CN103205785A - A film stripping process - Google Patents
A film stripping process Download PDFInfo
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- CN103205785A CN103205785A CN2012100107739A CN201210010773A CN103205785A CN 103205785 A CN103205785 A CN 103205785A CN 2012100107739 A CN2012100107739 A CN 2012100107739A CN 201210010773 A CN201210010773 A CN 201210010773A CN 103205785 A CN103205785 A CN 103205785A
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- ultrasonic
- stripping
- releasing
- releasing process
- demoulding
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Abstract
The invention discloses a film stripping process which includes two film stripping modes: an ultrasonic stripping mode and a spraying washing stripping mode. The film stripping process is a cycle process, and a cycle unit is ultrasonic stripping -> spraying washing. The film stripping process comprises at least 1, and preferably 3 cycle units. The spraying washing includes two steps of soaking and spraying. The same film stripping solution is used in both the ultrasonic stripping step and the spraying washing stripping step, and the main component of the film stripping solution is alkali. The film stripping process provide by the present invention has the advantages that: dry film inside the electroformed openings can be completely stripped, and there is no damage to a mask plate; ultrasonic vibration is employed, so unique effects can be achieved to the decomposition and stripping of dry film in parts with complex shapes, multiple openings and small-sized openings; and the cost is low, thus being convenient for large-scale use and promotion.
Description
Technical field
The present invention relates to a kind of releasing process of electroforming metal mask plate, belong to material processing field, be specifically related to the demoulding technology in a kind of aftertreatment technology of electroforming metal mask plate.
Background technology
Make the field in high precision now, as precise electrotyping, the market of electroforming web plate is increasing, and therefore a whole set of technology to the electroforming metal mask plate also requires more and more ripe.
Electroforming be utilize ionic with the material electroforming of want electroforming on core (substrate), leave the dry film opening figure zone after the exposure on the core (substrate), the ion of deposition material is along the dry film marginal growth in opening figure zone, lengthening along with the electroforming time, deposit thickness increases, and will form the electroformed layer opening identical with the dry film opening figure.After electroforming process is finished, need the dry film of clone's electroformed layer opening figure is taken off the film processing, and because the opening size of electroformed layer is very little, calculate with micron order, so the exposure dry film that is attached in the electroformed layer opening is difficult to take off, often only be difficult to it is taken off except clean by the single membrane method that takes off, all can have dry film to remain in perforated wall.If this residual dry film is untimely disposing, will impact in the subsequent applications of electroforming metal mask plate, such as: the mask used for printing plate that is used for SMT, by the opening on the mask plate, printing material drains on the PCB substrate, forms the transfer of mask plate upper shed figure, if leave residual film in the opening, will certainly the seepage of printing material be impacted, tin is bad under producing, and causes printing defects.
Handling the photosensitive dry film cardinal principle is alkali reductive polymerization thing, namely destroys the molecular linkage of membrane polymer, make it be reduced to small molecules, and be dissolved in the liquid parting, but the dry film after the single alkaline purification exposure is difficult to dry film is removed totally.For this reason, must carry out releasing process on this basis and improve, to guarantee under the prerequisite of not damaging mask plate, with the dry film Ex-all.
Summary of the invention
The objective of the invention is to propose a kind of releasing process.Use this kind releasing process and can solve the dry film residue problem that occurs when single alkali is removed dry film.Use the releasing process among the present invention, have following advantage:
(1) dry film of electroforming opening the inside all can be purified, and to not damage of mask plate;
(2) use sonic oscillation, for dry film complex-shaped, opening position many, that opening size is little decompose, coming off more has unique effects;
(3) with low cost, be convenient to large-scale the use and promote.
The present invention relates to a kind of demoulding technology, specifically, releasing process of the present invention is at the releasing process of the aftertreatment technology step of printing back mask plate.
A kind of demoulding technology is characterized in that, comprises two kinds of demoulding modes in the releasing process: the ultrasonic demoulding and spray washing.
What releasing process adopted is circulation technology, with the ultrasonic demoulding and the unit of spray washing as a circulation, carries out operation repeatedly, to reach the effect of removing dry film.
