CN103103499A - Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus - Google Patents
Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus Download PDFInfo
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- CN103103499A CN103103499A CN2011103580448A CN201110358044A CN103103499A CN 103103499 A CN103103499 A CN 103103499A CN 2011103580448 A CN2011103580448 A CN 2011103580448A CN 201110358044 A CN201110358044 A CN 201110358044A CN 103103499 A CN103103499 A CN 103103499A
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- backfill
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- dividing plate
- air dividing
- air
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Abstract
The invention relates to an air-inlet device, and in particular relates to a labyrinth air-inlet device for a vacuum chamber of a large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus. The device is arranged on the vacuum chamber and comprises a first backfill air-distributing plate, a second backfill air-distributing plate, a backfill air-distributing pipe, an air inlet flange, a stub pipe butt-welding adapter and a sealing fastener, wherein the air-inlet flange is arranged on the vacuum chamber, the stub pipe butt-welding adapter is out of the vacuum chamber, the backfill air-distributing pipe, the first backfill air-distributing plate and the second backfill air-distributing plate are arranged in the vacuum chamber; one end of the stub pipe butt-welding adapter is connected with one end of the backfill air-distributing pipe through the air-inlet flange, and the other end is connected with an air-inlet pipe through the sealing fastener, the second backfill air-distributing plate is arranged at the other end of the backfill air-distributing pipe, the first backfill air-distributing plate is arranged on the backfill air-distributing plate, and the space between the first backfill air-distributing plate and the second backfill air-distributing plate is an air-inlet buffer area. The device provided by the invention has a buffer effect for the backfill air, the backfill air in the vacuum chamber is uniform, and the condition that the battery slides from a support plate since the direct air-inlet is too fast is avoided.
Description
Technical field
The present invention relates to diffuser, specifically a kind of labyrinth diffuser of large plate-type PECVD equipment vacuum chamber.
Background technology
Along with the fast development of economic construction, microelectronics has obtained rapidly development, and the exploitation of PECVD apparatus for processing plasma and use are also increasingly extensive.PECVD is the plasma enhanced chemical vapor deposition method, when chemical vapour deposition, for chemical reaction can be carried out at lower temperature, can utilize the activity of plasma body to promote reaction, this chemical gaseous phase depositing process is called the plasma enhanced chemical vapor deposition method, and the equipment of implementing this kind working method is PECVD equipment.Be mainly large-scale flat-plate type PECVD equipment for thin film deposition systems such as field of solar energy, a kind of typical board-like PECVD system packs a plurality of solar battery sheets in support plate, with this carrier plate transmission to process cavity, after being preheating to design temperature, pass into process gas, setting power ionization process gas produces plasma body, and then completes thin film deposition.But existing diffuser exists air inlet too fast, thereby causes cell piece from situations such as carrier board landings.
Summary of the invention
For the problems referred to above, the object of the present invention is to provide a kind of labyrinth diffuser of large plate-type PECVD equipment vacuum chamber.This diffuser can cushion input gas, thereby avoids due to the direct too fast cell piece that causes of air inlet from situations such as support plate landings.
The objective of the invention is to be achieved through the following technical solutions:
the present invention is arranged on vacuum chamber, comprise the first backfill air dividing plate, the second backfill air dividing plate, the backfill gas-distributing pipe, inlet flange, short tube is to welded tube and sealing fastener, wherein inlet flange is arranged on vacuum chamber, described short tube is positioned at outside vacuum chamber welded tube, the backfill gas-distributing pipe, the first backfill air dividing plate and the second backfill air dividing plate all are positioned at vacuum chamber, short tube is connected by inlet flange with an end of backfill gas-distributing pipe to an end of welded tube, short tube is connected to admission passage to the other end of welded tube by sealing fastener, the other end of backfill gas-distributing pipe is equipped with the second backfill air dividing plate, be provided with the first backfill air dividing plate on the second backfill air dividing plate, space between the first backfill air dividing plate and the second backfill air dividing plate is the air inlet buffer zone.
Wherein: described the first backfill air dividing plate is positioned at the top of the second backfill air dividing plate, is connected with the second backfill air dividing plate by joint pin; Described the second backfill air dividing plate is annular, is fixed in the other end of described backfill gas-distributing pipe, and the other end of backfill gas-distributing pipe and the first backfill air dividing plate are connected with air inlet buffer zone between the second backfill air dividing plate; Described joint pin is a plurality of, circumferentially is distributed in the second backfill and divides on the plate plate; Described the first backfill air dividing plate is circular, and the external diameter of the second backfill air dividing plate equals greatly the diameter of the first backfill air dividing plate; Described inlet flange is fixed in the bottom of vacuum chamber, and the centre has the hole countersunk through hole, is provided with annular recesses on the upper surface of described through hole periphery, is equipped with sealing-ring in this annular recesses, is tightly connected with chamber bottom; Described backfill gas-distributing pipe is hollow cylinder; Described short tube is hollow cylinder to welded tube, and it is threaded with sealing fastener; Described sealing fastener is internal threaded nut or outside screw nut; The material of described diffuser is metal, is preferably stainless steel; The bottom of described vacuum chamber has a plurality of inlet mouths, and each inlet mouth all connects a diffuser.
