CN103127810B - Non-homogeneous field intensity plasma emission-control equipment and treatment system - Google Patents
Non-homogeneous field intensity plasma emission-control equipment and treatment system Download PDFInfo
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- CN103127810B CN103127810B CN201310060432.7A CN201310060432A CN103127810B CN 103127810 B CN103127810 B CN 103127810B CN 201310060432 A CN201310060432 A CN 201310060432A CN 103127810 B CN103127810 B CN 103127810B
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Abstract
A kind of non-homogeneous field intensity plasma emission-control equipment and treatment system, treatment system comprises air inlet pipe, packed tower, treating apparatus, centrifugal blower is communicated with successively with blast pipe, in the plasma sheath for the treatment of apparatus, some layers of plasma treatment mechanism are installed, plasma treatment mechanism comprises pedestal, collar flange is provided with in pedestal, before flange, connect grounding electrode plate and electrode plate with high voltage below, there is air outlet between ground electrode plate and flange and have insulation medium board therebetween, electrode plate with high voltage front surface has some tapers, through hole is established at its tip, ground electrode plate outer surface and electrode plate with high voltage rear surface establish first respectively, two insulating barriers, second insulating barrier is established the second through hole, high-field electrode and ground electrode plate are respectively by the high-pressure side of electrode outlet line and high voltage source, earth terminal connects.The present invention can produce high-density plasma under lower disruptive field intensity, can process all gas, extends gas and action of plasma time, improves treatment effeciency.
Description
Technical field
The present invention relates to a kind of purifier of waste gas, be specifically related to a kind of non-homogeneous field intensity plasma emission-control equipment and treatment system.
Background technology
Along with expanding economy, the gaseous contamination that field of industrial production produces, as H
2s, SO
2, NO
x, VOC
salso day by day serious etc. problem.Relevant laws and regulations and the professional standard of country all have strict restriction to gas purging standard, and administering dusty gas is the key of environmental protect quality.
The method of tradition pollution administration gas has combustion method, absorption method, bioanalysis, membrane separation process, photocatalytic method etc.The shortcoming of combustion method is that the auxiliary fuel consumed is more, can cause secondary pollution etc. when waste heat energy and imperfect combustion; Absorption method shortcoming is that the adsorbent amount that needs is large and regeneration energy consumption is high, and gas-flow resistance is large, and makes blower fan drive energy consumption high, and flow process complexity, absorptive element can not continued operations, and when having micelle material or other impurity in waste gas, adsorbent easily lost efficacy; The essence of bioanalysis utilizes the active microorganism that medium is assembled using gas pollutant as the energy of its vital movement or nutrient, and through metabolic degradation, shortcoming is that microorganism is to temperature and humidity sensitive.
Non-thermal plasma trap is that gaseous contaminant administers the hot spot technology of neck in recent years.Compared to traditional air purifying process, lower temperature plasma technology has the features such as handling process is short, efficiency is high, energy consumption is low, secondary pollution is few, applied widely.Plasma is the admixture of electronics, negative ions, excited atom, atom and free radical.The state of plasma depends primarily on the physical chemistry parameters such as its chemical composition, particle density and particle temperature, and wherein the density of particle and temperature are two parameters the most basic of plasma.In plasma environment, various chemical reaction all carries out under highly excited level, the active particle kind produced than common chemical reaction is more, active stronger, be easier to react with the pollutant in waste gas, make within a short period of time contaminant molecule decompose, thus reach the object of degradation of contaminant.And the common discharge type of lower temperature plasma technology has: electric arc, dielectric barrier discharge, glow discharge and corona discharge.The high temperature of electric arc and export license are difficult to obtain application in dusty gas.The uniform and stable electric discharge of the aura form under atmospheric pressure of realizing is very difficult.The corona zone of corona discharge is less to be only limitted near corona electrode, and discharge current is also more weak.Dielectric barrier discharge has the advantages that current density is large, electron density is high and can run at ambient pressure, makes it have a good application prospect in the process of industrial pollution gas.
Conventional dielectric barrier discharge structure exists due to medium, makes its disruptive field intensity higher, and region of discharge less (as coaxial-type).Because region of discharge is less, under same flow, gas and the action of plasma time shorter, dusty gas fails fully to react or have portion gas namely to discharge with tail gas without plasma treatment, and treatment effeciency is lower.
