CN103108985A - Apparatus - Google Patents
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- CN103108985A CN103108985A CN2011800417550A CN201180041755A CN103108985A CN 103108985 A CN103108985 A CN 103108985A CN 2011800417550 A CN2011800417550 A CN 2011800417550A CN 201180041755 A CN201180041755 A CN 201180041755A CN 103108985 A CN103108985 A CN 103108985A
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- Prior art keywords
- cylindrical shell
- substrate
- injector head
- precursor
- transfer surface
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
Abstract
The present invention relates to an apparatus for processing a surface (4) of a flexible substrate (6). The apparatus comprising transport mechanism (20, 22, 24, 26, 28, 30, 8, 10) for transporting the substrate (6) and at least one nozzle head (2) comprising two or more precur- sor zones (14, 16) for subjecting the surface (4) of the substrate (6) to at least first and second precursors. Ac- cording to the invention the transport mechanism (20, 22, 24, 26, 28, 30, 8, 10) comprises a transport cylinder (8) and the nozzle head is formed as a nozzle head cylinder (2) arranged around the transport cylinder (8) for trans- porting and processing the substrate (6) between the transport cylinder (8) and the nozzle head cylinder (2).
Description
Technical field
The present invention relates to a kind of surface reaction in succession that stands at least the first precursor and the second precursor by the surface that makes flexible substrates and process the device on the surface of substrate, particularly relate to a kind of device as described in the preamble according to claim 1.
Background technology
In polytype device of prior art, according to the principle of Atomic layer deposition method (ALD), injector head stands the surface reaction in succession of at least the first precursor and the second precursor for the surface that makes substrate.In ALD uses, typically two kinds of gaseous state precursors are introduced in the ALD reactor in the stage of separating.React effectively on the surface of gaseous state precursor and substrate, thereby form the individual layer ald.Typically, following the removing stage after the stage at precursor, perhaps the precursor stage separated with the removing stage, and this removing stage was removed too much precursor from substrate surface before introducing respectively other precursor.Therefore, ALD process need precursor flows to the flow that in succession replaces of substrate surface.Repeated sequence and the intervenient removing stage of the surface reaction that should replace are a kind of typical ALD deposition cycle.
The ALD device of prior art generally includes injector head, and this injector head has: one or more the first precursor zones of standing the first precursor effect be used to the surface that makes substrate; One or more the second precursor zones of standing the second precursor effect be used to the surface that makes substrate; And one or more being arranged between the first precursor zone and the second precursor zone with for making the surface of substrate stand to remove the removing gas zones of gas effect.Following zone alternately is set in injector head in succession: the first precursor zone, remove gas zones, the second precursor zone, remove gas zones, the first precursor zone, remove gas zones, the second precursor zone etc.Therefore, according to the principle of ALD method, when injector head moves, produce grown layer on the surface of substrate on substrate surface.Injector head also can comprise discharge-channel, these discharge-channels be arranged between the first precursor zone and the second precursor zone or the first precursor zone with remove between gas zones or at the second precursor between regional and removing gas zones.The surface that discharge-channel is arranged in substrate is subjected to precursor and removes the gas effect and discharge precursor afterwards and remove gas.Alternately, each in the precursor of these prior aries zone and removing gas zones comprises: at least one ingress port that is used for the supply precursor or removes gas; With at least one the outlet port that is used for discharging precursor or removing gas.Therefore, after substrate stands the effect of precursor or removing gas, each is used for the zone of discharging precursor or is used for discharging the zone of removing gas providing suction function.
Owing to producing only one deck atomic shell on the surface of an ALD cycle period in substrate, injector head forms and comprises a plurality of first areas and second area, forms multi-layer atomic layer so that utilize injector head to carry out single sweep operation in the surface of substrate in the surface of substrate.Utilize the single sweep operation of injector head to complete by injector head or substrate are moved.In the prior art, utilize quick walking mechanism to make injector head move around to increase the scanning times of injector head, be used for carrying out the Multiple-Scan in the surface of substrate.Shortcoming for generation of the art methods of multi-layer atomic layer is: moving back and forth produces very large mechanicals efforts, and injector head must bear this mechanicals efforts.When injector head had stopped at limit position and again accelerated, this reactive force was large especially.So this device and injector head are easy to damage.
