CN103108985B - Apparatus for processing flexible substrate - Google Patents

Apparatus for processing flexible substrate Download PDF

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Publication number
CN103108985B
CN103108985B CN201180041755.0A CN201180041755A CN103108985B CN 103108985 B CN103108985 B CN 103108985B CN 201180041755 A CN201180041755 A CN 201180041755A CN 103108985 B CN103108985 B CN 103108985B
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Prior art keywords
cylindrical shell
substrate
injector head
precursor
transfer surface
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CN201180041755.0A
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CN103108985A (en
Inventor
J·辛科
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Qingdao Sifang Sri Intelligent Technology Co ltd
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Beneq Oy
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The present invention relates to an apparatus for processing a surface (4) of a flexible substrate (6). The apparatus comprising transport mechanism (20, 22, 24, 26, 28, 30, 8, 10) for transporting the substrate (6) and at least one nozzle head (2) comprising two or more precur- sor zones (14, 16) for subjecting the surface (4) of the substrate (6) to at least first and second precursors. Ac- cording to the invention the transport mechanism (20, 22, 24, 26, 28, 30, 8, 10) comprises a transport cylinder (8) and the nozzle head is formed as a nozzle head cylinder (2) arranged around the transport cylinder (8) for trans- porting and processing the substrate (6) between the transport cylinder (8) and the nozzle head cylinder (2).

Description

For the treatment of the device on the surface of flexible substrates
Technical field
The present invention relates to a kind of by making the surface of flexible substrates stand the surface reaction in succession of at least the first precursor and the second precursor and process the device on the surface of substrate, particularly relating to a kind of device of the surface for the treatment of flexible substrates.
Background technology
In polytype device of prior art, according to the principle of Atomic layer deposition method (ALD), the in succession surface reaction of injector head for making the surface of substrate stand at least the first precursor and the second precursor.In ALD application, typically two kinds of gaseous precursors are introduced in ALD reactor in the stage of separating.The surface of gaseous precursors and substrate is reacted effectively, thus forms individual layer ald.Typically, followed by the removing stage after the precursor stage, or separate the precursor stage with the removing stage, this removing stage removed too much precursor from substrate surface before introducing other precursor respectively.Therefore, ALD process need precursor flow is to the flow in succession replaced of substrate surface.The repeated sequence of the surface reaction that should replace and intervenient removing stage are a kind of typical ALD deposition cycle.
The ALD device of prior art generally includes injector head, and this injector head has: one or more the first precursor region for making the surface of substrate stand the first precursor effect; One or more the second precursor region for making the surface of substrate stand the second precursor effect; And to be one or morely arranged between the first precursor region and the second precursor region for the removing gas zones making the surface of substrate stand to remove gas effect.Following region is alternately set in injector head in succession: the first precursor region, removing gas zones, the second precursor region, removing gas zones, the first precursor region, removing gas zones, the second precursor region etc.Therefore, according to ALD side's ratio juris, when injector head moves on the surface of the substrate, produce grown layer on the surface of the substrate.Injector head also can comprise discharge-channel, and these discharge-channels are arranged between the first precursor region and the second precursor region or between the first precursor region and removing gas zones or between the second precursor region and removing gas zones.The surface that discharge-channel is arranged in substrate is discharged precursor by after precursor and the effect of removing gas and is removed gas.Alternately, the precursor region of these prior aries comprises with each in removing gas zones: for supplying at least one ingress port of precursor or removing gas; With at least one outlet port for discharging precursor or removing gas.Therefore, after substrate stands precursor or removes the effect of gas, to each for discharging the region of precursor or providing suction function for discharging the region of removing gas.
Owing to producing only one deck atomic shell on the surface of the substrate an ALD cycle period, injector head is formed as comprising multiple first area and second area, to make to utilize injector head just to carry out single sweep operation square one-tenth multi-layer atomic layer on the surface of the substrate on the surface of the substrate.The single sweep operation of injector head is utilized to move by making injector head or substrate and complete.In the prior art, Fast marching mechanism is utilized to make injector head move around to increase the scanning times of injector head, for carrying out the Multiple-Scan of side on the surface of the substrate.Shortcoming for generation of the art methods of multi-layer atomic layer is: move back and forth the mechanicals efforts that generation is very large, and injector head must bear this mechanicals efforts.When injector head has stopped at limit position and again accelerated, this reactive force is large especially.So this device and injector head are easy to damage.
