CN102658528A - Graded structured composite elastic grinding and polishing disc - Google Patents
Graded structured composite elastic grinding and polishing disc Download PDFInfo
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- CN102658528A CN102658528A CN2012100426397A CN201210042639A CN102658528A CN 102658528 A CN102658528 A CN 102658528A CN 2012100426397 A CN2012100426397 A CN 2012100426397A CN 201210042639 A CN201210042639 A CN 201210042639A CN 102658528 A CN102658528 A CN 102658528A
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Abstract
A graded structured composite elastic grinding and polishing disc comprises a grinding material layer, an adhesive layer and a base layer, wherein the grinding material layer is adhered to the base layer surface via the adhesive layer, and the base layer is connected with a driving device. According to the graded structured composite elastic grinding and polishing disc provided by the invention, a grinding material is consolidated and combined with a composite elastic material to improve quality of the surface of a to-be-processed workpiece and reduce consumption of the grinding material; self-correction capability of the grinding and polishing disc prolongs the service life of the grinding and polishing disc; the space of an inner ring is fully utilized for polishing, the linear speed advantage of an outer ring is exerted for grinding, and grinding and polishing procedures are integrated to improve processing efficiency and save resources; and structured flow passages effectively improve cooling liquid (or polishing liquid) and grinding dust discharge and workpiece surface processing efficiency and processing quality.
Description
Technical field
The present invention relates to a kind of hierarchy composite elastic polishing dish; Integrate and grind and the polishing function; Relate in particular to a kind of grinding and polishing that is applied to optical element, noncrystal membrane substrate etc.; Can effectively improve the flowability of cooling fluid (or polishing fluid), strengthen the participation rate and the cutting effect of abrasive particle, improve the polishing dish of workpiece working (machining) efficiency and quality.
Background technology
Require after workpiece such as optical element, noncrystal membrane substrate machine surface low damnification, flatness good, do not have an obvious cut.Workpiece is in the early stage process, and traditional turning, milling stay tool marks at surface of the work, are difficult to obtain super-smooth surface, and abrasive disk therefore commonly used grinds and polishes surface of the work with polishing disk, in the hope of obtaining high-quality, hanging down the surface of residual stress.
Adopt traditional abrasive disk and polishing disk that optical element and noncrystal membrane substrate etc. are carried out Precision Machining following deficiency is arranged: (1) hard abrasive disk is changed frequent with polishing disk with different processing technology demands; Influence working (machining) efficiency, and the effect of discharging cooling fluid (or polishing fluid) and abrasive dust (abrasive particle that weares and teares or come off and the workpiece material of removal) is relatively poor; (2) because material is removed the inconsistent of characteristic, cause the abrasive wear of abrasive disk and polishing disk zones of different inconsistent, situation such as local pit occur, influence the flatness of surface of the work, the service life of also having reduced abrasive disk and polishing disk simultaneously; (3) lack grind and polishing process between linking, facts have proved only works hard on polishing process does not far reach dreamboat, because the quality of quality of finish is directly relevant with the quality of grinding step; (4) the free abrasive polishing needs a large amount of recycle polishing fluids, compares the fixed abrasive material polishing mode, and the use amount of abrasive material is big, and the processing requirements of abrasive dust is high, and contaminant capacity is big.
Summary of the invention
In order to overcome method of surface finish such as traditional optical element, noncrystal membrane substrate at cooling fluid (or polishing fluid) and abrasive dust discharge capacity; Grind and polishing efficiency; Utilization rate of equipment and installations and service life; The deficiency and the defective of effective participation rate of abrasive particle and workpiece planarization effect aspect; The present invention proposes that a kind of abrasive dust discharge capacity is little, grinding and polishing efficiency, and utilization rate of equipment and installations and service life, effective participation rate of abrasive particle and workpiece planarization effect aspect all show good hierarchy composite elastic polishing dish.
Technical scheme of the present invention: a kind of hierarchy composite elastic polishing dish, its characteristic comprises abrasive material, tack coat and base layer, and said abrasive material is bonded in the base layer surface through tack coat, and said base layer links to each other with drive unit.
Further, said abrasive material is fully mixed by abrasive material such as the diamond of high rigidity or aluminium oxide and high polymer adhesive, light trigger etc., handles through structuring " printing " and photocuring, is bonded in the different matrix laminar surface.
