CN202886841U - Cascading-type self-adaption gas seal device for immersion-type photoetching machine - Google Patents
Cascading-type self-adaption gas seal device for immersion-type photoetching machine Download PDFInfo
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- CN202886841U CN202886841U CN 201220540858 CN201220540858U CN202886841U CN 202886841 U CN202886841 U CN 202886841U CN 201220540858 CN201220540858 CN 201220540858 CN 201220540858 U CN201220540858 U CN 201220540858U CN 202886841 U CN202886841 U CN 202886841U
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- 238000001259 photo etching Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 238000007789 sealing Methods 0.000 claims description 30
- 238000002347 injection Methods 0.000 claims description 8
- 239000007924 injection Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 239000011148 porous material Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 abstract description 22
- 238000007654 immersion Methods 0.000 abstract description 19
- 230000033001 locomotion Effects 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 238000010276 construction Methods 0.000 abstract description 4
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 39
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 230000001133 acceleration Effects 0.000 description 3
- 230000003044 adaptive effect Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 238000000671 immersion lithography Methods 0.000 description 3
- 230000001914 calming effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 230000029052 metamorphosis Effects 0.000 description 2
- 230000010070 molecular adhesion Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 230000000246 remedial effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model discloses a cascading-type self-adaption gas seal device for an immersion-type photoetching machine. The gas seal device is a device arranged between a projecting lens group and a substrate, and consists of an upper construction element, a lower construction element and a rotary construction element. During the photoetching scanning process, under the traction effect to an immersion liquid by the high-speed motion of the substrate, a boundary form of an immersion flow filed can be changed rapidly. A multi-layer cascading-type gas seal structure is adopted in the device; gas seal pressure from the center to the exterior rises gradually, and the seal pressure degree of each layer of gas is regulated in real time according to the motion direction and the speed of the substrate, so that the leakage of the immersion liquid caused by insufficient peripheral gas seal pressure and gas bubble entrainment caused by too high internal gas seal pressure are inhibited, and the liquid self-adaption gas seal is realized; and meanwhile, rotary gas flow auxiliary seal is adopted for the exterior of the device, and further the gas seal reliability and stability are improved.
Description
Technical field
The utility model relates to a kind of packoff with immersed photoetching machine, particularly relates to a kind of staged self-adaptation gas-tight sealing for immersed photoetching machine.
Background technology
Modern lithographic equipment is take optical lithography as the basis, it utilize optical system the figure on the mask plate accurately projection exposure to the substrate that was coated with photoresist (as: silicon chip).It comprises a ultraviolet source, an optical system, projection mask, an alignment system and a substrate that covers photosensitive photoresist that is comprised of graphics chip.
Fill certain liquid in the slit of liquid immersion lithography (Immersion Lithography) system between projecting lens and substrate, improve the numerical aperture (NA) of projecting lens by the refractive index (n) that improves this slit medium, thereby improve resolution and the depth of focus of photoetching.
Usually the scheme that adopts is limited in liquid in the regional area between the end component of substrate top and projection arrangement.If lack limited sealing, this scheme will cause filling the leakage of border, flow field liquid, and the liquid of leakage will form the water mark after photoresist or Topcoat dry tack free, have a strong impact on exposal image-forming quality.The hermetically-sealed construction of this scheme generally adopts the hermetic seal member around the gap flow field between projection lens set end component and the substrate at present.Between the surface of containment member and substrate, Dry-gas Sealing Technology (for example referring to Chinese patent ZL200310120944.4 and US Patent No. 2007046916) is limited in liquid in certain flow field regions by applying gases at high pressure forming air curtain around filling the flow field periphery.