Summary of the invention
The object of the present invention is to provide a kind of device to solve the problem of prior art as mentioned above.Object of the present invention is realized by a kind of device of the surface for the treatment of flexible substrates, and the feature of this device is: the transport sector of equipment arranges and is used for substrate being directed to transfer surface and guiding out from transfer surface.
Invention further describes the preferred embodiments of the present invention.
The present invention is based on following conception: provide a kind of device, hollow barrel-type injector head has output face on the surface at inner barrel, transfer surface conforms to the output face of tubular injector head, to make the bar of flexible substrates or web can transmit or guiding in the gap (transmission route) between output face and transfer surface, and transmit from this transmission route or guide out.In other words, transport sector arranges and is used for the elongated substrate of flexibility being directed to transfer surface and guiding out from transfer surface.In one embodiment, flexible substrates from the first substrate roller supply and can be directed to transfer surface, and can by flexible substrates from transfer surface supply be directed to the second substrate roller.This device is arranged so that, when substrate is along transmission path between output face and transfer surface, according to ald principle, to process flexible substrates by making the surface of flexible substrates stand surface reaction in succession further.Transport sector arranges and is used for substrate transport to the transfer surface of central axis being basically perpendicular to injector head cylindrical shell.This device preferably includes the transport sector with transmission cylindrical shell, and this transmission cylindrical shell comprises opening, for by substrate transport to the transfer surface of central axis being basically perpendicular to injector head cylindrical shell.Transmission cylindrical shell can be the hollow cylinder with opening, and described opening is arranged in the cylindrical shell cover of transmission cylindrical shell, for by substrate transport to the transfer surface of central axis being basically perpendicular to injector head cylindrical shell.Transmission cylindrical shell outside drum surface is provided with transfer surface, for the outside surface transmission substrate along transmission cylindrical shell.In addition, injector head cylindrical shell is provided with output face on the surface at inner barrel, for the surface reaction making the surface of substrate stand at least the first precursor and the second precursor.Injector head cylindrical shell is arranged around transmission cylindrical shell, to make transfer surface and output face toward each other, for the surface by substrate to be processed substrate along transfer surface transmission.
The advantage that the present invention has is that providing a kind of can utilize rotational motion to make the surface of flexible substrates stand the device of precursor effect.In the present invention, both flexible substrates and nozzle all can be arranged to utilize rotational motion.Compared with the moving around of injector head, rotational motion reduces stress that this device stands and reactive force.Because rotational motion can make injector head have higher motion speed, thus the present invention also can provide effective coating.Moreover due to along tubular path instead of the substrate of conventional flat Route guiding, therefore the present invention improves the rate of utilization of baseplate zone.Present invention also offers a kind of device, in the apparatus, substrate can be supplied to circular transmission route, this circular transmission route is basically perpendicular to the central axis of cylinder-shaped injector head equably.
Accompanying drawing explanation
Come in conjunction with the preferred embodiments below with reference to accompanying drawings to describe the present invention in more detail, in the accompanying drawings:
Fig. 1 shows the schematic diagram of an embodiment according to device of the present invention.
Embodiment
Fig. 1 schematically shows an embodiment of the apparatus according to the invention.This device comprises two cylindrical shells 8,2 that is arranged on another inside.Inner barrel is transmission cylindrical shell 8, and this transmission cylindrical shell has internal surface and outside surface.The outside surface of transmission cylindrical shell 8 is transfer surface 3, and flexible substrates 6 is guided along transfer surface 3, to make substrate 6 through tubular path.This device comprises outer cylinder body 2 further, and this outer cylinder body 2 is formed as injector head cylindrical shell 2, this injector head cylindrical shell 2 for supplying precursor, with the surface reaction in succession making the surface 4 of substrate 6 stand precursor.As shown in Figure 1, injector head cylindrical shell 2 is arranged for transmission and the substrate 6 between process transmission cylindrical shell 8 and injector head cylindrical shell 2 around transmission cylindrical shell 8.Therefore, between transmission cylindrical shell 8 and injector head cylindrical shell 2, have gap, substrate 6 is arranged in the gap between transmission cylindrical shell 8 and injector head cylindrical shell 2, transmits at least part of tubular or circular transmission route.Injector head cylindrical shell 2 can comprise gas connector, and these gas connector axially arrange or coaxially arrange relative to the central axis of injector head cylindrical shell 2, for supply and/or evacuated of process gases.Injector head cylindrical shell 2 also can comprise bottom (not shown), can be used for arranging axially arranging or the coaxial gas connector arranged relative to the central axis of injector head cylindrical shell 2 bottom this.
