CN102877028A - Vapor deposition device - Google Patents
Vapor deposition device Download PDFInfo
- Publication number
- CN102877028A CN102877028A CN2012102408459A CN201210240845A CN102877028A CN 102877028 A CN102877028 A CN 102877028A CN 2012102408459 A CN2012102408459 A CN 2012102408459A CN 201210240845 A CN201210240845 A CN 201210240845A CN 102877028 A CN102877028 A CN 102877028A
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- guide arm
- mentioned
- vacuum chamber
- vapor deposition
- deposition source
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- 238000007740 vapor deposition Methods 0.000 title claims description 69
- 238000001704 evaporation Methods 0.000 claims abstract description 52
- 230000008020 evaporation Effects 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000011248 coating agent Substances 0.000 claims description 20
- 238000000576 coating method Methods 0.000 claims description 20
- 238000007789 sealing Methods 0.000 claims description 20
- 230000009471 action Effects 0.000 claims description 11
- 230000007246 mechanism Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000009826 distribution Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000000112 cooling gas Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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Abstract
The invention relates to an evaporation device, being characterized in that s a vacuum chamber, an evaporation source which is arranged in the vacuum chamber, an evaporation source driver which makes the evaporation source moves linearly relative to the vacuum chamber within the substrate, a guide arm, and the sliding guide part; the end of guide arm leads to the outside of the vacuum chamber, the other end of the housing and the evaporation source connected to the power line, through the end of the guide arm to make the power line which leads to the outside of the vacuum chamber, the guide arm at the other end of the department is able to combine with the evaporation source pivot, and the guide arm follow linear movement of the evaporation source rotation movement of the slide in the direction of length at the same time; and the sliding guiding part, in order to maintain the seal of the state is set in the vacuum chamber and the guide arm, to guide sliding of the guide arm.
Description
Technical field
The present invention relates to a kind of evaporation coating device, relate in more detail a kind of vapor deposition source that in vacuum chamber, makes and carry out Linear-moving with respect to substrate, and at the evaporation coating device (Deposition apparatus) of the surperficial evaporation evaporation material of substrate.
Background technology
As flat-panel display device (Flat Panel Display), it is following several to have comprising of the meaning of representing, liquid crystal display device (Liquid Crystal Display), plasma display apparatus (Plasma Display Panel) and organic light emitting display (Organic Light Emitting Diodes) etc.Wherein, organic light emitting display has the speed of responding rapidly, is lower than the in the past characteristic of current consumption, high brightness and the light weight etc. of liquid crystal display device, owing to can manufacture ultrathin type etc. because not needing independent backlight (back lighting) device to have advantages of, thereby, attracted attention by the people and be follow-on display device.
On the other hand, the film forming general method of the substrate of flat-panel display device can point out as vacuum vapour deposition (Evaporation), ion plating (Ion-plation) and sputter (Sputtering) physical vaporous deposition (PVD) and based on chemical Vapor deposition process (CVD) of gas reaction etc.Wherein, vacuum vapour deposition can form middle use at the film as the organic matter layer of organic light emitting display, inorganic layer etc.
Vacuum vapour deposition refers to make in vacuum chamber after the organism taken in by vapor deposition source or inorganics evaporation or the distillation evaporation in the method on the surface of substrate.In this vacuum vapour deposition, vapor deposition source can receive electricity, control signal, cooling gas etc. from the outside of vacuum chamber, so that control evaporation operation.Vapor deposition source is connected with the feed unit of the outside of vacuum chamber by the service line of distribution, pipe arrangement etc.But, because vacuum state is kept in the inside of vacuum chamber in operation, thereby, if service line is exposed to vacuum, then there is the problem that makes rapid outmodedization of service line or line interruption.
And recent taking advantage of a favourable situation becomes big area gradually for flat-panel display device.Thus, employed substrate also becomes big area gradually in the flat-panel display device manufacturing.For this mode to large-area substrates evaporation evaporation material, can use in vacuum chamber, to make vapor deposition source with respect to the mode of linearly moving while of substrate at the surperficial evaporation evaporation material of substrate.In this case, mobile swimmingly in order to make vapor deposition source when the Linear-moving of vapor deposition source, should in service line also vacuum chamber, move.
Therefore, for outmodedization or the line interruption phenomenon that prevents service line, and have in vacuum chamber, to provide in the state identical with the atmospheric pressure state of the outside of vacuum chamber movably mode to carry out necessity that distribution is processed to service line.