Summary of the invention
The object of the present invention is to provide a kind of device to solve the problem of prior art as mentioned above.Purpose of the present invention realizes by the described device of characteristic according to claim 1, and this device is characterised in that: the transport sector of equipment is provided for substrate being directed to transfer surface and guiding out from transfer surface.
The preferred embodiments of the present invention have been described in the dependent claims.
The present invention is based on following conception: provide a kind of device, the hollow barrel-type injector head has output face on the inner barrel surface, transfer surface conforms to the output face of tubular injector head, so that the bar of flexible substrates or web can the gap (transmission route) between output face and transfer surface in transmission or guiding, and transmission or guide out from this transmission route.In other words, transport sector is provided for the elongated substrate of flexibility is directed to transfer surface and guides out from transfer surface.In one embodiment, flexible substrates can and be directed to transfer surface from the first substrate roller supply, and can be with flexible substrates from the transfer surface supply be directed to the second substrate roller.This device further is arranged so that, according to the ald principle, can stand surface reaction in succession by the surface that makes flexible substrates and process flexible substrates during along the transmission path between output face and transfer surface when substrate.Transport sector is provided for substrate is transferred to the transfer surface of the central axis that is basically perpendicular to the injector head cylindrical shell.This device preferably includes the transport sector with transmission cylindrical shell, and this transmission cylindrical shell comprises opening, is used for substrate is transferred to the transfer surface of the central axis that is basically perpendicular to the injector head cylindrical shell.The transmission cylindrical shell can be the hollow cylinder with opening, and described opening is arranged in the cylindrical shell cover of transmission cylindrical shell, to be used for substrate is transferred to the transfer surface of the central axis that is basically perpendicular to the injector head cylindrical shell.Transmission cylindrical shell drum surface outside is provided with transfer surface, is used for the outside surface transmission substrate along the transmission cylindrical shell.In addition, the injector head cylindrical shell is provided with output face on the inner barrel surface, is used for making the surface of substrate to stand the surface reaction of at least the first precursor and the second precursor.The injector head cylindrical shell, is used for by substrate is transmitted the surface of processing substrate along transfer surface so that transfer surface and output face are toward each other around the setting of transmission cylindrical shell.
The advantage that the present invention has is to provide a kind of surface that can utilize rotational motion to make flexible substrates to stand the device of precursor effect.In the present invention, flexible substrates and nozzle both all can be arranged to utilize rotational motion.Compare with moving around of injector head, rotational motion reduces stress and the reactive force that this device stands.Because rotational motion can make injector head have higher motion speed, thereby the present invention also can provide effective coating.Moreover due to along the tubular path rather than traditional horizontal route guiding substrate, so the present invention improves the rate of utilization of baseplate zone.The present invention also provides a kind of device, in this device, substrate can be supplied to circular transmission route, and this circle transmission route is basically perpendicular to the central axis of cylinder-shaped injector head equably.
Description of drawings
Come in conjunction with the preferred embodiments below with reference to accompanying drawings to describe in more detail the present invention, in the accompanying drawings:
Fig. 1 shows the schematic diagram according to an embodiment of device of the present invention.
Embodiment
Fig. 1 schematically shows an embodiment of the apparatus according to the invention.This device comprises two cylindrical shells 8,2 that are arranged on another inside.Inner barrel is transmission cylindrical shell 8, and this transmission cylindrical shell has internal surface and outside surface.The outside surface of transmission cylindrical shell 8 is transfer surface 3, and flexible substrates 6 is guided along transfer surface 3, so that substrate 6 is through the tubular path.This device further comprises outer cylinder body 2, and this outer cylinder body 2 forms injector head cylindrical shell 2, and this injector head cylindrical shell 2 is used for the supply precursor, so that the surface reaction in succession of precursor is stood on the surface 4 of substrate 6.As shown in Figure 1, injector head cylindrical shell 2 arranges to be used for transmission and processes the substrate 6 of transmitting between cylindrical shell 8 and injector head cylindrical shell 2 around transmission cylindrical shell 8.Therefore, gapped between transmission cylindrical shell 8 and injector head cylindrical shell 2, substrate 6 is arranged in the gap of transmitting between cylindrical shell 8 and injector head cylindrical shell 2, transmits at least part of tubular or circular transmission route.Injector head cylindrical shell 2 can comprise the gas web member, and these gas web members axially arrange or coaxial setting with respect to the central axis of injector head cylindrical shell 2, to be used for supply and/or evacuated of process gases.Injector head cylindrical shell 2 also can comprise the bottom (not shown), and this bottom can be used for arranging with respect to the axial setting of central axis of injector head cylindrical shell 2 or the gas web member of coaxial setting.
