CN102990216A - Method for welding bosses of sputtering tantalum ring pieces onto ring body under one-time vacuum condition - Google Patents
Method for welding bosses of sputtering tantalum ring pieces onto ring body under one-time vacuum condition Download PDFInfo
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- CN102990216A CN102990216A CN2012102916437A CN201210291643A CN102990216A CN 102990216 A CN102990216 A CN 102990216A CN 2012102916437 A CN2012102916437 A CN 2012102916437A CN 201210291643 A CN201210291643 A CN 201210291643A CN 102990216 A CN102990216 A CN 102990216A
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Abstract
The invention relates to a method for welding the bosses of sputtering tantalum ring pieces onto a ring body under a one-time vacuum condition, and the method is characterized in that first the bosses and the ring pieces are respectively acid-cleaned; then all the bosses are fixedly arranged on the ring pieces; finally the ring pieces on which the bosses are fixed are clamped on a three-jaw chuck; and the welding of a plurality of bosses is completed in sequence through the rotation of a W shaft. According to the method for welding the bosses of sputtering tantalum ring pieces onto the ring body under the one-time vacuum condition, a clamp is used for fixing the bosses and the ring body, then electronic beam welding is carried out, so that the welding of all the bosses can be completed by one-time vacuumizing, a processing technique is simplified to the largest extent, the processing efficiency is greatly improved, and the processing cost is reduced; and meanwhile, because all the bosses are fixed first, the bosses do not deform when electronic beams are used for welding, so that waste is reduced, and the processing quality is improved.
Description
Technical field
The present invention relates to the non-ferrous metallurgy technology field, particularly relate to an a kind of vacuum sputtering tantalum ring boss is welded on method on the ring body.
Background technology
Physical vapor deposition (PVD) is one of technique of most critical in the semiconductor chip production process, its objective is the form of the compound of metal or metal with film deposited on silicon chip or other the substrate, and subsequently by the cooperating of the techniques such as photoetching and corrosion, finally form distribution structure complicated in the semiconductor chip.Physical vapour deposition (PVD) is finished by sputtering machine table, and sputtering tantalum ring is exactly a very important crucial consumptive material for above-mentioned technique, and its Main Function in semiconductor technology has 2 points:
First: the movement locus of constraint sputtering particle, play the effect of focusing;
Second: the large particle that produces in the absorption sputter procedure, play the effect of purification.
Sputtering tantalum ring is comprised of ring and the boss that is welded on the ring.At present, the sputtering tantalum ring that is applied in semicon industry mainly contains two kinds of structures, a kind of 12 ", ring has 7 boss; A kind of 8 ", ring has 5 boss, and the welding method of two kinds of structures is the same.
In the prior art, weld according to AMS 2681B standard between the boss of sputtering tantalum ring and the ring, namely adopt electron beam welding.Electron beam welding must be finished at vacuum chamber, at seven boss of ring body welding, general way is: mounting boss (1), advance vacuum chamber, vacuumize, weld, exit and go out vacuum chamber, weld 7 boss and just need the above operation of circulation 7 times, working (machining) efficiency is extremely low, is very large waste to the energy.Simultaneously, when carrying out electron beam welding, because boss is not fixed, cause electron beam when the starting the arc, energy too converges, and makes the boss perk, has a strong impact on welding quality, produces waste product.
Summary of the invention
Purpose of the present invention just is to overcome the defective of above-mentioned prior art, and a kind of Effective Raise working (machining) efficiency is provided, and reduces production costs, and a vacuum that improves welding quality is welded on method on the ring body with the sputtering tantalum ring boss.
The technical scheme of taking for achieving the above object is:
An a kind of vacuum is welded on method on the ring body with the sputtering tantalum ring boss, it is characterized in that: at first with boss and respectively pickling of ring, then all boss are fixed on the ring, to fix at last the ring clamping of boss on scroll chuck, finish successively the welding of a plurality of boss by the rotation of W axle.
Above-mentioned pickling is to be 5 in volume ratio: the HCl of 3:1, HF and H
2SO
4Mix acid liquor in carry out, pickling time is controlled at 8-10 minutes.
