CN102650757A - Color-film substrate, preparation method thereof and liquid crystal display panel - Google Patents

Color-film substrate, preparation method thereof and liquid crystal display panel Download PDF

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Publication number
CN102650757A
CN102650757A CN2011102645271A CN201110264527A CN102650757A CN 102650757 A CN102650757 A CN 102650757A CN 2011102645271 A CN2011102645271 A CN 2011102645271A CN 201110264527 A CN201110264527 A CN 201110264527A CN 102650757 A CN102650757 A CN 102650757A
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color resin
color
black matrix
thickness
photoresist
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CN2011102645271A
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CN102650757B (en
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马俊才
宋省勳
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BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
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Beijing BOE Optoelectronics Technology Co Ltd
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Abstract

The invention discloses a color-film substrate, a preparation method thereof and a liquid crystal display panel and relates to the technical field of liquid crystal display. The invention aims to solve the problem that the display quality of the liquid crystal display panel is lowered finally caused by poor abrasion of an orientation layer due to the fact that the height difference between color resin and every black matrix which are formed on the color filter is larger in the prior art. According to the embodiment disclosed by the invention, as the gray scale mask technology is adopted in the process of forming the color resin, the thickness of a formed photoresist pattern corresponding to the upward side of the black matrixes is less than that of the photoresist pattern corresponding to an area between the two adjacent black matrixes. After dry etching is ended, the corrosion amount of a color resin material layer corresponding to the upward side of the black matrixes can be greater than that of the color resin material layer corresponding to the area between the two adjacent black matrixes, therefore, the thickness of the overlapped sections of the color resin and the black matrixes can be reduced, and further, the height difference between the color resin and each black matrix is reduced.

