CN102654704B - Display device and production method thereof - Google Patents

Display device and production method thereof Download PDF

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Publication number
CN102654704B
CN102654704B CN201110268326.9A CN201110268326A CN102654704B CN 102654704 B CN102654704 B CN 102654704B CN 201110268326 A CN201110268326 A CN 201110268326A CN 102654704 B CN102654704 B CN 102654704B
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China
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described
material
layer
insulation course
infrabasal plate
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CN201110268326.9A
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Chinese (zh)
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CN102654704A (en
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李文波
张卓
王刚
刘则
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京东方科技集团股份有限公司
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Abstract

The embodiment of the invention discloses a display device and a production method thereof, relating to the field of display device. According to the embodiment of the invention, a technological process is simplified and product yield is improved. The display device comprises an upper substrate and a lower substrate, wherein a display dielectric layer is arranged between the upper substrate and the lower substrate, the lower substrate comprises a lead layer, an insulating layer covers the lead layer, and the lead layer is connected with the display dielectric layer by virtue of a through hole of the insulating layer. The preparation method of the display device comprises the following steps of: forming the lead layer comprising a lead layer graph by adopting a composition technology on the lower substrate; forming the insulating layer by adopting the composition technology on the lead layer; and encapsulating the upper substrate, display dielectric and the lower substrate into a display device.

Description

Display device and preparation method thereof

Technical field

The present invention relates to display device technical field, particularly relate to structure of a kind of display device and preparation method thereof.

Background technology

In the prior art, as typical n segment display n, include display medium, be coated with the upper lower glass substrate of ito transparent electrode, ITO electrode is wherein carved into the shape of field, on upper and lower base plate, the shape of ITO electrode as illustrated in fig. 1 and 2, the combination representative of number available a, b, c, d, e, f, g etc. 7 sections, corresponding segment electrode is pixel electrode.Figure 1 shows that infrabasal plate segment electrode, utilize logical circuit to carry out to these 7 sections the control shown with not showing respectively and a n segment display n just can be made to demonstrate these 10 numerals of 0-9.As shown in Figure 2, on the glass sheet that upper substrate electrode is coated with ITO at another block or polyester sheet, relative with infrabasal plate segment electrode, field place is nesa coating, form with the glass sheet or polyester sheet photoetching that deposit ITO, the object that upper substrate electrode is set be infrabasal plate segment electrode is shown while can cover the lead-in wire of infrabasal plate segment electrode.

State in realization in the manufacturing process of display device, inventor finds that in prior art, at least there are the following problems: need the electrode etching the pattern identical with infrabasal plate segment electrode at upper substrate in prior art, and the pattern of the pattern of upper substrate electrode and infrabasal plate segment electrode needs strict contraposition that the lead-in wire of infrabasal plate segment electrode just can be avoided to be revealed, and this will cause the yield of product and display effect to be affected.

Summary of the invention

Embodiments of the invention provide a kind of display device and preparation method thereof, without the need to the strict counterpoint of upper substrate and infrabasal plate, have both avoided the display of contact conductor, and in turn simplify technological process, and improve product yield.For achieving the above object, embodiments of the invention adopt following technical scheme:

A kind of display device, comprising: upper substrate and infrabasal plate, between described upper substrate and described infrabasal plate, be provided with display dielectric layer, described infrabasal plate comprises trace layer, and described trace layer is coated with insulation course, and described trace layer is connected with described display dielectric layer.

Described trace layer comprises trace layer figure;

Described insulation course comprises the void region with default display pattern shape, and described void region is corresponding with described trace layer figure to be arranged;

Described void region is less than trace layer figure corresponding with it.

Described infrabasal plate also comprises the pixel layer be arranged on described insulation course, described pixel layer comprises the pixel electrode that shape is predetermined pattern, described insulation course has insulation course via hole, described trace layer is connected with described pixel electrode by described insulation course via hole, and described pixel electrode is connected with described display dielectric layer.

The material of described display dielectric layer is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.

The material of described display dielectric layer is electrochromic material, and the material of described insulation course is coloured insulating material, and the material of described trace layer is colored electro-conductive material, and the color of the material of described insulation course is identical with the color of described trace layer material.

The material of described display dielectric layer is polymer dispersion liquid crystal material, and described trace layer material is colored electro-conductive material.

Also be provided with background chromatograph under described infrabasal plate, the material of described insulation course is transparent insulation material, and the material of described trace layer is transparent conductive material.

