CN103253868A - Liquid crystal display screen thinning pretreatment liquid and liquid crystal display screen thinning method - Google Patents
Liquid crystal display screen thinning pretreatment liquid and liquid crystal display screen thinning method Download PDFInfo
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- CN103253868A CN103253868A CN2012100368476A CN201210036847A CN103253868A CN 103253868 A CN103253868 A CN 103253868A CN 2012100368476 A CN2012100368476 A CN 2012100368476A CN 201210036847 A CN201210036847 A CN 201210036847A CN 103253868 A CN103253868 A CN 103253868A
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Abstract
The invention relates to a liquid crystal display screen thinning pretreatment liquid, which comprises, by weight, 5-20% of silanol, 0.1-5% of an inorganic silicate, 0.01-1% of an alkali activator, and the balance of water, wherein the alkali activator is at least one selected from a metal hydroxide and a strong base weak acid salt. According to the present invention, the liquid crystal display screen thinning pretreatment liquid is filled in micro cracks on the surface of glass, and is combined with silicon-oxygen bonds on the surface of glass; and before a glass substrate is subjected to chemical thinning in a HF solution, the chemical substrate is soaked in the liquid crystal display screen thinning pretreatment liquid containing 5-20% by weight of silanol, 0.1-5% by weight of an inorganic silicate and 0.01-1% by weight of an alkali activator, such that enlargement of cracks on the glass substrate in the HF solution during the chemical thinning process is prevented so as to increase a liquid crystal display screen yield. In addition, the present invention further provides a liquid crystal display screen thinning method.
Description
[technical field]
The present invention relates to the etching thining method of liquid crystal display, particularly the thining method of a kind of liquid crystal display attenuate pretreatment fluid and liquid crystal display.
[background technology]
At present the thining method of liquid crystal display has two kinds usually, and a kind of is physics polishing abrasive method, and another kind is the method for chemical milling attenuate, wherein, the method for chemical milling attenuate with its distinctive advantage by comparatively widespread use.The aqueous solution of the hydrofluoric acid that existing chemical milling thining method normally directly adopts is as the chemical milling reducer, glass substrate is carried out the chemical milling attenuate, but in the etching reducer behind the attenuate, the surface of glass substrate can produce a large amount of concave points and cut, even cause thinning glass substrate inhomogeneous, thereby influenced the good article rate of liquid crystal display, increased production cost.
[summary of the invention]
Based on this, be necessary to provide a kind of liquid crystal display attenuate pretreatment fluid that can improve the good article rate of liquid crystal display.
A kind of liquid crystal display attenuate pretreatment fluid comprises that weight percentage is 5%～20% silanol, 0.1%～5% inorganic silicate and 0.01%～1% alkaline activation thing; Surplus is water; Wherein, described alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt.
In a preferred embodiment, described silanol is R
3SiOH or R
2Si (OH)
2, wherein R is methyl, ethyl or propyl group.
In a preferred embodiment, described inorganic silicate is potassium silicate or water glass.
In a preferred embodiment, described metal hydroxides is at least a in sodium hydroxide and the potassium hydroxide; Described strong base-weak acid salt is at least a in yellow soda ash, sodium bicarbonate, salt of wormwood and the saleratus.
In addition, also be necessary to provide a kind of thining method of liquid crystal display of the good article rate that can improve liquid crystal display.
A kind of thining method of liquid crystal display comprises the steps:
Be 5%～20%: 0.1%～5% according to weight percent: 0.01%～1% ratio is mixed with water after taking by weighing silanol, inorganic silicate and alkaline activation material, obtains liquid crystal display attenuate pretreatment fluid; Wherein, described alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt;
Glass substrate is soaked in the described liquid crystal display attenuate pretreatment fluid; And
Described glass substrate after soaking is put into the hydrofluoric acid solution chemical reduction.
In a preferred embodiment, the processing parameter that described glass substrate is soaked in the described liquid crystal display attenuate pretreatment fluid is: soaking temperature is 30 ℃～60 ℃, and soak time is 0.5 hour～2 hours.
In a preferred embodiment, the processing parameter of the glass substrate after soaking being put into described hydrofluoric acid solution chemical reduction is: temperature is 20 ℃～40 ℃.
