CN102956427A - Motion control system for broadband beam ion source extraction electrode - Google Patents
Motion control system for broadband beam ion source extraction electrode Download PDFInfo
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- CN102956427A CN102956427A CN2011102411546A CN201110241154A CN102956427A CN 102956427 A CN102956427 A CN 102956427A CN 2011102411546 A CN2011102411546 A CN 2011102411546A CN 201110241154 A CN201110241154 A CN 201110241154A CN 102956427 A CN102956427 A CN 102956427A
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- axle
- extraction electrode
- ion source
- optical fiber
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Abstract
The invention discloses a motion control system for a broadband beam ion source extraction electrode. The control system comprises a main control computer (1), an optical fiber communication card (2), a four-axial motor motion control card (3), a Y1-axial direct-current motor (4), a Y2-axial direct-current motor (5), a Z1-axial direct-current motor (6), a Z2-axial direct-current motor (7), a Y1-axial straight-line shifting potentiometer (8), a Y2-axial straight-line shifting potentiometer (9), a Z1-axial straight-line shifting potentiometer (10) and a strip extraction electrode (12). The control system is characterized in that the optical fiber communication card (2) is inserted on a PCI (personal computer interface) slot of the main control computer (1), transmission signals are connected between the optical communication card (2) and the four-axial motor motion control card (3) through optical fiber, the four-axial motor motion control card (3) regulates shifting of the extraction electrode in the Y1 axial, Y2 axial, Z1 axial and Z2 axial directions through screw transmission by controlling motion of the four direct-current motors, and accordingly an extraction gap of the extraction electrode and an extraction gap of an ion source cavity are in a same horizontal plane, are kept parallel and are adjustable in distance.
Description
Technical field
The present invention relates to a kind of broadband line ion source extraction electrode kinetic control system, especially relate to ion implantor, belong to the equipment for making semiconductor device field.
Background technology
In semiconductor fabrication process equipment ion implantor, ion source extraction electrode is one of whole set equipment critical component, and itself and ion source bulk junction are combined the core component-----ion source system that consists of ion implantor; It has determined all multi-performance index of ion implantor, not only determine ion source system educt beaming flow size, draw energy size, educt beaming flow quality and beam stability energy, simultaneously and other opticses couplings of ion implantor in conjunction with the beam transport efficient that determines the complete machine ion-optic systems and the production efficiency of complete machine.
What broadband line ion source extraction electrode adopted is the acceleration and deceleration three-electrode structures, experiment and long-term operating position show repeatedly, and the drawing seam on the extraction electrode draws with respect to the ion source cavity that there is extremely important impact the position on Ion Extraction line and Shu Pinzhi between the seam.Has larger width with the dress ion beam that the component requirement sends from ion source of wandering about as a refugee, the related ion source line width of this patent has surpassed 300mm, can effectively draw in order to make so wide line, satisfy the requirement of integrated circuit technology and production, must guarantee that drawing of extraction electrode stitched and drawing of ion source cavity is sewn on the same level, and keeping parallelism.
Summary of the invention
The broadband line ion source extraction electrode kinetic control system that the present invention namely is propose for above-mentioned requirements a kind of simple in structure, reliability is high.
The present invention is achieved through the following technical solutions:
A kind of broadband line ion source extraction electrode kinetic control system comprises: main control computer (1), optical fiber communication card (2), four spindle motor motion control cards (3), Y1 axle direct current machine (4), Y2 axle direct current machine (5), Z1 axle direct current machine (6), Z2 axle direct current machine (7), Y1 axle straight-line displacement potentiometer (8), Y2 axle straight-line displacement potentiometer (9), Z1 axle straight-line displacement potentiometer (10), Z1 axle straight-line displacement potentiometer (11), the capable extraction electrode of bar (12).Optical fiber communication card (2) is inserted on the PCI slot of main control computer (1), connect transmission of signal by optical fiber between optical fiber communication card (2) and the four spindle motor motion control cards (3), four spindle motor motion control cards (3) are by the motion of four direct current machines of control, through lead screw transmission, adjust extraction electrode in the displacement of Y1 axle, Y2 axle, Z1 axle, Z2 axle four direction, thereby make extraction electrode draw the seam and drawing of ion source cavity be sewn on the same level, and keeping parallelism, distance is adjustable.
The present invention has following remarkable advantage:
1. four spindle motor motion control cards (3) use optical fiber to the connection between the optical fiber communication card (2), have effectively prevented the interference of ion source sparking to the signal transmission.
2. adjust by electrode movement control by the displacement to extraction electrode Y1, Y2 axle, Z1 axle, Z2 axle four direction, that can regulate extraction electrode draws seam and ionogenic relative position of drawing between the seam, thereby effectively adjusts size and the quality of educt beaming flow.
Description of drawings
Below in conjunction with the drawings and specific embodiments the present invention is further introduced, but not as a limitation of the invention.
Fig. 1 is the theory diagram of a kind of broadband line ion source extraction electrode kinetic control system;
Fig. 2 is a kind of broadband line ion source extraction electrode direction of motion schematic diagram.