The material of described display dielectric layer is electrochromic material, and the material of described insulation course is coloured insulating material, and described pixel electrode material is transparent conductive material.

The material of described display dielectric layer is polymer dispersion liquid crystal material, and described pixel electrode material is colored electro-conductive material.

Also be provided with background chromatograph under described infrabasal plate, the material of described trace layer is transparent conductive material; The material of described insulation course is transparent insulation material; The material of described pixel electrode is transparent conductive material.

The embodiment of the present invention only needs etching infrabasal plate to complete graphic making, realize display device Presentation Function, infrabasal plate just can be avoided to go between without the need to upper substrate and the strict contraposition of infrabasal plate to be revealed, and the background color of display device just can be changed by changing background chromatograph, simplify technological process and improve product yield and display effect.

A preparation method for display device, comprising:

Infrabasal plate is formed by patterning processes the trace layer comprising trace layer figure;

Described trace layer forms insulation course by patterning processes;

Upper substrate, display medium and described infrabasal plate are packaged into display device.

Described by patterning processes formed insulation course comprise:

Formed by patterning processes and have the void region of default display pattern shape or the insulation course of insulation course via hole, described void region is corresponding with described trace layer figure to be arranged, and described void region is less than trace layer figure corresponding with it.

Formed after insulation course by patterning processes described, also comprise:

Pixel deposition layer metal on described insulation course, forms pixel layer via hole by patterning processes and comprises the pixel layer that shape is the pixel electrode of predetermined pattern.

The embodiment of the present invention adopts twice patterning processes and three patterning processes can complete the making of display device, and without the need to strict contraposition in preparation process, simplifies technological process, improves product yield.

Accompanying drawing explanation

In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.

Fig. 1 is the structural representation of a n segment display n infrabasal plate segment electrode in background technology;

Fig. 2 is the structural representation of a n segment display n upper substrate segment electrode in background technology;

Fig. 3 is the structural representation of display device in the embodiment of the present invention one;

Fig. 4 is the structural representation of trace layer figure in the embodiment of the present invention two;

Fig. 5 is the structural representation of trace layer and insulation course in the embodiment of the present invention two;

Fig. 6 is the structural representation of display device in the embodiment of the present invention three;

Fig. 7 is the structural representation of infrabasal plate in the embodiment of the present invention three;

Fig. 8 is the process flow diagram of the preparation method of display device in the embodiment of the present invention four;

Fig. 9 is trace layer graphic structure schematic diagram in the embodiment of the present invention six;

Figure 10 is insulation layer structure schematic diagram in the embodiment of the present invention six;

Figure 11 is pixel layer structural representation in the embodiment of the present invention six.

Description of reference numerals:

1, upper substrate 2, display dielectric layer 3, infrabasal plate 4, insulation course 5, trace layer

6, trace layer figure 7, insulation course void region 8, background chromatograph 9, pixel layer

10, insulation course via hole 11, substrate 12, PET film substrate

Embodiment

Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.

The embodiment of the present invention provides a kind of display device and preparation method thereof, without the need to the strict counterpoint of upper substrate and infrabasal plate, has both avoided the display of contact conductor, and in turn simplify technological process, and improve product yield.

Embodiment one

The embodiment of the present invention provides a kind of display device, and as shown in Figure 3, this display device comprises: upper substrate 1 and infrabasal plate 3, be provided with display dielectric layer 2 between upper substrate 1 and infrabasal plate 3.Upper substrate 1 can for being coated with the substrate of ITO layer, or glass substrate, or PET film flexible base, board.The material of display dielectric layer 2 is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.Infrabasal plate 3 comprises trace layer 5 and insulation course 4, and trace layer 5 is prepared on substrate, or glass substrate, or PET film flexible base, board, and insulation course 4 covers in trace layer 5, and trace layer 5 is connected with display dielectric layer 2 by the via hole of insulation course 4.Trace layer 5 comprises trace layer figure, insulation course 4 comprises the void region with default display pattern shape, void region is corresponding with trace layer figure to be arranged, because insulation course 4 covers in trace layer, this just makes the trace layer figure under insulation course 4 void region expose, make insulation course 4 does not have the trace layer figure under the region of hollow out to be blocked simultaneously, on insulation course 4, namely expose the trace layer conductive region with default display pattern shape.The trace layer conductive region with default display pattern shape exposed is connected with display dielectric layer 2, certain voltage is added between the ITO conductive layer and trace layer 5 of upper substrate 1, the display medium color be connected with trace layer conductive region just can be made to change, make display device demonstrate default display pattern.Meanwhile, due to trace layer 5 cover by insulation course 4, the lead-in wire of trace layer 5 can be made to be revealed.