Summary of the invention
The object of the present invention is to provide a kind of non-homogeneous field intensity plasma emission-control equipment and treatment system, it can produce highdensity plasma under lower disruptive field intensity, process gas all passes through heating region, extend dusty gas and action of plasma time simultaneously, improve treatment effeciency, reduce energy consumption.
To achieve these goals, technical solution of the present invention is: a kind of non-homogeneous field intensity plasma emission-control equipment, comprising plasma sheath, described plasma sheath be provided with into, gas outlet, be positioned at into, the inner chamber part of the plasma sheath between gas outlet is provided with several plasma treatment mechanisms at least one cross section, the described plasma treatment mechanism being positioned at same cross section mutually connects along outer rim direction and fills up the cross section at place, described plasma treatment mechanism is perpendicular to the air inlet of plasma sheath, described plasma treatment mechanism comprises shaped as frame pedestal, described pedestal is made up of insulating materials, the internal chamber wall of described pedestal circumferentially has collar flange, before described flange, connect grounding electrode plate and electrode plate with high voltage respectively below, air outlet is provided with between the outer rim of described ground electrode plate and flange, insulation medium board is provided with between described flange and ground electrode plate, the outer surface of described ground electrode plate is provided with the first insulating barrier, described ground electrode plate is connected with ground electrode lead-out wire, described ground electrode lead-out wire is connected with the earth terminal of high-voltage ac power through after the first insulating barrier, the front surface of described electrode plate with high voltage has several tapers, the rear surface of each described taper is corresponding cone tank, the tip of each described taper is respectively equipped with the first through hole, the rear surface of described electrode plate with high voltage is provided with the second insulating barrier, on described second insulating barrier with each first lead to the hole site before, the position of rear correspondence is respectively equipped with the second through hole, described electrode plate with high voltage connects high-field electrode lead-out wire, be connected with the high-pressure side of high voltage source after described high-field electrode lead-out wire passes pedestal.
The present invention's non-homogeneous field intensity plasma emission-control equipment, wherein said plasma sheath is cuboid case structure, its left and right two ends are respectively equipped with the described inlet, outlet of reducing, the pedestal of described plasma treatment mechanism is rectangular frame structure, links together between the pedestal of adjacent plasma processing mechanism and between adjacent pedestal and plasma sheath respectively by C type channel-section steel and hold-down screw.
The present invention's non-homogeneous field intensity plasma emission-control equipment, wherein said plasma sheath is provided with access door.
The exhaust treatment system of the present invention's non-homogeneous field intensity plasma emission-control equipment, comprise at least one air inlet pipe and a blast pipe, wherein each described air inlet pipe is communicated with the air inlet of packed tower respectively, the exhaust outlet of each described packed tower is communicated with respectively by the air inlet of the first tube connector with the plasma sheath of described treating apparatus, the gas outlet of each described plasma sheath is communicated with centrifugal blower respectively by the second tube connector, and described centrifugal blower is communicated with at least one blast pipe respectively by the 3rd tube connector.
The present invention's non-homogeneous field intensity plasma exhaust treatment system, the plasma sheath of plasma treatment mechanism is equipped with at least one inside of wherein contacting respectively between the air inlet of each described plasma sheath and each second tube connector.
The present invention's non-homogeneous field intensity plasma exhaust treatment system, wherein said air inlet pipe is provided with air inlet disk valve.
The present invention's non-homogeneous field intensity plasma exhaust treatment system, wherein said air inlet pipe is communicated with one end of the first bypass pipe, and described first bypass pipe is provided with bypass butterfly valve, and the other end of described first bypass pipe is communicated with the second tube connector.
