base material 1, and this base material 1 is positioned at the first light absorbing zone 2 times, or is positioned on the adjustment layer 5.And when base material 1 was positioned at diverse location, meeting was so that watch black film structure can demonstrate different color and lusters and uniformity coefficient from the direction of adjusting layer 5.In addition, base material 1 material can be metal, glass or macromolecular material etc.
Consult Fig. 3, be the first thickness of the present invention's the second light absorbing zone 4 synoptic diagram to the visible light average reflectance.Such as Fig. 1 and shown in Figure 3, in the present embodiment, the first light absorbing zone 2, articulamentum 3 and the second light absorbing zone 4 form optical texture, and this optical texture can absorb light and reduce light reflectance.Be positioned at the first light absorbing zone 2 times as example take base material 1, the first light absorbing zone 2 that is positioned on the base material 1 is the chromium layer, and the chromium material has good plating rate, compactness and adhesion.The thickness range of this first light absorbing zone 2 is 50nm to 350nm, is more preferred from 75nm to 130nm, is exemplified as 100nm at the first light absorbing zone 2 thickness of present embodiment.The ensemble average reflectivity of the variation in thickness of the first light absorbing zone 2 and black film structure there is no direct relation.In addition, the thickness range of articulamentum 3 can be 50 to 150nm, is more preferred from 70nm to 90nm, and its thickness is 80nm in the present embodiment.In the black film structure of present embodiment, the second light absorbing zone 4 is the chromium layer, and wherein the visible light average reflectance of the first thickness A of this second light absorbing zone 4 and reflected light a2 is corresponding relation.For example, the visible light average reflectance of the first thickness A of this second light absorbing zone 4 and reflected light a2 can be in particular range proportional relation.As shown in Figure 3, when the first thickness A of the second light absorbing zone 4 was 20nm, the visible light average reflectance was 5.96%; When the first thickness A of the second light absorbing zone 4 was 15nm, the visible light average reflectance was 3.48%; When the first thickness A of the second light absorbing zone 4 was 10nm, the visible light average reflectance was 1.52%; When the first thickness A of the second light absorbing zone 4 was 5nm, the visible light average reflectance was 0.94%.In sum, if the first thickness A of the second light absorbing zone 4 is thinner, then the visible light average reflectance is less.If but the first thickness A of the second light absorbing zone 4 is less than 6nm, its visible light average reflectance can rise a little.In addition, better first thickness A of the second light absorbing zone 4 is about between the 6nm to 16.5nm.
Such as Fig. 1 and shown in Figure 5, to adjust layer 5 and be positioned on the second light absorbing zone 4, the second thickness B scope of this adjustment layer 5 is between the 50nm to 150nm.Wherein, when adjusting the second thickness B thickening of layer 5, the reflectivity of the longer red light district of visible wavelength and then increases, and therefore cause reflected light a2 color partially yellow, and visible reflectance maximum different value e also increases.Specifically, when adjusting layer 5 second thickness B greater than 90nm, reflected light a2 color is partially yellow, and visible reflectance maximum different value e will be near 5%.Wherein, adjusting layer 5 preferred thickness is 65nm, and when adjustment layer 5 second thickness B were 65nm, e was less than 1% for the visible reflectance maximum different value.And the black film structure reflection colour is comparatively average, makes the black film structure color can not produce the partially red or partially blue phenomenon of color and luster at the visible light section toward long wavelength shifted or past short wavelength's skew because of the reflectivity crest.In other words, be 65nm when adjusting layer 5 second thickness B, and the second light absorbing zone 4 first thickness A are when being 15nm, visible reflectance maximum different value e is not only less than 1%, and than less without the difference value of adjusting layer 5.The color that black film structure shows can be more even, but color can shoal.
Such as Fig. 1 and shown in Figure 2, produce reflected light a2 and inject the first refractive light a3 that adjusts layer 5 behind the light a1 irradiation black film structure, first refractive light a3 touches the second light absorbing zone 4 rear generation the first reflected light a4 and the second refract light b1, the wherein light failure interference of the first reflected light a4 and reflected light a2 institute corresponding wavelength, the light of absorption reflected light a2 institute corresponding wavelength.
The the second refract light b1 that injects the second light absorbing zone 4 touches articulamentum 3 rear generation the second reflected light b2 and fourth reflect light c1, the second reflected light b2 reflects the second reflected light b2 that produces a plurality of different optical path differences from reflection repeatedly at the second light absorbing zone 4, produce the third reflect light b3 of a plurality of different optical path differences during the second reflected light b2 contact adjusting layer 5 of these a plurality of different optical path differences, the reflected light a2 failure interference of the third reflect light b3 of these a plurality of different optical path differences and institute's corresponding wavelength, the light of absorption reflected light a2 institute corresponding wavelength.
