CN103009246B - Double-eccentric bushing regulating device for rotation balance of high-rotating-speed polishing head - Google Patents
Double-eccentric bushing regulating device for rotation balance of high-rotating-speed polishing head Download PDFInfo
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- CN103009246B CN103009246B CN201210439248.9A CN201210439248A CN103009246B CN 103009246 B CN103009246 B CN 103009246B CN 201210439248 A CN201210439248 A CN 201210439248A CN 103009246 B CN103009246 B CN 103009246B
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Abstract
The invention discloses a double-eccentric bushing regulating device for the rotation balance of a high-rotating-speed polishing head. The double-eccentric bushing regulating device is applied to the driving and high-speed polishing processing of optical elements with medium and large calibers, a small eccentric bushing, a large eccentric bushing and a cylinder body form a double-eccentric bushing structure for regulating the eccentricity, and an eccentric hole per se (a matched and connected position of the small eccentric bushing and the cylinder body) is driven to do revolution movement around an axial line of a main shaft in the rotating process of the small eccentric bushing; through the relative rotation, the relative circumference position of the small eccentric bushing and the large eccentric bushing is regulated, the axis distance between the small eccentric bushing and the large eccentric bushing is changed, the polishing distance is regulated, and a polishing disc can obtain different revolution radii for adapting to the polishing requirements of different workpieces; and in the eccentric distance regulating process, the whole mass gravity center is always on the rotating center of the main shaft. When the structure is adopted, greater centrifugal force cannot be generated in the polishing rotation process, the rotary movement stability is ensured, and the rotating speed of the rotary polishing head can be improved, so the polishing efficiency of a polishing machine is improved.
Description
Technical field
The present invention relates to a kind of two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance, this device is applicable to the active of Large diameter optical element, high speed polishing processing.
Background technology
It is eccentric that polishing head structure system in domestic and international existing small tool burnishing machine all adopts dovetail groove to adjust, after bias reaches certain distance, larger centrifugal force is produced in high-speed rotation, cause the shake of rubbing head, machine vibration, polished die is beat thereupon, bumpy motion, and polishing precision is difficult to reach expection requirement, polishing efficiency is reduced, and surface precision convergence is slow.
Summary of the invention
The object of the present invention is to provide a kind of two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance, this device, by two relative circular-rotation change in location of eccentric bushing, carries out the eccentric distance adjusting polished die.Although the distance of polished die changes, the position of centre of gravity of rubbing head does not change, so can not produce larger centrifugal force in rotation process.At high speed, rubbing head operates steadily, and adds the surface area of polishing of optical element in the polished die unit interval, and polished die steadily can act on element surface and carry out polishing, obtains maximum removal function and reaches the object improving polishing efficiency.
The technical solution realizing the object of the invention is:
Formed two eccentric bushing structure adjusted eccentric by small eccentricity cover, large eccentricity cover, cylinder body: by relatively rotating, the circumference relative position that adjustment small eccentricity cover overlaps with large eccentricity, change small eccentricity cover and large eccentricity overlap between distance of shaft centers from, carry out the adjustment of polishing distance, polishing disk can be made to obtain different revolution-radius, to adapt to the polishing requirement of different workpieces; In eccentric distance adjustment process, overall mass cg is all the time on the pivot of main shaft.So, in polishing rotation process, larger centrifugal force can not be produced, ensure that rotary motion is steady; The rotary speed of rubbing head can be improved, thus improve polishing efficiency.
Compared with prior art, its remarkable advantage is in the present invention:
Structurally, straight line adjustment eccentric distance is in the past changed into and rotates adjustment eccentric distance, by the rectilinear movement structural adjustment straight line eccentric distance of dovetail guide, change two eccentric bushing rotational structure adjustment eccentric distance into.
Functionally, in polishing process, larger centrifugal force can not be produced, the rotary speed of rubbing head can be improved, thus improve polishing efficiency, the face shape error Fast Convergent that element is processed, and it is stable to remove function, meets efficient, controlled, the Ultraprecise polished processing of medium/large-aperturaspheric aspheric optical element.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the present invention is further described.
