CN103127810B - Non-homogeneous field intensity plasma emission-control equipment and treatment system - Google Patents

Non-homogeneous field intensity plasma emission-control equipment and treatment system Download PDF

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CN103127810B
CN103127810B CN201310060432.7A CN201310060432A CN103127810B CN 103127810 B CN103127810 B CN 103127810B CN 201310060432 A CN201310060432 A CN 201310060432A CN 103127810 B CN103127810 B CN 103127810B
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ground electrode
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gas treatment
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CN103127810A (en
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钱黎明
王祥科
江健
程诚
张芹
余红君
倪国华
胡浙平
沈杰
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Anhui Yu Xin Environmental Engineering Science And Technology Co ltd
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Zhongwei Environmental Protection Technology Co Ltd
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Abstract

一种非均匀场强等离子体废气处理装置及处理系统,处理系统包括进气管、填料塔、处理装置、离心风机和排气管依次连通,处理装置的等离子壳体内安装若干层等离子处理机构,等离子处理机构包括基座,基座内设有环状凸缘,凸缘前、后面连接地电极板和高压电极板,地电极板与凸缘间有出风口且二者之间有绝缘介质板,高压电极板前表面具有若干尖锥体,其尖端设通孔,地电极板外表面和高压电极板后表面分别设第一、二绝缘层,第二绝缘层上设第二通孔,高压电极和地电极板分别通过电极引出线与高压电源的高压端、接地端连接。本发明能在较低击穿场强下产生高密度等离子体,可处理全部气体,延长气体与等离子体作用时间,提高处理效率。

A non-uniform field strength plasma waste gas treatment device and treatment system. The treatment system includes an intake pipe, a packing tower, a treatment device, a centrifugal fan, and an exhaust pipe connected in sequence. Several layers of plasma treatment mechanisms are installed in the plasma shell of the treatment device. The processing mechanism includes a base, an annular flange is arranged inside the base, and the ground electrode plate and the high-voltage electrode plate are connected to the front and back of the flange. There is an air outlet between the ground electrode plate and the flange, and an insulating medium plate between the two. There are several pointed cones on the front surface of the high-voltage electrode plate, and through holes are provided at the tips. The outer surface of the ground electrode plate and the rear surface of the high-voltage electrode plate are respectively provided with the first and second insulating layers, and the second insulating layer is provided with the second through hole. The ground electrode plate is respectively connected with the high voltage end and the ground end of the high voltage power supply through electrode lead wires. The invention can generate high-density plasma under a relatively low breakdown field strength, can process all gases, prolongs the interaction time between gas and plasma, and improves processing efficiency.

Description

非均匀场强等离子体废气处理装置及处理系统Non-uniform field strength plasma waste gas treatment device and treatment system

技术领域technical field

本发明涉及一种废气的净化装置,具体涉及一种非均匀场强等离子体废气处理装置及处理系统。The invention relates to a waste gas purification device, in particular to a non-uniform field strength plasma waste gas treatment device and a treatment system.

背景技术Background technique

随着经济的发展,工业生产领域产生的气态污染,如H2S、SO2、NOx、VOCs等问题也日益严重。国家的相关法律法规及行业标准都对气体的排放标准有严格的限定,对污染气体进行治理是改善环境质量的关键。With the development of the economy, gaseous pollution such as H 2 S , SO 2 , NO x , VOCs, etc. produced in the field of industrial production is becoming more and more serious. Relevant national laws and regulations and industry standards have strict restrictions on gas emission standards, and the control of polluted gases is the key to improving environmental quality.

传统治理污染气体的方法有燃烧法、吸附法、生物法、膜分离法、光催化法等。燃烧法的缺点是消耗的辅助燃料较多,浪费热能和不完全燃烧时会造成二次污染等;吸附法缺点是需要的吸附剂用量大和再生能耗高,气流阻力大,而使风机驱动能耗高,流程复杂、吸附元件不能连续操作,当废气中有胶粒物质或其它杂质时,吸附剂易失效等;生物法的实质是利用介质上聚集的活性微生物以气体污染物作为其生命活动的能源或养分,经代谢降解,缺点是微生物对温度和湿度变化敏感。The traditional methods of controlling polluted gases include combustion method, adsorption method, biological method, membrane separation method, photocatalytic method and so on. The disadvantage of the combustion method is that it consumes more auxiliary fuel, wastes heat energy, and causes secondary pollution during incomplete combustion; High consumption, complex process, continuous operation of the adsorption element, when there are colloidal substances or other impurities in the exhaust gas, the adsorbent is prone to failure, etc.; the essence of the biological method is to use the active microorganisms accumulated on the medium to use gas pollutants as its life activities The energy or nutrients are metabolized and degraded. The disadvantage is that microorganisms are sensitive to temperature and humidity changes.

