CN103046026B - CVD equipment with optical heating effect - Google Patents
CVD equipment with optical heating effect Download PDFInfo
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- CN103046026B CN103046026B CN201210571914.4A CN201210571914A CN103046026B CN 103046026 B CN103046026 B CN 103046026B CN 201210571914 A CN201210571914 A CN 201210571914A CN 103046026 B CN103046026 B CN 103046026B
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Abstract
The invention relates to the field of semiconductor production equipment and in particular to CVD equipment with optical heating effect. According to the CVD equipment with the optical heating effect, a roller group is arranged between a housing and a conveyor belt, and the roller group is hermetically connected with the housing and the conveyor belt, so that a dynamic seal is formed between the housing and the conveyor belt; a gas inlet and a gas outlet, into which a working gas flows, are formed in the housing, so that the working gas exists in a high concentration inside the housing before coating, which prevents a to-be-coated material put on the conveyor belt from undergoing chemical reaction with the air. Furthermore, the CVD equipment provided by the invention adopts a mobile photo-thermal mixing device instead of a fixed photo-thermal mixing device, resulting in the miniaturization of the whole photo-thermal mixing device.
Description
Technical field
The present invention relates to the design field of semiconductor production equipment, particularly relate to the CVD equipment adopting light heating.
Background technology
Chemical vapour deposition (English: Chemical Vapor Deposition, to be called for short CVD) is a kind of chemical technology being used for producing the solid-state material that purity is high, performance is good.Semiconductor industry uses this technology to carry out grow films.Typical CVD processing procedure is under wafer (substrate) is exposed to one or more different precursors, produces the film for deposition at substrate surface generation chemical reaction and/or decomposition.Usually also can produce different byproducts concomitantly in reaction process, but mostly can be pulled away along with air-flow, and can not stay in the reactor chamber.
Chemical vapour deposition technique extensively uses in semiconductor coated film field, due to semiconductor coated film process need isolation and the state of contacting external air or close to the state of vacuum under carry out.In prior art, each technical process of semi-conductor integrated manufacturing system all need be carried out under airtight environment, after completing a technical process, semi-conductor half cost need be taken out, to carry out next step art breading, but it requires higher to the vacuum of space after taking out, and therefore causes semi-conductor Integrated manufacture device fabrication difficulty, factory building huge.Producer's investment is founded the factory need bear in earlier stage a large amount of fund inputs on the one hand, usually the time that semiconductor integrated manufacturing system needs the several years is built on the other hand, visible current construction semiconductor integrated manufacturing system fund input amount is large and of long duration, and easily causes the difficulty of producer's turnover of funds.
Summary of the invention
The object of the invention is to the defect overcoming prior art, aim to provide and adopt the CVD equipment of light heating to realize modularization and miniaturized design with the relevant device realized in the CVD process in semiconductor production equipment, thus reduce manufacturing cost in CVD process.
The present invention realizes like this, adopt the CVD equipment of light heating, comprise a housing, described housing both lateral sides is respectively equipped with the entrance and exit passed through for the transport tape placing material to be plated, and described housing is separated into epicoele and cavity of resorption by described transport tape, the entrance and exit place of described housing is respectively equipped with the cylinder group of transport tape described in dynamic clamp, each described cylinder group comprises the upper cylinder be attached on the upside of transport tape and the bottom roll be attached on the downside of transport tape, described housing is also provided with the first servomotor driving the running of described cylinder group; Described housing offers the inlet mouth and venting port that enter for working gas; Be provided with the photo-thermal mixing device of movement in described cavity of resorption, described photo-thermal mixing device has one towards described transport tape and sprays the air nozzle of working gas.
Particularly, be provided with the screw mandrel of a rotation in described cavity of resorption, described photo-thermal mixing device is provided with the threaded hole with described screw mandrel adaptation, and described photo-thermal mixing device is installed on described screw mandrel by described threaded hole.
Particularly, described photo-thermal mixing device comprises the mixing bunker with hybrid chamber, the support frame of coated described mixing bunker and the photo-thermal device that focuses on described support frame.
