CN103219218A - Plasma etcher loading system - Google Patents
Plasma etcher loading system Download PDFInfo
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- CN103219218A CN103219218A CN201310123525XA CN201310123525A CN103219218A CN 103219218 A CN103219218 A CN 103219218A CN 201310123525X A CN201310123525X A CN 201310123525XA CN 201310123525 A CN201310123525 A CN 201310123525A CN 103219218 A CN103219218 A CN 103219218A
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- guide post
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- tray rack
- lifting
- sheet
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Abstract
A plasma etcher loading system comprises a loading cavity body and a cavity cover, a sealing ring is arranged between the loading cavity body and the cavity cover, a manipulator sheet taking and sending opening is formed in one side of the loading cavity body, a gate valve is arranged in the sheet taking and sending opening and connected with a manipulator cavity body, the loading cavity body is connected with a vacuum mechanical pump and an external air source, a tray rack of a supporting sheet tray is arranged inside the loading cavity body, the tray rack is provided with a plurality of supporting positions of the supporting sheet tray, each supporting position is provided with a notch which allows the sheet tray to leave, the tray rack is fixed on a base frame which is connected with a lifting rotating device, the lifting rotating device comprises a lifting operation portion and a rotating operation portion, the lifting operation portion comprises a guide rod, a lifting motor and a lifting transmission mechanism, the rotating operation portion comprises a rotating motor and a rotating transmission mechanism which is used for connecting the guide rod with the rotating motor, and a gap between the guide rod and the cavity body is sealed. The plasma etcher loading system has the advantages of being large in productivity of the sheet tray and capable of achieving batch machining.
Description
Technical field
The present invention relates to the Load System in plasma etching machine field, particularly a kind of plasma etching machine.
Background technology
Plasma etching, it is modal a kind of form in the dry etching, its principle is that the gas that is exposed to electronics regions forms plasma, the gas that consequent ionized gas and release high energy electron are formed, thereby plasma or ion have been formed, when the ionized gas atom quickens by electric field, can discharge enough strength and surperficial expulsion power tightly jointing material or etched surfaces.
Etching is important procedure in semiconductor, microelectronics and the LED manufacture process, etching is to utilize chemistry or physical method selectively from the process of silicon chip or the unwanted material of Sapphire Substrate sheet surface removal, integrated level raising along with semiconductor device, the live width of semiconductor device is more and more littler, the control of critical size is also more and more important, and is also more and more higher to the requirement of etching technics.Distinguish from technology, etching can be divided into wet etching and dry etching.Dry etching is a plasma etching, feeds etching gas usually in plasma processing apparatus, and the described etching gas of ionization becomes plasma, utilizes described plasma that wafer to be etched is carried out etching.Existing method for etching plasma forms the photoresist figure at laminar surface to be etched usually, is that mask carries out etching to described layer to be etched with described photoresist figure.Dry etching is selected than high because anisotropy is good, and controllability, flexibility, good reproducibility are easily realized automation, and distinguishing features such as cleanliness factor height become one of current the most frequently used etching technics.
The etch rate and the etching homogeneity of plasma etching machine are most important to wafer fabrication.At first, etch rate is fast, and the etch period required for identical etching depth is just few, and production efficiency just can be improved.Secondly, etching homogeneity has conclusive effect for the yield that improves product.
Load System is the important component part of plasma etching machine as man-machine communication's window, promptly before etching process begins to be etched dish is put into load chamber, transfer to process cavity by manipulator, after the etching process end, manipulator is sent the sheet dish back to load chamber, thereby takes out the sheet dish.And there are problems in the load chamber system of existing most of dry etching machines, mainly is that sheet dish throughput is less, or even the monolithic etching, and automaticity is low, can not realize batch machining, can't adapt to the large-scale industrial production demand.
Summary of the invention
Have the shortcoming that the sheet dish amount of telling is little, can not realize batch machining in order to overcome existing plasma etching machine Load System, it is big to the invention provides a kind of dish amount of telling, and can realize the Load System of the plasma etching machine of batch machining.