Above-mentioned boss fixedly utilizes anchor clamps to realize that anchor clamps clamp ring, then utilizes the binding silk that boss is fixed on the anchor clamps.
The supporting screw that is connected with in the screwed hole at described boss center has the hole on the screw, be bundled on the anchor clamps after the binding silk passes the hole.
Described binding silk is tantalum wire.
Described anchor clamps adopt the aluminium preparation.
Close tantalum wire one side of arcing point during the boss welding, and tantalum wire can not be fused.
The present invention adopts anchor clamps that boss and ring body are fixed, then carry out electron beam welding, so only need to take out the welding that a time vacuum can be finished all boss, simplify to greatest extent processing technology, thereby greatly improved working (machining) efficiency, reduced processing cost, simultaneously because first that boss is all fixing, the boss distortion has reduced the generation of waste product when avoiding electron beam welding, has improved crudy.
Description of drawings
Fig. 1 is sputtering tantalum ring structural representation sketch;
Weld jig axonometric drawing among Fig. 2 the present invention;
Fig. 3 is fixedly partial schematic diagram of boss;
Fig. 4 is welding arcing point schematic diagram.
The specific embodiment
A vacuum of the present invention is welded on method on the ring body with the sputtering tantalum ring boss, is specially:
1, the welding front surface is processed, and in order to guarantee welding quality, must carry out pickling processes to ring body and boss before the welding, eliminates the impurity such as greasy dirt.Above-mentioned pickling refers to adopt 5: the HCl of 3:1, HF and H
2SO
4Mix acid liquor in carry out, pickling time is controlled at 8-10 minutes, thoroughly removes pollution and the oxidation at assemble welding place.
2, boss is fixed, as shown in Figures 2 and 3, and 1-tantalum wire among the figure, 2-screw, 3-boss, 4-ring body, 5-anchor clamps.Utilize the screwed hole at boss 3 centers, the screw 2 that turning is corresponding, screw 2 and boss 3 are threaded connection, at the other end of screw 2 hole of Φ 1.2 is arranged, the tantalum wire of Φ 1.0 is passed, ring body 4 is fixing by anchor clamps 5, tantalum wire is bundled on the anchor clamps, thereby realizes boss is fixed on the ring body.Clamp material is aluminium, can avoid the interference to electron beam.Selecting tantalum wire as the binding silk, is to exert an influence for fear of other materials welding quality when welding.
3, electron beam welding at scroll chuck, is finished the welding of a plurality of boss with the ring clamping that fixes boss successively by the rotation of electron beam W axle.Arcing point is seen diagram during welding, the 1-tantalum wire, and the 3-boss, the A-arcing point, close tantalum wire one side of arcing point, but tantalum wire can not be fused.Can guarantee that like this blowing front boss at tantalum wire has finished welding more than 45%, boss does not produce distortion when guaranteeing to weld.Tantalum wire directly fuses when welding, facts have proved that welding quality does not exert an influence.
Claims (7)
- One kind once vacuum the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that: at first with boss and respectively pickling of ring, then all boss are fixed on the ring, to fix at last the ring clamping of boss on scroll chuck, finish successively the welding of a plurality of boss by the rotation of W axle.
- 2. according to a vacuum claimed in claim 1 the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that above-mentioned pickling is is 5 in volume ratio: the HCl of 3:1, HF and H 2SO 4Mix acid liquor in carry out, pickling time is controlled at 8-10 minutes.
- 3. according to a vacuum claimed in claim 1 the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that above-mentioned boss fixedly utilizes anchor clamps (5) to realize, anchor clamps (5) clamp ring (4), then utilize binding silk (1) that boss (3) is fixed on the anchor clamps (5).
- 4. according to a vacuum claimed in claim 3 the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that: the supporting screw (2) that is connected with in the screwed hole at described boss (3) center, screw has the hole on (2), is bundled on the anchor clamps (5) after binding silk (1) passes the hole.
- 5. according to claim 3 or 4 described vacuum the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that: described binding silk (1) is tantalum wire.