In a preferred embodiment, the hydrofluoric quality percentage composition in the described hydrofluoric acid solution is 5%～20%.
In a preferred embodiment, described metal hydroxides is at least a in sodium hydroxide and the potassium hydroxide; Described strong base-weak acid salt is at least a in yellow soda ash, sodium bicarbonate, salt of wormwood and the saleratus.
Main component is that weight percentage is 5%～20% silanol, 0.1%～5% inorganic silicate and 0.01%～1% alkaline activation thing in the above-mentioned liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt, the inside of the fine crack by the filling glass surface, and be combined with the siloxane bond of glass surface, thereby prevent that crackle from amplifying in the process of chemical reduction, thereby improve the good article rate of liquid crystal display.Glass substrate carries out before the chemical reduction in HF solution, earlier chemical substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, prevented the amplification of the crackle on the glass substrate in the chemical reduction process in HF solution, above-mentioned liquid crystal display attenuate pretreatment fluid is applied to the technology of reducer crystal display screen, and not only preparation technology is simple, and has improved the good article rate of liquid crystal display.
[description of drawings]
Fig. 1 is the schema of the thining method of an embodiment liquid crystal display;
Fig. 2 is the test set of the attenuate effect of embodiment 1 to embodiment 10.
[embodiment]
Below mainly reach specific embodiment by reference to the accompanying drawings the thining method of liquid crystal display attenuate pretreatment fluid and liquid crystal display be described in further detail.
The liquid crystal display attenuate pretreatment fluid of one embodiment comprises silanol, inorganic silicate and alkaline activation thing, and surplus is water.
The weight percentage of silanol is 5%～20%.In the present embodiment, silanol is R
3SiOH or R
2Si (OH)
2, wherein R is methyl (CH
3-), ethyl (CH
3CH
2-) or propyl group (CH
3CH
2CH
2-).Silanol is attached to the glass micro-crack surface by-OH, forms protective layer, and has filled tiny crack to a certain extent, and the R group has certain hydrophobic nature, and the fluorion of electrolysis is not easy near tiny crack inside, thereby reduces the expansion of tiny crack.If the R carbochain increases or has side chain, the ability that forms protective layer dies down, can variation to the restraining effect of glass surface tiny crack.
The weight percentage of inorganic silicate is 0.1%～5%.In the present embodiment, inorganic silicate is potassium silicate (K
2SiO
3) or water glass (Na
2SiO
3).Inorganic silicate mainly act as the fine crack on filling glass surface, and is combined with the siloxane bond of glass surface, activates glass surface simultaneously.
It is pointed out that the inorganic silicate in the present embodiment is the general name of the compound of silicon, oxygen and other chemical element (mainly being aluminium, iron, calcium, magnesium, potassium, sodium etc.) be combined into.
The weight percentage of alkaline activation thing is 0.01%～1%.The alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt.In the present embodiment, metal hydroxides is at least a among sodium hydroxide (NaOH) and the potassium hydroxide KOH; Strong base-weak acid salt is yellow soda ash (Na
2CO
3), sodium bicarbonate (NaHCO
3), salt of wormwood (K
2CO
3) and saleratus (KHCO
3) at least a.In a preferred embodiment, the alkaline activation thing is at least a in sodium hydroxide and the potassium hydroxide.The effect of alkaline activation thing is that the siloxane bond in the fine crack of glass surface is disconnected, and activates glass simultaneously.
All the other compositions in the liquid crystal display attenuate pretreatment fluid are water.Water is deionized water.
Main component is that weight percentage is 5%～20% silanol, 0.1%～5% inorganic silicate and 0.01%～1% alkaline activation thing in the above-mentioned liquid crystal display attenuate pretreatment fluid, and the alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt, the inside of the fine crack by the filling glass surface, and be combined with the siloxane bond of glass surface, thereby prevent that crackle from amplifying in the process of chemical reduction, thereby improve the good article rate of liquid crystal display.
As shown in Figure 1, the thining method of the liquid crystal display of an embodiment comprises the steps:
Step S1: be 5%～20%: 0.1%～5% according to weight percent: 0.01%～1% ratio is mixed with water after taking by weighing silanol, inorganic silicate and alkaline activation material, obtains liquid crystal display attenuate pretreatment fluid; Wherein, the alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt.
