CN102929106A - Photoetching illuminating system for ultraviolet photoetching machine - Google Patents
Photoetching illuminating system for ultraviolet photoetching machine Download PDFInfo
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Abstract
The invention relates to a photoetching illuminating system for an ultraviolet photoetching machine, and the system comprises an ultraviolet laser, a one-dimensional continuous zoom beam-expanding lens group, a diffractive optical element rotating-disc mechanism, a Fourier transform lens, a dodging system and a controller, wherein the diffractive optical element rotating-disc mechanism is circumferentially uniformly provided with a plurality of diffractive optical elements; the ultraviolet laser generates parallel light beams; and the one-dimensional continuous zoom beam-expanding lens group, the diffractive optical elements of the diffractive optical element rotating-disc mechanism, the Fourier transform lens and the dodging system are sequentially arranged along the transmission direction of the light beams. The photoetching illuminating system disclosed by the invention has the characteristics of simple structure, high optical transmission rate, no problem of pupil degradation caused by a tapered lens group, effective reduction of the production cost of the ultraviolet photoetching machine, and the like.
Description
Technical field
The present invention relates to litho machine, particularly a kind of lithography illuminating system for the ultraviolet photolithographic machine.
Background technology
Along with the development of large scale integrated circuit, the resolution requirement of optical patterning is more and more higher, and is correspondingly, also more and more higher to the requirement of lithography illuminating system.In the illuminator of advanced litho machine, by selecting the pupil plane illumination light distribution corresponding with size with the structure of mask figure, particularly by changing internal diameter size and the endless belt width of the endless belt of ring illumination on the pupil plane, improve the resolution of litho machine, improve the contrast of litho pattern, thereby realize accurately copying of hyperfine litho pattern.
In the present ultraviolet photolithographic illuminator, the formation of pupil plane illumination light distribution mainly realizes by diffraction optical element, continuous magnification lens group and conical mirror group; Diffraction optical element is for generation of the required pupil plane light distribution style of photoetching illumination (such as light illumination modes such as tradition, annular, two utmost points and four utmost points), design of diffractive optical element can be referring to Jerry Leonard in the litho machine, JamesCarriere, Jared Stack, Rich Jones, Marc Himel, John Childers, Kevin Welch, Proc.SPIE.6924, Optical Microlithography XXI 69242O, March 14,2008; Described conical mirror group generally is made of two conical mirrors of concave, convex, by changing the adjusting of endless belt internal diameter on the distance realization pupil plane between two conical mirrors.The continuous magnification lens group is used for regulating the adjusting of pupil plane pressed on ring bandwidth.Adopt the major defect of the method to have: the introducing of conical mirror group will make optical system produce the off-axis aberration that is difficult to proofread and correct, and make the pupil plane light distribution deteriorated, changed the size of the tangential utmost point subtended angle of pupil plane, and radially light distribution can be affected also; The introducing of conical mirror group has reduced the transmitance of whole optical system, can't effectively utilize the energy of laser ultraviolet laser; The difficulty of processing of conical mirror that is operated in the deep ultraviolet wave band is large, causes the manufacturing cost of litho machine high.
In the prior art, among " a kind of reshaping structure of micro-photoetching illumination iris " (referring to patent CN101320216A), the illuminating pupil reshaping structure of a kind of photoetching is disclosed, compare with traditional lithography illuminating system, this invention still utilizes diffraction element to produce different endless belt width with continuous vari-focus mirror group, and difference is to utilize two male conical mirrors to regulate the size of endless belt internal-and external diameter.But this invention does not change the integral layout of traditional apparatus for shaping.
Summary of the invention
The object of the invention is to overcome the deficiency of above-mentioned formerly technology, a kind of illuminator for the ultraviolet photolithographic machine is provided.Illuminator of the present invention does not contain the conical mirror group, but the mode that adopts one dimension continuous zoom beam expanding lens group to combine with diffraction optical element, produce various light illumination modes, and the adjusting partial coherence factor, have simple in structure, optical transmittance is high, do not have the deteriorated problem of pupil that the conical mirror group introduces, the characteristics such as production cost that can effectively reduce litho machine.