Description

Color membrane substrates, its preparation method and display panels
Technical field
The present invention relates to technical field of liquid crystal display, relate in particular to a kind of color membrane substrates, its preparation method and display panels.
Background technology
Color membrane substrates (Color Filter; Abbreviate as: CF) be one of assembly of display panels; Comprise: (Black Matrix abbreviates as: BM) and be used for the color resin of Show Color to be used to block the unusual black matrix of arranging the light leakage phenomena that causes of the liquid crystal that on data line, produces.
Fig. 1 is the schematic cross-section of existing CF, and the preparation method of this CF comprises: black matrix forms step, color resin forms step and functional layer forms step.
Wherein, black matrix formation step comprises: on substrate 11, form black matrix material layer; On black matrix material layer, form photoresist; Adopt mask to resist exposure; The photoresist that the made public back of developing is formed the patterning photoresist; By this patterning photoresist black matrix material layer is carried out dry etching, to form black matrix 12.
Color resin forms step and comprises: on the substrate 11 that is formed with black matrix 12, form the color resin material layer; On the color resin material layer, form photoresist; Adopt mask to resist exposure; The photoresist that the made public back of developing is formed the patterning photoresist; By this patterning photoresist the color resin material layer is carried out dry etching, to form color resin 13, its part covers black matrix 12 and is formed between the adjacent two black matrixes 12.Color resin 13 can be for red, blue or green.CF is last to be placed with a plurality of red resins, blue resins and green resin by certain rule, and the color resin of same color is made in same photoetching process.Color resin 13 among Fig. 1, color resin 13 ' and color resin 13 " have different colours, and color resin 13 ' with color resin 13 " respectively by processing successively with color resin 13 identical photoetching processes.
Functional layer forms step and comprises: on the substrate 11 that is formed with black matrix 12 and color resin 13, form common electrode layer 14, protective seam 15 and oriented layer 16 successively.
In forming the process of above-mentioned CF, the inventor finds to have following problem in the prior art at least: the section of being called that does not cover the difference in height between the color resin top partly on the color resin top that covers black matrix edge part and the black matrix is poor.Generally; In order to make evenly distributed need the oriented layer on the CF friction of liquid crystal molecule in the display panels that is assembled into by CF and array base palte; But because the existence of section difference makes that the oriented layer surface is rough and uneven in surface; Cause in the process of friction orientation layer, the uneven phenomenon of friction appears in the oriented layer in corresponding section difference zone.Because these frictions are bad to have caused in the display panels near the liquid crystal molecule the corresponding section difference zone can not normal alignment, makes this regional brightness be different from other zone, thereby has reduced the display quality of display panels.
Summary of the invention
Embodiments of the invention provide a kind of color membrane substrates, its preparation method and display panels, can reduce color membrane substrates enamel between resin and the black matrix the section poor.
For achieving the above object, embodiments of the invention adopt following technical scheme:
A kind of preparation method of color membrane substrates; Comprise: on substrate, form black matrix, color resin, common electrode layer, protective seam and oriented layer successively; Wherein, the step that forms said color resin comprises: adopt first gray level mask plate that first photoresist that is formed on the color resin material layer is made public; Said first photoresist that develops after the exposure forms the first patterning photoresist, on the said first patterning photoresist corresponding to the thickness of said black matrix top less than thickness corresponding to zone between the adjacent two black matrixes; By the said first patterning photoresist said color resin material layer is carried out dry etching, to form said color resin.
A kind of color membrane substrates is by preparation method's preparation of above-mentioned color membrane substrates.
A kind of display panels comprises above-mentioned color membrane substrates.
In the color membrane substrates that the embodiment of the invention provides, its preparation method and the display panels; Owing in the process that forms color resin, adopted the gray level mask technology; On the photoresist pattern that make to form corresponding to the thickness of black matrix top less than thickness corresponding to zone between the adjacent two black matrixes; Photoresist pattern and color resin material layer are understood quilt etching together in dry etch step subsequently; Therefore; Can be corresponding to the etch amount of black matrix top color resin material layer greater than etch amount corresponding to the color resin material layer in zone between the adjacent two black matrixes, thus the thickness of color resin and black matrix lap can be reduced, and then reduced section poor between color resin and the black matrix.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art; To do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below; Obviously, the accompanying drawing in describing below only is some embodiments of the present invention, for those of ordinary skills; Under the prerequisite of not paying creative work property, can also obtain other accompanying drawing according to these accompanying drawings.
Fig. 1 is the schematic cross-section of the color membrane substrates of prior art for preparing;
Fig. 2 A~2F is the preparation method's of the embodiment of the invention 1 color membrane substrates a flow process schematic cross-section;
Fig. 3 A~3E is the preparation method's of the embodiment of the invention 2 color membrane substrates a flow process schematic cross-section.
Embodiment
The embodiment of the invention provides a kind of preparation method of color membrane substrates; Comprise: on substrate, form black matrix, color resin, common electrode layer, protective seam and oriented layer successively; Wherein, the step that forms said color resin comprises: adopt first gray level mask plate that first photoresist that is formed on the color resin material layer is made public; Said first photoresist that develops after the exposure forms the first patterning photoresist, on the said first patterning photoresist corresponding to the thickness of said black matrix top less than thickness corresponding to zone between the adjacent two black matrixes; By the said first patterning photoresist said color resin material layer is carried out dry etching, to form said color resin.
