CN102621826A - Synchronous control system of step scanning photoetching machine based on VME (Virtual Mobile Engine) bus and synchronous control method thereof - Google Patents
Synchronous control system of step scanning photoetching machine based on VME (Virtual Mobile Engine) bus and synchronous control method thereof Download PDFInfo
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Abstract
基于VME总线的步进扫描光刻机的同步控制系统及该系统的同步控制方法，本发明具体涉及基于VME总线的步进扫描光刻机的同步控制系统及该系统的同步控制方法。它为了解决步进扫描光刻机曝光过程中的同步误差大，光刻效率低的问题。本发明的上位机与下位机通过以太网连接，同步控制组件通过VME64标准总线与下位机连接，同步控制组件通过VME64自定义协议总线与激光计数组件和运动控制组件连接，同步控制组件的网口通过网线与下位机的网口连接，VME总线包括VME64自定义协议总线和VME64标准总线。本发明达到了控制和减小步进扫描过程中的同步误差，提高光刻效率的目的。本发明适用于扫描光刻机领域。
A synchronous control system of a VME bus-based step-scan lithography machine and a synchronous control method of the system. The present invention specifically relates to a synchronous control system of a VME bus-based step-scan lithography machine and a synchronous control method of the system. It aims to solve the problems of large synchronization error and low photolithography efficiency in the exposure process of the step-and-scan photolithography machine. The upper computer of the present invention is connected with the lower computer through Ethernet, the synchronous control component is connected with the lower computer through the VME64 standard bus, the synchronous control component is connected with the laser counting component and the motion control component through the VME64 custom protocol bus, and the network port of the synchronous control component It is connected to the network port of the lower computer through a network cable, and the VME bus includes a VME64 custom protocol bus and a VME64 standard bus. The invention achieves the purpose of controlling and reducing the synchronous error in the step scanning process and improving the photoetching efficiency. The invention is applicable to the field of scanning photolithography machines.
Description
Technical field
The present invention relates to a kind of synchronous control system, be specifically related to based on the synchronous control system of the step-by-step scanning photo-etching device of VME bus and the synchronisation control means of this system.
Background technology
Development of integrated circuits mainly relies on the development of semiconductor manufacturing equipment, and along with development of technology, the integrated level of silicon chip improves constantly, to live width require increasingly high.Present stage, photoetching has become the core technology of great scale integrated circuit, and the integrated level of circuit is played a decisive role.Litho machine is a strategic task that has merged the newest research results of many sciemtifec and technical spheres.
Along with the increase of die size, require to have high resolving power and big visual field simultaneously, the design cost of object lens is very high under original mode of operation.The mode of operation of step-scan can reduce the requirement to object lens.Obtain image quality preferably, the bearing accuracy and the synchronization accuracy of the kinetic control system of work stage and mask platform are all had higher requirement.Therefore, the control technology of work stage and mask platform has been called one of core technology of litho machine.
Summary of the invention
The synchronous error that the objective of the invention is in order to solve in the step-by-step scanning photo-etching device exposure process is big, the inefficient problem of photoetching, thus proposed based on the synchronous control system of the step-by-step scanning photo-etching device of VME bus and the synchronisation control means of this system.
Synchronous control system based on the step-by-step scanning photo-etching device of VME bus; It comprises host computer, slave computer, laser counting assembly, synchro control assembly, motion control component and VME bus; Described motion control component is made up of work stage controller and mask platform controller
Described VME bus comprises VME64 custom protocol bus and VME64 STD bus; Described VME64 custom protocol bus is the User Defined interface of P2/J2 mouth; This User Defined interface comprises the address bus of 7 laser counting assemblies; The data bus of 36 laser counting assemblies; The sampled signal line of 2 laser counting assemblies; The clock cable of 1 laser counting assembly; The state transfer signal wire of 6 laser counting assemblies; The data read signal line of 1 motion control component; The data bus of 48 motion control components; The reference signal line of laser counting assembly and the status signal lines of motion control component
Described host computer is connected through Ethernet with slave computer; The synchro control assembly is connected with slave computer through the VME64 STD bus; The synchro control assembly is connected with motion control component with laser counting assembly through VME64 custom protocol bus, and the network interface of this synchro control assembly is connected with the network interface of slave computer through netting twine.
