CN103163740A - Position measuring device for tilted object - Google Patents
Position measuring device for tilted object Download PDFInfo
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- CN103163740A CN103163740A CN2011104168188A CN201110416818A CN103163740A CN 103163740 A CN103163740 A CN 103163740A CN 2011104168188 A CN2011104168188 A CN 2011104168188A CN 201110416818 A CN201110416818 A CN 201110416818A CN 103163740 A CN103163740 A CN 103163740A
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Abstract
The present invention provides a position measuring device for a tilted object. Along a light path direction, the position measuring device successively comprises an illumination unit for generating uniform illumination light; a marking plate perpendicular to an optical axis of the illumination light; a mark adjustment unit for projecting a mark on the marking plate to different positions on a first plane not perpendicular to the optical axis of the illumination light; a projection imaging unit for projecting a mark image passing through the mark adjustment unit to a to-be-tested surface of the tilted object, wherein the first plane and the to-be-tested surface are conjugated in relative to the projection imaging unit; a receiving imaging unit for receiving the mark image reflected by the to-be-tested surface, wherein the projection imaging unit and the receiving imaging unit are in a double telecentric structure; an image space adjusting unit for adjusting the mark image formed by the receiving imaging unit to different positions on a second plane perpendicular to the optical axis of the illumination light; and a detection unit with a detection surface, wherein the marked image on the second plane is projected to the detection surface. The position changes of the to-be-tested surface in an optical axis direction of an objective lens result in that the mark image on the detection surface generates corresponding position changes.
Description
Technical field
The present invention relates to field of lithography, relate in particular to the tilting body position-measurement device for lithographic equipment.
Background technology
Projection mask aligner a kind ofly projects to device on the silicon chip face to the pattern on mask by object lens.In apparatus for projection exposure, must there be Auto-focus control system the silicon chip face accurately to be brought into the exposure position of appointment, realize that there is multiple different technical scheme in this system.Relatively more commonly used at present is the non-contact type photoelectricity measuring technique, its common ground is that in measuring system, opticator has all adopted the optical texture that satisfies Scheimpflug condition (thing that namely tilts looking like of becoming satisfied condition), fundamental purpose is to make to be marked at imaging clearly on the silicon chip face, reduce measuring error, improve measuring accuracy.In order to achieve the above object, denomination of invention has adopted the offset lens structure for having adopted the structure of ladder reflecting mirror in the Chinese patent 200610119021.0 of " a kind of optical system of focusing and leveling sensor " in US Patent No. 5414515.When adopting ladder reflecting mirror, its fixed sturcture is convenient, but it needs imaging system that substance markers is imaged onto on ladder reflecting mirror, reaches the purpose of compensation.And when adopting lens compensation, offset lens is placed on positions different after substance markers, and the design and installation of offset lens have all been proposed very high requirement, complex structure.
Summary of the invention
The invention provides a kind of tilting body position-measurement device, comprise successively along optical path direction:
Lighting unit for generation of Uniform Illumination light;
Marking plate perpendicular to described illumination light optical axis;
With the mark on described marking plate project to described optical axis not perpendicular the first plane on the mark adjustment unit at diverse location place;
To be projected to through the marker image of described mark adjustment unit the projection imaging unit of the tested surface of described tilting body, described the first plane and described tested surface are with respect to described projection imaging unit object-image conjugate;
Receive the reception image-generating unit of the marker image of described tested surface reflection, described projection imaging unit and described reception image-generating unit are double telecentric structure;
The marker image that described reception image-generating unit is become is adjusted to picture side's adjustment unit at the place of diverse location on the second plane vertical with described optical axis;
With the probe unit with test surface, the marker image on described the second plane is projected to described test surface;
The change in location of described tested surface on described objective lens optical axis direction causes the marker image on described test surface to produce corresponding change in location on described test surface.
Wherein, described projection imaging unit and reception image-generating unit satisfy the SC image-forming condition.
Wherein, described mark adjustment unit has the object with reflecting surface at a plurality of spatially diverse locations place, and described reflecting surface is used for reflection through the incident light of described marking plate.
Wherein, described object is catoptron.
Wherein, on described catoptron, the incident angle of chief ray is spent less than or equal to 45.
Wherein, equate in horizontal and vertical distance between two adjacent catoptrons.
Wherein, described mark adjustment unit also has the turnover catoptron, is used for the light that described mirror reflects goes out is reflexed to described projection imaging unit to regulate optical path direction.
Wherein, described object is a plurality of mutual gummeds and reflecting prism with identical appearance size, and each incidence point zone on described reflecting prism is coated with reflectance coating.
