CN102929098A - V-structured mold cavity and manufacturing method thereof, and manufacturing method of light-guide plate - Google Patents
V-structured mold cavity and manufacturing method thereof, and manufacturing method of light-guide plate Download PDFInfo
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- CN102929098A CN102929098A CN201210276114XA CN201210276114A CN102929098A CN 102929098 A CN102929098 A CN 102929098A CN 201210276114X A CN201210276114X A CN 201210276114XA CN 201210276114 A CN201210276114 A CN 201210276114A CN 102929098 A CN102929098 A CN 102929098A
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Abstract
The embodiment of the invention provides a V-structured mold cavity and a manufacturing method, and a manufacturing method of a light-guide plate. The invention relates to the field of display manufacturing. With the method provided by the invention, V-structured mold cavities with different angles can be manufactured according to requirements, and the V-structured mold cavities are adopted for manufacturing light-guide plates. With the method, processing cost can be reduced, and processing period can be shortened. The method comprises the steps that: photosensitive adhesive is formed on a substrate; a light shielding layer is arranged on the photosensitive adhesive, wherein the light shielding layer comprises a plurality of light shielding stripes, the widths of the light shielding stripes are equal to that of the pre-designed V-structures, and the central axis spacings of the light shielding stripes are equal to the central axis spacings of the corresponding V-structures; according to the angle of the V-structure, the photosensitive adhesive is exposed by using an exposing machine; and the photosensitive adhesive is subjected to a developing treatment, such that the V-structured mold cavity is obtained. The invention is suitable for the field of display device generation and manufacturing.
Description
Technical field
The present invention relates to the manufacturing field of display, relate in particular to the method for making of a kind of V structure die and preparation method thereof, light guide plate.
Background technology
Along with the development of science and technology, display technique constantly perfect, the liquid crystal display product that people use is more and more.In the picture disply process that realizes the liquid crystal display high-quality, the design of light guide plate is particularly important.Light source is injected light guide plate with light, forms comparatively uniformly area source under the effect of light guide plate; Adjusted good comparatively uniformly light is injected display screen, with the purpose that realizes showing.
At present, the light guide plate of high light efficiency simultaneously has salient point, the another side surface is the V structure, wherein, the V structure of light guide plate is with PC (Polycarbonate, polycarbonate) material or PMMA (PolymethylMethacrylate, polymethylmethacrylate) material use V structure die is made by the method for ejection formation.V structure die commonly used has two kinds, and a kind of is copper mold benevolence, and a kind of is the nickel die.The V structure of copper mold benevolence is through machining, and utilizes diamond cutter to be processed into required V structure in copper mold benevolence; The V structure of nickel die is to utilize the mode of electroforming to obtain required V structure by copper mold benevolence V structure.The method for making of V structure die mainly is machining, utilizes diamond cutter to be processed into required V structure, obtains the V structural plane of light guide plate by ejection formation.
State in realization in the process of making V structure die, the inventor finds that there are the following problems at least in the prior art: the angle of V structure die is by the control of diamond cutter angle, and the diamond cutter angle is changeless in the masterplate.If the light guide plate of design different angles V structure needs the die of different angles V structure, need the diamond cutter of coupling angle customized, so that the cost of processing is high, the cycle is long like this.
Summary of the invention
The invention provides the method for making of a kind of V structure die and preparation method thereof, light guide plate, make as required the V structure die of different angles in order to realization, and utilize V structure die to make light guide plate, cut down finished cost, shorten the purpose of process-cycle.
For achieving the above object, the present invention adopts following technical scheme:
A kind of method for making of V structure die comprises: form photoresists at base plate; At described photoresists light shield layer is set, described light shield layer comprises a plurality of shading strips, the width of described shading strip equates with the width of V structure of in advance design, and the spacing between the central shaft of the spacing between the central shaft of described shading strip and corresponding described V structure equates; According to the angle of described V structure, utilize exposure machine that described photoresists are exposed; Described photoresists are carried out development treatment, obtain V structure die.
A kind of V structure die comprises: base plate and be formed on photoresists on the described base plate, the surface of described photoresists is the V structure.
A kind of method for making of light guide plate comprises: utilize V structure die to produce light guide plate by the method for ejection formation; Wherein, described V structure die is above-mentioned V structure die.