Synchronisation control means based on the synchronous control system of the step-by-step scanning photo-etching device of VME bus is: carry out decoupling zero through the information that laser counting assembly is measured and obtain controlled work stage current location data; Adopt position data and controlled work stage current location data in the position command of importing to subtract each other the position error data that obtains work stage, this work stage position error data inputs to the work stage controller;
Take advantage of 4 to obtain mask platform control position data the position data in the position command of input; Information decoupling zero through laser counting assembly is measured obtains controlled mask platform current location data; These mask platform control position data and controlled mask platform current location data are subtracted each other acquisition mask platform position error data, and this mask platform position error data inputs to the mask platform controller;
The work stage position error data is deducted 1/4th of mask platform position error data obtain the sync bit error information; This sync bit error information inputs to the synchro control assembly; And obtain correction data and the correction data of mask platform steering order of the work stage steering order of next control cycle through the synchro control algorithm process in this assembly; The correction data of work stage steering order are sent to the work stage controller through VME64 custom protocol bus, the correction data of mask platform steering order are sent to the mask platform controller through VME64 custom protocol bus;
The work stage controller obtains the steering order of the next control cycle of work stage according to the correction data of work stage position error data of importing and work stage steering order; And this steering order sent to the driver part of controlled work stage, be used to drive controlled work stage motion;
The mask platform controller obtains the steering order of the next control cycle of mask platform according to the correction data of mask platform position error data of importing and mask platform steering order; And this steering order sent to the driver part of controlled mask platform, be used to drive controlled mask platform motion;
/ 4th of a current location data of above-mentioned controlled mask platform is subtracted each other the sync bit error information that obtains work stage and mask platform with the current location data of controlled work stage, and this sync bit error is exported to slave computer.
The present invention provides based on the synchronous control system of the step-by-step scanning photo-etching device of VME bus and the synchronisation control means of this system; Signal is coordinated in scheduling through each sub-systems in the step-by-step scanning photo-etching device exposure process of synchro control assembly generation; Receive original sampling data that laser counting component passes comes and be the positional information that motion control component can be used its decoupling zero; Reach control and reduced the synchronous error in the step-scan process, improved the purpose of photoetching efficient.
Description of drawings
Fig. 1 is based on the basic principle schematic of synchronous control system of the step-by-step scanning photo-etching device of VME bus;
Fig. 2 is based on the synchronous control system overall construction drawing of the step-by-step scanning photo-etching device of VME bus;
Fig. 3 is the hardware structure diagram of synchro control card a;
Fig. 4 is the hardware structure diagram of synchro control card b;
Fig. 5 is the control cycle synoptic diagram;
Fig. 6 is the data transmission sketch of synchro control assembly 4, motion control component 5 and laser counting assembly 3;
Fig. 7 is based on the control block diagram of synchronisation control means of synchronous control system of the step-by-step scanning photo-etching device of VME bus.
Embodiment
Embodiment one, combination Fig. 1 specify this embodiment; Synchronous control system based on the step-by-step scanning photo-etching device of VME bus; It comprises host computer 1, slave computer 2, laser counting assembly 3, synchro control assembly 4, motion control component 5 and VME bus; Described motion control component 5 is made up of work stage controller and mask platform controller
Described VME bus comprises VME64 custom protocol bus and VME64 STD bus; Described VME64 custom protocol bus is the User Defined interface of P2/J2 mouth; This User Defined interface comprises the address bus of 7 laser counting assemblies 3; The data bus of 36 laser counting assemblies 3; The sampled signal line of 2 laser counting assemblies 3; The clock cable of 1 laser counting assembly 3; The state transfer signal wire of 6 laser counting assemblies 3; The data read signal line of 1 motion control component 5; The data bus of 48 motion control components 5; The status signal lines of signal wire and motion control component 5 at the bottom of the reference of laser counting assembly 3
Described host computer 1 and slave computer 2 are connected through Ethernet; Synchro control assembly 4 is connected with slave computer 2 through the VME64 STD bus; Synchro control assembly 4 is connected with motion control component 5 with laser counting assembly 3 through VME64 custom protocol bus, and the network interface of this synchro control assembly 4 is connected with the network interface of slave computer 2 through netting twine.
