CN103337273B - A kind of pinhole collimator - Google Patents
A kind of pinhole collimator Download PDFInfo
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- CN103337273B CN103337273B CN201310297713.4A CN201310297713A CN103337273B CN 103337273 B CN103337273 B CN 103337273B CN 201310297713 A CN201310297713 A CN 201310297713A CN 103337273 B CN103337273 B CN 103337273B
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- narrow slit
- end liner
- slit structure
- blade
- cutting edge
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Abstract
The present invention relates to a kind of collimator.Pin hole shape for solving the existence of existing pinhole collimator is undesirable, the Low energy scattering making heavy ion microbeam is serious, the heavy ion beam spot resulted in is excessive, the problems such as application requirement can not be met, the invention provides a kind of pinhole collimator, including upper end liner, the first narrow slit structure, the second narrow slit structure and lower end liner；Described first narrow slit structure and the second narrow slit structure are constituted by the blade that the two panels cutting edge being placed in same plane is relative, leave slit, and collimated thing will not be transmitted to require the thickness of cutting edge ensure that between relative cutting edge.The linearity on the pinhole collimator blade cutting edge top of the present invention is good, the slit seam of splicing is wide is smaller than 1 μm, advantageously reduce the Low energy scattering composition of heavy ion microbeam, the heavy ion beam spot quality better of generation, achieve the application in heavy ion microbeam irradiation devices preferably.
Description
Technical field
The present invention relates to a kind of collimator, particularly to a kind of pinhole collimator.
Background technology
Heavy ion microbeam irradiation devices are the irradiation devices that a kind of heavy ion beam spot that diameter is millimeter magnitude produced by conventional accelerator is restricted to micron level by the method collimating or focusing on.As the radiation mode of a kind of uniqueness, heavy ion microbeam irradiation has a wide range of applications in the research in the single particle effect mechanism of microelectronic component, radiobiology, materialogy etc..From the phase at the beginning of the eighties in last century, countries in the world begin to utilize heavy ion microbeam irradiation to study single particle effect, and are developed rapidly after the nineties.Up to the present, every country having heavy ion avcceleration in the world, almost establish heavy ion microbeam irradiation devices bar none, and carry out the research work of the aspects such as single particle effect.Such as, heavy ion microbeam irradiation devices are all had in the Naval Research Labratory of the U.S., Asia, Holy Land National Laboratory, the Oxford University of Britain, the Institute for Atomic Research of Japan, the heavy ion institute of Germany, the nuclear physics institute of Italy, Australian University of Melbourne etc., carry out single particle effect research work, and achieve great achievement.
At present, built in the world heavy ion microbeam irradiation devices produce the method for heavy ion microbeam mainly two kinds: pin-hole collimation method utilizes opening size to be that the accelerator line of general diameter several millimeters is limited to micron order by micron-sized pinhole collimator；Focussing utilizes electromagnetic component that the accelerator beam focusing of general diameter several millimeters is become the HIB of micron order or submicron order.Due to focussing, to there is equipment investment high, focusing effect is by the restriction of electromagnetic component focusing power, the requirement of initial line and equipment is very harsh, the problems such as line debugging comparatively difficulty, therefore, having equipment investment few, the pin-hole collimation method of heavy ion quality and the advantage such as energy is unrestricted is usually used.
The assembly adopting the heavy ion microbeam irradiation devices most critical of pin-hole collimation method is pinhole collimator, because it directly determines the most key parameters such as the spot size of produced heavy ion microbeam.Existing pinhole collimator mainly adopts spark machined (less than Φ < 10 μm) and Laser Processing (Φ < 5 μm) two kinds of processing methods to make, but all nonideal cylinder of its pin hole of pinhole collimator that employing both processing methods are made, but funnel type.Such as the Φ 1 μm of Newport company, thick 12.5 μm of pinhole collimators adopting Laser Processing to make, aperture, actual entry is 2.5 μm, and outlet aperture is 1 μm.Owing to nonideal cylindrical pin hole can make heavy ion produce serious scattering, ream weight ion peak total ratio significantly reduces, and causes there is substantial amounts of Low energy scattering composition in heavy ion microbeam, and the heavy ion beam spot of generation is excessive, often greater than pin hole a lot of times, tend not to meet application requirement.Based on above-mentioned present situation, for meeting ever-increasing application demand, need badly and existing pinhole collimator is improved.
