Summary of the invention
Based on this, it is necessary to for the problem that thickness is bigger and relatively costly, it is provided that one advantageously reduces electricity
Sub-product thickness and the optical filter box of production cost and use the touch display screen of this optical filter box.
A kind of optical filter box, including:
Substrate, including first surface and the second surface that is oppositely arranged with described first surface;
Filter layer, is arranged at described first surface, including light shielding part and multiple filter unit, described light shielding part
In lattice-shaped, including cross one another gridline, if the space split by described gridline forms dry lattice
Unit, each filter unit is contained in a grid cell of correspondence, and the plurality of filter unit is formed and filters
Portion;
First conductive layer, is located at the described filter layer side away from described first surface, sets including multiple intervals
The first conductive pattern put, described first conductive pattern includes the first conductive grid, described first conductive grid
Being intersected to form by the first conductive thread, the first conductive thread intersects to form grid node;
Second conductive layer, is located at the side of described second surface, including multiple spaced second conductive patterns
Case, described second conductive pattern includes the second conductive grid, and described second conductive grid is by the second conductive thread
Intersecting to form, the second conductive thread intersects to form grid node;
Wherein, the live width of the one of which in described first conductive thread and the second conductive thread is
The distance of 0.2 μm~5 μm and adjacent two grid nodes is 50 μm~800 μm, and another one is at described filter layer
Projection all fall on described gridline.
Wherein in an embodiment, described first conductive thread fully falls in institute in the projection of described filter layer
State on gridline, the live width of described second conductive thread be 0.2 μm~5 μm and adjacent two grid nodes away from
From for 50 μm~800 μm.
Wherein in an embodiment, the live width of described first conductive thread is not more than the live width of described gridline.
Wherein in an embodiment, described second conductive thread all falls within institute in the projection of described filter layer
State on gridline.
Wherein in an embodiment, farther including the first impressing glue-line, described first impressing glue-line is arranged
In described filter layer away from the side of described first surface, described first impressing glue-line is away from described first surface
Side offer the first groove, the conductive thread of described first conductive pattern is contained in described first groove.
Wherein in an embodiment, farther including the second impressing glue-line, described second impressing glue-line is arranged
In the second surface of described substrate, described second impressing glue-line offers the away from the side of described second surface
Two grooves, the conductive thread of described second conductive pattern is contained in described second groove.
Wherein in an embodiment, the thickness in described optical filtering portion is not less than the thickness of described light shielding part.
Wherein in an embodiment, the interval width of adjacent two first conductive patterns of described first conductive layer
Degree is the width of no more than one filter unit, between adjacent two second conductive patterns of described second conductive layer
It is 0.5 μm~50 μm every width.
Wherein in an embodiment, each first conductive grid of described first conductive layer is at described filter layer
On projection surround have at least one filter unit, each second conductive grid of described second conductive layer is in institute
State the encirclement of the projection on filter layer and have at least one filter unit.
Wherein in an embodiment, described second conductive grid is in the optical filtering of the projection encirclement of described filter layer
Element number is not more than described first conductive grid filter unit quantity in the projection encirclement of described filter layer.
A kind of touch display screen, including the TFT electrode stacked gradually, Liquid Crystal Module, optical filter box and partially
Mating plate, described optical filter box is optical filter box as described above.
Above-mentioned optical filter box and use the touch display screen of this optical filter box, optical filter box can be the most real
Existing touch control operation and filtering functions, as the combination of two assemblies indispensable in display screen, be used for showing
Time in screen, display screen can be directly made to have touch controllable function, it is not necessary to assemble a touch screen the most on a display screen, no
Only advantageously reduce the thickness of electronic product, be the most also greatly saved material and assembly cost.
Detailed description of the invention
Understandable for enabling the above-mentioned purpose of the present invention, feature and advantage to become apparent from, the most right
The detailed description of the invention of the present invention is described in detail.Elaborate in the following description a lot of detail with
It is easy to fully understand the present invention.But the present invention can come real to be a lot different from alternate manner described here
Executing, those skilled in the art can do similar improvement in the case of intension of the present invention, therefore this
Bright do not limited by following public being embodied as.
It should be noted that when element is referred to as " being fixed on " another element, and it can be directly at another
On individual element or element placed in the middle can also be there is.When an element is considered as " connection " another yuan
Part, it can be directly to another element or may be simultaneously present centering elements.