Flexible substrates 6 can be any elongated and flexible substrate that can guide along circular path.In this article, substrate represents itself or is contained in Powdered, particulate state or independent parts or object on elongated and flexible substrate carrier.The precursor that uses can comprise any precursor that is applicable to ald, such as ozone, trimethyl aluminium (TMA), water, titanium tetrachloride (TiCl
4), zinc ethyl (DEZ), perhaps precursor can be also plasma body, such as ammonia (NH
3), argon (Ar), oxygen (O
2), nitrogen (N
2), hydrogen (H
2) or carbonic acid gas (CO
2) plasma body.The removing gas that is used for injector head cylindrical shell 2 can comprise rare gas element, is applicable to be used as such as nitrogen, dry air or any other gas of removing gas in ald.Plasma body also can be used for removing operation, for example nitrogen or argon plasma.In this article, remove gas and precursor and also comprise plasma body.
According to Fig. 1, this device comprises transport sector and at least one injector head cylindrical shell 2, transport sector comprises the transmission cylindrical shell 8 for transmission substrate 6, and injector head cylindrical shell 2 has the precursor zone 14,16 that at least the first precursor and the second precursor effect are stood in two or more surfaces 4 that are used for making substrate 6.As mentioned above, transmission cylindrical shell 8 drum surface outside is provided with transfer surface 3, is used for making substrate 6 along the outside surface transmission of transmission cylindrical shell 8.Correspondingly, injector head cylindrical shell 2 is provided with output face 5 on the inner barrel surface, is used for making the surface 4 of substrate 6 to stand the surface reaction of at least the first precursor and the second precursor.As shown in Figure 1, injector head cylindrical shell 2 arranges around transmission cylindrical shell 8, so that transfer surface 3 and output face 5 are toward each other, is used for by making substrate 6 transmit the surface 4 of processing substrate 6 along transfer surface 3.Be provided with the gap between transfer surface 3 and output face 5.This gap forms transmission route, and substrate 6 is along the transmission between transmission cylindrical shell 8 and injector head cylindrical shell 2 of this transmission route.So, form reaction compartment between transfer surface 3 and output face 5.So substrate 6 is moved along the transfer surface 3, substrate surface 4 and the output face 5 that are used for reaction compartment.
The transport sector of this device preferably includes the one or more transfer elements that offer transfer surface 3, and these one or more transfer elements are used for the movement that guiding substrate 6 is moved and accelerated substrate 6 along transfer surface 3.In the embodiment in figure 1, transfer element forms conveying roller 10, and these conveying rollers 10 roughly extend along the central axial direction of injector head cylindrical shell 2 and transmission cylindrical shell 8.Conveying roller 10 can be roller or the return idler that freely rotates.Transfer element can be for example also conveying belt or sliding surface.
As shown in Figure 1, this device comprises the first substrate roller 20 and the second substrate roller 22.Substrate 6 can be supplied at injector head cylindrical shell 2 and transmission the transmission route between cylindrical shell 8 processing from the first substrate roller 20, and substrate 6 can be supplied to the second substrate roller 22 from transmission route.Substrate 6 also can further be supplied to the first substrate roller 20 from the second substrate roller 22 in the same manner.And substrate 6 can be driven by the transmission route between the first substrate roller 20 and the second substrate roller 22 by twice or more times.The first substrate roller 20 and the second substrate roller 22 can be driven into and make them that reactive force is provided so that substrate 6 moves through transmission route.It should be noted, injector head cylindrical shell 2 and transmission cylindrical shell 8 can be the parts of device, or they can be the separate parts that can be connected to this device.The first substrate roller 20 and the second substrate roller 22 also can be replaced by the container of some other type that is used for substrate 6 is stored, supplies and receives.