The embodiment of the invention also provides a kind of color membrane substrates, by preparation method's preparation of above-mentioned color membrane substrates.
The embodiment of the invention provides a kind of display panels again, comprises above-mentioned color membrane substrates.
In the color membrane substrates that the embodiment of the invention provides, its preparation method and the display panels; Owing in the process that forms color resin, adopted the gray level mask technology; On the photoresist pattern that make to form corresponding to the thickness of black matrix top less than thickness corresponding to zone between the adjacent two black matrixes; Photoresist pattern and color resin material layer are understood quilt etching together in dry etch step subsequently; Therefore; Can be corresponding to the etch amount of black matrix top color resin material layer greater than etch amount corresponding to the color resin material layer in zone between the adjacent two black matrixes, thus the thickness of color resin and black matrix lap can be reduced, and then reduced section poor between color resin and the black matrix.
To combine the accompanying drawing in the embodiment of the invention below, the technical scheme in the embodiment of the invention is carried out clear, intactly description, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the present invention's protection.
Embodiment 1
Present embodiment provides a kind of preparation method of color membrane substrates, referring to Fig. 2 A~2F this method is described in detail.
Step 1, utilize prior art on substrate 21, to form black matrix 22 (shown in Fig. 2 A).
Step 2, utilize the gray level mask technology on the substrate 21 that is formed with black matrix 22, to form color resin.
This step specifically comprises: be shown on the substrate 21 that is formed with black matrix 22 color resin material layer 23 and photoresist 24 successively like Fig. 2 B; Adopt gray level mask plate that photoresist 24 is made public; The photoresist 24 that develops after the exposure forms patterning photoresists 25 (shown in Fig. 2 C), on this patterning photoresist 25 corresponding to the thickness d 1 of black matrix 22 tops less than thickness d 2 corresponding to zone between the adjacent two black matrixes 22; Carry out dry etching by 25 pairs of color resin material layers of this patterning photoresist 23, to form color resin 26 (shown in Fig. 2 D).
Step 3, set by step 2 on substrate 21, continue to form other two kinds of colors color resin (color resin 26 shown in Fig. 2 E ' with color resin 26 ").
Step 4, utilize prior art on the substrate 21 that is formed with black matrix 22 and color resin, to form common electrode layer 27, protective seam 28 and oriented layer 29 (shown in Fig. 2 F) successively.
In the present embodiment; Owing in the process that forms color resin, adopted the gray level mask technology; On the photoresist pattern that make to form corresponding to the thickness of black matrix top less than thickness corresponding to zone between the adjacent two black matrixes; Photoresist pattern and color resin material layer can be by etchings together in dry etch step subsequently, therefore, and can be corresponding to the etch amount of black matrix top color resin material layer greater than etch amount corresponding to the color resin material layer in zone between the adjacent two black matrixes; Thereby can reduce the thickness of color resin and black matrix lap, and then the section that has reduced between color resin and the black matrix is poor.
Embodiment 2
Present embodiment provides a kind of preparation method of color membrane substrates, referring to Fig. 3 A~3E this method is described.
Step 1, utilize the gray level mask technology on substrate 31, to form black matrix.
This step specifically comprises: on substrate 301, form black matrix material layer 302 and photoresist 303 (shown in Fig. 3 A) successively; Adopt gray level mask plate that photoresist 303 is made public; This photoresist 303 that develops after making public forms the photoresist pattern 304 (shown in Fig. 3 B) with concave shape structure; Carry out dry etching by 304 pairs of black matrix material layers 302 of this photoresist pattern, have the black matrix 306 (shown in Fig. 3 C) of recess 305 with formation.
Step 2, utilize the gray level mask technology on the substrate 301 that is formed with black matrix 306, to form color resin shown in Fig. 3 D (color resin 307, color resin 307 ' and color resin 307 ").
The formation step of the color resin of describing among this step and the embodiment is identical; Repeat no more at this; What the color resin that present embodiment forms was different with the color resin that forms according to embodiment 1 is: color resin not only covers the fringe region of black matrix; Also cover the recess of black matrix, the color resin that therefore forms the two kind different colours adjacent with black matrix is in the overlapping structure of recess.
Step 3, utilize prior art on the substrate 301 that is formed with black matrix 306 and color resin, to form common electrode layer 308, protective seam 309 and oriented layer 310 (shown in Fig. 3 E) successively.
In the present embodiment; Owing to utilize the gray level mask technology on black matrix, to form recess; And the color resin that utilizes the gray level mask technology to form not only covers the fringe region of black matrix; Covered recess simultaneously; Make that part color resin, that cover this black matrix of the two kind different colours adjacent with black matrix is overlapping in the recess of this black matrix, be equivalent to cut down through recess the part height of this overlapping color resin, what make that the height of overlapping color resin outside recess remedied that black matrix edge zone enamels that resin forms is section poor; The section that has further reduced between black matrix and the color resin is poor, thereby can make oriented layer rub more evenly.
The embodiment of the invention also provides a kind of color membrane substrates, and it is by enforcement 1 or implement the preparation of 2 provider's methods.
The embodiment of the invention provides a kind of display panels again, and it comprises above-mentioned color membrane substrates.
Because this display panels has adopted the color membrane substrates that uses embodiment 1 or the preparation of embodiment 2 methods; Can avoid because near the liquid crystal molecule the corresponding section difference zone can not normal alignment in the bad display panels that causes of friction of oriented layer on the color membrane substrates; Therefore, this display panels has uniform brightness and higher display quality.
The embodiment of the invention is used to prepare display panels.
The above; Be merely embodiment of the present invention, but protection scope of the present invention is not limited thereto, any technician who is familiar with the present technique field is in the technical scope that the present invention discloses; The variation that can expect easily or replacement all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of said claim.