Technical solution of the present invention is as follows:
A kind of lithography illuminating system for the ultraviolet photolithographic machine, characteristics are that its formation comprises: ultraviolet laser, one dimension continuous zoom beam expanding lens group, rotating disk mechanism, Fourier transform lens, even photosystem and controller, and the position relationship of above-mentioned component is as follows:
The cross section that described ultraviolet laser produces is square parallel beam, is described one dimension continuous zoom beam expanding lens group, rotating disk mechanism, Fourier transform lens and even photosystem successively along this beam Propagation direction;
Described rotating disk mechanism contains a plurality of diffraction optical elements, and described controller is accurately controlled the rotation of rotating disk mechanism by the circle scrambler, select required diffraction optical element, realizes required light illumination mode; Each diffraction optical element is arranged by a plurality of subregions and is formed, and described controller is controlled described diffraction optical element and moved along its subregion orientation, realizes the adjusting of illumination iris face upper inner ring size;
The annular beam that described Fourier transform lens is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face is carried out the homogenising processing through described even photosystem, and projects on the mask face.
Described rotating disk mechanism along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element, directions X two utmost points illumination diffraction optical element, the illumination of Y-direction two utmost points diffraction optical element, quadrupole illuminating diffraction optical element and traditional lighting diffraction optical element, form ring illumination, the illumination of directions X two utmost points, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting at described pupil plane accordingly.
Described diffraction optical element is made of the subregion of a series of one dimension partition types, the orientation of this subregion is identical with the moving direction of described diffraction optical element, every sub regions corresponds respectively to and produces different-diameter and the identical illumination endless belt of endless belt width, the subregion of described diffraction optical element is corresponding with the endless belt on the described pupil plane, the illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, during work, by shining several continuous subregions, obtain a total illumination endless belt, the number that the width of the illumination endless belt that this is total equals illuminated subregion multiply by the width of an illumination endless belt.
Described one dimension continuous zoom beam expanding lens group, by the first spherical mirror successively, the second spherical mirror, the first cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror consist of, described the first spherical mirror, the second spherical mirror maintains static, described the first cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror are positioned on the guide rail, the controller of dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel by scrambler and is driven described the first cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror move along guide rail, change between three cylindrical mirrors the position relationship along direction of beam propagation, the parallel beam of ultraviolet laser output is expanded into: size is fixed on the y direction, the parallel beam of dimension adjustable on the x direction.
Described diffraction optical element rotating disk mechanism is accurately controlled rotating disk mechanism by the circle scrambler and is rotated, and realizes that the exact position between a plurality of diffraction optical elements is switched.Rotary turnplate mechanism forwards required diffraction optical element in the light path to, and the diffraction optical element in the light path is positioned at the Fourier transform lens front focal plane, and forms specific illumination iris distribution at the back focal plane of Fourier transform lens; And each diffraction optical element is placed perpendicular to optical axis, and passes through the accurate control of guide rail, screw mandrel and displacement encoder, and each diffraction optical element can be accurately mobile along its subregion orientation.
The Main Function of described diffraction optical element is to produce required illumination style at the illumination iris face, by moving the size that diffraction optical element can change endless belt internal diameter on the illumination iris face along the subregion orientation; And change the multiplying power that expands of one dimension continuous zoom beam expanding lens group, then can regulate the size of ring width on the illumination iris cross section.Namely by the multiplying power that expands of mobile diffraction optical element and change one dimension continuous zoom beam expanding lens group, can realize the adjusting of ring size in illumination iris face pressed on ring bandwidth and the endless belt.Continuous magnification lens group in the traditional approach and the model of conical mirror have been changed.
Described diffraction optical element adopts one dimension partition type structure, subregion can be according to the requirement design of illumination style, every sub regions produces one inside and outside numerical aperture is different and difference inside and outside numerical aperture is fixing disperses annular beam, the annular beam of dispersing that the adjacent subarea territory produces just in time joins, the moving direction of diffraction optical element is identical with the subregion orientation, through Fourier transform lens, every sub regions corresponds respectively at the illumination iris face and produces different-diameter and the identical illumination endless belt of endless belt width, and the illumination endless belt of every sub regions and the generation of adjacent subarea territory just in time joins.