In releasing process was handled, the cycling element number of times was no less than 1 time, and preferably, cycle index is 3 times.
In the ultrasonic step of releasing process, ultrasonic parameter comprises ultrasonic frequency and ultrasonic time, and specifically, ultrasonic frequency is at 4~6KHz, and ultrasonic time is at 1~5min.
In the spray water-washing step of releasing process, comprise and soak and sprayed for two steps.
Specifically, soak time is 3~10min, and spray time is 10~60s.
In each step of each cycling element, comprise the ultrasonic demoulding and spray washing, all use identical releasing liquid.
Specifically, the main component of liquid parting is water soluble alkali, and the concentration of releasing liquid is 1-3mol/L, and the temperature the during demoulding is 40-50 ℃.
Use the advantage of the ultra-sonic dispersion among the present invention to be: the acoustic pressure drastic change when ultrasonic wave is propagated in liquid makes liquid that strong cavitation and emulsion take place, produce millions of micro-bubbles p.s., these bubbles produce under the acoustic pressure effect hastily in a large number, and fierce explosion constantly, produce strong wallop and negative-pressure sucking, be enough to make the dry film that remains in the opening to remove totally.
When ultrasonic wave is propagated in liquid, because the high vibration of liquid particle can produce little cavity at liquid internal.These little cavities swell rapidly and are closed, can make the fierce effect of impact of generation between the liquid particle, thereby produce several thousand to several ten thousand atmospheric pressure, this violent interaction between particulate, the temperature of liquid is raise suddenly, played good stirring action, thereby make two kinds of immiscible liquid generation emulsifications, and add the dissolving of fast solute, accelerate chemical reaction.
Using ultrasound concussion adds spray and handles the fracture of strengthening the dry film molecular linkage, reaching the effect that the dry film process in the electroforming opening is clean, and to not damage of mask plate.
This kind function just because of ultrasonic makes demoulding effect improved, adds the mechanical effect of spray washing, can impel the acceleration chemical reaction, and makes and the easier disengaging of dry film reach the clean purpose of demoulding.
Additional aspect of the present invention and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present invention.
Embodiment
Following examples are used for explanation the present invention, but are not used for limiting the scope of the invention.
The present invention discloses the releasing process in a kind of aftertreatment technology of electroforming mask plate.
Embodiment 1
At thickness 0.15mm, the figure A/F is the mask plate of 0.2mm in the present embodiment, and the releasing process parameter of the aftertreatment of carrying out is as follows:
Cycle index | 3 |
Ultrasonic frequency | 5KHz |
Ultrasonic time | 3min |
Soak time | 5min |
Spray time | 60s |
Releasing liquid concentration | 2mol/L |
Calcining temperature | 45℃ |
By the metal mask plate after science and engineering is planted herein, its smooth surface, no burr, no dry film is residual.
Embodiment 2
At thickness 0.2mm, the figure A/F is the mask plate of 0.1mm in the present embodiment, and the releasing process parameter of the aftertreatment of carrying out is as follows:
Cycle index | 10 |
Ultrasonic frequency | 6KHz |
Ultrasonic time | 5min |
Soak time | 10min |
Spray time | 60s |
Releasing liquid concentration | 2.5mol/L |
Calcining temperature | 45℃ |
By the metal mask plate after science and engineering is planted herein, its smooth surface, no burr, no dry film is residual.
Embodiment 3
At thickness 0.15mm, the figure A/F is the mask plate of 0.15mm in the present embodiment, and the releasing process parameter of the aftertreatment of carrying out is as follows:
Cycle index | 5 |
Ultrasonic frequency | 5KHz |
Ultrasonic time | 3min |
Soak time | 8min |
Spray time | 60s |
Releasing liquid concentration | 2.5mol/L |
Calcining temperature | 45℃ |
By the metal mask plate after science and engineering is planted herein, its smooth surface, no burr, no dry film is residual.
Claims (9)
1. a demoulding technology is characterized in that, comprises two kinds of demoulding modes in the releasing process: the ultrasonic demoulding and spray washing.