Claims (5)

1. the preparation method of a color membrane substrates comprises: on substrate, form black matrix, color resin, common electrode layer, protective seam and oriented layer successively, it is characterized in that the step that forms said color resin comprises:
Adopt gray level mask plate that the photoresist that is formed on the color resin material layer is made public;
The said photoresist that develops after the exposure forms the patterning photoresist, said patterning photoresist, corresponding to the thickness of said black matrix top less than thickness corresponding to zone between the adjacent two black matrixes;
By said patterning photoresist said color resin material layer is carried out dry etching, to form said color resin.
2. method according to claim 1 is characterized in that, said color resin is red, blue or green.
3. method according to claim 2 is characterized in that, also comprises:
Before forming said color resin, on said black matrix, form recess;
The step of the said color resin of said formation comprises that also to make the color resin of two kinds of adjacent different colours overlapping in the female portion.
4. color membrane substrates; Be included in the black matrix, color resin, common electrode layer, protective seam and the oriented layer that form successively on the substrate; It is characterized in that thickness said color resin, that cover said black matrix top is less than the thickness that covers zone between the adjacent two black matrixes.
5. a display panels is characterized in that, comprises the described color membrane substrates of claim 4.
CN201110264527.1A 2011-09-06 2011-09-06 Color-film substrate, preparation method thereof and liquid crystal display panel Expired - Fee Related CN102650757B (en)

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Cited By (5)

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CN103646852A (en) * 2013-12-12 2014-03-19 京东方科技集团股份有限公司 Manufacturing method of substrate
CN104009062A (en) * 2014-04-23 2014-08-27 京东方科技集团股份有限公司 Color film substrate, manufacturing method, organic electroluminescence display panel and display device
WO2015149378A1 (en) * 2014-04-04 2015-10-08 深圳市华星光电技术有限公司 Exposure mask and manufacturing method of color filter
CN105404050A (en) * 2016-01-04 2016-03-16 京东方科技集团股份有限公司 Color film substrate and manufacture method and display device thereof
WO2016095278A1 (en) * 2014-12-19 2016-06-23 深圳市华星光电技术有限公司 Color film substrate for display, manufacturing method therefor, and photomask for color film substrate

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KR20070063056A (en) * 2005-12-14 2007-06-19 삼성전자주식회사 Color filter substrate for liquid crystal display and fabricating method thereof
CN101706626A (en) * 2009-04-03 2010-05-12 深超光电(深圳)有限公司 Colorful filter substrate and liquid crystal display panel thereof
CN101819349A (en) * 2009-02-27 2010-09-01 北京京东方光电科技有限公司 Color film base plate and manufacturing method thereof as well as liquid crystal display panel

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JPH11174465A (en) * 1997-12-16 1999-07-02 Denso Corp Liquid crystal cell
CN1427284A (en) * 2001-12-11 2003-07-02 精工爱普生株式会社 Electro-optical apparatus, substrate for electro-optical apparatus and mfg. method thereof, and electronic apparatus
CN1797111A (en) * 2004-12-31 2006-07-05 Lg.菲利浦Lcd株式会社 Color filter substrate for liquid crystal display and method of fabricating the same
KR20070063056A (en) * 2005-12-14 2007-06-19 삼성전자주식회사 Color filter substrate for liquid crystal display and fabricating method thereof
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CN103646852A (en) * 2013-12-12 2014-03-19 京东方科技集团股份有限公司 Manufacturing method of substrate
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WO2015149378A1 (en) * 2014-04-04 2015-10-08 深圳市华星光电技术有限公司 Exposure mask and manufacturing method of color filter
CN104009062A (en) * 2014-04-23 2014-08-27 京东方科技集团股份有限公司 Color film substrate, manufacturing method, organic electroluminescence display panel and display device
CN104009062B (en) * 2014-04-23 2015-04-29 京东方科技集团股份有限公司 Color film substrate, manufacturing method, organic electroluminescence display panel and display device
WO2016095278A1 (en) * 2014-12-19 2016-06-23 深圳市华星光电技术有限公司 Color film substrate for display, manufacturing method therefor, and photomask for color film substrate
CN105404050A (en) * 2016-01-04 2016-03-16 京东方科技集团股份有限公司 Color film substrate and manufacture method and display device thereof
CN105404050B (en) * 2016-01-04 2018-04-20 京东方科技集团股份有限公司 Color membrane substrates and preparation method thereof, display device

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