Unless otherwise defined, all of technology used herein and scientific terminology and the technology belonging to the present invention
The implication that the technical staff in field is generally understood that is identical.The art used the most in the description of the invention
Language is intended merely to describe the purpose of specific embodiment, it is not intended that in limiting the present invention.Used herein
Term " and/or " include the arbitrary and all of combination of one or more relevant Listed Items.
Refer to Fig. 1, be the touch display screen 100 of an embodiment, including the lower polaroid 10 stacked gradually,
TFT electrode 20, Liquid Crystal Module 30, public electrode 40, protecting film 50, optical filter box 200 and upper partially
Mating plate 60.In other examples, it is not necessary to protecting film 50 is set and public electrode 40 also may be used.
TFT electrode 20 includes glass-base 24 and the show electrode 22 being arranged on glass-base 24.Liquid crystal
Module includes liquid crystal 32 and is held on the alignment film 34 of liquid crystal 32 both sides.
It is appreciated that when use backlight is as polarized light source, such as OLED polarized light source, it is not necessary to lower inclined
Mating plate 10, it is only necessary to upper polaroid 60.The lower polaroid 10 of the present embodiment, TFT electrode 20, liquid
Crystal module 30, public electrode 40, protecting film 50, the structure of upper polaroid 60 and function can be with existing products
Condition is same, does not repeats them here.
Optical filter box 200 have simultaneously tangible operation and can filtering functions, make touch display screen 100 have
There is touch display function.Touching display screen can be straight-down negative or the LCDs of side entering type light source.
Referring to Fig. 2 to Fig. 5, expression is 200 4 different embodiments of optical filter box.Aforementioned four
Optical filter box 200 in embodiment all include substrate 210, filter layer 220, first imprint glue-line 230,
First conductive layer 240, second imprints glue-line 250 and the second conductive layer 260.Wherein substrate 210 includes first
Surface 212 and second surface 214, first surface 212 and second surface 214 are oppositely arranged.Substrate 210
Material can be sillico aluminate glass and calcium soda-lime glass, processes rear surface through Plasma and has good bonding
Power.General, the thickness range of substrate 210 can be 0.1mm~0.5mm.
Filter layer covers in first surface 212, including light shielding part 222 and multiple filter unit.Light shielding part 222
In lattice-shaped, including some cross one another gridlines.If the space split by gridline forms dry lattice
Unit, each filter unit is contained in a grid cell of correspondence, and multiple filter units form optical filtering portion 224.
General, the thickness range in light shielding part 222 and optical filtering portion 224 is 0.5 μm~2 μm.
First impressing glue-line 230 covers in filter layer 220 away from the side of first surface 212, and the first pressure
Print glue-line 230 offers the first groove 232 away from the side of first surface 212.First groove 232 is grid
The groove of shape, mesh shape can be preset to required figure as required.First conductive layer 240 is embedded at
First impressing glue-line 230, including multiple first conductive patterns 242, is provided with between multiple first conductive patterns 242
Interval, so that multiple first conductive pattern 242 insulate.First conductive pattern 242 includes some first conductions
Grid, the first conductive grid is intersected to form by the first conductive thread 2422, and the first conductive thread 2422 intersects
Forming grid node, described first conductive thread 2422 is contained in described first groove 232.Reality at other
Execute in example, it is also possible to be not provided with the first impressing glue-line 230, by directly at described filter layer 220 away from first
The side applying conductive material on surface 212, if silver ink or plating conducting film are again by etching formation the
One conductive layer 240, thus first impressing glue-line 230 it is not necessary to.
Second impressing glue-line 250 covers the second surface 214 in substrate 210, the second impressing glue-line 250 away from
The side of second surface 214 offers the second groove 252.Second groove 252 is the groove of mesh shape, net
Trellis shape can be preset to required figure as required.Second conductive layer 260 is embedded at the second impressing glue-line 250,
Including multiple second conductive patterns 262.It is provided with interval between multiple second conductive patterns 262, so that multiple second
Conductive pattern 262 mutually insulated.Second conductive pattern 262 includes some second conductive grids, the second conduction
Grid is intersected to form by the second conductive thread 2622, and the second conductive thread 2622 intersects to form grid node,
Second conductive thread 2622 is contained in the second groove 252.Specific in the present embodiment, the first conductive thread 2422
Identical with the material of the second conductive thread 2622.In other examples, first conductive thread 2422
Material can also be different from the material of the second conductive thread 2622.In other embodiments, it is also possible to pass through
Plating conducting film or applying conductive material, such as silver ink, the mode etched the most again, at substrate 210
Second surface 214 form the second conductive layer 260, so second impressing glue-line 250 it is not necessary to.