But above-mentioned seal element comes with some shortcomings:
(1) in the substrate high-speed motion state, because the effect of molecular adhesion, the liquid of close substrate will move with substrate generation tractive, and cause thus the flow field border motif to change.This variation is all different in the different boundary position, is mainly manifested in the variation of dynamic contact angle size.That is: the advancing contact angle identical with direction of substrate motion will become greatly, and the receding contact angle opposite with direction of substrate motion will diminish.It is large that advancing contact angle becomes, and forms bubble so that the easier quilt of ambient atmos entrainments in the flow field, thereby affect homogeneity and the exposal image-forming quality in flow field; Receding contact angle diminishes, so that the liquid easier periphery, flow field that is pulled in border causes leak of liquid, and forms thus a series of defectives (as: water mark).
(2) sealing means of all calming the anger that usually adopts can't carry out adaptive equalization in the stream field border, this is to become because of less seal-air pressure general so that in position, receding contact angle place to be more prone to leak, and larger seal-air pressure will be increased in the advancing contact angle place and get the possibility that liquid bubble is entrainmented, best seal gas pressure distribute the high speed dynamic change that is accompanied by the border, flow field and instantaneous change.Yet, also there are some sealing patents (for example participating in Chinese patent ZL200810164176.5 and ZL200910096971.X) to adopt non-mode of all calming the anger sealing or employing rotation to carry out the self-adapting seal of gap flow field, although improved the effect of sealing, but still come with some shortcomings: in the substrate high speed compound movement process, gap flow field is in disturbed flow condition.Brought thus pressure and flow unstable, untimelyly effectively discharge the pressure surge that brings, constantly the stack meeting brings vibration problem to device, and then has influence on the exposure quality; These methods do not take into full account the auxiliary remedial measures of the serious consequence that (such as instantaneous high acceleration and anxious shut-down condition) brought under the exceedingly odious operating mode of substrate (leaking such as drop) in addition.
Summary of the invention
The purpose of this utility model provides a kind of staged self-adaptation gas-tight sealing for immersed photoetching machine, metamorphosis according to the border, flow field, adjust in real time the pressure of sealing gas in the different hermetic seal passages, thereby obtain flow field, high stability border, to promote the quality of exposure.
In order to achieve the above object, the technical solution adopted in the utility model is as follows:
The utility model comprises projection lens set, packoff and substrate, and packoff is arranged between projection lens set and the substrate.Described packoff is staged self-adaptation gas-tight sealing, comprises lower member, upper member and rotating member; Wherein:
1) lower member: lower member is the ring-type cylinder, and circumferencial direction equidistantly has the hermetic seal passage of 10 ~ 18 fan-shaped multilayers, and each hermetic seal passage is 5 ~ 8 layers; Hermetic seal passage bottom has inclination hermetic seal chamber; Be arranged with the return gas channel that is equally spaced outside the hermetic seal passage, the bottom of return gas channel is provided with the return-air chamber, fills the water absorptivity porous medium in the return-air chamber; Have the rotation groove of ring-type in the lower member outer circumferential walls;
2) upper member: upper member is the ring-type cylinder, the lower surface circumferencial direction has the fan-shaped air-flow buffer chamber with the hermetic seal passage corresponding number of the fan-shaped multilayer of lower member ring-type cylinder, correspondence is close to the hermetic seal passage of the fan-shaped multilayer of lower member 2A ring-type cylinder, and the top in each air-flow buffer chamber all has the gas injection passage that is communicated with the air-flow buffer chamber; The gas injection passage is positioned at outside the outermost hermetic seal passage;
3) rotating member: rotating member is the ring-type cylinder, runs through upper and lower surface and equidistantly has 8 ~ 10 Sloped rotating gas channels; Be provided with the rotation boss of ring-type at the center circumferential inwall, the rotation boss cooperates with the rotation recess-mounted of the ring-type of lower member ring-type cylinder.
The hermetic seal passage of described fan-shaped multilayer, mind-set outside direction therefrom, the width of every layer of hermetic seal passage increases gradually, increases progressively width at 0.5 ~ 1mm.
Described inclination hermetic seal chamber, therefrom mind-set outer incline angle beta is 20 ~ 40 degree.
