CN102759796B - Optical calibration technology of multi-degree-of-freedom imaging optical system for computed-generated holographic multi-point instantaneous positioning - Google Patents

Optical calibration technology of multi-degree-of-freedom imaging optical system for computed-generated holographic multi-point instantaneous positioning Download PDF

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CN102759796B
CN102759796B CN201210142495.2A CN201210142495A CN102759796B CN 102759796 B CN102759796 B CN 102759796B CN 201210142495 A CN201210142495 A CN 201210142495A CN 102759796 B CN102759796 B CN 102759796B
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optical system
school
light source
mark
light
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CN102759796A (en
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于清华
孙胜利
段东
曲荣生
陈凡胜
李欣耀
肖金才
王宝勇
金钢
杨林
陆强
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Shanghai Institute of Technical Physics of CAS
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Shanghai Institute of Technical Physics of CAS
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Abstract

The invention discloses an optical calibration technology of a multi-degree-of-freedom imaging optical system for computer-generated holographic multi-point instantaneous positioning. According to the optical calibration technology, a holographic image is designed according to the positioning requirement of various optical elements of an imaging optical system to be mounted and calibrated and a mechanical reference, so that light beams are diffracted and imaged by a computer-generated holographic image to form a set of marking images; the marking images correspond to the optical element of the imaging optical system to be mounted and calibrated and the reference of mechanical assembly parts; relative space positions of the marking images correspond to relative space positions of the optical elements of the imaging optical system to be mounted and calibrated and the reference of mechanical assembly parts; and the set of the marking images forms a stereogram of the optical system to be mounted and calibrated. In the mounting and calibrating process of the imaging optical system, various optical elements of an imaging optical system to be mounted and calibrated and the reference of mechanical assembly parts are aligned to corresponding marking images, and thus coarse tuning of the imaging optical system is finished and further the imaging optical system to be mounted and calibrated enters an interferogram phase; and then fine tuning is finished by a computer-aided aberration decoupling technology.