低温等离子技术是近年来气态污染物治理领的热点技术。相比于传统的空气净化技术,低温等离子体技术具有处理流程短、效率高、能耗低、二次污染少、适用范围广等特点。等离子体是电子、正负离子、激发态原子、原子以及自由基的混合状态。等离子体的状态主要取决于它的化学成分、粒子密度和粒子温度等物理化学参量,其中粒子的密度和温度是等离子体的两个最基本的参量。在等离子体环境中,各种化学反应都是在高激发态下进行的,比通常的化学反应所产生的活性粒子种类更多、活性更强、更易于和废气中的污染物发生反应,在较短时间内使得污染物分子分解,从而达到降解污染物的目的。而低温等离子体技术常见的放电形式有:电弧、介质阻挡放电、辉光放电和电晕放电。电弧的高温以及电极损耗难以在污染气体中获得应用。实现大气压下的辉光形式均匀稳定的放电十分困难。电晕放电的电晕区较小仅限于电晕电极附近,放电电流也比较弱。介质阻挡放电具有电流密度大、电子密度高和可在常压下运行的特点,使其在工业污染气体的处理中具有良好的应用前景。Low-temperature plasma technology is a hot technology in the field of gaseous pollutant control in recent years. Compared with traditional air purification technology, low-temperature plasma technology has the characteristics of short treatment process, high efficiency, low energy consumption, less secondary pollution, and wide application range. Plasma is a mixed state of electrons, positive and negative ions, excited atoms, atoms, and free radicals. The state of plasma mainly depends on physical and chemical parameters such as its chemical composition, particle density and particle temperature, among which the density and temperature of particles are the two most basic parameters of plasma. In the plasma environment, various chemical reactions are carried out in a highly excited state, and the active particles produced by the usual chemical reactions are more diverse, more active, and more likely to react with pollutants in the exhaust gas. In a short period of time, the pollutant molecules are decomposed, so as to achieve the purpose of degrading pollutants. The common discharge forms of low temperature plasma technology are: arc, dielectric barrier discharge, glow discharge and corona discharge. The high temperature and electrode wear of the arc make it difficult to apply in polluted gases. It is very difficult to achieve a uniform and stable discharge in the form of glow under atmospheric pressure. The corona area of corona discharge is small and limited to the vicinity of the corona electrode, and the discharge current is relatively weak. Dielectric barrier discharge has the characteristics of high current density, high electron density and operation under normal pressure, so it has a good application prospect in the treatment of industrial polluted gases.

常规的介质阻挡放电结构由于介质存在,使得其击穿场强较高,而且放电区域较小(如同轴式)。由于放电区域较小,在同样流量下,气体与等离子体作用时间较短,污染气体未能充分反应或者有部分气体未经等离子体处理即随尾气排出,处理效率较低。The conventional dielectric barrier discharge structure has a higher breakdown field strength and a smaller discharge area (such as the axial type) due to the presence of a dielectric. Due to the small discharge area, the reaction time between the gas and the plasma is short at the same flow rate, the polluted gas fails to fully react or some gas is discharged with the tail gas without plasma treatment, and the treatment efficiency is low.

发明内容Contents of the invention

本发明的目的在于提供一种非均匀场强等离子体废气处理装置及处理系统,其能够在较低的击穿场强下产生高密度的等离子体,处理气体全部通过等离子体区域,同时延长污染气体与等离子体作用时间,提高处理效率,降低能耗。The object of the present invention is to provide a non-uniform field strength plasma exhaust gas treatment device and treatment system, which can generate high-density plasma at a lower breakdown field strength, and all the treatment gas passes through the plasma region, while prolonging the pollution The interaction time between gas and plasma improves processing efficiency and reduces energy consumption.

为了实现上述目的,本发明的技术解决方案为:一种非均匀场强等离子体废气处理装置,其中包括等离子壳体,所述等离子壳体上设有进、出气口,位于进、出气口之间的等离子壳体的内腔部分上至少一个横截面内安装有若干个等离子处理机构,位于同一横截面内的所述等离子处理机构相互沿外缘方向连接且填满所在的横截面,所述等离子处理机构垂直于等离子壳体的进气口,所述等离子处理机构包括框形基座,所述基座由绝缘材料制成,所述基座的内腔壁沿周向延伸有环状凸缘,所述凸缘的前、后面分别连接地电极板和高压电极板,所述地电极板的外缘与凸缘之间设有出风口,所述凸缘与地电极板之间设有绝缘介质板,所述地电极板的外表面设有第一绝缘层,所述地电极板上连接有地电极引出线,所述地电极引出线穿过第一绝缘层后与高压交流电源的接地端连接,所述高压电极板的前表面具有若干个尖锥体,各所述尖锥体的后表面为相应的锥形槽,各所述尖锥体的尖端分别设有第一通孔,所述高压电极板的后表面设有第二绝缘层,所述第二绝缘层上与各第一通孔位置前、后对应的部位分别设有第二通孔,所述高压电极板连接高压电极引出线,所述高压电极引出线穿出基座后与高压电源的高压端连接。In order to achieve the above object, the technical solution of the present invention is: a non-uniform field strength plasma exhaust gas treatment device, which includes a plasma shell, and the plasma shell is provided with an inlet and an outlet, located between the inlet and the outlet. Several plasma processing mechanisms are installed in at least one cross-section of the inner cavity of the plasma housing between them, and the plasma processing mechanisms located in the same cross-section are connected to each other along the outer edge direction and fill up the cross-section where they are located. The plasma processing mechanism is perpendicular to the air inlet of the plasma shell, and the plasma processing mechanism includes a frame-shaped base, the base is made of insulating material, and the inner cavity wall of the base is extended with a ring-shaped protrusion along the circumferential direction. The front and back of the flange are respectively connected to the ground electrode plate and the high-voltage electrode plate, and an air outlet is provided between the outer edge of the ground electrode plate and the flange, and an air outlet is provided between the flange and the ground electrode plate An insulating medium plate, the outer surface of the ground electrode plate is provided with a first insulating layer, the ground electrode lead-out line is connected to the ground electrode plate, and the ground electrode lead-out line passes through the first insulating layer and connects with the high-voltage AC power supply The ground terminal is connected, the front surface of the high-voltage electrode plate has several pointed cones, the rear surface of each of the pointed cones is a corresponding tapered groove, and the tip of each of the pointed cones is respectively provided with a first through hole , the rear surface of the high-voltage electrode plate is provided with a second insulating layer, and the positions corresponding to the front and rear positions of the first through holes on the second insulating layer are respectively provided with second through holes, and the high-voltage electrode plate is connected to The high-voltage electrode lead-out wire is connected to the high-voltage end of the high-voltage power supply after passing through the base.

