CN102902446A - Capacitive type touch screen and manufacturing method thereof - Google Patents
Capacitive type touch screen and manufacturing method thereof Download PDFInfo
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- CN102902446A CN102902446A CN2012104224981A CN201210422498A CN102902446A CN 102902446 A CN102902446 A CN 102902446A CN 2012104224981 A CN2012104224981 A CN 2012104224981A CN 201210422498 A CN201210422498 A CN 201210422498A CN 102902446 A CN102902446 A CN 102902446A
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Abstract
The invention provides a capacitive type touch screen and a manufacturing method thereof. The manufacturing method comprises the following steps of: providing a transparent substrate; manufacturing a metal line on the transparent substrate; manufacturing an organic transparent insulating layer on the metal line; manufacturing a first transparent electrode layer on the organic transparent insulating layer; and enabling the first transparent electrode layer to be bridged with the metal line section at the second part. According to the manufacturing method, the process for manufacturing the metal wiring is carried out before the process of manufacturing the organic transparent insulating layer. The manufacturing method has the advantages that the yellow-light processing of the organic transparent insulating layer is omitted, the manufacturing process is simplified, and the cost is saved; and in addition, the metal wiring is protected by adopting thicker organic transparent insulating layer, so that the protection for the metal wiring is enhanced to a certain extent, and the guarantee in the aspect of the function of the touch screen is improved.
Description
Technical field
The present invention relates to touch-screen manufacturing technology field, relate in particular to capacitive touch screen and preparation method thereof.
Background technology
Touch-screen is a kind of simple, convenient, natural human-computer interaction device, is widely used in already various places.Touch-screen is of a great variety, mainly is divided into resistance-type, condenser type, infrared type and surface acoustic wave type according to principle.Capacitive touch screen is because of its outstanding advantage, as can carry out many finger touch-controls, resolution is high, light transmission good, so used widely.
Capacitive touch screen is the coordinate that induced current that the capacitance variations of utilizing electrode on the transparency carrier and the electrostatical binding between the human body to produce produces detects its position that is touched.Principle of induction acts on four corners of screen induction zone and forms a stationary electric field with voltage, when finger bumps screen, can make electric field cause electric current, measures by controller, according to the difference of four corner ratios of electric current, can calculate touch location.
In the method for making of existing capacitive touch screen, no matter be single layered transparent electrode touch-screen or Double-layered transparent electrode touch-screen, all need make two-layer organic transparent insulating layer (OC).Like this, two-layer organic transparent insulating layer (OC) all need adopt the gold-tinted processing procedure, and processing procedure is loaded down with trivial details and cost is higher.
Summary of the invention
In view of this, the invention provides a kind of capacitive touch screen and preparation method thereof, to overcome above-mentioned technical matters.
In order to achieve the above object, technical scheme of the present invention is:
A kind of method for making of capacitive touch screen comprises:
Transparency carrier is provided;
On described transparency carrier, make metal routing;
Make organic transparent insulating layer on described metal routing, described organic transparent insulating layer covers the first metal routing section, and wherein, described the first metal routing section is the part of described metal routing;
On described organic transparent insulating layer, make the first transparent electrode layer, described the first transparent electrode layer and the second metal routing section bridge joint, wherein said the second metal routing Duan Wei is covered by described organic transparent insulating layer, and is the part of described metal routing.
More preferably, the described making on described organic transparent insulating layer after the first transparent electrode layer also comprises: make protective clear layer at described the first transparent electrode layer.
More preferably, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
The present invention also provides the method for making of another capacitive touch screen to comprise:
Transparency carrier is provided;
Make the first transparent electrode layer at described transparency carrier, described the first transparent electrode layer covers the described transparency carrier of first;
Make metal routing at the described transparency carrier of second portion that is not covered by described the first transparent electrode layer;
Make organic transparent insulating layer on described the first transparent electrode layer and described metal routing, described organic transparent insulating layer covers whole described metal routings, and described organic transparent insulating layer covers described the first transparent electrode layer of first;
Make the second transparent electrode layer on described organic transparent insulating layer, described the first transparent electrode layer bridge joint of described the second transparent electrode layer and second portion, described the first transparent electrode layer of wherein said second portion are not covered by described organic transparent insulating layer.