Particularly, described photo-thermal device comprise be located at described support frame lower end optical cavity, be located in described optical cavity and focus on the described amasthenic lens of support frame lower end and the light pipe of flexibility, one end of described light pipe is inserted in described optical cavity and towards described amasthenic lens, the other end is connected with light source.
Particularly, described mixing bunker comprise be positioned at bottom intake section, to be connected with intake section and to be positioned at top and to form the mixing unit of described hybrid chamber, described intake section is contained in described support frame, be provided with the air inlet cavity that some and described mixing unit gas circuit is communicated with in described intake section, described air nozzle is located at described mixing unit.
Particularly, the elongated slit of described air nozzle, described mixing unit comprises two oblique of being extended respectively to both sides by described air nozzle and by described oblique the horizontal plane be connected with described intake section, the lateral cross section of described mixing unit is isosceles triangle; Described air inlet cavity is two, described intake section be provided with by bottom it to the partition wall that described mixing unit extends, air inlet cavity described in two is enclosed by described partition wall and described intake section sidewall and forms.
Particularly, described hybrid chamber has the protuberance protruding from described intake section near described intake section.
Particularly, described photo-thermal mixing device also comprises and is located at described housing sidewall and the second servomotor driving described screw mandrel to rotate.
Particularly, the surface of each described upper cylinder and bottom roll is provided with elastic layer, surface, the both ends elasticity pressing mutually of each described upper cylinder and bottom roll, there is between each described upper cylinder and bottom roll the gap passed through for described transport tape, and each described upper cylinder and between bottom roll and described transport tape mutual elasticity press.
Particularly, above-mentioned CVD equipment also comprises Controlling System, also comprise film thickness monitoring system, temperature measuring equipment, System Controlled by Measuring Pressure and video monitoring apparatus, described System Controlled by Measuring Pressure is for monitoring the pressure in described epicoele and cavity of resorption, and described video monitoring apparatus is for monitoring the internal medium of described epicoele and cavity of resorption.
Beneficial effect of the present invention: the CVD equipment of employing light heating provided by the invention arranges described cylinder group by adopting between described housing and described transport tape, utilize the relation that is tightly connected of described cylinder group and housing and described transport tape, the dynamic seal reached between described housing and described transport tape designs; By offering the inlet mouth and venting port that enter for working gas on the housing, when entering CVD plated film, working gas is first made to enter described enclosure interior by described inlet mouth, make the gas in described housing be discharged by described venting port simultaneously, the working gas of high density so can be formed in described housing, make in coating process, avoid being positioned over the material to be coated on described transport tape and air generation chemical reaction; Meanwhile, CVD equipment of the present invention adopts the photo-thermal mixing device of movement, with the alternative fixing photo-thermal mixing device of movement, whole photo-thermal mixing device can be made microminiaturized.
Accompanying drawing explanation
Fig. 1 is the external structure schematic diagram of one embodiment of the present invention;
Fig. 2 is the structural representation after Fig. 1 removes housing one sidewall;
Fig. 3 is the structural representation after Fig. 1 removes housing;
Fig. 4 is the structural representation of cylinder group and transport tape mutual alignment relation;
Fig. 5 is the structural representation of mixing bunker;
Fig. 6 is the sectional view of Fig. 5 cross section;
Fig. 7 is photo-thermal device cross-sectional view.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with drawings and Examples, the present invention is further elaborated.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Please refer to accompanying drawing 1 ~ 7, adopt the CVD equipment of light heating, comprise a housing 1, described housing 1 both lateral sides is respectively equipped with the entrance 11 and outlet 12 that pass through for the transport tape 2 placing material to be plated, and described housing 1 is separated into epicoele 13 and cavity of resorption 14 by described transport tape 2, the entrance 11 of described housing 1 and outlet 12 places are respectively equipped with the cylinder group 3 of transport tape 2 described in dynamic clamp, each described cylinder group 3 comprises the upper cylinder 31 be attached on the upside of transport tape 2 and the bottom roll 32 be attached on the downside of transport tape 2, described housing 1 is also provided with the first servomotor 4 driving described cylinder group 3 to operate.Between described housing 1 and described transport tape 2, arrange described cylinder group 3 by adopting, utilize the relation that is tightly connected of described cylinder group 3 and described housing 1 and described transport tape 2, the dynamic seal reached between described housing 1 and described transport tape 2 designs.So, CVD equipment of the present invention can be convenient to realize good sealing with all the other technical modules of semi-conductor integrated manufacturing system by described transport tape 2 and be connected.In addition, the preheating table 8 material to be plated be positioned on described transport tape 2 being carried out to preheat process is also provided with in described epicoele 13.Particularly, described preheating table 8 is arranged at the upside of described transport tape 2, has less gap to by the material to be plated on described transport tape 2.Described preheating table 8 arrange before object is to prevent carrying out coating film treatment to material to be plated, the temperature because of material to be plated does not reach corresponding plated film and requires temperature, causes coating effects not good.Wherein, described preheating table 8 adopts the mode of infrared heating or resistive heating.