Summary of the invention
Pin hole shape for solving the existence of existing pinhole collimator is undesirable so that the Low energy scattering of heavy ion microbeam is serious, and the heavy ion beam spot resulted in is excessive, it is impossible to meets the problems such as application requirement, the invention provides a kind of pinhole collimator.
A kind of pinhole collimator, including upper end liner, the first narrow slit structure, the second narrow slit structure and lower end liner；Described first narrow slit structure and the second narrow slit structure are constituted by the blade that the two panels cutting edge being placed in same plane is relative, leave slit, and collimated thing will not be transmitted to require the thickness of cutting edge ensure that between relative cutting edge；The two panels blade of described first narrow slit structure is fixed together by upper end liner, and the two panels blade of described second narrow slit structure is fixed together by lower end liner；Upper end liner leaves the opening so that the partial slits of the first narrow slit structure is not blocked, and lower end liner leaves the opening so that the partial slits of the second narrow slit structure is not blocked；The overall structure formed by upper end liner and the first narrow slit structure is stacked with the overall structure formed by lower end liner and the second narrow slit structure to be fixed together, in requirement, the opening of end liner is corresponding to the opening of lower end liner common opening, and makes the slit of the first narrow slit structure and the slit of the second narrow slit structure intersect to form the pin hole of pinhole collimator in the opening that upper end liner and lower end liner are common.
Described blade is preferably stainless steel blade.
The blade that the described two panels cutting edge being placed in same plane is relative is preferably and is blocked as two panels to obtain by a piece of blade.
The blade that the described two panels cutting edge being placed in same plane is relative, its front is placed as preferably in the same direction.
The preparation method of above-mentioned pinhole collimator, its step is as follows:
1) the grinding of blade
First, preparing mould, it is desirable to this mould has two faces to be plane and intersect vertically, intersection forms straightedge；Blade is fixed in a plane of mould, and makes blade cutting edge top parallel with described straightedge and slightly protrude from this straightedge；
Precision sand paper is fixed on flat board, then the blade being fixed together and mould are placed on accurate sand paper, make blade vertical with accurate sand paper and blade cutting edge top contacts with accurate sand paper, control mould and blade cutting edge top is ground to smooth bright and clean with accurate sand paper relative motion, and collimated thing will not be transmitted to require the thickness of cutting edge ensure that；
2) splicing of narrow slit structure
Take the blade that two panels grinds according to step 1), two panels blade is placed in same plane and cutting edge is relative, leave slit between cutting edge and form narrow slit structure；Then narrow slit structure is fixed on the end liner with opening, and makes partial slits be positioned at the opening part of end liner and not be blocked, obtain the overall structure formed by end liner and narrow slit structure；
3) assemble
Take two according to step 2) overall structure formed by end liner and narrow slit structure that obtains, they stacked are fixed together, require that the opening of two end liners is corresponding to common opening, and make the slit of two narrow slit structures intersect to form the pin hole of pinhole collimator in common opening.
The linearity on the pinhole collimator blade cutting edge top of the present invention is good, surface roughness Ra meansigma methods can be low to moderate 5nm, the slit seam of splicing is wide is smaller than 1 μm, advantageously reduce the Low energy scattering composition of heavy ion microbeam, and the mode that the relative blade of two panels cutting edge is blocked acquisition by a piece of blade and front is placed in the same direction reduce further the Low energy scattering of heavy ion microbeam, the heavy ion beam spot quality better produced, heavy ion beam spot area about 2 μm2, the peak total ratio of heavy ion microbeam power spectrum is more than 95%, hence it is evident that is about the peak total ratio of 50% higher than the heavy ion microbeam power spectrum obtained by existing pinhole collimator, achieves the application in heavy ion microbeam irradiation devices preferably.In addition, the pinhole collimator of the present invention it is also used as the collimator of other radiation or particle etc. to be applied.