After adopting such scheme, the present invention's non-homogeneous field intensity plasma emission-control equipment and waste gas are connected, waste gas is all through each plasma treatment mechanism of plasma sheath inner chamber, connect high-voltage ac power, highfield is produced at the tip of each taper of electrode plate with high voltage, make this device can produce high-density plasma under lower breakdown voltage, this structure overcomes conventional dielectric barrier discharge structure and makes because medium exists the problem that its disruptive field intensity is higher, because the tip of taper has passage, it is both as sparking electrode, simultaneously all dusty gas all by, improve the treatment effeciency of gas, reduce energy consumption, due to the effect of high-k dielectric, easily form stable plasma at region of discharge, extend plasma and dusty gas action time, when waste gas is by type plasma treatment mechanism, high voltage discharge field produce more low-energy electronics and waste gas in particle and microorganism collide, make it charged, thus by electrostatic field adsorption removal, the chemical substance of electronics directly and in waste gas that the energy that high voltage discharge field produces is higher is collided, and makes it ionization and decomposes, the higher electronics of energy that high voltage discharge field produces interacts with Multiple components in waste gas, generation free radical, harmful substance and free radical carry out two bodies even three-body collision become harmless object.
Further beneficial effect of the present invention is: plasma sheath is designed to cuboid case structure, be rectangular frame structure by the foundation design of plasma treatment mechanism, link together respectively by C type channel-section steel and hold-down screw between the pedestal of adjacent plasma processing mechanism and between adjacent pedestal and plasma sheath, the structure of such design is simple, convenient installation.
Further beneficial effect of the present invention is: on plasma sheath, establish access door to be the plasma treatment mechanism of conveniently overhauling plasma sheath inner chamber.
Further beneficial effect of the present invention is: each air inlet pipe and the waste gas of the present invention's non-homogeneous field intensity plasma exhaust treatment system are connected, waste gas is after packed tower preliminary purification, all through each plasma treatment mechanism of plasma sheath inner chamber, connect high-voltage ac power, highfield is produced at the tip of each taper of electrode plate with high voltage, make this device can produce high-density plasma under lower breakdown voltage, this structure overcomes conventional dielectric barrier discharge structure and makes because medium exists the problem that its disruptive field intensity is higher, because the tip of taper has passage, it is both as sparking electrode, simultaneously all dusty gas all by, improve the treatment effeciency of gas, reduce energy consumption, due to the effect of high-k dielectric, easily form stable plasma at region of discharge, extend plasma and dusty gas action time, when waste gas is by type plasma treatment mechanism, high voltage discharge field produce more low-energy electronics and waste gas in particle and microorganism collide, make it charged, thus by electrostatic field adsorption removal, the chemical substance of electronics directly and in waste gas that the energy that high voltage discharge field produces is higher is collided, and makes it ionization and decomposes, the higher electronics of energy that high voltage discharge field produces interacts with Multiple components in waste gas, generation free radical, harmful substance and free radical carry out two bodies even three-body collision become harmless object.
Further beneficial effect of the present invention is: the plasma sheath of plasma treatment mechanism is equipped with at least one inside of contacting respectively between the air inlet and each second tube connector of each plasma sheath, its objective is to extend dusty gas and action of plasma time further, improving treatment effeciency.
Further beneficial effect of the present invention is: in air inlet pipe, establish the object of air inlet disk valve to be to regulate exhaust gas flow and closing air inlet disk valve when emergency, protection system safety.
Further beneficial effect of the present invention is: between air inlet pipe with the second tube connector, be connected the first bypass pipe, and object is in order to when system and device breaks down, and waste gas can also be discharged through the first bypass pipe.
Accompanying drawing explanation
Fig. 1 is embodiment one structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system;
Fig. 2 is the front sectional view of the plasma treatment mechanism of the present invention's non-homogeneous field intensity plasma emission-control equipment;
Fig. 3 is the top view of the plasma treatment mechanism of the present invention's non-homogeneous field intensity plasma emission-control equipment;
Fig. 4 is the front view of single plasma treatment mechanism of the present invention;
Fig. 5 is the rearview of single plasma treatment mechanism of the present invention;
Fig. 6 is the right view of single plasma treatment mechanism of the present invention;
Fig. 7 is that the A-A of Fig. 4 is to sectional view;
Fig. 8 is that the B-B of Fig. 5 is to sectional view;
Fig. 9 is embodiment two structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system;
Figure 10 is embodiment three structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system.