Wherein, described mark adjustment unit also has for the compensating plate of adjusting light path.
Wherein, described reflecting prism quantity is two.
Wherein, described compensating plate has the first compensating plate and the second compensating plate, described the first compensating plate and described incidence point zone gummed away from the described reflecting prism of projection imaging unit, described the second compensating plate and described incidence point zone gummed near the described reflecting prism of projection imaging unit, described the first compensating plate is than described the second compensation thickness of slab.
Wherein, described mark adjustment unit also have one with prism near the described reflecting prism gummed of projection imaging unit, a face of described prism is vertical with emergent light.
Wherein, also have after described picture side adjustment unit be used to the relaying amplification imaging unit that amplifies described marker image, described relaying amplification imaging unit is that double telecentric structure and enlargement ratio are greater than 1 times.
Wherein, also has the unidirectional convergence unit that compresses for the non-direction of measurement of described marker image after described relaying amplification imaging unit and before described probe unit.
Wherein, described unidirectional convergence unit has the corresponding cylindrical mirror of line number of the described mark on a plurality of quantity and non-direction of measurement.
Wherein, the pass of detecting on described test surface between the displacement Δ z of the displacement Δ x of described marker image and described tested surface is:
Δx=2×f1×Δz×sinθ×f2，
Wherein, θ is the angle between the emergent light of described the first plane and described mark adjustment unit, and f1 is the multiplying power of described reception image-generating unit, and f2 is the enlargement ratio of described relaying amplification imaging unit.
Wherein, the value of described f1 is 1, and the value of described f2 is more than or equal to 10.
The present invention combines the advantage of two kinds of different structures in prior art, a kind of employing catoptron of imaging system or compensation scheme of reflecting prism of not needing proposed, and the direct measuring system of this scheme for the tilting body surface location, it is simple in structure, is convenient to design and installation.And see through and adjust offset angle or position, can also reduce the useful area of mark, reduce the design field of follow-up magnifying optics, reduce the structural design difficulty.
Description of drawings
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Figure 1 shows that the structural representation according to position-measurement device of the present invention;
Figure 2 shows that the structural representation of unidirectional convergence unit;
Figure 3 shows that a kind of structural representation of adjustment unit;
Figure 4 shows that a variant of adjustment unit;
Figure 5 shows that a kind of expansion structure of adjustment unit;
Figure 6 shows that the another kind of structural representation of adjustment unit;
Figure 7 shows that another structural representation of adjustment unit.
Embodiment
Describe specific embodiments of the invention in detail below in conjunction with accompanying drawing.
Figure 1 shows that the structural representation according to position-measurement device of the present invention, this device comprises and arranging along optical path direction: the lighting unit that is comprised of wideband light source 1 and illuminated mirror group 2, marking plate 3, mark adjustment unit 4, by projection front lens group 5, catoptron 6, projection rear lens group 7, the projection imaging unit that catoptron 8 and catoptron 9 consist of, by catoptron 9 ', catoptron 8 ', receive front lens group 7 ', the reception image-generating unit that catoptron 6 ' and reception rear lens group 5 ' consist of, picture side's adjustment unit 4 ', by the group 11 relaying amplification imaging unit that consist of after group 10 and relay lens before relay lens, unidirectional convergence unit 12, probe unit 13 consists of.Tested surface s is that objective lens optical axis AX direction changes in coordinate Z direction, and the direction that is reacted to the change in location of marker image on test surface on test surface 13 is X-direction, and above-mentioned change direction is direction of measurement, and vertical direction is non-direction of measurement with it.
the light that light source 1 sends is through illuminated mirror group 2 Uniform Illumination marking plates 3, marking plate 3 is perpendicular to axial direction, a plurality of marks on marking plate 3 through mark adjustment unit 4, each mark is adjusted at from lighting optical axis not perpendicular the first plane on different positions, the first plane and tested surface are with respect to projection imaging unit object-image conjugate, marker image after adjustment is imaged onto on tested surface s through the projection imaging cell projection, be imaged as the reception mark through tested surface s reflection by receiving image-generating unit, pass through again as square adjustment unit 4 ' and adjust to second plane vertical with lighting optical axis receiving mark, namely receive index face IS, on the diverse location place, be imaged onto on test surface 13 through relaying amplification imaging unit and unidirectional convergence unit 12.Projection imaging unit and reception image-generating unit are two heart SC structures far away with respect to the optical axis AX left-right symmetric of object lens PO, and its multiplying power is generally 1 times, will analyze based on 1 times of multiplying power in follow-up explanation.Relaying amplification imaging unit is also double telecentric structure, and its enlargement ratio is greater than 1 times.Mark adjustment unit 4 is identical with picture side's adjustment unit 4 ' principle, and the marker image on the mark structure on marking plate and IS face is just the same.
