CN102902166A - Rotary roller sealing device for immersion lithography machine - Google Patents
Rotary roller sealing device for immersion lithography machine Download PDFInfo
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- CN102902166A CN102902166A CN2012104035903A CN201210403590A CN102902166A CN 102902166 A CN102902166 A CN 102902166A CN 2012104035903 A CN2012104035903 A CN 2012104035903A CN 201210403590 A CN201210403590 A CN 201210403590A CN 102902166 A CN102902166 A CN 102902166A
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Abstract
The invention discloses a rotary roller sealing device for an immersion lithography machine. The rotary roller sealing device is arranged between a projection lens group and a substrate and comprises an inner member, an outer member, end covers and a roller. During the lithography scanning process, immersion liquid can produce liquid flow which is consistent with the motion direction of the substrate along with the traction action of high-speed motion of the substrate. The device adopts a rotary roller sealing structure, and by dynamically regulating the rotational speed and the direction of the roller, the peripheral immersion liquid can get the flow caused by resistance to motion of the substrate. The rotary roller sealing device disclosed by the invention can effectively resist outward leakage kinetic energy produced by traction motion of the substrate and further enhance the capability of inhibiting the leakage of the liquid by combining with peripheral gas for sealing; and in addition, the rotary roller sealing device can effectively resist impact pressure caused by the sealing gas on the boundary of the immersion liquid, inhibit bubble entrainment on the boundary of the liquid, caused by too large gas sealing pressure, and be further conductive to realizing reliability and stability in sealing of an immersion flow field.
Description
Technical field
The present invention relates to a kind of packoff with immersed photoetching machine, particularly relate to a kind of rotation roller packoff for immersed photoetching machine.
Background technology
Modern lithographic equipment is take optical lithography as the basis, it utilize optical system the figure on the mask plate accurately projection exposure to the substrate that was coated with photoresist (as: silicon chip).It comprises a ultraviolet source, an optical system, projection mask, an alignment system and a substrate that covers photosensitive photoresist that is comprised of graphics chip.
Fill certain liquid in the slit of liquid immersion lithography (Immersion Lithography) system between projecting lens and substrate, improve the numerical aperture (NA) of projecting lens by the refractive index (n) that improves this slit medium, thereby improve resolution and the depth of focus of photoetching.
Usually the scheme that adopts is limited in liquid in the regional area between the end component of substrate top and projection arrangement.If lack limited sealing, this scheme will cause filling the leakage of border, flow field liquid, and the liquid of leakage will form the water mark after photoresist or Topcoat dry tack free, have a strong impact on exposal image-forming quality.The hermetically-sealed construction of this scheme generally adopts the hermetic seal member around the gap flow field between projection lens set end component and the substrate at present.Between the surface of containment member and substrate, Dry-gas Sealing Technology (for example referring to Chinese patent ZL200310120944.4 and US Patent No. 2007046916) is limited in liquid in certain flow field regions by applying gases at high pressure forming air curtain around filling the flow field periphery.But above-mentioned seal element comes with some shortcomings:
(1) in the substrate high-speed motion state, because the effect of molecular adhesion, the liquid of close substrate will move with substrate generation tractive, and cause thus the flow field border motif to change.This variation is all different in the different boundary position, is mainly manifested in the variation of dynamic contact angle size.That is: the advancing contact angle identical with direction of substrate motion will become greatly, and the receding contact angle opposite with direction of substrate motion will diminish.It is large that advancing contact angle becomes, and forms bubble so that the easier quilt of ambient atmos entrainments in the flow field, thereby affect homogeneity and the exposal image-forming quality in flow field; Receding contact angle diminishes, and causes leak of liquid so that border liquid more easily is pulled to the periphery, flow field, and forms thus a series of defectives (as: water mark).
The stability on the border, the uncontrollable flow field of high pressure gas sealing means of (2) usually adopting.Although because higher seal-air pressure so that in receding contact angle place position control fluid leakage problems, need to consume larger outside energy so high seal-air pressure is provided.In addition, higher seal-air pressure has increased the advancing contact angle place and has got the possibility that liquid bubble is entrainmented, and therefore seal-air pressure is controlled at less scope, helps to improve Systems balanth.