Further, said abrasive material utilization classification theory is provided with and grinds outer ring and polishing inner ring, and said grinding outer ring is divided into corase grind circle, fine grinding circle and correct grinding circle along polishing dish diametric(al) ecto-entad.The wear particle size, the abrasive material proportioning that are comprised in said corase grind circle, fine grinding circle, correct grinding circle and the polishing inner ring are different.The corase grind circle is selected the abrasive material proportioning of high-quality concentration for use, and the present invention adopts 50%～75% mass concentration; The fine grinding circle is selected fine granularity abrasive particle and middle mass concentration proportioning for use with the correct grinding circle, and the present invention adopts 50%～40% and 40%～30% mass concentration; The polishing inner ring is selected fine particle size and low quality concentration proportioning for use, and the present invention adopts the mass concentration about 25%.
Further, said polishing dish is provided with patterned surface, said patterned surface by not on the same group the runner of divergent shape, different geometries such as circular form.
Further, said tack coat constitutes by different types of high polymer cemented dose.
Further, said base layer is processed by the different composite material that comprises rubber.
Technical conceive of the present invention is: according to the size of base layer the abrasive material of high rigidity and high polymer adhesive, light trigger etc. are fully mixed, handle through structuring " printing " and photocuring, be bonded in different base layer surfaces and form abrasive material.Polishing dish with abrasive material is consolidated on the composite elastic layer (composite elastic bonding layer and base layer) is processed, and compares free abrasive processing, and abrasive particle has better cutting state and participation rate, has guaranteed the processing of high efficiency and high-quality.Compare the fixed hard polishing of abrasive material mode; Elastic bonding layer and base layer have guaranteed that abrasive particle has better elastic supporting condition and mechanical behavior restrained condition on microcosmic; Cutting dynamics and the effective participation rate of abrasive particle that surface of the work is certain have been guaranteed; Make revolution mark unordered, meticulous, be not easy to produce obvious cut, and the surface of the work damage is low.The polishing dish adopts the macromolecule water uptake polymer manufacture; Cooling fluid (or polishing fluid) can make it produce the swelling phenomenon; The binding agent of bound abrasive grains softens gradually and under the frictional force effect of abrasive material and surface of the work, the abrasive material of passivation is removed; Form new abrasive material, realize the self-training function of polishing dish.Polishing dish branch grinds outer ring and polishing inner ring, and the grinding outer ring is divided into along the diametric(al) ecto-entad roughly grinds circle, fine grinding circle and correct grinding circle, adopts different composite elastic materials and different abrasive material proportioning and granularity molding bondeds respectively.Add man-hour; Workpiece along polishing dish diametric(al) by extroversion roughly grind successively, fine grinding, correct grinding and polishing, the high linear speed that has effectively utilized the polishing dish to grind the outer ring grinds, and utilizes that cycle space carries out last polishing processing in the polishing; To grind like this with polishing process and be integrated in one; Promoted from being ground to the connecting of polishing, increased the space availability ratio of abrasive disk, improved working (machining) efficiency and also effectively economized on resources.The polishing dish forms patterned surface through structuring " printing "; Cooling fluid in the process (or polishing fluid) and abrasive dust can in time discharge through surperficial runner; Reduce the damage of abrasive dust to surface of the work; Increase contacting of surface of the work and cooling fluid (or polishing fluid), improved surface of the work working (machining) efficiency and crudy.
Beneficial effect of the present invention is: the fixed and composite elastic material combination with abrasive material, improved the workpiece to be machined surface quality, and reduced the use amount of abrasive material; Certainly the correction ability of polishing dish itself has prolonged the service life of polishing dish; The space that makes full use of inner ring is as polishing, and the linear velocity advantage of having brought into play the outer ring is used as grinds, and will grind with polishing process to be integrated in one, and has improved working (machining) efficiency and has practiced thrift resource; The structuring runner has effectively improved the discharging of cooling fluid (or polishing fluid) and abrasive dust, has significantly improved the working (machining) efficiency and the crudy of surface of the work.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Fig. 2 is the patterned surface form sketch map of another kind of hierarchy composite elastic polishing dish.
The specific embodiment
A kind of hierarchy composite elastic polishing dish, its characteristic comprises abrasive material 3, tack coat 2 and base layer 1, and said abrasive material 3 is bonded in base layer 1 surface through tack coat 2, and said base layer 1 links to each other with drive unit.
