CN103191889B - A kind of clean method for gleam image intensifier photocathode input window - Google Patents
A kind of clean method for gleam image intensifier photocathode input window Download PDFInfo
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- CN103191889B CN103191889B CN201210002565.4A CN201210002565A CN103191889B CN 103191889 B CN103191889 B CN 103191889B CN 201210002565 A CN201210002565 A CN 201210002565A CN 103191889 B CN103191889 B CN 103191889B
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Abstract
The invention discloses a kind of clean method for gleam image intensifier photocathode input window, be mainly used in the surface cleaning of gleam image intensifier photocathode glass input window and fibre faceplate input window.Its main technical schemes is: development is a kind of adopts plasma cleaning technique, clean the surface of image intensifier photocathode input window, its technological process is by preparing cleaning solution, cleaning workpiece, flushing workpiece, Ultrasonic Cleaning, rinsing workpiece, drying workpiece, workpiece installation again, regulating argon pressure, plasma cleaning, end program and inspection to form.The present invention passes through probationary certificate: reach development object completely, and fundamentally take former method operating efficiency low, cost is high, affects the deficiencies such as environment.Effectively ensure that the quality of photocathode, raise the efficiency, adapt to the demand that modern gleam image intensifier is produced in enormous quantities completely.
Description
Technical field
The present invention relates to a kind of optical glass to electron tube, the method for fibre faceplate surface cleaning, is mainly used in the surface cleaning of gleam image intensifier multialkali photocathode glass input window and fibre faceplate input window.Also can be used for the surface cleaning of similar photocathode input window.
Background technology
Be that the vacuum opto-electronic device of representative has a wide range of applications in the industry such as national defence, scientific research with gleam image intensifier, receive widespread attention international and domestic.Gleam image intensifier (see figure 1), forms primarily of the parts such as negative electrode input window, photocathode, cone electrode or microchannel plate, fluorescent screen, anode output window.Its operation principle: under night low-illumination, by the scene image that human eye can not directly be seen, corresponding photoelectron image is converted to by the photocathode on negative electrode input window, photoelectron image is through boring amplification, the enhancing of electrode or microchannel plate electron multiplier, accelerate through anode high voltage again, convert the enough optical imagerys of brightness to by fluorescent screen, eventually pass anode output window and export, watch for human eye.
The making of its photocathode needs to carry out under UHV condition, require simultaneously want the multialkali photocathode glass input window 1 of evaporation or fibre faceplate input window 2 (clean-up performance see Fig. 2 surface be quite high, requirement reaches Atomically clean, and namely the trace level chemical substance on input window surface is zero.Adopt general chemistry or mechanical cleaning, after completion, from microcosmic, surface as glass input window in fact still retains a part of chemical residue, like this when its surperficial evaporation photocathode, because photocathode coating growth is a kind of semiconductor film, therefore the trace level chemical substance remaining in glass surface will have an impact to the stuctures and properties of photocathode, the technical performance of photocathode instability and technical indicator is caused obviously to decline, badly influence the quality of gleam image intensifier, therefore in the manufacture process of image intensifier, Atomically clean is reached in order to make input window surface, often need to carry out machine glazed finish to glazing surface, and then clean, dry.Owing to adopting the way of machine glazed finish, generally can only single-piece production, polishing piecemeal.Concrete technique is: 90g cerium rouge (Cerox 1650) is put into pure water, is to stir under the environment of 20 DEG C in temperature; Regulate compressed-air actuated air pressure, make rubbing head pressure be about 1.5 atmospheric pressure, according to the forward and backward eccentric wheel of the surface modulation polishing machine of the input window of wanted polishing, make the displacement of left and right directions equal, the rotating speed regulating polishing machine is 1000 revs/min, regulates the time of polishing machine timer; Workpiece is put into polishing chuck, start timer and start polishing, after polishing terminates, take off workpiece, clean up with pure water, then put into work supporting block, and work supporting block is put into the stainless steel cask filling pure water, repeat above process until work supporting block filled by workpiece; After work supporting block is filled, then work supporting block is put into ultrasonic cleaner, ultrasonic 5 minutes, take out work supporting block, with pure water rinsing work supporting block and workpiece 1 minute, change the pure water in stainless steel cask afterwards, again work supporting block is put into ultrasonic cleaner, more ultrasonic 5 minutes; After ultrasonic end, take out work supporting block, then use pure water rinsing 1 minute, take off a workpiece from work rest, put into centrigugal swing dryer, workpiece is dried piecemeal, put into culture dish.Repeat this process, dry whole workpiece and put into culture dish; Finally workpiece is inspected by random samples by technical requirement.
The method of this machine glazed finish is utilized to clean photocathode input window, although the technical requirement of part can be reached.But this kind of method expends time in longer, operating efficiency is low, and cost is high, the inadaptable demand produced in enormous quantities far away.Simultaneously owing to using polishing powder, certain pollution is also produced to environment.