More preferably, the described making on described organic transparent insulating layer after the second transparent electrode layer also comprises: make protective clear layer at described the second transparent electrode layer.
More preferably, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
The present invention also provides a kind of capacitive touch screen, comprises transparency carrier, is formed at metal routing on the described transparency carrier, is formed at organic transparent insulating layer on the described metal routing, is formed at the first transparent electrode layer on described organic transparent insulating layer and the described transparency carrier; Wherein, described metal routing is made of the first metal routing section and the second metal routing section, and described the first metal routing section is covered by described organic transparent insulating layer, described the second metal routing Duan Wei is covered described the first transparent electrode layer and described the second metal routing section bridge joint by described organic transparent insulating layer.
More preferably, described capacitive touch screen also comprises the protective clear layer that is formed on described the first transparent electrode layer.
More preferably, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
The present invention also provides another kind of capacitive touch screen, comprises transparency carrier, is formed at the first transparent electrode layer on the described transparency carrier, is formed at not metal routing on the described transparency carrier of second portion that is covered by described the first transparent electrode layer, is formed at the organic transparent insulating layer on described the first transparent electrode layer and the described metal routing and is formed at the second transparent electrode layer on described organic transparent insulating layer; Wherein, described organic transparent insulating layer covers described metal routing fully, described organic transparent insulating layer covers described the first transparent electrode layer of first, described the second transparent electrode layer and described the first transparent electrode layer bridge joint of second portion that is not covered by described organic transparent insulating layer.
More preferably, described capacitive touch screen also comprises the protective clear layer that is formed on described the second transparent electrode layer.
More preferably, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
Compared to prior art, the method for making capacitive touch screen provided by the invention will be made the metal routing processing procedure and be mentioned the front that makes organic transparent insulating layer processing procedure.This method for making saved organic transparent insulating layer together the gold-tinted processing procedure, simplified manufacture craft, saved cost.In addition, this method for making adopts the thicker organic transparent insulating layer of thickness to protect metal routing, has strengthened to a certain extent the protection to metal routing, has promoted the guarantee of touch screen function aspect.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the method for making process flow diagram of the capacitive touch screen of the embodiment of the invention one;
Fig. 2 is the method for making process flow diagram of the capacitive touch screen of the embodiment of the invention two;
Fig. 3 is the method for making process flow diagram of the capacitive touch screen of the embodiment of the invention three;
Fig. 4 is the capacitive touch screen structural representation of the embodiment of the invention four;
Fig. 5 is the structural representation of the capacitive touch screen of the embodiment of the invention five;
Fig. 6 is the structural representation of the capacitive touch screen of the embodiment of the invention six.
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent more, below in conjunction with accompanying drawing the specific embodiment of the present invention is described in detail.
A lot of details have been set forth in the following description so that fully understand the present invention, but the present invention can also adopt other to be different from alternate manner described here and implement, those skilled in the art can be in the situation that do similar popularization without prejudice to intension of the present invention, so the present invention is not subjected to the restriction of following public specific embodiment.
The terms such as the term that uses in the description process " first ", " second " are used for an element and another element region are separated, and described element is not subject to the definition of above-mentioned term.
Embodiment one
See also Fig. 1.Fig. 1 is the method flow diagram of the embodiment one of the capacitive touch screen method for making that contains the layer of transparent electrode layer provided by the invention.
S101, provide transparency carrier:
One transparency carrier is provided.Material to transparency carrier is without restriction, can be polyethylene terephthalate (PET), polycarbonate (PC), polymethylmethacrylate (PMMA), PEN (PEN), polyethersulfone (PES), cyclic olefin polymer (COC), glass or tempered glass etc.
S102, make metal routing at described transparency carrier:
Adopt the gold-tinted processing procedure to make metal routing at described transparency carrier.The step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.The thickness of the metal routing of made is generally
About, the metal that adopts adhesion general and transparency carrier is larger, can be molybdenum (Mo) or aluminium (Al).This metal routing can adopt sandwich construction, for example, and Mo is
Al is
Mo is
S103, make organic transparent insulating layer at described metal routing:
Adopt the gold-tinted processing procedure to make organic transparent insulating layer at the metal routing of above-mentioned formation.This organic transparent insulating layer only covers the first metal routing section, and this first metal routing section is the part of metal routing.The step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.This organic transparent insulating layer covers the first metal routing section, and the first transparent electrode layer insulation of making in the metal routing made among the step S102 and the S104 step is separated.The thickness of this organic transparent insulating layer is generally about 1.3 μ m.And the thickness of the metal routing that step S102 makes is generally
About, so be that organic transparent insulating layer protection thickness about 1.3 μ m is with thickness
About metal routing, can realize well protection to metal routing.Protect metal routing just can reach good effect even only adopt the organic transparent insulating layer of this one deck.
S104, make the first transparent electrode layer at described organic transparent insulating layer and described transparency carrier:
Adopt the gold-tinted processing procedure to make the first transparent electrode layer at described organic transparent insulating layer and described transparency carrier.This first transparent electrode layer is realized bridge joint with the second metal routing section that is not covered by organic transparent insulating layer by the mode of putting up a bridge, and this second metal routing section is the part of metal routing and is not covered by organic transparent insulating layer.This first transparent electrode layer is preferably the ITO electrode layer.Has predetermined electrode pattern on this first transparent electrode layer.This electrode pattern can be del, rhombus or hexagon etc.
When the user utilizes a touch-control object (such as finger or other conductive body) touching, metal routing and the first transparent electrode layer can produce capacitive coupling, with the position of axial X, the Y of the correspondence touching signals by sending a potential change to controller (accompanying drawing is not shown), position of touch detects thus, reaches the effect of touch-control.
The present embodiment will be made the metal routing processing procedure and be placed on before the organic transparent insulating layer of making.So only need the organic transparent insulating layer of one deck just metal routing and transparent electrode layer can be realized that insulation separates, simultaneously, this organic transparent insulating layer plays the protective effect to metal routing, and it is not corroded or oxidation.Compared to existing conventional art, the capacitive touch screen method for making that the embodiment of the invention provides has been saved the organic transparent insulating layer of one deck, and then has reduced the gold-tinted processing procedure one.And then the simplification so that the making flow process of capacitive touch screen becomes, reduced cost.
Embodiment one example goes out provided by the invention method for making that contains the capacitive touch screen of layer of transparent electrode layer.In addition, the present invention also provides the method for making of the capacitive touch screen that contains two-layer transparent electrode layer.See also embodiment two and Fig. 2.
Embodiment two
Embodiment two and Fig. 2 example contain the method for making of the capacitive touch screen of two-layer transparent electrode layer.
S201, provide transparency carrier:
One transparency carrier is provided.Material to transparency carrier is without restriction, can be polyethylene terephthalate (PET), polycarbonate (PC), polymethylmethacrylate (PMMA), PEN (PEN), polyethersulfone (PES), cyclic olefin polymer (COC), glass or tempered glass etc.
S202, make the first transparent electrode layer at described transparency carrier:
Adopt the gold-tinted processing procedure to make the first transparent electrode layer at the transparency carrier that provides.The step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.This second transparent electrode layer is preferably the ITO electrode layer.Has the first predetermined electrode pattern on this first transparent electrode layer.This first electrode pattern can be del, rhombus or hexagon etc.
S203, make metal routing at described transparency carrier:
Adopt the gold-tinted processing procedure to make metal routing at the partially transparent substrate that is not covered by the first transparent electrode layer that provides.The thickness of the metal routing of made is generally
The metal that adopts adhesion general and transparency carrier is larger, can be molybdenum (Mo) or aluminium (Al).This metal routing can adopt sandwich construction, for example, and Mo is
Al is
Mo is
S204, make organic transparent insulating layer at described metal routing:
Adopt the gold-tinted processing procedure to make organic transparent insulating layer at described metal routing.The step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.The thickness of this organic transparent insulating layer is generally 1.3 μ m.This organic transparent insulating layer covers described metal routing fully, and only covers first's the first transparent electrode layer.
S205, make the second transparent electrode layer at described organic transparent insulating layer and described transparency carrier:
Adopt the gold-tinted processing procedure to make the second transparent electrode layer at described organic transparent insulating layer and described transparency carrier.This second transparent electrode layer and second portion the first transparency electrode layer segment bridge joint that is not partly covered by described organic transparent insulating layer.
When the user utilizes a touch-control object (such as finger or other conductive body) touching, the first transparent electrode layer and the second transparent electrode layer can produce capacitive coupling, with the position of axial X, the Y of the correspondence touching signals by sending a potential change to controller (accompanying drawing is not shown), position of touch detects thus, reaches the effect of touch-control.
The present embodiment will be made the metal routing processing procedure and be placed on before the organic transparent insulating layer of making.So only need the organic transparent insulating layer of one deck just metal routing and the second transparency electrode can be realized that insulation separates, simultaneously, this organic transparent insulating layer plays the protective effect to metal routing, and it is not corroded or oxidation.Compared to existing conventional art, the capacitive touch screen method for making that the embodiment of the invention provides has been saved the organic transparent insulating layer of one deck, and then has reduced the gold-tinted processing procedure one.And then the simplification so that the making flow process of capacitive touch screen becomes, reduced cost.
All only adopt the organic transparent insulating layer of one deck to protect metal routing not to be corroded or oxygenated in the method for making that contains two-layer transparent electrode layer of the method for making that contains the layer of transparent electrode layer of embodiment one example and embodiment two examples.For greater safety; embodiment one after making the first transparent electrode layer or embodiment two after making the second transparent electrode layer; can also adopt on first transparent electrode layer of method in embodiment one of magnetron sputtering or on the second transparent electrode layer of embodiment two, make protective clear layer; metal routing is adopted double shielding, strengthen the guarantee of capacitive touch screen function aspects.In detail referring to embodiment three and accompanying drawing 3.
Embodiment three
Embodiment three improves on the basis of embodiment two, has made again protective clear layer after having made the second transparent electrode layer.Can certainly improve on the basis of embodiment one, after having made the first transparent electrode layer, make protective clear layer equally.
In step S301～step S305 and above-described embodiment two step S201～step S205 is identical, for simplicity, do not repeat them here, corresponding steps sees also step S201 in above-described embodiment two～step S205.
S306, make protective seam at described the second transparent electrode layer:
Adopt magnetically controlled sputter method to make protective clear layer at described the second transparent electrode layer.The thickness of this protective clear layer is generally
The purpose of this protective clear layer be further prevent metal routing oxidized and the corrosion.Under the preferable case, this protective clear layer is made by the material with hypoergia.This protective clear layer can adopt the material with high-k, the sensing sensitivity when this can improve touch-screen and is subject to touching.Protective clear layer can be made by silicon dioxide, titania or zinc oxide.
Embodiment four
Based on the embodiment one of above-mentioned capacitive touch screen method for making, the present invention also provides a kind of capacitive touch screen.In detail referring to Fig. 4.A kind of structural representation that contains the capacitive touch screen of layer of transparent electrode layer that provides in the embodiment of the invention four is provided Fig. 4 example.。
This capacitive touch screen comprises a transparency carrier 401, be formed at metal routing 402 on this transparency carrier, be formed at organic transparent insulating layer 403 on this metal routing 402, be formed at the first transparent electrode layer 404 on this organic transparent insulating layer 403 and this transparency carrier 401.Wherein, this organic transparent insulating layer 403 covers the first metal routing section 402, and this first metal routing section 402 is parts of metal routing.
The present embodiment is without restriction to the material of transparency carrier 401, can be polyethylene terephthalate (PET), polycarbonate (PC), polymethylmethacrylate (PMMA), PEN (PEN), polyethersulfone (PES), cyclic olefin polymer (COC), glass or tempered glass etc.
The present embodiment adopts the gold-tinted manufacturing method thereof to make metal routing 402, and the step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.The thickness of the metal routing 402 of made is generally
The metal that adopts adhesion general and transparency carrier 401 is larger, can be molybdenum (Mo) or aluminium (Al).This metal routing 402 can adopt sandwich construction, for example, and Mo is
Al is
Mo is
Organic transparent insulating layer 403 in the present embodiment adopts the gold-tinted processing procedure to be produced on the established metal routing 402.The step of this gold-tinted processing procedure specifically comprises: gluing, preliminary drying, exposure, development, post bake, acid etch, the demoulding.This organic transparent insulating layer 403 covers first metal routing section 402, and the first transparent electrode layer 404 insulation of making in the metal routing 402 made and the subsequent step are separated.The thickness of this organic transparent insulating layer 403 is generally about 1.3 μ m.And the thickness of the metal routing 402 of making is generally
About, so be that organic transparent insulating layer 403 protection thickness about 1.3 μ m are with thickness
About metal routing 402, can realize well protection to metal routing 402.Protect metal routing 402 just can reach good effect even only adopt the organic transparent insulating layer 403 of this one deck.
Adopt the gold-tinted processing procedure on described organic transparent insulating layer 403 and described transparency carrier 401, to make the first transparent electrode layer 404 in the present embodiment.This first transparent electrode layer is preferably the ITO electrode layer.Has the first predetermined electrode pattern on this first transparent electrode layer 404.This electrode pattern can be del, rhombus or hexagon etc.This first transparent electrode layer and the second metal routing section bridge joint, wherein, this second metal routing section is the metal routing part that is not covered by described organic transparent insulating layer.
When the user utilizes a touch-control object (such as finger or other conductive body) touching, metal routing 402 and the first transparent electrode layer 404 can produce capacitive coupling, with the position of axial X, the Y of the correspondence touching signals by sending a potential change to controller (accompanying drawing is not shown), position of touch detects thus, reaches the effect of touch-control.
The structure of the capacitive touch screen of example by the metal routing processing procedure being placed on the front of organic transparent insulating layer processing procedure, has only adopted the organic transparent insulating layer of one deck in existing conventional art in the present embodiment.Adopt two-layer organic transparent insulating layer compared to existing conventional art, reduced the gold-tinted processing procedure one, simplified and made the technique of capacitive touch screen, and then reduced production cost.
Embodiment five
Based on the above-mentioned embodiment two that contains the capacitive touch screen method for making of two-layer transparent electrode layer, the present invention also provides a kind of capacitive touch screen, in detail referring to Fig. 5.Fig. 5 example goes out a kind of structural representation that contains the capacitive touch screen of two-layer transparent electrode layer provided by the invention.
This capacitive touch screen comprises a transparency carrier 501, be formed at the first transparent electrode layer 502 on this transparency carrier, be formed at not metal routing 503 on the transparency carrier that is covered by this first transparent electrode layer, be formed at the organic transparent insulating layer 504 on this first transparent electrode layer and this metal routing and be formed at the second transparent electrode layer 505 on this organic transparent insulating layer and this transparency carrier.Wherein, this organic transparent insulating layer 504 covers this metal routing fully, and covers the part of the first transparent electrode layer 502.The second transparent electrode layer 505 and the first transparency electrode layer segment that is not covered by organic transparent insulating layer 504 are by the mode bridge joint of putting up a bridge together.
Contain material and process for making that the capacitive touch screen of layer of transparent electrode layer adopts in the material that capacitive touch screen in the present embodiment adopts and process for making and above-described embodiment four identical.For the purpose of concise and to the point, no longer describe, describe in detail and see also above-described embodiment four.
Capacitive touch screen in the present embodiment, when the user utilizes a touch-control object (such as finger or other conductive body) touching, the first transparent electrode layer 502 and the second transparent electrode layer 505 can produce capacitive coupling, with the position of axial X, the Y of the correspondence touching signals by sending a potential change to controller (accompanying drawing is not shown), position of touch detects thus, reaches the effect of touch-control.
The structure of the capacitive touch screen of example by the metal routing processing procedure being placed on the front of organic transparent insulating layer processing procedure, has only adopted the organic transparent insulating layer of one deck in existing conventional art in the present embodiment.Adopt two-layer organic transparent insulating layer compared to existing conventional art, reduced the gold-tinted processing procedure one, simplified and made the technique of capacitive touch screen, and then reduced production cost.
In the capacitive touch screen that contains two-layer transparent electrode layer of the capacitive touch screen that contains the layer of transparent electrode layer of embodiment four examples and embodiment five examples, all only adopt the organic transparent insulating layer of one deck to protect metal routing in case be corroded and oxidation.For greater safety; the capacitive touch screen of embodiment four examples can also comprise the protective clear layer that is formed on the first transparent electrode layer, and the capacitive touch screen of embodiment five examples can also comprise the protective clear layer that is formed on the second transparent electrode layer.Like this, realize double shielding to metal routing by the organic transparent insulating layer of one deck and layer of transparent protective seam, thereby strengthened the guarantee of capacitive touch screen function aspects.
Embodiment six
See also Fig. 6.The capacitive touch screen that Fig. 6 example goes out to contain two-layer transparent electrode layer also comprises the protective clear layer that is formed on the second transparent electrode layer.Certainly, the capacitive touch screen that contains the layer of transparent electrode layer also can also comprise the protective clear layer that is formed on the first transparent electrode layer.
The capacitive touch screen of Fig. 6 example comprises a transparency carrier 601; be formed at the first transparent electrode layer 602 on this transparency carrier; be formed at this not by the metal routing 603 on transparency carrier 601 parts of the first transparent electrode layer 602 coverings; be formed at the organic transparent insulating layer 604 on this first transparent electrode layer 602 and this metal routing 603; be formed at the second transparent electrode layer 605 on this organic transparent insulating layer 604 and this transparency carrier 601 and be formed at protective clear layer 606 on the second transparent electrode layer 605.Wherein, this organic transparent insulating layer 604 covers this metal routing 603 fully, and cover part the first transparent electrode layer 602.The second transparent electrode layer 605 and the first transparent electrode layer 602 that is not covered by organic transparent insulating layer 604 are by the mode bridge joint of putting up a bridge together.
Identical among structure of transparency carrier 601 in this touch-screen, the first transparent electrode layer 602, metal routing 603, organic transparent insulating layer 604 and the second transparent electrode layer 605 and preparation method thereof and the embodiment five, for the purpose of concise and to the point, be not described in detail, detailed description can be referring to embodiment five.
This protective clear layer 606 adopts magnetically controlled sputter method to be produced on the second transparent electrode layer 605.The thickness of this protective clear layer is generally
The purpose of this protective clear layer 606 be further prevent metal routing oxidized and the corrosion.Under the preferable case, this protective clear layer 606 is by the material processing procedure with hypoergia.This protective clear layer can adopt the material with high-k, the sensing sensitivity when this can improve touch-screen and is subject to touching.
Organic transparent insulating layer and a layer thickness of adopting a layer thickness to be approximately 1.3 μ m in the present embodiment are approximately
Protective clear layer protect thickness to be
Metal routing.Strengthen to a great extent the protection to metal routing, further promoted the guarantee of capacitive touch screen function aspects.
The above only is preferred embodiment of the present invention, is not the present invention is done any pro forma restriction.Although the present invention discloses as above with preferred embodiment, yet is not to limit the present invention.Any those of ordinary skill in the art, do not breaking away from the technical solution of the present invention scope situation, all can utilize method and the technology contents of above-mentioned announcement that technical solution of the present invention is made many possible changes and modification, or be revised as the equivalent embodiment of equivalent variations.Therefore, every content that does not break away from technical solution of the present invention, according to any simple modification of on the technical spirit of the present invention above embodiment being done, equivalent variations and modification all still belong in the scope of technical solution of the present invention.
Claims (12)
1. the method for making of a capacitive touch screen is characterized in that, comprising:
Transparency carrier is provided;
On described transparency carrier, make metal routing;
Make organic transparent insulating layer on described metal routing, described organic transparent insulating layer covers the first metal routing section, and wherein, described the first metal routing section is the part of described metal routing;
On described organic transparent insulating layer, make the first transparent electrode layer, described the first transparent electrode layer and the second metal routing section bridge joint, wherein said the second metal routing section is the part of described metal routing and is not covered by described organic transparent insulating layer.
2. method for making according to claim 1 is characterized in that, the described making on described organic transparent insulating layer after the first transparent electrode layer also comprises: make protective clear layer at described the first transparent electrode layer.
3. method for making according to claim 2 is characterized in that, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
4. the method for making of a capacitive touch screen is characterized in that, comprising:
Transparency carrier is provided;
Make the first transparent electrode layer at described transparency carrier, described the first transparent electrode layer covers the described transparency carrier of first;
Make metal routing at the described transparency carrier of second portion that is not covered by described the first transparent electrode layer;
Make organic transparent insulating layer on described the first transparent electrode layer and described metal routing, described organic transparent insulating layer covers whole described metal routings, and described organic transparent insulating layer covers described the first transparent electrode layer of first;
On described organic transparent insulating layer, make the second transparent electrode layer, described the first transparent electrode layer bridge joint of described the second transparent electrode layer and second portion, wherein, described the first transparent electrode layer of described second portion is not covered by described organic transparent insulating layer.
5. method for making according to claim 4 is characterized in that, the described making on described organic transparent insulating layer after the second transparent electrode layer also comprises: make protective clear layer at described the second transparent electrode layer.
6. method for making according to claim 5 is characterized in that, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
7. capacitive touch screen, it is characterized in that, comprise transparency carrier, be formed at metal routing on the described transparency carrier, be formed at organic transparent insulating layer on the described metal routing, be formed at the first transparent electrode layer on described organic transparent insulating layer and the described transparency carrier; Wherein, described metal routing is made of the first metal routing section and the second metal routing section, and described the first metal routing section is covered by described organic transparent insulating layer, described the second metal routing Duan Wei is covered described the first transparent electrode layer and described the second metal routing section bridge joint by described organic transparent insulating layer.
8. touch-screen according to claim 7 is characterized in that, also comprises the protective clear layer that is formed on described the first transparent electrode layer.
9. touch-screen according to claim 8 is characterized in that, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
10. capacitive touch screen, it is characterized in that, comprise transparency carrier, be formed at the first transparent electrode layer on the described transparency carrier, be formed at not metal routing on the described transparency carrier of second portion that is covered by described the first transparent electrode layer, be formed at the organic transparent insulating layer on described the first transparent electrode layer and the described metal routing and be formed at the second transparent electrode layer on described organic transparent insulating layer; Wherein, described organic transparent insulating layer covers described metal routing fully, described organic transparent insulating layer covers described the first transparent electrode layer of first, described the second transparent electrode layer and described the first transparent electrode layer bridge joint of second portion that is not covered by described organic transparent insulating layer.
11. touch-screen according to claim 10 is characterized in that, also comprises the protective clear layer that is formed on described the second transparent electrode layer.
12. touch-screen according to claim 11 is characterized in that, described protective clear layer is made by silicon dioxide, titania or zinc oxide.
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| CN103970390A (en) * | 2014-04-10 | 2014-08-06 | 湖北仁齐科技有限公司 | OGS capacitive touch screen of metal frame bridge, and machining technology of OGS capacitive touch screen |
| CN104978094A (en) * | 2015-07-03 | 2015-10-14 | 惠州Tcl移动通信有限公司 | Capacitive touch screen |
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| CN101751181A (en) * | 2009-12-28 | 2010-06-23 | 友达光电股份有限公司 | Touch control panel manufacturing method |
| CN102375578A (en) * | 2010-08-04 | 2012-03-14 | 东莞万士达液晶显示器有限公司 | Touch control panel structure and touch control display device with same |
| CN102116954A (en) * | 2011-03-17 | 2011-07-06 | 信利半导体有限公司 | Capacitance-type touch screen displayer |
| CN102243556A (en) * | 2011-06-14 | 2011-11-16 | 华映视讯（吴江）有限公司 | Capacitive touch panel |
| CN102707834A (en) * | 2012-04-12 | 2012-10-03 | 华映视讯（吴江）有限公司 | Touch panel and manufacture method of touch sensing layer of panel |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103970390A (en) * | 2014-04-10 | 2014-08-06 | 湖北仁齐科技有限公司 | OGS capacitive touch screen of metal frame bridge, and machining technology of OGS capacitive touch screen |
| CN104978094A (en) * | 2015-07-03 | 2015-10-14 | 惠州Tcl移动通信有限公司 | Capacitive touch screen |
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Address after: 516600 Guangdong Industrial Zone, Shanwei City Road, Lee Lee Industrial City, a district of the building fifteenth Applicant after: Truly Opto-Electronics Ltd. Address before: 516600, Fifteenth Industrial Zone, Xinli Industrial Road, downtown industrial district, Guangdong, Shanwei Applicant before: Truly Semiconductors (Shanwei) Co., Ltd. |
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Application publication date: 20130130 |