本发明非均匀场强等离子体废气处理装置,其中所述等离子壳体为长方体箱式结构,其左、右两端分别设有变径的所述进、出气口,所述等离子处理机构的基座为矩形框架结构,相邻等离子处理机构的基座之间及相邻的基座与等离子壳体之间分别通过C型槽钢和固定螺钉连接在一起。The non-uniform field strength plasma waste gas treatment device of the present invention, wherein the plasma shell is a cuboid box structure, and the left and right ends are respectively provided with the gas inlet and outlet with variable diameters, and the plasma processing mechanism is basically The seat is a rectangular frame structure, and the bases of adjacent plasma processing mechanisms and between the adjacent bases and the plasma housing are connected together by C-shaped channel steel and fixing screws.

本发明非均匀场强等离子体废气处理装置,其中所述等离子壳体上设有检修门。In the non-uniform field strength plasma exhaust gas treatment device of the present invention, an inspection door is provided on the plasma housing.

本发明非均匀场强等离子体废气处理装置的废气处理系统,包括至少一个进气管和一个排气管,其中各所述进气管分别与填料塔的进气口连通,各所述填料塔的排气口分别通过第一连接管与所述处理装置的等离子壳体的进气口连通,各所述等离子壳体的出气口分别通过第二连接管与离心风机连通,所述离心风机分别通过第三连接管与至少一个排气管连通。The exhaust gas treatment system of the non-uniform field strength plasma exhaust gas treatment device of the present invention includes at least one inlet pipe and one exhaust pipe, wherein each of the inlet pipes is respectively connected with the inlet of the packed tower, and the exhaust pipe of each of the packed towers is The gas ports communicate with the air inlets of the plasma housings of the processing device through the first connecting pipes respectively, and the gas outlets of the plasma housings respectively communicate with the centrifugal fans through the second connecting pipes, and the centrifugal fans respectively communicate with the centrifugal fans through the first connecting pipes. The three connecting pipes communicate with at least one exhaust pipe.

本发明非均匀场强等离子体废气处理系统,其中各所述等离子壳体的进气口与各第二连接管之间分别串连至少一个内部装有等离子处理机构的等离子壳体。In the non-uniform field strength plasma exhaust gas treatment system of the present invention, at least one plasma housing equipped with a plasma processing mechanism is connected in series between the air inlet of each plasma housing and each second connecting pipe.

本发明非均匀场强等离子体废气处理系统,其中所述进气管上设有进气蝶阀。In the non-uniform field strength plasma waste gas treatment system of the present invention, the intake pipe is provided with an intake butterfly valve.

本发明非均匀场强等离子体废气处理系统,其中所述进气管与第一旁通管的一端连通,所述第一旁通管上设有旁路蝶阀,所述第一旁通管的另一端与第二连接管连通。The non-uniform field strength plasma waste gas treatment system of the present invention, wherein the inlet pipe communicates with one end of the first bypass pipe, the first bypass pipe is provided with a bypass butterfly valve, and the other end of the first bypass pipe One end communicates with the second connecting pipe.

采用上述方案后,本发明非均匀场强等离子体废气处理装置与废气接通,废气全部经过等离子壳体内腔的各等离子处理机构,接通高压交流电源,在高压电极板的各尖锥体的尖端产生强电场,使得该装置可以在较低的击穿电压下产生高密度等离子体,该结构克服了常规的介质阻挡放电结构由于介质存在使得其击穿场强较高的问题,由于尖锥体的尖端开有通气孔,它既作为放电电极,同时全部污染气体均可通过,提高了气体的处理效率,降低能耗,由于高介电常数绝缘介质的作用,容易在放电区形成稳定的等离子体,延长等离子体与污染气体作用时间,废气通过等离子体处理机构时,高压放电区产生的较低能量的电子与废气中的颗粒和微生物碰撞,使之荷电,从而被静电场吸附清除;高压放电区产生的能量较高的电子直接与废气中的化学物质碰撞,使之电离分解;高压放电区产生的能量较高的电子与废气中多种成分相互作用,产生自由基,有害物质与自由基进行两体甚至三体碰撞变为无害物。After adopting the above scheme, the non-uniform field strength plasma waste gas treatment device of the present invention is connected to the waste gas, and all the waste gas passes through the plasma treatment mechanisms in the inner cavity of the plasma shell, and is connected to the high-voltage AC power supply. The tip generates a strong electric field, so that the device can generate high-density plasma at a lower breakdown voltage. This structure overcomes the problem that the conventional dielectric barrier discharge structure has a high breakdown field strength due to the existence of the medium. Due to the sharp cone There is a vent at the tip of the body, which serves as a discharge electrode, and at the same time all polluted gases can pass through, which improves the gas treatment efficiency and reduces energy consumption. Due to the effect of high dielectric constant insulating medium, it is easy to form a stable discharge area. Plasma, to prolong the interaction time between plasma and polluted gas, when the waste gas passes through the plasma treatment mechanism, the lower energy electrons generated in the high-voltage discharge area collide with the particles and microorganisms in the waste gas to charge them, and then they are adsorbed and removed by the electrostatic field The high-energy electrons generated in the high-voltage discharge area directly collide with the chemical substances in the exhaust gas to ionize and decompose them; the high-energy electrons generated in the high-voltage discharge area interact with various components in the exhaust gas to generate free radicals and harmful substances Two-body or even three-body collisions with free radicals become harmless.