The transport sector of this device further comprises guide element, is used for substrate 6 is directed at the transmission route that transmits between cylindrical shell 8 or transfer surface 3 and injector head cylindrical shell 2, and guides out from transmission route or transfer surface 3.In the embodiment in figure 1, guide element comprises one or more guide rollers 24,26,28,30, is used for substrate 6 being directed to transfer surface 3 or guiding out from transfer surface 3.In Fig. 1, guide roller 24,26 is provided for the opening 32 of cylindrical shell 8 settings and the first conveying roller 28 in guiding transfer surface 3 are most transmitted in substrate 6 guidings.Opening 32 passes the wall of hollow transmission cylindrical shell 8 and extends along the central axial direction of transmission cylindrical shell 8.Last conveying roller 30 and the second substrate roller 22 are arranged so that substrate 6 can directly be directed to the second substrate roller 22 from transfer surface 3.Yet, it should be noted, guide element, guide roller 24,26,28,30, the first substrate roller 20 and the second substrate roller 22 also can arrange differently, and the present invention is not limited to the configuration of guide element, guide roller 24,26,28,30, the first substrate roller 20 and the second substrate roller 22.Therefore, transport sector can comprise that one or more guide rollers, guidance surface or other are used for the guide element that substrate 6 is directed to transfer surface 3 and guides out from transfer surface 3.
As can be seen from Figure 1, the transmission route of substrate 6 between cylindrical shell is near 360 degree, and only the width of opening 32 is got rid of from whole circle.Yet the transmission route between cylindrical shell and transport sector also can be arranged to along transfer surface 3 transmission substrate 6 180 degree, preferably at least 270 degree and more preferably at least 330 degree at least.It should be noted, in Fig. 1, transmission cylindrical shell 8 is shown as the hollow cylinder 32 with cut-out 32.Therefore, opening can for 90 the degree or even 180 the degree.In this article, the terms transferred cylindrical shell comprises all these alternative.Therefore, transmission cylindrical shell 8 can be only also the part of cylindrical shell, such as: 270 degree of the cylindrical wall of cylindrical shell or cylindrical shell or 180 degree.Therefore, the transmission cylindrical shell can comprise the transfer surface of a part that is only cylindrical wall.Should also be noted that opening needn't cut out as in Fig. 1, but opening can be also the hole that is formed in the cover that transmits cylindrical shell.Opening 32 can transfer to substrate 6 transfer surface 3 of the central axis that is basically perpendicular to injector head cylindrical shell 2.
Fig. 1 also shows the detailed section view of injector head cylindrical shell 2.Injector head cylindrical shell 2 is one after the other comprising by following order on internal surface and in output face 5: remove gas zones 13, precursor zone 14,16 and discharge areas 11, they alternatively repeatedly.Remove gas zones 13, precursor zone 14,16 and discharge areas 11 along the circumferential direction alternately setting in succession of injector head cylindrical shell 2.As shown in Figure 1, injector head cylindrical shell 2 one after the other comprises by following order in output face 5: the first precursor zone 14, discharge areas 11, remove gas zones 13, the second precursor zone 16, discharge areas 11 and remove gas zones 13, they alternatively repeatedly.Supply precursors so that the surface reaction of precursor is stood on the surface of substrate via regional the 14 and second precursor regional 16 of the first precursor.Utilizing absorption or vacuum will remove gas is supplied in removing gas zones 13 and utilizes discharge areas 11 discharging precursors.As shown in Figure 1, the 14 and second precursor zone 16, the first precursor zone can form passage or otch or the analogue that roughly extends along the central axial direction of injector head cylindrical shell 2.In an alternative embodiment, many passages 14,16,11,13 can be arranged to angularly extend with respect to the central axial direction of injector head cylindrical shell 2, passage 14,16,11,13 and central axis between angle can be for example that 1 degree is to 10 degree.The first the 14 and second precursor zone 16, precursor zone also can be provided by the precursor nozzle that is provided for supplying precursor.
The configuration of Fig. 1 along the first precursor zone 14, the second precursor zone 16 and the whole length of removing gas zones 13 provides uniform gas stream, also provides even discharging along discharge areas 11.So the 14 and second precursor zone 16, the first precursor zone can be set to precursor nozzle 14,16, thereby along the whole length supply precursor in precursor zone.Remove gas zones 13 and also can be set to remove gas jet, thereby remove gas along the whole length supply of removing gas zones, and discharge areas 11 is provided for discharging precursor and removing gas along the whole length of discharge areas.