In order to obtain more optimal effect, more existing sealing patents (for example referring to Chinese patent ZL200810164176.5 and ZL200910096971.X) adopt non-mode of all calming the anger sealing or the rotation of employing mechanism to carry out the self-adapting seal of gap flow field.Although these modes have improved the effect of sealing, but still come with some shortcomings.As in substrate high speed compound movement process, unstable and the rapid fluctuations that easily causes the pressure and other parameters of immersion flow field, if can not effectively control in real time the adverse effect that the silicon chip motion brings, flow instability will constantly superpose and the initiating system vibration problem, even might cause the defective of exposing.
Summary of the invention
The object of the present invention is to provide a kind of rotation roller packoff for immersed photoetching machine, by regulating the different running method of rotation roller, so that the liquid on border, flow field produces certain kinetic energy.The mobile one side of this external-added can resist that substrate tractive motion produces to external leakage kinetic energy, suppress the leak of liquid effect under in conjunction with peripheral air seal better.On the other hand, can effectively resist the impact that sealing gas brings at the flow field boundary, suppress thus the excessive liquid boundary bubble that causes of seal-air pressure and entrainment.This will help to realize the reliability and stability of immersion flow field sealing, and promote thus the quality of exposure.
In order to achieve the above object, the technical solution used in the present invention is as follows:
The present invention includes projection lens set, rotation roller packoff and substrate, rotation roller packoff is arranged between projection lens set and the substrate.Described rotation roller packoff comprises inner member, external member, end cap and roller; Wherein:
1) inner member: inner member is regular polygon ring-type cylinder, have 6 ~ 10 lateral surfaces, every lateral surface all has the cambered surface of envelope roller, and ring-type cylinder center has stepped bore, ring-type cylinder upper surface periphery forms annular boss with the large shoulder hole in center, and the annular boss outside is ring groove;
2) external member: external member is regular polygon ring-type cylinder, have and the corresponding medial surface of inner member regular polygon ring-type cylinder lateral surface, the corresponding cambered surface that has the envelope roller of lateral surface of external member medial surface and inner member, have annular boss at the periphery near cambered surface above the external member, the external member circumferencial direction outside annular boss has 10 ~ 20 ring-shaped pouring vent holes of equidistant placement;
3) end cap: end cap is the ring-type cylinder, run through the end cap upper and lower surface and have 8 ~ 16 annular return-air through holes, the end cap bottom surface is fastened together respectively at the annular boss of the annular boss of inner member and external member and forms the return-air chamber, the return-air through hole be positioned at the return-air chamber directly over, fill the water absorptivity porous medium in the return-air chamber, end cap central bore is communicated with the inner member central stepped;
4) roller: roller is right cylinder, each roller part envelope is between the cambered surface of the cambered surface of inner member and external member, an each roller not side of envelope part is exposed at outside inner member and the external member lower surface, and each roller not opposite side of envelope part is exposed in the return-air chamber.
The envelope cambered surface that the cambered surface of the inner member regular polygon ring-type cylinder of described envelope roller and external member regular polygon ring-type cylinder cambered surface consist of, the diameter of its envelope diameter and roller is identical, is 10 ~ 15mm.
The beneficial effect that the present invention has:
(1) causes speed and the Variation Regularity of Morphological Characteristics of immersion flow field according to substrate motion, adjust in real time rotating speed and the sense of rotation of rotation roller; Drive thus peripheral immersion liquid and produce multi-form liquid kinetic energy, effectively resist the impact that leak of liquid that substrate motion causes and flow field border seal gas bring, promoted the stability of immersion flow field.
(2) under the substrate high-speed motion state, the leak of liquid that can avoid the advancing contact angle place to cause because of the seal gas pressure deficiency, and the receding contact angle place causes edge, flow field bubble to entrainment because seal gas pressure is excessive, effectively controlled two large sources of liquid immersion lithography defective.
