CN103345328B - Optical filter box and use the touch display screen of this optical filter box - Google Patents
Optical filter box and use the touch display screen of this optical filter box Download PDFInfo
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Abstract
A kind of optical filter box, including substrate, filter layer and the first conductive layer laying respectively at described substrate opposite sides and the second conductive layer, first conductive layer and the second conductive layer all include the conductive grid that conductive thread fork-shaped becomes, the live width of conductive thread is 0.2 μm～5 μm, and the distance of adjacent two grid nodes is 50 μm～800 μm；Above-mentioned optical filter box, filtering functions is realized by filter layer, induction structure is constituted by the first conductive layer and the second conductive layer, make optical filter box can have again filtering functions by touch control operation, when for touch control display apparatus, it is not required to the most additionally increase touch screen, advantageously reduces the thickness of electronic product, also a saving material and assembly cost.There is provided one to touch display screen simultaneously.
Description
Technical field
The present invention relates to flat panel display technology field, particularly relate to a kind of optical filter box and use this optical filtering
The touch display screen of chip module.
Background technology
Touch screen is the inductive arrangement that can receive the input signals such as touch.It is the finest that touch screen imparts information
New looks, are extremely attractive brand-new information interactive devices.The development of touch screen technology causes domestic
The common concern of external information medium circle, it has also become the Chaoyang new high-tech industry that photovoltaic industry is a dark horse.
At present, the electronic product with touch display function all includes display screen and the touch being positioned on display screen
Screen.But, touch screen is as the assembly with display screen independence, at the electronics realizing man-machine interaction for some
During product, it is required to the size according to display screen and orders, assemble the most again, show to be formed to touch
Display screen, touch display screen can have simultaneously can touch control operation and display function.Existing touch screen and display screen
Assembling mainly have a two ways, i.e. frame patch and entirely fitting.Frame patch is by the edge patch of touch screen with display screen
Closing, full laminating is by whole of the upper surface laminating of the lower surface of touch screen Yu display screen.
Display screen mainly includes polaroid, optical filter box, Liquid Crystal Module and thin film transistor (TFT) (TFT, Thin
Film Transistor), polaroid, optical filter box, Liquid Crystal Module and thin film transistor (TFT) it is combined into display
During screen, there is bigger thickness, and when continuing laminating touch screen on display screen, will be further increased
Its thickness, furthermore, many one attaching process, it is meant that add the probability that product is bad, be greatly increased
The production cost of product.
Summary of the invention
Based on this, it is necessary to for the problem that thickness is bigger and relatively costly, it is provided that one advantageously reduces electricity
Sub-product thickness and the optical filter box of production cost and use the touch display screen of this optical filter box.
A kind of optical filter box, including:
Substrate, including first surface and the second surface that is oppositely arranged with described first surface；
Filter layer, is arranged at described first surface, including light shielding part and multiple filter unit, described light shielding part
In lattice-shaped, including cross one another gridline, if the space split by described gridline forms dry lattice
Unit, each filter unit is contained in a grid cell of correspondence, and the plurality of filter unit is formed and filters
Portion；
First conductive layer, is arranged at the described filter layer side away from described first surface, including multiple intervals
The first conductive pattern arranged, described first conductive pattern includes conductive grid, and described conductive grid is by conducting electricity
Silk thread intersects to form, and conductive thread intersects to form grid node；
Second conductive layer, is located at the side of described second surface, including multiple spaced second conductive patterns
Case, described second conductive pattern includes conductive grid, and described conductive grid is intersected to form by conductive thread, leads
Electrical filament line intersects to form grid node；
Wherein, the live width of the conductive thread of described first conductive layer and the second conductive layer is 0.2 μm～5 μm, phase
The distance of adjacent two described grid nodes is 50 μm～800 μm.
Wherein in an embodiment, the conductive mesh of at least one in described first conductive layer and the second conductive layer
Lattice are random grid.
Wherein in an embodiment, the interval width of adjacent two the first conductive patterns in described first conductive layer
Degree is 0.5 μm～50 μm, and in described second conductive layer, the interval width of adjacent two the second conductive patterns is
0.5 μm～50 μm.