Flexible substrates 6 can be can along circular path carry out guiding any elongated and the substrate of flexibility.In this article, substrate represents itself or is contained in elongated and Powdered, particulate state on the substrate carrier of flexibility or independent parts or object.The precursor used can comprise any precursor being applicable to ald, such as ozone, trimethyl aluminium (TMA), water, titanium tetrachloride (TiCl 4), zinc ethyl (DEZ), or precursor also can be plasma body, such as ammonia (NH 3), argon (Ar), oxygen (O 2), nitrogen (N 2), hydrogen (H 2) or carbonic acid gas (CO 2) plasma body.Can comprise rare gas element for the removing gas in injector head cylindrical shell 2, such as nitrogen, dry air or any other are applicable to the gas being used as removing gas in ald.Plasma body also can be used for removing operation, such as nitrogen or argon plasma.In this article, removing gas and precursor also comprise plasma body.
According to Fig. 1, this device comprises transport sector and at least one injector head cylindrical shell 2, transport sector comprises the transmission cylindrical shell 8 for transmitting substrate 6, and injector head cylindrical shell 2 has two or more precursor regions 14,16 for making the surface 4 of substrate 6 stand at least the first precursor and the second precursor effect.As mentioned above, transmission cylindrical shell 8 outside drum surface is provided with transfer surface 3, for making substrate 6 along the outside surface transmission of transmission cylindrical shell 8.Correspondingly, injector head cylindrical shell 2 is provided with output face 5 on the surface at inner barrel, for the surface reaction making the surface 4 of substrate 6 stand at least the first precursor and the second precursor.As shown in Figure 1, injector head cylindrical shell 2 is arranged, to make transfer surface 3 and output face 5 toward each other, for processing the surface 4 of substrate 6 by making substrate 6 transmit along transfer surface 3 around transmission cylindrical shell 8.Gap is provided with between transfer surface 3 and output face 5.This gap forms transmission route, and substrate 6 is transmitted between transmission cylindrical shell 8 and injector head cylindrical shell 2 along this transmission route.So, forming reactions space between transfer surface 3 and output face 5.So substrate 6 is moved along for the transfer surface 3 of reaction compartment, substrate surface 4 and output face 5.
The transport sector of this device preferably includes the one or more transfer elements being supplied to transfer surface 3, and this one or more transfer element to move along transfer surface 3 for guiding substrate 6 and to accelerate the movement of substrate 6.In the embodiment in figure 1, transfer element is formed as conveying roller 10, and these conveying rollers 10 roughly extend along the central axial direction of injector head cylindrical shell 2 and transmission cylindrical shell 8.Conveying roller 10 can be the roller or return idler that freely rotate.Transfer element also can be such as conveying belt or sliding surface.
As shown in Figure 1, this device comprises the first substrate roller 20 and the second substrate roller 22.Substrate 6 can be supplied to transmission route between injector head cylindrical shell 2 and transmission cylindrical shell 8 to process from the first substrate roller 20, and substrate 6 can be supplied to the second substrate roller 22 from transmission route.Substrate 6 also can be supplied to the first substrate roller 20 from the second substrate roller 22 in the same manner further.And, the transmission route that substrate 6 can be driven through between the first substrate roller 20 and the second substrate roller 22 by twice or more time.First substrate roller 20 and the second substrate roller 22 can be driven into and make them provide reactive force to pass through transmission route to make substrate 6 move.It should be noted, injector head cylindrical shell 2 and transmission cylindrical shell 8 can be parts for device, or they can be the separate parts that can be connected to this device.First substrate roller 20 and the second substrate roller 22 also can be replaced by the container of some other type for storing substrate 6, supply and receive.
