CN103205694B - Mask aligning device and alignment method thereof - Google Patents
Mask aligning device and alignment method thereof Download PDFInfo
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- CN103205694B CN103205694B CN201210010748.0A CN201210010748A CN103205694B CN 103205694 B CN103205694 B CN 103205694B CN 201210010748 A CN201210010748 A CN 201210010748A CN 103205694 B CN103205694 B CN 103205694B
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- mask
- mask frame
- registration holes
- pin
- frame
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Abstract
The present invention relates to a kind of mask aligning device and alignment method thereof, mask frame 3 is put on para-position base station 4 so that it is side contacts with pin 5,6,7；Again mask plate 11 is lain in a horizontal plane on mask frame 3, it is ensured that the two fits tightly；The registration holes 13,14 on mask plate 11 and mask frame 3 and registration holes 1,2 is accurately caught by CCD；Carry software by device and read the maximum deflection difference value L of holes registration holes 1 and 13,2 and 14；If difference exceeds ± 15 μm, adjust pin and catch the registration holes 1 and 13 and 2 and 14 on mask plate and mask frame with CCD the most again, again read off relative standard deviation values L between two groups of registration holes；Repeat fine setting like this to read, until L controls in ± 15 μm.The present invention can make mask plate and mask frame exactitude position, and makes its position deviation control in ± 15 μm.
Description
Technical field
The present invention relates to a kind of mask aligning device and alignment method thereof, belong to the manufacture field of organic electroluminescent device.
Background technology
Organic electroluminescent device (OLED), because its visual angle is wide, low cost, manufacturing process are simple, resolution is high and provides the features such as luminescence for oneself, receives much concern, and is considered to make the emerging application technology of follow-on flat-panel screens.
In terms of manufacturing the vacuum deposition apparatus of organic electroluminescent device, the crucible holding organic material is set in bottom, is set using organic material heating, the heater of evaporation in the outside of crucible.In evaporation coating device, the chuck with crucible relative configuration is set and sandwiches the insulating element of glass substrate and make this substrate that the substrate fixture of the bottom surface being maintained at chuck to be installed.Mask assembly includes mask plate and mask frame, chuck is to be plane flat board for maintaining glass substrate, in substrate presss from both sides, elevating mechanism is set, and on elevating mechanism, it is provided with fixture, by fixture permanent mask framework, make it control within the specific limits relative to the position deviation of substrate, there is limitation.Lift dog, makes mask assembly near substrate.
And when manufacturing organic illuminating element, on substrate, the pixel of every 10um width must be arranged side by side by the illuminating part of red, green, blue, the positional precision of each pixel is necessary for ± degree of 5um；During having due to evaporation, temperature constantly raises, and is affected by sheet material expanded by heating, and mask assembly can produce position deviation relative to substrate, therefore the highest to the position accuracy demand of vacuum deposition apparatus mask.
It is to carry out para-position by the anchor point on mask plate and substrate during evaporated device on mask assembly, debug scope due to the position of mask frame and there is limitation, mask plate is welded on again on mask frame, make to carry out para-position only by mask plate anchor point and substrate and cannot meet position schedule requirement, it is necessary to assure mask plate also to control within the specific limits with the position deviation of mask frame.
And at present in the manufacture field of evaporation mask plate, the assembling equipment of mask plate cannot accomplish mask plate and mask frame efficiently, para-position in high precision.
Summary of the invention
The present invention provides a kind of mask aligning device and relevant alignment method, it is possible to makes mask plate and mask frame exactitude position, and makes its position deviation control in ± 15 μm.
For problem above, the present invention proposes below scheme:
A kind of mask aligning device, for para-position mask plate and mask frame, it is characterized in that: include base station, pin, pull unit, described mask plate, described mask frame, described pin and described pull unit are respectively positioned on base station, being respectively provided with registration holes on described mask plate and described mask frame, described pin can finely tune its position by described pull unit.
Registration holes shape on described mask plate is identical with the registration holes shape on described mask frame, quantity is equal, equal in magnitude.
Preferably, described registration holes can be the shape such as square hole, circular hole, the registration holes at least two on described mask plate and described mask frame.
The inward flange that the inward flange of described base station is positioned at described mask frame is inboard.
Described pin can be in the optional position in the outer rim length range of described mask frame, and the number of described pin is at least three.
When the pin in described mask frame one side is one, pin is positioned at the centre position on this limit of mask frame.
When described mask frame on one side in pin be two time, two pins are about the middle point symmetry on this limit of mask frame.
Preferably, in described mask frame outer rim, at least there is pin on two limits.
A kind of mask aligning method, it is characterised in that use aforementioned mask alignment device to realize.
Described mask aligning method, it is characterised in that step includes: mask frame is put on para-position base station so that it is side contacts with pin；Mask plate is lain in a horizontal plane on mask frame, it is ensured that the two fits tightly；The registration holes on mask plate and mask frame is accurately caught by CCD；Carry software by device and read the maximum deflection difference value of corresponding registration holes；If difference exceeds ± 15 μm, adjust pin；Again use CCD(Charge-coupled Device, charge coupled cell) catch the registration holes on mask plate and mask frame, read relative standard deviation values between two groups of registration holes；Repeat to read the deviation value of two groups of registration holes, until controlling in ± 15 μm.
The alignment device of the present invention and supporting alignment method can make mask plate and mask frame exactitude position, and make its position deviation control in ± 15 μm.
Accompanying drawing explanation
Below in conjunction with the accompanying drawings the detailed description of the invention of the present invention is described in further detail.