2. releasing process according to claim 1 is characterized in that, releasing process is circulation technology, and cycling element is: ultrasonic demoulding → spray washing.
3. releasing process according to claim 1 and 2 is characterized in that, the cycling element number of releasing process is no less than 1.
4. releasing process according to claim 1 and 2 is characterized in that, the spray water wash bags are drawn together immersion and sprayed for two steps.
5. according to claim 1,2 or 3 described releasing processes, it is characterized in that the cycling element number is preferably 3.
6. releasing process according to claim 1 is characterized in that, the ultrasonic demoulding is washed with spray and used identical releasing liquid in two steps.
7. releasing process according to claim 1 is characterized in that, the process parameters range of the ultrasonic demoulding is as follows:
。
8. releasing process according to claim 1 is characterized in that, the process parameters range of spray washing is as follows:
。
9. releasing process according to claim 1 is characterized in that, the main component of liquid parting is water soluble alkali, and the concentration of releasing liquid is 1-3mol/L, and calcining temperature is 40-50 ℃.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2012100107739A CN103205785A (en) | 2012-01-16 | 2012-01-16 | A film stripping process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN2012100107739A CN103205785A (en) | 2012-01-16 | 2012-01-16 | A film stripping process |
Publications (1)
Publication Number | Publication Date |
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CN103205785A true CN103205785A (en) | 2013-07-17 |
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CN2012100107739A Pending CN103205785A (en) | 2012-01-16 | 2012-01-16 | A film stripping process |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106289913A (en) * | 2016-09-24 | 2017-01-04 | 中海油常州涂料化工研究院有限公司 | A kind of liquid parting for inorganic zinc-rich coating surface corrosion product and preparation method thereof and using method |
CN107059071A (en) * | 2017-04-20 | 2017-08-18 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
CN107119288A (en) * | 2017-05-23 | 2017-09-01 | 上海天马有机发光显示技术有限公司 | Mask plate and preparation method thereof |
CN108267929A (en) * | 2017-01-03 | 2018-07-10 | 昆山国显光电有限公司 | The cleaning method and device of mask plate |
CN110113872A (en) * | 2019-04-29 | 2019-08-09 | 武汉利之达科技股份有限公司 | A kind of PCB moves back membrane process, manufacturing method and system |
CN110408965A (en) * | 2019-08-16 | 2019-11-05 | 河南理工大学 | A kind of micro electroforming part removes gluing method |
CN111304701A (en) * | 2020-04-01 | 2020-06-19 | 集美大学 | Preparation method for assisting ultra-precise electroforming demolding by using graphene oxide |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106289913A (en) * | 2016-09-24 | 2017-01-04 | 中海油常州涂料化工研究院有限公司 | A kind of liquid parting for inorganic zinc-rich coating surface corrosion product and preparation method thereof and using method |
CN108267929A (en) * | 2017-01-03 | 2018-07-10 | 昆山国显光电有限公司 | The cleaning method and device of mask plate |
CN107059071A (en) * | 2017-04-20 | 2017-08-18 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
CN107059071B (en) * | 2017-04-20 | 2019-05-24 | 上海天马有机发光显示技术有限公司 | A kind of release method of electroforming mask plate |
CN107119288A (en) * | 2017-05-23 | 2017-09-01 | 上海天马有机发光显示技术有限公司 | Mask plate and preparation method thereof |
CN107119288B (en) * | 2017-05-23 | 2019-08-02 | 上海天马有机发光显示技术有限公司 | Mask plate and preparation method thereof |
CN110113872A (en) * | 2019-04-29 | 2019-08-09 | 武汉利之达科技股份有限公司 | A kind of PCB moves back membrane process, manufacturing method and system |
CN110408965A (en) * | 2019-08-16 | 2019-11-05 | 河南理工大学 | A kind of micro electroforming part removes gluing method |
CN111304701A (en) * | 2020-04-01 | 2020-06-19 | 集美大学 | Preparation method for assisting ultra-precise electroforming demolding by using graphene oxide |
CN111304701B (en) * | 2020-04-01 | 2021-02-26 | 集美大学 | Preparation method for assisting ultra-precise electroforming demolding by using graphene oxide |
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