The embodiment of the invention provides the method for making of a kind of V structure die and preparation method thereof, light guide plate, form photoresists at base plate, at photoresists light shield layer is set, and according to the angle of V structure of design in advance, utilize exposure machine that photoresists are exposed, and photoresists are carried out development treatment, remove the unexposed portion of photoresists, thereby obtain V structure die.Because the angle of V structure die is according to required V structure angular setting surface of light source with exposure machine, so that the surface of light source of exposure machine is respectively half angle photoresists are exposed of required V structure angle in the both sides of vertical plane, thereby obtain required V structure die, realized making as required the V structure die of different angles, and utilize V structure die to make light guide plate, cut down finished cost, shorten the purpose of process-cycle.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
The schematic diagram of a kind of V structure die method for making that Fig. 1 provides for the embodiment of the invention;
The schematic diagram of the V structure that Fig. 2 provides for the embodiment of the invention;
The structural representation of a kind of V structure die method for making that Fig. 3～Fig. 6 provides for the embodiment of the invention;
The schematic top plan view of light shield layer is set in a kind of V structure die method for making that Fig. 7 provides for the embodiment of the invention.
The accompanying drawing sign:
The 11-base plate, 12-photoresists, 13-light shield layer, 14-exposure machine, 15-the first surface of light source, 16-secondary light source face.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
The embodiment of the invention provides a kind of method for making of V structure die, as shown in Figure 1, comprising:
101, form photoresists 12 at base plate 11.
Concrete, photoresists 12 are photosensitive mixing materials, can comprise photosensitive resin, sensitizer and three kinds of compositions of solvent.Photocuring reaction can occur at exposure region in photosensitive resin soon after illumination, so that significant change occurs for the physical property of this material, particularly dissolubility, affinity etc.Process through suitable solvent, dissolve soluble part, obtain required image.Preferably, photoresists are negative-working photoresist.
Need to prove, in the method for making of V structure die, base plate 11 is the sheet metals with satisfactory flatness, can be steel, the sheet metal of other metals such as copper material.
Need to prove, can utilize the method for making of V structure die to make other V infrastructure products, this moment, at this moment, base plate can be nonmetallic, comprises glass plate, plastic plate etc. according to the material of the Location of requirement base plate of product.For example, if will make V structure plastic plate, then this moment, base plate was the plastic plate with satisfactory flatness.
Need to prove, the V structure refers to that two sides become V-types to connect, the height of V structure be the opening part of V to the distance between the summit of V, in Fig. 2 with shown in the H.
Wherein, as shown in Figure 3, the thickness of the photoresists 12 that form at base plate 11 is more than or equal to the height of the V structure of design in advance.The thickness of the photoresists 12 that preferably, form at base plate 11 is greater than the height of the V structure of design in advance.
Need to prove, in all embodiment of the present invention, the mode that forms photoresists at base plate can be to be coated with photoresists at base plate, also can be to deposit photoresists at base plate, also can be to attach photoresists at base plate, also form photoresists with other modes at base plate, the present invention does not limit this.
102, at described photoresists 12 light shield layer 13 is set.
Wherein, described light shield layer 13 comprises a plurality of shading strips, and the width of described shading strip equates with the width of V structure of in advance design, and the spacing between the central shaft of the spacing between the central shaft of described shading strip and corresponding described V structure equates.
Need to prove, the width of described shading strip and the width of V structure of in advance design equate to refer to that the width at the arbitrary place of shading strip equates with the width of corresponding V structure herein.
Concrete, the mode that light shield layer 13 is set has two kinds.A kind of mode is the width according to the V structure that designs in advance, spacing between the central shaft of V structure, in a plurality of light shield layers, select the shading strip width to equate with the width of V structure, and the light shield layer 13 that the spacing between the central shaft of the spacing between the central shaft of shading strip and corresponding V structure equates, and this light shield layer 13 is arranged on the photoresists 12.Another kind of mode is width and the interstructural spacing of V according to the V structure, at photoresists 12 many shading strips are set, and the width at the arbitrary place of shading strip is identical with the width of V structure, spacing between the central shaft of the spacing between the central shaft of shading strip and corresponding V structure equates described many shading strips composition light shield layer 13.