Synchro control assembly 4 is core controllers of step-by-step scanning photo-etching device synchro control.When litho machine makes public scanning, after each sub-systems is ready, implement the synchro control of whole scan exposure process by synchro control assembly 4.
Embodiment two, combination Fig. 1 specify this embodiment; The difference of the synchronous control system of the described step-by-step scanning photo-etching device based on the VME bus of this embodiment and embodiment one is; It also comprises signals collecting assembly 6, and synchro control assembly 4 is connected with signals collecting assembly 6 through the VME64 self-defined bus.
Embodiment three, combination Fig. 1 specify this embodiment; The difference of the synchronous control system of the described step-by-step scanning photo-etching device based on the VME bus of this embodiment and embodiment one is; It also comprises alignment controller 7, leveling and focusing controller 8, slit controller 9, lighting controller 10, dosage control device 11 and high-order as controller 12, and synchro control assembly 4 is connected as controller 12 with alignment controller 7, leveling and focusing controller 8, slit controller 9, lighting controller 10, dosage control device 11 and high-order through optical fiber respectively.
The difference of the synchronous control system of the described step-by-step scanning photo-etching device based on the VME bus of embodiment four, this embodiment and embodiment three is; Described synchro control assembly 4 is made up of synchro control card a and synchro control card b two boards card; Described synchro control card a comprises first serial 4-1-1, second serial 4-1-2, the first optical fiber port 4-1-3,10/100M network interface 4-1-4, the 3rd serial ports 4-1-5, the second optical fiber port 4-1-6, SRAM memory module 4-1-7, DSP synchro control algoritic module 4-1-8, NVRAM memory module 4-1-9, the first level switch module 4-1-10, the second level switch module 4-1-11, a VMEP2/J2 interface 4-1-12, a VMEP0/J0 interface 4-1-13, VMEP1/J1 interface 4-1-14 and FPGA module 4-1-15; Described FPGA module 4-1-15 comprises external data exchange logic interface 4-1-15-1 and VME interface 4-1-15-2, and described first serial 4-1-1, second serial 4-1-2 and the 3rd serial ports 4-1-5 are the RS422 communication port; First serial 4-1-1 is connected with alignment controller 7 through twisted-pair feeder; Second serial 4-1-2 is connected with lighting controller 10 through twisted-pair feeder; The first optical fiber port 4-1-3 is connected with alignment controller 7 through optical fiber; 10/100M network interface 4-1-4 is connected with slave computer 2 through netting twine; The 3rd serial ports 4-1-5 is connected with the serial port of slit controller 9 through twisted-pair feeder; The second optical fiber port 4-1-6 is connected with slit controller 9 through optical fiber; The one VMEP2/J2 interface 4-1-12 adopts self-defined VME64 bus protocol to be connected with slave computer 2; VMEP1/J1 interface 4-1-14 adopts standard VME64 bus protocol to be connected with slave computer 2,
Described external data exchange logic interface 4-1-15-1 is connected with first serial 4-1-1, second serial 4-1-2, the 3rd serial ports 4-1-5, the first optical fiber port 4-1-3,10/100M network interface 4-1-4 and the second optical fiber port 4-1-6 respectively; The storage data terminal of SRAM memory module 4-1-7 is connected with the storage data terminal of DSP synchro control algoritic module 4-1-8; Described DSP synchro control algoritic module 4-1-8 control algolithm end is connected with the control algolithm end of FPGA module 4-1-15; The storage end of described FPGA module 4-1-15 is connected with the storage end of NVRAM memory module 4-1-9; VME interface 4-1-15-2 is connected with the first level switch module 4-1-10, the second level switch module 4-1-11 and a VMEP0/J0 interface 4-1-13 respectively through the VME64 self-defined bus; The first level switch module 4-1-10 is connected with a VMEP2/J2 interface 4-1-12 through the VME64 self-defined bus, and the second level switch module 4-1-11 is connected with VMEP1/J1 interface 4-1-14 through the VME64 STD bus;
