CN102862103B - 抛光装置 - Google Patents
抛光装置 Download PDFInfo
- Publication number
- CN102862103B CN102862103B CN201110189538.8A CN201110189538A CN102862103B CN 102862103 B CN102862103 B CN 102862103B CN 201110189538 A CN201110189538 A CN 201110189538A CN 102862103 B CN102862103 B CN 102862103B
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- Prior art keywords
- polished
- rotating shaft
- silicon wafer
- polishing
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110189538.8A CN102862103B (zh) | 2011-07-07 | 抛光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110189538.8A CN102862103B (zh) | 2011-07-07 | 抛光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102862103A CN102862103A (zh) | 2013-01-09 |
CN102862103B true CN102862103B (zh) | 2016-12-14 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1002363A7 (fr) * | 1988-08-17 | 1991-01-15 | Colot Paul | Engin pour la realisation et la mise en oeuvre du sillon poli et inalterable dans un materiau pierreux et pour la realisation de lignes polies sur materiau pierreux. partie : ligne en arc de cercle et segments de droite. |
JP2000079544A (ja) * | 1998-09-02 | 2000-03-21 | Sony Corp | 盤状体の研削装置 |
CN1484567A (zh) * | 2001-01-04 | 2004-03-24 | 科林研发公司 | 使用表面面积减少的抛光片使半导体晶片抛光和平坦化的系统和方法 |
CN101058169A (zh) * | 2006-02-15 | 2007-10-24 | 应用材料股份有限公司 | 抛光表面 |
CN101716585A (zh) * | 2009-12-14 | 2010-06-02 | 中国电子科技集团公司第四十五研究所 | 化学机械抛光设备硅片清洗装置 |
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1002363A7 (fr) * | 1988-08-17 | 1991-01-15 | Colot Paul | Engin pour la realisation et la mise en oeuvre du sillon poli et inalterable dans un materiau pierreux et pour la realisation de lignes polies sur materiau pierreux. partie : ligne en arc de cercle et segments de droite. |
JP2000079544A (ja) * | 1998-09-02 | 2000-03-21 | Sony Corp | 盤状体の研削装置 |
CN1484567A (zh) * | 2001-01-04 | 2004-03-24 | 科林研发公司 | 使用表面面积减少的抛光片使半导体晶片抛光和平坦化的系统和方法 |
CN101058169A (zh) * | 2006-02-15 | 2007-10-24 | 应用材料股份有限公司 | 抛光表面 |
CN101716585A (zh) * | 2009-12-14 | 2010-06-02 | 中国电子科技集团公司第四十五研究所 | 化学机械抛光设备硅片清洗装置 |
Non-Patent Citations (1)
Title |
---|
公自转磁流变抛光循环装置及其稳定性;左巍 等;《清华大学学报》;20100731;第50卷(第7期);1000-1004 * |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171017 Address after: No. 889, Foxconn Road, Yushan Town, Kunshan, Jiangsu Patentee after: Fuyu precise component (Kunshan) Co., Ltd. Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two Co-patentee before: Hon Hai Precision Industry Co., Ltd. Patentee before: Hongfujin Precise Industry (Shenzhen) Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20161214 Termination date: 20200707 |