During work, one dimension continuous zoom beam expanding lens group expands the parallel beam that ultraviolet laser sends, in the subregion orientation perpendicular to diffraction optical element, expand size and fix, and with measure-alike in this direction of diffraction optical element; In the subregion orientation that is parallel to diffraction optical element, beam sizes changes with expanding the multiplying power variation, thereby changes the number of the continuous subregion of irradiation diffraction optical element.By shining the several continuous subregions of diffraction optical element, on the Fourier transform lens back focal plane, can produce several illumination endless belt that join continuously, when changing the number of the continuous subregion of irradiation, the width of total endless belt also changes thereupon, and the number that its total endless belt width equals to shine subregion multiply by the width of each illumination endless belt.When one dimension continuous zoom beam expanding lens group zoom ratio fixedly the time, diffraction optical element shines the position of diffraction optical element subregion by mobile change incident beam, the determining positions of light beam irradiates disperse the concrete numerical value of the inside and outside numerical aperture of annular beam, after passing through again the Fourier transform lens conversion, the adjusting of ring size in its back focal plane is realized the illumination light intensity, but do not change the endless belt width.
In sum, by adjusting the multiplying power that expands of one dimension continuous zoom beam expanding lens group, to change total endless belt width on the illumination iris face; By moving diffraction optical element along the subregion orientation, to change the interior ring size of endless belt.Thereby realize the internal diameter size of illumination endless belt on the illumination iris face and the adjustment of endless belt width, improved the resolution of litho machine.
Described diffraction optical element is D in the overall dimensions perpendicular to the subregion orientation
y, the overall dimensions that is parallel to the subregion orientation is D
xThe selection range of the size l of every sub regions is that 0.5mm is to 1mm in the diffraction optical element.Its overall dimensions D
xComputing formula be
Wherein
The maximum gauge of illumination iris cross section outer shroud,
Be the minimum diameter of ring in the illumination iris cross section, Δ d is the adjusting resolution of ring in the illumination iris cross section, also equals the width of an illumination endless belt.
Described diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square position facies unit, and these square position facies units are combined into a position phase distribution matrix, produce required illumination iris and distribute; The size t of square position facies unit is for being not more than
Wherein
Be the maximum gauge of illumination iris cross section outer shroud, λ is the wavelength of incident laser, and f is the focal length of fourier lense under wavelength X.
Every sub regions of described diffraction optical element distributes according to required illumination iris, and every sub regions row's position phase distribution matrix obtains by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm.The concrete steps of lid Shi Beige-Sa Ke stone (G-S) iterative algorithm can be referring to R.W.Gershberg, W.O.Saxton, Optik, 35,237-246,1972.After obtaining successively the position phase distribution matrix of every sub regions, obtain the position phase distribution matrix of this diffraction optical element integral body.
Compare with technology formerly, the present invention has following technological merit:
(1) lithography illuminating system of the present invention adopts the partition type diffraction optical element, realizes the function of endless belt internal diameter on the conical mirror group adjusting pupil plane in traditional pupil Shaping Module, thereby need not the conical mirror group, and the whole transmitance of system is improved.
(2) the present invention need not the conical mirror group, has reduced the difficulty of optical design, and the deteriorated problem of the pupil that does not exist the conical mirror group to cause; Need not to design the fourier lense group of zoom, simplified design step and time.
(3) the present invention has saved the processing charges of conical mirror group, has reduced system's manufacturing cost.
Description of drawings
Fig. 1 is the structured flowchart of lithography illuminating system of the present invention.
Fig. 2 and Fig. 3 are the embodiment of one dimension Zooming expander group of the present invention.
Fig. 4 and Fig. 5 are embodiment who realizes that the ring illumination pupil is regulated of the present invention.
Fig. 6 is the structural drawing of diffraction optical element of the present invention and subregion.
Fig. 7 is a kind of turntable structure figure that changes diffraction optical element of the present invention.