Described Sloped rotating gas channel is tilt distribution from the outside centre of surface downwards of upper surface, and angle of inclination and substrate angle γ are 60 ~ 80 degree, and the pore of top surface porosity and lower surface in a circumferential direction under two pore center of circle angle θ 20 ~ 40 spend.
The beneficial effect that the utlity model has:
(1) according to the metamorphosis on border, flow field, automatically regulates the seal gas pressure in the different hermetic seal passages, thereby guarantee the high stability in flow field; Created advantage for further improving substrate motion speed and production efficiency.
(2) under the substrate high-speed motion different conditions, can avoid the advancing contact angle place to cause flow field, edge bubble to entrainment because the sealing gas flow is excessive, and the receding contact angle place causes leak of liquid because of the seal gas pressure deficiency, effectively controlled two large defectives in the liquid immersion lithography.
(3) enclose outside the rotary gas sealing supplementary means of putting, effectively be controlled at the drop leakage problem of (such as instantaneous high acceleration and anxious shut-down condition) under the bad working environments, further improve the Stability and dependability in air seal and flow field.
Description of drawings
Fig. 1 rough schematic view that to be the utility model assemble mutually with projection lens set.
Fig. 2 is blast cross section view of the present utility model.
Fig. 3 is the structural drawing of the utility model rotating member.
Fig. 4 is the upward view of the utility model working surface.
Fig. 5 is the P-P cut-open view of the utility model Fig. 2.
Fig. 6 characterizes fundamental diagram under the substrate stationary state.
Fig. 7 be characterize substrate by the center sealing principle figure during to external movement.
Fig. 8 be characterize substrate by the outside sealing principle figure during to central motion.
Fig. 9 is the auxiliary seal schematic diagram that characterizes the rotary pneumatic sealing.
Among the figure: 1, projection lens set, 2, staged self-adaptation gas-tight sealing, 2A, lower member, 2B, upper member, 2C, rotating member, 3, substrate, 4A, hermetic seal passage, 4B, gas injection passage, 4C, Sloped rotating gas channel, 5A, inclination hermetic seal chamber, 5B, air-flow buffer chamber, 5C, rotation boss, 6A, return gas channel, 7A, return-air chamber, 8A, rotation groove, 9, water absorptivity porous medium, 10, immersion flow field, 11, seal channel gaseous tension field.
Embodiment
Below in conjunction with drawings and Examples the utility model is further described.
Such as Fig. 1, Fig. 2, Fig. 3, Fig. 4, shown in Figure 5, the utility model comprises projection lens set 1, packoff and substrate 3, and packoff is arranged between projection lens set 1 and the substrate 3.Described packoff is staged self-adaptation gas-tight sealing 2, comprises lower member 2A, upper member 2B and rotating member 2C; Wherein:
1) lower member 2A: lower member 2A is the ring-type cylinder, and circumferencial direction equidistantly has the hermetic seal passage 4A of 10 ~ 18 fan-shaped multilayers, and each hermetic seal passage is 5 ~ 8 layers; Hermetic seal passage bottom has the inclination hermetic seal chamber 5A that enlarges from the inside to the outside; Be arranged with the return gas channel 6A that is equally spaced outside the hermetic seal passage, the bottom of return gas channel 6A is provided with return-air chamber 7A, fills water absorptivity porous medium 9 in the 7A of return-air chamber; Have the rotation groove 8A of ring-type in lower member 2A outer circumferential walls;
2) upper member 2B: upper member 2B is the ring-type cylinder, the lower surface circumferencial direction has the fan-shaped air-flow buffer chamber 5B with the hermetic seal passage 4A corresponding number of the fan-shaped multilayer of lower member 2A ring-type cylinder, correspondence is close to the hermetic seal passage 4A of the fan-shaped multilayer of lower member 2A ring-type cylinder, the top, the outside of each air-flow buffer chamber 5B all has the gas injection passage 4B that is communicated with air-flow buffer chamber 5B, and gas injection passage 4B is positioned at outside the outermost hermetic seal passage 4A;
3) rotating member 2C: rotating member 2C is the ring-type cylinder, runs through upper and lower surface and equidistantly has 8 ~ 10 Sloped rotating gas channel 4C; Be provided with the rotation boss 5C of ring-type at the center circumferential inwall, rotation boss 5C inlays with the rotation groove 8A of the ring-type of lower member 2A ring-type cylinder and cooperates.