The transport sector of this device comprises guide element further, for substrate 6 being directed at transmission cylindrical shell 8 or the transmission route between transfer surface 3 and injector head cylindrical shell 2, and guides out from transmission route or transfer surface 3.In the embodiment in figure 1, guide element comprises one or more guide roller 24,26,28,30, for substrate 6 being directed to transfer surface 3 or guiding out from transfer surface 3.In FIG, guide roller 24,26 arranges the first conveying roller 28 being used for substrate 6 to guide and most transmitting in opening 32 and directed transmission surface 3 that cylindrical shell 8 arranges.Opening 32 passes the wall of hollow delivery cylindrical shell 8 and the central axial direction along transmission cylindrical shell 8 extends.Last conveying roller 30 and the second substrate roller 22 are arranged so that substrate 6 can directly be directed to the second substrate roller 22 from transfer surface 3.But, it should be noted, guide element, guide roller 24,26,28,30, first substrate roller 20 and the second substrate roller 22 also can be arranged differently, and the present invention is not limited to the configuration of guide element, guide roller 24,26,28,30, first substrate roller 20 and the second substrate roller 22.Therefore, transport sector can comprise one or more guide roller, guidance surface or other is for guide element substrate 6 being directed to transfer surface 3 and guide out from transfer surface 3.
As can be seen from Figure 1, the transmission route of substrate 6 between cylindrical shell is close to 360 degree, and only the width of opening 32 is got rid of from whole circle.But the transmission route between cylindrical shell and transport sector also can be arranged to transmit substrate 6 at least 180 along transfer surface 3 and spend, preferably at least 270 degree and more preferably at least 330 degree.It should be noted, in FIG, transmission cylindrical shell 8 is shown as the hollow cylinder 32 with cut-out 32.Therefore, opening can be 90 degree or even 180 degree.In this article, terms transferred cylindrical shell comprises all these alternative.Therefore, transmission cylindrical shell 8 also can be only the part of cylindrical shell, such as: 270 degree or 180 degree of the cylindrical wall of cylindrical shell or cylindrical shell.Therefore, the transfer surface that cylindrical shell can comprise the part being only cylindrical wall is transmitted.Should also be noted that opening need not cut out as in Fig. 1, but opening also can be formed at the hole in the cover of transmission cylindrical shell.Substrate 6 can be transferred to the transfer surface 3 of the central axis being basically perpendicular to injector head cylindrical shell 2 by opening 32.
Fig. 1 also show the detailed section view of injector head cylindrical shell 2.Injector head cylindrical shell 2 is on an internal surface and one after the other comprise by following order in output face 5: remove gas zones 13, precursor region 14,16 and discharge areas 11, they alternatively repeatedly.Removing gas zones 13, precursor region 14,16 and discharge areas 11 are alternately arranged in succession along the circumferential direction of injector head cylindrical shell 2.As shown in Figure 1, injector head cylindrical shell 2 one after the other comprises by following order in output face 5: the first precursor region 14, discharge areas 11, removing gas zones 13, second precursor region 16, discharge areas 11 and removing gas zones 13, they alternatively repeatedly.Precursor is supplied with the surface reaction making the surface of substrate stand precursor via the first precursor region 14 and the second precursor region 16.Utilize absorption or vacuum to be supplied to by removing gas and remove in gas zones 13 and utilize discharge areas 11 to discharge precursor.As shown in Figure 1, the first precursor region 14 and the second precursor region 16 can be formed as the passage that roughly extends along the central axial direction of injector head cylindrical shell 2 or otch or analogue.In an alternative embodiment, many passages 14,16,11,13 can be arranged to angularly extend relative to the central axial direction of injector head cylindrical shell 2, passage 14,16,11, angle between 13 and central axis can be such as 1 degree to 10 degree.First precursor region 14 and the second precursor region 16 also can be provided for the precursor nozzle of supplying precursor by setting.
The configuration of Fig. 1 provides uniform gas stream along the first precursor region 16, precursor region 14, second and the whole length of removing gas zones 13, also provides uniform discharge along discharge areas 11.So the first precursor region 14 and the second precursor region 16 can be set to precursor nozzle 14,16, thus supply precursor along the whole length in precursor region.Remove gas zones 13 also can be set to remove gas jet, thus along removing the whole length supply removing gas of gas zones, and discharge areas 11 arranges the whole length discharge precursor and removing gas that are used for along discharge areas.
