CN102654704A - Display device and production method thereof - Google Patents
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- CN102654704A CN102654704A CN2011102683269A CN201110268326A CN102654704A CN 102654704 A CN102654704 A CN 102654704A CN 2011102683269 A CN2011102683269 A CN 2011102683269A CN 201110268326 A CN201110268326 A CN 201110268326A CN 102654704 A CN102654704 A CN 102654704A
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Abstract
The embodiment of the invention discloses a display device and a production method thereof, relating to the field of display device. According to the embodiment of the invention, a technological process is simplified and product yield is improved. The display device comprises an upper substrate and a lower substrate, wherein a display dielectric layer is arranged between the upper substrate and the lower substrate, the lower substrate comprises a lead layer, an insulating layer covers the lead layer, and the lead layer is connected with the display dielectric layer by virtue of a through hole of the insulating layer. The preparation method of the display device comprises the following steps of: forming the lead layer comprising a lead layer graph by adopting a composition technology on the lower substrate; forming the insulating layer by adopting the composition technology on the lead layer; and encapsulating the upper substrate, display dielectric and the lower substrate into a display device.
Description
Technical field
The present invention relates to the display device technical field, relate in particular to structure of a kind of display device and preparation method thereof.
Background technology
In the prior art; Like typical n segment display n; Include display medium, be coated with the last lower glass substrate of ito transparent electrode, ITO electrode wherein is carved into the shape of field, and the shape of ITO electrode is as illustrated in fig. 1 and 2 on the upper and lower base plate; The combination representative that available a of number, b, c, d, e, f, g etc. are 7 sections, corresponding segment electrode is a pixel electrode.Shown in Figure 1 is the infrabasal plate segment electrode, utilizes logical circuit just can make a n segment display n demonstrate these 10 numerals of 0-9 to these 7 sections controls that show respectively and do not show.As shown in Figure 2; The upper substrate electrode is coated with on the glass sheet or polyester sheet of ITO at another piece; Relative with the infrabasal plate segment electrode; The field place is a nesa coating, forms with the glass sheet or the polyester sheet photoetching that deposit ITO, and the purpose that the upper substrate electrode is set is the lead-in wire that can cover the infrabasal plate segment electrode when infrabasal plate segment electrode is shown.
State in realization in the manufacturing process of display device; The inventor finds to have following problem in the prior art at least: the electrode that need etch the pattern identical with the infrabasal plate segment electrode in the prior art at upper substrate; And the pattern of the pattern of upper substrate electrode and infrabasal plate segment electrode needs strict contraposition just can avoid the lead-in wire of infrabasal plate segment electrode to be revealed, and this will cause the yield of product and display effect to be affected.
Summary of the invention
Embodiments of the invention provide a kind of display device and preparation method thereof, need not the strict counterpoint of upper substrate and infrabasal plate, have both avoided the demonstration of contact conductor, have simplified technological process again, have improved the product yield.For achieving the above object, embodiments of the invention adopt following technical scheme:
A kind of display device comprises: upper substrate and infrabasal plate, between said upper substrate and said infrabasal plate, be provided with display dielectric layer, and said infrabasal plate comprises trace layer, on said trace layer, is coated with insulation course, said trace layer is connected with said display dielectric layer.
Said trace layer comprises the trace layer figure;
Said insulation course comprises the hollow out zone with preset display pattern shape, said hollow out zone and the corresponding setting of said trace layer figure;
Said hollow out zone is less than corresponding with it trace layer figure.
Said infrabasal plate also comprises the pixel layer that is arranged on the said insulation course; Said pixel layer comprises the pixel electrode that is shaped as predetermined pattern; Said insulation course has the insulation course via hole; Said trace layer is connected with said pixel electrode through said insulation course via hole, and said pixel electrode is connected with said display dielectric layer.
The material of said display dielectric layer is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.
The material of said display dielectric layer is an electrochromic material, and the material of said insulation course is coloured insulating material, and the material of said trace layer is coloured conductive material, and the color of the material of said insulation course is identical with the color of said trace layer material.