Wherein in an embodiment, in described first conductive layer and described second conductive layer, at least one leads
Electrical filament line all falls within described gridline in the projection of described filter layer.
Wherein in an embodiment, farther including the first impressing glue-line, described first impressing glue-line is arranged
In described filter layer away from the side of described first surface, described first impressing glue-line is away from described first surface
Side offer the first groove, the conductive thread of described first conductive pattern is contained in described first groove.
Wherein in an embodiment, further second impressing glue-line, described second impressing glue-line is arranged at institute
Stating the second surface of substrate, it is recessed that described second impressing glue-line offers second away from the side of described second surface
Groove, the conductive thread of described second conductive pattern is contained in described second groove.
Wherein in an embodiment, the thickness in described optical filtering portion is not less than the thickness of described light shielding part.
Wherein in an embodiment, described first conductive layer and each described conduction of described second conductive layer
Grid projection on described filter layer is surrounded at least one filter unit.
Wherein in an embodiment, each described conductive grid of described first conductive layer is at described filter layer
On each described conductive grid of filter unit number and described second conductive layer that surrounds of projection in described optical filtering
The filter unit number that projection on layer is surrounded differs.
A kind of touch display screen, including the TFT electrode stacked gradually, Liquid Crystal Module, optical filter box and partially
Mating plate, described optical filter box is above-described optical filter box.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be the most real
Existing touch control operation and filtering functions, as the combination of two assemblies indispensable in display screen, be used for showing
Time in screen, display screen can be directly made to have touch controllable function, it is not necessary to assemble a touch screen the most on a display screen, no
Only advantageously reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.
Accompanying drawing explanation
Fig. 1 is the structural representation touching display screen of an embodiment；
Fig. 2 is the structural representation of the optical filter box of an embodiment；
Fig. 3 is the structural representation of the optical filter box of another embodiment；
Fig. 4 is the structural representation of the optical filter box of another embodiment；
Fig. 5 is the structural representation of the optical filter box of a further embodiment；
Fig. 6 is the structural representation at another visual angle of the optical filter box shown in Fig. 5；
Fig. 7 is the conductive layer that in optical filter box, conductive thread all falls within gridline in the projection of filter layer
The interval schematic diagram of multiple conductive patterns；
Fig. 8 is the conductive layer that in optical filter box, conductive thread the most all falls within gridline in the projection of filter layer
The interval schematic diagram of multiple conductive patterns；
Fig. 9 is the structural representation that the conductive thread of conductive layer shown in Fig. 7 projects to an embodiment of filter layer
Figure；
Figure 10 is the structural representation that the conductive thread of conductive layer shown in Fig. 8 projects to an embodiment of filter layer
Figure；
Figure 11 is that the structure of another embodiment that the conductive thread of conductive layer shown in Fig. 7 projects to filter layer is shown
It is intended to；
Figure 12 is that the structure of the another embodiment that the conductive thread of conductive layer shown in Fig. 7 projects to filter layer is shown
It is intended to；
Figure 13 is that the structure of a further embodiment that the conductive thread of conductive layer shown in Fig. 7 projects to filter layer is shown
It is intended to；
Figure 14 is that the structure of the another embodiment that the conductive thread of conductive layer shown in Fig. 8 projects to filter layer is shown
It is intended to；
Figure 15 is that the structure of the another embodiment that the conductive thread of conductive layer shown in Fig. 8 projects to filter layer is shown
It is intended to；
Figure 16 is that the structure of a further embodiment that the conductive thread of conductive layer shown in Fig. 8 projects to filter layer is shown
It is intended to.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
It should be noted that when element is referred to as " being fixed on " another element, and it can be directly at another
On individual element or element placed in the middle can also be there is.When an element is considered as " connection " another yuan
Part, it can be directly to another element or may be simultaneously present centering elements.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention
The implication that the technical staff in field is generally understood that is identical.The art used the most in the description of the invention
Language is intended merely to describe the purpose of specific embodiment, it is not intended that in limiting the present invention.Used herein
Term " and/or " include the arbitrary and all of combination of one or more relevant Listed Items.