The fourth reflect light c1 that injects articulamentum 3 touches the first light absorbing zone 2 rear generation the 3rd reflected light c2, the 3rd reflected light c2 contacts the second light absorbing zone 4 rear generation the 4th reflected light c3, the the second reflected light b2 that repeatedly reflects a plurality of different optical path differences that produce from reflection in the second light absorbing zone 4 reflects the 5th refract light d of a plurality of different optical path differences in articulamentum 3, the light failure interference of the 5th refract light d of these a plurality of different optical path differences and the 5th refract light d institute corresponding wavelength absorbs the light of the 5th refract light d institute corresponding wavelength.
To sum up, after second thickness B and the first thickness A of the second light absorbing zone 4 of the present invention by change adjusting layer 5, can change black film structure to the reflectivity of each wavelength of visible light.Wherein, the second thickness B system that change to adjust layer 5 can in order to the otherness of the reflectivity of adjusting each wavelength of visible light, make the black film structure reflection ray average.Wherein, the first thickness A system that changes the second light absorbing zone 4 can in order to reduce the reflectivity of each wavelength of visible light, reduce black film structure visible light average reflectance.
Such as Fig. 1 and shown in Figure 4, be positioned at the first light absorbing zone 2 times as example take the base material 1 of black film structure, the manufacture method of black film structure of the present invention comprises the following step:
Step S1 provides base material 1.
Step S2 forms the first light absorbing zone 2 on the result of previous step.
Step S3 forms articulamentum 3 on the result of previous step.
Step S4, formation has the second light absorbing zone 4 of the first thickness A on the result of previous step.
And step S5, formation has the adjustment layer 5 of the second thickness B on the result of previous step.
For instance, manufacture method provides first the base material 1 of metal, glass or macromolecular material in step S1, in step S2, form the first light absorbing zone 2 on base material 1, in step S3, form again articulamentum 3 on the first light absorbing zone 2, in step S4, form again and have the second light absorbing zone 4 of the first thickness A on articulamentum 3, the last adjustment layer 5 that formation has the second thickness B in step S5 forms black film structure of the present invention with this on the second light absorbing zone 4.
In addition, when base material 1 is positioned on the adjustment layer 5, this black film structure manufacture method can be behind step S1, sequentially carry out step S5, step S4, step S3 and step S2 Lift example, first in step S1, provide metal, the base material 1 of glass or macromolecular material, in step S5, form and have the adjustment layer 5 of the second thickness B on base material 1, formation has the second light absorbing zone 4 of the first thickness A in adjusting on the layer 5 in step S4 again, in step S3, form again articulamentum 3 on the second light absorbing zone 4, in step S2, form at last the first light absorbing zone 2 on articulamentum 3, form black film structure of the present invention with this.Also or, but order is carried out step S2, step S3, step S4 and step S5, and base material 1 with adjust layer 5 and link.In addition, the formation method of aforementioned the first light absorbing zone 2, articulamentum 3, the second light absorbing zone 4 and adjustment layer 5 is the deposition processs such as sputter, plating, evaporation, chemogenic deposit (CVD), electric pulp vapour deposition (PECVD) or coating.Wherein, the first light absorbing zone 2 and the second light absorbing zone 4 materials are the antiradar reflectivity materials such as chromium or titanium.Wherein, adjusting layer 5 is the low-refraction materials such as Si oxide, nitride or aluminum oxide with articulamentum 3 materials, and base material 1 material is glass, metal or macromolecular material.In addition, the second light absorbing zone 4 first thickness A are less than 30nm, and are preferably in 6nm to the 16.5nm interval.This adjusts layer 5 second thickness B between between the 50nm to 150nm, and is preferably 65nm.
The above only is illustrative, but not is restricted person.Any spirit and category that does not break away from the present invention, and to its equivalent modifications of carrying out or change, all should be contained in the rear attached claim.
Claims (11)
1. the manufacture method of a black film structure is characterized in that: comprise the following step:
Step 1: the first light absorbing zone is provided;
Step 2: form articulamentum at described the first light absorbing zone;
Step 3: form the second light absorbing zone with first thickness, described the first thickness and the proportional corresponding relation of catoptrical visible light average reflectance at described articulamentum; And,
Step 4: form the adjustment layer with second thickness at described the second light absorbing zone, to reduce the otherness of each wavelength reflectivity of visible light in the described reflected light;
Step 5: form base material at described adjustment layer; Perhaps before described step 1, form first base material, form described the first light absorbing zone at described base material again.
2. the manufacture method of black film structure as claimed in claim 1, it is characterized in that the formation method of described the first light absorbing zone, articulamentum, the second light absorbing zone and adjustment layer is a kind of in sputter-deposited method, electroplating deposition method, vapor deposition method, chemical deposition, electric pulp vapour deposition process or the coating sedimentation.