Said abrasive material 3 is fully mixed by abrasive material such as the diamond of high rigidity or aluminium oxide and high polymer adhesive, light trigger etc., handles through structuring " printing " and photocuring, is bonded in different matrix layer 1 surface.
Said abrasive material 3 utilization classification theories are provided with and grind outer ring 32 and polishing inner ring 31, and said grinding outer ring 32 is divided into corase grind circle 323, fine grinding circle 322 and correct grinding circle 321 along polishing dish diametric(al) ecto-entad.The wear particle size, the abrasive material proportioning that are comprised in said corase grind circle 323, fine grinding circle 322, correct grinding circle 321 and the polishing inner ring 31 are different.Corase grind circle 323 is selected the abrasive material proportioning of high-quality concentration for use, and the present invention adopts 50%～75% mass concentration; Fine grinding circle 322 is selected fine granularity abrasive particle and middle mass concentration proportioning for use with correct grinding circle 321, and the present invention adopts 50%～40% and 40%～30% mass concentration; Polishing inner ring 31 is selected fine particle size and low quality concentration proportioning for use, and the present invention adopts the mass concentration about 25%.
Said polishing dish is provided with patterned surface, said patterned surface by not on the same group the runner 4 of divergent shape, different geometries such as circular form.
Said tack coat 2 constitutes by different types of high polymer cemented dose.
Said base layer 1 is processed by the different composite material that comprises rubber.
Technical conceive of the present invention is: according to the size of base layer 1 abrasive material of high rigidity and high polymer adhesive, light trigger etc. are fully mixed, handle through structuring " printing " and photocuring, be bonded in different base layers 1 surface and form abrasive material 3.Polishing dish with abrasive material is consolidated on the composite elastic layer (composite elastic bonding layer 2 and base layer 1) is processed, and compares the free abrasive processing mode, and abrasive particle has better cutting state and participation rate, has guaranteed the processing of high efficiency and high-quality.Compare the fixed hard polishing of abrasive material mode; Elastic bonding layer 2 has guaranteed that with base layer 1 abrasive particle has better elastic supporting condition and mechanical behavior restrained condition on microcosmic; Cutting dynamics and the effective participation rate of abrasive particle that surface of the work is certain have been guaranteed; Make revolution mark unordered, meticulous, be not easy to produce obvious cut, and the surface of the work damage is low.The polishing dish adopts the macromolecule water uptake polymer manufacture; Cooling fluid (or polishing fluid) can make it produce the swelling phenomenon; The binding agent of bound abrasive grains softens gradually and under the frictional force effect of abrasive material 3 and surface of the work, the abrasive material 3 of passivation is removed; Form new abrasive material 3, realize the self-training function of polishing dish.Polishing dish branch grinds outer ring 32 and polishing inner ring 31, and grinding outer ring 32 is divided into along the diametric(al) ecto-entad roughly grinds circle 323, fine grinding circle 322 and correct grinding circle 321, adopts different composite elastic materials and different abrasive material proportioning and granularity molding bondeds respectively.Add man-hour; Workpiece along polishing dish diametric(al) by extroversion roughly grind successively, fine grinding, correct grinding and polishing, the high linear speed that has effectively utilized the polishing dish to grind outer ring 32 grinds, and utilizes polishing inner ring 31 spaces to carry out last polishing processing; To grind like this with polishing process and be integrated in one; Promoted from being ground to the connecting of polishing, increased the space availability ratio of abrasive disk, improved working (machining) efficiency and also effectively economized on resources.The polishing dish forms patterned surface through structuring " printing "; Cooling fluid in the process (or polishing fluid) and abrasive dust can in time discharge through surperficial runner 4; Reduce the damage of abrasive dust to surface of the work; Increase contacting of surface of the work and cooling fluid (or polishing fluid), improved surface of the work working (machining) efficiency and crudy.The patterned surface of polishing dish can have various ways, and Fig. 2 is the another kind of canonical form of patterned surface.
The described content of this specification embodiment only is enumerating the way of realization of inventive concept; Should not being regarded as of protection scope of the present invention only limits to the concrete form that embodiment states, protection scope of the present invention also reach in those skilled in the art conceive according to the present invention the equivalent technologies means that can expect.