Wherein, the live width of the one of which in the first conductive thread 2422 and the second conductive thread 2622 is
The distance of 0.2 μm~5 μm and adjacent two grid nodes is 50 μm~800 μm, and another one is at filter layer 220
The live width of the projection conductive thread that falls into gridline and this conductive layer be not more than the live width of gridline.
As it is shown in figure 5, represent is that the first conductive thread 2422 falls into gridline in the projection of filter layer 220,
And the live width of this first conductive thread 2422 is less than the live width of gridline, the live width of the second conductive thread 2622
Be the distance of 0.2 μm~5 μm and adjacent two grid nodes be 50 μm~800 μm.In other examples,
As shown in Figure 4, the live width of the first conductive thread 2422 can also be equal to the live width of gridline.Work as filter set
When part 200 is applied to product, be generally the second surface 214 of substrate 210 towards user, so
The second conductive layer 260 being embedded at the second impressing glue-line 250 is easier to be seen by user's naked eyes and affect user
Experience sense.So the first conductive thread 2422 is fallen into gridline and without departing from grid in the projection of filter layer 220
Ruling, the live width of the second conductive thread 2622 is that the distance of 0.2 μm~5 μm and adjacent two grid nodes is
50 μm~800 μm, make visually-clear, is conducive to improving Consumer's Experience sense.In other examples, also
The projection that second conductive thread 2622 can be arranged in filter layer 220 all falls within gridline, enters one
Step improves Consumer's Experience sense.
As in figure 2 it is shown, represent be the first conductive thread 2422 live width be 0.2 μm~5 μm and adjacent two
The distance of grid node is 50 μm~800 μm, and the second conductive thread 2622 falls in the projection of filter layer 220
Gridline, and the live width of this second conductive thread 2622 is less than the live width of gridline.As it is shown on figure 3, represent
Be the first conductive thread 2422 live width be that the distance of 0.2 μm~5 μm and adjacent two grid nodes is
50 μm~800 μm, the second conductive thread 2622 falls into gridline in the projection of filter layer 220, and this second
The live width of conductive thread 2622 is equal to the live width of gridline.
Above-mentioned optical filter box 200, the first conductive layer 240 and the second conductive layer 260 interval arrange composition electric capacity
Induction structure, makes optical filter box 200 can realize touch control operation and filtering functions simultaneously, and without taking
Bridge designs, and reduces task difficulty.When above-mentioned optical filter box 200 is applied to display screen, can directly make
Display screen has touch controllable function, it is not necessary to assemble a touch screen the most on a display screen, not only contributes to reduce electronics
The thickness of product, is also greatly saved material and assembly cost.First conductive pattern 242 and second is led simultaneously
Electrical pattern 262 is positioned at substrate 210 and the outside of filter layer 220, makes the first conductive pattern 242 and second lead
Electrical pattern 262 all exposes, it is simple to the making of subsequent electrode lead-in wire and flexible PCB and the binding of contact conductor
(bonding).When the live width of either conductive layer conductive thread in the first conductive layer 240 and the second conductive layer 260
When being that in 0.2 μm~5 μm and this conductive layer, the distance of adjacent two grid nodes is 50 μm~800 μm, permissible
Reach visually-clear, it is not necessary to alignment grid ruling, reduce fraction defective and production cost;Leading of another conductive layer
Electrical filament line falls into gridline in the projection of filter layer 220, because light shielding part 222 has opaqueness, as long as
Ensure that the live width of conductive thread is not more than the width of gridline, so that it may so that conductive thread is without departing from gridline,
From without blocking filter layer 220, the light transmittance of filter layer 220 will not be reduced.