(3) by controlling the mode of motion of rotation roller, drive immersion liquid and produce the kinetic energy opposite with direction of substrate motion, significantly offset the immersion liquid that formed by the substrate high-speed motion to external leakage kinetic energy, create advantage for reducing peripheral seal-air pressure, and saved thus the energy of ambient atmos sealing.
Description of drawings
Fig. 1 rough schematic view that to be the present invention assemble mutually with projection lens set.
Fig. 2 is the upward view of working surface of the present invention.
Fig. 3 is P-P cut-open view of the present invention.
Fig. 4 is that roller is in schematic diagram under the off working state when characterizing substrate motion.
Fig. 5 be characterize substrate by the center sealing principle figure during to external movement.
Fig. 6 be characterize substrate by the outside sealing principle figure during to central motion.
Among the figure: 1, projection lens set, 2, rotation roller packoff, 2A, inner member, 2B, external member, 2C, end cap, 2D, roller, 3, substrate, 4A, cambered surface, 4B, cambered surface, 4C, return-air through hole, 5A, annular boss, 5B, annular boss, 6B, gas injection through hole, 6C, return-air chamber, 7, immersion flow field, 8, water absorptivity porous medium, 9, the immersion flow field velocity, 10, sealing gas.
Embodiment
The present invention is further illustrated below in conjunction with drawings and Examples.
Such as Fig. 1, Fig. 2, shown in Figure 3, the present invention includes projection lens set 1, rotation roller packoff and substrate 3, rotation roller packoff is arranged between projection lens set 1 and the substrate 3.Described rotation roller packoff 2 comprises inner member 2A, external member 2B, end cap 2C and roller 2D; Wherein:
1) inner member 2A: inner member 2A is regular polygon ring-type cylinder, have 6 ~ 10 lateral surfaces, every lateral surface all has the cambered surface 4A of envelope roller 2D, ring-type cylinder center has stepped bore, ring-type cylinder upper surface periphery forms annular boss 5A with the large shoulder hole in center, and the annular boss 5A outside is ring groove;
2) external member 2B: external member 2B is regular polygon ring-type cylinder, have and the corresponding medial surface of inner member 2A regular polygon ring-type cylinder lateral surface, the corresponding cambered surface 4B that has envelope roller 2D of lateral surface of external member 2B medial surface and inner member 2A, have annular boss 5B at the periphery near cambered surface 4B above the external member 2B, the external member 2B circumferencial direction outside annular boss 5B has 10 ~ 20 ring-shaped pouring vent hole 6B of equidistant placement;
3) end cap 2C: end cap 2C is the ring-type cylinder, run through end cap 2C upper and lower surface and have 8 ~ 16 annular return-air through hole 4C, end cap 2C bottom surface is fastened together respectively at the annular boss 5B of the annular boss 5A of inner member 2A and external member 2B and forms return-air chamber 6C, return-air through hole 4C be positioned at return-air chamber 6C directly over, fill water absorptivity porous medium 8 in the 6C of return-air chamber, end cap 2C center pit is communicated with inner member 2A central stepped;
4) roller 2D: roller 2D is right cylinder, each roller part envelope is between the cambered surface 4B of the cambered surface 4A of inner member 2A and external member 2B, an each roller 2D not side of envelope part is exposed at outside inner member 2A and the external member 2B lower surface, and each the roller 2D not opposite side of envelope part is exposed in the 6C of return-air chamber.
The envelope cambered surface that the cambered surface 4A of the inner member 2A regular polygon ring-type cylinder of described envelope roller 2D and external member 2B regular polygon ring-type cylinder cambered surface 4B consist of, its envelope diameter is identical with the diameter of roller 2D, is 10 ~ 15mm.
Schematically shown the rotation roller packoff 2 of embodiment of the present invention and the assembling of projection lens set 1 such as Fig. 1, this device can be used in the lithographic equipments such as Step-and-repeat or step-by-step scanning type.In exposure process, the light (as: ArF or the F that send from light source (not providing the figure)
2Excimer laser) mask plate (not providing among the figure) by aiming at, projection lens set 1 and be full of the flow field, 3 slits of lens-substrate of immersion liquid is exposed to the photoresist on substrate 3 surfaces.