Claims (6)
1. hierarchy composite elastic polishing dish, it is characterized in that: comprise abrasive material, tack coat and base layer, said abrasive material is bonded in the base layer surface through tack coat, and said base layer links to each other with drive unit.
2. a kind of hierarchy composite elastic polishing dish as claimed in claim 1; It is characterized in that: said abrasive material is fully mixed by abrasive materials such as the diamond of high rigidity or aluminium oxide and high polymer adhesive, light trigger etc.; Handle through structuring " printing " and photocuring, be bonded in the different matrix laminar surface.
3. according to claim 1 or claim 2 a kind of hierarchy composite elastic polishing dish; It is characterized in that: said abrasive material comprises grinding outer ring and polishing inner ring; Said grinding outer ring is divided into corase grind circle, fine grinding circle and correct grinding circle along the diametric(al) ecto-entad; The wear particle size that is comprised in said corase grind circle, fine grinding circle, correct grinding circle and the polishing inner ring reduces successively, and the abrasive material proportioning is also different.
4. a kind of hierarchy composite elastic polishing dish as claimed in claim 3, it is characterized in that: said polishing dish is provided with patterned surface, said patterned surface by not on the same group the runner of divergent shape, different geometries such as circular form.
5. a kind of hierarchy composite elastic polishing dish as claimed in claim 4, it is characterized in that: said tack coat constitutes by different types of high polymer cemented dose.
6. a kind of hierarchy composite elastic polishing dish as claimed in claim 5, it is characterized in that: said base layer is processed by the different composite material that comprises rubber.
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| CN2012100426397A CN102658528A (en) | 2012-02-24 | 2012-02-24 | Graded structured composite elastic grinding and polishing disc |
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| CN2012100426397A CN102658528A (en) | 2012-02-24 | 2012-02-24 | Graded structured composite elastic grinding and polishing disc |
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Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103878681A (en) * | 2014-03-06 | 2014-06-25 | 浙江工业大学 | Multi-stage polishing disk with loading device |
| CN103878682A (en) * | 2014-03-06 | 2014-06-25 | 浙江工业大学 | Multistage machining grinding and polishing disk |
| CN104128888A (en) * | 2014-07-25 | 2014-11-05 | 浙江博海金属制品科技有限公司 | Plane polishing machine |
| CN104907919A (en) * | 2015-06-18 | 2015-09-16 | 浙江工商大学 | Continuous grinding mechanism based on grinding disk surface self-growth |
| CN105014525A (en) * | 2015-07-03 | 2015-11-04 | 浙江工业大学 | Self-adaptive adjusting method based on multi-degree-of-freedom adjusting mechanism of grinded/polished workpieces |
| CN106695582A (en) * | 2017-01-06 | 2017-05-24 | 浙江工业大学 | Combined cylindrical bar grinding and polishing disc with gradient function |
| CN106737253A (en) * | 2017-01-06 | 2017-05-31 | 浙江工业大学 | The preparation method of the gradient function polishing disk based on gauge block theory |
| CN107053026A (en) * | 2017-01-06 | 2017-08-18 | 浙江工业大学 | A kind of method and its preparation facilities for preparing gradient function polishing disk |
| CN107053030A (en) * | 2017-01-06 | 2017-08-18 | 浙江工业大学 | A kind of fan-shaped combined type polishing disk with gradient function |
| CN107052987A (en) * | 2017-06-05 | 2017-08-18 | 南京航空航天大学 | Applied to it is synchronous slightly grind, lappingout, the processing unit (plant) for polishing spheroid |
| WO2018118566A1 (en) * | 2016-12-23 | 2018-06-28 | 3M Innovative Properties Company | Polymer bond abrasive articles and methods of making them |
| CN108466131A (en) * | 2018-05-30 | 2018-08-31 | 四川欧瑞特光电科技有限公司 | A kind of optical element process equipment |