Referring to Fig. 5 and Fig. 6, specific in the present embodiment, optical filtering portion 224 includes chromatic photoresist, each grid
Being formed with a chromatic photoresist in lattice unit, chromatic photoresist forms filter unit.Chromatic photoresist is band chromatic colour dye
The photoresist of material is formed, and can use exposure-development processing procedure.Chromatic photoresist the reddest (red, R) photoresistance,
Green (green, G) photoresistance or indigo plant (blue, B) photoresistance, be used for making incident illumination be transformed into monochromatic light, it is achieved
Filtering functions.Light shielding part is that the photoresist with black dyes is formed at the first impressing glue-line 230, and light shielding part
In lattice-shaped, there is opaqueness, exposure-development processing procedure can be used.In lattice-shaped, grid cell is square,
The photoresistance arrangement making optical filtering portion 224 is more compact and uniform.Light shielding part 222 can be prevented effectively from chromatic photoresist phase
Colour contamination between Hu, and the contrast of R, G, B light can be increased.
Specific in the present embodiment, the material of the first impressing glue-line 230 and the second impressing glue-line 250 is without molten
Agent ultra-violet curing acryl resin, thickness is 2 μm~10 μm.First impressing glue-line 230 and the second impressing glue
Layer 250 is transparence, does not affect the transmitance of entirety.In other embodiments, the first impressing glue-line 230
Can also be On Visible Light Cured Resin or heat reactive resin with the material of the second impressing glue-line 250.
The above-mentioned optical filter box with touch controllable function, the first conductive pattern 242 and the second conductive pattern 262
Being impressing mode to be formed, specifically can be made by following two mode, method one is:
(1) first first surface 212 and second surface 214 at substrate 210 carry out plasma (Plasma)
Process.To remove the first surface 212 of substrate 210 and the dirty of second surface 214, and make first surface
212 and second surface 214 ionizing, increase follow-up with filter layer 220 and the bonding of the second impressing glue-line 250
Power.
(2) the whole face of first surface 212 at substrate 210 covers one layer of photoresist with black dyes.
(3) use exposure-development technology, the photoresist in filter unit region is removed, form the screening of lattice-shaped
Light portion 222.The space split by gridline forms some grid cells.
(4) R/G/B chromatic photoresist is set by several times at grid cell, forms optical filtering portion 224.
(5) it is coated with impressing at filter layer 220 away from side and the second surface 214 of first surface 212 simultaneously
Glue, forms the first impressing glue-line 230 and the second impressing glue-line 250 respectively.The present embodiment uses solvent-free ultraviolet
Solidification acryl resin.And by pressure nested with the first conductive pattern 242 and the second conductive pattern 262 respectively
Die plate imprints at the first impressing glue-line 230 and the second impressing glue-line 250 surface and solidifies respectively,
To required the first groove 232 and second mated with the first conductive pattern 242 and the second conductive pattern 262
Groove 252.Wherein, impression block is transparent material, can avoid the mutual shading in two sides, it is impossible to ultraviolet (UV)
Solidification.
(6) to the first groove 232 mated respectively with the first conductive pattern 242 and the second conductive pattern 262
With fill conductive material in the second groove 252 simultaneously and solidify, obtain the first conductive layer 240 and the second conduction
Layer 260.The live width of the one of which in the first conductive thread 2422 and the second conductive thread 2622 is
The distance of 0.2 μm~5 μm and adjacent two grid nodes is 50 μm~800 μm, and another one is at filter layer 220
The live width of the projection conductive thread that falls into gridline and this conductive layer be not more than the live width of gridline.Conduction material
Material includes at least one in metal, CNT, Graphene, organic conductive macromolecule and ITO, shape
Become the conductive grid being made up of conductive thread 270 intersection.It is preferably metal, such as nanometer silver paste.When selecting gold
During genus, it is possible to decrease resistance and reduction touch the energy consumption of display screen.
In said method, the first impressing glue-line 230 and the second impressing glue-line 250 are coated with simultaneously, are conducive to letter
Change flow process, improve efficiency.
Method two is:
(1) first first surface 212 and second surface 214 at substrate 210 carry out plasma (Plasma)
Process.To remove the first surface 212 of substrate 210 and the dirty of second surface 214, and make first surface
212 and second surface 214 ionizing, increase follow-up with filter layer 220 and the bonding of the second impressing glue-line 250
Power.
(2) the whole face of first surface 212 at substrate 210 covers one layer of photoresist with black dyes.
(3) use exposure-development technology, the photoresist in filter unit region is removed, form the screening of lattice-shaped
Light portion 222.The space split by gridline forms some grid cells.
(4) R/G/B chromatic photoresist is set by several times at grid cell, forms optical filtering portion 224.