Refer to Fig. 1, be the touch display screen 100 of an embodiment, including the lower polaroid 10 stacked gradually,
TFT electrode 20, Liquid Crystal Module 30, public electrode 40, protecting film 50, optical filter box 200 and upper partially
Mating plate 60.In other examples, it is not necessary to protecting film 50 is set and public electrode 40 also may be used.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid crystal
Module includes liquid crystal 32 and is held on the alignment film 34 of liquid crystal 32 both sides.
It is appreciated that when use backlight is as polarized light source, such as OLED polarized light source, it is not necessary to lower inclined
Mating plate 10, it is only necessary to upper polaroid 60.The lower polaroid 10 of the present embodiment, TFT electrode 20, liquid
Crystal module 30, public electrode 40, protecting film 50, the structure of upper polaroid 60 and function can be with existing products
Condition is same, does not repeats them here.
Optical filter box 200 have simultaneously can touch control operation and can filtering functions, make touch display screen 100 have
There is touch display function.Touching display screen can be straight-down negative or the LCDs of side entering type light source.
Referring to Fig. 2 to Fig. 5, expression is 200 4 different embodiments of optical filter box.Aforementioned four
Optical filter box 200 in embodiment all include substrate 210, filter layer 220, first imprint glue-line 230,
First conductive layer 240, second imprints glue-line 250 and the second conductive layer 260.Wherein substrate 210 includes first
Surface 212 and second surface 214, first surface 212 and second surface 214 are oppositely arranged.Substrate 210 is
The material of transparent insulation, such as glass, can be specifically sillico aluminate glass and calcium soda-lime glass, through grade from
Son processes rear surface and has good cohesive force.General, the thickness range of substrate 210 can be
0.1mm～0.5mm.
Filter layer is arranged at first surface 212, including light shielding part 222 and multiple filter unit.Light shielding part 222
In lattice-shaped, including some cross one another gridlines.If the space split by gridline forms dry lattice
Unit, each filter unit is contained in a grid cell of correspondence, and multiple filter units form optical filtering portion 224.
General, the thickness range in light shielding part 222 and optical filtering portion 224 is 0.5 μm～2 μm.
First impressing glue-line 230 is arranged at the filter layer 220 side away from first surface 212, and the first pressure
Print glue-line 230 offers the first groove 232 away from the side of first surface 212.First groove 232 is grid
The groove of shape, mesh shape can be preset to required figure as required.First conductive layer 240 is embedded at
First impressing glue-line 230, including multiple first conductive patterns 242, is provided with between multiple first conductive patterns 242
Interval, so that multiple first conductive pattern 242 insulate.First conductive pattern 242 includes some conductive grids,
Conductive grid is intersected to form by conductive thread 270, and conductive thread 270 intersects to form grid node, described in lead
Electrical filament line 270 is contained in described first groove 232.In other embodiments, it is also possible to be not provided with the first pressure
Print glue-line 230, by directly at described filter layer 220 away from the side applying conductive material of first surface 212,
As silver ink or plating conducting film form the first conductive layer 240 by etching again, so the first impressing glue-line
230 it is not necessary to.
Second impressing glue-line 250 is arranged at the second surface 214 of substrate 210, the second impressing glue-line 250 away from
The side of second surface 214 offers the second groove 252.Second groove 252 is the groove of mesh shape, net
Trellis shape can be preset to required figure as required.Second conductive layer 260 is embedded at the second impressing glue-line 250,
Including multiple second conductive patterns 262.It is provided with interval between multiple second conductive patterns 262, so that multiple second
Conductive pattern 262 mutually insulated.Second conductive pattern 262 includes some conductive grids, and conductive grid is by leading
Electrical filament line 270 intersects to form, the conductive thread 270 of the second conductive pattern 262 and the first conductive pattern 242
The material of conductive thread 270 identical.Conductive thread 270 intersects to form grid node, conductive thread 270
It is contained in the second groove 252.In other examples, the material of the conductive thread of the first conductive layer 240 is also
Can be different from the material of the conductive thread of the second conductive layer 260.In other embodiments, it is also possible to logical
Crossing plating or applying conductive material, the mode etched again such as silver ink, at the second table of substrate 210
Face 214 forms the second conductive layer 260, so second impressing glue-line 250 it is not necessary to.