Accompanying drawing explanation
The pinhole collimator STRUCTURE DECOMPOSITION schematic diagram of Fig. 1 present invention；
The blade structure schematic diagram of the pinhole collimator of Fig. 2 present invention.
Detailed description of the invention
Below in conjunction with specific embodiment, embodiments of the present invention are described further.
Embodiment
A kind of pinhole collimator, including upper end liner, the first narrow slit structure, the second narrow slit structure and lower end liner；Described first narrow slit structure and the second narrow slit structure are constituted by the blade that the two panels cutting edge being placed in same plane is relative, leave slit, and collimated thing will not be transmitted to require the thickness of cutting edge ensure that between relative cutting edge；The two panels blade of described first narrow slit structure is fixed together by upper end liner, and the two panels blade of described second narrow slit structure is fixed together by lower end liner；Upper end liner leaves the opening so that the partial slits of the first narrow slit structure is not blocked, and lower end liner leaves the opening so that the partial slits of the second narrow slit structure is not blocked；The overall structure formed by upper end liner and the first narrow slit structure is stacked with the overall structure formed by lower end liner and the second narrow slit structure to be fixed together, in requirement, the opening of end liner is corresponding to the opening of lower end liner common opening, and makes the slit of the first narrow slit structure and the slit of the second narrow slit structure intersect to form the pin hole of pinhole collimator in the opening that upper end liner and lower end liner are common；Described blade is stainless steel blade；The blade that the described two panels cutting edge being placed in same plane is relative is blocked as two panels by a piece of blade to obtain, and its front is placed in the same direction.
Checking at bundle of the pinhole collimator of the present invention:
1. peak total ratio
The pinhole collimator of the employing present invention energy to being produced by accelerator is 48MeV's32S ion beam current collimates, after measuring collimation with Au Si surface barrier detector32S ion microbeam power spectrum, result shows:32The peak total ratio of S ion microbeam power spectrum is 95.2%, after collimation is described32The Low energy scattering composition of S ion microbeam is few, and quality of beam is good.
2. heavy ion microbeam beam spot area
The pinhole collimator of the employing present invention energy to being produced by accelerator is 48MeV's32S ion beam current collimates, after collimation32S ion micro irradiation plastic track detector, after plastic track detector is carried out chemical etching process, finds beam spot with scanning electron microscope and observes the distribution situation of record beam spot, and result shows:32The linear-scale of S ion microbeam beam spot is 1.5 μ m 1.5 μm, and Low energy scattering composition constitutes about 5%, after describing collimation equally32The Low energy scattering composition of S ion microbeam is few, and quality of beam is good.
Application in the single particle effect study mechanism of microelectronic component
The energy produced by accelerator is 145MeV's by the pinhole collimator (linear-scale of pin hole is 2 μ m 3 μm) adopting the present invention79Br ion beam current collimates, after collimation79SRAM (SRAM) sample being previously written data is carried out point by point scanning irradiation by Br ion microbeam, by measuring the relation (i.e. SEU imaging technique) between single-particle inversion (SEU) and incident beam position, it is determined that the position of the SEU sensitizing range within this Memory Storage Unit and area.
Result shows: the sensitizing range of SRAM (SRAM) sample generation single-particle inversion is NMOS and the PMOS district under reverse-biased cut-off state, measurement result accuracy is good, consistent with AUTHORITATIVE DATA, illustrate that the pinhole collimator of the present invention is completely suitable for the single particle effect study mechanism of microelectronic component.