(5) imprint glue at filter layer 220 surface whole topcoating cloth, form the first impressing glue-line 230.This enforcement
Example uses solvent-free ultra-violet curing acryl resin.And use the impressing being nested with the first conductive pattern 242
Masterplate imprints on the first impressing glue-line 230 surface and solidifies, and obtains mating with the first conductive pattern 242
The first groove 232.
(6) in the first groove 232, fill conductive material and solidify, obtaining the first conductive layer 240.Conduction
Material can be at least one in metal, CNT, Graphene, organic conductive macromolecule or ITO,
Form the conductive grid being made up of conductive thread 270.It is preferably metal, such as nanometer silver paste.When selecting metal
Time, it is possible to decrease resistance and reduction touch the energy consumption of display screen.
(7) layer protecting film 50 is covered in the first whole face, conductive layer 240 side, to avoid leading in making second
The effect of filter layer 220 is affected during electrical pattern 262.Can be the transparent protective film 50 being coated with/plating, finally produce
Product retain;Can also be one layer of intermediate process protecting film 50, finally remove.
(8) second surface 214 at substrate 210 is coated with the second impressing glue-line 250.The present embodiment uses nothing
Solvent ultra-violet curing acryl resin.And use the impression block that is nested with the second conductive pattern 262 the
Two impressing glue-line 250 surfaces imprint and solidify, and obtain mating with the second conductive pattern 262 second is recessed
Groove 252.
(9) in the second groove 252, fill conductive material and solidify, obtaining the second conductive layer 260.First
The live width of the one of which in conductive thread 2422 and the second conductive thread 2622 is 0.2 μm~5 μm and adjacent
The distance of two grid nodes is 50 μm~800 μm, and another one falls into gridline in the projection of filter layer 220
And the live width of the conductive thread of this conductive layer is not more than the live width of gridline.Conductive material can be metal, carbon
Nanotube, Graphene, organic conductive macromolecule or ITO, form the conductive mesh being made up of conductive thread 270
Lattice.It is preferably metal, such as nanometer silver paste.When selecting metal, it is possible to decrease resistance and reduction touch display
The energy consumption of screen.If in above-mentioned 7th step for intermediate process protecting film 50, also need to after the 9th step
Removed.
Specific in the present embodiment, the first conductive grid and filter unit similar fitgures each other, the first conductive filament
The centrage of line 2422 overlaps with the centrage of described gridline in the projection of filter layer 220, the i.e. first conduction
Silk thread 2422 alignment grid ruling.First conductive grid is that the first conductive thread 2422 intersects to form, grid list
Unit is formed by gridline segmentation, and filter unit is formed at grid cell.So in the present embodiment, may be used
So that the shape of the first conductive grid is identical with the shape of filter unit but vary in size, the i.e. first conductive grid
With filter unit similar fitgures each other, ensure simultaneously the first conductive thread 2422 filter layer projection without departing from
Gridline.Further reduce the first conductive thread 2422 and expose the probability of gridline region.
Specific in the present embodiment, the thickness in optical filtering portion 224 is not less than the thickness of light shielding part 222.Refer to
Fig. 5 and Fig. 6, expression is that the thickness of filter unit is more than the thickness of gridline.Thickness when optical filtering portion 224
During more than the thickness of light shielding part 222, the light appeared from optical filtering portion 224, not only from front it will be seen that from
Side it can be seen that, such that it is able to increase optical filtering portion 224 light emission rate.Certainly, as shown in Figure 4, filter
The thickness in portion 224 can also be equal to the thickness of gridline.
Specific in the present embodiment, adjacent first conductive pattern 242 is provided with interval, the second adjacent conduction
Pattern 262 is provided with interval, with mutually insulated.As it is shown in fig. 7, represent is first as shown in Figure 5
The interval schematic diagram of multiple first conductive patterns 242 of conductive layer 240.As shown in Figure 8, expression be as
The interval schematic diagram of multiple second conductive patterns 262 in the second conductive layer 260 shown in Fig. 5.Specific to this
In embodiment, the interval width of adjacent two first conductive patterns 242 of the first conductive layer 240 is for being not more than
The width of one filter unit, now can be lacked by full line or permutation conductive thread, cut off.Described
The interval width of adjacent two second conductive patterns 262 of the second conductive layer 260 is 0.5 μm~50 μm, now
Can be by conductive thread marginal portion disappearance be cut off.In other examples, when the second conductive layer
Second conductive thread 2622 of 260 is when the projection of filter layer 220 all falls within gridline, and second conducts electricity
Second conductive pattern 262 of adjacent two of layer 260 can also be with adjacent two s' of the first conductive layer 240
The interval width of the first conductive pattern 242 is the same, for the width of no more than one filter unit, as shown in Figure 7.