In an alternative embodiment, output face is one after the other provided with along the peripheral direction of injector head cylindrical shell 2 by following order: the first precursor region 14, removing gas zones 13, second precursor region 16 and removing gas zones 13, alternatively repeatedly.In the present embodiment, first precursor region 14 is provided with at least one for supplying the first ingress port of the first precursor and at least one is for discharging the first outlet port of the first precursor, second precursor region 16 is provided with at least one for supplying the second ingress port of the second precursor and at least one is for discharging the second outlet port of the second precursor, and removes gas zones 13 and be provided with at least one for supplying the 3rd ingress port removing gas.Remove gas zones 13 and also can comprise one or more 3rd outlet port, or alternately removing gas can discharge via the outlet port in precursor region.Ingress port such as can be positioned at the precursor passage of lengthwise and remove an end of gas passage, and outlet port can be positioned at precursor passage or remove the other end of gas passage, can along these channel flow to make precursor and to remove gas.Alternately, ingress port can be located substantially on the centre of passage, and outlet port can be positioned at the opposed end of passage.
As shown in Figure 1, when substrate 6 is along the transmission path transmitted between cylindrical shell 8 and injector head cylindrical shell 2, the substrate surface 4 towards the output face 5 of injector head cylindrical shell 2 stands the alternating action in succession in precursor region.It should be noted, output face 5 can comprise two or more precursor regions, but preferably output face 5 comprises several precursor regions, to make, when substrate 6 is conveyed through the transmission route between injector head cylindrical shell 2 and transmission cylindrical shell 8, the surface 4 of substrate 6 can form several grown layers.
The coatability of this device is can further improve around the center axis thereof of injector head cylindrical shell 2 by making injector head cylindrical shell 2.Therefore, this device can comprise for making injector head cylindrical shell 2 around the rotating mechanism (not shown) of the center axis thereof of injector head cylindrical shell 2.Rotating mechanism can be arranged to injector head cylindrical shell 2 is rotated in the transmission direction of substrate 6 along transfer surface 3, or injector head cylindrical shell 2 is rotated on the direction contrary relative to the transmission direction of substrate 6 along transfer surface 3.When injector head cylindrical shell 2 rotates along transfer surface 3 in the transmission direction of substrate 6, injector head cylindrical shell 2 should rotate with the speed of the transmission speed higher than substrate 6.Move period in substrate along transmission route, the injector head cylindrical shell 2 of rotation makes the surface of substrate stand the effect in precursor region 14,16 for more than 4 time.Therefore, when substrate 6 is conveyed through transmission route one time, multiple grown layer can be provided.Precursor and removing gas can be supplied to injector head 2 via fluid connection.Alternately, injector head 2 is provided with one or more for precursor and/or remove the container of gas, bottle or analogue, if to make injector head move, then and precursor and/or remove gas and move together with injector head.This configuration reduces the quantity being connected to the implacable fluid connection of the injector head 2 of movement.
It will be apparent to one skilled in the art that, due to technological merit of the present invention, design of the present invention can be adopted and be implemented in various manners.The present invention and embodiment are not limited to above-mentioned example, but can change in the scope of every claim.

Claims (21)

1. the device on the surface (4) of the substrate for the treatment of flexibility (6), carry out described process by making the surface of substrate (6) (4) stand the surface reaction in succession of at least the first precursor and the second precursor, described device comprises:
At least one injector head (2), at least one injector head described comprises two or more precursor regions (14,16) for making the surface of substrate (6) (4) stand at least the first precursor and the second precursor effect; With
For transmitting the transport sector (20,22,24,26,28,30,8,10) of substrate (6);
Injector head is formed as injector head cylindrical shell (2), described injector head cylindrical shell is provided with output face (5) on the surface at inner barrel, for the surface reaction making the surface of substrate (6) (4) stand at least the first precursor and the second precursor; And
Transport sector (20,22,24,26,28,30,8,10) comprises transfer surface (3), described transfer surface conforms at least partly with the output face (5) of injector head cylindrical shell (2), for transmitting substrate (6) between output face (5) and transfer surface (3);
It is characterized in that: transport sector (20,22,24,26,28,30,8,10) arranges and is used for substrate (6) being directed to transfer surface (3) and guiding out from transfer surface (3), and transfer surface (3) is provided with one or more for the transfer element (10) along transfer surface (3) guiding substrate (6).
2. device according to claim 1, wherein, transport sector (20,22,24,26,28,30,8,10) comprises the transmission cylindrical shell (8) of at least part of tubular, transmission cylindrical shell has described transfer surface (3), described transfer surface outside drum surface is arranged on the inside of injector head cylindrical shell (2), for transmitting between transmission cylindrical shell (8) and injector head cylindrical shell (2) and processing substrate (6).