Embodiment
The present invention is further illustrated below in conjunction with accompanying drawing and example, but should not limit protection scope of the present invention with this.
See also first Fig. 1, Fig. 1 is a kind of lithography illuminating system structural drawing of the present invention, as seen from the figure, the formation that the present invention is used for the lithography illuminating system of ultraviolet photolithographic machine comprises: ultraviolet laser 11, one dimension continuous zoom beam expanding lens group 12, rotating disk mechanism 13, Fourier transform lens 14, even photosystem 16 and controller 18, and the position relationship of above-mentioned component is as follows:
The cross section that described ultraviolet laser 11 produces is square parallel beam, is described one dimension continuous zoom beam expanding lens group 12, rotating disk mechanism 13, Fourier transform lens 14 and even photosystem 16 successively along this beam Propagation direction;
Described rotating disk mechanism 13 contains a plurality of diffraction optical elements, and described controller 18 is accurately controlled the rotation of rotating disk mechanism 13 by the circle scrambler, select required diffraction optical element, realizes required light illumination mode; Each diffraction optical element is arranged by a plurality of subregions and is formed, and the described diffraction optical element of described controller 18 controls moves along its subregion orientation, realizes the adjusting of illumination iris face 15 upper inner ring sizes;
The annular beam that described Fourier transform lens 14 is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face 15 is carried out the homogenising processing through described even photosystem 16, and projects on the mask face 17.
Described rotating disk mechanism 13 along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element 401, directions X two utmost points illumination diffraction optical element 402, the illumination of Y-direction two utmost points diffraction optical element 403, quadrupole illuminating diffraction optical element 404 and traditional lighting diffraction optical element 405, form ring illumination, the illumination of directions X two utmost points, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting at described pupil plane 15 accordingly.
Comprise successively from the object side to image side: ultraviolet laser 11, one dimension continuous zoom beam expanding lens group 12, diffraction optical element rotating disk mechanism 13, Fourier transform lens 14, even photosystem 16, controller 18.
Described ultraviolet laser 11, built-in colimated light system is square parallel ultraviolet for generation of the cross section.
See also Fig. 2 and Fig. 3, described one dimension continuous zoom beam expanding lens group 12, by the first spherical mirror 121 successively, the second spherical mirror 122, the first cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 consist of, described the first spherical mirror 121 and the second spherical mirror 122 maintain static, described the first cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 are positioned on the guide rail 126, the controller 128 of dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel 127 by scrambler and is driven described the first cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 move along guide rail 126, change between three cylindrical mirrors the position relationship along direction of beam propagation, the parallel beam of ultraviolet laser 11 outputs is expanded into: size is fixed on the y direction, the parallel beam of dimension adjustable on the x direction.
Each diffraction optical element is to be arranged by a series of subregions to consist of, by move to change the size of illumination iris face upper inner ring diameter along its subregion orientation.See also Fig. 1, take ring illumination diffraction optical element 401 as example, it is accurately mobile along guide rail 4011 that ring illumination diffraction optical element 401 drives ring illumination diffraction optical element 201 by controller 18 control screw mandrels 4012, in like manner, other diffraction optical element also can be accurately mobile along its subregion orientation in this way, when described diffraction optical element 401 ~ 405 during along its subregion orientation mobile, can be used for realizing the adjusting of illumination iris face upper inner ring size.
Simultaneously, the rotation that controller 18 can also accurately be controlled by the circle scrambler rotating disk mechanism 13 realizes the switching between five diffraction optical elements, realizes the switching (such as light illumination modes such as tradition, annular, two utmost points and four utmost points) of multiple light illumination mode with this.
As shown in Figure 1, take diffraction optical element 401 as example, the light beam that one dimension continuous zoom beam expanding lens group 12 expands is used for being radiated at diffraction optical element 401; Diffraction optical element 401 is placed perpendicular to optical axis, and is positioned at the front focal plane of Fourier transform lens 14, and its function is to form specific illumination iris distribution (such as light illumination modes such as tradition, annular, two utmost points and four utmost points) at illumination iris face 15; Different spatial light intensity distributes and enters even photosystem 16 and carry out homogenising and process on the illumination iris face 15, and projects on the mask face 17.During work, by adjusting the multiplying power that expands of one dimension continuous zoom beam expanding lens group 12, can change endless belt width total on the pupil plane; By moving diffraction optical element 401 along the subregion orientation, can change the inner and outer ring size of the total endless belt of illumination iris face 15.Distribution on the illumination iris face enters even photosystem 16 and carries out the homogenising processing, and projects on the mask face 17.