Principle of work of the present invention is as follows:
As shown in Figure 4, during to outside high-speed motion, roller remains static at substrate 3 centers.Because the effect of the molecular adhesion of liquid, the traction action of substrate 3 impels immersion flow field 7 outwards to move.Sealing gas acts on the immersion flow field 7 border meniscus after by gas injection through hole 6B, meniscus place on immersion flow field 7 borders, come the gaseous tension of free air seal passage 6B, the surface tension of liquid self of being combined with the flowing pressure of the immersion flow field 7 that is come by the priming device liquid filling pressure transmission of submergence unit reaches balance jointly.Get immersion flow field velocity 9 as shown in FIG. in meniscus vicinity, border.
As shown in Figure 5, by the center during to outside high-speed motion, because the effect of the molecular adhesion of liquid, balance is destroyed between the pressure three of surface tension, seal-air pressure and immersion flow field 7 at substrate 3.Regulate rotating speed and the direction of extraneous motor (not providing among the figure), drive in real time roller 2D rotational speed and direction.Sense of rotation is that the linear velocity of roller 2D bottom is opposite with substrate motion speed, so that near the immersion liquid the roller 2D obtains certain speed and kinetic energy, the kinetic energy that produces with the motion of substrate tractive is able to mutually effective counteracting, and immersion flow field boundary vicinity place velocity 9 as shown in FIG..And sealing gas 10 is flowed through behind the gas injection through hole 6B, acts on the meniscus of immersion flow field 7.Under both effects, effectively controlled receding contact angle because of the not enough fluid leakage problems that produces of air-proof condition, reach the steady state (SS) of sealing.Because the kinetic energy that the motion of substrate tractive produces is able to effective counteracting, so the pressure of required sealing gas 10 will be effectively reduced, saved the extraneous energy that sealing load is provided.During roller 2D rotation, stick to the rare drop of roller surface under the effect of negative pressure, along with cambered surface 4A and the cambered surface 4B micro gap arrival return-air chamber 6C of the air-flow effect of carrying secretly by envelope, in the 6C of return-air chamber, fill water absorptivity porous medium 8, realize the separation of gas-liquid, gas then is recovered from return-air through hole 4C.
As shown in Figure 6, substrate 3 to central motion, obtains than kinetic energy to central motion immersion flow field 7 by the outside, and the dynamic contact angle on immersion flow field 7 borders increases rapidly.If this moment, boundary position kept the impact of higher seal-air pressure, entrainmenting and causing the exposure image defective of bubble will be caused very easily.Sealing gas is flowed through behind the gas injection through hole 6B, finally acts on the meniscus of immersion flow field 7.By real-time drive roller 2D rotational speed and direction, so that sense of rotation is that linear velocity and the sealing gas impingement flow of roller 2D bottom is to opposite, near the immersion liquid of roller 2D this moment obtains certain speed and kinetic energy, immersion flow field boundary velocity 9 has improved the ability of immersion flow field 7 boundaries opposing high pressure sealing gas 10 as shown in FIG.; Effectively avoided again entrainmenting of bubble when guaranteeing sealing effectiveness thus.Equally, air-flow is filled water absorptivity porous medium 8 finally by return-air chamber 6C in the 6C of return-air chamber, realize the separation of gas-liquid, and liquid is absorbed, and gas reclaims along return-air through hole 4C.
This shows, regulate in real time rotating speed and the direction of roller 2D by motor, not only obtained reliable immersion flow field sealing, effectively reduce simultaneously the pressure requirement of sealing gas.Solved at receding contact angle and produced on the basis of leak of liquid because air-proof condition is not enough, effectively controlled border, the flow field bubble that high pressure sealing gas causes and entrainmented.