Below in conjunction with accompanying drawing, by embodiment, the present invention is described further;
Detailed description of the invention
As shown in Figure 1, embodiment one structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system, it comprises an air inlet pipe 1 and a blast pipe 2.Air inlet pipe 1 is provided with air inlet disk valve 22.Air inlet pipe 1 is communicated with one end of the first bypass pipe 23, and the first bypass pipe 23 is provided with bypass butterfly valve 24.Air inlet pipe 1 is communicated with the air inlet of packed tower 3.The exhaust outlet of packed tower 3 is communicated with the air inlet of plasma sheath 5 by the first tube connector 4.Plasma sheath 5 is cavity cuboid case structure, and its left and right end is respectively equipped with the inlet, outlet of reducing, and it supports below by support member 29, is processed with access door 26 before it.The gas outlet of plasma sheath 5 is communicated with centrifugal blower 8 by the second tube connector 6.Second tube connector 6 is communicated with the other end of the first bypass pipe 23.Centrifugal blower 8 is communicated with blast pipe 2 by the 3rd tube connector 7.The process air quantity of this centrifugal blower 8 is 2000m
3/ h.Shown in composition graphs 2 and Fig. 3, in the same cross section of inner chamber of plasma sheath 5,4 × 5 plasma treatment mechanisms 9 are installed.I.e. transversely arranged 4 plasma treatment mechanisms 9, longitudinal arrangement 5 plasma treatment mechanisms 9.Each adjacent plasma treatment mechanism 9 is by being interconnected along outer rim direction and filling up this cross section.Plasma treatment mechanism 9 is perpendicular to the air inlet of plasma sheath 5.Shown in composition graphs 4 to Fig. 8, single plasma treatment mechanism 9 comprises pedestal 10, and pedestal 10 is rectangular frame structure.It is of a size of 30cm × 30cm.Pedestal 10 is made up of insulating materials.Interconnect respectively by C type channel-section steel 27 and hold-down screw 28 between adjacent susceptors 10, between adjacent pedestal 10 and plasma sheath 5.The internal chamber wall circumferentially side's of having collar flange 11 of pedestal 10.Forward and backward of flange 11 connects grounding electrode plate 12 and electrode plate with high voltage 13 respectively by hold-down screw.Ground electrode plate 12 and electrode plate with high voltage 13 are made up of corrosion resistant metallic plate.Air outlet 14 is provided with between the outer rim of ground electrode plate 12 and flange 11.Insulation medium board 15 is provided with between flange 11 and ground electrode plate 12.The outer surface of ground electrode plate 12 is provided with the first insulating barrier 16.Ground electrode plate 12 connects ground electrode lead-out wire (not shown), and this ground electrode lead-out wire is connected with the earth terminal of high-voltage ac power through after the first insulating barrier 16, and the front surface of electrode plate with high voltage 13 is evenly equipped with several tapers 17.The height of taper 17 is 5mm.The rear surface of each taper 17 is corresponding cone tank.The tip of each taper 17 is processed with the first through hole 18 respectively.The diameter of the first through hole 18 is 2mm.The spacing of adjacent two the first through holes 18 is 10mm.Distance between electrode plate with high voltage 13 and ground electrode plate 12 is 8mm.The rear surface of electrode plate with high voltage 13 is provided with the second insulating barrier 19.Second insulating barrier 19 is processed with the second through hole 20 respectively with each first forward and backward corresponding position, through hole 18 position.Second through hole 20 is distributed on the second insulating barrier 19, makes the second insulating barrier 19 form homogenizing plate.Electrode plate with high voltage 13 connects high-field electrode lead-out wire 21.High-field electrode lead-out wire 21 is connected with the high-pressure side of high-voltage ac power after passing pedestal 10.
During use, waste gas and air inlet pipe 1 are connected, and start centrifugal blower 8, and connect high voltage source.Under the effect of centrifugal blower 8, the styrene (C in waste gas
8h
8), carbon disulfide (CS
2), hydrogen sulfide (H
2and methyl mercaptan (CH S)
3sH) after gas is all joined, first through packed tower 3 purification filtering, then enter in the inner chamber of plasma sheath 5, by being distributed on 20 plasma treatment mechanisms 9 of the same cross sectional arrangement of plasma sheath 5 inner chamber.Connect high-voltage ac power, highfield is produced at the tip of each taper 17 of electrode plate with high voltage 13, make this system can produce high-density plasma under lower breakdown voltage, tip due to taper 17 has the first through hole 18, it is both as sparking electrode, simultaneously all dusty gas all by, improve the treatment effeciency of gas, reduce energy consumption, when waste gas is by type plasma treatment mechanism, particle in the more low-energy electronics that high voltage discharge field produces and waste gas and microorganism collide, and make it charged, thus by electrostatic field adsorption removal; The chemical substance of electronics directly and in waste gas that the energy that high voltage discharge field produces is higher is collided, and makes it ionization and decomposes; The higher electronics of energy that high voltage discharge field produces interacts with Multiple components in waste gas, generation free radical, harmful substance and free radical carry out two bodies even three-body collision become harmless object, its detailed process is:
(1) produce district at plasma, under the effect of high energy particle, strong oxidizing property free radical O produces; O
2+ e → 2O
(2) O and organic molecule, little group, other free radicals interact, and end product is CO, CO2, H
2o etc.And styrene (C
8h
8) be broken down into carbon dioxide and water.