Synchro control card b comprises the 4th serial ports 4-2-1, the 5th serial ports 4-2-2, the 6th serial ports 4-2-3, concurrent testing mouth 4-2-4, the 3rd optical fiber port 4-2-5, the 4th optical fiber port 4-2-6, CPLD module 4-2-7, the 2nd VMEP2/J2 interface 4-2-8 and the 2nd VMEP0/J0 interface 4-2-9; Described the 4th serial ports 4-2-1, the 5th serial ports 4-2-2 and the 6th serial ports 4-2-3 are the RS422 communication port, and the 4th serial ports 4-2-1 is connected with the serial ports of dosage control device 11; The 5th serial ports 4-2-2 is connected with the serial ports of leveling and focusing controller 8; The 6th serial ports 4-2-3 is connected with the serial ports of high-order as controller 12; The optical fiber interface of leveling and focusing controller 8 is connected with the 3rd optical fiber port 4-2-5; Concurrent testing mouth 4-2-4 is a test port, is used for whether operate as normal of test logic chip; The 4th optical fiber port 4-2-6 is a spare interface; The 2nd VMEP2/J2 interface 4-2-8 adopts self-defined VME64 bus protocol to be connected with the industry control cabinet of slave computer 2; The 2nd VMEP0/J0 interface 4-2-9 is connected with a V MEP0/J0 interface 4-1-13 through the VME64 self-defined bus, is used to realize the message exchange of synchro control card a and synchro control card b,
Described CPLD module 4-2-7 is connected with the 4th serial ports 4-2-1, the 5th serial ports 4-2-2, the 6th serial ports 4-2-3 and concurrent testing mouth 4-2-4 respectively, and CPLD module 4-2-7 is connected with the 3rd optical fiber port 4-2-5, the 4th optical fiber port 4-2-6, the 2nd VMEP2/J2 interface 4-2-8 and the 2nd VMEP0/J0 interface 4-2-9 respectively.
Slave computer adopts the VME industrial computer system; The synchro control card a of synchro control assembly 4 is a 6U standard integrated circuit board; The interface position of front panel is limited, and synchro control assembly 4 needs to reserve a plurality of interfaces, so; Utilize the VME cabinet the rear panel Position Design synchro control card b of synchro control assembly 4 be connected through the connector P0 of VME bus with synchro control card a, P0 has 17 ground wires and 95 self-defined signal wires.Synchro control card b is the carrier of external coordination signaling interface, has saved the arrangement space of synchro control card a, the dirigibility that has improved interface.Fig. 3 is the hardware structure diagram of synchro control card a, and Fig. 4 is the hardware structure diagram of synchro control card b.
Embodiment five, combine Fig. 7 to specify this embodiment, this embodiment is described to be that the synchronisation control means of using the synchronous control system of the described step-by-step scanning photo-etching device based on the VME bus of embodiment one is:
Carry out decoupling zero through the information that laser counting assembly is measured and obtain controlled work stage current location data; Adopt position data and controlled work stage current location data in the position command of importing to subtract each other the position error data that obtains work stage, this work stage position error data inputs to the work stage controller;
Take advantage of 4 to obtain mask platform control position data the position data in the position command of input; Information decoupling zero through laser counting assembly is measured obtains controlled mask platform current location data; These mask platform control position data and controlled mask platform current location data are subtracted each other acquisition mask platform position error data, and this mask platform position error data inputs to the mask platform controller;
The work stage position error data is deducted 1/4th of mask platform position error data obtain the sync bit error information; This sync bit error information inputs to the synchro control assembly; And obtain correction data and the correction data of mask platform steering order of the work stage steering order of next control cycle through the synchro control algorithm process in this assembly; The correction data of work stage steering order are sent to the work stage controller through VME64 custom protocol bus, the correction data of mask platform steering order are sent to the mask platform controller through VME64 custom protocol bus;
The work stage controller obtains the steering order of the next control cycle of work stage according to the correction data of work stage position error data of importing and work stage steering order; And this steering order sent to the driver part of controlled work stage, be used to drive controlled work stage motion;
The mask platform controller obtains the steering order of the next control cycle of mask platform according to the correction data of mask platform position error data of importing and mask platform steering order; And this steering order sent to the driver part of controlled mask platform, be used to drive controlled mask platform motion;
/ 4th of a current location data of above-mentioned controlled mask platform is subtracted each other the sync bit error information that obtains work stage and mask platform with the current location data of controlled work stage; This sync bit error is exported to slave computer, in certain hour, exceeds allowed band and just produces error message.