Summary of the invention
Main task of the present invention and object are, according to the defect existing for the existing cleaning method to the surface machine glazed finish of gleam image intensifier multialkali photocathode input window, development is a kind of adopts plasma cleaning technique, the surface of gleam image intensifier multialkali photocathode glass input window and fibre faceplate input window is cleaned, fundamentally take former method can only single-piece operate, operating efficiency is low, and cost is high, affects the deficiencies such as environment.Reach and effectively ensure photocathode quality, raise the efficiency, adapt to the demand that modern gleam image intensifier is produced in enormous quantities completely.
Main technical schemes of the present invention is: carry out plasma cleaning, its technological process to gleam image intensifier photocathode glass input window and fibre faceplate input window surface:
A, preparation cleaning solution.A certain amount of washing agent is put into stainless steel cask, backward bucket in inject a certain amount of pure water and fully mix, form cleaning solution, pure water and washing agent ratio are volume ratio 100:1, and namely concentration is 1%;
B, cleaning workpiece.Hand-held clean sponge, is stained with the outer surface that workpiece cleaned gently by cleaning solution, and every part workpiece is about the several seconds, puts into work supporting block afterwards, repeats this process until cleaned a collection of workpiece;
C, flushing workpiece.With pure water rinsing workpiece and work rest 1 minute, put into the stainless steel cask that clean pure water is housed afterwards;
D, Ultrasonic Cleaning.Stainless steel cask is put into ultrasonic cleaner, ultrasonic 5 minutes;
E, rinse workpiece again.After ultrasonic end, take out work supporting block, then use pure water rinsing 1 minute;
F, drying workpiece.Take off a workpiece from work rest, put into centrigugal swing dryer, workpiece is dried, puts into culture dish.Repeat this process, and drying workpiece is loaded one by one
fixed bolsterin;
G, workpiece are installed.Workpiece will be housed
fixed bolsterload in the quartz ampoule of plasma cleaner, shut quartz ampoule hermatic door;
H, adjustment argon pressure.Open argon gas pressure-reducing valve, make output argon pressure reach 0.1MPa;
I, plasma cleaning.Start plasma cleaner working procedure, first quartzy cavity is vacuumized and reach 10
-4torr, is then filled with argon gas to quartzy cavity, makes Stress control in quartz ampoule cavity 10
-2torr, starts glow discharge afterwards, carries out plasma cleaning 7 minutes to workpiece;
J, end program.Turn off argon gas, in quartzy cavity, be filled with nitrogen, when the pressure recover in quartzy cavity is to atmospheric pressure, open quartzy cavity door, take out
fixed bolster, by workpiece from
fixed bolsteron take out one by one, put into culture dish;
K, inspection.According to batch and quantity, workpiece is inspected by random samples, with syringe, pure water is dropped in surface of the work, pure water scatters rapidly or scatters disappearance, explanation workpiece is qualified, if pure water still keeps the shape of water droplet to scatter, then workpiece is defective, illustrates that surface of the work exists one deck chemical residue and other impurity.If occur, underproof phenomenon need double sampling observation or carry out one-hundred-percent inspection, is again cleaned by underproof workpiece 4 by operation.
The present invention passes through probationary certificate: reach development object completely, and compared with traditional machine glazed finish cleaning method, efficiency improves more than 5 times, cost reduces 70%, environmentally safe, workpiece reaches 100% substantially in the qualification rate of this procedure, adapts to the demand produced in enormous quantities completely.For solving a large technical barrier in my company and even the sector.
Accompanying drawing explanation
Below in conjunction with accompanying drawing, the present invention is described in further detail.
Fig. 1 is the primary structure schematic diagram of gleam image intensifier.
Fig. 2 is the multialkali photocathode fibre faceplate input window schematic diagram of gleam image intensifier.
Fig. 3 is process chart of the present invention.
Fig. 4 is the present invention
fixed bolster3 and the installation site structural representation of workpiece 4.
Detailed description of the invention
With reference to Fig. 1,2,3,4, be described main technical schemes of the present invention: plasma cleaning is carried out on the surface of gleam image intensifier photocathode glass input window 1 and fibre faceplate input window 2, its concrete technology flow process is the same.Described plasma cleaner is: GDR-10PR type, major parameter: frequency 13.56MHz, power 300W, and market can be purchased; Washing agent is: RBS-25 type concentrates neutral detergent, and market can be purchased; Supersonic wave cleaning machine is: 1012S type, and market can be purchased;
fixed bolster3(is shown in Fig. 4): according to the erecting tools of the feature designed, designed of plasma cleaning, its structure by step post (3-2) on base plate (3-1) face, by workpiece 4(input window) the large minispread of external diameter assemble.