| CN110403717A (en) * | 2018-04-26 | 2019-11-05 | 盘锦国瑞升科技有限公司 | A kind of burnishing stick of grinding and polishing teeth space |
| CN110421460A (en) * | 2019-07-26 | 2019-11-08 | 浙江工业大学 | A kind of classification grinding and polishing device based on complex gradient elasticity small tool |
| CN112123225A (en) * | 2020-08-26 | 2020-12-25 | 南京航空航天大学 | Elastic milling and polishing tool for machining brittle workpiece and manufacturing method thereof |
| CN114193343A (en) * | 2021-12-29 | 2022-03-18 | 泉州兴启商金刚石工具有限公司 | Novel abrasive disc for diamond grinding and rapid production method thereof |
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Cited By (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103878681A (en) * | 2014-03-06 | 2014-06-25 | 浙江工业大学 | Multi-stage polishing disk with loading device |
| CN103878682A (en) * | 2014-03-06 | 2014-06-25 | 浙江工业大学 | Multistage machining grinding and polishing disk |
| CN103878682B (en) * | 2014-03-06 | 2016-04-13 | 浙江工业大学 | A kind of multistage processing grinding burnishing device |
| CN103878681B (en) * | 2014-03-06 | 2016-04-13 | 浙江工业大学 | A kind of multistage polishing disk with charger |
| CN104128888A (en) * | 2014-07-25 | 2014-11-05 | 浙江博海金属制品科技有限公司 | Plane polishing machine |
| CN104907919A (en) * | 2015-06-18 | 2015-09-16 | 浙江工商大学 | Continuous grinding mechanism based on grinding disk surface self-growth |
| CN105014525A (en) * | 2015-07-03 | 2015-11-04 | 浙江工业大学 | Self-adaptive adjusting method based on multi-degree-of-freedom adjusting mechanism of grinded/polished workpieces |
| WO2018118566A1 (en) * | 2016-12-23 | 2018-06-28 | 3M Innovative Properties Company | Polymer bond abrasive articles and methods of making them |
| EP3558589A4 (en) * | 2016-12-23 | 2020-10-07 | 3M Innovative Properties Company | Polymer bond abrasive articles and methods of making them |
| US11623324B2 (en) | 2016-12-23 | 2023-04-11 | 3M Innovative Properties Company | Polymer bond abrasive articles and methods of making them |
| CN110121400A (en) * | 2016-12-23 | 2019-08-13 | 3M创新有限公司 | Polymer bonding abrasive product and preparation method thereof |
| CN110121400B (en) * | 2016-12-23 | 2022-01-18 | 3M创新有限公司 | Polymer-bonded abrasive article and method of making same |
| CN107053026A (en) * | 2017-01-06 | 2017-08-18 | 浙江工业大学 | A kind of method and its preparation facilities for preparing gradient function polishing disk |
| CN107053030A (en) * | 2017-01-06 | 2017-08-18 | 浙江工业大学 | A kind of fan-shaped combined type polishing disk with gradient function |
| CN106695582A (en) * | 2017-01-06 | 2017-05-24 | 浙江工业大学 | Combined cylindrical bar grinding and polishing disc with gradient function |
| CN106737253B (en) * | 2017-01-06 | 2019-03-05 | 浙江工业大学 | The preparation method of gradient function polishing disk based on gauge block theory |
| CN106737253A (en) * | 2017-01-06 | 2017-05-31 | 浙江工业大学 | The preparation method of the gradient function polishing disk based on gauge block theory |
| CN106695582B (en) * | 2017-01-06 | 2020-02-18 | 浙江工业大学 | Column bar combination formula is ground and is thrown dish with gradient function |
| CN107052987A (en) * | 2017-06-05 | 2017-08-18 | 南京航空航天大学 | Applied to it is synchronous slightly grind, lappingout, the processing unit (plant) for polishing spheroid |
| CN110403717A (en) * | 2018-04-26 | 2019-11-05 | 盘锦国瑞升科技有限公司 | A kind of burnishing stick of grinding and polishing teeth space |
| CN108466131A (en) * | 2018-05-30 | 2018-08-31 | 四川欧瑞特光电科技有限公司 | A kind of optical element process equipment |
| CN110421460A (en) * | 2019-07-26 | 2019-11-08 | 浙江工业大学 | A kind of classification grinding and polishing device based on complex gradient elasticity small tool |
| CN112123225A (en) * | 2020-08-26 | 2020-12-25 | 南京航空航天大学 | Elastic milling and polishing tool for machining brittle workpiece and manufacturing method thereof |
| CN114193343A (en) * | 2021-12-29 | 2022-03-18 | 泉州兴启商金刚石工具有限公司 | Novel abrasive disc for diamond grinding and rapid production method thereof |
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Application publication date: 20120912 |