When the position of tested surface s changes, reception after adjustment is marked on the IS face and also is subjected to displacement, the position of snoop tag on test surface 13 that forms after the relay imaging amplification system is amplified also can produce corresponding variation, reaches after treatment the purpose of measurement.Suppose that tested surface s is Δ z along the Z-direction displacement, angle between the emergent light of the first plane and mark adjustment unit is θ, the multiplying power that receives image-generating unit is f1, the enlargement ratio of relaying amplification imaging unit is f2, and the pass of detecting on test surface 13 between the displacement Δ z of the displacement Δ x of picture of snoop tag and tested surface s is: Δ x=2 * f1 * Δ z * sin θ * f2.
Getting f1 during general design is 1 times, and θ is greater than 74 °, and following formula becomes Δ x ≈ 2 * f2 * Δ z.Thereby the enlargement ratio f2 of relaying amplification imaging unit directly affects the sensitivity of measurement, generally gets f2 greater than 10 times, thereby can reach very high Measurement Resolution.
Figure 2 shows that the structural representation of unidirectional convergence unit 12, consisted of by a plurality of cylindrical mirrors, its in the position in system as shown in coordinate system in figure, on it, what of cylindrical mirror are corresponding with the line number of mark on non-direction of measurement Y, mainly that the snoop tag on non-direction of measurement is compressed, improve the signal intensity of snoop tag, thereby be conducive to improve the measuring accuracy of system.
Figure 3 shows that a kind of structural representation of adjustment unit.Adjustment unit 4a is made of three catoptron a1, a2, the a3 at the place of diverse location spatially, and on catoptron, the incident angle of chief ray is 45 degree, wherein equates in horizontal and vertical distance between two adjacent catoptrons, and the below is to its adjustment principle brief description.
This structure is moved towards figure as shown in Figure 3 with what the mark of the adjustment unit 4 of marking was adjusted, light path is reverse when as picture side's adjustment unit 4 ' can play and the opposite effect of mark adjustment unit, only reception mark P1 ', P2 ', P3 ' are adjusted into P1, P2, P3 on the IS face, are not described in detail in this.
When this structure is placed in measuring system, as long as keep adjusting the relative position relation of catoptron, can be placed on the position of light path any appropriate, easily install.
Although schematically provided the embodiment of three gauge points in figure, in fact can be consisted of by a plurality of marks, be not limited to three marks.
Figure 4 shows that a variant of above-mentioned adjustment unit, adjustment unit is made of three catoptron b1, b2, the b3 at the place of diverse location spatially, wherein equates in horizontal and vertical distance between two adjacent catoptrons.Only the incident angle on its three catoptrons becomes less than 45 degree.End-state after adjusting through it and result shown in Figure 3 are identical, the angle of the optical axis direction of the first plane s1 that mark P1 ', the P2 ' after namely adjusting, P3 ' consist of and projection imaging unit is θ, and with tested surface s with respect to projection imaging unit image conjugation.
the difference of the structure in itself and Fig. 3 is catoptron (b1, b2, mark spacing n(b on mark 3 after less incident angle is arranged b3)) become than catoptron (a1, a2, mark spacing n(a on mark 3 after larger incident angle is arranged a3)) less, such benefit is that imaging adjustment unit 4 ' adopts the apparent field that receives the face IS that mark consists of after the described structure of Fig. 4 can become less, be conducive to the design of follow-up relaying amplification imaging system, enlargement ratio can design De Genggao, the exposure field area of tested surface s is larger, the advantage of this structure is just more obvious.
Figure 5 shows that a kind of expansion of the adjustment unit in Fig. 3.It is compared with the structure of Fig. 3 and has been a turnover catoptron c0 many, is used for the light that catoptron (c1, c2, c3) reflects is reflexed to the projection imaging unit to regulate optical path direction, and light path is carried out in a direction, and is compacter on structure.
Figure 6 shows that the another kind of structural representation of adjustment unit.Adjustment unit is formed by reflecting prism d1 and the d2 gummed of two (mark greater than 3 time can be also a plurality of) identical appearance sizes, and each incidence point zone on reflecting prism is coated with reflectance coating.