Description

Multiple degrees of freedom imaging optical system light school, calculation holographic multi-point transient location technology
Technical field
The present invention relates to optical system light school technology, particularly multiple degrees of freedom imaging optical system light school, a kind of calculation holographic multi-point transient location technology.
Technical background
Have the imaging optical system of Rotational Symmetry central shaft for tradition, it adopts the optical element with Rotational Symmetry central shaft, and such as spherical mirror, high order aspheric surface mirror, its supporting construction has Rotational Symmetry central shaft equally.Debuging of such imaging optical system utilizes this Rotational Symmetry characteristic to fill school, and its dress school technology is relatively ripe, and assembly tool is perfect, such as transit, Eccentric Instrument, standard length bar etc.
Along with disappear from axle three-mirror reflective astigmatism optical texture and multiple degrees of freedom Random Curved Surface Designing, processing and inspection technology development, the multiple degrees of freedom optics list mirror productive life that has incorporated people gradually, such as automobile lamp, duplicating machine, printer and color CRT etc.
From axle three-mirror reflective disappear astigmatism optical texture adopt optics list mirror mostly be from axle high order aspheric surface, rotation axes of symmetry is positioned at outside mirror body, from axle high order aspheric surface list mirror self out-of-shape.Multiple degrees of freedom freeform optics surface is because of axis of symmetry without spin, out-of-shape and gaining the name.The irregular multiple degrees of freedom optical surface of these present situations, sphere and high order aspheric surface have more freedom relatively, and it is stronger that it improves optical image mass-energy, has the advantages such as the optical instrument of reducing size and weight, therefore, extensively discussed.
Multiple degrees of freedom optical system, because having multiple degrees of freedom, has been difficult to multiple degrees of freedom imaging optical system dress school by traditional imaging optical system dress calibration method used.
At present, domestic Duo Jia unit develops from axle three-mirror reflective imaging optical system, but because of using from axle that the single mirror adopting is high order aspheric surface, therefore, the dress calibration method of employing is continued to use the dress calibration method of traditional imaging optical system.Meanwhile, the domestic discussion to multiple degrees of freedom free form surface imaging optical system rests on the design phase, and the dress school technology of multiple degrees of freedom free form surface imaging optical system does not break through not yet.
In the world, U.S. NASA is the IRMOS imaging spectrometer of Kitt Peak country observational astronomy platform development, and the SCUBA-2 multi-object telescope of James Clark Maxwell Telescope has adopted multiple degrees of freedom freeform optics surface list mirror.The tolerance of these two cameras is pine relatively, translation tolerance is 0.125mm, inclination tolerance is 0.016 degree, its dress school relies on machining precision completely and ensures, therefore, support frame adopts one processing, and the processing of reference field is 0.025mm at the scope inner plane degree of 1.2m × 2.4m, thereby the positioning precision that has ensured dress school, camera encircled energy halfwidth is 55um.
In sum, multiple degrees of freedom freeform optics surface is improved, is improved imaging optical system aspect of performance and has clear superiority at aberration, obtain extensive discussions, but the dress calibration method of multiple degrees of freedom free form surface imaging optical system is still in the exploratory stage, and the advantage performance of freeform optics surface is restricted.
Summary of the invention
This technological invention is to propose for a multiple degrees of freedom high-precision optical instrument dress school difficult problem, solves a dress school difficult problem for part optical texture form, advances the application of multiple degrees of freedom high-precision optical free form surface in imaging optical system.
This dress school technology is to adopt light beam hologram image diffraction imaging as calculated, form with each optical element in the optical system of school to be installed and machinery organize parts benchmark corresponding ' mark ' as set, in the process of optical system bulk cargo school, by the benchmark of each optical element of school to be installed imaging optical system and mechanical group of portion with corresponding ' mark ' as aligning, thereby complete the coarse adjustment of imaging optical system, make school to be installed imaging optical system enter the interferogram stage, afterwards, utilize area of computer aided aberration decoupling technology to complete accurate adjustment.
Technical scheme
Each optical element or component of machine can be considered as a rigid body, and on it, three points, a space curve or other complex space figures all can indicate its locus.The complete optical instrument in dress school can be considered as a rigid body equally, also be the set of the ray machine parts rigid body of this optical instrument of composition simultaneously, therefore the locus, and between corresponding point, space curve or other complex space figures of ray machine parts is relative fixing.