The Load System of plasma etching machine comprises and loads cavity and chamber lid that load between the lid of cavity and chamber and be provided with sealing ring, loading cavity one side is provided with manipulator and fetches and delivers the sheet mouth, fetches and delivers outlet for lantern slide and is provided with gate valve, and gate valve is connected with the manipulator cavity; Load cavity and connect vacuum mechanical pump and extraneous source of the gas;
Load the tray rack that inside cavity is provided with holding sheet dish, tray rack has the holding position of a plurality of holding sheet dishes, and each holding position is equipped with the breach that allows the sheet dish to leave, and tray rack is fixed on the underframe, and underframe is connected with lift rotating equipment;
Lift rotating equipment comprises the lifting operate portions that the drive tray rack lifts or falls, with the rotary work portion of drive tray rack rotation with conversion holding position, the lifting operate portions comprises inserts the guide post that loads in the cavity, lifting motor and the elevating drive mechanism that is connected guide post and lifting motor; Rotary work portion comprises electric rotating machine and the rotating actuator that is connected guide post and electric rotating machine; Clearance seal between guide post and the cavity.
Further, elevating drive mechanism comprises the reductor that is connected with the output shaft of lifting motor, and leading screw that is connected with guide post and the shaft coupling that is connected leading screw and reductor offer the screw that meshes with leading screw in the guide post, and guide post only moves up and down during the leading screw rotation.
Further, rotating actuator comprises worm gear that is fixed on the guide post and the worm screw that is connected with the output shaft of electric rotating machine, the worm and gear engaged transmission, and electric rotating machine is a stepping motor, holding position of a tray rack rotation of electric rotating machine stepping; Be fixed with the carriage of holding rotary work portion on the guide post.
Further, guide post is sheathed in the vacuum ripple pipe, and the bump joint at vacuum ripple pipe two ends is individually fixed on the guide post, and the vacuum ripple pipe is with protective sleeve outward; Vacuum ripple pipe bottom is connected with back tightening nut, and the other end of back tightening nut and reductor shell are by being threaded.
Further, each holding position is equipped with step groove, and the sheet dish is positioned on the step groove.
Further, the chamber covers and is provided with observation window.
Use of the present invention is as follows: earlier to be etched dish is positioned on the holding position of tray rack, closes chamber lid and gate valve, connect vacuum mechanical pump on the vacuum measuring device connector.Then, opening vacuum mechanical pump vacuumizes loading cavity.After reaching the equipment predetermined vacuum level, the lifting operate portions drives tray rack and rises.At this moment, open gate valve, manipulator enters and loads in the cavity, and manipulator is positioned at the tray rack below.Then, the lifting operate portions descends, and the sheet dish of tray rack falls in the mechanical arm.Manipulator reclaims, and the sheet dish is deviate from the holding position from breach, and manipulator is sent into the sheet dish in the etch chamber of etching machine, and simultaneously, gate valve cuts out.After sheet dish etching was finished, gate valve was opened, and manipulator is sent into the sheet dish and loaded in the cavity, and the lifting operate portions rises tray rack, holds up the sheet dish, and manipulator is recalled.Lifting operate portions then falls tray rack.Make tray rack rotate to next holding position by rotary work portion again, repeat above-mentioned the sheet dish is sent into etch chamber and sent the sheet dish that etching is finished back to load cavity step, the sheet dish in loading cavity is by all etchings are intact.After sheet dish etching was finished, extraneous source of the gas was inflated in loading cavity, made the loading cavity interior suitable with ambient pressure, opened the chamber lid, took out the sheet dish.
The invention has the beneficial effects as follows: can a plurality of dishes of disposable loading, can realize polydisc etching automatically continuously, the production efficiency height, the automaticity height can adapt to the large-scale industrial production demand.
Description of drawings
Fig. 1 is a stereogram of the present invention.
Fig. 2 is a bottom schematic view of the present invention.
Fig. 3 is the schematic diagram of cavity.
Fig. 4 is a cutaway view of the present invention.
Fig. 5 is a front view of the present invention.
Embodiment
The Load System of plasma etching machine comprises and loads cavity 1 and chamber lid 2 that load between cavity 1 and the chamber lid 2 and be provided with sealing ring 4, loading cavity 1 one sides are provided with manipulator and fetch and deliver sheet mouth 8, fetch and deliver sheet mouth 8 places and are provided with gate valve, and gate valve is connected with the manipulator cavity; Load cavity 1 and connect vacuum mechanical pump and extraneous source of the gas.Load and be provided with the vacuum suction passage 9 that connects vacuum mechanical pump, inlet channel 8 that is connected with extraneous source of the gas and the detection mouth that is connected with vacuum checking device in the cavity 1.Sealing ring 4 is installed in the seal groove that loads cavity.