Described housing 1 offers the inlet mouth 15 entered for working gas and the venting port 16 of discharging.So, CVD equipment of the present invention is before plated film, by described inlet mouth 15, working gas is full of described housing 1 inside, make the inner original gas of described housing 1 be discharged by described venting port 16 simultaneously, finally make the working gas forming high density in described housing 1, make in coating process, avoid being positioned over the material to be coated on described transport tape 2 and air generation chemical reaction.Further, described inlet mouth 15 is equipped with inlet mouth valve and drain tap respectively with venting port 16, by controlling the open and-shut mode of described air intake valve and drain tap, and then controls air input and the free air delivery of working gas.
Be provided with the photo-thermal mixing device 5 of movement in described cavity of resorption 14, described photo-thermal mixing device 5 has one towards described transport tape 2 and sprays the air nozzle 51 of working gas.In the prior art, photo-thermal mixing device normally adopts fixed set-up mode, and so for making jet scope comparatively large, the opening of the air nozzle 51 designed is also comparatively large, and cause the volume of photo-thermal mixing device also comparatively large like this, its manufacturing cost therefore uprises.The present invention adopts portable photo-thermal mixing device 5, and wherein, the move mode of described photo-thermal mixing device 5 can be the movement of linear reciprocating, also can adopt the reciprocating type mobile of XY plane formula, not do concrete restriction at this to its move mode.So, by adopting the photo-thermal mixing device 5 of movement, with the alternative fixing photo-thermal mixing device of movement, whole photo-thermal mixing device can be made microminiaturized.
In the present embodiment, be provided with the screw mandrel 52 of a rotation in described cavity of resorption 14, described photo-thermal mixing device 5 is provided with the threaded hole 53 with described screw mandrel 52 adaptation, and described photo-thermal mixing device 5 is installed on described screw mandrel 52 by described threaded hole 53.Wherein, described screw mandrel 52 and plane-parallel, so, by rotating described screw mandrel 52 to change described photo-thermal mixing device 5 position in the horizontal direction.
In the present embodiment, described photo-thermal mixing device 5 comprises the mixing bunker 54 with hybrid chamber 543, the support frame 55 of coated described mixing bunker 54 and the photo-thermal device 56 that focuses on described support frame 55.Wherein, described support frame 55 adopt heat conductivility preferably metallic substance be made.So, when CVD equipment provided by the invention is in running order, described photo-thermal device 56 provides heat for described support frame 55, heat is through the quick conduction of described support frame 55, make mixing bunker 54 thermally equivalent be contained in described support frame 55, the working gas flowed through like this in described mixing bunker 54 can obtain evenly be heated, the coating film thickness that final material to be plated on described transport tape 2 is formed is more all even smooth, working gas can also be made fully to complete reaction and form plated film on material to be plated simultaneously, save the consumption of working gas.
In the present embodiment, described photo-thermal device 56 comprise be located at described support frame 55 lower end optical cavity 561, be located in described optical cavity 561 and focus on the described amasthenic lens 562 of support frame 55 lower end and the light pipe 563 of flexibility, one end of described light pipe 563 is inserted in described optical cavity 561 and towards described amasthenic lens 562, the other end is connected with light source.So, the energy of light source can be realized to transfer on described support frame 55 by described light pipe 563, the working gas flowing through described mixing bunker 54 is heated.Because the present invention adopts flexible light pipe 563, light pipe 563 can be made together to move in company with described photo-thermal mixing device 5, make the setting position of described light source more flexible.Particularly, described light source is located at the outside of described housing 1, and one end that described light pipe 563 connects light source is connected with described light source through described housing 1.So, being separated from each other of CVD equipment of the present invention and light source can be facilitated, be also convenient to the maintenance of described CVD equipment.