The structural representation of Fig. 1 mask aligning device.
Wherein: 1,2 is mask frame registration holes；3 is mask frame；4 is para-position base station；5,6,7 it is pin.
Fig. 2 is the top view of mask aligning device.
Fig. 3 is mask plate and mask frame para-position schematic diagram.
Wherein: 11 is mask plate；12 is mask plate opening；13,14 is mask plate registration holes.
Fig. 4 is the deviation schematic diagram of registration holes.
Wherein: 13,14 is mask plate registration holes；1,2 is mask frame registration holes；L is the maximum position deviation of 1 and 13, and 2 is identical with this with the maximum position deviation of 14.
Fig. 5 is the flow chart of mask aligning method.
Detailed description of the invention
Embodiment
Shown in Fig. 1, Fig. 3 and Fig. 4, mask frame 3 is put on para-position base station 4 so that it is side contacts with pin 5,6,7；Again mask plate 11 is lain in a horizontal plane on mask frame 3, it is ensured that the two fits tightly；The registration holes 13,14 on mask plate and mask frame 3 and registration holes 1,2 is accurately caught by CCD；Carry software by device and read corresponding two pairs of holes registration holes 1 and the maximum deflection difference value L of 13 and 2 and 14, i.e. cross the center of circle and do straight line, holes ipsilateral penumbra distance on this line；If difference exceeds ± 15 μm, adjust pin and catch the corresponding registration holes 1 and 13 and 2 and 14 on mask plate and mask frame with CCD the most again, again read off relative standard deviation values L between two groups of registration holes；Repeat fine setting like this to read, until L controls in ± 15 μm.
Above example is intended to indicate that the present invention, rather than limits the scope of the invention, and all each falls within protection scope of the present invention in the simple transformation made under conditions of spiritual principles of the present invention.
Claims (9)
1. a mask aligning method, it uses a kind of mask aligning device to realize, it is characterised in that step includes: be put in by mask frame on para-position base station so that it is side contacts with pin；Mask plate is lain in a horizontal plane on mask frame, it is ensured that the two fits tightly；The registration holes on mask plate and mask frame is accurately caught by CCD；Carry software by device and read the maximum deflection difference value of corresponding registration holes；If difference exceeds ± 15 μm, adjust pin；Again catch the registration holes on mask plate and mask frame with CCD, read relative standard deviation values between two groups of registration holes；Repeat to read the deviation value of two groups of registration holes, until controlling in ± 15 μm, described mask aligning device includes base station, pin, pull unit, described mask plate, described mask frame, described pin and described pull unit are respectively positioned on base station, being respectively provided with registration holes on described mask plate and described mask frame, described pin can finely tune its position by described pull unit.
Mask aligning method the most according to claim 1, it is characterised in that the registration holes shape on described mask plate is identical with the registration holes shape on described mask frame, quantity is equal, equal in magnitude.
Mask aligning method the most according to claim 2, it is characterised in that described registration holes is square hole or circular hole shape.
Mask aligning method the most according to claim 1 and 2, it is characterised in that the registration holes at least two on described mask plate and described mask frame.
Mask aligning method the most according to claim 1, it is characterised in that the inward flange that the inward flange of described base station is positioned at described mask frame is inboard.
Mask aligning method the most according to claim 1, it is characterised in that described pin can be in the optional position in the outer rim length range of described mask frame, and the number of described pin is at least three.
Mask aligning method the most according to claim 6, it is characterised in that when the pin in described mask frame is one, pin is positioned at the centre position on this limit of mask frame.
Mask aligning method the most according to claim 6, it is characterised in that when the pin in described mask frame is two, two pins are about the middle point symmetry on this limit of mask frame.
Mask aligning method the most according to claim 1, it is characterised in that in described mask frame outer rim, at least there is pin on two limits.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010748.0A CN103205694B (en) | 2012-01-16 | 2012-01-16 | Mask aligning device and alignment method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010748.0A CN103205694B (en) | 2012-01-16 | 2012-01-16 | Mask aligning device and alignment method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103205694A CN103205694A (en) | 2013-07-17 |
| CN103205694B true CN103205694B (en) | 2016-12-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210010748.0A Expired - Fee Related CN103205694B (en) | 2012-01-16 | 2012-01-16 | Mask aligning device and alignment method thereof |
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| Country | Link |
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| CN (1) | CN103205694B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107868931A (en) * | 2016-09-23 | 2018-04-03 | 昆山国显光电有限公司 | Precision metallic shade, oled substrate and its alignment method |
| CN110629160B (en) * | 2019-10-31 | 2022-01-14 | 京东方科技集团股份有限公司 | Mask plate assembly |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101603167A (en) * | 2008-06-13 | 2009-12-16 | 阿德文泰克全球有限公司 | Mask size is adjusted station-keeping system and method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3702754B2 (en) * | 2000-06-14 | 2005-10-05 | 三菱電機株式会社 | Alignment device |
| KR20060114462A (en) * | 2005-04-29 | 2006-11-07 | 엘지전자 주식회사 | Apparatus and method of clamping mask for organic electro luminescence display device |
| JP2010106358A (en) * | 2008-09-30 | 2010-05-13 | Canon Inc | Film formation mask and film formation method using the same |
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2012
- 2012-01-16 CN CN201210010748.0A patent/CN103205694B/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101603167A (en) * | 2008-06-13 | 2009-12-16 | 阿德文泰克全球有限公司 | Mask size is adjusted station-keeping system and method |
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|---|---|
| CN103205694A (en) | 2013-07-17 |
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