Advantage of the present invention and positively effect are:
The present invention be with backfill gas from short tube to welded tube, backfill gas-distributing pipe by and be sprayed onto on backfill air dividing plate I, buffering input gas, realize even backfill gas in vacuum chamber, thereby avoid due to the direct too fast battery that causes of air inlet from situations such as support plate landings.
2. the present invention has the characteristics such as simple in structure, that cost is low, security is high.
Description of drawings
Fig. 1 is present inventor's perspective view;
Fig. 2 is that master of the present invention looks sectional view;
Wherein: 1 is the first backfill air dividing plate, and 2 is the second backfill air dividing plate, and 3 is joint pin, and 4 for the backfill gas-distributing pipe, and 5 is inlet flange, 6 be short tube to welded tube, 7 is sealing fastener, 8 is annular recesses.
Embodiment
The invention will be further described below in conjunction with accompanying drawing.
The present invention is arranged on the bottom of vacuum chamber, and the bottom of vacuum chamber has a plurality of inlet mouths, and each inlet mouth all connects a diffuser.
As shown in Figure 1 and Figure 2, the present invention includes the first backfill air dividing plate 1, the second backfill air dividing plate 2, joint pin 3, backfill gas-distributing pipe 4, inlet flange 5, short tube to welded tube 6 and sealing fastener 7, wherein inlet flange 5 is fixed in the bottom of vacuum chamber, the centre has the hole countersunk through hole, be provided with annular recesses 8 on the upper surface of described through hole periphery, be equipped with sealing-ring in this annular recesses 8, be tightly connected with chamber bottom.Short tube is positioned at outside vacuum chamber welded tube 6, and backfill gas-distributing pipe 4, the first backfill air dividing plate 1 and the second backfill air dividing plate 2 all are positioned at vacuum chamber; Backfill gas-distributing pipe 4 and short tube are hollow circular cylinder to welded tube 6, short tube is connected by inlet flange 5 with an end (upper end) of backfill gas-distributing pipe 4 to an end (lower end) of welded tube 6, short tube is connected with the threaded one end of sealing fastener 7 the other end (lower end) of welded tube 6, and the other end of sealing fastener 7 is connected to admission passage; Sealing fastener 7 of the present invention can be internal threaded nut or outside screw nut; The other end of backfill gas-distributing pipe 4 (upper end) is connected with the second backfill air dividing plate 2.The second backfill air dividing plate 2 can be annular, is evenly equipped with a plurality of joint pins 3 (the present embodiment is three) on the second backfill air dividing plate 2, and the first backfill air dividing plate 1 is fixed in the top of each joint pin 3; Space between the first backfill air dividing plate 1 and the second backfill air dividing plate 2 is the air inlet buffer zone, and the other end of backfill gas-distributing pipe 4 is connected with this air inlet buffer zone.
The shape of the first backfill air dividing plate 1 of the present invention and the second backfill air dividing plate 2 can be determined according to the real work situation, in the present embodiment, the first backfill air dividing plate 1 is circular, the second backfill air dividing plate 2 is annular, and the external diameter of the second backfill air dividing plate 2 equals greatly the diameter of the first backfill air dividing plate 1.
Principle of work of the present invention is:
In chamber bottom, a plurality of diffusers are installed, each diffuser is connected with admission passage respectively.Backfill gas is sprayed onto the lower surface of the first backfill air dividing plate 1 through sealing fastener 7, short tube successively by admission passage to welded tube 6, backfill gas-distributing pipe 4, the second backfill air dividing plate 2, backfill gas is played shock absorption, and be backfilled to uniformly in cooling chamber; Unnecessary gas can be discharged outside vacuum chamber by the vacuum pump group.
The material of diffuser of the present invention is metal, is preferably stainless steel; Backfill gas can be helium, gas that the nitrogen isoreactivity is extremely low.The present invention has offered a plurality of inlet mouths in the bottom of vacuum chamber, and preferably inlet mouth quantity is even number; Vacuum chamber can be square case structure, and the wall thickness everywhere of vacuum chamber can be identical; Vacuum chamber also is not limited to square, also can be other forms of case structure, for example column.