本发明的进一步有益效果是:将等离子壳体设计为长方体箱式结构,将等离子处理机构的基座设计为矩形框架结构,相邻等离子处理机构的基座之间及相邻的基座与等离子壳体之间分别通过C型槽钢和固定螺钉连接在一起,这样设计的结构简单,方便安装。The further beneficial effects of the present invention are: the plasma housing is designed as a cuboid box structure, the base of the plasma processing mechanism is designed as a rectangular frame structure, between the bases of adjacent plasma processing mechanisms and adjacent bases and plasma The shells are connected together by C-shaped channel steel and fixing screws, so that the structure of the design is simple and easy to install.

本发明的进一步有益效果是:在等离子壳体上设检修门是为了方便检修等离子壳体内腔的等离子处理机构。A further beneficial effect of the present invention is that: the purpose of providing an inspection door on the plasma housing is to facilitate inspection and maintenance of the plasma processing mechanism in the inner chamber of the plasma housing.

本发明的进一步有益效果是:本发明非均匀场强等离子体废气处理系统的各进气管与废气接通,废气经填料塔初步净化后,全部经过等离子壳体内腔的各等离子处理机构,接通高压交流电源,在高压电极板的各尖锥体的尖端产生强电场,使得该装置可以在较低的击穿电压下产生高密度等离子体,该结构克服了常规的介质阻挡放电结构由于介质存在使得其击穿场强较高的问题,由于尖锥体的尖端开有通气孔,它既作为放电电极,同时全部污染气体均可通过,提高了气体的处理效率,降低能耗,由于高介电常数绝缘介质的作用,容易在放电区形成稳定的等离子体,延长等离子体与污染气体作用时间,废气通过等离子体处理机构时,高压放电区产生的较低能量的电子与废气中的颗粒和微生物碰撞,使之荷电,从而被静电场吸附清除;高压放电区产生的能量较高的电子直接与废气中的化学物质碰撞,使之电离分解;高压放电区产生的能量较高的电子与废气中多种成分相互作用,产生自由基,有害物质与自由基进行两体甚至三体碰撞变为无害物。The further beneficial effects of the present invention are: each intake pipe of the non-uniform field strength plasma waste gas treatment system of the present invention is connected to the waste gas, and after the waste gas is preliminarily purified by the packing tower, all of the waste gas passes through the plasma treatment mechanisms in the inner cavity of the plasma housing, and is connected A high-voltage AC power supply generates a strong electric field at the tip of each pointed cone of the high-voltage electrode plate, so that the device can generate high-density plasma at a lower breakdown voltage. This structure overcomes the conventional dielectric barrier discharge structure due to the presence of a medium The problem of high breakdown field strength, because the tip of the cone has a vent hole, it is used as a discharge electrode, and all polluted gases can pass through it, which improves the gas processing efficiency and reduces energy consumption. The role of the electric constant insulating medium is easy to form a stable plasma in the discharge area, prolonging the interaction time between the plasma and the polluted gas. When the exhaust gas passes through the plasma processing mechanism, the lower energy electrons generated in the high-voltage discharge area and the particles in the exhaust gas and Microorganisms collide to charge them, and then they are adsorbed and removed by the electrostatic field; electrons with higher energy generated in the high-voltage discharge area directly collide with chemical substances in the exhaust gas to ionize and decompose them; electrons with higher energy generated in the high-voltage discharge area and A variety of components in the exhaust gas interact to generate free radicals, and harmful substances and free radicals undergo two-body or even three-body collisions to become harmless substances.

本发明的进一步有益效果是:在各等离子壳体的进气口与各第二连接管之间分别串连至少一个内部装有等离子处理机构的等离子壳体,其目的是为了进一步延长污染气体与等离子体作用时间,提高处理效率。The further beneficial effects of the present invention are: at least one plasma housing with a plasma processing mechanism inside is connected in series between the air inlets of each plasma housing and each second connecting pipe, the purpose of which is to further prolong the distance between the polluted gas and the Plasma action time, improve processing efficiency.

本发明的进一步有益效果是:在进气管上设进气蝶阀的目的是为了调节废气流量和在紧急情况时关闭进气蝶阀,保护系统安全。The further beneficial effect of the present invention is: the purpose of setting the intake butterfly valve on the intake pipe is to adjust the flow of exhaust gas and close the intake butterfly valve in case of emergency, so as to protect the safety of the system.

本发明的进一步有益效果是:在进气管与第二连接管之间连接第一旁通管,目的是为了在系统装置出现故障时,废气还可以经第一旁通管排出。A further beneficial effect of the present invention is: the first bypass pipe is connected between the intake pipe and the second connecting pipe, so that when the system device fails, the exhaust gas can also be discharged through the first bypass pipe.

