CN103324032A - Polyhedron main substrate, manufacturing method and processing method thereof - Google Patents
Polyhedron main substrate, manufacturing method and processing method thereof Download PDFInfo
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Abstract
The invention relates to a polyhedron main substrate for installing support devices, a measurement device and a lens barrel device, wherein the main substrate is provided with at least a working position, and the outer surface of the main substrate is defined by polygon enveloping surfaces of installation regions of the support devices, the measurement device and the lens barrel device, and is a convex polyhedron formed through connecting a plurality of other planes according to a convex enveloping rule. According to the present invention, based on the polyhedron structure design, the whole structure of the obtained main substrate is simple and efficient, good dynamic performance and good stability can be achieved, processing characteristics of integrated main substrate casting are met, and the main substrate formed through the combination has performance advantages of high modality and low quality compared with the existing structure.
Description
Technical field
The present invention relates to a kind of semiconductor manufacturing facility, relate in particular to a kind of polyhedron main substrate structure for lithographic equipment and manufacture method and job operation.
Background technology
Main substrate and measurement support are the cores of litho machine complete machine Frame Design, it had both needed to possess the characteristic index of high mode, to satisfy the demand of short-term stability dynamic property, must search out a good equilibrium point to satisfy the demand of long-term thermal stability at material and field of heat transfer again simultaneously.In addition, along with the increase of object lens and measuring system quality, force again main substrate and measurement support Design will satisfy inferior quality, light-weighted development trend.Therefore the design direction of main substrate and measurement support need to possess high mode and light-weighted double characteristic.
With regard to space constraint, because the development of projection objective so that conjugate distance constantly increase, this is so that the complete machine Inner-world, specifically comprise main substrate and measure support, need to provide the size from mask face (object lens object plane) to the larger Z-direction height of silicon chip face (object lens image planes) span, for mask platform laser interferometer and work stage laser interferometer provide effective mounting plane.Simultaneously, litho machine is for improving the complete machine work efficiency, and the development trend of main substrate increases to two working positions by a working position, to adapt to X and the Y-direction plane space demand of double-workpiece-table and double-exposure design.Therefore, main substrate and measure support and need to be provided as the larger installation of spatial extent and seating surface for photo-etching machine objective lens and measuring system.
US Patent No. 7130019 provides a kind of main substrate manufacture method of aluminum composite material, and increase feedback temperature control system carries out active cooling and temperature compensation.Such main substrate can use the material of higher thermal expansion coefficient, and this new material possesses higher rigidity to reach equal dynamic property simultaneously.But if the material of the low thermal coefficient of expansion such as employing invar (Invar) is made main substrate, can produce following defective: the invar manufacturing cost is high, and processibility is difficult, and delivery date is long.On the other hand, be subjected to the impact of invar material character also to have the problems such as bottleneck of dynamic property.US Patent No. 7130019 disclosed main substrates are a kind of double, large tracts of land main substrate, although its lighter weight, the mode value is relatively on the low side, is unfavorable for the complete machine dynamic property.
US Patent No. 5691806 provides a kind of casting mold main substrate framework, and described casting mold frame installation is above work stage.The top of casting mold framework is body structure, and inside is provided with many reinforcements, and framework is divided into several small box, to strengthen the rigidity of casting mold framework, fills up the vibration damping foam simultaneously in framework, improves system stability.The casting mold framework is enclosed construction, does not have the particle contamination work stage.US Patent No. 5691806 disclosed main substrates are a kind of single station, small size main substrate, although its structural strength is good, the mode value is high, because be casting mold main substrate and cause quality excessive.
For the problem that prior art exists, this case designer relies on the industry experience for many years of being engaged in, and the active research improvement is so had polyhedron main substrate structure of the present invention and manufacture method and job operation.
Summary of the invention
The present invention be directed in the prior art, existing litho machine main substrate manufacturing cost is high, and processibility is difficult, and delivery date is long, and bad dynamic performance, and the defective such as quality is excessive provide a kind of polyhedron main substrate structure.