In the prior art, need the electrode etching pattern identical with infrabasal plate pixel electrode on upper substrate, could at the contact conductor realizing covering while display device shows this pattern around infrabasal plate pixel electrode, this method needs contraposition strict between upper substrate and infrabasal plate, and under infrabasal plate contact conductor is arranged on insulation course by the embodiment of the present invention, and public electrode is set on upper substrate, therefore, etching infrabasal plate is only needed to complete graphic making, just can avoid the display of contact conductor while realizing display device Presentation Function without the need to contraposition strict between upper substrate and infrabasal plate, simplify technological process and improve product yield and display effect.

Embodiment two

The embodiment of the present invention provides a kind of display device, and this display device comprises: upper substrate and infrabasal plate, be provided with display dielectric layer between upper substrate and infrabasal plate.Upper substrate is the glass substrate being coated with ITO layer.The material of display dielectric layer is polymer dispersion liquid crystal material.Infrabasal plate comprises trace layer and insulation course, on the glass substrate, insulation course covers in trace layer in trace layer preparation, and trace layer is connected with display medium by the via hole of insulation course, due to trace layer cover by insulation course, the lead-in wire of trace layer can be made to be revealed.

In the prior art, need the electrode etching pattern identical with infrabasal plate pixel electrode on upper substrate, the lead-in wire of infrabasal plate pixel electrode could be covered while realizing display device Presentation Function, this method needs contraposition strict between upper substrate and infrabasal plate, and under infrabasal plate contact conductor is arranged on insulation course by the embodiment of the present invention, and public electrode is set on upper substrate, therefore, the embodiment of the present invention only needs etching infrabasal plate to complete graphic making, just can avoid the display gone between while realizing display device Presentation Function without the need to upper substrate and the strict contraposition of infrabasal plate.

The trace layer of the embodiment of the present invention comprises trace layer figure, and as shown in Figure 4, in trace layer, trace layer figure 6 is made up of the multiplanar conductive region by shape, and trace layer figure 6 is arranged on the substrate 11.

The insulation course of the embodiment of the present invention comprises the void region having and preset letter and pattern form, as shown in Figure 5, insulation course 4 covers on trace layer figure 6, and insulation course void region 7 is corresponding with trace layer figure 6 to be arranged, and void region 7 is less than trace layer figure 6 corresponding with it.Because insulation course covers in trace layer, this just makes the trace layer figure 6 under insulation course void region 7 expose, make insulation course does not have the trace layer figure 6 under the region of hollow out to be blocked simultaneously, namely expose the trace layer figure having and preset letter and pattern form on the insulating layer.The default letter that has exposed is connected with display dielectric layer with the trace layer figure of pattern form, certain voltage is added between the ITO conductive layer and trace layer of upper substrate, the display medium color be connected with trace layer figure just can be made to change, make display device demonstrate default letter and pattern.The default letter that insulation course has and the insulation course void region 7 of pattern form are less than trace layer figure 6 corresponding with it, can be reduced in the contraposition requirement of patterning processes used in preparation process like this, improve product yield.

In the embodiment of the present invention, the material of display dielectric layer is the polymer dispersion liquid crystal material that after being applied in voltage, color transforms between milky and water white transparency, utilize milky color as a setting, when polymer dispersion liquid crystal material become transparent after, trace layer just can be made to be exposed, utilize the color of trace layer as color of image, the material of trace layer is colored electro-conductive material, and the material of insulation course can be coloured insulating material also can be transparent insulation material; Or, background colour layer can be set under infrabasal plate, the filter of the optional different colours of background chromatograph, utilize the color of filter as color of image, now, in order to the color making way for the filter under infrabasal plate can show, trace layer will adopt transparent conductive material.

In embodiments of the present invention, the electrochromic material that display dielectric layer material also can transform between water white transparency and blueness for color after application of a voltage, can utilize blue as color of image, with the color color as a setting of insulation course and trace layer, therefore, the material of insulation course is coloured insulating material, the material of trace layer is colored electro-conductive material, and the material of insulation course is identical with the color of the material of trace layer, background colour layer is set under infrabasal plate, utilize filter chromatograph as a setting, with the color of filter color as a setting, now the material of trace layer is water white transparency conductive material, the material of insulation course is transparent insulation material, the color of filter can be revealed.Background chromatograph selects the filter of different colours, and display device just can present the background colour of respective color.