Wherein, the live width of the conductive thread 270 of the first conductive layer 240 and the second conductive layer 260 is
0.2 μm～5 μm, the distance of adjacent two grid nodes is 50 μm～800 μm, so that the first conductive layer 240
Reach visually-clear with the second conductive layer 260, i.e. naked eyes are invisible.As in figure 2 it is shown, represent is first
The conductive thread 270 of conductive layer 240 and the second conductive layer 260 is random grid, to reduce conductive thread
The manufacture difficulty of 270.As it is shown on figure 3, represent is that the conductive thread 270 of the first conductive layer 240 is in optical filtering
The projection of layer 220 all falls within gridline, and the conductive thread 270 of the second conductive layer 260 is random grid.
In other examples, it is also possible to the conductive thread 270 of the first conductive layer 240 is random grid, second
The conductive thread 270 of conductive layer 260 all falls within gridline in the projection of filter layer 220, is conducive to system
Make the optimization of cost.As shown in Figure 4 and Figure 5, expression is the first conductive layer 240 and the second conductive layer 260
Conductive thread 270 the most all fall within gridline in the projection of filter layer 220, to reduce conductive thread 270
It is exposed to the risk that gridline is lateral.
Above-mentioned optical filter box 200, the first conductive layer 240 and the second conductive layer 260 interval arrange composition electric capacity
Induction structure, makes optical filter box 200 can realize touch control operation and filtering functions simultaneously, and without taking
Bridge designs, and reduces task difficulty.When above-mentioned optical filter box 200 is applied to display screen, can directly make
Display screen has touch controllable function, it is not necessary to assemble a touch screen the most on a display screen, not only contributes to reduce electronics
The thickness of product, is also greatly saved material and assembly cost.First conductive pattern 242 and second is led simultaneously
Electrical pattern 262 is positioned at substrate 210 and the outside of filter layer 220, makes the first conductive pattern 242 and second lead
Electrical pattern 262 all exposes, it is simple to the making of subsequent electrode lead-in wire and flexible PCB and the binding of contact conductor
(bonding).When the live width of the first conductive layer 240 and the conductive thread 270 of the second conductive layer 260 is
0.2 μm～5 μm, when the distance of adjacent two grid nodes is 50 μm～800 μm, can reach visually-clear
Effect.Because falling within regardless of conductive thread 270 in the projection of filter layer 220 or not falling within gridline,
It is attained by visually-clear.
Referring to Fig. 5 and Fig. 6, specific in the present embodiment, optical filtering portion 224 includes chromatic photoresist, each grid
Being formed with a chromatic photoresist in lattice unit, chromatic photoresist forms filter unit.Chromatic photoresist is band chromatic colour dye
The photoresist of material is formed, and can use exposure-development processing procedure.Chromatic photoresist the reddest (red, R) photoresistance,
Green (green, G) photoresistance or indigo plant (blue, B) photoresistance, be used for making incident illumination be transformed into monochromatic light, it is achieved
Filtering functions.Light shielding part is that the photoresist with black dyes is formed at the first impressing glue-line 230, and light shielding part
222 in lattice-shaped, has opaqueness, can use exposure-development processing procedure.In lattice-shaped, grid cell is
Square so that the photoresistance arrangement in optical filtering portion 224 is more compact and uniform.Light shielding part 222 can be prevented effectively from colour
Photoresistance colour contamination each other, and the contrast of R, G, B light can be increased.
Specific in the present embodiment, the material of the first impressing glue-line 230 and the second impressing glue-line 250 is without molten
Agent ultra-violet curing acryl resin, thickness is 2 μm～10 μm.First impressing glue-line 230 and the second impressing glue
Layer 250 is transparence, does not affect the transmitance of entirety.In other embodiments, the first impressing glue-line 230
Can also be On Visible Light Cured Resin or heat reactive resin with the material of the second impressing glue-line 250.