Fig. 1 is the two eccentric bushing adjusting device structure charts of the present invention for high rotating speed rubbing head rotary balance.
Fig. 2 is the position view of the two eccentric bushing of the present invention.
Fig. 3 is the eccentric trajectory diagram of the two eccentric bushing of the present invention.
Detailed description of the invention
With reference to Fig. 1, Fig. 2, Fig. 3, two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance provided by the invention, comprise polishing disk (1), buff spindle (2), blind flange (3), bottom end cover (4), left belt wheel (5), body (6), cylinder body (7), upper end cover (8), piston (9), sliding axle (10), compact heap (11), small eccentricity cover (12), large eccentricity cover (13), lid (14), adapter sleeve (15), main shaft (16), motor (17), right belt wheel (18), axle (19).
Structural relation:
Polishing disk (1) is connected with piston (9) by buff spindle (2), piston (9) is connected by sliding axle (10) with cylinder body (7), one end of cylinder body (7) is contained in small eccentricity cover (12), the other end of cylinder body (7) is contained in body (6), body (6) and bottom end cover (4) are fixedly connected by screw, and bottom end cover (4) and blind flange (3) are fixedly connected by screw.
The power of main shaft (16) is transmitted by adapter sleeve (15), adapter sleeve (15) is fixedly connected with large eccentricity cover (13) by screw, large eccentricity cover (13) and small eccentricity cover (12) are by compact heap (11) fixed-circumference position, one end of small eccentricity cover (12) is fixedly connected with by screw with upper end cover (8), and the other end of small eccentricity cover (12) is fixedly connected with by screw with lid (14).
Left belt wheel (5) and cylinder body (7) are fixedly connected with key, and left belt wheel (5) and right belt are taken turns (18) and moved by belt transmission, and right belt wheel (18) and motor (17) are fixedly connected by key, and axle (19) power relies on motor (17) transmission.
Eccentric bushing structure is installed: large eccentricity cover (13) cylindrical and adapter sleeve (15) inner circle are fixedly connected, large eccentricity cover (13) interior eccentric orfice connects with small eccentricity cover (12) cylindrical, small eccentricity cover (12) interior eccentric orfice and cylinder body (7) are installed by bearing and are connected, after installation terminates, cylinder body (7) axis and main shaft (16) eccentric axis distance adjust by rotating small eccentricity cover (12).
The eccentric orfice of small eccentricity cover (12) drive itself in rotation process (i.e. small eccentricity cover (12) match with cylinder body (7) coupled position) does revolution motion around main shaft (16) axis, and cylinder body (7) is contained in small eccentricity cover (12) eccentric orfice.
Action relationships:
Motor (17) band moving axis (19) rotates, axle (19) drives right belt wheel (18) to rotate, right belt wheel (18) is rotated by the left belt wheel of belt drive (5), and left belt wheel (5) drives cylinder body (7) to rotate, and cylinder body (7) drives piston (9) to rotate by sliding axle (10); Buff spindle (2) and cylinder body (7) concentric, main shaft (16) and large eccentricity cover (13) concentric, axial bias is had between large eccentricity cover (13) and small eccentricity cover (12), when main shaft (16) circular-rotation, the circumference relative position adjustable of small eccentricity cover (12) and large eccentricity cover (13), its distance of shaft centers, from changing, makes polishing disk (1) obtain different revolution-radius; While the different revolution-radius of adjustment, the center of gravity of external overall does not change, and is substantially consistent all the time with main shaft (16) pivot.
Revolution motion: main shaft (16) drives adapter sleeve (15) to rotate, adapter sleeve (15) drives large eccentricity cover (13) to rotate, large eccentricity cover (13) drives small eccentricity cover (12) to rotate by compact heap (11), and small eccentricity cover (12) does circumference revolution rotational motion around the axis of main shaft (16) in rotation process; Piston (9), buff spindle (2), polishing disk (1) do revolution motion around main shaft (16) together with cylinder body (7).