The material of said display dielectric layer is a polymer dispersion liquid crystal material, and said trace layer material is coloured conductive material.
Also be provided with the background chromatograph under the said infrabasal plate, the material of said insulation course is a transparent insulation material, and the material of said trace layer is a transparent conductive material.
The material of said display dielectric layer is an electrochromic material, and the material of said insulation course is coloured insulating material, and said pixel electrode material is a transparent conductive material.
The material of said display dielectric layer is a polymer dispersion liquid crystal material, and said pixel electrode material is coloured conductive material.
Also be provided with the background chromatograph under the said infrabasal plate, the material of said trace layer is a transparent conductive material; The material of said insulation course is a transparent insulation material; The material of said pixel electrode is a transparent conductive material.
The embodiment of the invention only needs the etching infrabasal plate can accomplish graphic making; Realize the display device Presentation Function; Need not the strict contraposition of upper substrate and infrabasal plate just can avoid the infrabasal plate lead-in wire to be revealed; And, simplified technological process and improved product yield and display effect through changing the background color that the background chromatograph just can change display device.
A kind of preparation method of display device comprises:
On infrabasal plate, form the trace layer that comprises the trace layer figure through composition technology;
On said trace layer, form insulation course through composition technology;
Upper substrate, display medium and said infrabasal plate are packaged into display device.
Saidly form insulation course through composition technology and comprise:
Have the hollow out zone of preset display pattern shape or the insulation course of insulation course via hole through the formation of composition technology, said hollow out zone and the corresponding setting of said trace layer figure, said hollow out zone is less than corresponding with it trace layer figure.
Said form insulation course through composition technology after, also comprise:
Pixel deposition layer metal on said insulation course forms pixel layer via hole and the pixel layer that comprises the pixel electrode that is shaped as predetermined pattern through composition technology.
The embodiment of the invention adopts twice composition technology and three composition technologies can accomplish the making of display device, and in the preparation process, need not strict contraposition, has simplified technological process, has improved the product yield.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills; Under the prerequisite of not paying creative work property, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the structural representation of a n segment display n infrabasal plate segment electrode in the background technology;
Fig. 2 is the structural representation of a n segment display n upper substrate segment electrode in the background technology;
Fig. 3 is the structural representation of display device in the embodiment of the invention one;
Fig. 4 is the structural representation of trace layer figure in the embodiment of the invention two;
Fig. 5 is the structural representation of trace layer and insulation course in the embodiment of the invention two;
Fig. 6 is the structural representation of display device in the embodiment of the invention three;
Fig. 7 is the structural representation of infrabasal plate in the embodiment of the invention three;
Fig. 8 is the preparation method's of display device in the embodiment of the invention four a process flow diagram;
Fig. 9 is a trace layer graphic structure synoptic diagram in the embodiment of the invention six;
Figure 10 is an insulation layer structure synoptic diagram in the embodiment of the invention six;
Figure 11 is a pixel layer structural representation in the embodiment of the invention six.
Description of reference numerals:
1, upper substrate 2, display dielectric layer 3, infrabasal plate 4, insulation course 5, trace layer
6, trace layer figure 7, insulation course hollow out zone 8, background chromatograph 9, pixel layer
10, insulation course via hole 11, substrate 12, PET film substrate
Embodiment
To combine the accompanying drawing in the embodiment of the invention below, the technical scheme in the embodiment of the invention is carried out clear, intactly description, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the present invention's protection.
The embodiment of the invention provides a kind of display device and preparation method thereof, need not the strict counterpoint of upper substrate and infrabasal plate, has both avoided the demonstration of contact conductor, has simplified technological process again, has improved the product yield.