Claims (3)
1. a pinhole collimator, it is characterised in that: include end liner, the first narrow slit structure, the second narrow slit structure and lower end liner；Described first narrow slit structure and the second narrow slit structure are constituted by the blade that the two panels cutting edge being placed in same plane is relative, leave slit, and transmission will not occur collimated thing to require the thickness of cutting edge ensure that between relative cutting edge；The two panels blade of described first narrow slit structure is fixed together by upper end liner, and the two panels blade of described second narrow slit structure is fixed together by lower end liner；Upper end liner leaves the opening so that the partial slits of the first narrow slit structure is not blocked, and lower end liner leaves the opening so that the partial slits of the second narrow slit structure is not blocked；The overall structure formed by upper end liner and the first narrow slit structure is stacked with the overall structure formed by lower end liner and the second narrow slit structure to be fixed together, in requirement, the opening of end liner is corresponding to the opening of lower end liner common opening, and makes the slit of the first narrow slit structure and the slit of the second narrow slit structure intersect to form the pin hole of pinhole collimator in the opening that upper end liner and lower end liner are common.
2. pinhole collimator as claimed in claim 1, it is characterised in that: described blade is stainless steel blade.
3. pinhole collimator as claimed in claim 1, it is characterised in that: described in be placed in same plane the relative blade of two panels cutting edge for being blocked as two panels by a piece of blade to obtain.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201310297713.4A CN103337273B (en) | 2013-07-17 | 2013-07-17 | A kind of pinhole collimator |
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| CN201310297713.4A CN103337273B (en) | 2013-07-17 | 2013-07-17 | A kind of pinhole collimator |
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| CN103337273B true CN103337273B (en) | 2016-06-29 |
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Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103698896B (en) * | 2013-12-26 | 2016-01-27 | 中国科学院苏州生物医学工程技术研究所 | A kind of precise pinhole aims at debug system and method |
| CN112562882A (en) * | 2020-12-07 | 2021-03-26 | 中国原子能科学研究院 | Heavy ion microbeam irradiation device, system and control method |
| CN112835091B (en) * | 2021-01-05 | 2021-11-02 | 中国原子能科学研究院 | Micron-level beam distribution test method and device |
| CN116441562B (en) * | 2023-06-16 | 2023-08-15 | 西安赛隆增材技术股份有限公司 | Device and method for calibrating beam spot of electron beam |
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| US7388207B1 (en) * | 2006-03-28 | 2008-06-17 | University Of Utah Research Foundation | Skew slit collimator and method of use thereof |
| CN101329923A (en) * | 2007-06-21 | 2008-12-24 | 同方威视技术股份有限公司 | Dual-purpose collimating device with seam |
| EP2073039A1 (en) * | 2007-12-21 | 2009-06-24 | Milabs B.V. | A focused pinhole gamma detection device |
| US7579600B2 (en) * | 2006-06-30 | 2009-08-25 | Siemens Medical Solutions Usa, Inc. | Preclinical SPECT system using multi-pinhole collimation |
| US7612343B2 (en) * | 2006-10-16 | 2009-11-03 | Gvi Medical Devices | Collimator for radiation detectors and method of use |
| CN102008314A (en) * | 2010-12-17 | 2011-04-13 | 清华大学 | Collimator device for small animal imaging |
| CN203366771U (en) * | 2013-07-17 | 2013-12-25 | 中国原子能科学研究院 | Pinhole collimator |
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| US7388207B1 (en) * | 2006-03-28 | 2008-06-17 | University Of Utah Research Foundation | Skew slit collimator and method of use thereof |
| US7579600B2 (en) * | 2006-06-30 | 2009-08-25 | Siemens Medical Solutions Usa, Inc. | Preclinical SPECT system using multi-pinhole collimation |
| US7612343B2 (en) * | 2006-10-16 | 2009-11-03 | Gvi Medical Devices | Collimator for radiation detectors and method of use |
| CN101329923A (en) * | 2007-06-21 | 2008-12-24 | 同方威视技术股份有限公司 | Dual-purpose collimating device with seam |
| EP2073039A1 (en) * | 2007-12-21 | 2009-06-24 | Milabs B.V. | A focused pinhole gamma detection device |
| CN102008314A (en) * | 2010-12-17 | 2011-04-13 | 清华大学 | Collimator device for small animal imaging |
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