Summary of the invention:
Technical problem to be solved by this invention is: in the prior art, in the operation of preparation metallic substrate surface TiN coating, often need to synthesize in advance TiN, again TiN is carried out coating on metallic substrate surface, and in the operation of synthetic TiN, the nitrogen element penetrates into the infiltration effect among the pure Ti, and is undesirable often.
For solving this technical problem, technical scheme provided by the invention is:
The invention provides a kind of method for preparing metallic surface TiN coating, this method is, at first by high energy differential of the arc alloying process in the pure Ti coating of metallic surface deposition one deck, will deposit the pure titanium layer of getting well then, carry out nitriding by the glow ion nitriding technology and handle, form the TiN layer.
Above-mentioned preparation method's concrete steps are:
(1) pre-treatment of Ti electrode pole, with Ti electrode pole through acetone ultrasonic cleaning oil removing, ethanol anhydrate, distilled water dries after cleaning,
Ti electrode pole diameter is 0.5-5mm, and purity is greater than 99.9wt%;
(2) pre-treatment of matrix metal material is with the matrix metal material of well cutting, through 400,800,1000
#Sand paper polish step by step to surface-brightening, with acetone ultrasonic cleaning oil removing, ethanol anhydrate, distilled water cleans, dry at last,
Wherein, matrix metal is selected from stainless steel or titanium alloy, and these materials itself have the favorable mechanical performance, is material commonly used in the association area;
(3) high energy differential of the arc Alloying Treatment; with the Ti electrode pole that obtains in the step (1) as depositing electrode; carry out the operation of high energy differential of the arc alloying in metallic substrate surface; power supply is selected the unidirectional pulse AC power; deposition voltage is that 40-100V is adjustable; frequency is 200-600Hz; the electric current pulsewidth is 100-500 μ s; output rating is 200-3000W, adopts argon shield, and depositing electrode constantly rotates vibrations; the electrode speed of rotation is 800r/min-4500r/min; by the control depositing time, can realize that the Ti coat-thickness is adjustable
When adopting argon shield, the gas flow of argon gas is 5-30L/min,
Flow is too little, does not have provide protection, and flow is too big, then can increase the burden of equipment,
This step be utilize the power supply energy stored by in short-term, high-current pulse is with electrode materials fusing and deposit on the metallic matrix, high-current pulse melts electrode materials in coating forming procedure, and forms metallurgical binding with matrix;
(4) glow ion nitriding is handled, the Ti coating that obtains in the step (3) is put into nitriding furnace, body of heater is as anode, the Ti coating feeds the mixed gas of ammonia or hydrogen and nitrogen as negative electrode, and pressure is 400-1200Pa, nitriding temperature is 450-900 ℃, nitriding time is 3-10 hour, generates the TiN coating
In the mixed gas of hydrogen and nitrogen, the volume ratio of hydrogen and nitrogen is 3:1,
In the nitriding treating processes, body of heater is as anode, and titanium layer is as negative electrode, and nitrogen ion, nitrogen-atoms adsorption and diffusion in the Ti of metallic surface coating that glow discharge produces are easy to by the Ti layer adsorption and permeation of micritization, generate one deck TiN coating in the metallic surface.
The invention has the beneficial effects as follows: the present invention prepares metal Ti N ceramic coating, and operating procedure is simple, with low cost.Among the preparation technology of the present invention, do not need to synthesize in advance TiN, but by high energy differential of the arc alloying technology, utilize high-current pulse that electrode materials is melted, in the pure Ti coating of metallic substrate surface deposition one deck, make it to form metallurgical binding with matrix, post-depositional Ti coating generally has micritization or nanocrystalline structure, being conducive to the nitrogen element like this can be more even, penetrates into more fully in the Ti coating, thereby has guaranteed the use properties of TiN coating.
Embodiment
Embodiment 1:
(1) be 5mm with diameter, purity is put into acetone ultrasonic cleaning oil removing greater than the Ti electrode pole of 99.9wt%, and ethanol anhydrates again, cleans with distilled water at last and dries;
(2) select stainless steel as body material, be cut to 7mm * 10mm * 3mm shape, and polish step by step to surface-brightening with 400#, 800#, 1000#SiC sand paper successively, anhydrate with ethanol, after the acetone oil removing, clean and dry with distilled water flushing;
(3) adopt high energy differential of the arc alloying deposition technique, adjustment apparatus and process parameter is: it is 80V that deposition voltage is set, and frequency is 600Hz, and pulsewidth is 200 μ s, and the electrode speed of rotation is 1500r/min, and argon flow amount is 8L/min, and depositing time is 8min.Can generate the Ti coating that thickness is 16 μ m, titanium coatingsurface light, even compact at stainless steel surface.