附图说明Description of drawings

图1是本发明非均匀场强等离子体废气处理系统的实施例一结构示意图;Fig. 1 is a structural schematic diagram of Embodiment 1 of the non-uniform field strength plasma waste gas treatment system of the present invention;

图2是本发明非均匀场强等离子体废气处理装置的等离子处理机构的主视剖视图;Fig. 2 is a front sectional view of the plasma treatment mechanism of the non-uniform field intensity plasma waste gas treatment device of the present invention;

图3是本发明非均匀场强等离子体废气处理装置的等离子处理机构的俯视图;Fig. 3 is a top view of the plasma treatment mechanism of the non-uniform field strength plasma waste gas treatment device of the present invention;

图4是本发明的单个等离子处理机构的主视图;Figure 4 is a front view of a single plasma processing mechanism of the present invention;

图5是本发明的单个等离子处理机构的后视图;Figure 5 is a rear view of a single plasma processing mechanism of the present invention;

图6是本发明的单个等离子处理机构的右视图;Figure 6 is a right side view of a single plasma processing mechanism of the present invention;

图7是图4的A-A向剖视图;Fig. 7 is the A-A direction sectional view of Fig. 4;

图8是图5的B-B向剖视图;Fig. 8 is the B-B direction sectional view of Fig. 5;

图9是本发明非均匀场强等离子体废气处理系统的实施例二结构示意图;Fig. 9 is a schematic structural diagram of Embodiment 2 of the non-uniform field strength plasma waste gas treatment system of the present invention;

图10是本发明非均匀场强等离子体废气处理系统的实施例三结构示意图。Fig. 10 is a schematic structural diagram of Embodiment 3 of the non-uniform field strength plasma waste gas treatment system of the present invention.

下面结合附图,通过实施例对本发明做进一步的说明;Below in conjunction with accompanying drawing, the present invention will be further described by embodiment;

具体实施方式detailed description

如图1所示,本发明非均匀场强等离子体废气处理系统的实施例一结构示意图,其包括一个进气管1和一个排气管2。进气管1上安装有进气蝶阀22。进气管1与第一旁通管23的一端连通,第一旁通管23上安装有旁路蝶阀24。进气管1与填料塔3的进气口连通。填料塔3的排气口通过第一连接管4与等离子壳体5的进气口连通。等离子壳体5为空腔长方体箱式结构,其左、右端分别设有变径的进、出气口,其下面通过支撑件29支撑,其前面加工有检修门26。等离子壳体5的出气口通过第二连接管6与离心风机8连通。第二连接管6与第一旁通管23的另一端连通。离心风机8通过第三连接管7与排气管2连通。该离心风机8的处理风量为2000m3/h。结合图2和图3所示,等离子壳体5的内腔同一横截面内安装有4×5个等离子处理机构9。即横向排列4个等离子处理机构9,纵向排列5个等离子处理机构9。各个相邻的等离子处理机构9通过沿外缘方向相互连接且填满该横截面。等离子处理机构9垂直于等离子壳体5的进气口。结合图4至图8所示,单个等离子处理机构9包括基座10,基座10为矩形框架结构。其尺寸为30cm×30cm。基座10由绝缘材料制成。相邻基座10之间、相邻的基座10与等离子壳体5之间分别通过C型槽钢27和固定螺钉28相互连接在一起。基座10的内腔壁沿周向延伸有方环状凸缘11。凸缘11的前、后面分别通过固定螺钉连接地电极板12和高压电极板13。地电极板12和高压电极板13由耐腐蚀的金属板制成。地电极板12的外缘与凸缘11之间设有出风口14。凸缘11与地电极板12之间设有绝缘介质板15。地电极板12的外表面设有第一绝缘层16。地电极板12连接地电极引出线(图中未示出),该地电极引出线穿过第一绝缘层16后与高压交流电源的接地端连接,高压电极板13的前表面均布有若干个尖锥体17。尖锥体17的高度为5mm。各尖锥体17的后表面为相应的锥形槽。各尖锥体17的尖端分别加工有第一通孔18。第一通孔18的直径为2mm。相邻两个第一通孔18的间距为10mm。高压电极板13与地电极板12之间的距离为8mm。高压电极板13的后表面设有第二绝缘层19。第二绝缘层19上与各第一通孔18位置前、后对应的部位分别加工有第二通孔20。第二通孔20均布在第二绝缘层19上,使第二绝缘层19形成均流板。高压电极板13连接高压电极引出线21。高压电极引出线21穿出基座10后与高压交流电源的高压端连接。As shown in FIG. 1 , a schematic structural diagram of Embodiment 1 of the non-uniform field strength plasma waste gas treatment system of the present invention includes an inlet pipe 1 and an exhaust pipe 2 . An intake butterfly valve 22 is installed on the intake pipe 1 . The intake pipe 1 communicates with one end of a first bypass pipe 23 , and a bypass butterfly valve 24 is installed on the first bypass pipe 23 . The air inlet pipe 1 communicates with the air inlet of the packed tower 3 . The exhaust port of the packed tower 3 communicates with the air inlet of the plasma housing 5 through the first connecting pipe 4 . The plasma shell 5 is a cuboid box structure with a cavity, and its left and right ends are respectively provided with air inlets and outlets with variable diameters. The gas outlet of the plasma housing 5 communicates with the centrifugal fan 8 through the second connecting pipe 6 . The second connecting pipe 6 communicates with the other end of the first bypass pipe 23 . The centrifugal fan 8 communicates with the exhaust pipe 2 through the third connecting pipe 7 . The processing air volume of the centrifugal fan 8 is 2000m 3 /h. As shown in FIG. 2 and FIG. 3 , 4×5 plasma processing mechanisms 9 are installed in the same cross-section of the inner chamber of the plasma housing 5 . That is, four plasma processing mechanisms 9 are arranged horizontally, and five plasma processing mechanisms 9 are arranged vertically. Each adjacent plasma treatment unit 9 is connected to each other in the direction of the outer edge and fills up the cross section. The plasma treatment mechanism 9 is perpendicular to the air inlet of the plasma housing 5 . As shown in conjunction with FIGS. 4 to 8 , a single plasma processing mechanism 9 includes a base 10 , which is a rectangular frame structure. Its size is 30cm x 30cm. The base 10 is made of insulating material. Adjacent bases 10 , and adjacent bases 10 and plasma housing 5 are connected to each other through C-shaped channel steel 27 and fixing screws 28 . The inner wall of the base 10 has a square annular flange 11 extending in the circumferential direction. The front and rear of the flange 11 are respectively connected to the ground electrode plate 12 and the high voltage electrode plate 13 by fixing screws. The ground electrode plate 12 and the high voltage electrode plate 13 are made of corrosion-resistant metal plates. An air outlet 14 is provided between the outer edge of the ground electrode plate 12 and the flange 11 . An insulating medium plate 15 is provided between the flange 11 and the ground electrode plate 12 . The outer surface of the ground electrode plate 12 is provided with a first insulating layer 16 . The ground electrode plate 12 is connected to the ground electrode lead wire (not shown in the figure), and the ground electrode lead wire passes through the first insulating layer 16 and is connected to the ground terminal of the high-voltage AC power supply. 17 pointed cones. The height of the pointed cone 17 is 5 mm. The rear surface of each pointed cone 17 is a corresponding tapered groove. The tip of each pointed cone 17 is respectively processed with a first through hole 18 . The diameter of the first through hole 18 is 2 mm. The distance between two adjacent first through holes 18 is 10 mm. The distance between the high voltage electrode plate 13 and the ground electrode plate 12 is 8mm. The rear surface of the high voltage electrode plate 13 is provided with a second insulating layer 19 . Second through holes 20 are respectively processed on the second insulating layer 19 at positions corresponding to the front and rear of the first through holes 18 . The second through holes 20 are evenly distributed on the second insulating layer 19, so that the second insulating layer 19 forms a current equalizer. The high-voltage electrode plate 13 is connected to the high-voltage electrode lead wire 21 . The high-voltage electrode lead wire 21 passes through the base 10 and is connected to the high-voltage end of the high-voltage AC power supply.