Need to prove, if the width of V structure is to become gradually large in the V structure die of design in advance, then as shown in Figure 7, the width of shading strip also is to become gradually large, be the ladder type that is shaped as of shading strip, and the width at the arbitrary place of shading strip equate with the width of corresponding herein V structure.If the width of V structure remains unchanged in the V structure die of design in advance, then the width of shading strip also remains unchanged, namely shading strip be shaped as rectangle, the width of shading strip equates with the width of V structure all the time.As long as the width at the arbitrary place of shading strip is equal with the width of corresponding herein V structure, the width of the V structure that designs in advance can also be to diminish gradually, or the change of other modes, and the present invention does not limit this.
Preferably, the width of V structure of design remains unchanged in advance, and then the width of shading strip equates with the width of the V structure that designs in advance, namely shading strip be shaped as rectangle, and a plurality of shading strip is parallel to each other.
Need to prove, the spacing between the central shaft of V structure can equate, also can be unequal, and the present invention does not limit this.If the spacing between the central shaft of V structure is equal, then the spacing between the central shaft of corresponding shading strip also equates, if the spacing between the central shaft of V structure is unequal, then with reference to shown in Figure 7, then the spacing between the central shaft of corresponding shading strip is also unequal.
Further preferred, the spacing between the central shaft of V structure is equal, then as shown in Figure 4, and parallel equidistant arrangement between each shading strip in the light shield layer.
Preferably, light shield layer 13 is film layer.The printing ink face of film layer is formed on the photoresists.
Need to prove, the width of V structure is the distance at the initial opening part two ends of V, uses shown in the D in Fig. 2.Spacing between the central shaft of V structure is the distance between the central shaft of the central shaft of a V structure and adjacent V structure, represents with M in Fig. 2.
103, according to the angle of described V structure, utilize 14 pairs of described photoresists 12 of exposure machine to expose.
Concrete, angle according to the V structure that designs in advance, surface of light source that can two exposure machines is set to different directions and the angle surface of light source identical with the angle of V structure, is mapped to photoresists so that the light that the surface of light source of exposure machine sends casts oblique rays in different directions, in the drawings sign.Preferably, as shown in Figure 5, also can be 14 pairs of described photoresists 12 of an exposure machine and expose.At this moment, the surface of light source of described exposure machine 14 is divided into the first surface of light source 15 and secondary light source face 16, and the first surface of light source 15 and secondary light source face 16 to send direction of light different.Angle according to described V structure, adjust the angle of 16 in the first surface of light source 15 and secondary light source face, so that the first surface of light source 15 equates with the angle of V structure with the angle of 16 in secondary light source face, and the angle of the light that sends of the first surface of light source 15 and secondary light source face 16 is V structure angle half.Expose by described the first surface of light source 15 and 16 pairs of described photoresists 12 of secondary light source face, so that the exposed portion of photoresists 12 solidifies.
Preferably, the angle of V structure is 60～135 degree, and the width of described V structure is 0.05～0.2mm, and then the height of described V structure is 0.005～0.04mm.
Need to prove, the angle of V structure refers to two angles between the side, represents with A in Fig. 2.
104, described photoresists 12 are carried out development treatment, obtain V structure die.
Concrete, not being exposed partly of photoresists 12 can be dissolved in certain material, photoresists 12 are carried out development treatment, developer solution removes the part of photoresists 12 for not being exposed, namely remove the part that light shield layer 13 covers, keep photoresists 12 and be exposed part, then the photoresists 12 after developing have been carried out the V structure photoresists 12 that pyroprocessing can obtain having at base plate 11 high rigidity, be V structure die.Because exposure machine 14 to photoresists 12 oblique exposures, so can obtain V structure photoresists 12 after developing, forms V structure die by V structure photoresists 12 and base plate, as shown in Figure 6.
Below the exemplary method for making to V structure die describe.
Need to prove, in example, describe as example for be coated with photoresists at base plate take the specific implementation that forms photoresists at base plate.
For example, the angle that now will make the V structure is 135 degree, and width is 0.2mm, highly is the V structure die of 0.04mm, and the spacing between the central shaft of arbitrary neighborhood V structure is 0.2mm in the V structure die.
S201, evenly coating thickness is the negative-working photoresist of 0.05mm on base plate.