Step S2: glass substrate is soaked in the liquid crystal display attenuate pretreatment fluid.In the present embodiment, the processing parameter that glass substrate is soaked in the liquid crystal display attenuate pretreatment fluid is: soaking temperature is 30 ℃～60 ℃, and soak time is 0.5 hour～2 hours.
Step S3: the glass substrate after will soaking is put into the hydrofluoric acid solution chemical reduction.The processing parameter of glass substrate after soaking being put into the hydrofluoric acid solution chemical reduction is: temperature is 20 ℃～40 ℃.The time of chemical reduction decides according to the thickness of glass needs attenuate, is thinned to 0.6mm as glass from 1.0mm, and the chemical reduction time is 1 hour～5 hours.Wherein, the hydrofluoric quality percentage composition in hydrofluoric acid (HF) solution is 5%～20%.Hydrofluoric quality percentage composition in hydrofluoric acid (HF) solution is higher than 5%～20% and easily causes the liquid crystal display uneven thickness of producing, and can cause production efficiency to descend and be lower than 5%～20%.
In the present embodiment, after glass substrate soaks in liquid crystal display attenuate pretreatment fluid, earlier the glass substrate water is cleaned up, and carry out spending dry 5 minutes～20 minutes at 30 ℃～60 ℃, and then glass basis is carried out chemical reduction in the etching bath that contains HF solution.
Glass substrate carries out before the chemical reduction in HF solution, earlier chemical substrate is soaked in the liquid crystal display attenuate pretreatment fluid, prevented the amplification of the crackle on the glass substrate in the chemical reduction process in HF solution, above-mentioned liquid crystal display attenuate pretreatment fluid is applied to the technology of reducer crystal display screen, and not only preparation technology is simple, and has improved the good article rate of liquid crystal display.
Below be the specific embodiment part, adopting TFT (thin film transistor) glass substrate among the following embodiment is example, will become the thickness of the TFT glass substrate of box to be thinned to 0.6mm from 1.0mm.
Embodiment 1
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 5%: 0.1%: 0.01% ratio takes by weighing (CH according to weight percentage
3)
3SiOH, Na
2SiO
3And mix with water behind the NaOH, be mixed with liquid crystal display attenuate pretreatment fluid.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 30 ℃, and soak time is 2 hours, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 5% hydrofluoric acid solution, and the temperature of chemical reduction is 40 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 1 is the test result of TFT glass substrate.
Table 1
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 33 | 9 | 1 | 0 | 43 |
Embodiment 2
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 5%: 1%: 0.1% ratio takes by weighing (CH according to weight percentage
3)
2Si (OH)
2, K
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is NaOH and KOH.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 60 ℃, and soak time is 0.5 hour, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 15% hydrofluoric acid solution, and the temperature of chemical reduction is 30 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 2 is the test result of TFT glass substrate.
Table 2
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 26 | 11 | 1 | 0 | 38 |
Embodiment 3
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 5%: 5%: 1% ratio takes by weighing (CH according to weight percentage
3CH
2)
3SiOH, K
2SiO
3And mix with water behind the KOH, be mixed with liquid crystal display attenuate pretreatment fluid.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 40 ℃, and soak time is 1.5 hours, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 20% hydrofluoric acid solution, and the temperature of chemical reduction is 20 ℃, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 3 is the test result of TFT glass substrate.
Table 3
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 48 | 17 | 5 | 0 | 70 |
Embodiment 4
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 10%: 0.1%: 0.1% ratio takes by weighing (CH according to weight percentage
3CH
2CH
2)
3SiOH, Na
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is Na
2CO
3And KHCO
3
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 50 ℃, and soak time is 1 hour, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 10% hydrofluoric acid solution, and the temperature of chemical reduction is 35 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 4 is the test result of TFT glass substrate.
Table 4
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 24 | 9 | 2 | 0 | 35 |
Embodiment 5
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 20%: 5%: 0.1% ratio takes by weighing (CH according to weight percentage
3CH
2)
2Si (OH)
2, Na
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is NaOH and KOH.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 55 ℃, and soak time is 1 hour, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 5% hydrofluoric acid solution, and the temperature of chemical reduction is 40 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 5 is the test result of TFT glass substrate.