使用时,废气与进气管1接通,启动离心风机8,并且接通高压电源。在离心风机8的作用下,废气中的苯乙烯(C8H8)、二硫化碳(CS2)、硫化氢(H2S)和甲硫醇(CH3SH)经气体均配后,首先经过填料塔3净化过滤,然后进入等离子壳体5的内腔中,通过均布在等离子壳体5内腔同一横截面布置的20个等离子处理机构9。接通高压交流电源,在高压电极板13的各尖锥体17的尖端产生强电场,使得该系统可以在较低的击穿电压下产生高密度等离子体,由于尖锥体17的尖端开有第一通孔18,它既作为放电电极,同时全部污染气体均可通过,提高了气体的处理效率,降低能耗,废气通过等离子体处理机构时,高压放电区产生的较低能量的电子与废气中的颗粒和微生物碰撞,使之荷电,从而被静电场吸附清除;高压放电区产生的能量较高的电子直接与废气中的化学物质碰撞,使之电离分解;高压放电区产生的能量较高的电子与废气中多种成分相互作用,产生自由基,有害物质与自由基进行两体甚至三体碰撞变为无害物,其具体过程为:During use, the exhaust gas is connected with the intake pipe 1, the centrifugal blower 8 is started, and the high-voltage power supply is connected. Under the action of the centrifugal fan 8, the styrene (C 8 H 8 ), carbon disulfide (CS 2 ), hydrogen sulfide (H 2 S) and methyl mercaptan (CH 3 SH) in the exhaust gas are firstly distributed through the The packed tower 3 is purified and filtered, then enters the inner chamber of the plasma housing 5 and passes through 20 plasma processing mechanisms 9 evenly distributed in the same cross-section of the inner chamber of the plasma housing 5 . Switch on the high-voltage AC power supply, and generate a strong electric field at the tips of each pointed cone 17 of the high-voltage electrode plate 13, so that the system can generate high-density plasma at a lower breakdown voltage, because the pointed tip of the pointed cone 17 has a The first through hole 18 serves as a discharge electrode, and all polluted gases can pass through, which improves the gas processing efficiency and reduces energy consumption. The particles in the exhaust gas collide with the microorganisms to charge them, and then they are adsorbed and removed by the electrostatic field; the electrons with high energy generated in the high-voltage discharge area directly collide with the chemical substances in the exhaust gas to ionize and decompose them; the energy generated in the high-voltage discharge area Higher electrons interact with various components in the exhaust gas to generate free radicals, and harmful substances and free radicals undergo two-body or even three-body collisions to become harmless substances. The specific process is:

(1)在等离子体产生区,在高能粒子的作用下,强氧化性自由基O产生;O2+e→2O(1) In the plasma generation area, under the action of high-energy particles, strong oxidizing free radical O is generated; O 2 +e→2O

(2)O与有机物分子、小基团、其他自由基相互作用,最终产物为CO、CO2、H2O等。而苯乙烯(C8H8)被分解成二氧化碳和水。(2) O interacts with organic molecules, small groups, and other free radicals, and the final products are CO, CO2, H 2 O, etc. And styrene (C 8 H 8 ) is decomposed into carbon dioxide and water.

最后经过处理的气体经排气管2排出。在该系统每次运行30min后,在排气管2处采样。Finally, the treated gas is discharged through the exhaust pipe 2. After the system runs for 30 minutes each time, samples are taken at exhaust pipe 2.