In the present embodiment, described mixing bunker 54 comprise be positioned at bottom intake section 541, to be connected with intake section 541 and to be positioned at top and to form the mixing unit 542 of described hybrid chamber 543, described intake section 541 is contained in described support frame 55, be provided with the air inlet cavity 5411 that some and described mixing unit 542 gas circuit is communicated with in described intake section 541, described tuyere 51 is located at described mixing unit 542.So, working gas enters in described mixing bunker 54 via described intake section 541, working gas is in the process flowing through described intake section 541, via being arranged at the heating of described supporting lever frame 55 and exciting, enter described mixing unit 542 again, can mix fully in described mixing unit 542, to improve the quality of final plated film and to reduce the use of gas raw material.
In addition, described photo-thermal mixing device 5 also comprises the intake ducting 57 be connected with described air inlet cavity 5411, described intake ducting 57 is connected with the air feed equipment being positioned at housing 1 outside through a longitudinal side wall of described housing 1, described intake ducting 57 adopts flexible pipe to be made, when described air inlet cavity 5411 has many, described intake ducting 57 correspondingly can arrange the air intake branch 571 adapted with air inlet cavity 5411, and each air intake branch 571 converges in an air inlet supervisor 572.In addition, based on some working gas unsuitable sounding chemical reaction before mixing, be provided with the air inlet tubule 573 identical with air intake branch 571 quantity in described intake ducting 57, each described air inlet tubule 573 is each passed through described air inlet supervisor 572 and an air intake branch 571 provides working gas to air inlet cavity 5411 described in.
In the present embodiment, the elongated slit of described tuyere 51, described mixing unit 542 comprises the two oblique faces 5421 of being extended respectively to both sides by described tuyere 51 and the horizontal plane 5422 be connected with described intake section 541 in described oblique face 5421, and the lateral cross section of described mixing unit 542 is isosceles triangle; Described air inlet cavity 5411 is two, described intake section 541 be provided with by bottom it to the partition wall 5412 that described mixing unit 542 extends, air inlet cavity 5411 described in two is enclosed by described partition wall 5412 and described intake section 541 sidewall and forms.So, described intake section 541 two described in air inlet cavity 5411 respectively corresponding described mixing unit 542 two described in oblique face 5421, working gas via described intake section 541 heat with excite after enter described hybrid chamber 543; Under the guide effect in described oblique face 5421, better mixed effect can be obtained, and after leading in described oblique face 5421, the working gas of ejection is more even.
In the present embodiment, described hybrid chamber 543 has the protuberance 5431 protruding from described intake section 541 near described intake section 541.So, when working gas enters described mixing unit 542 via described air inlet cavity 5411, the mitigation first via described protuberance 5431 is excessive, and mixed effect can be made better.
In the present embodiment, similar with the described cylinder group 3 of driving, described photo-thermal mixing device 5 also comprises is located at described housing 1 sidewall and the second servomotor 6 driving described screw mandrel 52 to rotate.Wherein, described first servomotor 4 and the second servomotor 6 be arranged at respectively described housing 1 relative two to side.So be conducive to the balance that whole CVD equipment is stressed.
In the present embodiment, the surface of each described upper cylinder 31 and bottom roll 32 is provided with elastic layer (not shown in FIG.), surface, the both ends elasticity pressing mutually of each described upper cylinder 31 and bottom roll 32, there is between each described upper cylinder 31 and bottom roll 32 gap passed through for described transport tape 2, and each described upper cylinder 31 and between bottom roll 32 and described transport tape 2 mutual elasticity press.Wherein, described elastic layer adopts silicon rubber to be made.Technique scheme gives the concrete sealing means of described cylinder group 3, by described upper cylinder 31, bottom roll 32 and transport tape 2 being contacted with each other, part is arranged to Elastic Contact, so, when described transport tape 2 is in company with in described cylinder group 3 operation process, good sealing effectiveness can be kept the moment, realize dynamic seal.In addition, owing to adopting the mode of shrink-fit between described cylinder group 3 and described transport tape 2, therefore, a large amount of heats will inevitably be produced each other because of friction, for enabling the heat of produced heat distribute in time, in described housing 1, be also provided with the water-cooling system 7 that described cylinder group 3 is lowered the temperature.
