CN103003681A - 结构的光学计量的材料光学特性的确定 - Google Patents
结构的光学计量的材料光学特性的确定 Download PDFInfo
- Publication number
- CN103003681A CN103003681A CN2011800228258A CN201180022825A CN103003681A CN 103003681 A CN103003681 A CN 103003681A CN 2011800228258 A CN2011800228258 A CN 2011800228258A CN 201180022825 A CN201180022825 A CN 201180022825A CN 103003681 A CN103003681 A CN 103003681A
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- CN
- China
- Prior art keywords
- diffraction
- order
- optical
- spectrum
- sample spectrum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (26)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/775,392 | 2010-05-06 | ||
US12/775,392 US20110276319A1 (en) | 2010-05-06 | 2010-05-06 | Determination of material optical properties for optical metrology of structures |
PCT/US2011/034833 WO2011139982A2 (en) | 2010-05-06 | 2011-05-02 | Determination of material optical properties for optical metrology of structures |
Publications (1)
Publication Number | Publication Date |
---|---|
CN103003681A true CN103003681A (zh) | 2013-03-27 |
Family
ID=44902508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2011800228258A Pending CN103003681A (zh) | 2010-05-06 | 2011-05-02 | 结构的光学计量的材料光学特性的确定 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110276319A1 (zh) |
EP (1) | EP2567209B1 (zh) |
JP (1) | JP5848328B2 (zh) |
KR (1) | KR20130061688A (zh) |
CN (1) | CN103003681A (zh) |
WO (1) | WO2011139982A2 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105004286A (zh) * | 2015-05-19 | 2015-10-28 | 哈尔滨工业大学 | 一种基于激光束衍射光斑特性的超精密车削加工表面三维微观形貌测量方法 |
CN106030282A (zh) * | 2013-06-03 | 2016-10-12 | 科磊股份有限公司 | 用于光学度量衡的自动波长或角度修剪 |
CN107110638A (zh) * | 2014-11-02 | 2017-08-29 | 诺威量测设备股份有限公司 | 用于图案化结构中的光学测量的方法和系统 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9588066B2 (en) * | 2014-01-23 | 2017-03-07 | Revera, Incorporated | Methods and systems for measuring periodic structures using multi-angle X-ray reflectance scatterometry (XRS) |
US10545104B2 (en) | 2015-04-28 | 2020-01-28 | Kla-Tencor Corporation | Computationally efficient X-ray based overlay measurement |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020088952A1 (en) * | 2000-11-15 | 2002-07-11 | Rao Nagaraja P. | Optical method and apparatus for inspecting large area planar objects |
CN1875244A (zh) * | 2003-10-28 | 2006-12-06 | 音质技术公司 | 形成于半导体晶片上的结构的方位扫描 |
US20070002337A1 (en) * | 2005-07-01 | 2007-01-04 | Timbre Technologies, Inc. | Modeling and measuring structures with spatially varying properties in optical metrology |
US20080076045A1 (en) * | 2006-09-26 | 2008-03-27 | Tokyo Electron Limited | Methods and apparatus for changing the optical properties of resists |
US20080129986A1 (en) * | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
CN101393880A (zh) * | 2008-10-29 | 2009-03-25 | 南昌慧翔自控科技有限公司 | 一种画中画观察及自动判断固晶质量的方法 |
US20100042388A1 (en) * | 2008-08-18 | 2010-02-18 | Joerg Bischoff | Computation efficiency by diffraction order truncation |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6483580B1 (en) * | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
JP3947006B2 (ja) * | 2000-01-26 | 2007-07-18 | ティンバー テクノロジーズ,インコーポレイティド | 高速密結合波分析のための層内計算のキャッシング |
US7317531B2 (en) * | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
US6819426B2 (en) * | 2001-02-12 | 2004-11-16 | Therma-Wave, Inc. | Overlay alignment metrology using diffraction gratings |
US7031894B2 (en) * | 2002-01-16 | 2006-04-18 | Timbre Technologies, Inc. | Generating a library of simulated-diffraction signals and hypothetical profiles of periodic gratings |