In an alternative embodiment, output face one after the other is provided with by following order along the peripheral direction of injector head cylindrical shell 2: the first precursor zone 14, remove gas zones 13, the second precursor zone 16 and remove gas zones 13, alternatively repeatedly.In the present embodiment, the first precursor zone 14 is provided with at least one first ingress port that is used for supply the first precursor and at least one is used for the first outlet port of discharging the first precursor, the second precursor zone 16 is provided with at least one second ingress port that is used for supply the second precursor and at least one is used for the second outlet port of discharging the second precursor, and remove gas zones 13 and be provided with at least one and be used for the 3rd ingress port that gas is removed in supply.Remove gas zones 13 and also can comprise one or more the 3rd outlet ports, or alternately remove gas can be via the outlet port discharging in precursor zone.Ingress port can for example be positioned at the precursor passage of lengthwise and an end of removing gas passage, and the other end that the outlet port can be positioned at the precursor passage or remove gas passage, so that precursor and removing gas can be along these channel flow.Alternately, ingress port can be located substantially on the centre of passage, and the outlet port can be positioned at the opposed end of passage.
As shown in Figure 1, when substrate 6 during along the transmission path between transmission cylindrical shell 8 and injector head cylindrical shell 2, stand the alternating action in succession in precursor zone towards the substrate surface 4 of the output face 5 of injector head cylindrical shell 2.It should be noted, output face 5 can comprise that two or more precursors are regional, but preferred output face 5 comprises that several precursors are regional, so that when substrate 6 is transmitted by the transmission route between injector head cylindrical shell 2 and transmission cylindrical shell 8, can form several grown layers on the surface 4 of substrate 6.
By making injector head cylindrical shell 2 rotate around the central axis of injector head cylindrical shell 2 the coating ability that can further improve this device.Therefore, this device can comprise the rotating mechanism (not shown) that rotates be used to the central axis that makes injector head cylindrical shell 2 around injector head cylindrical shell 2.Rotating mechanism can be arranged to make injector head cylindrical shell 2 to rotate in the transmission direction of substrate 6 along transfer surface 3, and injector head cylindrical shell 2 is rotated on respect to the opposite direction of the transmission direction of substrate 6 along transfer surface 3.When injector head cylindrical shell 2 rotated along transfer surface 3 in the transmission direction of substrate 6, injector head cylindrical shell 2 should rotate with the speed higher than the transmission speed of substrate 6.During substrate was moved along transmission route, the injector head cylindrical shell 2 of rotation made the surface of substrate stand the effect in precursor zone 14,16 for more than 4 time.Therefore, during by transmission route one time, can provide a plurality of grown layers when substrate 6 transmission.Precursor and removing gas can be supplied to injector head 2 via the fluid web member.Alternately, injector head 2 is provided with one or more container, bottle or analogues for precursor and/or removing gas, if so that injector head moves, precursor and/or removing gas move together with injector head.This configuration reduces to be connected to the quantity of the implacable fluid web member of mobile injector head 2.
It will be apparent to one skilled in the art that due to technological merit of the present invention, design of the present invention can adopt variety of way to implement.The present invention and embodiment are not limited to above-mentioned example, but can change in the scope of every claim.
Claims (21)
1. the device on the surface (4) of the substrate for the treatment of flexibility (6), stand the surface reaction in succession of at least the first precursor and the second precursor and carry out described processing by the surface (4) that makes substrate (6), and described device comprises:
At least one injector head (2), described at least one injector head comprise that two or more surfaces that are used to make substrate (6) (4) stand the precursor zone (14,16) of at least the first precursor and the second precursor effect; With
The transport sector (20,22,24,26,28,30,8,10) that is used for transmission substrate (6);
Injector head forms injector head cylindrical shell (2), and described injector head cylindrical shell is provided with output face (5) on the inner barrel surface, is used for making the surface (4) of substrate (6) to stand the surface reaction of at least the first precursor and the second precursor; And
Transport sector (20,22,24,26,28,30,8,10) comprises transfer surface (3), at least part of the conforming to of output face (5) of described transfer surface and injector head cylindrical shell (2), be used for transmitting substrate (6) between output face (5) and transfer surface (3);
It is characterized in that: transport sector (20,22,24,26,28,30,8,10) is provided for substrate (6) being directed to transfer surface (3) and guiding out from transfer surface (3).