The step-by-step scanning photo-etching device its working principles is seen shown in Figure 2.Mask platform carries the mask of chip design, and work stage is then carried silicon chip to be carved, and need move to the exposure position of appointment; Work stage moves to the exposure light source below, opens the exposure shutter synchronously, and work stage and mask platform continue at the uniform velocity move toward one another; Exposure light source is projected to mask pattern on the silicon chip then; Working table movement is behind assigned address, and exposure light source is closed, and accomplishes the single pass exposure process.This crosses the range request mask platform and the work stage strictness is at the uniform velocity synchronous, and keeps fixed speed ratios 4: 1 (by the scale down decision of projection objective).Great circle is represented whole silicon chip among the figure, and each exposure area is called a field, fills square and representes field of making public and accomplishing, and blank square is represented still unexposed field, and the dotted line small circle representes to carry out the field of scan exposure.Along with mask platform and the move toward one another of work stage about projection objective, constantly made public in the field of planning on the silicon chip.
The photoetching machine control system general structure is as shown in Figure 1.Synchro control assembly 4 is the core of control system, is a ring important in the position feedback, also is the processing unit of synchro control algorithm.The major function of synchro control assembly 4 is the exchanges data on the control VME bus; Produce internal schedule signal and external coordination signal; The original sampling data decoupling zero that sends over laser counting assembly 3 is the positional information that synchro control assembly 4 can be used; The site error of work stage and mask platform and draw the modified value of motion control component 5 controlled quentity controlled variables through the synchro control algorithm in the calculation exposure process is collected error condition.
Synchro control assembly 4 information transmitted mainly contain: slave computer is through the exposure scan-data of VME64 STD bus agreement to 4 transmission of synchro control assembly; The internal schedule signal that synchro control assembly 4 sends to slave computer through the VME64 custom protocol; The external coordination signal that synchro control assembly 4 adopts RS422 communication port differential signal to send to slave computer; The original sampling data that laser counting assembly 3 adopts the VME64 custom protocol to send to synchro control assembly 4 under the effect of internal schedule signal; Synchro control assembly 4 is adopting VME64 custom protocol home position information after the decoupling zero that motion control component 5 sends under the effect of internal schedule signal; The error message that synchro control assembly 4 adopts VME64 STD bus agreement to send to slave computer 2.
In the synchro control of 200us in the cycle; Comprise following subcycle: numbered card sampling period, numbered card data transfer cycle, numbered card data solver cycle; Motion control component 5 data acquisition cycle, motion control instruction computation period and steering order are sent cycle and idling cycle.Control cycle is as shown in Figure 5.
Begin sampling after laser counting assembly 3 receives the sampling instruction, the raw data that sampling obtains will be latched in the predetermined register, and sampling finishes, and returns the original sampling data latch signal.Five laser counting assemblies 3 are at same machine-processed down-sampling, latch data, return data latch signal separately after, laser counting 3 sampling periods of assembly finish.
After sampling period finished, data transfer cycle began, and the synchro control card reads the original sampling data of five laser counting assemblies 3 successively according to predetermined laser counting assembly 3 addresses, deposits among the NVRAM memory module 4-1-9 of synchro control assembly 4.
Laser counting assembly 3 original sampling datas are transformed to 18 positional informations that motion control component 5 can be used, i.e. the physical location of sampling instant work stage and mask platform in the exposure process through after resolving.Synchro control assembly 4 adds corresponding prefix in the front of each positional information after resolving, in order to distinguish different light path data, called after home position data are one 48 bit binary data.
In motion control component 5 data transfer cycles; Synchro control assembly 4 sends data read signal to motion control component 5 and also in order 18 road position error information data is write in the self-defined synchronous bus of VME64P2/J2 mouth; 11 motion control components 5 are after receiving data read signal; Read data and storage in the self-defined parallel bus, after 18 circulations, every motion control component 5 is with getting access to 18 road all position error information data respectively; Motion control component 5 is according to prefix, and the position error information of choosing needs in the current control cycle is as the position feedback amount in the closed-loop control.Fig. 6 has described above stream data transmission direction.