Along with the development of calculation holographic technology, can make diversified calculation holographic pattern.Light can produce different picture through different calculation holographic patterns.When the benchmark of optical element and component of machine in different picture and school to be installed optical system is at once, these pictures become indicate in the optical system of school to be installed optical element and the reference space position of component of machine and ' mark ' of shape as.' mark ' as set become ' stereographic map ' of school to be installed optical system.
Based on above-mentioned analysis, this dress school technical scheme mainly comprise dress school light path design, build, coarse adjustment and the accurate adjustment of optical system.
The design of dress school light path divides the following steps:
1) scheme by the structure mould dress of school to be installed optical system, specify the design feature of school to be installed optical system, find an angle, the light source that makes to fill school light path can be seen the optical element in all or part school to be installed in the optical system of school to be installed simultaneously and component of machine is local or all.
2) on the optical element and component of machine in dress school, the visible position of the light source design basis of dress school light path, this benchmark can be the spatial complex figures such as point, line, crosshair, ring or polygon etc., in processing testing process, this benchmark is carved or is indicated on optical element and component of machine, and the processing and fabricating of benchmark or the precision of sign are determined by the coarse adjustment tolerance of school to be installed optical system.
3), according to 2) the middle benchmark designing, design dress school light path, dress school light path comprises light source and calculation holographic plate, wherein, calculation holographic plate designs multiple area of the pattern, each area of the pattern has different functions, the optical element in corresponding school to be installed and the benchmark of component of machine ' mark ' are as locating with light source respectively, when light source incides on the pattern of light source location, diffraction returns along original optical path, interfere with the reference light in interferometer, in order to the location between light source and calculation holographic plate, when light source incide benchmark ' mark ' as pattern on, diffraction imaging, and with 2) in design benchmark corresponding, ' mark ' that becomes its space as, in order to locate school to be installed optical element and mechanical component.The design of calculation holographic plate pattern, according to the relative position of light source type, light source and holographic plate, holographic plate and treat ' mark ' in relative position and ' stereographic map ' of ' stereographic map ' of school optical system as with the corresponding relation of mechanical-optical setup benchmark, Optimal design and calculation hologram pattern.For the location between light source and calculation holographic plate, the light source location pattern on calculation holographic plate, is incident to light source location pattern with light source, and diffraction returns along original optical path, interferes with the reference light in interferometer, and producing 0 speckle pattern interferometry pattern is design standards.Light source as calculated the benchmark ' mark ' on holographic plate as ' mark ' of pattern generating as.As required, ' mark ' is as being the spatial complex figures such as point, line, crosshair, ring or polygon.' mark ', as corresponding one by one with the ray machine benchmark in the light path of school to be installed, its corresponding relation comprises locus and shape facility.' mark ' as linear precision and positional precision determined by the coarse adjustment tolerance of school to be installed optical system.
The building method of dress school light path is: the light source of dress school light path adopts interferometer light source, can be parallel light source, can be also sphere light source.Make the incident of interferometer light source coverage holographic plate, adjust the position of interferometer and calculation holographic plate, the beam diffraction that order is incident to light source location pattern returns along original optical path, interfere with the reference light in interferometer, when interference figure 0 striped, and incide benchmark ' mark ' as the beam diffraction of pattern become ' mark ' as time, dress school light path is adjusted complete;
Optical system coarse adjustment is: after the building of school to be installed light path, ' mark ' that the benchmark of the optical element of school to be installed optics and component of machine is produced with dress school light path as aiming at, thereby make school to be installed optical system produce interferogram;
Optical system accurate adjustment is, in the time that school to be installed optical system produces interferogram, utilize area of computer aided aberration decoupling technology, from interferogram, demodulate school to be installed optical system misalignment rate, and regulate, thereby make school to be installed optical system arrive expection picture element, thereby the dress school that completes imaging optical system.
This dress school technology has advantages of that positioning precision is high, the interpretation of position of optical element error is directly perceived, assembly period is short.
Brief description of the drawings
Fig. 1: optics list mirror and on datum line.
Fig. 2: the optics list mirror of three mark location of a use, wherein, in figure, mark 1, mark 2 and mark 3 are crosshair, corresponding with benchmark 1, benchmark 2 and benchmark 3 in Fig. 1 respectively.