In embodiments of the present invention, the material of display dielectric layer also can be electronic ink material, electronic ink material after application of a voltage, its color transforms between white and black, because itself just can realize image white, background black, or the display effect of picture black, background white, so the color of the material therefor of infrabasal plate pixel electrode layer, insulation course and trace layer is not limited.

In embodiments of the present invention, the material of display dielectric layer also can be electrochromic material or electronic ink material.

The embodiment of the present invention only needs etching infrabasal plate to complete graphic making, realizes display device Presentation Function, without the need to the strict counterpoint of upper substrate and infrabasal plate, has both avoided the display of contact conductor, and in turn simplify technological process, and improve product yield.

Embodiment three

The embodiment of the present invention provides a kind of display device, and as shown in Figure 6, this display device comprises: upper substrate 1 and infrabasal plate 3, be provided with display dielectric layer 2 between upper substrate and infrabasal plate.Filter chromatograph 8 is as a setting set under infrabasal plate.Upper substrate 1 is for being coated with the PET film flexible base, board of ITO layer.The material of display dielectric layer 2 is electrochromic material.As shown in Figure 7, infrabasal plate 3 comprises trace layer 5, insulation course 4 and pixel layer 9, trace layer 5 is prepared on PET film flexible base, board, insulation course 4 covers trace layer 5, pixel layer 9 covers on insulation course 4, and pixel layer 9 comprises the pixel electrode that shape is matrix form predetermined pattern, insulation course has insulation course via hole 10, trace layer 5 is connected with pixel layer 9 by insulation course via hole 10, and pixel layer 9 is connected with display dielectric layer 2.Trace layer 5 is connected with pixel electrode in pixel layer 9 by insulation course via hole 10, the pixel electrode with matrix form predetermined pattern shape is connected with display dielectric layer 2, between the ITO conductive layer and trace layer 5 of upper substrate 1, add that the color that certain voltage just can make display dielectric layer 2 be connected with pixel electrode part changes, respectively the trace layer figure be connected with each pixel electrode is connected on logical circuit, display device just can be made by logical circuit to present static state or dynamic figure or numeral etc. to the control that each pixel electrode carries out showing and do not show.Meanwhile, due to trace layer 5 cover by insulation course 4, the lead-in wire of trace layer 5 can be made to be revealed.

In the prior art, need the electrode etching pattern identical with infrabasal plate pixel electrode on upper substrate, the lead-in wire of infrabasal plate pixel electrode could be covered while realizing display device Presentation Function, this method needs contraposition strict between upper substrate and infrabasal plate, and under infrabasal plate contact conductor is arranged on insulation course by the embodiment of the present invention, and public electrode is set on upper substrate, therefore, the embodiment of the present invention only needs etching infrabasal plate to complete graphic making, just can avoid the display gone between while realizing display device Presentation Function without the need to upper substrate and the strict contraposition of infrabasal plate.

Embodiment of the present invention display dielectric layer material is the electrochromic material that transforms between water white transparency and blueness of color after application of a voltage, can utilize blue as color of image, with the color of insulation course color as a setting, now, requirement pixel electrode is transparent conductive material, the color of insulation course can be shown through pixel electrode, and insulation course is coloured insulating material; Or, background colour layer can be set under infrabasal plate, utilize filter chromatograph as a setting, with the color of filter color as a setting, now the material of trace layer is water white transparency conductive material, the material of insulation course is transparent insulation material, and pixel electrode material is water white transparency conductive material, and the color of filter can be revealed.Background chromatograph selects the filter of different colours, and display device just can present the background colour of respective color.

In embodiments of the present invention, the material of display dielectric layer also can be polymer dispersion liquid crystal material, after polymer dispersion liquid crystal material is applied in voltage, color transforms between milky and water white transparency, utilize milky color as a setting, when polymer dispersion liquid crystal material become transparent after, trace layer just can be made to be exposed, utilize the color of trace layer as color of image, the material of trace layer is colored electro-conductive material, and the material of insulation course can be coloured insulating material also can be transparent insulation material.

In embodiments of the present invention, the material of display dielectric layer also can be electronic ink material, electronic ink material after application of a voltage, its color transforms between white and black, because itself just can realize image white, background black, or the display effect of picture black, background white, so the color of the material therefor of infrabasal plate pixel electrode layer, insulation course and trace layer is not limited.