Embodiment one
The embodiment of the invention provides a kind of display device, and is as shown in Figure 3, and this display device comprises: upper substrate 1 and infrabasal plate 3 are provided with display dielectric layer 2 between upper substrate 1 and infrabasal plate 3.Upper substrate 1 can be for being coated with the substrate of ITO layer, or glass substrate, or PET thin film flexible substrate.The material of display dielectric layer 2 is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.Infrabasal plate 3 comprises trace layer 5 and insulation course 4, and trace layer 5 is prepared on the substrate, or glass substrate, or PET thin film flexible substrate, and insulation course 4 covers on the trace layer 5, and trace layer 5 is connected with display dielectric layer 2 through the via hole of insulation course 4.Trace layer 5 comprises the trace layer figure; Insulation course 4 comprises the hollow out zone with preset display pattern shape; The hollow out corresponding setting in zone with the trace layer figure, because insulation course 4 covers on the trace layer, this just makes the trace layer figure under the insulation course 4 hollow out zones expose; Trace layer figure under the zone that does not have hollow out on the insulation course 4 is blocked, promptly on insulation course 4, exposes trace layer conductive region with preset display pattern shape.The trace layer conductive region with preset display pattern shape that exposes is connected with display dielectric layer 2; Between the ITO of upper substrate 1 conductive layer and trace layer 5, add certain voltage; The display medium color that links to each other with the trace layer conductive region is changed, make display device demonstrate preset display pattern.Meanwhile, because trace layer 5 is insulated 4 covering of layer, the lead-in wire of trace layer 5 can be revealed.
In the prior art; Need on upper substrate, etch electrode with the identical pattern of infrabasal plate pixel electrode; Could realize covering infrabasal plate pixel electrode contact conductor on every side when display device shows this pattern; This method needs contraposition strict between upper substrate and the infrabasal plate, and the embodiment of the invention is arranged on the infrabasal plate contact conductor under the insulation course, and on upper substrate, public electrode is set; Therefore; Only need the etching infrabasal plate can accomplish graphic making, need not contraposition strict between upper substrate and the infrabasal plate just can be avoided contact conductor when realizing the display device Presentation Function demonstration, simplified technological process and improved product yield and display effect.
Embodiment two
The embodiment of the invention provides a kind of display device, and this display device comprises: upper substrate and infrabasal plate are provided with display dielectric layer between upper substrate and infrabasal plate.Upper substrate is the glass substrate that is coated with the ITO layer.The material of display dielectric layer is a polymer dispersion liquid crystal material.Infrabasal plate comprises trace layer and insulation course; Trace layer is prepared on the glass substrate, and insulation course covers on the trace layer, and trace layer is connected with display medium through the via hole of insulation course; Because trace layer is insulated layer and covers, and the lead-in wire of trace layer can be revealed.
In the prior art; Need on upper substrate, etch electrode with the identical pattern of infrabasal plate pixel electrode; Could when realizing the display device Presentation Function, cover the lead-in wire of infrabasal plate pixel electrode, this method needs contraposition strict between upper substrate and the infrabasal plate, and the embodiment of the invention is arranged on the infrabasal plate contact conductor under the insulation course; And public electrode is set on upper substrate; Therefore, the embodiment of the invention only needs the etching infrabasal plate can accomplish graphic making, need not the strict contraposition of upper substrate and infrabasal plate and just can in realization display device Presentation Function, avoid the demonstration that goes between.
The trace layer of the embodiment of the invention comprises the trace layer figure, and is as shown in Figure 4, and trace layer figure 6 is by being made up of the plane conductive region of shape in the trace layer, and trace layer figure 6 is arranged on the substrate 11.
The insulation course of the embodiment of the invention comprises the hollow out zone with preset letter and pattern form; As shown in Figure 5; Insulation course 4 covers on the trace layer figure 6, insulation course hollow out zone 7 and the 6 corresponding settings of trace layer figure, and hollow out zone 7 is less than corresponding with it trace layer figure 6.Because insulation course covers on the trace layer; This just makes the trace layer figure 6 under the insulation course hollow out zone 7 expose; Trace layer figure 6 under the zone that does not have hollow out on the insulation course is blocked, promptly on insulation course, exposes trace layer figure with preset letter and pattern form.The preset letter that has that exposes is connected with display dielectric layer with the trace layer figure of pattern form; Between the ITO of upper substrate conductive layer and trace layer, add certain voltage; The display medium color that links to each other with the trace layer figure is changed, make display device demonstrate preset letter and pattern.Preset letter that has on the insulation course and the insulation course hollow out of pattern form zone 7 can be reduced in the contraposition requirement of used composition technology in the preparation process like this less than corresponding with it trace layer figure 6, improve the product yield.