After laser counting assembly 3 resolves end cycle; Synchro control assembly 4 can calculate the synchro control error in the current control cycle according to the work stage and the mask platform planned trajectory of current location information and slave computer 2 transmissions; After the processing of synchronous error correcting unit; Draw a modified value, be used for revising the motion control instruction in next control cycle.This modified value can reduce work stage and mask platform synchronous error in the exposure process, improves photoetching resolution and alignment precision.Fig. 7 has described above-mentioned control algolithm.
The work stage of motion control component 5 is divided into two work stage, is respectively first work stage and second work stage.First work stage is in the exposure area, and second work stage is in measured zone, and the upper and lower silicon chip of second work stage is accomplished leveling and focusing; Actions such as aligning, after first work stage was accomplished exposure, first work stage and second work stage were changed platform; Second work stage is carried out exposure actions, and first work stage is carried out upper and lower silicon chip, accomplishes leveling and focusing; Actions such as aligning move in circles, and raise the efficiency.
Based on above-mentioned synchro control assembly 4, in conjunction with the step-by-step scanning photo-etching device workflow, concrete steps are following:
The communication system of step 1, host computer 1 sends to slave computer 2 with the exposure parameter and the mode of operation information of user's input through Ethernet;
After step 2, slave computer 2 receive exposure parameter and mode of operation information, exposure parameter being carried out parameter resolve, is the host computer parameter transformation exposure parameter, has obtained the ready signal that makes public; Call for synchro control card and motion control card in the exposure process;
Step 3, slave computer 2 ready signal that will make public sends to synchro control assembly 4 and motion control component 5, and exposure process begins to prepare;
Step 4, synchro control assembly 4 send the exposure enabling signal to laser counting assembly 3, motion control component 5 and signals collecting assembly 6 after receiving the exposure ready signal; Motion control component 5 is controlled first work stage, second work stage and mask platform to the motion of exposure reference position after receiving the exposure enabling signal; Laser counting assembly 3 sends original sampling data to synchro control assembly 4 after receiving the exposure enabling signal; 4 pairs of original sampling datas of synchro control assembly calculate original position-information, and position error information is sent to motion control component 5 as position feedback information;
Step 5, synchro control assembly 4 send the laser ready signal to lighting controller 10, and the high-voltage capacitance of lighting controller 10 begins charging, prepares to send first light pulse;
Step 6, synchro control assembly 4 receive and interrupt to slave computer 2 requests of sending after scanning is ready to complete signal, and the exposure preparatory stage accomplishes;
Step 8, motion control component 5 controls first work stage move to measurement zone, accomplish leveling and focusing and alignment parameter collection;
Step 11, motion control component 5 control first work stage and mask platform begin exposure, and in each control cycle, synchro control assembly 4 calculates synchronous error and motion control component 5 steering orders are revised, and accomplishes exposure process;
Step 12, motion control component 5 control first work stage and second work stage get into changes Tai Qu, accomplishes and changes platform;
Step 13, motion control component 5 controls first work stage get into section up and down, accomplish sheet action down; If need continuous exposure, then descend sheet after, carry out last slice action; Otherwise the control of first work stage stops;
Step 14, motion control component 5 controls second work stage get into exposure region, as carry out continuous exposure, then carry out step 11, otherwise the control of second work stage stops;
Step 15, synchro control assembly 4 notice motion control components 5 and other exposure subsystems get into idle condition.