(4) again the stainless steel of depositing Ti coating, put into that Wuhan glow plasma Equipment for Heating Processing company limited produces, model is in the nitriding furnace of MC-55AQK, carry out glow ion nitriding, selection gas is ammonia, and pressure is 400Pa, nitriding temperature is 450 ℃, and nitriding time is 4h.Treat that nitriding finishes the back and takes out sample, formed the TiN coating at stainless steel surface.
After tested, coating hardness is higher than 60HRC, and the compactness of coating is good, because ceramic coating itself is anti-corrosion, so corrosive nature is better; Be metallurgical binding with matrix in addition, because in the deposition process be the fusion mode, bonding force is good.
Embodiment 2:
The working method of step (1) and step (2) shown in embodiment 1,
(3) adopt high energy differential of the arc alloying deposition technique, adjustment apparatus and process parameter is: it is 90V that deposition voltage is set, and frequency is 400Hz, and pulsewidth is 150 μ s, and the electrode speed of rotation is 1000r/min, and argon flow amount is 5L/min, and depositing time is 6min.Can generate the Ti coating that thickness is 13 μ m, titanium coatingsurface light, even compact at stainless steel surface;
(4) again the stainless steel of depositing Ti coating, put into that Wuhan glow plasma Equipment for Heating Processing company limited produces, model is in the nitriding furnace of MC-55AQK, carry out glow ion nitriding, selecting gas is the mixed gas (hydrogen nitrogen volume ratio is 3:1) of hydrogen and nitrogen, pressure is 600Pa, and nitriding temperature is 550 ℃, and nitriding time is 8h.Treat that nitriding finishes the back and takes out sample, formed the TiN coating at stainless steel surface.
After tested, coating hardness is higher than 60HRC, and the compactness of coating is good, because ceramic coating itself is anti-corrosion, so corrosive nature is better; Be metallurgical binding with matrix in addition, because in the deposition process be the fusion mode, bonding force is good.
Embodiment 3:
Select the TC4 titanium alloy as body material, the working method of step (1) and step (2) shown in embodiment 1,
(3) adopt high energy differential of the arc alloying deposition technique, adjustment apparatus and process parameter is: it is 70V that deposition voltage is set, and frequency is 500Hz, and pulsewidth is 300 μ s, and the electrode speed of rotation is 1200r/min, and argon flow amount is 10L/min, and depositing time is 5min.Can generate thickness at the TC4 titanium alloy surface is the Ti coating of 11 μ m, titanium coatingsurface light, even compact;
(4) again the TC4 titanium alloy of depositing Ti coating, put into that Wuhan glow plasma Equipment for Heating Processing company limited produces, model is in the nitriding furnace of MC-55AQK, carry out glow ion nitriding, selection gas is ammonia, and pressure is 1100Pa, nitriding temperature is 900 ℃, and nitriding time is 3h.Treat that nitriding finishes the back and takes out sample, formed the TiN coating at the TC4 titanium alloy surface.
After tested, coating hardness is higher than 60HRC, and the compactness of coating is good, because ceramic coating itself is anti-corrosion, so corrosive nature is better; Be metallurgical binding with matrix in addition, because in the deposition process be the fusion mode, bonding force is good.
Embodiment 4:
Select the TC4 titanium alloy as body material, the working method of step (1) and step (2) shown in embodiment 1,
(3) adopt high energy differential of the arc alloying deposition technique, adjustment apparatus and process parameter is: it is 100V that deposition voltage is set, and frequency is 300Hz, and pulsewidth is 400 μ s, and the electrode speed of rotation is 1300r/min, and argon flow amount is 8L/min, and depositing time is 12min.Can generate thickness at the TC4 titanium alloy surface is the Ti coating of 22 μ m, titanium coatingsurface light, even compact;
(4) again the TC4 titanium alloy of depositing Ti coating, put into that Wuhan glow plasma Equipment for Heating Processing company limited produces, model is in the nitriding furnace of MC-55AQK, carry out glow ion nitriding, selecting gas is the mixed gas (hydrogen nitrogen volume ratio is 3:1) of hydrogen and nitrogen, pressure is 1200Pa, and nitriding temperature is 800 ℃, and nitriding time is 6h.Treat that nitriding finishes the back and takes out sample, formed the TiN coating at the TC4 titanium alloy surface.
After tested, coating hardness is higher than 60HRC, and the compactness of coating is good, because ceramic coating itself is anti-corrosion, so corrosive nature is better; Be metallurgical binding with matrix in addition, because in the deposition process be the fusion mode, bonding force is good.