In the present embodiment, for realizing the Automated condtrol of above-mentioned CVD equipment, above-mentioned CVD equipment also comprises Controlling System, and described Controlling System comprises the film thickness monitoring system adopting infrared external reflection principle to be made, the temperature measuring equipment adopting IR thermometry to be made, monitors the System Controlled by Measuring Pressure of described epicoele and lower cavity pressure, monitors the video monitoring apparatus of described epicoele and cavity of resorption internal medium.
In the present embodiment, above-mentioned CVD equipment comprises Controlling System, and described Controlling System comprises the film thickness monitoring system adopting infrared external reflection principle to be made, the temperature measuring equipment adopting IR thermometry to be made, monitors the System Controlled by Measuring Pressure of described epicoele and lower cavity pressure, monitors the video monitoring apparatus of described epicoele and cavity of resorption internal medium.In view of described film thickness monitoring system, temperature measuring equipment, System Controlled by Measuring Pressure and video monitoring apparatus are prior art respectively, carefully do not state at this.In addition, described Controlling System also can be made to be connected with described air intake valve, drain tap, the first servomotor 4 and the second servomotor 6, by measuring the corresponding working order of air intake valve, drain tap, the first servomotor 4 and the second servomotor 6 described in the data settings such as pressure in the thickness of film in coating process, temperature and epicoele and cavity of resorption in real time, thus reach more preferably control effects.
Below introduce the working process of the CVD equipment that the present embodiment provides further, the working process of above-mentioned CVD equipment comprises preheating preparatory stage and normal work stage, and details are as follows respectively.
The preheating preparatory stage: Controlling System opens described drain tap, open described air intake valve simultaneously, and to the air in described housing 1 input protection gas and discharge housing 1; According to coating process requirement, particularly air pressure and temperature requirement, described Controlling System according to the measured value of described temperature measuring equipment and System Controlled by Measuring Pressure, and then makes described Controlling System control the air input of described inlet mouth 15 and the free air delivery of described venting port 16 and the heated condition to the heating installation that described preheating table 8 heats; Meanwhile, start described photo-thermal device 56 and thermal pretreatment is carried out to described mixing bunker 54.After described preheating table 8 air pressure reached in predetermined working temperature, housing 1 reaches predetermined requirement and described mixing bunker 54 reaches predetermined temperature requirement, enter normal work stage.
Normal work stage: described Controlling System makes the heating installation to described preheating table 8 heats be adjusted to normal keeping warm mode, is adjusted to normal keeping warm mode to the heated condition of described photo-thermal device 56; Start described first servomotor 4 simultaneously, the material to be coated be positioned on described transport tape 2 can be entered in described epicoele 13 according to predetermined speed in company with described transport tape 2, and mobile in described epicoele 13; Meanwhile, the valve that carries out starting working gas relevant makes working gas flow through described mixing bunker 54, and sprays to described material to be plated, to form plated film by the air nozzle 51 of described mixing bunker 54.
The foregoing is only preferred embodiment of the present invention, its structure is not limited to the above-mentioned shape enumerated, and all any amendments done within the spirit and principles in the present invention, equivalent replacement and improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. adopt the CVD equipment of light heating, comprise a housing, it is characterized in that: described housing both lateral sides is respectively equipped with the entrance and exit passed through for the transport tape placing material to be plated, and described housing is separated into epicoele and cavity of resorption by described transport tape, the entrance and exit place of described housing is respectively equipped with the cylinder group of transport tape described in dynamic clamp, each described cylinder group comprises the upper cylinder be attached on the upside of transport tape and the bottom roll be attached on the downside of transport tape, described housing is also provided with the first servomotor driving the running of described cylinder group; Described housing offers the inlet mouth and venting port that enter for working gas; Be provided with the photo-thermal mixing device of movement in described cavity of resorption, described photo-thermal mixing device has one towards described transport tape and sprays the air nozzle of working gas.