The material of display dielectric layer is to be applied in the polymer dispersion liquid crystal material that color transforms between milky and water white transparency behind the voltage in the embodiment of the invention; Utilize milky color as a setting; When polymer dispersion liquid crystal material become transparent after, trace layer is exposed, the color of utilizing trace layer is as color of image; The material of trace layer is coloured conductive material, and the material of insulation course can be that coloured insulating material also can be a transparent insulation material; Perhaps, the background colour layer can be set under infrabasal plate, the optional filter of background chromatograph with different colours; The color of utilizing filter is as color of image; At this moment, for the color of making way for the filter under the infrabasal plate can show, trace layer will adopt transparent conductive material.
In embodiments of the present invention, the electrochromic material that the display dielectric layer material also can transform between water white transparency and blueness for color after applying voltage, blueness capable of using is as color of image; With the color of insulation course and trace layer color as a setting, therefore, the material of insulation course is coloured insulating material; The material of trace layer is coloured conductive material; And the material of insulation course is identical with the color of the material of trace layer, and the background colour layer is set under infrabasal plate, utilizes filter chromatograph as a setting; With the color of filter color as a setting; This moment, the material of trace layer was the water white transparency conductive material, and the material of insulation course is a transparent insulation material, makes the color of filter to be revealed.The background chromatograph is selected the filter of different colours for use, and display device just can demonstrate the background colour of respective color.
In embodiments of the present invention; The material of display dielectric layer also can be electronic ink material; Electronic ink material is after applying voltage, and its color transforms between white and black, owing to itself just can realize image white, background black; The perhaps display effect of picture black, background white is not so limit the color of the material therefor of infrabasal plate pixel electrode layer, insulation course and trace layer.
In embodiments of the present invention, the material of display dielectric layer also can be electrochromic material or electronic ink material.
The embodiment of the invention only needs the etching infrabasal plate can accomplish graphic making, realizes the display device Presentation Function, need not the strict counterpoint of upper substrate and infrabasal plate, has both avoided the demonstration of contact conductor, has simplified technological process again, has improved the product yield.
Embodiment three
The embodiment of the invention provides a kind of display device, and is as shown in Figure 6, and this display device comprises: upper substrate 1 and infrabasal plate 3 are provided with display dielectric layer 2 between upper substrate and infrabasal plate.Filter chromatograph 8 as a setting is set under infrabasal plate.Upper substrate 1 is for being coated with the PET thin film flexible substrate of ITO layer.The material of display dielectric layer 2 is an electrochromic material.As shown in Figure 7, infrabasal plate 3 comprises trace layer 5, insulation course 4 and pixel layer 9, and trace layer 5 is prepared on the PET thin film flexible substrate; Insulation course 4 covers trace layer 5; Pixel layer 9 covers on the insulation course 4, and pixel layer 9 comprises the pixel electrode that is shaped as the matrix form predetermined pattern, has insulation course via hole 10 on the insulation course; Trace layer 5 is connected with pixel layer 9 through insulation course via hole 10, and pixel layer 9 is connected with display dielectric layer 2.Trace layer 5 is connected through pixel electrode in insulation course via hole 10 and the pixel layer 9; Pixel electrode with matrix form predetermined pattern shape is connected with display dielectric layer 2; Add that between the ITO of upper substrate 1 conductive layer and trace layer 5 color that certain voltage just can make display dielectric layer 2 be connected with pixel electrode part changes; The trace layer figure that will be connected with each pixel electrode respectively is connected on the logical circuit, through logical circuit each pixel electrode is shown with the control that does not show just to make display device demonstrate static or dynamic graphics or numeral etc.Meanwhile, because trace layer 5 is insulated 4 covering of layer, the lead-in wire of trace layer 5 can be revealed.