苯乙烯(C8H8)的采样测定方法按照国标GB/T14677气相色谱法;The sampling and determination method of styrene (C 8 H 8 ) is in accordance with the national standard GB/T14677 gas chromatography;

二硫化碳(CS2)的采样测定方法按照国标GB/T14680二乙胺分光光度法;The sampling and determination method of carbon disulfide (CS 2 ) is in accordance with the national standard GB/T14680 diethylamine spectrophotometric method;

硫化氢(H2S)和甲硫醇(CH3SH)的采样测定方法按照国标GB/T14678气相色谱法;The sampling and determination methods of hydrogen sulfide (H 2 S) and methyl mercaptan (CH 3 SH) are in accordance with the national standard GB/T14678 gas chromatography;

检测结果(按恶臭污染物排放标准GB1455493)。Test results (according to GB1455493 emission standard for odor pollutants).

实施效果如下表所示The implementation effect is shown in the table below

如图9所示,为本发明非均匀场强等离子体废气处理系统的实施例二结构示意图,其大部分结构与上述实施例一的结构相同,其不同之处是:该系统包括两个进气管1,两个进气管1分别与一第一旁通管23的一端连通,两个第一旁通管23上分别安装旁路蝶阀24。两个进气管1分别与填料塔3的进气口连通。两个填料塔3的排气口分别通过第一连接管4与等离子壳体5的进气口连通。两个等离子壳体5的左、右端分别设有进气口和出气口。两个等离子壳体5的出气口分别通过第二连接管6与两个离心风机8连通。两个第二连接管6分别与两个第一旁通管23的另一端连通。两个离心风机8通过两个第三连接管7与排气管2连通。这样设计可以同时处理大流量废气。As shown in Figure 9, it is a schematic structural diagram of Embodiment 2 of the non-uniform field strength plasma waste gas treatment system of the present invention. Most of its structure is the same as that of Embodiment 1 above. The air pipe 1 and the two intake pipes 1 communicate with one end of a first bypass pipe 23 respectively, and bypass butterfly valves 24 are respectively installed on the two first bypass pipes 23 . The two inlet pipes 1 communicate with the inlets of the packed tower 3 respectively. The exhaust ports of the two packed towers 3 communicate with the air inlets of the plasma housing 5 through the first connecting pipe 4 respectively. The left and right ends of the two plasma shells 5 are respectively provided with an air inlet and an air outlet. The gas outlets of the two plasma shells 5 communicate with the two centrifugal fans 8 through the second connecting pipe 6 respectively. The two second connecting pipes 6 communicate with the other ends of the two first bypass pipes 23 respectively. Two centrifugal fans 8 communicate with the exhaust pipe 2 through two third connecting pipes 7 . This design can handle large flow of exhaust gas at the same time.

如图10所示,为本发明非均匀场强等离子体废气处理系统的实施例三结构示意图,其大部分结构与上述实施例一的结构相同,其不同之处是:在等离子壳体5的出气口与第二连接管6之间还串连一个内部装有4×5个等离子处理机构9的等离子壳体5。As shown in Figure 10, it is a schematic structural diagram of Embodiment 3 of the non-uniform field strength plasma waste gas treatment system of the present invention, most of its structure is the same as that of the above-mentioned Embodiment 1, and the difference is: in the plasma shell 5 A plasma housing 5 with 4×5 plasma processing mechanisms 9 inside is also connected in series between the gas outlet and the second connecting pipe 6 .

以上所述实施例仅仅是对本发明的优选实施方式进行描述,并非对本发明的范围进行限定,在不脱离本发明设计精神的前提下,本领域普通工程技术人员对本发明的技术方案作出的各种变形和改进,均应落入本发明的权利要求书确定的保护范围内。The above-mentioned embodiments are only descriptions of the preferred implementation modes of the present invention, and are not intended to limit the scope of the present invention. Variations and improvements should fall within the scope of protection defined by the claims of the present invention.

Claims (7)