Embodiment
Shown in Figure 1 such as reference, a kind of broadband line ion source extraction electrode kinetic control system comprises: main control computer (1), optical fiber communication card (2), four spindle motor motion control cards (3), Y1 axle direct current machine (4), Y2 axle direct current machine (5), Z1 axle direct current machine (6), Z2 axle direct current machine (7), Y1 axle straight-line displacement potentiometer (8), Y2 axle straight-line displacement potentiometer (9), Z1 axle straight-line displacement potentiometer (10), Z1 axle straight-line displacement potentiometer (11).Optical fiber communication card (2) is inserted on the PCI slot of main control computer (1), the Y1 axle that optical fiber communication card (2) sends main control computer (1), the Y2 axle, the Z1 axle, Z2 axial displacement command signal is given four spindle motor motion control cards (3) by optical fiber transmission, four spindle motor motion control cards (3) drive corresponding direct current machine and rotate, through lead screw transmission, driving mechanical structure rectilinear motion, the straight-line displacement potentiometer changes the displacement signal that detects into the signal of telecommunication and feeds back to four spindle motor motion control cards (3), four spindle motor motion control cards (3) are through the rotating speed of inner PID circuit adjustment direct current machine, so that direct current machine stops operating when extraction electrode moves to corresponding desired location.By setting four axial displacements of extraction electrode, stitch and ionogenic relative position of drawing between the seam thereby regulate drawing of extraction electrode.
As with reference to shown in Figure 2, be broadband line ion source extraction electrode direction of motion schematic diagram.Bar shaped extraction electrode (11) is suspended on the pedestal (12) by accurate slideway by left connecting rod (13) and right connecting rod (14), through driven by motor, two connecting rods can be distinguished mobile all around, left connecting rod (13) vertical direction is decided to be the Y1 direction, horizontal direction is decided to be the Z1 direction, right connecting rod (14) vertical direction is decided to be the Y2 direction, and horizontal direction is decided to be the Z2 direction.
The above elaborates content of the present invention.For persons skilled in the art, any apparent change of without departing from the premise in the spirit of the present invention it being done all consists of the infringement to patent of the present invention, will bear corresponding legal liabilities.
Claims (3)
1. the invention provides broadband line ion source extraction electrode kinetic control system, comprising: main control computer (1), optical fiber communication card (2), four spindle motor motion control cards (3), Y1 axle direct current machine (4), Y2 axle direct current machine (5), Z1 axle direct current machine (6), Z2 axle direct current machine (7), Y1 axle straight-line displacement potentiometer (8), Y2 axle straight-line displacement potentiometer (9), Z1 axle straight-line displacement potentiometer (10), Z1 axle straight-line displacement potentiometer (11), the capable extraction electrode of bar (12).
2. the optical fiber communication card (2) described in the right 1 is inserted on the PCI slot of main control computer (1), connects transmission of signal by optical fiber between optical fiber communication card (2) and the four spindle motor motion control cards (3).
3. the motion of four direct current machines of the control of four spindle motor motion control cards (3) described in the right 1, adjust extraction electrode in the displacement of Y1 axle, Y2 axle, Z1 axle, Z2 axle four direction, thereby make extraction electrode draw the seam and drawing of ion source cavity be sewn on the same level, and keeping parallelism, distance is adjustable.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411546A CN102956427A (en) | 2011-08-22 | 2011-08-22 | Motion control system for broadband beam ion source extraction electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102411546A CN102956427A (en) | 2011-08-22 | 2011-08-22 | Motion control system for broadband beam ion source extraction electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102956427A true CN102956427A (en) | 2013-03-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102411546A Pending CN102956427A (en) | 2011-08-22 | 2011-08-22 | Motion control system for broadband beam ion source extraction electrode |
Country Status (1)
| Country | Link |
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| CN (1) | CN102956427A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105185683A (en) * | 2014-06-23 | 2015-12-23 | 汉辰科技股份有限公司 | Lower Dose Rate Ion Implantation Using A Wider Ion Beam |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6501078B1 (en) * | 2000-03-16 | 2002-12-31 | Applied Materials, Inc. | Ion extraction assembly |
| CN2914113Y (en) * | 2006-03-17 | 2007-06-20 | 北京中科信电子装备有限公司 | Fiber connection system applied to ion implantation apparatus |
| US20090114841A1 (en) * | 2007-07-31 | 2009-05-07 | Axcelis Technologies, Inc. | Double plasma ion source |
| US20110186749A1 (en) * | 2009-04-03 | 2011-08-04 | Varian Semiconductor Equipment Associates, Inc. | Ion source |
-
2011
- 2011-08-22 CN CN2011102411546A patent/CN102956427A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6501078B1 (en) * | 2000-03-16 | 2002-12-31 | Applied Materials, Inc. | Ion extraction assembly |
| CN2914113Y (en) * | 2006-03-17 | 2007-06-20 | 北京中科信电子装备有限公司 | Fiber connection system applied to ion implantation apparatus |
| US20090114841A1 (en) * | 2007-07-31 | 2009-05-07 | Axcelis Technologies, Inc. | Double plasma ion source |
| US20110186749A1 (en) * | 2009-04-03 | 2011-08-04 | Varian Semiconductor Equipment Associates, Inc. | Ion source |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105185683A (en) * | 2014-06-23 | 2015-12-23 | 汉辰科技股份有限公司 | Lower Dose Rate Ion Implantation Using A Wider Ion Beam |
| CN105185683B (en) * | 2014-06-23 | 2018-08-03 | 汉辰科技股份有限公司 | Use the relatively low-dose ion implanting compared with wide ion beam |
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| C06 | Publication | ||
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| DD01 | Delivery of document by public notice |
Addressee: Zhongkexin Electronic Equipment Co., Ltd., Beijing Document name: the First Notification of an Office Action |
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| DD01 | Delivery of document by public notice |
Addressee: Zhongkexin Electronic Equipment Co., Ltd., Beijing Document name: Notification that Application Deemed to be Withdrawn |
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130306 |