In order to address the above problem, the invention provides a kind of polyhedron main substrate, be used for fittable slackening device, measurement mechanism and body tube device, offer at least one station on the described main substrate, wherein, the outside surface of described main substrate is that the polygon enveloping surface by the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device is limited, and the convex polyhedron that is connected and composed by the convex closure rule by some other planes.
Further, described main substrate outside surface comprises: the main substrate upper surface offers at least one station, and is provided with the installation region of corresponding described bracing or strutting arrangement, described main substrate upper surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described bracing or strutting arrangement; The main substrate lower surface, corresponding main substrate upper surface offers corresponding station, and be respectively arranged with the installation region of corresponding some measuring systems, and described main substrate lower surface is polygonized structure, the edge of described polygonized structure is limited by the installation region of described each measuring system; Peripheral board, comprise some polygon panels, described peripheral board carries out transition with the polygon vertex of described main substrate lower surface with some polygon panels to the polygon vertex of described main substrate upper surface and is connected, and makes described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
Optionally, also be provided with some floors between described main substrate upper surface and the main substrate lower surface.
Optionally, described each floor is crisscross and evenly is arranged between described main substrate upper surface and the main substrate lower surface.
Optionally, the polygonized structure of described main substrate upper surface is the polygon that envelope was limited with each vibration damper installation region.
Optionally, the station offered of described main substrate upper surface and main substrate lower surface correspondence comprises that at least one exposure position and at least one measure the position.
Optionally, described bracing or strutting arrangement is vibration damper.
Optionally, the quantity of described bracing or strutting arrangement is three or four.
Optionally, described bracing or strutting arrangement is arranged on the plane of two differing heights at least, and described main substrate upper surface is formed by connecting by at least two planes that are connected respectively described differing heights.
Optionally, the polygonized structure of described main substrate lower surface is the polygon that envelope was limited with each measuring system installation region.
Optionally, described measuring system comprises the work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
Optionally, the space envelope that is connected to form of each the polygon panel in the described peripheral board is by the convex closure term restriction.
Another purpose of the present invention is the defective for prior art, and a kind of manufacture method of making above-mentioned polyhedron main substrate is provided.
In order to achieve the above object, the invention provides a kind of manufacture method of polyhedron main substrate, described main substrate is installed on the basic framework by some bracing or strutting arrangements, it may further comprise the steps: the main substrate upper surface is provided: the installation region of determining corresponding described each bracing or strutting arrangement of described main substrate upper surface, determine the polygonized structure of main substrate upper surface with described each bracing or strutting arrangement installation region as marginal point, and offer at least one station at described main substrate upper surface; Provide the main substrate lower surface: the installation region of determining the corresponding some measuring systems of difference on the described main substrate lower surface, determine the polygonized structure of described main substrate lower surface with described each measuring system installation region as marginal point, and offer the station of corresponding main substrate upper surface at described main substrate lower surface; Provide peripheral board: the polygon vertex of described main substrate upper surface is carried out transition with the polygon vertex of described main substrate lower surface with some polygon panels be connected, and make described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
Optionally, this method also is included in the step that floor is set between described main substrate upper surface and the main substrate lower surface.
Optionally, the polygonized structure of described main substrate upper surface is the polygon that envelope was limited with each vibration damper installation region.
Optionally, the station offered of described main substrate upper surface and main substrate lower surface correspondence comprises that at least one exposure position and at least one measure the position.
Optionally, the polygonized structure of described main substrate lower surface is the polygon that envelope was limited with each measuring system installation region.
Optionally, described measuring system comprises the work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
Optionally, the polygon panel of described peripheral board is to adopt algorithm of convex hull that the polygon vertex of described main substrate upper surface and main substrate lower surface is found the solution in three dimensions, is satisfying under the condition of installing space, obtains the structure of each polygon panel.
Optionally, in the described step that peripheral board is provided, also comprise the step of peripheral board being carried out the model correction, described model correction comprises, the polygon panel of described peripheral board is divided into up and down two-layer the structure; Remain on the polygon limit number of each polygon panel in the described peripheral board minimum.