The hermetic seal passage 4A of described fan-shaped multilayer, mind-set outside direction therefrom, the width of every layer of hermetic seal passage increases gradually, increases progressively width at 0.5 ~ 1mm.
Described inclination hermetic seal chamber 5A, therefrom mind-set outer incline angle beta is 20 ~ 40 degree.
Described Sloped rotating gas channel 4C is tilt distribution from the outside centre of surface downwards of upper surface, and angle of inclination and substrate angle γ are 60 ~ 80 degree, and the pore of top surface porosity and lower surface in a circumferential direction under two pore center of circle angle θ 20 ~ 40 spend.
As shown in Figure 1, schematically shown the staged self-adaptation gas-tight sealing 2 of the utility model embodiment and the assembling of projection lens set, this device can be used in the lithographic equipments such as Step-and-repeat or step-by-step scanning type.In exposure process, the light (as: ArF or the F that send from light source (not providing the figure)
2Excimer laser) mask plate (not providing among the figure) by aiming at, projection lens set 1 and be full of the flow field, 3 slits of lens-substrate of immersion liquid is exposed to the photoresist on substrate 3 surfaces.
Principle of work of the present utility model is as follows:
After sealing gas enters gas injection passage 4B, the air-flow buffer chamber 5B that flows through, the multilayer of then flowing through hermetic seal passage 4A acts on the meniscus of immersion flow field 10 at last.Owing to gas flow through the pressure loss of passage along with channel width reduce increase, so therefrom the gaseous tension in outside each layer hermetic seal of the mind-set passage constantly raises, be staged and distribute; And through Sloped rotating gas channel 4C, under the back pressure of air-flow impacts, thereby rotating member begins to rotate generation from the outside to the rotation air curtain of central distribution at the most external gas flow.When the gap flow field border changes along with motion, change the gas flow of multilayer hermetic seal passage, and then the pressure in real-time corresponding each layer of change hermetic seal passage; In conjunction with outside rotation air curtain, finally reach the state of stable air seal, guarantee the reliability and stability that seals.
Shown in Figure 6, when substrate 3 stationary state, the sealing gas that acts on immersion flow field 10 borders evenly and seal channel pressure field 11 stable.Owing to gas flow through the pressure loss of passage along with channel width reduce increase, so therefrom the gaseous tension in the outside hermetic seal passage of mind-set constantly raises.Meniscus place on immersion flow field 10 borders comes the gaseous tension of free air seal passage 4A, and the surface tension of liquid self of being combined with the pressure of the immersion flow field 10 that is come by the priming device liquid filling pressure transmission of submergence unit reaches balance jointly.
Shown in Figure 7, by the center during to outside high-speed motion, because the effect of the molecular adhesion of liquid, the balance of surface tension, seal-air pressure and immersion flow field 10 pressure is destroyed at substrate 3.The traction action immersion flow field 10 of substrate 3 outwards moves, the immersion flow field 10 that is under the disturbed flow condition obtains to move to the periphery than kinetic energy and pressure surge, because the effect of the inclination hermetic seal chamber 5A that enlarges from the inside to the outside is able to timely and effective release than kinetic energy and pressure surge.Because each layer hermetic seal passage 4A width therefrom mind-set is outward and increases progressively, gas flow increases along with reducing of channel width through the pressure loss of passage, so therefrom the gaseous tension in the outside hermetic seal passage of mind-set constantly raises.Again during every breakthrough one deck hermetic seal passage 4A, in the situation that always the injecting gas flow is constant, so that gas flow increases in the hermetic seal passage 4A of outside not shutoff, air seal pressure further raises, gaseous tension field 11 stageds of seal channel distribute as shown in Figure 7, and sealing effectiveness further improves.Be accompanied by draw rate and the liquid filling pressure of different substrates, the flow of sealing gas and pressure adaptive change, and under the acting in conjunction of the rotation air curtain in rotating member 2C, control the leakage that liquid causes because being subject to substrate 3 traction action, guaranteed the stability of immersion flow field 10.