1.一种非均匀场强等离子体废气处理装置,其特征在于:包括等离子壳体(5),所述等离子壳体(5)上设有进、出气口,位于进、出气口之间的等离子壳体(5)的内腔部分上至少一个横截面内安装有若干个等离子处理机构(9),位于同一横截面内的所述等离子处理机构(9)相互沿外缘方向连接且填满所在的横截面,所述等离子处理机构(9)垂直于等离子壳体(5)的进气口,所述等离子处理机构(9)包括框形基座(10),所述基座(10)由绝缘材料制成,所述基座(10)的内腔壁沿周向延伸有环状凸缘(11),所述凸缘(11)的前、后面分别连接地电极板(12)和高压电极板(13),所述地电极板(12)的外缘与凸缘(11)之间设有出风口(14),所述凸缘(11)与地电极板(12)之间设有绝缘介质板(15),所述地电极板(12)的外表面设有第一绝缘层(16),所述地电极板(12)上连接有地电极引出线,所述地电极引出线穿过第一绝缘层(16)后与高压交流电源的接地端连接,所述高压电极板(13)的前表面具有若干个尖锥体(17),各所述尖锥体(17)的后表面为相应的锥形槽,各所述尖锥体(17)的尖端分别设有第一通孔(18),所述高压电极板(13)的后表面设有第二绝缘层(19),所述第二绝缘层(19)上与各第一通孔(18)位置前、后对应的部位分别设有第二通孔(20),所述高压电极板(13)连接高压电极引出线(21),所述高压电极引出线(21)穿出基座(10)后与高压电源的高压端连接。1. A non-uniform field strength plasma exhaust gas treatment device, characterized in that: comprising a plasma shell (5), said plasma shell (5) is provided with an air inlet and an air outlet, and is located between the air inlet and the air outlet Several plasma processing mechanisms (9) are installed in at least one cross-section of the inner cavity of the plasma shell (5), and the plasma processing mechanisms (9) located in the same cross-section are connected to each other along the outer edge direction and filled The cross section where the plasma processing mechanism (9) is perpendicular to the air inlet of the plasma housing (5), the plasma processing mechanism (9) includes a frame-shaped base (10), and the base (10) Made of insulating material, the inner cavity wall of the base (10) has an annular flange (11) extending in the circumferential direction, and the front and rear of the flange (11) are respectively connected to the ground electrode plate (12) and A high-voltage electrode plate (13), an air outlet (14) is provided between the outer edge of the ground electrode plate (12) and the flange (11), and an air outlet (14) is provided between the flange (11) and the ground electrode plate (12). An insulating medium plate (15) is provided, the outer surface of the ground electrode plate (12) is provided with a first insulating layer (16), the ground electrode lead wire is connected to the ground electrode plate (12), and the ground electrode The lead-out wire passes through the first insulating layer (16) and is connected to the ground terminal of the high-voltage AC power supply. The front surface of the high-voltage electrode plate (13) has several pointed cones (17), and each of the pointed cones (17 ) is a corresponding tapered groove, the tip of each of the pointed cones (17) is respectively provided with a first through hole (18), and the rear surface of the high voltage electrode plate (13) is provided with a second insulating layer (19), the second through holes (20) are respectively provided on the second insulating layer (19) corresponding to the front and rear positions of the first through holes (18), and the high voltage electrode plate (13) is connected to A high-voltage electrode lead-out wire (21). The high-voltage electrode lead-out wire (21) passes through the base (10) and is connected to the high-voltage end of the high-voltage power supply. 2.如权利要求1所述的非均匀场强等离子体废气处理装置,其特征在于:所述等离子壳体(5)为长方体箱式结构,其左、右两端分别设有变径的所述进、出气口,所述等离子处理机构(9)的基座(10)为矩形框架结构,相邻等离子处理机构(9)的基座(10)之间及相邻的基座(10)与等离子壳体(5)之间分别通过C型槽钢(27)和固定螺钉(28)连接在一起。2. The non-uniform field strength plasma exhaust gas treatment device as claimed in claim 1, characterized in that: the plasma shell (5) is a cuboid box-type structure, and its left and right ends are respectively provided with variable-diameter Said inlet and outlet, the base (10) of the plasma processing mechanism (9) is a rectangular frame structure, between the bases (10) of the adjacent plasma processing mechanism (9) and adjacent bases (10) It is connected with the plasma shell (5) by C-shaped channel steel (27) and fixing screws (28) respectively. 3.如权利要求2所述的非均匀场强等离子体废气处理装置,其特征在于:所述等离子壳体(5)上设有检修门(26)。3. The non-uniform field strength plasma waste gas treatment device according to claim 2, characterized in that: the plasma shell (5) is provided with an inspection door (26). 4.一种使用如权利要求1-3之一所述的非均匀场强等离子体废气处理装置的废气处理系统,包括至少一个进气管(1)和一个排气管(2),其特征在于:各所述进气管(1)分别与填料塔(3)的进气口连通,各所述填料塔(3)的排气口分别通过第一连接管(4)与所述处理装置的等离子壳体(5)的进气口连通,各所述等离子壳体(5)的出气口分别通过第二连接管(6)与离心风机(8)连通,所述离心风机(8)分别通过第三连接管(7)与至少一个排气管(2)连通。4. An exhaust gas treatment system using the non-uniform field strength plasma exhaust gas treatment device according to any one of claims 1-3, comprising at least one intake pipe (1) and an exhaust pipe (2), characterized in that : each of the air inlet pipes (1) is communicated with the air inlet of the packed tower (3) respectively, and the exhaust port of each of the packed towers (3) is connected to the plasma of the processing device through the first connecting pipe (4) respectively. The air inlets of the shells (5) are communicated, and the air outlets of each of the plasma shells (5) are respectively communicated with the centrifugal fans (8) through the second connecting pipes (6), and the centrifugal fans (8) are respectively connected through the second connecting pipes (6). The three connecting pipes (7) communicate with at least one exhaust pipe (2). 5.如权利要求4所述的废气处理系统,其特征在于:各所述等离子壳体(5)的进气口与各第二连接管(6)之间分别串连至少一个内部装有等离子处理机构(9)的等离子壳体(5)。5. The exhaust gas treatment system according to claim 4, characterized in that: at least one plasma tube is connected in series between the air inlet of each plasma shell (5) and each second connecting pipe (6). Plasma housing (5) of processing mechanism (9). 6.如权利要求5所述的废气处理系统,其特征在于:所述进气管(1)上设有进气蝶阀(22)。6. The exhaust gas treatment system according to claim 5, characterized in that: the intake pipe (1) is provided with an intake butterfly valve (22). 7.如权利要求6所述的废气处理系统,其特征在于:所述进气管(1)与第一旁通管(23)的一端连通,所述第一旁通管(23)上设有旁路蝶阀(24),所述第一旁通管(23)的另一端与第二连接管(6)连通。7. The exhaust gas treatment system according to claim 6, characterized in that: the intake pipe (1) communicates with one end of the first bypass pipe (23), and the first bypass pipe (23) is provided with A bypass butterfly valve (24), the other end of the first bypass pipe (23) communicates with the second connecting pipe (6).
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