2. device according to claim 1, wherein, transport sector (20,22,24,26,28,30,8,10) comprises the transmission cylindrical shell (8) of at least part of tubular, the transmission cylindrical shell has described transfer surface (3), described transfer surface is outside on drum surface and be arranged on the inside of injector head cylindrical shell (2), is used for transmission and processing substrate (6) between transmission cylindrical shell (8) and injector head cylindrical shell (2).
3. device according to claim 1 and 2, wherein, transport sector (20,22,24,26,28,30,8,10) is provided for substrate (6) is transferred to the transfer surface (3) of the central axis that is basically perpendicular to injector head cylindrical shell (2).
4. according to claim 2 or 3 described devices, wherein, transmit cylindrical shell (8) and comprise opening (32), is used for substrate (6) is transferred to the transfer surface (3) of the central axis that is basically perpendicular to injector head cylindrical shell (2).
5. device according to claim 4, wherein, transmission cylindrical shell (8) is the hollow cylinder with described opening (32), opening (32) is arranged in the cylindrical shell cover of transmission cylindrical shell (8), to be used for substrate (6) is transferred to the transfer surface (3) of the central axis that is basically perpendicular to injector head cylindrical shell (2).
6. the described device of any one according to claim 1 to 5, wherein, transfer surface (3) is provided with one or more for the transfer element (10) along transfer surface (3) guiding substrate (6).
7. device according to claim 5, wherein, transfer element comprises conveying roller (10), conveying belt or sliding surface.
8. the described device of any one according to claim 1 to 7, wherein, transport sector comprises one or more guide elements (24,26,28,30) for substrate (6) being directed to transfer surface (3).
9. device according to claim 8, wherein, guide element comprises one or more guide rollers (24,26,28,30) or bar, is used for substrate (6) being directed to transfer surface (3) and guiding out from transfer surface (3).
10. the described device of any one according to claim 1 to 9, wherein, transport sector comprises the first substrate roller (20) and the second substrate roller (22), substrate (6) can be transmitted between the first substrate roller and the second substrate roller (20,22), so that process substrate (6) between the first substrate roller and the second substrate roller (20,22).
11. the described device of any one according to claim 1 to 10, wherein, injector head cylindrical shell (2) is provided with along one or more the first precursor zones (14) and one or more the second precursor zone (16) that the circumferential direction of injector head cylindrical shell (2) alternately arranges in succession.
12. device according to claim 11, wherein, injector head cylindrical shell (2) one after the other comprises in output face (5) in the following order: remove gas zones (13), precursor regional (14,16) and discharge areas (11), alternatively repeatedly.
13. according to claim 11 or 12 described devices, wherein, injector head cylindrical shell (2) one after the other comprises in output face (5) in the following order: the first precursor regional (14), discharge areas (11), removing gas zones (13), the second precursor zone (16), discharge areas (11) and removing gas zones (13), alternatively repeatedly.
14. device according to claim 11, wherein, output face (5) one after the other is provided with in the following order: the first precursor zone (14), removing gas zones (13), the second precursor zone (16) and removing gas zones (13), alternatively repeatedly.
15. device according to claim 14, wherein, the first precursor zone (14) is provided with at least one ingress port that is used for supply the first precursor and at least one is used for the outlet port of discharging the first precursor, the second precursor zone (16) is provided with at least one for ingress port of supply the second precursor and at least one outlet port for discharging the second precursor, and removing gas zones (13) is provided with the ingress port that at least one is used for supply removing gas.
16. according to claim 11 to the described device of any one in 15, wherein, precursor zone (14,16) is formed by passage, described passage roughly extends along the central axial direction of injector head cylindrical shell (2), and perhaps described passage angularly extends with respect to the central axial direction of injector head cylindrical shell (2).
17. the described device of any one according to claim 1 to 16, wherein, described device comprises rotating mechanism, and described rotating mechanism is used for making injector head cylindrical shell (2) or transmits cylindrical shell (8) around the central axis rotation of injector head cylindrical shell (2).
18. device according to claim 17, wherein, described rotating mechanism is arranged to make injector head cylindrical shell (2) or transmission cylindrical shell (8) to rotate in the transmission direction of substrate (6) along transfer surface (3), and injector head cylindrical shell (2) or transmission cylindrical shell (8) are rotated on respect to the opposite direction of the transmission direction of substrate (6) along transfer surface (3).
19. the described device of any one according to claim 1 to 18, wherein, transport sector (20,22,24,26,28,30,8,10) is arranged to along transfer surface (3) transmission substrate (6) 270 degree at least.