Describing the ring illumination diffraction optical element below in conjunction with Fig. 4 and Fig. 5 is how to change interior ring diameter on the illumination iris face.As shown in Figure 4, the corresponding relation in the subregion of diffraction optical element 401 and the endless belt is with identical numeral, and for example subregion 6 is for generation of endless belt 6.The illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, and the number that its width equals illuminated subregion multiply by the width of an illumination endless belt.As shown in Figure 4, adjust the multiplying power that expands of one dimension continuous zoom beam expanding lens group 12, make light beam irradiates arrive five sub regions of diffraction optical element 401, the subregion 4 ~ 8 that shines has produced the ring width of 5* Δ d at illumination iris face 15 through Fourier transform lens 14, corresponding numeral also is 4 ~ 8, and the style correspondence that subregion 8 produces the endless belt 8 on the illumination iris face 15, the style correspondence that subregion 4 produces the endless belt 4 on the illumination iris face 15, endless belt 6,8 corresponding ring width diameters were the interior ring size of endless belt in the middle of the style correspondence that subregion 6 produces on the illumination iris face 15; As shown in Figure 5, adjust the zoom ratio of one dimension continuous zoom beam expanding lens group 12, make light beam irradiates become 3 sub regions size to the area of diffraction optical element 401 from 5 sub regions sizes, then along the accurate mobile diffraction optical element 401 of x direction of principal axis, make the subregion of irradiation become n-2, n-1 and n three sub regions, subregion n-2, the n-1 that shines and n have produced the ring width of 3* Δ d at illumination iris face 15 through Fourier transform lens 14.Because subregion 1 correspondence on the illumination iris face
Ring width, subregion n correspondence on the illumination iris face
Ring width, be 0 traditional lighting graphic pattern so produced interior ring diameter.
In sum, by adjusting the zoom ratio of one dimension continuous zoom beam expanding lens group 12, change the incident beam width, can change the ring width on the illumination iris face, by along the mobile diffraction optical element of x direction of principal axis (subregion orientation), can change the interior ring size on the illumination iris face.Both cooperate, and have realized the adjusting of the ring width on the illumination iris face and interior ring size in the lithography illuminating system.
Diffraction optical element shown in Fig. 6 is perpendicular to the overall dimensions of subregion orientation and the dimension D of square incident beam
yIdentical, the overall dimensions that is parallel to the subregion orientation is D
xThe selection range of the size l of every sub regions is that 0.5mm is to 1mm in the diffraction optical element.Its overall dimensions D
xComputing formula be
Wherein
The maximum gauge of illumination iris cross section outer shroud,
Be the minimum diameter of ring in the illumination iris cross section, Δ d is the adjusting resolution of ring in the illumination iris cross section, equals the width of an illumination endless belt.
As shown in Figure 6, diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square morpheme facies unit 311, and these square morpheme facies units are combined into a position phase distribution matrix, produces required illumination iris and distributes; The size t of square morpheme facies unit 311 is not more than
Wherein
Be the maximum gauge of illumination iris cross section outer shroud, λ is the wavelength of incident laser, and f is the focal length of Fourier transform lens during corresponding to λ.