In the prior art; Need on upper substrate, etch electrode with the identical pattern of infrabasal plate pixel electrode; Could when realizing the display device Presentation Function, cover the lead-in wire of infrabasal plate pixel electrode, this method needs contraposition strict between upper substrate and the infrabasal plate, and the embodiment of the invention is arranged on the infrabasal plate contact conductor under the insulation course; And public electrode is set on upper substrate; Therefore, the embodiment of the invention only needs the etching infrabasal plate can accomplish graphic making, need not the strict contraposition of upper substrate and infrabasal plate and just can in realization display device Presentation Function, avoid the demonstration that goes between.
Embodiment of the invention display dielectric layer material is the electrochromic material that color transforms between water white transparency and blueness after applying voltage; Blueness capable of using is as color of image; With the color of insulation course color as a setting, at this moment, requiring pixel electrode is transparent conductive material; Make the color of insulation course to show, and insulation course is coloured insulating material through pixel electrode; Perhaps; Can the background colour layer be set under infrabasal plate, utilize filter chromatograph as a setting, with the color of filter color as a setting; This moment, the material of trace layer was the water white transparency conductive material; The material of insulation course is a transparent insulation material, and the pixel electrode material is the water white transparency conductive material, makes the color of filter to be revealed.The background chromatograph is selected the filter of different colours for use, and display device just can demonstrate the background colour of respective color.
In embodiments of the present invention; The material of display dielectric layer also can be polymer dispersion liquid crystal material, and after polymer dispersion liquid crystal material was applied in voltage, color transformed between milky and water white transparency; Utilize milky color as a setting; When polymer dispersion liquid crystal material become transparent after, trace layer is exposed, the color of utilizing trace layer is as color of image; The material of trace layer is coloured conductive material, and the material of insulation course can be that coloured insulating material also can be a transparent insulation material.
In embodiments of the present invention; The material of display dielectric layer also can be electronic ink material; Electronic ink material is after applying voltage, and its color transforms between white and black, owing to itself just can realize image white, background black; The perhaps display effect of picture black, background white is not so limit the color of the material therefor of infrabasal plate pixel electrode layer, insulation course and trace layer.
The embodiment of the invention only needs the etching infrabasal plate can accomplish graphic making; Realize the display device Presentation Function; Need not the strict contraposition of upper substrate and infrabasal plate just can avoid the infrabasal plate lead-in wire to be revealed; And, simplified technological process and improved product yield and display effect through changing the background color that the background chromatograph just can change display device.
Embodiment four
The embodiment of the invention also provides a kind of preparation method of display device, and is as shown in Figure 8, and this method comprises:
101, on infrabasal plate, form the trace layer that comprises the trace layer figure through composition technology;
On glass substrate or PET film substrate, utilize sputtering method deposition of wire layer conductive material, make public wet quarter, obtain the trace layer figure with the conductive material of mask plate to deposition.
102, on said trace layer, form insulation course through composition technology;
On trace layer, use plasma enhanced chemical vapor deposition method deposition of insulative material, utilize mask plate that the insulating material of deposition is made public wet quarter then, obtain comprising the insulation course in insulation course hollow out zone, accomplish the preparation of infrabasal plate.Wherein insulation course hollow out zone can be reduced in the contraposition requirement of used composition technology in the preparation process like this less than corresponding with it trace layer figure, improves the product yield.
Through this preparation method, make that the trace layer figure under the insulation course hollow out zone exposes, the trace layer figure under the zone that does not have hollow out on the insulation course is blocked, promptly on insulation course, expose trace layer figure with preset display pattern shape.
103, upper substrate, display medium and said infrabasal plate are packaged into display device.
The embodiment of the invention adopts twice making that composition technology can be accomplished display device, and in the preparation process, need not strict contraposition, has simplified technological process, has improved the product yield.