3. device according to claim 1, wherein, transport sector (20,22,24,26,28,30,8,10) arranges the transfer surface (3) being used for substrate (6) being transferred to the central axis being basically perpendicular to injector head cylindrical shell (2).
4. device according to claim 2, wherein, transmission cylindrical shell (8) comprises opening (32), for substrate (6) being transferred to the transfer surface (3) of the central axis being basically perpendicular to injector head cylindrical shell (2).
5. device according to claim 4, wherein, transmission cylindrical shell (8) is the hollow cylinder with described opening (32), opening (32) is arranged in the cylindrical shell cover of transmission cylindrical shell (8), for the transfer surface (3) substrate (6) being transferred to the central axis being basically perpendicular to injector head cylindrical shell (2).
6. device according to claim 1, wherein, transfer element comprises conveying roller (10), conveying belt or sliding surface.
7. device according to claim 1, wherein, transport sector comprises one or more guide element (24,26,28,30) for substrate (6) being directed to transfer surface (3).
8. device according to claim 7, wherein, guide element comprises one or more guide roller (24,26,28,30) or bar, for substrate (6) being directed to transfer surface (3) and guiding out from transfer surface (3).
9. device according to claim 1, wherein, transport sector comprises the first substrate roller (20) and the second substrate roller (22), substrate (6) can be transmitted between the first substrate roller (20) and the second substrate roller (22), to make to process substrate (6) between the first substrate roller (20) and the second substrate roller (22).
10. device according to claim 1, wherein, injector head cylindrical shell (2) is provided with the one or more first precursor region (14) and one or more second precursor region (16) that the circumferential direction along injector head cylindrical shell (2) alternately arranges in succession.
11. devices according to claim 10, wherein, injector head cylindrical shell (2) one after the other comprises in the following order in output face (5): remove gas zones (13), precursor region (14,16) and discharge areas (11).
12. devices according to claim 10, wherein, injector head cylindrical shell (2) one after the other comprises in the following order in output face (5): the first precursor region (14), discharge areas (11), removing gas zones (13), the second precursor region (16), discharge areas (11) and removing gas zones (13).
13. devices according to claim 10, wherein, output face (5) is one after the other provided with in the following order: the first precursor region (14), removing gas zones (13), the second precursor region (16) and removing gas zones (13).
14. devices according to claim 13, wherein, first precursor region (14) is provided with at least one for supplying the ingress port of the first precursor and at least one is for discharging the outlet port of the first precursor, second precursor region (16) is provided with at least one for supplying the ingress port of the second precursor and at least one is for discharging the outlet port of the second precursor, and removes gas zones (13) and be provided with at least one for supplying the ingress port removing gas.
15. devices according to claim 10, wherein, first precursor region (14) and the second precursor region (16) are formed by passage, described passage extends along the central axial direction of injector head cylindrical shell (2), or described passage angularly extends relative to the central axial direction of injector head cylindrical shell (2).
16. devices according to claim 1, wherein, described device comprises rotating mechanism, and described rotating mechanism is used for making injector head cylindrical shell (2) or transmitting the center axis thereof of cylindrical shell (8) around injector head cylindrical shell (2).
17. devices according to claim 16, wherein, described rotating mechanism is arranged to injector head cylindrical shell (2) or transmission cylindrical shell (8) are rotated in the transmission direction of substrate (6) along transfer surface (3), or injector head cylindrical shell (2) or transmission cylindrical shell (8) are rotated on the direction contrary relative to the transmission direction of substrate (6) along transfer surface (3).
18. devices according to claim 1, wherein, transport sector (20,22,24,26,28,30,8,10) is arranged to spend along transfer surface (3) transmission substrate (6) at least 270.
19. devices according to claim 18, wherein, transport sector (20,22,24,26,28,30,8,10) is arranged to spend along transfer surface (3) transmission substrate (6) at least 330.
20. devices according to claim 1, wherein, injector head cylindrical shell (2) comprises for being supplied and/or the gas connector of evacuated of process gases, and described gas connector axially arranges relative to the central axis of injector head cylindrical shell (2) or coaxially arranges.
21. devices according to any one of claim 11-13, wherein, described order repeats repeatedly.
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FI20105906A FI20105906A0 (en) 2010-08-30 2010-08-30 Device
PCT/FI2011/050743 WO2012028776A1 (en) 2010-08-30 2011-08-25 Apparatus

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