When reflecting prism is chosen suitable refractive index and thickness, can realize adjusting purpose.Marking plate 3 is vertical with lighting optical axis, a plurality of marks on marking plate 3 (being made as P1, P2, P3) are through mark adjustment unit 4(d) each mark is adjusted to axially different position (P1 ', P2 ', P3 '), the angle of the optical axis direction of the first plane s1 that mark P1 ', the P2 ' after adjustment, P3 ' consist of and projection imaging unit is θ, and with respect to projection imaging unit object-image conjugate, mark P1 ', P2 ', P3 ' after adjusting like this can clearly project on tested surface with tested surface s.Compare with structure shown in Figure 3, the light path of this structure is advanced in prism, and the distance same with structure shown in Figure 3 can play larger optical path compensation, and so whole light path is more compact.When adjusting the thickness of two reflecting prisms, the apparent field that receives index face IS after imaging adjustment unit 4 ' adopts this structure also can become less, is conducive to the design of follow-up relaying amplification imaging system, and it is higher that enlargement ratio can design.After adopting simultaneously cemented prism to replace each single catoptron, mounting structure is more convenient.
Figure 7 shows that another structural representation of adjustment unit, it is further optimized in structure shown in Figure 6 and obtains, it is formed by reflecting prism e1, e2, e3 and the first compensating plate e4, the common gummed of the second compensating plate e5, wherein reflecting prism e1 and e2 contour structures are identical, the light-emitting face of e3 is perpendicular to emergent light, the first thicker compensating plate e4 and reflecting prism e1 gummed, the second thinner compensating plate e5 and reflecting prism e2 gummed.Equally be coated with reflectance coating in each incidence point zone on reflecting prism.Owing to having added compensating plate, the refractive index of reflecting prism and thickness setting can be more flexible, and on reflecting prism, the light path adjustment can leave some surpluses, and the compensating plate by different-thickness or different refractivity compensates this surplus and gets final product.This structure also has all advantages of structure shown in Figure 6 except above-mentioned advantage.
Said structure is used and is not limited the mark number, and the corresponding a plurality of structures of a plurality of marks can realize.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (17)
1. tilting body position-measurement device comprises successively along optical path direction:
Lighting unit for generation of Uniform Illumination light;
Marking plate perpendicular to described illumination light optical axis;
With the mark on described marking plate project to described illumination light optical axis not perpendicular the first plane on the mark adjustment unit at diverse location place;
To be projected to through the marker image of described mark adjustment unit the projection imaging unit of the tested surface of described tilting body, described the first plane and described tested surface are with respect to described projection imaging unit object-image conjugate;
Receive the reception image-generating unit of the marker image of described tested surface reflection, described projection imaging unit and described reception image-generating unit are double telecentric structure;
The marker image that described reception image-generating unit is become is adjusted to picture side's adjustment unit at the place of diverse location on the second plane vertical with described illumination light optical axis;
With the probe unit with test surface, the marker image on described the second plane is projected to described test surface;
The change in location of described tested surface on the objective lens optical axis direction causes the marker image on described test surface to produce corresponding change in location on described test surface.
2. measurement mechanism as claimed in claim 1, is characterized in that, described projection imaging unit and reception image-generating unit satisfy the SC image-forming condition.
3. measurement mechanism as claimed in claim 1, is characterized in that, described mark adjustment unit has the object with reflecting surface at a plurality of spatially diverse locations place, and described reflecting surface is used for reflection through the incident light of described marking plate.
4. measurement mechanism as claimed in claim 3, is characterized in that, described object is catoptron.
5. measurement mechanism as claimed in claim 4, is characterized in that, on described catoptron, the incident angle of chief ray is less than or equal to 45 degree.
6. measurement mechanism as claimed in claim 4, is characterized in that, wherein equates in horizontal and vertical distance between two adjacent catoptrons.
7. measurement mechanism as claimed in claim 4, is characterized in that, described mark adjustment unit also has the turnover catoptron, is used for the light that described mirror reflects goes out is reflexed to described projection imaging unit to regulate optical path direction.
8. measurement mechanism as claimed in claim 3, is characterized in that, described object is a plurality of mutual gummeds and reflecting prism with identical appearance size, and each incidence point zone on described reflecting prism is coated with reflectance coating.
9. measurement mechanism as claimed in claim 8, is characterized in that, described mark adjustment unit also has for the compensating plate of adjusting light path.
10. measurement mechanism as claimed in claim 9, is characterized in that, described reflecting prism quantity is two.
11. measurement mechanism as claimed in claim 10, it is characterized in that, described compensating plate has the first compensating plate and the second compensating plate, described the first compensating plate and described incidence point zone gummed away from the described reflecting prism of projection imaging unit, described the second compensating plate and described incidence point zone gummed near the described reflecting prism of projection imaging unit, described the first compensating plate is than described the second compensation thickness of slab.