Table 5
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 8 | 3 | 0 | 0 | 11 |
Embodiment 6
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 20%: 1%: 0.01% ratio takes by weighing (CH according to weight percentage
3CH
2CH
2)
2Si (OH)
2, K
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is NaOH and KOH.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 30 ℃, and soak time is 2 hours, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 10% hydrofluoric acid solution, and the temperature of chemical reduction is 25 ℃, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 6 is the test result of TFT glass substrate.
Table 6
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 9 | 2 | 0 | 0 | 11 |
Embodiment 7
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 10%: 1%: 1% ratio takes by weighing (CH according to the weight percentage ratio
3CH
2)
2Si (OH)
2, Na
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein, the alkaline activation thing is K
2CO
3And KOH.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 45 ℃, and soak time is 1.5 hours, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 15% hydrofluoric acid solution, and the temperature of chemical reduction is 30 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 7 is the test result of TFT glass substrate.
Table 7
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 27 | 11 | 0 | 0 | 38 |
Embodiment 8
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 10%: 5%: 0.01% ratio takes by weighing (CH according to weight percent
3)
3SiOH, K
2SiO
3And NaHCO
3Mix with water the back, is mixed with liquid crystal display attenuate pretreatment fluid.
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 30 ℃, and soak time is 2 hours, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 15% hydrofluoric acid solution, and the temperature of chemical reduction is 30 ℃, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 8 is the test result of TFT glass substrate.
Table 8
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 19 | 4 | 0 | 0 | 23 |
Embodiment 9
(1) preparation liquid crystal display attenuate pretreatment fluid: be that 10%: 5%: 0.01% ratio takes by weighing (CH according to weight percent
3)
2Si (OH)
2, Na
2SiO
3And mix with water behind the alkaline activation thing, be mixed with liquid crystal display attenuate pretreatment fluid, wherein the alkaline activation thing is K
2CO
3And KHCO
3
(2) the TFT glass substrate is soaked in the above-mentioned liquid crystal display attenuate pretreatment fluid, soaking temperature is 60 ℃, and soak time is 0.5 hour, then the TFT glass substrate is cleaned up, and carries out drying.
(3) then the TFT glass substrate being put into the quality percentage composition that contains HF is that chemical reduction is carried out in the etching bath of 20% hydrofluoric acid solution, and the temperature of chemical reduction is 20 ℃, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 9 is the test result of TFT glass substrate.
Table 9
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 14 | 4 | 0 | 0 | 18 |
Comparative Examples
It is that chemical reduction is carried out in the etching bath of 10% hydrofluoric acid solution that the TFT glass substrate is put into the quality percentage composition that contains HF, and the temperature of chemical reduction is 25 ℃, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate behind the attenuate is: be 100 sand paper with 10mm * 10mm size, order number, be positioned on the horizontal checkout platform, TFT glass substrate behind the attenuate is placed on the sand paper, apply the pressure of 5Kg thereon, the quantity of the concave point by causing the different lengths on the TFT glass substrate behind the statistical test characterizes effect.Table 10 is the test result of TFT glass substrate.
Table 10
| Below the 100 μ m | 100～150μm | 150～200μm | More than the 200 μ m | Add up to |
| 126 | 34 | 8 | 2 | 170 |
The above embodiment has only expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but can not therefore be interpreted as the restriction to claim of the present invention.Should be pointed out that for the person of ordinary skill of the art without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (10)
1. a liquid crystal display attenuate pretreatment fluid is characterized in that, comprises that weight percentage is 5%～20% silanol, 0.1%～5% inorganic silicate and 0.01%～1% alkaline activation thing, and surplus is water; Wherein, described alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt.
2. liquid crystal display attenuate pretreatment fluid according to claim 1 is characterized in that, described silanol is R
3SiOH or R
2Si (OH)
2, wherein R is methyl, ethyl or propyl group.
3. liquid crystal display attenuate pretreatment fluid according to claim 1 is characterized in that, described inorganic silicate is potassium silicate or water glass.