Fig. 3: optical system and for indicating ' mark ' set of whole optical system position of optical element, wherein, optics list mirror 1 and optics list mirror 3 indicate with two groups of three crosshairs respectively, spatial loop mark of optics list mirror 2 use, mark 1, mark 2, mark 3, mark 4, mark 5, mark 6 and Marking ring form optical system space ' stereographic map '.
Fig. 4: calculation holographic plate, be divided into eight regions, the corresponding different diffraction of zones of different pattern ' mark ' as with light source positioning function.
Fig. 5: calculation holographic diffraction dress school light path schematic diagram, pointolite as calculated holographic plate diffraction be shaped multiple ' marks ' as set, thereby sketch the contours of ' stereographic map ' of optical system, simultaneously, segment beam is met light source location pattern, diffraction Yan Yuan returns on road, interferes with reference light, thereby for the location, position between light source and calculation holographic plate.
Fig. 6: optical element is assembled to ' mark ' image set and closes optical system ' stereographic map ' position of sketching the contours of, ' mark ' aimed at as the optical element benchmark corresponding with it.
Fig. 7: dress school optical system accurate adjustment light path, the system aberration of dress school optical system obtains by means of interferometer and autocollimatic light path.
Embodiment
With a dress calibration method from axle three-mirror reflective optical system, this technological invention is described.
The every complete optical instrument of optics list mirror and dress school in axle three-mirror reflective optical system can be considered as rigid body.Every optics list mirror and supported mechanical parts, in development process, all can utilize the laser mark of the high-precision line of etching or other complex space figures thereon.
From in axle three-mirror reflective optical system ' optics list mirror 1 ' self out-of-shape as shown in Figure 1.In process, can utilize the laser high-precision line of etching thereon, ' groove of optics list mirror 1 ' is elected the center line of four side planes of optical element as.' mark ' that dress school light path becomes is as ' mark 1 ', ' mark 2 ' and ' mark 3 ' with crisis-cross as in Fig. 2, respectively with ' groove ' in optics list mirror 1 ' benchmark 1 ', ' benchmark 2 ' and ' benchmark 3 ' is corresponding, for indicating ' the position of optics list mirror 1 '.Equally, can be according to the resemblance of optical element, adopt spatial complex figures such as ' spatial loop ' or ' spatial triangle ' to indicate the locus of optical element.
This from axle three-mirror reflective optical system as shown in Figure 3, wherein ' optics list mirror 2 ' back is a plane, side is a face of cylinder, is easy to build spatial relation with physical construction, and therefore ' optics list mirror 1 ' is reference for installation in this school to be installed optical system selection.' optics list mirror 2 ' is easy to and physical construction builds spatial relation, therefore, this dress school light path without design to relevant ' sign ' of physical construction as.
As shown in Figure 3, ' optics list mirror 1 ' is with ' optics list mirror 3 ' is used respectively crisis-cross ' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ' and ' mark 6 ' sign, ' spatial loop ' Marking ring ' sign for optics list mirror 2 '.' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ', ' mark 6 ' and ' Marking ring ' relative position are corresponding with optical element datum line in the optical system model of school to be installed and reference rings locus, sketch the contours of ' stereographic map ' of optical system.
' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ', ' mark 6 ' and ' Marking ring ' and corresponding locus are built calculation holographic diffraction by design and are filled school light path and realize.Calculation holographic plate as shown in Figure 4, its zones of different has different function patterns, the generation ' mark ' that is irradiated to calculation holographic plate when light beam of light source as region produce respectively ' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ', ' mark 6 ' and ' Marking ring ', interferometer light source is irradiated to light source position location, beam diffraction Yan Yuan returns on road with interferometer and interferes, thereby determines the relative position of light source and calculation holographic plate.
Build calculation holographic diffraction dress school light path as shown in Figure 5, sphere light beam of light source as calculated hologram diffraction become ' mark ' as---' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ', ' mark 6 ' and ' Marking ring ' form optical system ' stereographic map '.Afterwards, utilize and calculate auxiliary dress calibration equipment, the school to be installed each optical element of optical system is assembled to the position that ' stereographic map ' that ' mark 1 ' ' mark 2 ', ' mark 3 ', ' mark 4 ', ' mark 5 ', ' mark 6 ' and ' Marking ring ' sketch the contours of indicates, and make ' mark ' to aim at as the optical element datum line corresponding with it and reference rings, as shown in Figure 6, make the interference autocollimatic light path of school to be installed optical system enter the interferogram stage, complete the coarse adjustment of optical system, as shown in Figure 7.Finally, utilize aberration decoupling technology, desirable picture element, the dress school that completes optical system are arrived in optical system picture element dress school.