Fig. 7 is the schematic diagram of turntable structure 13, has five removable diffraction optical elements, and changes to required diffraction optical element by converting mechanism more, realizes specific light illumination mode.For example, diffraction optical element 401-405 produces annular, directions X two utmost points, Y-direction two utmost points, four utmost points, traditional lighting successively.Need the specific requirement according to litho pattern in concrete the application, select suitable light illumination mode and corresponding diffraction optical element.By accurate control rotating disk, needed diffraction optical element is rotated to the position of laser beam irradiation.And each diffraction optical element can move to change along own subregion orientation the size of illumination iris face upper inner ring.During work, have pinpoint rotating disk by rotation, such as Fig. 4 or shown in Figure 5, ring illumination diffraction optical element 401 is rotated to the position of laser beam irradiation.Laser beam irradiation is on annular is movably thrown light on the several continuous subregion of diffraction optical element 401, and the laser beam optical axis direction is along Z-direction, direction along optical axis is placed Fourier transform lens in 401 back, then produces the ring illumination of certain ring width at the illumination iris face.When ring illumination diffraction optical element 401 moved along the subregion orientation, the interior ring diameter of illumination iris face changed thereupon.
Below by a specific embodiment, further specify the principle of work of lithography illuminating system of the present invention.
At first determine designing requirement and parameter, designing requirement distributes for realizing the ring illumination pupil, and parameter is that laser wavelength of incidence λ is 248nm, the maximum gauge of illumination iris cross section outer shroud
Be 25mm, the minimum diameter of ring in the illumination iris cross section
Be 0mm.Pass through computing formula
Obtain D
xBe 62.5mm, the number of movable diffractive-optical element subregion
Wherein subregion size l is taken as 0.5mm, and the adjusting resolution ax/d of ring is 0.2mm in the illumination iris cross section, D
xAnd D
yIt is the Two-dimensional Maximum size of diffraction optical element.
To obtain outer ring diameter 15mm at the illumination iris face now, the pupil illumination pattern of interior ring diameter 10mm, the Fourier transform lens focal length is 500mm.Calculate by formula, then the x direction of one dimension continuous zoom beam expanding lens group expands size and should be S
x=l * (15mm-10mm)/Δ d=12.5mm, the subregion that outer ring diameter is corresponding is counted n
Out=(25mm-15mm)/and Δ d=50, the subregion that interior ring diameter is corresponding is counted n
In=(25mm-10mm)/Δ d=75.Then the course of work is as follows, by regulating one dimension continuous zoom beam expanding lens group, makes incident beam be of a size of 10mm (y) * 12.5mm (x), and y direction beam expander size constancy is 10mm, and x direction beam expander is of a size of 12.5mm.Then mobile diffraction optical element in the x-direction drops in the subregion of number of regions 50 ~ 75 light beam, obtains outer ring diameter 15mm, and the pupil illumination of interior ring diameter 10mm distributes.
Diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square position facies unit, and these square position facies units are combined into a position phase distribution matrix, produce required ring illumination pupil and distribute; The size t of square position facies unit is for being not more than
Calculating rear morpheme facies unit size t is 2 μ m.
Diffraction optical element adopts one dimension partition type structure, distributes according to required illumination iris, and the position phase distribution matrix on every sub regions can obtain by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm.The concrete steps of lid Shi Beige-Sa Ke stone (G-S) iterative algorithm can be referring to Optik, 35,237-246,1972.For example design from top to bottom several the 4th sub regions, the ring illumination light field that this subregion produces is of a size of external diameter 24.4mm, internal diameter 24.2mm, and then the corresponding ring illumination light field that produces of the 5th sub regions is of a size of external diameter 24.2mm, internal diameter 24mm.Can obtain the position phase distribution matrix of this subregion by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm according to these conditions.After obtaining successively the position phase distribution matrix of every sub regions, obtain the position phase distribution matrix of this diffraction optical element integral body, i.e. complete design.
Compare with technology formerly, the present invention has following technological merit:
(1) the present invention adopts the pupil Shaping Module to adopt the partition type diffraction optical element, realizes the function of endless belt internal diameter on the conical mirror group adjusting pupil plane in traditional pupil Shaping Module, thereby need not the conical mirror group, and the whole transmitance of system is improved.
(2) the present invention need not the conical mirror group, has reduced the difficulty of optical design, and the deteriorated problem of the pupil that does not exist the conical mirror group to cause; Need not to design the fourier lense group of zoom, simplified design step and time.
(3) the present invention has saved the processing charges of conical mirror group, has reduced system's manufacturing cost.