Embodiment five
The embodiment of the invention also provides a kind of preparation method of display device, and this method comprises:
On glass substrate, utilize sputtering method deposition of wire layer conductive material, make public wet quarter, obtain the trace layer figure with the conductive material of mask plate to deposition.
On trace layer, use plasma enhanced chemical vapor deposition method deposition of insulative material; Utilize mask plate that the insulating material of deposition is made public wet quarter then; Obtain comprising the insulation course of insulation course hollow out zone, accomplish the preparation of infrabasal plate for preset letter and pattern form.Wherein insulation course hollow out zone can be reduced in the contraposition requirement of used composition technology in the preparation process like this less than corresponding with it trace layer figure, improves the product yield.
Through this preparation method, make that the trace layer figure under the insulation course hollow out zone exposes, the trace layer figure under the zone that does not have hollow out on the insulation course is blocked, promptly on insulation course, expose trace layer figure with preset letter and pattern form.
Upper substrate, display medium and said infrabasal plate are packaged into display device.
The embodiment of the invention is sticked the black filter below infrabasal plate, its objective is through the black filter to realize that background color is the demonstration of black.
The embodiment of the invention adopts twice making that composition technology can be accomplished display device, and in the preparation process, need not strict contraposition, has simplified technological process, has improved the product yield.
Embodiment six
The embodiment of the invention also provides a kind of preparation method of display device, and this method comprises:
As shown in Figure 9, on PET film substrate 12, utilize sputtering method deposition of wire layer conductive material, make public wet quarter with the conductive material of mask plate to deposition, obtain trace layer figure 6.
On trace layer, use plasma enhanced chemical vapor deposition method deposition of insulative material; Utilize mask plate that the insulating material of deposition is made public wet quarter then; Shown in figure 10, obtain comprising the insulation course 4 of insulation course via hole 10, on insulation course through sputtering method pixel deposition layer conductive material; Utilize mask plate that the pixel layer deposits conductive material is made public wet quarter; Shown in figure 11, obtain having the pixel layer 9 of the pixel electrode of matrix form predetermined pattern shape, promptly accomplish the preparation of this infrabasal plate.The trace layer figure is connected to through the insulation course via hole on the pixel electrode with matrix form predetermined pattern shape, and while trace layer figure is insulated layer and blocks.
The embodiment of the invention is sticked red filter below infrabasal plate, its objective is through red filter to realize the demonstration that background color is red.
Upper substrate, display medium and said infrabasal plate are packaged into display device.
The embodiment of the invention adopts three composition technologies can accomplish the making of display device, and in the preparation process, need not strict contraposition, has simplified technological process, has improved the product yield.
Embodiment seven
The embodiment of the invention also provides a kind of preparation method of display device, and this method comprises:
On glass substrate, utilize sputtering method deposition of wire layer conductive material, make public wet quarter, obtain the trace layer figure with the conductive material of mask plate to deposition.
On trace layer, use plasma enhanced chemical vapor deposition method deposition of insulative material; Utilize mask plate that the insulating material of deposition is made public wet quarter then; Obtain comprising the insulation course of insulation course via hole, on insulation course,, utilize mask plate that the pixel layer deposits conductive material is made public wet quarter through sputtering method pixel deposition layer conductive material; Obtain having the pixel electrode of matrix form predetermined pattern shape, promptly accomplish the preparation of this infrabasal plate.The trace layer figure is connected to through the insulation course via hole on the pixel electrode with matrix form predetermined pattern shape, and while trace layer figure is insulated layer and blocks.
Upper substrate, display medium and said infrabasal plate are packaged into display device.
The embodiment of the invention adopts three composition technologies can accomplish the making of display device, and in the preparation process, need not strict contraposition, has simplified technological process, has improved the product yield.
The above; Be merely embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; Can expect easily changing or replacement, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion by said protection domain with claim.
Claims (13)
1. display device, comprising: upper substrate and infrabasal plate are provided with display dielectric layer between said upper substrate and said infrabasal plate; Said infrabasal plate comprises trace layer; It is characterized in that, on said trace layer, be coated with insulation course, said trace layer is connected with said display dielectric layer.