Shown in Figure 8, at substrate 3 by the outside to central motion, the dynamic contact angle on immersion flow field 10 borders increases rapidly.If center position keeps higher seal-air pressure, will very easily cause the generation of entrainmenting of bubble, thereby affect the homogeneity of immersion flow field 10, cause the exposure image defective.Immersion flow field 10 liquid are subject to the tractive motion of substrate 3, immersion flow field 10 obtains certain kinetic energy to central motion, during every release one deck hermetic seal passage 4A, in the situation that always the injecting gas flow is constant, so that gas flow reduces in the outside hermetic seal passage 4A, interior flow field edge air seal pressure is with relative reduce, and this moment, gaseous tension field 11 stageds of seal channel distributed as shown in Figure 8, had avoided again entrainmenting of bubble when guaranteeing sealing effectiveness.The pressure adaptive that finally is formed on the sealing gas of immersion flow field 10 reduces, and it is excessive to immersion flow field 10 generation that formation is impacted and bubble entrainments to have suppressed seal-air pressure.
Shown in Figure 9, in the substrate scanning process, run into the serious consequence that (such as instantaneous high acceleration and anxious shut-down condition) brought under the exceedingly odious operating mode (leaking such as drop).The design's peripheral rotating member 2C will provide the auxiliary seal effect, the drop that leaks be cooperated the water absorptivity porous medium 9 that is filled in return-air chamber 7A through negative pressure return gas channel 6A, effectively be reclaimed absorption, guarantee validity and the reliability of hermetic seal.
Claims (4)
1. a staged self-adaptation gas-tight sealing that is used for immersed photoetching machine comprises projection lens set (1), packoff and substrate (3), and packoff is arranged between projection lens set (1) and the substrate (3); It is characterized in that: described packoff is staged self-adaptation gas-tight sealing (2), comprises lower member (2A), upper member (2B) and rotating member (2C); Wherein:
1) lower member (2A): lower member (2A) is the ring-type cylinder, and circumferencial direction equidistantly has the hermetic seal passage (4A) of 10 ~ 18 fan-shaped multilayers, and each hermetic seal passage is 5 ~ 8 layers; Hermetic seal passage bottom has inclination hermetic seal chamber (5A); Be arranged with the return gas channel (6A) that is equally spaced outside the hermetic seal passage, the bottom of return gas channel (6A) is provided with return-air chamber (7A), fills water absorptivity porous medium (9) in return-air chamber (7A); Have the rotation groove (8A) of ring-type in lower member (2A) outer circumferential walls;
2) upper member (2B): upper member (2B) is the ring-type cylinder, the lower surface circumferencial direction has the fan-shaped air-flow buffer chamber (5B) with hermetic seal passage (4A) corresponding number of the fan-shaped multilayer of lower member (2A) ring-type cylinder, correspondence is close to the hermetic seal passage (4A) of the fan-shaped multilayer of lower member (2A) ring-type cylinder, and the top in each air-flow buffer chamber (5B) all has the gas injection passage (4B) that is communicated with air-flow buffer chamber (5B); Gas injection passage (4B) is positioned at outside the outermost hermetic seal passage (4A);
3) rotating member (2C): rotating member (2C) is the ring-type cylinder, runs through upper and lower surface and equidistantly has 8 ~ 10 Sloped rotating gas channels (4C); Be provided with the rotation boss (5C) of ring-type at the center circumferential inwall, rotation boss (5C) is inlayed with the rotation groove (8A) of the ring-type of lower member (2A) ring-type cylinder and is cooperated.