4. liquid crystal display attenuate pretreatment fluid according to claim 1 is characterized in that, described metal hydroxides is at least a in sodium hydroxide and the potassium hydroxide; Described strong base-weak acid salt is at least a in yellow soda ash, sodium bicarbonate, salt of wormwood and the saleratus.
5. the thining method of a liquid crystal display is characterized in that, comprises the steps:
Be 5%～20%: 0.1%～5% according to weight percent: 0.01%～1% ratio is mixed with water after taking by weighing silanol, inorganic silicate and alkaline activation material, obtains liquid crystal display attenuate pretreatment fluid; Wherein, described alkaline activation thing is at least a in metal hydroxides and the strong base-weak acid salt;
Glass substrate is soaked in the described liquid crystal display attenuate pretreatment fluid; And
Described glass substrate after soaking is put into the hydrofluoric acid solution chemical reduction.
6. the thining method of liquid crystal display according to claim 5, it is characterized in that, the processing parameter that described glass substrate is soaked in the described liquid crystal display attenuate pretreatment fluid is: soaking temperature is 30 ℃～60 ℃, and soak time is 0.5 hour～2 hours.
7. the thining method of liquid crystal display according to claim 5 is characterized in that, the processing parameter of the glass substrate after soaking being put into described hydrofluoric acid solution chemical reduction is: temperature is 20 ℃～40 ℃.。
8. the thining method of liquid crystal display according to claim 5 is characterized in that, the hydrofluoric quality percentage composition in the described hydrofluoric acid solution is 5%～20%.
9. the thining method of liquid crystal display according to claim 5 is characterized in that, described silanol is R
3SiOH or R
2Si (OH)
2, wherein R is methyl, ethyl or propyl group.
10. the thining method of liquid crystal display according to claim 5 is characterized in that, described metal hydroxides is at least a in sodium hydroxide and the potassium hydroxide; Described strong base-weak acid salt is at least a in yellow soda ash, sodium bicarbonate, salt of wormwood and the saleratus.
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| CN105693105A (en) * | 2016-01-26 | 2016-06-22 | 武汉华星光电技术有限公司 | Thinning method for display panel |
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| CN115010375A (en) * | 2022-04-22 | 2022-09-06 | 深圳市瑞世兴科技有限公司 | Preparation method and application of glass pretreatment liquid |
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| CN101215099A (en) * | 2008-01-16 | 2008-07-09 | 京东方科技集团股份有限公司 | Flat glass substrate attenuation etching liquid |
| CN101634026A (en) * | 2009-08-26 | 2010-01-27 | 北京市太阳能研究所有限公司 | Corrosive liquid for preparing monocrystal silicon textured surface and method thereof |
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| CN105013755A (en) * | 2015-05-13 | 2015-11-04 | 湖北鸿创科技有限公司 | Pre-cleaning method used for pretreatment on liquid crystal display production line |
| CN105693105A (en) * | 2016-01-26 | 2016-06-22 | 武汉华星光电技术有限公司 | Thinning method for display panel |
| CN107272228A (en) * | 2017-05-20 | 2017-10-20 | 合肥市惠科精密模具有限公司 | Special immersion treatment liquid is thinned in a kind of TFT LCD displays |
| CN108504184A (en) * | 2018-04-28 | 2018-09-07 | 惠州市惠阳聚晟化工涂料有限公司 | One kind being used for glass shock resistance ink and its application method |
| CN112174538A (en) * | 2019-07-05 | 2021-01-05 | 维达力实业(深圳)有限公司 | Glass and method for enhancing impact resistance of glass |
| CN112480929A (en) * | 2020-10-23 | 2021-03-12 | 伯恩光学(惠州)有限公司 | Glass thinning agent |
| CN113480185A (en) * | 2021-08-12 | 2021-10-08 | 重庆永信科技有限公司 | Glass thinning pretreatment liquid, glass thinning pretreatment and glass thinning method |
| CN115010375A (en) * | 2022-04-22 | 2022-09-06 | 深圳市瑞世兴科技有限公司 | Preparation method and application of glass pretreatment liquid |
| CN115010375B (en) * | 2022-04-22 | 2023-10-03 | 深圳市瑞世兴科技有限公司 | Preparation method and application of glass pretreatment liquid |
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