2. display device according to claim 1 is characterized in that,
Said trace layer comprises the trace layer figure;
Said insulation course comprises the hollow out zone with preset display pattern shape, said hollow out zone and the corresponding setting of said trace layer figure;
Said hollow out zone is less than corresponding with it trace layer figure.
3. display device according to claim 1; It is characterized in that; Said infrabasal plate also comprises the pixel layer that is arranged on the said insulation course, and said pixel layer comprises the pixel electrode that is shaped as predetermined pattern, and said insulation course has the insulation course via hole; Said trace layer is connected with said pixel electrode through said insulation course via hole, and said pixel electrode is connected with said display dielectric layer.
4. according to claim 1,2 or 3 described display devices, it is characterized in that,
The material of said display dielectric layer is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.
5. display device according to claim 2; It is characterized in that; The material of said display dielectric layer is an electrochromic material; The material of said insulation course is coloured insulating material, and the material of said trace layer is coloured conductive material, and the color of the material of said insulation course is identical with the color of said trace layer material.
6. display device according to claim 2 is characterized in that, the material of said display dielectric layer is a polymer dispersion liquid crystal material, and said trace layer material is coloured conductive material.
7. display device according to claim 2 is characterized in that, also is provided with the background chromatograph under the said infrabasal plate, and the material of said insulation course is a transparent insulation material, and the material of said trace layer is a transparent conductive material.
8. display device according to claim 3 is characterized in that, the material of said display dielectric layer is an electrochromic material, and the material of said insulation course is coloured insulating material, and said pixel electrode material is a transparent conductive material.
9. display device according to claim 3 is characterized in that, the material of said display dielectric layer is a polymer dispersion liquid crystal material, and said pixel electrode material is coloured conductive material.
10. display device according to claim 3 is characterized in that, also is provided with the background chromatograph under the said infrabasal plate, and the material of said trace layer is a transparent conductive material; The material of said insulation course is a transparent insulation material; The material of said pixel electrode is a transparent conductive material.
11. the preparation method of a display device is characterized in that, comprising:
On infrabasal plate, form the trace layer that comprises the trace layer figure through composition technology;
On said trace layer, form insulation course through composition technology;
Upper substrate, display medium and said infrabasal plate are packaged into display device.
12. the preparation method of display device according to claim 11 is characterized in that, saidly forms insulation course through composition technology and comprises:
Have the hollow out zone of preset display pattern shape or the insulation course of insulation course via hole through the formation of composition technology, said hollow out zone and the corresponding setting of said trace layer figure, said hollow out zone is less than corresponding with it trace layer figure.
13. the preparation method of display device according to claim 11 is characterized in that, said form insulation course through composition technology after, also comprise:
Pixel deposition layer metal on said insulation course forms pixel layer via hole and the pixel layer that comprises the pixel electrode that is shaped as predetermined pattern through composition technology.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106647063A (en) * | 2017-03-03 | 2017-05-10 | 汕头超声显示器（二厂）有限公司 | Passive matrix liquid crystal display |
| CN110111687A (en) * | 2019-05-22 | 2019-08-09 | 深圳秋田微电子股份有限公司 | A kind of display device and preparation method thereof |
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| CN101738813A (en) * | 2008-11-25 | 2010-06-16 | 乐金显示有限公司 | Electrophoretic display device and method for fabricating the same |
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| CN106647063A (en) * | 2017-03-03 | 2017-05-10 | 汕头超声显示器（二厂）有限公司 | Passive matrix liquid crystal display |
| CN106647063B (en) * | 2017-03-03 | 2019-10-25 | 汕头超声显示器（二厂）有限公司 | A kind of passive matrix liquid crystal display |
| CN110111687A (en) * | 2019-05-22 | 2019-08-09 | 深圳秋田微电子股份有限公司 | A kind of display device and preparation method thereof |
| CN110111687B (en) * | 2019-05-22 | 2021-12-24 | 深圳秋田微电子股份有限公司 | Display device and preparation method thereof |
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