The above-mentioned optical filter box with touch controllable function, the first conductive pattern 242 and the second conductive pattern 262
Being impressing mode to be formed, specifically can be made by following two mode, method one is:
(1) first first surface 212 and second surface 214 at substrate 210 carry out plasma (Plasma)
Process.To remove the first surface 212 of substrate 210 and the dirty of second surface 214, and make first surface
212 and second surface 214 ionizing, increase follow-up with filter layer 220 and the bonding of the second impressing glue-line 250
Power.
(2) whole of the first surface 212 at substrate 210 arranges one layer of photoresist with black dyes.
(3) use exposure-development technology, the photoresist in filter unit region is removed, form the screening of lattice-shaped
Light portion 222.The space split by gridline forms some grid cells.
(4) R/G/B chromatic photoresist is set by several times at grid cell, forms optical filtering portion 224.
(5) it is coated with impressing at filter layer 220 away from side and the second surface 214 of first surface 212 simultaneously
Glue, forms the first impressing glue-line 230 and the second impressing glue-line 250 respectively.The present embodiment uses solvent-free ultraviolet
Solidification acryl resin.And by pressure nested with the first conductive pattern 242 and the second conductive pattern 262 respectively
Die plate imprints at the first impressing glue-line 230 and the second impressing glue-line 250 surface and solidifies respectively,
To required the first groove 232 and second mated with the first conductive pattern 242 and the second conductive pattern 262
Groove 252.Wherein, impression block is transparent material, can avoid the mutual shading in two sides, it is impossible to ultraviolet (UV)
Solidification.
(6) to the first groove 232 mated respectively with the first conductive pattern 242 and the second conductive pattern 262
With fill conductive material in the second groove 252 simultaneously and solidify, obtain the first conductive layer 240 and the second conduction
Layer 260.The live width of the conductive thread 270 of the first conductive layer 240 and the second conductive layer 260 is 0.2 μm～5 μm,
And the distance of adjacent two grid nodes is 50 μm～800 μm.Conductive material include metal, CNT,
At least one in Graphene, organic conductive macromolecule and ITO, is formed and is intersected structure by conductive thread 270
The conductive grid become.It is preferably metal, such as nanometer silver paste.When selecting metal, it is possible to decrease resistance and fall
The energy consumption of low touch display screen.
In said method, the first impressing glue-line 230 and the second impressing glue-line 250 are coated with simultaneously, are conducive to letter
Change flow process, improve efficiency.
Method two is:
(1) first first surface 212 and second surface 214 at substrate 210 carry out plasma (Plasma)
Process.To remove the first surface 212 of substrate 210 and the dirty of second surface 214, and make first surface
212 and second surface 214 ionizing, increase follow-up with filter layer 220 and the bonding of the second impressing glue-line 250
Power.
(2) whole of the first surface 212 at substrate 210 arranges one layer of photoresist with black dyes.
(3) use exposure-development technology, the photoresist in filter unit region is removed, form the screening of lattice-shaped
Light portion 222.The space split by gridline forms some grid cells.
(4) R/G/B chromatic photoresist is set by several times at grid cell, forms optical filtering portion 224.
(5) imprint glue at filter layer 220 surface whole topcoating cloth, form the first impressing glue-line 230.This enforcement
Example uses solvent-free ultra-violet curing acryl resin.And use the impressing being nested with the first conductive pattern 242
Masterplate imprints on the first impressing glue-line 230 surface and solidifies, and obtains mating with the first conductive pattern 242
The first groove 232.
(6) in the first groove 232, fill conductive material and solidify, obtaining the first conductive layer 240.First
The live width of the conductive thread 270 of conductive layer 240 is 0.2 μm～5 μm, adjacent two described grid nodes away from
From for 50 μm～800 μm.Conductive material can be metal, CNT, Graphene, organic conductive high score
At least one in son or ITO, forms the conductive grid being made up of conductive thread 270.It is preferably metal,
Such as nanometer silver paste.When selecting metal, it is possible to decrease resistance and reduction touch the energy consumption of display screen.