Claims (10)
1. the labyrinth diffuser of a large plate-type PECVD equipment vacuum chamber, be arranged on vacuum chamber, it is characterized in that: comprise the first backfill air dividing plate (1), the second backfill air dividing plate (2), backfill gas-distributing pipe (4), inlet flange (5), short tube is to welded tube (6) and sealing fastener (7), wherein inlet flange (5) is arranged on vacuum chamber, described short tube is positioned at outside vacuum chamber welded tube (6), backfill gas-distributing pipe (4), the first backfill air dividing plate (1) and the second backfill air dividing plate (2) all are positioned at vacuum chamber, short tube is connected by inlet flange (5) with an end of backfill gas-distributing pipe (4) to an end of welded tube (6), short tube is connected to admission passage to the other end of welded tube (6) by sealing fastener (7), the other end of backfill gas-distributing pipe (4) is equipped with the second backfill air dividing plate (2), be provided with the first backfill air dividing plate (1) on the second backfill air dividing plate (2), space between the first backfill air dividing plate (1) and the second backfill air dividing plate (2) is the air inlet buffer zone.
2. press the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: described the first backfill air dividing plate (1) is positioned at the top of the second backfill air dividing plate (2), is connected with the second backfill air dividing plate (2) by joint pin (3).
3. press the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 2, it is characterized in that: described the second backfill air dividing plate (2) is annular, be fixed in the other end of described backfill gas-distributing pipe (4), the other end of backfill gas-distributing pipe (4) and the first backfill air dividing plate (1) are connected with air inlet buffer zone between the second backfill air dividing plate (2); Described joint pin (3) is a plurality of, circumferentially is distributed in the second backfill and divides on plate plate (2).
4. press the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 2, it is characterized in that: described the first backfill air dividing plate (1) is for circular, and the external diameter of the second backfill air dividing plate (2) equals greatly the diameter of the first backfill air dividing plate (1).
5. press the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: described inlet flange (5) is fixed in the bottom of vacuum chamber, the centre has the hole countersunk through hole, be provided with annular recesses (8) on the upper surface of described through hole periphery, be equipped with sealing-ring in this annular recesses (8), be tightly connected with chamber bottom.
6. by the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: described backfill gas-distributing pipe (4) is hollow cylinder.
7. by the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: described short tube is hollow cylinder to welded tube (6), and it is threaded with sealing fastener (7).
8. by the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1 or 7, it is characterized in that: described sealing fastener (7) is internal threaded nut or outside screw nut.
9. by the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: the material of described diffuser is metal, is preferably stainless steel.
10. by the labyrinth diffuser of the described large plate-type PECVD equipment vacuum chamber of claim 1, it is characterized in that: the bottom of described vacuum chamber has a plurality of inlet mouths, and each inlet mouth all connects a diffuser.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103580448A CN103103499A (en) | 2011-11-11 | 2011-11-11 | Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103580448A CN103103499A (en) | 2011-11-11 | 2011-11-11 | Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus |
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| CN103103499A true CN103103499A (en) | 2013-05-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011103580448A Pending CN103103499A (en) | 2011-11-11 | 2011-11-11 | Labyrinth air-inlet device for vacuum chamber of large plate-type PECVD (plasma enhanced chemical vapor deposition) apparatus |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3578495A (en) * | 1968-01-15 | 1971-05-11 | Siemens Ag | Method of precipitating insulating protective layers comprised of inogranic material upon the surfaces of semiconductor wafers |
| JPS52138073A (en) * | 1976-05-13 | 1977-11-17 | Matsushita Electric Ind Co Ltd | Gas jetting apparatus |
| US20060196420A1 (en) * | 2005-03-02 | 2006-09-07 | Andrey Ushakov | High density plasma chemical vapor deposition apparatus |
| CN1910726A (en) * | 2004-01-12 | 2007-02-07 | 艾克塞利斯技术公司 | Gas distribution plate assembly for plasma reactors |
| CN202323018U (en) * | 2011-11-11 | 2012-07-11 | 中国科学院沈阳科学仪器研制中心有限公司 | Maze air inlet device for vacuum chamber of large-sized plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment |
-
2011
- 2011-11-11 CN CN2011103580448A patent/CN103103499A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3578495A (en) * | 1968-01-15 | 1971-05-11 | Siemens Ag | Method of precipitating insulating protective layers comprised of inogranic material upon the surfaces of semiconductor wafers |
| JPS52138073A (en) * | 1976-05-13 | 1977-11-17 | Matsushita Electric Ind Co Ltd | Gas jetting apparatus |
| CN1910726A (en) * | 2004-01-12 | 2007-02-07 | 艾克塞利斯技术公司 | Gas distribution plate assembly for plasma reactors |
| US20060196420A1 (en) * | 2005-03-02 | 2006-09-07 | Andrey Ushakov | High density plasma chemical vapor deposition apparatus |
| CN202323018U (en) * | 2011-11-11 | 2012-07-11 | 中国科学院沈阳科学仪器研制中心有限公司 | Maze air inlet device for vacuum chamber of large-sized plate type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment |
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Application publication date: 20130515 |