The embodiment of the present invention only needs etching infrabasal plate to complete graphic making, realize display device Presentation Function, infrabasal plate just can be avoided to go between without the need to upper substrate and the strict contraposition of infrabasal plate to be revealed, and the background color of display device just can be changed by changing background chromatograph, simplify technological process and improve product yield and display effect.

Embodiment four

The embodiment of the present invention also provides a kind of preparation method of display device, and as shown in Figure 8, the method comprises:

101, on infrabasal plate, form by patterning processes the trace layer comprising trace layer figure;

Glass substrate or PET film substrate utilize sputtering method deposition of wire layer conductive material, carries out exposure wet etching with the conductive material of mask plate to deposition, obtain trace layer figure.

102, in described trace layer, insulation course is formed by patterning processes;

Trace layer uses plasma enhanced chemical vapor deposition method deposition of insulative material, then utilizes the insulating material of mask plate to deposition to carry out exposure wet etching, obtain the insulation course comprising insulation course void region, complete the preparation of infrabasal plate.Wherein insulation course void region is less than trace layer figure corresponding with it, can be reduced in the contraposition requirement of patterning processes used in preparation process like this, improves product yield.

By this preparation method, the trace layer figure under insulation course void region is exposed, make insulation course does not have the trace layer figure under the region of hollow out be blocked simultaneously, namely expose the trace layer figure with default display pattern shape on the insulating layer.

103, upper substrate, display medium and described infrabasal plate are packaged into display device.

The embodiment of the present invention adopts twice making that patterning processes can complete display device, and without the need to strict contraposition in preparation process, simplifies technological process, improves product yield.

Embodiment five

The embodiment of the present invention also provides a kind of preparation method of display device, and the method comprises:

Utilize sputtering method deposition of wire layer conductive material on the glass substrate, carry out exposure wet etching with the conductive material of mask plate to deposition, obtain trace layer figure.

Trace layer uses plasma enhanced chemical vapor deposition method deposition of insulative material, then the insulating material of mask plate to deposition is utilized to carry out exposure wet etching, obtaining comprising insulation course void region is the insulation course presetting letter and pattern form, completes the preparation of infrabasal plate.Wherein insulation course void region is less than trace layer figure corresponding with it, can be reduced in the contraposition requirement of patterning processes used in preparation process like this, improves product yield.

By this preparation method, the trace layer figure under insulation course void region is exposed, make insulation course does not have the trace layer figure under the region of hollow out be blocked simultaneously, namely expose the trace layer figure having and preset letter and pattern form on the insulating layer.

Upper substrate, display medium and described infrabasal plate are packaged into display device.

The embodiment of the present invention sticks black filter at lower substrate, its objective is to realize by black filter the display that background color is black.

The embodiment of the present invention adopts twice making that patterning processes can complete display device, and without the need to strict contraposition in preparation process, simplifies technological process, improves product yield.

Embodiment six

The embodiment of the present invention also provides a kind of preparation method of display device, and the method comprises:

As shown in Figure 9, PET film substrate 12 utilizes sputtering method deposition of wire layer conductive material, carry out exposure wet etching with the conductive material of mask plate to deposition, obtain trace layer figure 6.

Trace layer uses plasma enhanced chemical vapor deposition method deposition of insulative material, then the insulating material of mask plate to deposition is utilized to carry out exposure wet etching, as shown in Figure 10, obtain the insulation course 4 comprising insulation course via hole 10, on the insulating layer by sputtering method pixel deposition layer conductive material, mask plate is utilized to carry out exposure wet etching to pixel layer deposits conductive material, as shown in figure 11, obtain the pixel layer 9 of the pixel electrode with matrix form predetermined pattern shape, namely complete the preparation of this infrabasal plate.On pixel electrode trace layer figure being connected to by insulation course via hole have matrix form predetermined pattern shape, trace layer figure is blocked by insulation course simultaneously.

The embodiment of the present invention sticks red filter plate at lower substrate, its objective is the display being realized background color redness by red filter plate.

Upper substrate, display medium and described infrabasal plate are packaged into display device.

The embodiment of the present invention adopts three making that patterning processes can complete display device, and without the need to strict contraposition in preparation process, simplifies technological process, improves product yield.