(7) layer protecting film 50 is set in the first whole of conductive layer 240 side, to avoid leading in making second
The effect of filter layer 220 is affected during electrical pattern 262.Can be the transparent protective film 50 being coated with/plating, finally produce
Product retain；Can also be one layer of intermediate process protecting film 50, finally remove.
(8) second surface 214 at substrate 210 is coated with the second impressing glue-line 250.The present embodiment uses nothing
Solvent ultra-violet curing acryl resin.And use the impression block that is nested with the second conductive pattern 262 the
Two impressing glue-line 250 surfaces imprint and solidify, and obtain mating with the second conductive pattern 262 second is recessed
Groove 252.
(9) in the second groove 252, fill conductive material and solidify, obtaining the second conductive layer 260, and protect
The live width of the conductive thread 270 demonstrate,proving the second conductive layer 260 is 0.2 μm～5 μm, adjacent two described grids joint
The distance of point is 50 μm～800 μm.Conductive material can be metal, CNT, Graphene, organic lead
Electricity macromolecule or ITO, form the conductive grid being made up of conductive thread 270.It is preferably metal, such as nanometer
Silver slurry.When selecting metal, it is possible to decrease resistance and reduction touch the energy consumption of display screen.If the above-mentioned 7th
In step for intermediate process protecting film 50, also need to be removed after the 9th step.
As shown in Figure 2 and Figure 8, it is when the conductive grid of the first conductive layer 240 and the second conductive layer 260
During random grid, in described first conductive layer 240, the interval width of adjacent two the first conductive patterns 242 is
0.5 μm～50 μm, in described second conductive layer 260, the interval width of adjacent two the second conductive patterns 262 is
0.5 μm～50 μm.Now can be by conductive thread 270 marginal portion disappearance be cut off.
As shown in figure 5 and figure 7, when the first conductive layer 240 and conductive thread 270 of the second conductive layer 260
When the projection of filter layer 220 the most all falls within gridline, in the first conductive layer 240 adjacent two first
The interval width of conductive pattern 242 is the width of a filter unit, in the second conductive layer 260 adjacent two
The width that interval width is a filter unit of two conductive patterns 262.Now can be conducted electricity by full line or permutation
Silk thread 270 lacks, and cuts off.The width of one filter unit is between 0.5 μm～50 μm.
As shown in Fig. 3, Fig. 7 and Fig. 8, when the first conductive layer 240 conductive thread filter layer projection not
All falling within grid, the conductive thread 270 of the second conductive layer 260 all falls in the projection of filter layer 220
Time on gridline, in the first conductive layer 240, the interval width of adjacent two the first conductive patterns 242 is
0.5 μm～50 μm, the interval width of adjacent two second conductive patterns 262 of the second conductive layer 260 is a filter
The width of light unit.Certainly, in other examples, it is also possible to the conductive thread of the first conductive layer 240
270 all fall within gridline in the projection of filter layer 220, the second conductive layer 260 conductive thread in filter
The projection of photosphere the most all falls within grid, now adjacent two first conductive patterns of the first conductive layer 240
The interval width of 242 is the width of a filter unit, adjacent two the second conductive patterns in the second conductive layer 260
The interval width of 262 is 0.5 μm～50 μm.
Specific in the present embodiment, the thickness in optical filtering portion 224 is not less than the thickness of light shielding part 222.Refer to
Fig. 5 and Fig. 6, expression is that the thickness of filter unit is more than the thickness of gridline.Thickness when optical filtering portion 224
During more than the thickness of light shielding part 222, the light appeared from optical filtering portion 224, not only from front it will be seen that from
Side it can be seen that, such that it is able to increase optical filtering portion 224 light emission rate.Certainly, as shown in Figure 4, filter
The thickness in portion 224 can also be equal to the thickness of gridline.
Referring to Fig. 6, specific in the present embodiment, conductive thread 270 is straight line, curve or broken line.Conduction
When silk thread 270 can be difformity, reduce production requirement.