Spinning motion: motor (17) drives right belt wheel (18) to rotate, and right belt wheel (18) drives left belt wheel (5) to rotate by belt pulley, and left belt wheel (5) drives cylinder body (7) spinning motion by key; Cylinder body (7) drives piston (9), buff spindle (2), polishing disk (1) spinning motion by sliding axle (10).
Therefore cylinder body (7), piston (9), buff spindle (2), polishing disk (1) rotate around main shaft (16) axis, simultaneously around respective own axes rotary motion, existing spinning motion, has revolution motion again.
With reference to Fig. 2, unclamp compact heap (11), make large eccentricity cover (13) and small eccentricity cover (12) have running clearance, drive small eccentricity cover (12) to make relative circular-rotation with large eccentricity cover (13) by rotation upper end cover (8) and move; Small eccentricity cover (12) and large eccentricity cover (13) own axes skew are changed the line of production raw distance, i.e. eccentric distance; After adjusting eccentric distance, locking compact heap (11).
With reference to Fig. 3, polishing disk (1) and cylinder body (7) are around axis of rotation O
1rotate, again around main shaft (16) axes O
2rotate, rotating speed is respectively ω
1and ω
2, e is eccentric distance; As axis of rotation O
1during dead in line with main shaft (16), eccentric distance e is 0, as axis of rotation O
1forward axis of rotation O to
3position time, eccentric distance e is maximum, and the track of eccentric distance is: with O
2o
3line mid point is the center of circle, with O
2o
3for the circle of diameter.
Claims (2)
1., for two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance, comprise polishing disk, buff spindle, blind flange, bottom end cover, left belt wheel, body, cylinder body, upper end cover, piston, sliding axle, compact heap, small eccentricity cover, large eccentricity cover, lid, adapter sleeve, main shaft, motor, right belt wheel, axle; It is characterized in that: polishing disk is connected with piston by buff spindle, piston is connected by sliding axle with cylinder body, and one end of cylinder body is contained in small eccentricity cover, and the other end of cylinder body is contained in body, body and bottom end cover are fixedly connected by screw, and bottom end cover and blind flange are fixedly connected by screw; The power of main shaft is transmitted by adapter sleeve, adapter sleeve is fixedly connected with large eccentricity cover by screw, large eccentricity cover is with small eccentricity cover by the fixed-circumference position of compact heap, and one end of small eccentricity cover is fixedly connected with by screw with upper end cover, and the other end of small eccentricity cover is fixedly connected with by screw with lid; Left belt wheel and cylinder body key are fixedly connected, and left belt wheel and right belt are taken turns and moved by belt transmission, and right belt wheel is fixedly connected by key with motor; Large eccentricity cover cylindrical and adapter sleeve inner circle are fixedly connected, and in large eccentricity cover, eccentric orfice overlap cylindrical with small eccentricity and connects, and small eccentricity is overlapped interior eccentric orfice and cylinder body and installed by bearing and connect, and cylinder body axis and main-shaft axis eccentric distance pass through to rotate small eccentricity and overlap and adjust; The eccentric orfice (i.e. small eccentricity cover to match with cylinder body coupled position) that small eccentricity is enclosed within drive itself in rotation process does revolution motion around main-shaft axis, and cylinder body is contained in small eccentricity and overlaps in eccentric orfice; Motor belt motor moving axis rotates, and axle drives right belt wheel to rotate, and right belt wheel is rotated by the left belt wheel of belt drive, and left belt wheel drives cylinder body to rotate, and cylinder body drives piston rotation by sliding axle; Buff spindle and cylinder body concentric, main shaft overlaps concentric with large eccentricity, has axial bias between large eccentricity cover and small eccentricity overlap, when main shaft circular-rotation, the circumference relative position adjustable that small eccentricity cover overlaps with large eccentricity, its distance of shaft centers, from changing, makes polishing disk obtain different revolution-radius; While the different revolution-radius of adjustment, the center of gravity of external overall does not change, and is substantially consistent all the time with main shaft pivot.