Load the tray rack 10 that cavity 1 inside is provided with holding sheet dish, tray rack 10 has the holding position of a plurality of holding sheet dishes, and each holding position is equipped with the breach that allows the sheet dish to leave, and tray rack 10 is fixed on the underframe 11, and underframe 11 is connected with lift rotating equipment;
Lift rotating equipment comprises the lifting operate portions that drive tray rack 10 lifts or falls, with the rotary work portion of drive tray rack 10 rotations with conversion holding position, the lifting operate portions comprises inserts the guide post 13 that loads in the cavity 1, lifting motor 21 and the elevating drive mechanism that is connected guide post 13 and lifting motor 21; Rotary work portion comprises electric rotating machine 22 and is connected the rotating actuator of guide post 13 with electric rotating machine 22; Clearance seal between guide post 13 and the loading cavity 1.
Elevating drive mechanism comprises the reductor 20 that is connected with the output shaft of lifting motor 21, leading screw 14 that is connected with guide post 13 and the shaft coupling that is connected leading screw 14 and reductor 20, offer the screw that meshes with leading screw 14 in the guide post 13, guide post 13 only moves up and down during leading screw 14 rotations.Leading screw 14 adopts ball-screw.Guide post 13 is equivalent to the nut with the screw mandrel engagement, and after the rotary freedom of guide post 13 was limited, guide post 13 was only axially done rectilinear motion along it.
Rotating actuator comprises the worm screw 24 that the worm gear 25 that is fixed on the guide post 13 is connected with output shaft with electric rotating machine 22, the worm and gear engaged transmission, and electric rotating machine 22 is a stepping motor, holding position of tray rack of electric rotating machine 22 steppings 10 rotations; Be fixed with the carriage of holding rotary work portion on the guide post 13.Worm screw 24 is fixing with electric rotating machine 22 by worm screw mount pad 23.
Certainly, rotating actuator also can use gear drive, and driving gear is connected with electric rotating machine 22, and driven gear is fixed on the guide post 13.The gearratio height of worm gear 25 worm screws 24 mechanisms, it is little to have a volume, light weight and alleviate the advantage of the carrying burden of guide post 13.
In addition, when electric rotating machine 22 was not worked, rotating actuator also played the position-limiting action that stops guide post 13 rotations, made guide post 13 rise or to descend along straight line.
Each holding position is equipped with step groove, and the sheet dish is positioned on the step groove.The sheet dish places and can prevent on the step groove that the sheet dish from because of reasons such as vibration break away from the holding position, playing the effect of location.
Use of the present invention is as follows: earlier to be etched dish is positioned on the holding position of tray rack 10, closes chamber lid 2 and gate valve, connect vacuum mechanical pump on the vacuum measuring device connector.Then, opening vacuum mechanical pump vacuumizes loading cavity 1.After reaching vacuum measuring device and detecting the vacuum degree of loading in the cavity 1 and reach preset value, the lifting operate portions drives tray rack 10 and rises, and at this moment, opens gate valve, and manipulator enters in the loading cavity 1, and manipulator is positioned at tray rack 10 belows.Then, the lifting operate portions descends, and the sheet dish of tray rack 10 falls in the mechanical arm.Manipulator reclaims, and the sheet dish is deviate from the holding position from breach, and manipulator is sent into the sheet dish in the etch chamber of etching machine, and simultaneously, gate valve cuts out.After sheet dish etching was finished, gate valve was opened, and manipulator is sent into the sheet dish and loaded in the cavity 1, and the lifting operate portions rises tray rack 10, holds up the sheet dish, and manipulator is recalled.Lifting operate portions then falls tray rack 10.Make tray rack 10 rotate to next holding position by rotary work portion again, repeat above-mentioned the sheet dish is sent into etch chamber and sent the sheet dish that etching is finished back to load cavity 1 step, the sheet dish in loading cavity 1 is finished by whole etchings.After sheet dish etching was finished, extraneous source of the gas is inflation in loading cavity 1, made loading cavity 1 interior suitable with ambient pressure, opened chamber lid 2, took out the sheet dish.
The invention has the beneficial effects as follows: can a plurality of dishes of disposable loading, can realize polydisc etching automatically continuously, the production efficiency height, the automaticity height can adapt to the large-scale industrial production demand.
The described content of this specification embodiment only is enumerating the way of realization of inventive concept; protection scope of the present invention should not be regarded as only limiting to the concrete form that embodiment states, protection scope of the present invention also reach in those skilled in the art conceive according to the present invention the equivalent technologies means that can expect.