S202, according to the width 0.2mm of required V structure, at described photoresists light shield layer is set.
Concrete, described light shield layer comprises the shading strip of a plurality of parallel equidistant arrangements, and the width of described shading strip equates with the width 0.2mm of required V structure, and for the spacing between the central shaft of shading strip is 0.4mm, and described light shield layer is film layer.
S203, according to the angle of described V structure, utilize exposure machine that described photoresists are exposed.
Concrete, angle 135 degree according to the V structure, adjust the first surface of light source of exposure machine and the angle between the secondary light source face, so that the first surface of light source of exposure machine and the angle between the secondary light source face are 135 degree, and the incident angle that guarantees the light that the first surface of light source sends be 67.5 the degree, the incident angle of the light that the secondary light source face sends be 67.5 the degree.And to adjust the first surface of light source and secondary light source face be 500mm to the height of photoresists, and the luminous energy of the first surface of light source and secondary light source face is 40mJ.Expose in the face of photoresists by the first surface of light source and secondary light source, so that the photoresists exposed portion solidifies.
It should be noted that, surface of light source to exposure machine among all embodiment of the present invention is relevant with the energy of the surface of light source of exposure machine with the distance between photoresists, but the surface of light source of exposure machine and the distance between photoresists, the energy occurrence of the surface of light source of exposure machine is that how many present invention do not limit.
S204, described photoresists are carried out development treatment, obtain V structure die.
Concrete, photoresists after the exposure are carried out development treatment, photoresists by illumination partly are retained, can in certain material, do not dissolved by the photoresists of illumination part, being developed liquid rinses out, then solidify through 300 celsius temperatures, obtain the V structure photoresists of high rigidity at base plate, namely obtain V structure die.
The embodiment of the invention provides a kind of method for making of V structure die, form photoresists at base plate, at photoresists light shield layer is set, and according to the angle of V structure of design in advance, utilize exposure machine that photoresists are exposed, and photoresists are carried out development treatment, remove the unexposed portion of photoresists, thereby obtain V structure die.Because V structure die is to obtain after exposure machine is exposed to photoresists after according to required V structure angular setting surface of light source angle, so obtained the V structure die that needs, realized making as required the V structure die of different angles, and utilize V structure die to make light guide plate, cut down finished cost, shorten the purpose of process-cycle.
The embodiment of the invention provides a kind of V structure die, with reference to shown in Figure 6, comprising: base plate 11 and be formed on photoresists 12 on the described base plate 11, the surface of described photoresists 12 is the V structure.
Concrete, the surface that is forming high rigidity on the base plate 11 is the photoresists 12 of V structure.Preferably, the angle of described V structure be 60～135 the degree between arbitrarily angled, the width of described V structure is any width between 0.05～0.2mm, and then the height of described V structure is the arbitrary height between 0.005～0.04mm, and the thickness of described photoresists 12 is more than or equal to the height of V structure.
Need to prove, the angle of V structure is fixed, and after width was fixing, the height of V structure can calculate accordingly, that is to say, the height of V structure is also fixing accordingly.
Need to prove the V structure nickel die that utilizes the method for electroforming also can arrive by V structure die.
The embodiment of the invention provides a kind of method for making of light guide plate, comprising: utilize V structure die to produce light guide plate by the method for ejection formation; Wherein, described V structure die is the V structure die described in above-described embodiment.
The embodiment of the invention provides the method for making of a kind of V structure die and preparation method thereof, light guide plate, form photoresists at base plate, at photoresists light shield layer is set, and according to the angle of V structure of design in advance, utilize exposure machine that photoresists are exposed, and photoresists are carried out development treatment, remove the unexposed portion of photoresists, thereby obtain V structure die.Because the angle of V structure die is according to required V structure angular setting surface of light source with exposure machine, so that the surface of light source of exposure machine sends the light of different directions, and the incident angle of the light that surface of light source sends is required V structure angle half, the light sensation optical cement that utilizes this exposure machine surface of light source to send exposes, thereby obtain required V structure die, realized making as required the V structure die of different angles, and utilize V structure die to make light guide plate, cut down finished cost, shorten the purpose of process-cycle, and above-mentioned light guide plate is used in the display, not only so that display backlight brighter, also so that backlight more even.