2. the CVD equipment of employing light heating according to claim 1, it is characterized in that: the screw mandrel being provided with a rotation in described cavity of resorption, described photo-thermal mixing device is provided with the threaded hole with described screw mandrel adaptation, and described photo-thermal mixing device is installed on described screw mandrel by described threaded hole.
3. the CVD equipment of employing light according to claim 1 heating, is characterized in that: described photo-thermal mixing device comprises the mixing bunker with hybrid chamber, the support frame of coated described mixing bunker and the photo-thermal device that focuses on described support frame.
4. the CVD equipment of employing light heating according to claim 3, it is characterized in that: described photo-thermal device comprise be located at described support frame lower end optical cavity, be located in described optical cavity and focus on the described amasthenic lens of support frame lower end and the light pipe of flexibility, one end of described light pipe is inserted in described optical cavity and towards described amasthenic lens, the other end is connected with light source.
5. the CVD equipment of employing light heating according to claim 3, it is characterized in that: described mixing bunker comprise be positioned at bottom intake section, to be connected with intake section and to be positioned at top and to form the mixing unit of described hybrid chamber, described intake section is contained in described support frame, be provided with the air inlet cavity that some and described mixing unit gas circuit is communicated with in described intake section, described air nozzle is located at described mixing unit.
6. the CVD equipment of employing light heating according to claim 5, it is characterized in that: the elongated slit of described air nozzle, described mixing unit comprises two oblique of being extended respectively to both sides by described air nozzle and by described oblique the horizontal plane be connected with described intake section, the lateral cross section of described mixing unit is isosceles triangle; Described air inlet cavity is two, described intake section be provided with by bottom it to the partition wall that described mixing unit extends, air inlet cavity described in two is enclosed by described partition wall and described intake section sidewall and forms.
7. the CVD equipment of employing light heating according to claim 6, is characterized in that: described hybrid chamber has the protuberance protruding from described intake section near described intake section.
8. the CVD equipment of employing light heating according to claim 2, is characterized in that: described photo-thermal mixing device also comprises is located at described housing sidewall and the second servomotor driving described screw mandrel to rotate.
9. the CVD equipment of employing light heating according to claim 1, it is characterized in that: the surface of each described upper cylinder and bottom roll is provided with elastic layer, surface, the both ends elasticity pressing mutually of each described upper cylinder and bottom roll, there is between each described upper cylinder and bottom roll the gap passed through for described transport tape, and each described upper cylinder and between bottom roll and described transport tape mutual elasticity press.
10. the CVD equipment of the employing light heating according to any one of claim 1 ~ 9, it is characterized in that: comprise Controlling System, described Controlling System comprises film thickness monitoring system, temperature measuring equipment, System Controlled by Measuring Pressure and video monitoring apparatus, described System Controlled by Measuring Pressure is for monitoring the pressure in described epicoele and cavity of resorption, and described video monitoring apparatus is for monitoring the internal medium of described epicoele and cavity of resorption.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210571914.4A CN103046026B (en) | 2012-12-25 | 2012-12-25 | CVD equipment with optical heating effect |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210571914.4A CN103046026B (en) | 2012-12-25 | 2012-12-25 | CVD equipment with optical heating effect |
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| Publication Number | Publication Date |
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| CN103046026A CN103046026A (en) | 2013-04-17 |
| CN103046026B true CN103046026B (en) | 2014-12-31 |
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| CN201210571914.4A Expired - Fee Related CN103046026B (en) | 2012-12-25 | 2012-12-25 | CVD equipment with optical heating effect |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS62104438U (en) * | 1985-12-23 | 1987-07-03 | ||
| DE69030140T2 (en) * | 1989-06-28 | 1997-09-04 | Canon Kk | Method and arrangement for the continuous formation of a large-area thin layer deposited by microwave plasma CVD |
| JP2714247B2 (en) * | 1990-10-29 | 1998-02-16 | キヤノン株式会社 | Method and apparatus for continuously forming large-area functional deposited film by microwave plasma CVD |
| CN203128656U (en) * | 2012-12-25 | 2013-08-14 | 王奉瑾 | CVD (chemical vapor deposition) device adopting light heating |
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