12. measurement mechanism as claimed in claim 8 is characterized in that, described mark adjustment unit also have one with prism near the described reflecting prism gummed of projection imaging unit, a face of described prism is vertical with emergent light.
13. measurement mechanism as claimed in claim 1 is characterized in that, also has after described picture side adjustment unit be used to the relaying amplification imaging unit that amplifies described marker image, described relaying amplification imaging unit is that double telecentric structure and enlargement ratio are greater than 1 times.
14. measurement mechanism as claimed in claim 13 is characterized in that, also has the unidirectional convergence unit that compresses for the non-direction of measurement of described marker image after described relaying amplification imaging unit and before described probe unit.
15. measurement mechanism as claimed in claim 14 is characterized in that, described unidirectional convergence unit has the corresponding cylindrical mirror of line number of the described mark on a plurality of quantity and non-direction of measurement.
16. as the described measurement mechanism of claim 13-15 any one, it is characterized in that, the pass of detecting on described test surface between the displacement Δ z of the displacement Δ x of described marker image and described tested surface is:
Δx=2×f1×Δz×sinθ×f2，
Wherein, θ is the angle between the emergent light of described the first plane and described mark adjustment unit, and f1 is the multiplying power of described reception image-generating unit, and f2 is the enlargement ratio of described relaying amplification imaging unit.
17. measurement mechanism as claimed in claim 16 is characterized in that, the value of described f1 is 1, and the value of described f2 is more than or equal to 10.
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|---|---|---|---|
| CN201110416818.8A CN103163740B (en) | 2011-12-14 | 2011-12-14 | Position measuring device for tilted object |
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| CN201110416818.8A CN103163740B (en) | 2011-12-14 | 2011-12-14 | Position measuring device for tilted object |
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| CN103163740B CN103163740B (en) | 2015-01-21 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114428444A (en) * | 2020-10-29 | 2022-05-03 | 中芯国际集成电路制造(上海)有限公司 | Alignment measurement system correction method |
| CN114894712A (en) * | 2022-03-25 | 2022-08-12 | 业成科技（成都）有限公司 | Optical measurement equipment and correction method thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0585041A1 (en) * | 1992-08-19 | 1994-03-02 | Canon Kabushiki Kaisha | Surface position detecting method |
| US5414515A (en) * | 1990-02-23 | 1995-05-09 | Canon Kabushiki Kaisha | Surface position detecting device |
| JPH10116781A (en) * | 1996-10-14 | 1998-05-06 | Canon Inc | Plane position detector and fabrication of device using it |
| CN1971426A (en) * | 2006-12-01 | 2007-05-30 | 上海微电子装备有限公司 | Optical system of focusing and leveling sensor |
| CN101403866A (en) * | 2008-11-18 | 2009-04-08 | 上海微电子装备有限公司 | Object position measurement apparatus and method |
| CN101477319A (en) * | 2009-01-22 | 2009-07-08 | 上海微电子装备有限公司 | Optical system used for focusing and leveling |
-
2011
- 2011-12-14 CN CN201110416818.8A patent/CN103163740B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5414515A (en) * | 1990-02-23 | 1995-05-09 | Canon Kabushiki Kaisha | Surface position detecting device |
| EP0585041A1 (en) * | 1992-08-19 | 1994-03-02 | Canon Kabushiki Kaisha | Surface position detecting method |
| JPH10116781A (en) * | 1996-10-14 | 1998-05-06 | Canon Inc | Plane position detector and fabrication of device using it |
| CN1971426A (en) * | 2006-12-01 | 2007-05-30 | 上海微电子装备有限公司 | Optical system of focusing and leveling sensor |
| CN101403866A (en) * | 2008-11-18 | 2009-04-08 | 上海微电子装备有限公司 | Object position measurement apparatus and method |
| CN101477319A (en) * | 2009-01-22 | 2009-07-08 | 上海微电子装备有限公司 | Optical system used for focusing and leveling |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114428444A (en) * | 2020-10-29 | 2022-05-03 | 中芯国际集成电路制造(上海)有限公司 | Alignment measurement system correction method |
| CN114428444B (en) * | 2020-10-29 | 2024-01-26 | 中芯国际集成电路制造(上海)有限公司 | Correction method of overlay measurement system |
| CN114894712A (en) * | 2022-03-25 | 2022-08-12 | 业成科技（成都）有限公司 | Optical measurement equipment and correction method thereof |
| CN114894712B (en) * | 2022-03-25 | 2023-08-25 | 业成科技（成都）有限公司 | Optical measuring equipment and correction method thereof |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |