CN203720818U - Monolithic capacitor touch screen - Google Patents

Monolithic capacitor touch screen Download PDF

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Publication number
CN203720818U
CN203720818U CN201420013257.6U CN201420013257U CN203720818U CN 203720818 U CN203720818 U CN 203720818U CN 201420013257 U CN201420013257 U CN 201420013257U CN 203720818 U CN203720818 U CN 203720818U
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China
Prior art keywords
layer
transparent base
touch screen
shielding layer
connecting portion
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CN201420013257.6U
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Chinese (zh)
Inventor
杨建文
黄家豪
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Biel Crystal Manufactory Huizhou Ltd
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Biel Crystal Manufactory Huizhou Ltd
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Priority to CN201420013257.6U priority Critical patent/CN203720818U/en
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Publication of CN203720818U publication Critical patent/CN203720818U/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

A monolithic capacitor touch screen comprises a transparent base material and a sensing electrode region located on the inner side of the transparent base material, wherein a metal line layer electrically connected with the sensing electrode region is arranged on the periphery of the sensing electrode region, a shielding layer for shielding the metal line layer to prevent the metal line layer from being exposed is arranged between the metal line layer and the transparent base material, a slope-shaped connecting portion exists at the connecting position of the inner side edge of the shielding layer and the transparent base material, a base angle of the inner side of the slope-shaped connecting portion is larger than or equal to 0 degree or smaller than or equal to 80 degrees, and the thickens of the shielding layer is smaller than or equal to 80mum. The monolithic capacitor touch screen can prevent collapse occurred at the slope-shaped connecting portion of the transparent base material due to the thickness of the shielding layer.

Description

Monolithic capacitive touch screen
Technical field
The utility model relates to a kind of touch technology, especially a kind of monolithic capacitive touch screen.
Background technology
Along with the fast development of the information industry such as infotech, wireless communication technique, people grow with each passing day to the demand of electronic product, in order to make more aspect people operation and use of product, many electronic products have started to adopt touch-screen as input media, touch-screen is as a kind of brand-new man-machine communication's mode, because of its use habit that there is lively operation-interface intuitively and meet human body, in people's live and work, apply more and more extensive.
Traditional touch-screen generally includes cover sheet and in order to play the contact panel of touch inductor effect, cover sheet is for the protection of contact panel, and contact panel normally causes owing to having added cover sheet in contact panel outside according to the touch of human body, therefore the integral thickness of touch-screen is increased, have a strong impact on the transmittance of touch-screen, and do not met the trend of touch-screen to ultra-thin future development; In order to improve the transmittance of touch-screen and to make more ultra-thin touch-screen, people have developed one chip touch-screen (OGS), one chip touch-screen, because it has the advantage such as thin thickness, transmittance height, progressively becomes one of main flow direction of capacitive touch screen development.
Referring to Fig. 1, traditional one chip touch-screen (OGS), its structure generally include transparent base 10 ', this transparent base 10 ' medial surface arrange induced electricity polar region 30 ', transparent base 10 ' lateral surface as use operating surface, to being positioned at the induced electricity polar region 30 of transparent base 10 ' medial surface ' protect, for to electrode induction zone 30 ' lateral surface protect, part one chip touch-screen (OGS) structure also induced electricity polar region 30 ' lateral surface arrange protective clear layer 50 ', for make induced electricity polar region 30 ' institute's sensing signal can conduct, in induced electricity polar region 30 ' periphery be also provided with metallic circuit layer 40 ', for avoiding metallic circuit layer 40 ' the see through outer screen outward appearance that affects of transparent base 10 ' be shown in, metallic circuit layer 40 ' on be also provided with shielding layer 20 ', this shielding layer 20 ' conventionally adopt opaque ink and form, its can effectively hide metallic circuit layer 40 ', outer and affect screen outward appearance to avoid it to see through transparent base 10 ' be shown in, but, in 20 ' time of processing and manufacturing shielding layer, due to impacts such as shielding layer 20 ' self thickness and processing technologys, after shielding layer 20 ' formation, conventionally can form a slope that is greater than 90 ° at shielding layer 20 ' edge and transparent base 10 ' junction, because induced electricity polar region 30 ' with metallic circuit layer 40 ' connecting portion is on this slope, this induced electricity polar region 30 ' this slope is applied to certain pressure with metallic circuit layer 40 ' meeting, because of this contact angle excessive, be easy under external force subside, and then induced electricity polar region 30' is separated with metallic circuit layer 40', and cause broken string phenomenon, cause screen to occur the bad quality phenomenons such as rainbow line, therefore,, in conjunction with existing problem in above one chip touch screen structure, be necessary the one chip touch-screen of this kind of structure further to make improvement.
Summary of the invention
The technical problems to be solved in the utility model is to provide a kind of monolithic capacitive touch screen, this monolithic capacitive touch screen can be because shielding layer self thickness is former thereby subsiding with transparent base connecting portion place, and then avoid therefore occurring between induced electricity polar region and metallic circuit broken string phenomenon.
For solving the problems of the technologies described above, the utility model adopts following technical proposals: this monolithic capacitive touch screen comprises transparent base and is positioned at the induced electricity polar region of transparent base medial surface, be provided with the metallic circuit layer being electrically connected with described induced electricity polar region at the periphery of induced electricity polar region, between described metallic circuit layer and described transparent base, be provided with to cover metallic circuit layer and prevent that metallic circuit layer is shown in outer shielding layer, there is the connecting portion that is ramped shaped in the junction of described shielding layer inside edge and described transparent base, inside the connecting portion of described ramped shaped, base angle is to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree, described shielding layer thickness is less than or equal to 80 μ m.
According to design concept of the present utility model, base angle is to be more than or equal to the random angle that 0 degree is less than or equal to 45 degree inside the connecting portion of described ramped shaped.
According to design concept of the present utility model, described shielding layer comprises ink layer, and the thickness of described ink layer is between 2~40 μ m scopes.
According to design concept of the present utility model, described shielding layer also comprises photoresist layer, and described photoresist layer is between described ink layer and described transparent base, and the thickness of described photoresist layer is between 1~30 μ m scope.
According to design concept of the present utility model, described shielding layer also comprises film plating layer, and described film plating layer is between described ink layer and described photoresist layer, and the thickness of described film plating layer is between 0.05~4 μ m scope.
According to design concept of the present utility model, described shielding layer also comprises film plating layer, and described film plating layer is between described ink layer and described transparent base, and the thickness of described film plating layer is between 0.05~4 μ m scope.
According to design concept of the present utility model, described induced electricity polar region also comprises two-layer conductive layer insulated from each other.
According to design concept of the present utility model, described transparent base is alkali-free glass or transparent flexible resin plate.
Compared with prior art, the utlity model has following beneficial effect: inside the connecting portion of (1) shielding layer of the present utility model inside edge and described transparent base ramped shaped, base angle is acute angle, and the THICKNESS CONTROL of shielding layer is being less than or equal between 80 μ m scopes, the utility model is by the size at base angle and the improvement of shielding layer thickness inside the connecting portion of this ramped shaped, reduced because of shielding layer thickness is excessive or the connecting portion of ramped shaped inside the excessive connecting portion that causes ramped shaped in base angle subside, cause the phenomenon of broken string, and then avoid screen to occur the bad quality phenomenons such as rainbow line, (2) because shielding layer of the present utility model is single or multiple lift structure, its single layer structure can effectively hide metallic circuit layer, avoid outside metallic circuit layer is shown in, its sandwich construction is except hiding metallic circuit, such as the film plating layer of covering layer can effectively shield extraneous signal, the signal of metallic circuit layer is disturbed, and then improved product quality, (3) because covering layer of the present utility model also comprises photoresist layer, this photoresist layer can be etched into different pattern, and then makes screen outward appearance present better effects if.
brief description of the drawings
Fig. 1 is the sectional structure schematic diagram of conventional one-piece formula capacitance touch screen;
Fig. 2 is the sectional structure schematic diagram of the first embodiment of the present utility model, and the covering layer in figure is single layer structure;
Fig. 3 is the sectional structure schematic diagram of the second embodiment of the present utility model, and the covering layer in figure is double-decker;
Fig. 4 is the sectional structure schematic diagram of the 3rd embodiment of the present utility model, and the covering layer in figure is three-decker.
embodiment
As shown in Figure 2, Figure 3 and Figure 4, monolithic capacitive touch screen of the present utility model, comprise transparent base 10, be provided with induced electricity polar region 30 at described transparent base 10 medial surfaces, be provided with metallic circuit layer 40 at the periphery of induced electricity polar region 30, described metallic circuit layer 40 is electrically connected with described induced electricity polar region 30; When work, induced electricity polar region 30 obtains that human finger touches and the information that causes signal intensity transfers to the exterior I C circuit being connected with metallic circuit layer 40 through described metallic circuit layer 40, and IC circuit is judged human finger institute touch location through calculating.
Because described transparent base 10 is transparent material, this transparent material can be alkali-free glass or transparent flexible resin plate, can certainly be to have alkali glass; Transparent flexible resin plate can be poly terephthalic acid second two fat (PET), polymethylmethacrylate (PMMA) or polycarbonate.
For the metallic circuit layer 40 of avoiding being positioned on transparent base 10 is shown in the outer product appearance that affects by it, the utility model is provided with shielding layer 20 between described transparent base 10 and described metallic circuit layer 40, this shielding layer 20 is made up of opaque material, and it can cover metallic circuit layer 40 and outside preventing that metallic circuit layer 40 is shown in.
Shielding layer of the present utility model 20 inside edges and transparent base 10 junctions are also formed with the connecting portion that is ramped shaped, for preventing that this connecting portion that is ramped shaped from subsiding, shielding layer 20 thickness of the present utility model are set to be less than or equal to 80 μ m, and ensure inside the connecting portion of described ramped shaped that base angle is to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree, described shielding layer thickness is less than or equal to 80 μ m; Wherein, inside the connecting portion of described ramped shaped, base angle is preferably more than the random angle that equals 0 degree and be less than or equal to 45 degree.Due to shielding layer thinner thickness of the present utility model, and the angle at base angle is also controlled as acute angle inside the connecting portion of ramped shaped, therefore, it can effectively avoid subsiding because of the excessive connecting portion that causes ramped shaped in base angle inside connecting portion, cause the phenomenon of broken string, and then promoted product quality.
Induced electricity of the present utility model polar region 30 also comprises two-layer conductive layer insulated from each other, and the material of this two conductive layers is at least one material in Nano Silver, carbon nano-tube, Graphene, ITO, IZO, AZO, ZnO or SnO; Protected by the lateral surface of this transparent base 10 because of a side of this induced electricity polar region 30, for the another side of this induced electricity polar region 30 is protected, the utility model is provided with protective clear layer 50 in the another side of this induced electricity polar region.
Referring to Fig. 2, as an embodiment of the present utility model, in this embodiment, shielding layer 20 is single layer structure, in order to play good bridging effect to described metallic circuit layer 40, this shielding layer 20 is preferably the ink layer being formed by ink material splash, and its thickness is preferably placed between 2~40 μ m scopes.Be to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree and shielding layer 20 inside edges and transparent base 10 junctions are base angle inside the connecting portion of ramped shaped, certainly, as preferred version, base angle is preferably more than the random angle that equals 0 degree and be less than or equal to 45 degree inside the connecting portion of the ramped shaped in the present embodiment.
In this embodiment, thickness and angle to shielding layer 20 are all controlled, make the reduced thickness of shielding layer 20, and inside the connecting portion of ramped shaped, the angle at base angle is also controlled as acute angle, therefore, it can effectively avoid, because the excessive connecting portion that causes ramped shaped in base angle inside connecting portion subsides, causing the phenomenon of broken string, and then having avoided the mass defect of the rainbow line causing because of broken string.
Referring to Fig. 3, as the second embodiment of the present utility model, in this embodiment, described shielding layer 20 is double-decker, as a technical scheme of the shielding layer 20 in this embodiment, this shielding layer 20 comprises ink layer 22 and photoresist layer 21, and described photoresist layer 21 is between described ink layer 22 and described transparent base 10.In order to prevent that subsiding from appearring in the connecting portion that is ramped shaped that described shielding layer 20 inside edges and transparent base 10 junctions also form, in this technical scheme, the THICKNESS CONTROL of described photoresist layer 21 is between 1~30 μ m scope, the THICKNESS CONTROL of ink layer 22 is between 2~40 μ m scopes, and it is to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree that shielding layer 20 inside edges and transparent base 10 junctions are base angle inside the connecting portion of ramped shaped, certainly, as preferred version, inside the connecting portion of the ramped shaped in the present embodiment, base angle is preferably more than the random angle that equals 0 degree and be less than or equal to 45 degree, because covering layer 20 in this technical scheme comprises photoresist layer 21 and ink layer 22, wherein, ink layer 22 can play good bridging effect to described metallic circuit layer 40, and photoresist layer 21 can be etched into different pattern, and then makes screen outward appearance present better effects if.
As another technical scheme of the present embodiment, the shielding layer 20 of the present embodiment comprises ink layer 22 and film plating layer 21, and described film plating layer 21 is between described ink layer 22 and described transparent base 10.In order to prevent that subsiding from appearring in the connecting portion that is ramped shaped that described shielding layer 20 inside edges and transparent base 10 junctions also form, in this technical scheme, the THICKNESS CONTROL of described film plating layer 21 is between 0.05~4 μ m scope, the THICKNESS CONTROL of ink layer 22 is between 2~40 μ m scopes, and it is to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree that shielding layer 20 inside edges and transparent base 10 junctions are base angle inside the connecting portion of ramped shaped, certainly, as preferred version, inside the connecting portion of the ramped shaped in the present embodiment, base angle is preferably more than the random angle that equals 0 degree and be less than or equal to 45 degree.Because covering layer 20 in this technical scheme comprises film plating layer 21 and ink layer 22, wherein, ink layer 22 can play good bridging effect to described metallic circuit layer 40, and film plating layer 21 can effectively shield the signal interference of extraneous signal to metallic circuit layer 40, and then has improved product quality.
It should be noted that, in Fig. 2, be that symbolistic to show base angle inside the connecting portion that is ramped shaped be the structural representation situation of 45 degree, it is evident that, when inside this connecting portion, base angle is other acute angle, its structure situation is similar with it, this base angle, inner side is the miter angle degree indicating, and does not form the restriction to structure of the present utility model.
Referring to Fig. 4, as the 3rd embodiment of the present utility model, in this embodiment, described shielding layer 20 is three-decker, it comprises ink layer 22, film plating layer 23 and photoresist layer 21, wherein, described photoresist layer 21 is formed at the inner surface of described transparency carrier 10, described film plating layer 23 between described ink layer 22 and described photoresist layer 21 and film plating layer 23 two sides be connected with described photoresist layer 21 with described ink layer 22 respectively; Same, in the present embodiment, described ink layer 22 can play good bridging effect to described metallic circuit layer 40, and film plating layer 23 can effectively shield the signal interference of extraneous signal to metallic circuit layer 40, improve product quality, and photoresist layer 21 can be etched into different pattern, can make screen outward appearance present better effects if.
In order to prevent that subsiding from appearring in the connecting portion that is ramped shaped that described shielding layer 20 inside edges and transparent base 10 junctions also form, in this technical scheme, the THICKNESS CONTROL of described photoresist layer 21 is between 1~30 μ m scope, the THICKNESS CONTROL of ink layer 22 is between 2~40 μ m scopes, the thickness of described film plating layer 23 is between 0.05~4 μ m scope, and the gross thickness of photoresist layer 21, ink layer 22 and film plating layer 23 is controlled at and is less than or equal to 40 μ m; Simultaneously, shielding layer 20 inside edges and transparent base 10 junctions are base angle inside the connecting portion of ramped shaped and are controlled at the random angle that is more than or equal to 0 degree and be less than or equal to 80 degree, certainly, as preferred version, base angle is preferably selected arbitrarily in being less than or equal to miter angle degree being more than or equal to 0 degree inside the connecting portion of the ramped shaped in the present embodiment.
In this embodiment, gross thickness to photoresist layer 21, ink layer 22 and film plating layer 23 and connecting portion bottom angle are all controlled, it can effectively avoid subsiding because of the excessive connecting portion that causes ramped shaped in base angle inside connecting portion, cause the phenomenon of broken string, and then avoided the mass defect of the rainbow line causing because of broken string.
It is evident that, in order to increase other function that should have of shielding layer, also can, according to properties of materials, this shielding layer be increased to the plural layer structure that other is greater than 3.
In sum, all carry out effective improvement due to the size of the utility model by base angle inside the connecting portion of ramped shaped and shielding layer thickness, reduced because of shielding layer thickness is excessive or the connecting portion of ramped shaped inside the excessive connecting portion that causes ramped shaped in base angle subside, and then avoided screen to occur the bad quality phenomenons such as rainbow line.

Claims (8)

1. a monolithic capacitive touch screen, comprise transparent base and be positioned at the induced electricity polar region of transparent base medial surface, be provided with the metallic circuit layer being electrically connected with described induced electricity polar region at the periphery of induced electricity polar region, between described metallic circuit layer and described transparent base, be provided with to cover metallic circuit layer and prevent that metallic circuit layer is shown in outer shielding layer, there is the connecting portion that is ramped shaped in the junction of described shielding layer inside edge and described transparent base, it is characterized in that, inside the connecting portion of described ramped shaped, base angle is to be more than or equal to the random angle that 0 degree is less than or equal to 80 degree, described shielding layer thickness is less than or equal to 80 μ m.
2. monolithic capacitive touch screen as claimed in claim 1, is characterized in that, base angle is to be more than or equal to the random angle that 0 degree is less than or equal to 45 degree inside the connecting portion of described ramped shaped.
3. monolithic capacitive touch screen as claimed in claim 1 or 2, is characterized in that, described shielding layer comprises ink layer, and the thickness of described ink layer is between 2~40 μ m scopes.
4. monolithic capacitive touch screen as claimed in claim 3, is characterized in that, described shielding layer also comprises photoresist layer, and described photoresist layer is between described ink layer and described transparent base, and the thickness of described photoresist layer is between 1~30 μ m scope.
5. monolithic capacitive touch screen as claimed in claim 4, is characterized in that, described shielding layer also comprises film plating layer, and described film plating layer is between described ink layer and described photoresist layer, and the thickness of described film plating layer is between 0.05~4 μ m scope.
6. monolithic capacitive touch screen as claimed in claim 3, is characterized in that, described shielding layer also comprises film plating layer, and described film plating layer is between described ink layer and described transparent base, and the thickness of described film plating layer is between 0.05~4 μ m scope.
7. monolithic capacitive touch screen as claimed in claim 3, is characterized in that, described induced electricity polar region also comprises two-layer conductive layer insulated from each other.
8. monolithic capacitive touch screen as claimed in claim 3, is characterized in that, described transparent base is alkali-free glass or transparent flexible resin plate.
CN201420013257.6U 2014-01-09 2014-01-09 Monolithic capacitor touch screen Expired - Lifetime CN203720818U (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI579747B (en) * 2015-11-26 2017-04-21 祥達光學(廈門)有限公司 Touch panel and method for manufacturing the same
CN107153479A (en) * 2017-02-22 2017-09-12 合肥鑫晟光电科技有限公司 A kind of OGS touches substrate and preparation method thereof
CN108008862A (en) * 2017-12-19 2018-05-08 上海天马微电子有限公司 Touch-control film layer, contact panel and its touch control display apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI579747B (en) * 2015-11-26 2017-04-21 祥達光學(廈門)有限公司 Touch panel and method for manufacturing the same
CN107153479A (en) * 2017-02-22 2017-09-12 合肥鑫晟光电科技有限公司 A kind of OGS touches substrate and preparation method thereof
CN108008862A (en) * 2017-12-19 2018-05-08 上海天马微电子有限公司 Touch-control film layer, contact panel and its touch control display apparatus

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Granted publication date: 20140716