Claims (4)
1. lithography illuminating system that is used for the ultraviolet photolithographic machine, be characterised in that its formation comprises: ultraviolet laser (11), one dimension continuous zoom beam expanding lens group (12), rotating disk mechanism (13), Fourier transform lens (14), even photosystem (16) and controller (18), the position relationship of above-mentioned component is as follows:
The cross section that described ultraviolet laser (11) produces is square parallel beam, is described one dimension continuous zoom beam expanding lens group (12), rotating disk mechanism (13), Fourier transform lens (14) and even photosystem (16) successively along this beam Propagation direction;
Described rotating disk mechanism (13) contains a plurality of diffraction optical elements, and described controller (18) is accurately controlled the rotation of rotating disk mechanism (13) by the circle scrambler, select required diffraction optical element, realizes required light illumination mode; Each diffraction optical element is arranged by a plurality of subregions and is formed, and the described diffraction optical element of described controller (18) control moves along its subregion orientation, realizes the adjusting of illumination iris face (15) upper inner ring size;
The annular beam that described Fourier transform lens (14) is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face (15) is carried out the homogenising processing through described even photosystem (16), and projects on the mask face (17).
2. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described rotating disk mechanism (13) along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element (401), directions X two utmost points illumination diffraction optical element (402), Y-direction two utmost points illumination diffraction optical element (403), quadrupole illuminating diffraction optical element (404) and traditional lighting diffraction optical element (405) form ring illumination at described pupil plane (15) accordingly, the illumination of directions X two utmost points, the illumination of Y-direction two utmost points, quadrupole illuminating and traditional lighting.
3. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described diffraction optical element is made of the subregion of a series of one dimension partition types, the orientation of this subregion is identical with the moving direction of described diffraction optical element, every sub regions corresponds respectively to and produces different-diameter and the identical illumination endless belt of endless belt width, the subregion of described diffraction optical element is corresponding with the endless belt on the described pupil plane, the illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, during work, by shining several continuous subregions, obtain a total illumination endless belt, the number that the width of the illumination endless belt that this is total equals illuminated subregion multiply by the width of an illumination endless belt.
4. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described one dimension continuous zoom beam expanding lens group (12), by the first spherical mirror (121) successively, the second spherical mirror (122), the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) consist of, described the first spherical mirror (121), the second spherical mirror (122) maintains static, described the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) are positioned on the guide rail (126), the controller (128) of dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel (127) by scrambler and is driven described the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) are mobile along guide rail (126), change between three cylindrical mirrors the position relationship along direction of beam propagation, the parallel beam of ultraviolet laser (11) output is expanded into: size is fixed on the y direction, the parallel beam of dimension adjustable on the x direction.
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| CN105717750A (en) * | 2014-12-04 | 2016-06-29 | 上海微电子装备有限公司 | Apparatus and method for setting rotation lens stations of optical diffraction wheel |
| CN109708756A (en) * | 2018-12-11 | 2019-05-03 | 南京邮电大学 | Imaging spectrometer and high spatial resolution spectrum imaging method based on diffraction effect |
| CN113084290A (en) * | 2021-03-15 | 2021-07-09 | 武汉华工激光工程有限责任公司 | Laser soldering system and method |
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| CN102109676A (en) * | 2011-02-25 | 2011-06-29 | 中国科学院上海光学精密机械研究所 | Design method of multi-partition optical phase plate for photoetching illumination |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105717750A (en) * | 2014-12-04 | 2016-06-29 | 上海微电子装备有限公司 | Apparatus and method for setting rotation lens stations of optical diffraction wheel |
| CN105717750B (en) * | 2014-12-04 | 2018-03-02 | 上海微电子装备（集团）股份有限公司 | The apparatus and method set for optical diffraction wheel rotation eyeglass station |
| CN109708756A (en) * | 2018-12-11 | 2019-05-03 | 南京邮电大学 | Imaging spectrometer and high spatial resolution spectrum imaging method based on diffraction effect |
| CN113084290A (en) * | 2021-03-15 | 2021-07-09 | 武汉华工激光工程有限责任公司 | Laser soldering system and method |
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| CN102929106B (en) | 2014-10-15 |
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