Claims (5)
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103092114A (en) * | 2013-01-22 | 2013-05-08 | 中国科学院光电技术研究所 | Embedded control equipment and control method for photoetching machine |
| CN103389625A (en) * | 2013-07-11 | 2013-11-13 | 浙江大学 | Communication method of immersion liquid transmission system applied to immersion lithography machine |
| CN103901832A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Serial synchronous control system |
| CN104181901A (en) * | 2014-09-04 | 2014-12-03 | 哈尔滨工业大学 | Upper computer centralized management and multi-level control system based on VxWorks |
| CN104360639A (en) * | 2014-09-16 | 2015-02-18 | 哈尔滨工业大学 | VME user-defined bus-based real-time synchronous grating ruler data reading method for multiple motion control cards |
| CN104950768A (en) * | 2015-06-24 | 2015-09-30 | 哈尔滨工业大学 | VME (Versa module Eurocard) bus based multi-board-card communication method of dual-stage lithography control system |
| CN105004264A (en) * | 2015-07-22 | 2015-10-28 | 哈尔滨工业大学 | VME bus-based method for synchronously reading data of multi-channel laser interferometer |
| CN105068386A (en) * | 2015-09-07 | 2015-11-18 | 哈尔滨工业大学 | Security protection method of double-workpiece-platform system |
| CN106324999A (en) * | 2015-07-06 | 2017-01-11 | 上海微电子装备有限公司 | Control framework for lithography equipment |
| CN110362010A (en) * | 2019-07-17 | 2019-10-22 | 江苏金陵智造研究院有限公司 | A kind of modularized multi-axis laser galvanometer motion controller |
| CN112859526A (en) * | 2019-11-27 | 2021-05-28 | 上海微电子装备（集团）股份有限公司 | Synchronous diagnosis method and device for scanning photoetching machine, medium and electronic equipment |
| CN113031439A (en) * | 2021-03-01 | 2021-06-25 | 哈尔滨工业大学 | Double-motion-table precise cooperative control system and method |
| TWI748425B (en) * | 2019-04-30 | 2021-12-01 | 大陸商上海微電子裝備（集團）股份有限公司 | Synchronous drive equipment fault diagnosis system and its diagnosis method |
| CN113983924A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
| CN113983925A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103901832A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Serial synchronous control system |
| CN103901832B (en) * | 2012-12-28 | 2016-12-07 | 上海微电子装备有限公司 | Serial synchronous control system |
| CN103092114A (en) * | 2013-01-22 | 2013-05-08 | 中国科学院光电技术研究所 | Embedded control equipment and control method for photoetching machine |
| CN103389625A (en) * | 2013-07-11 | 2013-11-13 | 浙江大学 | Communication method of immersion liquid transmission system applied to immersion lithography machine |
| CN104181901B (en) * | 2014-09-04 | 2016-07-06 | 哈尔滨工业大学 | Multilevel control system is managed concentratedly based on VxWorks host computer |
| CN104181901A (en) * | 2014-09-04 | 2014-12-03 | 哈尔滨工业大学 | Upper computer centralized management and multi-level control system based on VxWorks |
| CN104360639A (en) * | 2014-09-16 | 2015-02-18 | 哈尔滨工业大学 | VME user-defined bus-based real-time synchronous grating ruler data reading method for multiple motion control cards |
| CN104950768A (en) * | 2015-06-24 | 2015-09-30 | 哈尔滨工业大学 | VME (Versa module Eurocard) bus based multi-board-card communication method of dual-stage lithography control system |
| CN106324999A (en) * | 2015-07-06 | 2017-01-11 | 上海微电子装备有限公司 | Control framework for lithography equipment |
| CN105004264A (en) * | 2015-07-22 | 2015-10-28 | 哈尔滨工业大学 | VME bus-based method for synchronously reading data of multi-channel laser interferometer |
| CN105068386A (en) * | 2015-09-07 | 2015-11-18 | 哈尔滨工业大学 | Security protection method of double-workpiece-platform system |
| CN105068386B (en) * | 2015-09-07 | 2017-04-12 | 哈尔滨工业大学 | Security protection method of double-workpiece-platform system |
| TWI748425B (en) * | 2019-04-30 | 2021-12-01 | 大陸商上海微電子裝備（集團）股份有限公司 | Synchronous drive equipment fault diagnosis system and its diagnosis method |
| CN110362010A (en) * | 2019-07-17 | 2019-10-22 | 江苏金陵智造研究院有限公司 | A kind of modularized multi-axis laser galvanometer motion controller |
| CN110362010B (en) * | 2019-07-17 | 2020-04-17 | 江苏金陵智造研究院有限公司 | Modular multi-axis laser galvanometer motion controller |
| CN112859526A (en) * | 2019-11-27 | 2021-05-28 | 上海微电子装备（集团）股份有限公司 | Synchronous diagnosis method and device for scanning photoetching machine, medium and electronic equipment |
| CN113031439A (en) * | 2021-03-01 | 2021-06-25 | 哈尔滨工业大学 | Double-motion-table precise cooperative control system and method |
| CN113983924A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
| CN113983925A (en) * | 2021-10-27 | 2022-01-28 | 北京航天巨恒系统集成技术有限公司 | Coordinate calculation system, method and device of multi-axis laser interferometer |
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