Summary of the invention
Problem of the present invention is to provide a kind of can make swimmingly linearly moving service line (or the equipment installation: the phenomenons such as outmodedization Utility Line) or line interruption that prevents simultaneously of vapor deposition source, and can when the Linear-moving of vapor deposition source, the action of service line be minimized, thereby can prevent the evaporation coating device of the snarl phenomenon of service line.
Be used for reaching the evaporation coating device of the present invention of above-mentioned problem, comprise: vacuum chamber; Vapor deposition source, it is arranged on the inside of above-mentioned vacuum chamber; The vapor deposition source driving part, it makes above-mentioned vapor deposition source carry out Linear-moving with respect to the substrate of the inside of above-mentioned vacuum chamber; Guide arm, one end of its guide arm is drawn out to the outside of above-mentioned vacuum chamber, the service line that is connected with above-mentioned vapor deposition source is accommodated in the other end of this guide arm, and make above-mentioned service line be drawn out to the outside of above-mentioned vacuum chamber by an end of this guide arm, can be combined with above-mentioned vapor deposition source pivot in the other end of this guide arm, and this conductive arms Linear-moving of following above-mentioned vapor deposition source slides to length direction when carrying out rotational action; And sliding guidance section, it is arranged on above-mentioned vacuum chamber and the above-mentioned guide arm with the state of keeping sealing, is used for the slip of guiding guide arm.
According to the present invention, inside from service line to the vacuum state of vacuum chamber that do not expose and be housed in arm because of, and can be in the state identical with the state of the outside of vacuum chamber, thereby can prevent the phenomenons such as outmodedization of service line or line interruption, and can make vapor deposition source utilize arm and Linear-moving swimmingly.
According to the present invention, because the inside of guide arm has linear space service line can be set easily.And, because of the action that is directed to the service line that arm accommodates is minimized can rotate at the axle of guide arm as the time prevent the snarl phenomenon of service line.
Description of drawings
Fig. 1 represents the according to an embodiment of the invention structure iron of evaporation coating device.
Fig. 2 is in the presentation graphs 1, the side-view of the Linear-moving state of vapor deposition source.
Fig. 3 is in the presentation graphs 1, is provided with the accompanying drawing of the example of variable-length section at guide arm.
Fig. 4 is in the presentation graphs 1, and the accompanying drawing of articulate example is set at guide arm.
Fig. 5 is in the presentation graphs 4, the accompanying drawing of the state that vapor deposition source moves to substrate-side.
Fig. 6 is in the presentation graphs 4, is provided with the accompanying drawing of the example of turning unit at guide arm.
Fig. 7 is in the presentation graphs 1, and guide arm is with the sectional view of the structure of the mode combination that is separable into two parts.
(description of reference numerals)
110: vacuum chamber 120: vapor deposition source
130: vapor deposition source driving part 140: guide arm
142,143: joint 146: turning unit
150: service line 160: sliding guidance section
161: 162: the first sealing elements of exterior tube
163: extensible member 170: guiding mechanism
Embodiment
Below, by the reference accompanying drawing the present invention according to preferred embodiment is elaborated.
Fig. 1 represents the according to an embodiment of the invention structure iron of evaporation coating device, and Fig. 2 is in the presentation graphs 1, the side-view of the Linear-moving state of vapor deposition source.
With reference to Fig. 1 and Fig. 2, evaporation coating device comprises vacuum chamber 110, vapor deposition source 120, vapor deposition source driving part 130, guide arm 140 and sliding guidance section 160.
Vacuum state is kept in the internal space of vacuum chamber 110 when substrate 10 is carried out the film vapor deposition operation.Evaporation operation for substrate 10 can be made of various ways.For example, under the state that substrate 10 erects in vertical mode in the inside of vacuum chamber 110, vapor deposition source 120 is carried out Linear-moving with level or vertical mode, and supplies with evaporation material to the surface of substrate 10, thereby can be at the surperficial evaporated film of substrate 10.At this moment, when forming the film of preassigned pattern on the surface of substrate 10, can substrate 10 by configuration image mask 20 of evaporation.And, between pattern mask 20 and the substrate 10, can position by locating device 30.For example, under the state that substrate 10 is fixed by the position, utilize locating device 30 to make pattern mask 20 go forward side by side/rotate, thereby 20 pairs of substrates 10 of pattern mask are located in the mode of desired location.
Vapor deposition source driving part 130 makes vapor deposition source 120 carry out Linear-moving with respect to substrate 10.One example is, vapor deposition source driving part 130 can comprise linear actuator 131 and linear steering device 132, and described linear actuator 131 is provided for making vapor deposition source 120 linearly moving motivating forces, the Linear-moving of described linear steering device 132 guiding vapor deposition source 120.Linear actuator 131 can comprise spherical spiral and motor etc.