As shown in Figure 9 and Figure 10, what Figure 10 represented is when conductive thread the most all falls in the projection of filter layer
When gridline, each described conductive grid of the first conductive layer 240 and/or the second conductive layer 260 is described
The filter unit having one is surrounded in projection on filter layer 220.What Fig. 9 represented is when conductive thread 270 exists
When the projection of filter layer 220 all falls within gridline, the first conductive layer 240 and/or described second conductive layer
The filter unit having one is surrounded in each described conductive grid of 260 projection on described filter layer 220.Cause
For each grid cell to there being a conductive grid, so the density of conductive grid is relatively big, electric conductivity
Preferably.
As shown in Figure 11 to Figure 13, expression is when conductive thread 270 is whole in the projection of filter layer 220
When falling within gridline, the first conductive layer 240 and/or each described conductive mesh of described second conductive layer 260
The filter unit having at least two is surrounded in lattice projection on described filter layer 220, can be according to conductive layer
Resistance requirement and the requirement of coating weight of conductive material determine the filter unit quantity surrounded.Now can divide
Being three kinds of situations, with laterally as X-axis, the direction of vertical transverse is Y-axis.As shown in figure 11, only at X
On direction of principal axis, each conductive grid of the first conductive layer 240 and the second conductive layer 260 is on filter layer 220
Projection surround at least two filter unit.As shown in figure 12, the most in the Y-axis direction, the first conductive layer
240 and second the projection on filter layer 220 of each conductive grid of conductive layer 260 surround at least two and filter
Unit.As shown in figure 13, simultaneously in X-axis and Y direction, the first conductive layer 240 and the second conduction
At least two filter unit is surrounded in the projection on filter layer 220 of each conductive grid of layer 260.
As shown in Figure 14 to Figure 16, expression is when conductive thread the most all falls within grid in the projection of filter layer
During ruling, each described conductive grid of the first conductive layer 240 and/or described second conductive layer 260 is described
The filter unit having at least two is surrounded in projection on filter layer 220.The most also three kinds of situations can be divided into, with
Being laterally X-axis, the direction of vertical transverse is Y-axis.As shown in figure 14, the most in the X-axis direction, first
The projection on filter layer 220 of each conductive grid of conductive layer 240 and the second conductive layer 260 is surrounded at least
Two integer filter units.As shown in figure 15, the most in the Y-axis direction, the first conductive layer 240 and second
The projection on filter layer 220 of each conductive grid of conductive layer 260 is surrounded at least two integer and is filtered single
Unit.As shown in figure 16, simultaneously in X-axis and Y direction, the first conductive layer 240 and the second conductive layer
At least two integer filter unit is surrounded in each conductive grid of 260 projection on filter layer 220.
Specific in the present embodiment, the throwing on filter layer 220 of each conductive grid of the first conductive layer 240
Filter unit number and the projection on filter layer of each conductive grid of the second conductive layer 260 that shadow surrounds are surrounded
Filter unit number can differ.Can effectively reduce manufacture difficulty.Certainly, in other examples,
The filter unit number and that the projection on filter layer 220 of each conductive grid of the first conductive layer 240 is surrounded
The filter unit number that the projection on filter layer of each conductive grid of two conductive layers 260 is surrounded can also be identical.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.
Claims (8)
1. an optical filter box, it is characterised in that including:
Substrate, including first surface and the second surface that is oppositely arranged with described first surface；
Filter layer, is arranged at described first surface, including light shielding part and multiple filter unit, described light shielding part
In lattice-shaped, including cross one another gridline, if the space split by described gridline forms dry lattice
Unit, each filter unit is contained in a grid cell of correspondence, and the plurality of filter unit is formed and filters
Portion；
First impressing glue-line, is arranged at the described filter layer side away from described first surface, described first pressure
Print glue-line offers the first groove away from the side of described first surface；
First conductive layer, is arranged at the described filter layer side away from described first surface, including multiple intervals
The first conductive pattern arranged, described first conductive pattern includes conductive grid, and described conductive grid is by conducting electricity
Silk thread intersects to form, and conductive thread intersects to form grid node, and the conductive thread of described first conductive pattern is received
It is dissolved in described first groove；
Second conductive layer, is located at the side of described second surface, including multiple spaced second conductive patterns
Case, described second conductive pattern includes conductive grid, and described conductive grid is intersected to form by conductive thread, leads
Electrical filament line intersects to form grid node；
Wherein, the live width of the conductive thread of described first conductive layer and the second conductive layer is 0.2 μm～5 μm, phase
The distance of adjacent two described grid nodes is 50 μm～800 μm, each described conduction of described first conductive layer
The grid filter unit number of projection encirclement on described filter layer is led described in each of described second conductive layer
The filter unit number that power grid projection on described filter layer is surrounded differs.