- 6. according to claim 3 or 4 described vacuum the sputtering tantalum ring boss is welded on method on the ring body, it is characterized in that: described anchor clamps (5) adopt the aluminium preparation.
- 7. according to a vacuum claimed in claim 5 the sputtering tantalum ring boss is welded on method on the ring body, the arcing point when it is characterized in that boss (3) welding is near tantalum wire one side, and tantalum wire can not be fused.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012102916437A CN102990216A (en) | 2012-08-16 | 2012-08-16 | Method for welding bosses of sputtering tantalum ring pieces onto ring body under one-time vacuum condition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012102916437A CN102990216A (en) | 2012-08-16 | 2012-08-16 | Method for welding bosses of sputtering tantalum ring pieces onto ring body under one-time vacuum condition |
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| CN102990216A true CN102990216A (en) | 2013-03-27 |
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| CN2012102916437A Pending CN102990216A (en) | 2012-08-16 | 2012-08-16 | Method for welding bosses of sputtering tantalum ring pieces onto ring body under one-time vacuum condition |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104827176A (en) * | 2015-05-15 | 2015-08-12 | 哈尔滨工业大学 | Energy following adjustment method for electronic beam welding tantalum and invar alloy circumferential weld |
| CN105436687A (en) * | 2014-08-27 | 2016-03-30 | 宁波江丰电子材料股份有限公司 | Welding method for focusing ring assembly |
| CN108149204A (en) * | 2016-12-05 | 2018-06-12 | 宁波江丰电子材料股份有限公司 | The ring structure of long-life |
| CN109848538A (en) * | 2018-11-29 | 2019-06-07 | 沈阳富创精密设备有限公司 | Application of the vacuum electron beam welding in tantalum alloy welding |
| CN111575663A (en) * | 2020-05-15 | 2020-08-25 | 宁波江丰电子材料股份有限公司 | Magnetron sputtering ring piece and machining method of matching hole of magnetron sputtering ring piece |
| CN113084321A (en) * | 2021-04-22 | 2021-07-09 | 宁波江丰电子材料股份有限公司 | Welding method of semiconductor ring convex junction body |
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| CN101920435A (en) * | 2010-08-20 | 2010-12-22 | 宁夏东方钽业股份有限公司 | Preparation process of sputtering tantalum ring |
| CN201900416U (en) * | 2010-10-29 | 2011-07-20 | 宁波江丰电子材料有限公司 | Electronic beam welding clamp device |
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| CN101086437A (en) * | 2006-06-09 | 2007-12-12 | 朱瑞霞 | Heat radiator and its manufacturing method |
| CN101633080A (en) * | 2009-06-03 | 2010-01-27 | 敦化市亚联机械制造有限公司 | Manufacturing method of licker-in used for fiber board felting machine |
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| CN102284801A (en) * | 2011-07-25 | 2011-12-21 | 桐乡市伟达电子有限公司 | Bimetal strip welding method |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105436687A (en) * | 2014-08-27 | 2016-03-30 | 宁波江丰电子材料股份有限公司 | Welding method for focusing ring assembly |
| CN104827176A (en) * | 2015-05-15 | 2015-08-12 | 哈尔滨工业大学 | Energy following adjustment method for electronic beam welding tantalum and invar alloy circumferential weld |
| CN108149204A (en) * | 2016-12-05 | 2018-06-12 | 宁波江丰电子材料股份有限公司 | The ring structure of long-life |
| CN108149204B (en) * | 2016-12-05 | 2020-03-10 | 宁波江丰电子材料股份有限公司 | Long-life ring structure |
| CN109848538A (en) * | 2018-11-29 | 2019-06-07 | 沈阳富创精密设备有限公司 | Application of the vacuum electron beam welding in tantalum alloy welding |
| CN111575663A (en) * | 2020-05-15 | 2020-08-25 | 宁波江丰电子材料股份有限公司 | Magnetron sputtering ring piece and machining method of matching hole of magnetron sputtering ring piece |
| CN113084321A (en) * | 2021-04-22 | 2021-07-09 | 宁波江丰电子材料股份有限公司 | Welding method of semiconductor ring convex junction body |
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