The above; be the specific embodiment of the present invention only, but protection scope of the present invention is not limited to this, anyly is familiar with those skilled in the art in the technical scope that the present invention discloses; can expect easily changing or replacing, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (11)
1. the method for making of a V structure die is characterized in that, comprising:
Form photoresists at base plate;
At described photoresists light shield layer is set, described light shield layer comprises a plurality of shading strips, the width of described shading strip equates with the width of V structure of in advance design, and the spacing between the central shaft of the spacing between the central shaft of described shading strip and corresponding described V structure equates;
According to the angle of described V structure, utilize exposure machine that described photoresists are exposed;
Described photoresists are carried out development treatment, obtain V structure die.
2. method according to claim 1 is characterized in that, described photoresists are negative-working photoresist.
3. method according to claim 1 is characterized in that, the parallel equidistant arrangement of described shading strip.
4. method according to claim 1 is characterized in that, described light shield layer is film layer.
5. method according to claim 1 is characterized in that, the surface of light source of described exposure machine is divided into the first surface of light source and secondary light source face;
Describedly utilize exposure machine that described photoresists are exposed to comprise:
According to the angle of described V structure, adjust the angle of the first surface of light source and secondary light source face;
Expose in the face of described photoresists by described the first surface of light source and secondary light source.
6. each described method is characterized in that according to claim 1-5, and the angle of described V structure is 60～135 degree, and the width of described V structure is 0.05～0.2mm.
7. method according to claim 6 is characterized in that, the height of described V structure is 0.005～0.04mm, and the thickness of the described photoresists that form is more than or equal to the height of described V structure.
8. a V structure die is characterized in that, comprising: base plate and be formed on photoresists on the described base plate, the surface of described photoresists is the V structure.
9. V structure die according to claim 8 is characterized in that, the angle of described V structure be 60～135 the degree between arbitrarily angled, the width of described V structure is any width between 0.05～0.2mm.
10. V structure die according to claim 9 is characterized in that, the height of described V structure is the arbitrary height between 0.005～0.04mm, and the thickness of described photoresists is more than or equal to the height of V structure.
11. the method for making of a light guide plate is characterized in that, comprising: utilize V structure die to make light guide plate by the method for ejection formation; Wherein, described V structure die is each described V structure die of claim 8-10.
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| CN201210276114XA CN102929098A (en) | 2012-08-03 | 2012-08-03 | V-structured mold cavity and manufacturing method thereof, and manufacturing method of light-guide plate |
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| CN201210276114XA CN102929098A (en) | 2012-08-03 | 2012-08-03 | V-structured mold cavity and manufacturing method thereof, and manufacturing method of light-guide plate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110703559A (en) * | 2019-10-22 | 2020-01-17 | 苏州美盈森环保科技有限公司 | Method for manufacturing printing plate and printing plate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1396483A (en) * | 2001-07-13 | 2003-02-12 | 兴隆发电子股份有限公司 | Optical guide plate and method for making its module core |
| JP3412178B2 (en) * | 1993-01-04 | 2003-06-03 | 住友電気工業株式会社 | Method for forming microstructure |
| KR20040050502A (en) * | 2002-12-10 | 2004-06-16 | 한국과학기술연구원 | Method for manufacturing V groove structure using photoresist |
| CN101216663A (en) * | 2008-01-17 | 2008-07-09 | 陈林森 | Backlight module accurate light guide thin film core production method |
-
2012
- 2012-08-03 CN CN201210276114XA patent/CN102929098A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3412178B2 (en) * | 1993-01-04 | 2003-06-03 | 住友電気工業株式会社 | Method for forming microstructure |
| CN1396483A (en) * | 2001-07-13 | 2003-02-12 | 兴隆发电子股份有限公司 | Optical guide plate and method for making its module core |
| KR20040050502A (en) * | 2002-12-10 | 2004-06-16 | 한국과학기술연구원 | Method for manufacturing V groove structure using photoresist |
| CN101216663A (en) * | 2008-01-17 | 2008-07-09 | 陈林森 | Backlight module accurate light guide thin film core production method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110703559A (en) * | 2019-10-22 | 2020-01-17 | 苏州美盈森环保科技有限公司 | Method for manufacturing printing plate and printing plate |
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Application publication date: 20130213 |