For example, the state identical with the state of the outside of vacuum chamber 110 can be held in the inside of guide arm 140.When the state of the outside of vacuum chamber 110 was atmospheric pressure state, atmospheric pressure state also can be held in the inside of guide arm 140.Therefore, service line 150 can be connected to vapor deposition source 120 through the inside of the guide arm 140 of atmospheric pressure state.Guide arm 140 can be made of variform, and as an example, this guide arm 140 can be made of the tubular attitude of hollow.
Although illustrate vapor deposition source 120 according to guide arm 140 and carry out in a horizontal manner linearly moving example, but carry out in the linearly moving situation with vertical mode in vapor deposition source 120, obviously, guide arm 140 can be arranged on by sliding guidance section 160 sidewall of vacuum chamber 110, in order to can guide vapor deposition source 120 to carry out Linear-moving with vertical mode.
Sliding guidance section 160 is arranged on vacuum chamber 110 and guide arm 140 with the state of keeping sealing, guides the slip of guide arm 140.
By reference Fig. 2 to guiding the linearly moving process of vapor deposition source 120 to be described as follows according to described guide arm 140.
At first, if vapor deposition source 120 moves horizontally to the right or moves to the left at middle position, 140 of guide arms carry out axle and rotate work.At this moment, guide arm 140 is by sliding guidance section 160 guided slidable.That is, carry out axle under with the state of keeping specified length at guide arm 140 and rotate when doing, guide the Linear-moving of vapor deposition source 120 by the mode of sliding according to sliding guidance section 160.Therefore, the inside of guide arm 140 can have linear space, thereby service line 150 can easily be set.And, the action of the service line 150 that is housed in guide arm 140 is minimized, thereby when the axle rotation of guide arm 140 is done, prevent the snarl phenomenon of service line 150.
On the other hand, as among Fig. 3 in detail shown in, sliding guidance section 160 can comprise exterior tube 161, the first sealing element 162 and extensible member 163.
One end of exterior tube 161 and vacuum chamber 110 combinations, and the other end of this exterior tube 161 is positioned at the inside of vacuum chamber 110.The mode that exterior tube 161 connects by a part that makes guide arm 140 guides the slip of guide arm 140.In the situation that guide arm 140 is made of this cylinder, exterior tube 161 is made of rounded form, thereby configurable on the axle identical with guide arm 140.At this, the inwall of exterior tube 161 separates from the outer wall of guide arm 140, in order to avoid when guide arm 140 slides to length direction, externally manages between the outer wall of 161 inwall and guide arm 140 and produces friction.
Combining site between the first sealing element 162 sealed external pipes 161 and the vacuum chamber 110.As an example, the first sealing element 162 can be vacuum corrugated pipe (bellows).In this case, vacuum corrugated pipe can be arranged between the outside seal exterior tube 161 and vacuum chamber 110 of vacuum chamber 110.Externally manage 161 axles according to guide arm 140 and rotate when doing action, vacuum corrugated pipe can be out of shape according to the action of exterior tube 161, thereby can keep the sealed state between exterior tube 161 and the vacuum chamber 110.
In the situation that guide arm 140 is drawn by sliding guidance section 160, on derivative end, guiding mechanism 170 can be set.The action of the end of guiding guide arm 140 when guiding mechanism 170 moves according to the Linear-moving of vapor deposition source 120 in the derivative end of guide arm 140.Guiding mechanism 170 can comprise wire drum.As shown in Figure 2, an end of wire drum is connected to the derivative end of guide arm 140.Wire drum is by according to the derivative end position of guide arm 140 and crooked mode is moved, thereby can be guided out the action of the end of guide arm 140.
As shown in Figure 4, in guide arm 140, can arrange by at least one joint of the second sealing element 144 sealings.At this, guide arm 140 can form and utilize the joint to separating with substrate 10 or the direction of adjacency is crooked or launch.For example, guide arm 140 is made of the first arm 141a, the second arm 141b and the 3rd arm 141c, and can between the first arm 141a and the second arm 141b the first joint 142 be set, and can between the second arm 141b and the 3rd arm 141c second joint 143 be set.At this, each rotary middle spindle of the first joint 142, second joint 143 is configured to the linearly moving direction towards vapor deposition source 120, make guide arm 140 by the first joint 142, second joint 143 to separating with substrate 10 or the direction of adjacency is crooked or launch.
