CN102844461A - 用调质材料内涂覆功能层的方法 - Google Patents

用调质材料内涂覆功能层的方法 Download PDF

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Publication number
CN102844461A
CN102844461A CN2011800193259A CN201180019325A CN102844461A CN 102844461 A CN102844461 A CN 102844461A CN 2011800193259 A CN2011800193259 A CN 2011800193259A CN 201180019325 A CN201180019325 A CN 201180019325A CN 102844461 A CN102844461 A CN 102844461A
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CN
China
Prior art keywords
layer
base material
precursor
pores
functional layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011800193259A
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English (en)
Chinese (zh)
Inventor
R.瓦森
F.冯达伦
D.塞博尔德
D.E.马克
G.莫尔
D.施特弗
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Forschungszentrum Juelich GmbH
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Forschungszentrum Juelich GmbH
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Filing date
Publication date
Application filed by Forschungszentrum Juelich GmbH filed Critical Forschungszentrum Juelich GmbH
Publication of CN102844461A publication Critical patent/CN102844461A/zh
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28B—SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS; SHAPING SLAG; SHAPING MIXTURES CONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER
    • B28B19/00—Machines or methods for applying the material to surfaces to form a permanent layer thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
    • F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
    • F01D5/12—Blades
    • F01D5/28—Selecting particular materials; Particular measures relating thereto; Measures against erosion or corrosion
    • F01D5/288—Protective coatings for blades
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/24997—Of metal-containing material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
CN2011800193259A 2010-04-16 2011-04-05 用调质材料内涂覆功能层的方法 Pending CN102844461A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102010015470.9 2010-04-16
DE201010015470 DE102010015470A1 (de) 2010-04-16 2010-04-16 Verfahren zur Innenbeschichtung von Funktionsschichten mit einem Vergütungsmaterial
PCT/DE2011/000370 WO2011127896A1 (de) 2010-04-16 2011-04-05 Verfahren zur innenbeschichtung von funktionsschichten mit einem vergütungsmaterial.

Publications (1)

Publication Number Publication Date
CN102844461A true CN102844461A (zh) 2012-12-26

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011800193259A Pending CN102844461A (zh) 2010-04-16 2011-04-05 用调质材料内涂覆功能层的方法

Country Status (6)

Country Link
US (1) US20130196141A1 (enExample)
EP (1) EP2558611A1 (enExample)
JP (1) JP2013525599A (enExample)
CN (1) CN102844461A (enExample)
DE (1) DE102010015470A1 (enExample)
WO (1) WO2011127896A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116234784A (zh) * 2020-09-29 2023-06-06 赛峰集团陶瓷 制造环境屏障的方法

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* Cited by examiner, † Cited by third party
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US9290836B2 (en) * 2012-08-17 2016-03-22 General Electric Company Crack-resistant environmental barrier coatings
US11326253B2 (en) 2016-04-27 2022-05-10 Applied Materials, Inc. Atomic layer deposition of protective coatings for semiconductor process chamber components
US10186400B2 (en) 2017-01-20 2019-01-22 Applied Materials, Inc. Multi-layer plasma resistant coating by atomic layer deposition
US10975469B2 (en) * 2017-03-17 2021-04-13 Applied Materials, Inc. Plasma resistant coating of porous body by atomic layer deposition
US11473197B2 (en) 2018-03-16 2022-10-18 Raytheon Technologies Corporation HPC and HPT disks coated by atomic layer deposition
US10443126B1 (en) 2018-04-06 2019-10-15 Applied Materials, Inc. Zone-controlled rare-earth oxide ALD and CVD coatings
EP3784815A4 (en) * 2018-04-27 2021-11-03 Applied Materials, Inc. PROTECTION OF COMPONENTS AGAINST CORROSION
US11053855B2 (en) 2019-06-06 2021-07-06 Raytheon Technologies Corporation Reflective coating and coating process therefor
EP3754049A1 (en) * 2019-06-21 2020-12-23 Raytheon Technologies Corporation Reactive thermal barrier coating
CN113529075B (zh) * 2020-04-20 2022-05-03 厦门大学 一种液态金属复合多孔膜及其制备方法和应用

Citations (2)

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Publication number Priority date Publication date Assignee Title
US20050202168A1 (en) * 2002-08-16 2005-09-15 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components

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EP0852223A1 (en) * 1996-12-04 1998-07-08 European Atomic Energy Community (Euratom) Method of sealing open-pore ceramic coatings, in particular thermal barriers
US6887588B2 (en) * 2001-09-21 2005-05-03 General Electric Company Article protected by thermal barrier coating having a sintering inhibitor, and its fabrication
DE10200803A1 (de) 2002-01-11 2003-07-31 Forschungszentrum Juelich Gmbh Herstellung eines keramischen Werkstoffes für eine Wärmedämmschicht sowie eine den Werkstoff enthaltene Wärmedämmschicht
US20050287826A1 (en) * 2004-06-29 2005-12-29 Abell Thomas J Method of sealing low-k dielectrics and devices made thereby
CA2605905A1 (en) * 2005-03-22 2006-09-28 Stuart G. Burchill, Jr. Highly porous coated fine particles, composition, and method of production
US7678712B2 (en) * 2005-03-22 2010-03-16 Honeywell International, Inc. Vapor phase treatment of dielectric materials
US8039050B2 (en) * 2005-12-21 2011-10-18 Geo2 Technologies, Inc. Method and apparatus for strengthening a porous substrate
FI20095630A0 (fi) * 2009-06-05 2009-06-05 Beneq Oy Suojapinnoitus, menetelmä alustan suojaamiseksi ja menetelmän käyttö

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050202168A1 (en) * 2002-08-16 2005-09-15 General Electric Company Thermally-stabilized thermal barrier coating and process therefor
US7285312B2 (en) * 2004-01-16 2007-10-23 Honeywell International, Inc. Atomic layer deposition for turbine components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116234784A (zh) * 2020-09-29 2023-06-06 赛峰集团陶瓷 制造环境屏障的方法

Also Published As

Publication number Publication date
US20130196141A1 (en) 2013-08-01
JP2013525599A (ja) 2013-06-20
EP2558611A1 (de) 2013-02-20
DE102010015470A1 (de) 2011-10-20
WO2011127896A1 (de) 2011-10-20

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Application publication date: 20121226