Optical filter box the most according to claim 1, it is characterised in that described first conductive layer and
In two conductive layers, the conductive grid of at least one is random grid.
Optical filter box the most according to claim 1 and 2, it is characterised in that described first conductive layer
In the interval width of adjacent two the first conductive patterns be 0.5 μm～50 μm, in described second conductive layer adjacent two
The interval width of individual second conductive pattern is 0.5 μm～50 μm.
Optical filter box the most according to claim 1, it is characterised in that described first conductive layer and institute
State the conductive thread of at least one in the second conductive layer and all fall within described gridline in the projection of described filter layer
On.
Optical filter box the most according to claim 1, it is characterised in that further second impressing glue-line,
Described second impressing glue-line is arranged at the second surface of described substrate, and described second impressing glue-line is away from described the
The side on two surfaces offers the second groove, and the conductive thread of described second conductive pattern is contained in described second
In groove.
Optical filter box the most according to claim 1, it is characterised in that the thickness in described optical filtering portion is not
Thickness less than described light shielding part.
Optical filter box the most according to claim 1, it is characterised in that described first conductive layer and institute
State the projection on described filter layer of each described conductive grid of the second conductive layer to surround and have at least one to filter
Unit.
8. touch a display screen, including the TFT electrode stacked gradually, Liquid Crystal Module, optical filter box and
Polaroid, it is characterised in that described optical filter box is as claimed in any of claims 1 to 7 in one of claims
Optical filter box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310282588.XA CN103345328B (en) | 2013-07-05 | 2013-07-05 | Optical filter box and use the touch display screen of this optical filter box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310282588.XA CN103345328B (en) | 2013-07-05 | 2013-07-05 | Optical filter box and use the touch display screen of this optical filter box |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103345328A CN103345328A (en) | 2013-10-09 |
| CN103345328B true CN103345328B (en) | 2016-12-28 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310282588.XA Expired - Fee Related CN103345328B (en) | 2013-07-05 | 2013-07-05 | Optical filter box and use the touch display screen of this optical filter box |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103345328B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203338314U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
| CN203338317U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20130020313A (en) * | 2011-08-19 | 2013-02-27 | 삼성전기주식회사 | Touch sensor and method for manufacturing the same |
| KR101859478B1 (en) * | 2011-11-30 | 2018-06-29 | 엘지디스플레이 주식회사 | Liquid crystal display device having touch screen |
| CN103106953B (en) * | 2013-02-06 | 2014-11-26 | 南昌欧菲光科技有限公司 | Conducting film and preparation method thereof and touch screen comprising the same |
| CN103164100B (en) * | 2013-03-28 | 2014-08-06 | 南昌欧菲光科技有限公司 | Capacitive touch screen |
| CN203338316U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
-
2013
- 2013-07-05 CN CN201310282588.XA patent/CN103345328B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203338314U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
| CN203338317U (en) * | 2013-07-05 | 2013-12-11 | 南昌欧菲光显示技术有限公司 | Optical filter assembly and touch displaying screen with optical filter assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103345328A (en) | 2013-10-09 |
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Effective date of registration: 20170630 Address after: 330000 Jiangxi city of Nanchang province Huangjiahu road Nanchang economic and Technological Development Zone Patentee after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Co-patentee before: Shenzhen OFilm Tech Co.,Ltd. Patentee before: Nanchang Ofilm Display Tech Co.,Ltd. Co-patentee before: Suzhou OFilm Tech. Co.,Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20161228 Termination date: 20190705 |