3. the manufacture method of black film structure as claimed in claim 2 is characterized in that, described the first light absorbing zone and described the second light absorbing zone are to form with low-reflectivity metal, and described low-reflectivity metal is chromium or titanium.
4. the manufacture method of black film structure as claimed in claim 1 is characterized in that, the material of described base material is a kind of in glass, metal or the macromolecular material.
5. the manufacture method of black film structure as claimed in claim 2 is characterized in that, described adjustment layer is to form with low-index material with described articulamentum, and this low-index material is a kind of in Si oxide, nitride or the aluminum oxide.
6. the manufacture method of black film structure as claimed in claim 1 is characterized in that the first thickness of described the second light absorbing zone is less than 30nm; Described the second thickness of layer of adjusting is between between the 50nm to 150nm.
7. black film structure is characterized in that it comprises:
The first light absorbing zone;
Transparent articulamentum is positioned on described the first light absorbing zone;
The second light absorbing zone with first thickness is positioned on the described articulamentum, the size of described the first thickness and the proportional corresponding relation of a catoptrical visible reflectance;
Adjustment layer with second thickness is positioned on described the second light absorbing zone, to reduce the otherness of each wavelength reflectivity of visible light in the described reflected light; And,
Base material is positioned on the described adjustment layer or under described the first light absorbing zone.
8. black film structure as claimed in claim 7 is characterized in that, the material of described the first light absorbing zone and described the second light absorbing zone is chromium or titanium.
9. black film structure as claimed in claim 8 is characterized in that, the first thickness of described the second light absorbing zone is less than 30nm; Described the second thickness of layer of adjusting is between between the 50nm to 150nm.
10. black film structure as claimed in claim 7 is characterized in that, the described material of adjusting layer and described articulamentum is a kind of in Si oxide, nitride or the aluminum oxide.
11. black film structure as claimed in claim 7 is characterized in that, the material of described base material is a kind of in glass, metal or the macromolecular material.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101111044 | 2012-03-29 | ||
| TW101111044A TW201338876A (en) | 2012-03-29 | 2012-03-29 | Black film structure and manufacturing method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103364853A true CN103364853A (en) | 2013-10-23 |
Family
ID=49366613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210141514XA Pending CN103364853A (en) | 2012-03-29 | 2012-05-09 | Black film structure and manufacturing method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103364853A (en) |
| TW (1) | TW201338876A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106990808A (en) * | 2016-01-20 | 2017-07-28 | 宸鸿科技(厦门)有限公司 | Cover sheet and preparation method thereof |
| CN108973265A (en) * | 2018-09-26 | 2018-12-11 | 光驰科技(上海)有限公司 | A kind of glass shell for electronic device |
| EP3647049A4 (en) * | 2017-06-27 | 2020-05-06 | LG Chem, Ltd. | Decorative member and manufacturing method therefor |
| CN114600010A (en) * | 2019-10-15 | 2022-06-07 | 耐克创新有限合伙公司 | Structurally colored articles and methods for making and using same |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6335142B1 (en) * | 1997-12-08 | 2002-01-01 | Commissariat A L'energie Atomique | Light absorbing coating with high absorption capacity |
| CN1795401A (en) * | 2003-11-14 | 2006-06-28 | 日本电产科宝株式会社 | Nd filter and light quantity diaphragming device including the same |
-
2012
- 2012-03-29 TW TW101111044A patent/TW201338876A/en unknown
- 2012-05-09 CN CN201210141514XA patent/CN103364853A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6335142B1 (en) * | 1997-12-08 | 2002-01-01 | Commissariat A L'energie Atomique | Light absorbing coating with high absorption capacity |
| CN1795401A (en) * | 2003-11-14 | 2006-06-28 | 日本电产科宝株式会社 | Nd filter and light quantity diaphragming device including the same |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106990808A (en) * | 2016-01-20 | 2017-07-28 | 宸鸿科技(厦门)有限公司 | Cover sheet and preparation method thereof |
| CN106990808B (en) * | 2016-01-20 | 2023-10-24 | 宸鸿科技(厦门)有限公司 | Protective cover plate and manufacturing method thereof |
| EP3647049A4 (en) * | 2017-06-27 | 2020-05-06 | LG Chem, Ltd. | Decorative member and manufacturing method therefor |
| US11559966B2 (en) | 2017-06-27 | 2023-01-24 | Lg Chem, Ltd. | Decorative member and manufacturing method therefor |
| CN108973265A (en) * | 2018-09-26 | 2018-12-11 | 光驰科技(上海)有限公司 | A kind of glass shell for electronic device |
| CN114600010A (en) * | 2019-10-15 | 2022-06-07 | 耐克创新有限合伙公司 | Structurally colored articles and methods for making and using same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201338876A (en) | 2013-10-01 |
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Application publication date: 20131023 |