The gas eventually passing process is discharged through blast pipe 2.After this system each run 30min, sample at blast pipe 2 place.
Styrene (C
8h
8) sampling determination method according to GB GB/T14677 gas chromatography;
Carbon disulfide (CS
2) sampling determination method according to GB GB/T14680 diethylamine AAS;
Hydrogen sulfide (H
2and methyl mercaptan (CH S)
3sH) sampling determination method is according to GB GB/T14678 gas chromatography;
Testing result (by emission standard for odor pollutants GB1455493).
Implementation result is as shown in the table
As shown in Figure 9, for embodiment two structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system, its most of structure is identical with the structure of above-described embodiment one, its difference is: this system comprises two air inlet pipe 1, two air inlet pipe 1 are communicated with one end of one first bypass pipe 23 respectively, and bypass butterfly valve 24 installed respectively by two the first bypass pipes 23.Two air inlet pipe 1 are communicated with the air inlet of packed tower 3 respectively.The exhaust outlet of two packed towers 3 is communicated with the air inlet of plasma sheath 5 respectively by the first tube connector 4.The left and right end of two plasma sheath 5 is respectively equipped with air inlet and gas outlet.The gas outlet of two plasma sheath 5 is communicated with two centrifugal blowers 8 respectively by the second tube connector 6.Two the second tube connectors 6 are communicated with the other end of two the first bypass pipes 23 respectively.Two centrifugal blowers 8 are communicated with blast pipe 2 by two the 3rd tube connectors 7.Such design can process large discharge waste gas simultaneously.
As shown in Figure 10, for embodiment three structural representation of the present invention's non-homogeneous field intensity plasma exhaust treatment system, its most of structure is identical with the structure of above-described embodiment one, and its difference is: the plasma sheath 5 of 4 × 5 plasma treatment mechanisms 9 is equipped with in an inside of also contacting between the gas outlet of plasma sheath 5 and the second tube connector 6.
The above embodiment is only be described the preferred embodiment of the present invention; not scope of the present invention is limited; under not departing from the present invention and designing the prerequisite of spirit; the various distortion that the common engineers and technicians in this area make technical scheme of the present invention and improvement, all should fall in protection domain that claims of the present invention determine.
Claims (7)
1. a non-homogeneous field intensity plasma emission-control equipment, it is characterized in that: comprise plasma sheath (5), described plasma sheath (5) be provided with into, gas outlet, be positioned at into, the inner chamber part of the plasma sheath (5) between gas outlet is provided with several plasma treatment mechanisms (9) at least one cross section, the described plasma treatment mechanism (9) being positioned at same cross section mutually connects along outer rim direction and fills up the cross section at place, described plasma treatment mechanism (9) is perpendicular to the air inlet of plasma sheath (5), described plasma treatment mechanism (9) comprises shaped as frame pedestal (10), described pedestal (10) is made up of insulating materials, the internal chamber wall of described pedestal (10) circumferentially has collar flange (11), before described flange (11), connect grounding electrode plate (12) and electrode plate with high voltage (13) below respectively, air outlet (14) is provided with between the outer rim of described ground electrode plate (12) and flange (11), insulation medium board (15) is provided with between described flange (11) and ground electrode plate (12), the outer surface of described ground electrode plate (12) is provided with the first insulating barrier (16), described ground electrode plate (12) is connected with ground electrode lead-out wire, described ground electrode lead-out wire is connected with the earth terminal of high-voltage ac power afterwards through the first insulating barrier (16), the front surface of described electrode plate with high voltage (13) has several tapers (17), the rear surface of each described taper (17) is corresponding cone tank, the tip of each described taper (17) is respectively equipped with the first through hole (18), the rear surface of described electrode plate with high voltage (13) is provided with the second insulating barrier (19), on described second insulating barrier (19) and before each first through hole (18) position, the position of rear correspondence is respectively equipped with the second through hole (20), described electrode plate with high voltage (13) connects high-field electrode lead-out wire (21), described high-field electrode lead-out wire (21) passes pedestal (10) and is connected with the high-pressure side of high voltage source afterwards.