2. a kind of staged self-adaptation gas-tight sealing for immersed photoetching machine according to claim 1, it is characterized in that: the hermetic seal passage (4A) of described fan-shaped multilayer, mind-set outside direction therefrom, the width of every layer of hermetic seal passage increases gradually, increases progressively width at 0.5 ~ 1mm.
3. a kind of staged self-adaptation gas-tight sealing for immersed photoetching machine according to claim 1 is characterized in that: described inclination hermetic seal chamber (5A), therefrom mind-set outer incline angle beta is 20 ~ 40 degree.
4. a kind of staged self-adaptation gas-tight sealing for immersed photoetching machine according to claim 1, it is characterized in that: described Sloped rotating gas channel (4C) is tilt distribution from the outside centre of surface downwards of upper surface, angle of inclination and substrate angle γ are 60 ~ 80 degree, and the pore of top surface porosity and lower surface in a circumferential direction lower two pore center of circle angle θ 20 ~ 40 spend.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220540858 CN202886841U (en) | 2012-10-22 | 2012-10-22 | Cascading-type self-adaption gas seal device for immersion-type photoetching machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220540858 CN202886841U (en) | 2012-10-22 | 2012-10-22 | Cascading-type self-adaption gas seal device for immersion-type photoetching machine |
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| CN202886841U true CN202886841U (en) | 2013-04-17 |
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| CN 201220540858 Expired - Lifetime CN202886841U (en) | 2012-10-22 | 2012-10-22 | Cascading-type self-adaption gas seal device for immersion-type photoetching machine |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102880016A (en) * | 2012-10-22 | 2013-01-16 | 浙江大学 | Stair-type self-adaptive air sealing device used for immersed type photoetching machine |
| CN104965392A (en) * | 2015-07-17 | 2015-10-07 | 浙江大学 | Vertical recycling and air sealing device for immersion type photoetching machine |
| WO2018046329A1 (en) * | 2016-09-12 | 2018-03-15 | Asml Netherlands B.V. | Fluid handling structure for lithographic apparatus |
| CN113138537A (en) * | 2020-01-17 | 2021-07-20 | 浙江大学 | Immersion liquid supply and recovery device for immersion lithography machine |
-
2012
- 2012-10-22 CN CN 201220540858 patent/CN202886841U/en not_active Expired - Lifetime
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102880016A (en) * | 2012-10-22 | 2013-01-16 | 浙江大学 | Stair-type self-adaptive air sealing device used for immersed type photoetching machine |
| CN102880016B (en) * | 2012-10-22 | 2014-07-09 | 浙江大学 | Stair-type self-adaptive air sealing device used for immersed type photoetching machine |
| CN104965392A (en) * | 2015-07-17 | 2015-10-07 | 浙江大学 | Vertical recycling and air sealing device for immersion type photoetching machine |
| WO2018046329A1 (en) * | 2016-09-12 | 2018-03-15 | Asml Netherlands B.V. | Fluid handling structure for lithographic apparatus |
| CN109690413A (en) * | 2016-09-12 | 2019-04-26 | Asml荷兰有限公司 | Fluid handling structure for lithographic equipment |
| US11029607B2 (en) | 2016-09-12 | 2021-06-08 | Asml Netherlands B.V. | Fluid handling structure for lithographic apparatus |
| US11454892B2 (en) | 2016-09-12 | 2022-09-27 | Asml Netherlands B.V. | Fluid handling structure for lithographic apparatus |
| US11860546B2 (en) | 2016-09-12 | 2024-01-02 | Asml Netherlands B.V. | Fluid handling structure for lithographic apparatus |
| CN113138537A (en) * | 2020-01-17 | 2021-07-20 | 浙江大学 | Immersion liquid supply and recovery device for immersion lithography machine |
| CN113138537B (en) * | 2020-01-17 | 2023-10-13 | 浙江大学 | Immersion liquid supply and recovery device for immersion lithography machine |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20130417 Effective date of abandoning: 20140709 |
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| RGAV | Abandon patent right to avoid regrant |