20. device according to claim 19, wherein, transport sector (20,22,24,26,28,30,8,10) is arranged to along transfer surface (3) transmission substrate (6) 330 degree at least.
21. the described device of any one according to claim 1 to 20, wherein, injector head cylindrical shell (2) comprises the gas web member for supply and/or evacuated of process gases, and described gas web member axially arranges or coaxial setting with respect to the central axis of injector head cylindrical shell (2).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI20105906A FI20105906A0 (en) | 2010-08-30 | 2010-08-30 | Device |
| FI20105906 | 2010-08-30 | ||
| PCT/FI2011/050743 WO2012028776A1 (en) | 2010-08-30 | 2011-08-25 | Apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103108985A true CN103108985A (en) | 2013-05-15 |
| CN103108985B CN103108985B (en) | 2015-02-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201180041755.0A Active CN103108985B (en) | 2010-08-30 | 2011-08-25 | Apparatus for processing flexible substrate |
Country Status (4)
| Country | Link |
|---|---|
| CN (1) | CN103108985B (en) |
| FI (1) | FI20105906A0 (en) |
| TW (1) | TW201219596A (en) |
| WO (1) | WO2012028776A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8470718B2 (en) | 2008-08-13 | 2013-06-25 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film |
| US8758512B2 (en) | 2009-06-08 | 2014-06-24 | Veeco Ald Inc. | Vapor deposition reactor and method for forming thin film |
| US20110076421A1 (en) * | 2009-09-30 | 2011-03-31 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film on curved surface |
| US8840958B2 (en) | 2011-02-14 | 2014-09-23 | Veeco Ald Inc. | Combined injection module for sequentially injecting source precursor and reactant precursor |
| RU2600047C2 (en) * | 2012-03-23 | 2016-10-20 | Пикосан Ой | Method and device for deposition of atomic layers |
| FI125341B (en) * | 2012-07-09 | 2015-08-31 | Beneq Oy | Apparatus and method for processing substrates |
| DE102012111484A1 (en) * | 2012-11-27 | 2014-05-28 | Aixtron Se | Apparatus and method for processing strip-shaped substrates |
| NL2027074B1 (en) | 2020-12-08 | 2022-07-07 | Kalpana Tech B V | Roll-to-roll processing |
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| JP2005133165A (en) * | 2003-10-31 | 2005-05-26 | Masahito Yonezawa | Treatment device and treatment method for beltlike substrate |
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| JP2009052063A (en) * | 2007-08-24 | 2009-03-12 | Dainippon Printing Co Ltd | Method and apparatus for manufacturing gas barrier film, and gas barrier film |
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| US20110076421A1 (en) * | 2009-09-30 | 2011-03-31 | Synos Technology, Inc. | Vapor deposition reactor for forming thin film on curved surface |
| EP2360293A1 (en) * | 2010-02-11 | 2011-08-24 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method and apparatus for depositing atomic layers on a substrate |
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2010
- 2010-08-30 FI FI20105906A patent/FI20105906A0/en not_active Application Discontinuation
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2011
- 2011-08-25 WO PCT/FI2011/050743 patent/WO2012028776A1/en active Application Filing
- 2011-08-25 CN CN201180041755.0A patent/CN103108985B/en active Active
- 2011-08-26 TW TW100130644A patent/TW201219596A/en unknown
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| JP2005133165A (en) * | 2003-10-31 | 2005-05-26 | Masahito Yonezawa | Treatment device and treatment method for beltlike substrate |
| CN1918322A (en) * | 2004-02-09 | 2007-02-21 | 波克股份有限公司 | Barrier layer process and arrangement |
| CN101589171A (en) * | 2006-03-03 | 2009-11-25 | 普拉萨德·盖德吉尔 | Apparatus and method for large area multi-layer atomic layer chemical vapor processing of thin films |
| JP2009052063A (en) * | 2007-08-24 | 2009-03-12 | Dainippon Printing Co Ltd | Method and apparatus for manufacturing gas barrier film, and gas barrier film |
Also Published As
| Publication number | Publication date |
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| FI20105906A0 (en) | 2010-08-30 |
| TW201219596A (en) | 2012-05-16 |
| CN103108985B (en) | 2015-02-11 |
| WO2012028776A1 (en) | 2012-03-08 |
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