The inside of the second sealing element 144 guide arm 140 in the first joint 142, second joint 143 is by the vacuum-sealing of vacuum chamber 110.As the second sealing element 144, can use vacuum corrugated pipe.
Described the first joint 142, second joint 143 as shown in Figure 5, even vapor deposition source 120 is directed to mechanism guides and to substrate 10 side shiftings, also can make guide arm 140 by the first joint 142, second joint 143 bendings.Therefore, the distance with respect to the vapor deposition source 120 of substrate 10 also can change.Because can be by changing the angle of inclination with respect to the guide arm 140 of vapor deposition source 120, thereby easily connect guide arm 140 and vapor deposition source 120, thereby, can prevent the phenomenon of the combining site breakage between guide arm 140 and the vapor deposition source 120.And, have at guide arm 140 under the situation of the first joint 142, second joint 143, because of easily assembly and disassembly, so be conducive to safeguard.The quantity in joint is not limited to joint quantity as shown in the figure.
Another example is, guide arm 140 also can form and utilize the first joint 142, second joint 143 and crooked or launch to the Linear-moving direction of vapor deposition source 120.In this case, each rotary middle spindle of the first joint 142, second joint 143 be configured to towards with substrate 10 direction in opposite directions, make guide arm 140 utilize the first joint 142, second joint 143 crooked or launch to the Linear-moving direction of vapor deposition source 120.
As shown in Figure 6, at guide arm 140 turning unit 146 can also be set.Turning unit 146 can be to make guide arm 140 carry out relative the rotation with vapor deposition source 120 centered by the axle of the length direction of guide arm 140.For example, turning unit 146 can be fixed on the 3rd arm 141c.And turning unit 146 rotatable modes are bearing in the connection section 121 that connects the 3rd arm 141c and vapor deposition source 120.At this, turning unit 146 is by being bearing in connection section 121 in the mode that is rotated centered by the axle of the length direction of guide arm 140.
If turning unit 146 then can make the 3rd arm 141c rotation with respect to connection section 121 rotations, thereby can make whole guide arm 140 with respect to vapor deposition source 120 rotations.Therefore, even the error of shift motion occurs when vapor deposition source 120 Linear-moving, guide arm 140 also can be with respect to vapor deposition source 120 rotation, thus positive error more.At this moment, also can prevent the breakage of guide arm 140.
As shown in Figure 7, guide arm 140 can consist of with the structure of the mode combination that is separable into two parts at least.For example, guide arm 140 can comprise the first shell 140a, the second housing 140b that is divided into two parts to length direction.The first shell 140a combines separably with second housing 140b, and under the state that combines, provides the space of accommodating service line 150.
Combining site between the first shell 140a and the second housing 140b can be by sealing such as the sealing element 140c of O type circle etc.Because guide arm 140 utilizes the first shell 140a, second housing 140b easily assembles or decomposes, thereby, can be conducive to safeguard the service line 150 of the inside that is housed in this guide arm 140.On the other hand, in the situation that guide arm 140 is made of the first arm 141a, the second arm 141b and the 3rd arm 141c, the first arm 141a, the second arm 141b and the 3rd arm 141c can be made of the structure with the mode combination that is separable into two parts respectively.
Above, a shown embodiment describes the present invention with reference to accompanying drawing, but only as exemplary illustration, the general technical staff of the technical field of the invention should be appreciated that and can carry out according to the present invention various distortion and other impartial embodiment.Therefore, real protection domain of the present invention should be defined by the claims.
Claims (12)
1. an evaporation coating device is characterized in that, comprising:
Vacuum chamber;
Vapor deposition source, it is arranged on the inside of above-mentioned vacuum chamber;
The vapor deposition source driving part, it makes above-mentioned vapor deposition source carry out Linear-moving with respect to the substrate of the inside of above-mentioned vacuum chamber;
Guide arm, it is outside that the one end is drawn out to above-mentioned vacuum chamber, the service line that is connected with above-mentioned vapor deposition source is accommodated in the other end, end by this guide arm makes above-mentioned service line be drawn out to the outside of above-mentioned vacuum chamber, can be combined with above-mentioned vapor deposition source pivot in the other end of this guide arm, and this guide arm Linear-moving of following above-mentioned vapor deposition source carries out axle and rotates when doing and slide to length direction; And
Sliding guidance section, it is arranged on above-mentioned vacuum chamber and guide arm with the state of keeping sealing, is used for guiding the slip of above-mentioned guide arm.