2. non-homogeneous field intensity plasma emission-control equipment as claimed in claim 1, it is characterized in that: described plasma sheath (5) is cuboid case structure, its left and right two ends are respectively equipped with the described inlet, outlet of reducing, the pedestal (10) of described plasma treatment mechanism (9) is rectangular frame structure, links together between the pedestal (10) of adjacent plasma processing mechanism (9) and between adjacent pedestal (10) and plasma sheath (5) respectively by C type channel-section steel (27) and hold-down screw (28).
3. non-homogeneous field intensity plasma emission-control equipment as claimed in claim 2, is characterized in that: described plasma sheath (5) is provided with access door (26).
4. one kind uses the exhaust treatment system of the non-homogeneous field intensity plasma emission-control equipment as described in one of claim 1-3, comprise at least one air inlet pipe (1) and a blast pipe (2), it is characterized in that: each described air inlet pipe (1) is communicated with the air inlet of packed tower (3) respectively, the exhaust outlet of each described packed tower (3) is communicated with respectively by the air inlet of the first tube connector (4) with the plasma sheath (5) of described treating apparatus, the gas outlet of each described plasma sheath (5) is communicated with centrifugal blower (8) respectively by the second tube connector (6), described centrifugal blower (8) is communicated with at least one blast pipe (2) respectively by the 3rd tube connector (7).
5. exhaust treatment system as claimed in claim 4, is characterized in that: the plasma sheath (5) of plasma treatment mechanism (9) is equipped with at least one inside of contacting respectively between the air inlet of each described plasma sheath (5) and each second tube connector (6).
6. exhaust treatment system as claimed in claim 5, is characterized in that: described air inlet pipe (1) is provided with air inlet disk valve (22).
7. exhaust treatment system as claimed in claim 6, it is characterized in that: described air inlet pipe (1) is communicated with one end of the first bypass pipe (23), described first bypass pipe (23) is provided with bypass butterfly valve (24), and the other end of described first bypass pipe (23) is communicated with the second tube connector (6).
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104096460A (en) * | 2014-06-11 | 2014-10-15 | 武汉高特维电气有限公司 | Plasma waste gas treatment device |
| WO2017147806A1 (en) * | 2016-03-02 | 2017-09-08 | 马骏 | Novel waste gas treatment apparatus based on 485 communication technology |
| CN108361129A (en) * | 2018-02-27 | 2018-08-03 | 沈阳航空航天大学 | A kind of movable electrode structure air inlet suitable for internal combustion engine ionizes combustion-supporting driver |
| CN108601192B (en) * | 2018-06-25 | 2019-07-12 | 超力等离子技术(常州)有限公司 | A kind of plasma generator |
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| CN1828825A (en) * | 2005-03-02 | 2006-09-06 | 东京毅力科创株式会社 | Gas supply member and plasma processing apparatus |
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Inventor after: Lei Xiaolu Inventor before: Qian Liming Inventor before: Wang Xiangke Inventor before: Jiang Jian Inventor before: Cheng Cheng Inventor before: Zhang Qin Inventor before: Yu Hongjun Inventor before: Ni Guohua Inventor before: Hu Zheping Inventor before: Shen Jie |
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Effective date of registration: 20160425 Address after: Susong road in Baohe District of Hefei city in Anhui province 230022 No. 128 Jinan garden 15 building 307 room Patentee after: Lei Xiaolu Address before: 304 hi tech group building, 626 Mount Huangshan Road, Hefei hi tech Zone, Anhui, 230088 Patentee before: Zhongwei Environmental Protection Technology Co., Ltd. |