For above-mentioned polyhedron main substrate, the present invention also provides a kind of job operation of polyhedron main substrate, may further comprise the steps: sheet material blanking, part preprocessing, according to main substrate the polygon sheet material that station, bracing or strutting arrangement installation region and measuring system installation region process respectively each plane of corresponding main substrate outside surface is set, described main substrate outside surface comprises main substrate upper surface, main substrate lower surface and peripheral board; The sheet material welding comprises the base plate of welding main substrate lower surface and the base plate of corresponding measurement mechanism and body tube device; Weld successively crisscross floor between main substrate upper surface and the main substrate lower surface, finish building of inner skeleton; And, each polygon panel sheet material of welding peripheral board.
Optionally, adopt welding technology between each sheet material of described main substrate, its process sequence adopts and gets on, get off, first interior rear outer mode.
In sum, with respect to the existing structure main substrate, the present invention has adopted the design concept of polyhedral structure, installation requirements according to bracing or strutting arrangement in the lithographic equipment and each measurement mechanism, the structure qualification of main substrate upper surface and main substrate lower surface is more succinct efficiently polygonized structure form, and between main substrate upper surface and main substrate lower surface, connect into the convex polyhedron structure with the polygon panel, the main substrate one-piece construction that forms is compact efficient more, can reach better dynamic property and stability.
In addition, polygon and polyhedral geometry not only are fit to the manufacturing process of plate cutting and welding, and meet main substrate cast-in-block processing characteristics, and its main substrate that constitutes is compared existing structure and had high mode, low-quality performance advantage.
Description of drawings
Fig. 1 is the structural representation of polyhedron main substrate upper surface of the present invention;
Fig. 2 is the structural representation of polyhedron main substrate lower surface of the present invention;
Fig. 3 is the structural representation of polyhedron main substrate side periphery plate of the present invention;
Fig. 4 is the structural representation of polyhedron main substrate of the present invention back side peripheral board;
Fig. 5 is the structure skeleton view of polyhedron main substrate of the present invention;
Fig. 6 is the schematic diagram of main substrate upper support device of the present invention and measuring system installation region;
Fig. 7 is that main substrate of the present invention is installed in the structural representation on the basic framework;
Fig. 8 is main substrate processing and manufacturing process flow diagram of the present invention.
Embodiment
By the technology contents, the structural attitude that describe the invention in detail, reached purpose and effect, below in conjunction with embodiment and cooperate accompanying drawing to be described in detail.
Polyhedron main substrate of the present invention is used for fittable slackening device, measurement mechanism and body tube device, offers at least one station on the described main substrate.Wherein, the outside surface of described main substrate is that the polygon enveloping surface by the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device is limited, and the convex polyhedron that is connected and composed by the convex closure rule by some other planes.In embodiment, enumerating described polyhedron main substrate is the double main substrate, should not be considered as limitation of the present invention.
See also Fig. 1, Fig. 2, Fig. 1 and the external structure schematic diagram that Figure 2 shows that main substrate 100.The main substrate lower surface 203 that the external structure of described main substrate 100 comprises the main substrate upper surface 204 that is made of top board (not shown), is made of base plate (not shown), and be used for described main substrate upper surface 204 and carry out the peripheral board 205 that effective transition is connected with described main substrate lower surface 203.In the present embodiment, described main substrate 100 is the double main substrate, specifically comprises the exposure position 101 that projection objective is installed and the measurement position 102 of carrying out measurement update.
Wherein, it is polyhedron-shaped that the external structure of described main substrate 100 is the Y-direction symmetry.Be provided with the mounting plane of corresponding bracing or strutting arrangement at described main substrate upper surface 204.In the present embodiment, described bracing or strutting arrangement is active damper 201.Described active damper 201 is three or four, and described main substrate upper surface 204 corresponds to subtriangular structure, and the installation region of described active damper 201 is arranged at respectively the triangular apex position.
Because active damper 201 is arranged on the plane of two differing heights at least described in the present embodiment, described main substrate upper surface 204 is formed by connecting by at least two planes that are connected respectively active damper 201 height, main substrate 100 steadily is installed on the basic framework (can consults Fig. 7).
Described main substrate lower surface 203 is provided with the mounting interface (consulting shown in Figure 6) of corresponding work stage laser interferometer 301 and other litho machine measuring system, and the structure of described main substrate lower surface 203 is the polygons that envelope was limited with above-mentioned each measuring system installation region.Envelope described in the present invention refers to surround the contour structure of the girth minimum of periphery, appointed area, and its polygon that limits is the minimal convex polygon that surrounds the periphery, appointed area.
In the present embodiment, the peripheral envelope of described measuring system is made of six work stage laser interferometer 301 (the corresponding exposure of difference position 101 and measurement position 102), because there are certain width in described work stage laser interferometer 301 installation regions, so the structure of the main substrate lower surface 203 corresponding work stage laser interferometer 301 that limit of installation region envelope is approximate eight-sided formation.
Main substrate of the present invention is to be applied in the lithographic equipment, and bracing or strutting arrangement and the measuring system of litho machine is installed.Because in lithographic equipment, support system layout (corresponding active damper etc.) is fully different at aspects such as functional characteristics, design requirements with measuring system layout (corresponding laser interferometer, alignment device etc.), make the installation region of support system and measuring system also thereupon different, thereby obtain respectively the different version in the upper and lower surface of main substrate of the present invention.
It is to be noted; the definition that the main substrate upper surface of indication, main substrate lower surface are only done for ease of more clearly demonstrating main substrate ingredient and relativeness thereof among the present invention; not should be understood to the restriction to the corresponding site absolute position; in fact; the installed surface of the measuring systems such as described active damper 201 and work stage laser interferometer 301 can exchange fully in whole or in part; the upper and lower surface of main substrate also can horizontal or slant setting; all do not affect the enforcement of technical solution of the present invention, should belong to protection scope of the present invention.
See also Fig. 3, Fig. 4, between the point of main substrate upper surface 204 and main substrate lower surface 203, adopt several polygon panels to form peripheral board 205, described peripheral board 205 consists of the convex polyhedron structure of main substrates 100, and forms effective transition that is connected between described main substrate upper surface 204 and described main substrate lower surface 203.In the present embodiment, described peripheral board 205 is the convex polyhedrons that the polygon vertex of described main substrate upper surface 204 and main substrate lower surface 203 are connected to form by each polygon panel, and the formation of described each polygon panel can be found the solution acquisition according to algorithm of convex hull with being connected.
See also Fig. 5, Figure 5 shows that the structure skeleton view of main substrate 100.Described main substrate 100 inside are provided with along X-direction and the staggered inside floor 207 of Y-direction.Be space parallel with predeterminable range between the described inner floor 207 and arrange, also be provided with the oblique side rib plate that is connected between X, the inner floor 207 of Y-direction in important area peripheries such as exposure position, measurement positions.Described main substrate 100 arranges the stiffening plate 206 of having an appointment and being 45 ° of inclinations to the left and right sides of active damper 201 installation places.Described stiffening plate 206 is as the installation deep floor of main substrate 100, so that the 206 natural transition of described stiffening plate also can form whole the reinforcement with peripheral board 205.
On the other hand, the present invention also provides a kind of manufacture method of above-mentioned polyhedron main substrate, specifically may further comprise the steps.
Execution in step S1: data acquisition;
Please continue to consult Fig. 6, Fig. 7, Figure 6 shows that polyhedron main substrate and measuring system interface and installation site schematic diagram, Figure 7 shows that main substrate is installed in the structural representation on the basic framework.As shown in Figure 6, at first measuring system interface and bracing or strutting arrangement position on the installed surface of main substrate 100 and measurement support (not shown) are effectively identified and defined, clearly the three-dimensional space data of the location point of all relevant interfaces or installation region.In the present embodiment, described main substrate 100 is the double main substrate, specifically comprises the exposure position 101 that projection objective is installed and the measurement position 102 of carrying out measurement update.The interface position and the installation region that need to gather and define comprise: the some measuring systems (not shown) that are installed in main substrate lower surface 203, described measuring system includes but not limited to work stage laser interferometer, null pick-up, off-axis alignment, leveling and focusing, secondary prealignment, and the mounting means of described measuring system can be embedded installation or flat placed type is installed; Be installed in the mask platform laser interferometer (not shown) of described measurement rack upper surface 202; Be arranged on 3 active damper 201 installation sites on the described main substrate upper surface 204.As shown in Figure 7, described active damper 201 is arranged on the basic framework, and described main substrate 100 horizontal are on active damper 201, and the air supporting pressure by active damper 201 supports and reaches static balancing.
Execution in step S2: the main substrate external structure makes up;
See also Fig. 7, and in conjunction with consulting Fig. 1 to Fig. 4, the external overall structure that makes up main substrate 100 need to make up respectively main substrate upper surface 204, main substrate lower surface 203 and 205 3 parts of peripheral board.Wherein, make up described main substrate upper surface 204 and be the subtriangular structure that the installation region was limited with three active damper 201, offer the exposure position 101 that projection objective is installed and the measurement position 102 of carrying out measurement update on it.
Described main substrate lower surface 203 be the polygonized structure that limited with the peripheral envelope in the installation region of each measuring system that defines among the above-mentioned steps S1 (in the present embodiment, the peripheral envelope of each measuring system of lower surface is limited by six work stage laser interferometer), and correspondence offers exposure position 101 and measures position 102.
Between the polygon vertex of the polygon vertex of main substrate upper surface 204 and described main substrate lower surface 203, use some polygon panels to carry out transition and is connected, and make main substrate upper surface 204, main substrate lower surface 203 and peripheral board 205 formation convex polyhedron structures.
In the present embodiment, the polygon panel of above-mentioned peripheral board 205 is to adopt algorithm of convex hull that the polygon vertex of described main substrate upper surface and main substrate lower surface is found the solution acquisition in three dimensions, and the concrete steps of Algorithm for Solving are as follows.
See also Fig. 1 to Fig. 4, and in conjunction with consulting Fig. 6.Figure 6 shows that polyhedron main substrate and measuring system interface and installation site schematic diagram, can be according to the measuring system interface that gathers among the above-mentioned steps S1 and bracing or strutting arrangement position three-dimensional space data as input parameter when finding the solution, adopt the algorithm of convex hull in the computational geometry that arbitrfary point known in the three dimensions is found the solution, satisfying under the precondition of installing space, output obtains peripheral board 205 structures of main substrate 100.
By above-mentioned design construction step, can make the one-piece construction of described main substrate 100 more succinct efficient, can effectively reduce upper and lower surface lifting erection space.Simultaneously, between main substrate upper surface 204 and main substrate lower surface 203, adopt several polygons to form peripheral board 205, with the effective transition as described main substrate upper surface 204 and described main substrate lower surface 203, eliminated the unnecessary volume in main substrate 100 outsides, so that rationally effectively overlap joint and transition of upper and lower surface.Gengon and polygonal geometric configuration not only are fit to the manufacturing process of plate cutting and welding, and meet main substrate 100 cast-in-block processing characteristics, make main substrate 100 present high mode, low-quality performance advantage.
Execution in step S3: main substrate external structure model correction.
The model correction refers to according to more design constraint the external structure of the main substrate 100 of algorithm gained effectively be revised, and it is a kind of model to be carried out local, the correction of application and perfect process.Described model correction comprises: (1) is simplified the base plate of main substrate lower surface 203 and is reduced peripheral board 205 quantity, described base plate can carry out the partial structurtes simplification according to using needs, in the present embodiment, peripheral board 205 adopts the polygon facet Slab with preliminary planning to carry out the number simplification of polygon limit, some polygon vertexs that combined distance is nearer, thus make the polygon limit number of each polygon panel remain on minimum; (2) consider that existence is interfered on main substrate and the basic framework space, the polyhedral structure of peripheral board is divided into up and down two-layer planning (consulting Fig. 3, Fig. 4), in the present embodiment, the polygon panel of peripheral board 205 is take basic framework place height as boundary, and it forms up and down convex polyhedron peripheral board structure between two-layer polygon panel; (3) be subjected to the restraint condition of litho machine layout according to active damper 201, in the present embodiment, according to basic framework active damper 201 is installed in two different elevation plane, and local ribs is carried out in active damper 201 installation places strengthen, and consider to install and reserve the maintenance maintenance space.
Execution in step S4: the main substrate inner structure makes up.
See also Fig. 5, floor design for main substrate, adopting crisscross floor to carry out inside strengthens, comprise along X-direction and the staggered inside floor 207 of Y-direction, be space parallel with predeterminable range between the described inner floor 207 and arrange, also be provided with the oblique side rib plate that is connected between X, the inner floor 207 of Y-direction in important area peripheries such as exposure position, measurement positions.
The technological method for processing of main substrate of the present invention sees also Fig. 8, Figure 8 shows that main substrate 100 processing and manufacturing process flow diagrams.Adopt welding technology between each sheet material of main substrate 100, its technique is the order of " getting on, get off, interior rear outer first ".Described main substrate 100 welding manufacturing process flows comprise: according to the design elements drawing, carry out the sheet material blanking, the part preprocessing is specially: the sheet material profile is carried out preprocessing, reach the design shape of sheet material, finish the preliminary work of part; The part pre-assembled, the check one-piece construction; The sheet material welding, welding technology comprises: the base plate of welding main substrate lower surface 203 and the base plate (not shown) of projection objective and off-axis alignment; Weld successively main substrate 100 interior crisscross inside floors 207, finish building of inner skeleton; Welding peripheral board 205 polygon sheet materials, the welding sequence of peripheral board 205 still adopts the order of " getting on, get off "; The top board of welding main substrate upper surface 204 is finished welding and sealing to main substrate 100 integral body; Test mode, Performance Detection.
Special frock can be set during peripheral board 205 and angled support carries out supplemental support and location in welding, guarantee dimensional accuracy and welding quality between the sheet material.On the step of welding technology, at first with the spot welding location, carry out subsequently discontinuous welding or the full weld of whole piece fillet.Between the top board of main substrate upper surface 204 is with the fillet of inner floor 207 and peripheral board 205, can be provided with in advance the mortise structure, to realize interrupted welding.
By in Hyperworks and Nastran finite element software, the main substrate 100 in the present embodiment being carried out simulating, verifying, compute mode and weight, main substrate 100 of the present invention presents high mode, low-quality dual property advantage.Improve 10% with the existing main substrate design mode of comparing, weight reducing 30% has been obtained obvious effect.The PSD value of litho machine Inner-world vibration control main substrate vibration acceleration, and the response of its key position is controlled at maximum amplitude in the 1nm scope.
In sum, the present invention is based on the whole polyhedral structure design of main substrate, dynamic property that can not only Effective Raise complete machine Inner-world, and effectively alleviate the quality of Inner-world, simultaneously reduce purchasing cost and manufacturing cycle.
It is pointed out that the present embodiment only for describing specific structural features of the present invention and function mode in detail, does not consist of substantive the restriction to technical scheme of the present invention.The technical scheme that those skilled in the art put down in writing according to the present invention should be spreaded to thought of the present invention and is applied in other common enforcement scenes, includes but not limited to following situation.
The main substrate station Configuration Type of enumerating in the present embodiment is not construed as limiting main substrate structure of the present invention, those skilled in the art can freely select single station main substrate that single exposure position is only arranged fully according to actual needs, have single exposure position, single double main substrate of measuring the position, perhaps have the multistation main substrate of two above stations.
The configuration quantity of the basic framework bracing or strutting arrangement of enumerating in the present embodiment and type are not construed as limiting main substrate technical scheme of the present invention, this bracing or strutting arrangement can be active damper, damping block or other bracing or strutting arrangements commonly used, quantity can be that three, four or other can be realized the layout quantity of stable support, bracing or strutting arrangement can be positioned on the sustained height plane, also can be positioned at two even surpass on the plane of two differing heights.
The kind of the measuring system of enumerating in the present embodiment, mounting means and configuration quantity are not construed as limiting main substrate technical scheme of the present invention, described measuring system can be in work stage laser interferometer, null pick-up, off-axis alignment, leveling and focusing, secondary prealignment or other measurement mechanisms commonly used one or more according to the practical application needs, and the location layout of each measurement mechanism and quantity also can be selected according to practical measurement requirement.
The employing algorithm of convex hull of enumerating in the present embodiment is found the solution acquisition polygon panel and the building mode of peripheral board of the present invention is not construed as limiting, those skilled in the art are on the basis of understanding the technology of the present invention thought, can make up as required the polygon panel connecting method between the main substrate upper and lower surface polygon vertex fully, and so that the peripheral board that the polygon panel forms is the convex polyhedron structure, can realize basic purpose of the present invention.Under the prerequisite that summit and mounting condition are determined, can use General Principle or the existing algorithm model of computational geometry, perhaps adopt existing software for mathematical computing product (such as: the Mathematica computing platform that Wolfram company provides etc.), even according to the actual requirements structure and the array mode of hand-designed polygon panel.
Those skilled in the art all should be appreciated that, in the situation that do not break away from the spirit or scope of the present invention, can carry out various modifications and variations to the present invention.Thereby, if when any modification or modification fall in the protection domain of appended claims and equivalent, will be understood that the present invention contains these modifications and modification.
Claims (22)
1. polyhedron main substrate, be used for fittable slackening device, measurement mechanism and body tube device, offer at least one station on the described main substrate, it is characterized in that, the outside surface of described main substrate is that the polygon enveloping surface by the installation region of described bracing or strutting arrangement, measurement mechanism, body tube device is limited, and the convex polyhedron that is connected and composed by the convex closure rule by some other planes.
2. polyhedron main substrate as claimed in claim 1 is characterized in that, described main substrate outside surface comprises:
The main substrate upper surface offers at least one station, and is provided with the installation region of corresponding described bracing or strutting arrangement, and described main substrate upper surface is polygonized structure, and the edge of described polygonized structure is limited by the installation region of described bracing or strutting arrangement;
The main substrate lower surface, corresponding main substrate upper surface offers corresponding station, and be respectively arranged with the installation region of corresponding some measuring systems, and described main substrate lower surface is polygonized structure, the edge of described polygonized structure is limited by the installation region of described each measuring system; And,
Peripheral board, comprise some polygon panels, described peripheral board carries out transition with the polygon vertex of described main substrate lower surface with some polygon panels to the polygon vertex of described main substrate upper surface and is connected, and makes described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
3. polyhedron main substrate as claimed in claim 2 is characterized in that, also is provided with some floors between described main substrate upper surface and the main substrate lower surface.
4. polyhedron main substrate as claimed in claim 2 is characterized in that, described each floor is crisscross and evenly is arranged between described main substrate upper surface and the main substrate lower surface.
5. polyhedron main substrate as claimed in claim 2 is characterized in that, the polygonized structure of described main substrate upper surface is the polygon that envelope was limited with each vibration damper installation region.
6. polyhedron main substrate as claimed in claim 2 is characterized in that, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measurement position.
7. polyhedron main substrate as claimed in claim 2 is characterized in that, described bracing or strutting arrangement is vibration damper.
8. such as claim 1 or 2 or 7 described polyhedron main substrates, it is characterized in that, the quantity of described bracing or strutting arrangement is three or four.
9. polyhedron main substrate as claimed in claim 8 is characterized in that, described bracing or strutting arrangement is arranged on the plane of two differing heights at least, and described main substrate upper surface is formed by connecting by at least two planes that are connected respectively described differing heights.
10. polyhedron main substrate as claimed in claim 2 is characterized in that, the polygonized structure of described main substrate lower surface is the polygon that envelope was limited with each measuring system installation region.
11. such as claim 1 or 2 or 10 described polyhedron main substrates, it is characterized in that, described measuring system comprises the work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
12. polyhedron main substrate as claimed in claim 2 is characterized in that, the space envelope that each the polygon panel in the described peripheral board is connected to form is by the convex closure term restriction.
13. the manufacture method of a polyhedron main substrate as claimed in claim 1, described main substrate is installed on the basic framework by some bracing or strutting arrangements, and it may further comprise the steps:
Provide the main substrate upper surface: the installation region of determining corresponding described each bracing or strutting arrangement of described main substrate upper surface, determine the polygonized structure of main substrate upper surface with described each bracing or strutting arrangement installation region as marginal point, and offer at least one station at described main substrate upper surface;
Provide the main substrate lower surface: the installation region of determining the corresponding some measuring systems of difference on the described main substrate lower surface, determine the polygonized structure of described main substrate lower surface with described each measuring system installation region as marginal point, and offer the station of corresponding main substrate upper surface at described main substrate lower surface; And,
Provide peripheral board: the polygon vertex of described main substrate upper surface is carried out transition with the polygon vertex of described main substrate lower surface with some polygon panels be connected, and make described main substrate upper surface, main substrate lower surface and peripheral board be connected to form convex polyhedron.
14. the manufacture method of polyhedron main substrate as claimed in claim 13 is characterized in that, also is included in the step that floor is set between described main substrate upper surface and the main substrate lower surface.
15. the manufacture method of polyhedron main substrate as claimed in claim 13 is characterized in that, the polygonized structure of described main substrate upper surface is the polygon that envelope was limited with each vibration damper installation region.
16. the manufacture method of polyhedron main substrate as claimed in claim 13 is characterized in that, the station that described main substrate upper surface and main substrate lower surface correspondence are offered comprises at least one exposure position and at least one measurement position.
17. the manufacture method of polyhedron main substrate as claimed in claim 13 is characterized in that, the polygonized structure of described main substrate lower surface is the polygon that envelope was limited with each measuring system installation region.
18. the manufacture method such as claim 13 or 17 described polyhedron main substrates is characterized in that described measuring system comprises the work stage laser interferometer, null pick-up, off-axis alignment device, leveling and focusing device and secondary prealignment device.
19. the manufacture method of polyhedron main substrate as claimed in claim 13, it is characterized in that, the polygon panel of described peripheral board is to adopt algorithm of convex hull that the polygon vertex of described main substrate upper surface and main substrate lower surface is found the solution in three dimensions, satisfying under the condition of installing space, obtaining the structure of each polygon panel.
20. the manufacture method such as claim 13 or 19 described polyhedron main substrates, it is characterized in that, in the described step that peripheral board is provided, also comprise the step of peripheral board being carried out the model correction, described model correction comprises, the polygon panel of described peripheral board is divided into up and down two-layer the structure; Remain on the polygon limit number of each polygon panel in the described peripheral board minimum.
21. the job operation of a polyhedron main substrate as claimed in claim 1 may further comprise the steps:
Sheet material blanking, part preprocessing, according to main substrate the polygon sheet material that station, bracing or strutting arrangement installation region and measuring system installation region process respectively each plane of corresponding main substrate outside surface is set, described main substrate outside surface comprises main substrate upper surface, main substrate lower surface and peripheral board;
The sheet material welding comprises the base plate of welding main substrate lower surface and the base plate of corresponding measurement mechanism and body tube device; Weld successively crisscross floor between main substrate upper surface and the main substrate lower surface, finish building of inner skeleton; And,
Each polygon panel sheet material of welding peripheral board.
22. the job operation of polyhedron main substrate as claimed in claim 21 is characterized in that, adopts welding technology between each sheet material of described main substrate, its process sequence adopts and gets on, get off, first interior rear outer mode.
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