2. evaporation coating device according to claim 1 is characterized in that, above-mentioned sliding guidance section comprises:
Exterior tube, be combined with above-mentioned vacuum chamber in the one end, and the other end is positioned at the inside of above-mentioned vacuum chamber, and the mode that this exterior tube connects by a part that makes above-mentioned guide arm guides the slip of above-mentioned guide arm;
The first sealing element, it is used for the combining site between sealing said external pipe and the vacuum chamber; And
Extensible member, it seals between said external pipe and the guide arm in above-mentioned vacuum chamber, and carries out expanding-contracting action according to the slip direction of above-mentioned guide arm.
3. evaporation coating device according to claim 2 is characterized in that, above-mentioned the first sealing element and extensible member are respectively vacuum corrugated pipe.
4. evaporation coating device according to claim 1 is characterized in that, comprises guiding mechanism, and this guiding mechanism is used for guiding when moving along with the Linear-moving of above-mentioned vapor deposition source in an end of above-mentioned guide arm the action of an end of above-mentioned guide arm.
5. evaporation coating device according to claim 4 is characterized in that, above-mentioned guiding mechanism is wire drum.
6. evaporation coating device according to claim 1 is characterized in that, above-mentioned guide arm has by at least one joint of the second sealing element sealing.
7. evaporation coating device according to claim 6 is characterized in that, above-mentioned the second sealing element is vacuum corrugated pipe.
8. evaporation coating device according to claim 6 is characterized in that, above-mentioned guide arm forms above-mentioned joint to separating with substrate or the direction of adjacency is crooked or launch.
9. evaporation coating device according to claim 6 is characterized in that, above-mentioned guide arm utilizes the crooked or expansion to the linearly moving direction of above-mentioned vapor deposition source of above-mentioned joint.
10. evaporation coating device according to claim 1 is characterized in that, comprises turning unit, and this turning unit can make above-mentioned guide arm and vapor deposition source to carry out relative the rotation centered by the axle of the length direction of above-mentioned guide arm.
11. evaporation coating device according to claim 1 is characterized in that, above-mentioned guide arm is made of the structure with the mode combination that can be separated into two parts at least.
12. evaporation coating device according to claim 1 is characterized in that, the inside of above-mentioned guide arm has the state identical with the external status of above-mentioned vacuum chamber.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20110069661 | 2011-07-13 | ||
| KR10-2011-0069661 | 2011-07-13 | ||
| KR10-2011-0100094 | 2011-09-30 | ||
| KR1020110100094A KR20130009547A (en) | 2011-07-13 | 2011-09-30 | Deposition apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102877028A true CN102877028A (en) | 2013-01-16 |
Family
ID=47478537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012102408459A Pending CN102877028A (en) | 2011-07-13 | 2012-07-11 | Vapor deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102877028A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105695939A (en) * | 2016-04-26 | 2016-06-22 | 京东方科技集团股份有限公司 | Linear evaporation source and vacuum evaporation device and method |
| CN108300966A (en) * | 2017-01-12 | 2018-07-20 | Ald真空技术股份有限公司 | Device and method for coating workpieces |
| CN108966658A (en) * | 2017-03-17 | 2018-12-07 | 应用材料公司 | Depositing device, vacuum system and the method for operating depositing device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61251785A (en) * | 1985-04-30 | 1986-11-08 | 日本原子力研究所 | Repair device for inner wall of vacuum vessel |
| JPH0693428A (en) * | 1991-12-20 | 1994-04-05 | Ulvac Japan Ltd | Shutter mechanism of evaporating source for vacuum vapor deposition device |
-
2012
- 2012-07-11 CN CN2012102408459A patent/CN102877028A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61251785A (en) * | 1985-04-30 | 1986-11-08 | 日本原子力研究所 | Repair device for inner wall of vacuum vessel |
| JPH0693428A (en) * | 1991-12-20 | 1994-04-05 | Ulvac Japan Ltd | Shutter mechanism of evaporating source for vacuum vapor deposition device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105695939A (en) * | 2016-04-26 | 2016-06-22 | 京东方科技集团股份有限公司 | Linear evaporation source and vacuum evaporation device and method |
| CN108300966A (en) * | 2017-01-12 | 2018-07-20 | Ald真空技术股份有限公司 | Device and method for coating workpieces |
| CN108300966B (en) * | 2017-01-12 | 2022-03-01 | Ald真空技术股份有限公司 | Apparatus and method for coating workpieces |
| CN108966658A (en) * | 2017-03-17 | 2018-12-07 | 应用材料公司 | Depositing device, vacuum system and the method for operating depositing device |
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Application publication date: 20130116 |