Embodiment seven

The embodiment of the present invention also provides a kind of preparation method of display device, and the method comprises:

Utilize sputtering method deposition of wire layer conductive material on the glass substrate, carry out exposure wet etching with the conductive material of mask plate to deposition, obtain trace layer figure.

Trace layer uses plasma enhanced chemical vapor deposition method deposition of insulative material, then the insulating material of mask plate to deposition is utilized to carry out exposure wet etching, obtain the insulation course comprising insulation course via hole, on the insulating layer by sputtering method pixel deposition layer conductive material, mask plate is utilized to carry out exposure wet etching to pixel layer deposits conductive material, obtain the pixel electrode with matrix form predetermined pattern shape, namely complete the preparation of this infrabasal plate.On pixel electrode trace layer figure being connected to by insulation course via hole have matrix form predetermined pattern shape, trace layer figure is blocked by insulation course simultaneously.

Upper substrate, display medium and described infrabasal plate are packaged into display device.

The embodiment of the present invention adopts three making that patterning processes can complete display device, and without the need to strict contraposition in preparation process, simplifies technological process, improves product yield.

The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; change can be expected easily or replace, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should described be as the criterion with the protection domain of claim.

Claims (6)

1. a passive matrix displays part, comprising: upper substrate and infrabasal plate, between described upper substrate and described infrabasal plate, be provided with display dielectric layer, described infrabasal plate comprises trace layer, it is characterized in that, described trace layer is coated with insulation course, and described trace layer is connected with described display dielectric layer;
Described infrabasal plate also comprises the pixel layer be arranged on described insulation course, described pixel layer comprises the pixel electrode that shape is predetermined pattern, described insulation course has insulation course via hole, described trace layer is connected with described pixel electrode by described insulation course via hole, and described pixel electrode is connected with described display dielectric layer.
2. passive matrix displays part according to claim 1, is characterized in that,
The material of described display dielectric layer is electrochromic material, polymer dispersion liquid crystal material or electronic ink material.
3. passive matrix displays part according to claim 1, is characterized in that, the material of described display dielectric layer is electrochromic material, and the material of described insulation course is coloured insulating material, and described pixel electrode material is transparent conductive material.
4. passive matrix displays part according to claim 1, is characterized in that, the material of described display dielectric layer is polymer dispersion liquid crystal material, and described pixel electrode material is colored electro-conductive material.
5. passive matrix displays part according to claim 1, is characterized in that, is also provided with background chromatograph under described infrabasal plate, and the material of described trace layer is transparent conductive material; The material of described insulation course is transparent insulation material; The material of described pixel electrode is transparent conductive material.
6. a preparation method for passive matrix displays part, is characterized in that, comprising:
Infrabasal plate is formed by patterning processes the trace layer comprising trace layer figure;
Described trace layer forms insulation course by patterning processes;
Upper substrate, display medium and described infrabasal plate are packaged into display device;
Formed after insulation course by patterning processes described, also comprise:
Pixel deposition layer metal on described insulation course, forms pixel layer via hole by patterning processes and comprises the pixel layer that shape is the pixel electrode of predetermined pattern.
CN201110268326.9A 2011-09-09 2011-09-09 Display device and production method thereof CN102654704B (en)

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CN106647063B (en) * 2017-03-03 2019-10-25 汕头超声显示器(二厂)有限公司 A kind of passive matrix liquid crystal display

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US4448493A (en) * 1981-02-25 1984-05-15 Toppan Printing Co., Ltd. Electrochromic display device
JPS60221731A (en) * 1984-04-18 1985-11-06 Sony Corp Polychromatic display device
CN101116029A (en) * 2005-02-09 2008-01-30 皇家飞利浦电子股份有限公司 Display device with water-based electrolyte
CN101738813A (en) * 2008-11-25 2010-06-16 乐金显示有限公司 Electrophoretic display device and method for fabricating the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123841A (en) * 1975-09-29 1978-11-07 Sharp Kabushiki Kaisha Electrochromic display device manufacture method
US4448493A (en) * 1981-02-25 1984-05-15 Toppan Printing Co., Ltd. Electrochromic display device
JPS60221731A (en) * 1984-04-18 1985-11-06 Sony Corp Polychromatic display device
CN101116029A (en) * 2005-02-09 2008-01-30 皇家飞利浦电子股份有限公司 Display device with water-based electrolyte
CN101738813A (en) * 2008-11-25 2010-06-16 乐金显示有限公司 Electrophoretic display device and method for fabricating the same

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