US6721691B2 (en) * | 2002-03-26 | 2004-04-13 | Timbre Technologies, Inc. | Metrology hardware specification using a hardware simulator |
US7427521B2 (en) * | 2002-10-17 | 2008-09-23 | Timbre Technologies, Inc. | Generating simulated diffraction signals for two-dimensional structures |
US7171284B2 (en) * | 2004-09-21 | 2007-01-30 | Timbre Technologies, Inc. | Optical metrology model optimization based on goals |
US7483133B2 (en) * | 2004-12-09 | 2009-01-27 | Kla-Tencor Technologies Corporation. | Multiple angle of incidence spectroscopic scatterometer system |
TWI269870B (en) * | 2004-12-30 | 2007-01-01 | Ind Tech Res Inst | Method for deciding structure parameters of a grating |
KR100644390B1 (ko) * | 2005-07-20 | 2006-11-10 | 삼성전자주식회사 | 박막 두께 측정방법 및 이를 수행하기 위한 장치 |
US7428060B2 (en) * | 2006-03-24 | 2008-09-23 | Timbre Technologies, Inc. | Optimization of diffraction order selection for two-dimensional structures |
-
2010
- 2010-05-06 US US12/775,392 patent/US20110276319A1/en not_active Abandoned
-
2011
- 2011-05-02 KR KR1020127031766A patent/KR20130061688A/ko not_active Application Discontinuation
- 2011-05-02 WO PCT/US2011/034833 patent/WO2011139982A2/en active Application Filing
- 2011-05-02 EP EP11778115.3A patent/EP2567209B1/en active Active
- 2011-05-02 CN CN2011800228258A patent/CN103003681A/zh active Pending
- 2011-05-02 JP JP2013509147A patent/JP5848328B2/ja active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020088952A1 (en) * | 2000-11-15 | 2002-07-11 | Rao Nagaraja P. | Optical method and apparatus for inspecting large area planar objects |
CN1875244A (zh) * | 2003-10-28 | 2006-12-06 | 音质技术公司 | 形成于半导体晶片上的结构的方位扫描 |
US20070002337A1 (en) * | 2005-07-01 | 2007-01-04 | Timbre Technologies, Inc. | Modeling and measuring structures with spatially varying properties in optical metrology |
US20080076045A1 (en) * | 2006-09-26 | 2008-03-27 | Tokyo Electron Limited | Methods and apparatus for changing the optical properties of resists |
US20080129986A1 (en) * | 2006-11-30 | 2008-06-05 | Phillip Walsh | Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations |
US20100042388A1 (en) * | 2008-08-18 | 2010-02-18 | Joerg Bischoff | Computation efficiency by diffraction order truncation |
CN101393880A (zh) * | 2008-10-29 | 2009-03-25 | 南昌慧翔自控科技有限公司 | 一种画中画观察及自动判断固晶质量的方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106030282A (zh) * | 2013-06-03 | 2016-10-12 | 科磊股份有限公司 | 用于光学度量衡的自动波长或角度修剪 |
CN106030282B (zh) * | 2013-06-03 | 2021-10-22 | 科磊股份有限公司 | 用于光学度量衡的自动波长或角度修剪的方法及光学系统 |
US11175589B2 (en) | 2013-06-03 | 2021-11-16 | Kla Corporation | Automatic wavelength or angle pruning for optical metrology |
CN107110638A (zh) * | 2014-11-02 | 2017-08-29 | 诺威量测设备股份有限公司 | 用于图案化结构中的光学测量的方法和系统 |
CN107110638B (zh) * | 2014-11-02 | 2018-11-16 | 诺威量测设备股份有限公司 | 用于图案化结构中的光学测量的方法和系统 |
CN105004286A (zh) * | 2015-05-19 | 2015-10-28 | 哈尔滨工业大学 | 一种基于激光束衍射光斑特性的超精密车削加工表面三维微观形貌测量方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2011139982A2 (en) | 2011-11-10 |
US20110276319A1 (en) | 2011-11-10 |
EP2567209A2 (en) | 2013-03-13 |
WO2011139982A3 (en) | 2012-02-02 |
EP2567209B1 (en) | 2020-07-08 |
JP5848328B2 (ja) | 2016-01-27 |
JP2013525813A (ja) | 2013-06-20 |
KR20130061688A (ko) | 2013-06-11 |
EP2567209A4 (en) | 2018-03-07 |
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Free format text: FORMER OWNER: TOKYO ELECTRON LTD. Effective date: 20150602 |
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Address after: California, USA Applicant after: KLA-TENCOR Corp. Address before: California, USA Applicant before: KLA-TENCOR Corp. |
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Application publication date: 20130327 |