CN102906616B - 使用应力双折射性能标准设计透镜 - Google Patents

使用应力双折射性能标准设计透镜 Download PDF

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Publication number
CN102906616B
CN102906616B CN201180025303.3A CN201180025303A CN102906616B CN 102906616 B CN102906616 B CN 102906616B CN 201180025303 A CN201180025303 A CN 201180025303A CN 102906616 B CN102906616 B CN 102906616B
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CN
China
Prior art keywords
lens
glass
group
lens element
stress birefringence
Prior art date
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CN201180025303.3A
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English (en)
Chinese (zh)
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CN102906616A (zh
Inventor
J·R·比尔特雷
A·F·库尔茨
B·D·西尔弗斯坦
J·马扎雷拉
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Imax Corp
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Eastman Kodak Co
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Publication of CN102906616A publication Critical patent/CN102906616A/zh
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/16—Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Stereoscopic And Panoramic Photography (AREA)
  • Lenses (AREA)
  • Projection Apparatus (AREA)
CN201180025303.3A 2010-05-21 2011-05-09 使用应力双折射性能标准设计透镜 Active CN102906616B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/784,521 2010-05-21
US12/784,521 US8504328B2 (en) 2010-05-21 2010-05-21 Designing lenses using stress birefringence performance criterion
PCT/US2011/035737 WO2011146273A1 (en) 2010-05-21 2011-05-09 Designing lenses using stress birefringence performance criterion

Publications (2)

Publication Number Publication Date
CN102906616A CN102906616A (zh) 2013-01-30
CN102906616B true CN102906616B (zh) 2015-03-04

Family

ID=44259669

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180025303.3A Active CN102906616B (zh) 2010-05-21 2011-05-09 使用应力双折射性能标准设计透镜

Country Status (5)

Country Link
US (1) US8504328B2 (enExample)
EP (1) EP2572222B1 (enExample)
JP (1) JP5731636B2 (enExample)
CN (1) CN102906616B (enExample)
WO (1) WO2011146273A1 (enExample)

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US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
US8830580B2 (en) * 2011-10-27 2014-09-09 Eastman Kodak Company Low thermal stress catadioptric imaging optics
DE102012006244A1 (de) * 2012-03-21 2013-09-26 Jenoptik Optical Systems Gmbh Farbkorrigiertes F-Theta-Objektiv für die Lasermaterialbearbeitung
US9367648B2 (en) * 2013-03-14 2016-06-14 Synopsys, Inc. Specification-guided user interface for optical design systems
DE102013010466A1 (de) * 2013-06-24 2014-12-24 Trützschler GmbH & Co. Kommanditgesellschaft Vorrichtung in der Spinnereivorbereitung, Ginnerei o. dgL zum Erkennen von gleichfarbigen oder gleichhellen Fremdteilen oder Störstellen
WO2016132321A1 (en) * 2015-02-18 2016-08-25 Imax Emea Limited Despeckling system for projected light
EP3264741A1 (en) * 2016-06-30 2018-01-03 Thomson Licensing Plenoptic sub aperture view shuffling with improved resolution
CN106199918B (zh) * 2016-08-31 2018-10-16 浙江舜宇光学有限公司 摄像镜头
US11526020B2 (en) * 2018-11-05 2022-12-13 Omnivision Technologies, Inc. Structured light projector and projector assembly thereof
KR102597470B1 (ko) * 2019-06-05 2023-11-03 삼성전자주식회사 뎁스 맵 결정 방법 및 그 방법을 적용한 전자 장치
US20230024433A1 (en) * 2021-07-19 2023-01-26 Meta Platforms Technologies, Llc Optical components having athermalization and aberration correction characteristics
CN116680766B (zh) * 2023-08-01 2023-11-10 杭州纳境科技有限公司 消色差超透镜的确定方法、装置、电子设备及存储介质
CN120282352B (zh) * 2025-05-13 2025-10-10 中山市达尔科光学有限公司 一种深空探测用照明灯的光学数据处理方法

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US20040263989A1 (en) * 2003-06-25 2004-12-30 Eastman Kodak Company Display apparatus
US20060109560A1 (en) * 2004-11-22 2006-05-25 Vladimir Kamenov Method of determining lens materials for a projection exposure apparatus

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US4671624A (en) * 1985-03-25 1987-06-09 Hughes Aircraft Company Variable lens and birefringence compensator for continuous operation
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US6585378B2 (en) * 2001-03-20 2003-07-01 Eastman Kodak Company Digital cinema projector
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
US6785051B2 (en) 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
US6547396B1 (en) 2001-12-27 2003-04-15 Infocus Corporation Stereographic projection system
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US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6896381B2 (en) * 2002-10-11 2005-05-24 Light Prescriptions Innovators, Llc Compact folded-optics illumination lens
DE10316428A1 (de) 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US7832869B2 (en) 2003-10-21 2010-11-16 Barco N.V. Method and device for performing stereoscopic image display based on color selective filters
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JP2006048747A (ja) 2004-07-30 2006-02-16 Toshiba Corp ヘッド、ヘッドサスペンションアッセンブリ、およびこれを備えたディスク装置
JP4868209B2 (ja) * 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
US20060218971A1 (en) 2005-02-10 2006-10-05 Rolf Martin Synthetic quartz glass and process for producing a quartz glass body
US7357511B2 (en) 2005-03-23 2008-04-15 3M Innovative Properties Company Stress birefringence compensation in polarizing beamsplitters and systems using same
US7518662B2 (en) 2005-05-22 2009-04-14 Real D Contrast enhancement for liquid crystal based projection systems
EP2501139A3 (en) 2005-05-26 2014-01-08 RealD Inc. Ghost-compensation for improved stereoscopic projection
US7528906B2 (en) 2006-01-23 2009-05-05 Real D Achromatic polarization switches
JP4931628B2 (ja) 2006-03-09 2012-05-16 セイコーインスツル株式会社 照明装置及びこれを備える表示装置
CN101479637B (zh) * 2006-05-05 2011-09-21 康宁股份有限公司 准远心成像透镜的畸变调谐
DE102008051252B4 (de) * 2008-10-10 2016-09-08 Sypro Optics Gmbh Projektionsobjektiv und Projektor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004111690A1 (de) * 2003-06-18 2004-12-23 Carl Zeiss Smt Ag Projektionsobjektiv sowie verfahren zum auswählen von optischen materialien in einem derartigen objektiv
US20040263989A1 (en) * 2003-06-25 2004-12-30 Eastman Kodak Company Display apparatus
US20060109560A1 (en) * 2004-11-22 2006-05-25 Vladimir Kamenov Method of determining lens materials for a projection exposure apparatus

Also Published As

Publication number Publication date
EP2572222B1 (en) 2017-06-21
JP5731636B2 (ja) 2015-06-10
US20110288824A1 (en) 2011-11-24
CN102906616A (zh) 2013-01-30
WO2011146273A1 (en) 2011-11-24
JP2013531806A (ja) 2013-08-08
EP2572222A1 (en) 2013-03-27
US8504328B2 (en) 2013-08-06

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