Claims (6)
1. the Load System of plasma etching machine, it is characterized in that: comprise and load cavity and chamber lid that load between the lid of cavity and chamber and be provided with sealing ring, loading cavity one side is provided with manipulator and fetches and delivers the sheet mouth, fetch and deliver outlet for lantern slide and be provided with gate valve, gate valve is connected with the manipulator cavity; Load cavity and connect vacuum mechanical pump and extraneous source of the gas;
Load the tray rack that inside cavity is provided with holding sheet dish, tray rack has the holding position of a plurality of holding sheet dishes, and each holding position is equipped with the breach that allows the sheet dish to leave, and tray rack is fixed on the underframe, and underframe is connected with lift rotating equipment;
Lift rotating equipment comprises the lifting operate portions that the drive tray rack lifts or falls, with the rotary work portion of drive tray rack rotation with conversion holding position, the lifting operate portions comprises inserts the guide post that loads in the cavity, lifting motor and the elevating drive mechanism that is connected guide post and lifting motor; Rotary work portion comprises electric rotating machine and the rotating actuator that is connected guide post and electric rotating machine; Clearance seal between guide post and the cavity.
2. the Load System of plasma etching machine as claimed in claim 1, it is characterized in that: elevating drive mechanism comprises the reductor that is connected with the output shaft of lifting motor, leading screw that is connected with guide post and the shaft coupling that is connected leading screw and reductor, offer the screw that meshes with leading screw in the guide post, guide post only moves up and down during the leading screw rotation.
3. the Load System of plasma etching machine as claimed in claim 2, it is characterized in that: rotating actuator comprises worm gear that is fixed on the guide post and the worm screw that is connected with the output shaft of electric rotating machine, the worm and gear engaged transmission, electric rotating machine is a stepping motor, holding position of a tray rack rotation of electric rotating machine stepping; Be fixed with the carriage of holding rotary work portion on the guide post.
4. the Load System of plasma etching machine as claimed in claim 3, it is characterized in that: guide post is sheathed in the vacuum ripple pipe, and the bump joint at vacuum ripple pipe two ends is individually fixed on the guide post, and the vacuum ripple pipe is with protective sleeve outward; Vacuum ripple pipe bottom is connected with back tightening nut, and the other end of back tightening nut and reductor shell are by being threaded.
5. as the Load System of one of claim 1-4 described plasma etching machine, it is characterized in that: each holding position is equipped with step groove, and the sheet dish is positioned on the step groove.
6. the Load System of plasma etching machine as claimed in claim 5, it is characterized in that: the chamber covers and is provided with observation window.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310123525.XA CN103219218B (en) | 2013-04-10 | 2013-04-10 | The Load System of plasma etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310123525.XA CN103219218B (en) | 2013-04-10 | 2013-04-10 | The Load System of plasma etching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103219218A true CN103219218A (en) | 2013-07-24 |
| CN103219218B CN103219218B (en) | 2016-03-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310123525.XA Expired - Fee Related CN103219218B (en) | 2013-04-10 | 2013-04-10 | The Load System of plasma etching machine |
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| Country | Link |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017080447A1 (en) * | 2015-11-12 | 2017-05-18 | 纳恩博（北京）科技有限公司 | Moving and rotating mechanism and intelligent robot |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203205377U (en) * | 2013-04-10 | 2013-09-18 | 天通吉成机器技术有限公司 | Loading system of plasma etching machine |
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2013
- 2013-04-10 CN CN201310123525.XA patent/CN103219218B/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN203205377U (en) * | 2013-04-10 | 2013-09-18 | 天通吉成机器技术有限公司 | Loading system of plasma etching machine |
Non-Patent Citations (1)
| Title |
|---|
| 张钦亮;苏静洪;王谟;平志韩;雍春娥;祝启蒙;金志杰;: "《一种干法刻蚀机的新型装载腔设计 》", 《制造技术与机床》, no. 3, 2 March 2013 (2013-03-02), pages 60 - 61 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017080447A1 (en) * | 2015-11-12 | 2017-05-18 | 纳恩博（北京）科技有限公司 | Moving and rotating mechanism and intelligent robot |
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| Publication number | Publication date |
|---|---|
| CN103219218B (en) | 2016-03-30 |
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Granted publication date: 20160330 |
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