2. a kind of two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance according to claim 1, be further characterized in that: main shaft drives adapter sleeve to rotate, adapter sleeve drives large eccentricity cover to rotate, large eccentricity cover drives small eccentricity cover to rotate by compact heap, and small eccentricity is enclosed within rotation process and does circumference revolution rotational motion around the axis of main shaft; Piston, buff spindle, polishing disk do revolution motion around main shaft together with cylinder body; Driven by motor right belt wheel rotates, and right belt wheel drives left belt wheel to rotate by belt pulley, and left belt wheel drives cylinder body spinning motion by key; Cylinder body drives piston, buff spindle, polishing disk spinning motion by sliding axle; Cylinder body, piston, buff spindle, polishing disk rotate around main-shaft axis, and simultaneously around respective own axes rotary motion, existing spinning motion, has revolution motion again; Unclamp compact heap, large eccentricity is overlapped has running clearance with small eccentricity cover, drives small eccentricity cover circular-rotation relative to large eccentricity interplanting to move by rotating upper end cover; Small eccentricity cover overlaps own axes skew with large eccentricity and to change the line of production raw distance, i.e. eccentric distance; After adjusting eccentric distance, locking compact heap.
3. a kind of two eccentric bushing adjusting devices for high rotating speed rubbing head rotary balance according to claim 1, are further characterized in that: polishing disk and cylinder body are around axis of rotation O
1rotate, again around main-shaft axis O
2rotate, rotating speed is respectively ω
1and ω
2, e is eccentric distance; As axis of rotation O
1with the axes O of main shaft
2during coincidence, eccentric distance e is 0, as axis of rotation O
1forward axis of rotation O to
3position time, eccentric distance e is maximum, and the track of eccentric distance is: with O
2o
3line mid point is the center of circle, with O
2o
3for the circle of diameter.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210439248.9A CN103009246B (en) | 2012-11-07 | 2012-11-07 | Double-eccentric bushing regulating device for rotation balance of high-rotating-speed polishing head |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210439248.9A CN103009246B (en) | 2012-11-07 | 2012-11-07 | Double-eccentric bushing regulating device for rotation balance of high-rotating-speed polishing head |
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| CN103009246A CN103009246A (en) | 2013-04-03 |
| CN103009246B true CN103009246B (en) | 2015-03-18 |
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| CN114800077B (en) * | 2022-05-18 | 2022-12-23 | 扬州森源电力科技有限公司 | Internal grinding machine for machining bearing sleeve of power equipment |
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| JP2008036760A (en) * | 2006-08-04 | 2008-02-21 | Nsk Ltd | Polishing device |
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| CN201736117U (en) * | 2010-05-25 | 2011-02-09 | 宁国市晨曦机械有限公司 | Eccentric assembly of lapping machine main shaft |
| CN102135095A (en) * | 2011-03-13 | 2011-07-27 | 深圳乐满商务服务有限公司 | Eccentric birotor pump |
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- 2012-11-07 CN CN201210439248.9A patent/CN103009246B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2068031U (en) * | 1990-01-13 | 1990-12-26 | 成都科技大学 | Superfinishing device with cooperating machine tool |
| JPH0929602A (en) * | 1995-07-20 | 1997-02-04 | Amitec Corp | Polishing device |
| JPH10277820A (en) * | 1997-03-31 | 1998-10-20 | Toyoda Mach Works Ltd | Spindle device for machine tool, and tool holder used therein |
| JP2008036760A (en) * | 2006-08-04 | 2008-02-21 | Nsk Ltd | Polishing device |
| CN201353653Y (en) * | 2008-11-05 | 2009-12-02 | 邱寿山 | Balanced type eccentric fine-tuning boring cutter arbor |
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