Claims (4)

1. a calculation holographic multi-point transient location multiple degrees of freedom imaging optical system light calibration method, comprise dress school light path design, build, coarse adjustment and the accurate adjustment of optical system, it is characterized in that:
The design of described dress school light path divides the following steps:
1) scheme by the structure mould dress of school to be installed optical system, specify the design feature of school to be installed optical system, find an angle, the light source that makes to fill school light path can be seen the optical element in all or part school to be installed in the optical system of school to be installed simultaneously and component of machine is local or all;
2) on the optical element and component of machine in dress school, the visible position of the light source design basis of dress school light path, this benchmark can be point, space curve or other complex space figures, in processing testing process, this benchmark is carved or is indicated on optical element and component of machine, and the processing and fabricating of benchmark or the precision of sign are determined by the coarse adjustment tolerance of school to be installed optical system;
3) according to 2) the middle benchmark designing, design dress school light path, dress school light path comprises light source and calculation holographic plate, wherein, calculation holographic plate designs multiple area of the pattern, each area of the pattern has different functions, the optical element in corresponding school to be installed and the benchmark of component of machine ' mark ' are as locating with light source respectively, when light source incides on the pattern of light source location, diffraction returns along original optical path, interfere with the reference light in interferometer, in order to the location between light source and calculation holographic plate, when light source incide benchmark ' mark ' as pattern on, diffraction imaging, and with 2) in design benchmark corresponding, ' mark ' that becomes its space as, in order to locate school to be installed optical element and mechanical component,
The building method of described dress school light path is: the light source of dress school light path adopts interferometer light source, make the incident of interferometer light source coverage holographic plate, adjust the position of interferometer and calculation holographic plate, the beam diffraction that order is incident to light source location pattern returns along original optical path, interfere with the reference light in interferometer, when interference figure 0 striped, and incide benchmark ' mark ' as the beam diffraction of pattern become ' mark ' as time, dress school light path is adjusted complete;
Described optical system coarse adjustment is: after the building of school to be installed light path, ' mark ' that the benchmark of the optical element of school to be installed optics and component of machine is produced with dress school light path as aiming at, thereby make school to be installed optical system produce interferogram;
Described optical system accurate adjustment is, in the time that school to be installed optical system produces interferogram, utilize area of computer aided aberration decoupling technology, from interferogram, demodulate school to be installed optical system misalignment rate, and regulate, thereby make school to be installed optical system arrive expection picture element, thereby the dress school that completes imaging optical system.
2. a kind of calculation holographic multi-point transient according to claim 1 location multiple degrees of freedom imaging optical system light calibration method, it is characterized in that: the method for designing of described calculation holographic plate pattern is as follows: according to the relative position of light source type, light source and holographic plate, holographic plate and treat ' mark ' in relative position and ' stereographic map ' of ' stereographic map ' of school optical system as with the corresponding relation of mechanical-optical setup benchmark, Optimal design and calculation hologram pattern; For the location between light source and calculation holographic plate, the light source location pattern on calculation holographic plate, is incident to light source location pattern with light source, and diffraction returns along original optical path, interferes with the reference light in interferometer, and producing 0 speckle pattern interferometry pattern is design standards; Light source as calculated the benchmark ' mark ' on holographic plate as pattern, ' mark ' that diffraction produces as linear precision and positional precision determined by the coarse adjustment tolerance of school to be installed optical system.
3. a kind of calculation holographic multi-point transient according to claim 1 location multiple degrees of freedom imaging optical system light calibration method, it is characterized in that: ' mark ' that described optical element and the benchmark of component of machine produce with dress school light path is as corresponding, its corresponding relation comprises locus and shape facility, ray machine benchmark and ' mark ' as, as required, can be point, line, crosshair, ring or polygon space figure.
4. a kind of calculation holographic multi-point transient according to claim 1 location multiple degrees of freedom imaging optical system light calibration method, is characterized in that: the light beam that the described interferometer light source that dress school light path adopts sends is plane wave light beam or spherical wave light beam.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080180816A1 (en) * 2007-01-31 2008-07-31 Enplas Corporation Imaging lens and imaging device including the imaging lens
CN101390382A (en) * 2005-12-27 2009-03-18 京瓷株式会社 Imaging device and its image processing method
US20090136580A1 (en) * 2007-09-22 2009-05-28 Boise State University PREFERENTIAL KILLING OF CANCER CELLS AND ACTIVATED HUMAN T CELLS USING ZnO NANOPARTICLES

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101390382A (en) * 2005-12-27 2009-03-18 京瓷株式会社 Imaging device and its image processing method
US20080180816A1 (en) * 2007-01-31 2008-07-31 Enplas Corporation Imaging lens and imaging device including the imaging lens
US20090136580A1 (en) * 2007-09-22 2009-05-28 Boise State University PREFERENTIAL KILLING OF CANCER CELLS AND ACTIVATED HUMAN T CELLS USING ZnO NANOPARTICLES

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
任淑艳等.基于神经网络的锥光全息测量系统校准技术研究.《电子测量与仪器学报》.2010,第24卷(第7期),
基于神经网络的锥光全息测量系统校准技术研究;任淑艳等;《电子测量与仪器学报》;20100731;第24卷(第7期);第616-620页 *

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