Claims (2)
1. the clean method for gleam image intensifier photocathode input window, rinse workpiece, D Ultrasonic Cleaning containing operation C, E rinse workpiece again, F dries workpiece, it is characterized in that: the concrete technology flow process of plasma cleaning is carried out on the surface of gleam image intensifier photocathode glass input window (1) and fibre faceplate input window (2):
A, preparation cleaning solution, put into stainless steel cask by a certain amount of washing agent, backward bucket in inject a certain amount of pure water and fully mix, form cleaning solution, pure water and washing agent ratio are volume ratio 100:1, and namely concentration is 1%;
B, cleaning workpiece, hand-held clean sponge, is stained with the outer surface that workpiece (4) cleaned gently by cleaning solution, and every part workpiece is about the several seconds, puts into work supporting block afterwards, repeats this process until cleaned a collection of workpiece;
C, rinse workpiece, with pure water rinsing workpiece (4) and work rest 1 minute, put into the stainless steel cask that clean pure water is housed afterwards;
D, Ultrasonic Cleaning, put into ultrasonic cleaner by stainless steel cask, ultrasonic 5 minutes;
E, rinse workpiece again, after ultrasonic end, take out work supporting block, then use pure water rinsing 1 minute;
F, drying workpiece, take off a workpiece (4) from work rest, put into centrigugal swing dryer, dried by workpiece, put into culture dish, repeat this process, and loaded one by one by drying workpiece in fixed bolster (3);
G, workpiece are installed, and the fixed bolster (3) that workpiece (4) will be housed loads in the quartz ampoule of plasma cleaner, shuts quartz ampoule hermatic door;
H, adjustment argon pressure, open argon gas pressure-reducing valve, make output argon pressure reach 0.1MPa;
I, plasma cleaning, start plasma cleaner working procedure, first vacuumize quartzy cavity and reach 10
-4torr, is then filled with argon gas to quartzy cavity, makes Stress control in quartz ampoule cavity 10
-2torr, starts glow discharge afterwards, carries out plasma cleaning 7 minutes to workpiece (4);
J, end program, turn off argon gas, in quartzy cavity, be filled with nitrogen, when the pressure recover in quartzy cavity is to atmospheric pressure, open quartzy cavity door, take out fixed bolster (3), taken out one by one by workpiece (4), put into culture dish from fixed bolster (3);
K, inspection, according to batch and quantity, inspect by random samples workpiece (4), with syringe, pure water is dropped in surface of the work, pure water scatters rapidly or scatters disappearance, explanation workpiece is qualified, if pure water still keeps the shape of water droplet to scatter, then workpiece is defective, illustrates that surface of the work exists one deck chemical residue and other impurity, if occur, underproof phenomenon need double sampling observation or carry out one-hundred-percent inspection, is again cleaned by underproof workpiece (4) by operation.
2. the clean method for gleam image intensifier photocathode input window according to claim 1, is characterized in that: fixed bolster (3), is assembled by the large minispread of external diameter of workpiece (4) by step post (3-2) on base plate (3-1) face.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210002565.4A CN103191889B (en) | 2012-01-06 | 2012-01-06 | A kind of clean method for gleam image intensifier photocathode input window |
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| CN103191889B true CN103191889B (en) | 2015-08-26 |
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| CN112895480A (en) * | 2021-01-14 | 2021-06-04 | 北方夜视技术股份有限公司 | Processing method for improving adhesion between surface of low-light-level image intensifier tube and packaging material |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101665910A (en) * | 2008-09-04 | 2010-03-10 | 浙江师范大学 | Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation |
| CN102179390A (en) * | 2010-11-25 | 2011-09-14 | 西安北方捷瑞光电科技有限公司 | Method for cleaning ultra-smooth surface |
| CN102605334A (en) * | 2012-03-13 | 2012-07-25 | 宁波大学 | Preparation method for Ge-Sb-Se amorphous film of all-optical device |
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| TWI229017B (en) * | 2004-03-16 | 2005-03-11 | Powerchip Semiconductor Corp | Surface cleaning method of wafer carrying mechanism of semiconductor machine |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101665910A (en) * | 2008-09-04 | 2010-03-10 | 浙江师范大学 | Method for cleaning SiO* substrate used in alloy films made by vacuum evaporation |
| CN102179390A (en) * | 2010-11-25 | 2011-09-14 | 西安北方捷瑞光电科技有限公司 | Method for cleaning ultra-smooth surface |
| CN102605334A (en) * | 2012-03-13 | 2012-07-25 | 宁波大学 | Preparation method for Ge-Sb-Se amorphous film of all-optical device |
Non-Patent Citations (1)
| Title |
|---|
| 等离子清洗在电子元器件中的应用;孙祖琴;《机电元件》;20100331(第1期);全文 * |
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