Claims (2)
1. a rotation roller packoff that is used for immersed photoetching machine comprises projection lens set (1), rotation roller packoff and substrate (3), and rotation roller packoff is arranged between projection lens set (1) and the substrate (3); It is characterized in that: described rotation roller packoff (2) comprises inner member (2A), external member (2B), end cap (2C) and roller (2D); Wherein:
1) inner member (2A): inner member (2A) is regular polygon ring-type cylinder, have 6 ~ 10 lateral surfaces, every lateral surface all has the cambered surface (4A) of envelope roller (2D), ring-type cylinder center has stepped bore, ring-type cylinder upper surface periphery forms annular boss (5A) with the large shoulder hole in center, and annular boss (5A) outside is ring groove;
2) external member (2B): external member (2B) is regular polygon ring-type cylinder, have and the corresponding medial surface of inner member (2A) regular polygon ring-type cylinder lateral surface, the corresponding cambered surface (4B) that has envelope roller (2D) of lateral surface of external member (2B) medial surface and inner member (2A), have annular boss (5B) at the periphery near cambered surface (4B) above the external member (2B), external member (2B) circumferencial direction outside annular boss (5B) has 10 ~ 20 ring-shaped pouring vent holes (6B) of equidistant placement;
3) end cap (2C): end cap (2C) is the ring-type cylinder, run through end cap (2C) upper and lower surface and have 8 ~ 16 annular return-air through holes (4C), end cap (2C) bottom surface is fastened together respectively at the annular boss (5B) of the annular boss (5A) of inner member (2A) and external member (2B) and forms return-air chamber (6C), return-air through hole (4C) be positioned at return-air chamber (6C) directly over, fill water absorptivity porous medium (8) in the return-air chamber (6C), end cap (2C) center pit is communicated with inner member (2A) central stepped;
4) roller (2D): roller (2D) is right cylinder, each roller part envelope is between the cambered surface (4B) of the cambered surface (4A) of inner member (2A) and external member (2B), each roller (2D) not side of envelope part is exposed at outside inner member (2A) and external member (2B) lower surface, and each roller (2D) the not opposite side of envelope part is exposed in the return-air chamber (6C).
2. a kind of rotation roller packoff for immersed photoetching machine according to claim 1, it is characterized in that: the envelope cambered surface that the cambered surface (4A) of inner member (2A) the regular polygon ring-type cylinder of described envelope roller (2D) and external member (2B) regular polygon ring-type cylinder cambered surface (4B) consist of, its envelope diameter is identical with the diameter of roller (2D), is 10 ~ 15mm.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210403590.3A CN102902166B (en) | 2012-10-22 | 2012-10-22 | Rotary roller sealing device for immersion lithography machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210403590.3A CN102902166B (en) | 2012-10-22 | 2012-10-22 | Rotary roller sealing device for immersion lithography machine |
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| CN102902166A true CN102902166A (en) | 2013-01-30 |
| CN102902166B CN102902166B (en) | 2014-09-10 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807566A (en) * | 2014-12-29 | 2016-07-27 | 上海微电子装备有限公司 | Maintenance apparatus for immersion lithography machine immersion flow field |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101452218A (en) * | 2008-12-29 | 2009-06-10 | 浙江大学 | Submerge self-adapting gas seal device for photoetching machine |
| CN101571677A (en) * | 2008-04-24 | 2009-11-04 | Asml荷兰有限公司 | Lithographic projection apparatus and a method of operating the same |
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2012
- 2012-10-22 CN CN201210403590.3A patent/CN102902166B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101571677A (en) * | 2008-04-24 | 2009-11-04 | Asml荷兰有限公司 | Lithographic projection apparatus and a method of operating the same |
| CN101452218A (en) * | 2008-12-29 | 2009-06-10 | 浙江大学 | Submerge self-adapting gas seal device for photoetching machine |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807566A (en) * | 2014-12-29 | 2016-07-27 | 上海微电子装备有限公司 | Maintenance apparatus for immersion lithography machine immersion flow field |
| CN105807566B (en) * | 2014-12-29 | 2017-12-29 | 上海微电子装备（集团）股份有限公司 | A kind of submersible photoetching apparatus soaking liquid flow field maintains device |
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| CN102902166B (en) | 2014-09-10 |
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Effective date of registration: 20200721 Address after: No.99 Lixin Road, Qingshanhu street, Lin'an District, Hangzhou City, Zhejiang Province Patentee after: ZHEJIANG QIER ELECTROMECHANICAL TECHNOLOGY Co.,Ltd. Address before: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Patentee before: ZHEJIANG University |
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