Refer to Fig. 6, specific in the present embodiment, the first conductive thread 2422 and the second conductive thread 2622
For straight line, curve or broken line.First conductive thread 2422 and the second conductive thread 2622 can be different shapes
During shape, reduce production requirement.
As it is shown in figure 9, represent is the first conductive thread 2422 of the first conductive layer 240 as shown in Figure 5
When projecting to filter layer 220, each first conductive grid surrounds a filter unit.As shown in figure 13,
Represent is that the second conductive thread 2622 of the second conductive layer 260 as shown in Figure 5 projects to filter layer 220
Time, each second conductive grid surrounds at least one filter unit.Because each grid cell is to having
One conductive grid, so the density of conductive grid is relatively big, electric conductivity is preferable.
As shown in Figure 10 to Figure 12, expression is the first conduction of the first conductive layer 240 as shown in Figure 5
When silk thread 2422 projects on filter layer 220, each first conductive grid surrounds the optical filtering list having at least two
Unit, can determine according to the requirement of the coating weight to the resistance requirement of the first conductive layer 240 and conductive material
The filter unit quantity surrounded.Now can be divided into three kinds of situations, with laterally as X-axis, the direction of vertical transverse
For Y-axis.As shown in Figure 10, the most in the X-axis direction, each first conductive mesh of the first conductive layer 240
At least two filter unit is surrounded in lattice projection on filter layer 220.As shown in figure 11, only in Y direction
On, at least two is surrounded in the projection on filter layer 220 of each first conductive grid of the first conductive layer 240
Filter unit.As shown in figure 12, simultaneously in X-axis and Y direction, the first conductive layer 240 each
At least two filter unit is surrounded in the projection on filter layer 220 of first conductive grid.
As shown in Figure 14 to Figure 16, expression is the second conduction of the second conductive layer 260 as shown in Figure 5
When silk thread 2622 projects to filter layer 220, each second conductive grid surrounds at least two filter unit,
Can determine to surround according to the requirement of the coating weight to the resistance requirement of the second conductive layer 260 and conductive material
Filter unit quantity.The most also can be divided into three kinds of situations, with laterally as X-axis, the direction of vertical transverse is
Y-axis.As shown in figure 14, the most in the X-axis direction, each second conductive grid of the second conductive layer 260 exists
At least two filter unit is surrounded in projection on filter layer 220.As shown in figure 15, the most in the Y-axis direction,
The projection on filter layer 220 of each second conductive grid of the second conductive layer 260 is surrounded at least two and is filtered
Unit.As shown in figure 16, simultaneously in X-axis and Y direction, each the second of the second conductive layer 260
At least two filter unit is surrounded in conductive grid projection on filter layer 220.
Specific in the present embodiment, described second conductive grid is in the filter of the projection encirclement of described filter layer 220
Light element number is not more than described first conductive grid filter unit in the projection encirclement of described filter layer 220
Quantity.Because the live width of the second conductive thread 2622 of the second conductive grid is 0.2 μm~5 μm and adjacent two
The distance of individual grid node is 50 μm~500 μm, as long as the first conductive thread 2422 of the first conductive grid is not
Live width more than gridline.So the live width of the first conductive thread 2422 is relatively big, resistance is the biggest.Therefore
And described second conductive grid is arranged to not in the filter unit quantity of the projection encirclement of described filter layer 220
More than described first conductive grid in the filter unit quantity of the projection encirclement of described filter layer 220, that is to say
Second conductive grid density of the second conductive layer 260 is more than the first conductive grid density of the first conductive layer 240,
Thus increasing the resistance of the second conductive layer 260, it is to avoid the resistance difference of two conductive layers is the biggest.
Embodiment described above only have expressed the several embodiments of the present invention, and it describes more concrete and detailed,
But therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that, for this area
Those of ordinary skill for, without departing from the inventive concept of the premise, it is also possible to make some deformation and
Improving, these broadly fall into protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be with appended
Claim is as the criterion.