CN102605431B - Furnace mouth reflux part for diffusion furnace - Google Patents
Furnace mouth reflux part for diffusion furnace Download PDFInfo
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- CN102605431B CN102605431B CN201210073355.4A CN201210073355A CN102605431B CN 102605431 B CN102605431 B CN 102605431B CN 201210073355 A CN201210073355 A CN 201210073355A CN 102605431 B CN102605431 B CN 102605431B
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- spoiler
- annular
- choking ring
- silica tube
- island shape
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Abstract
The invention discloses a furnace mouth reflux part for a diffusion furnace. The furnace mouth reflux part for the diffusion furnace comprises a plurality of groups of annular island-shaped reflux structures. An annular flow blocking ring of an annular island-shaped reflux structure is provided with a bump which is protruded inwards a quartz tube. A flow blocking plate and the annular flow blocking ring of the annular island-shaped reflux structure are arranged oppositely and are arranged in the quartz tube; the flow blocking plate and the annular flow blocking ring are arranged concentrically; a gap is reserved between the flow blocking plate and the annular flow blocking ring to form an annular airflow channel; and therefore, a group of annular island-shaped reflux structures is formed; a plurality of groups of annular island-shaped reflux structures are arranged at intervals in the direction of the quartz tube opening from the inside to outside according to the sizes of the inside diameters of the annular flow blocking rings and the outside diameters of the flow blocking plates in each group of the island-shaped reflux structures, namely the inside diameters of the annular flow blocking rings and the outside diameters of the flow blocking plates which are arranged oppositely to the annular flow blocking rings are increased gradually in turn from the inside to outside, namely towards the direction of the quartz tube opening; and a plurality groups of annular island-shaped reflux structures are arranged in such a way to form a plurality of groups of annular island-shaped reflux structures.
Description
Technical field
The present invention relates to a kind of fire door backflow parts of diffusion furnace.
Background technology
Boron diffusion doping is the main barrier that photovoltaic circle is realized high-level efficiency, low cost, the raising market competitiveness, and it realizes the reason that difficult point has Technology aspect, also has the reason of device structure aspect.Technology aspect is mainly the intermediate product boron oxide (B of boron diffusion doping
2o
3) boiling point very high, suppressed the homogeneity of boron diffusion doping.Boron diffusion equipment is divided into low pressure diffusion facilities and normal pressure diffusion facilities, its mesolow diffusion facilities is comparatively expensive, low pressure diffusion furnace needs well behaved vacuum apparatus, improved the cost of equipment, increased the production cost of solar cell, that bibliographical information is more at present is the Tempress low temperature diffusion stove (A.R.Burgers cooperating with ECN, L.J.Geerligs, A.J.Carr, A.Gutjahr, et al., 19.5%efficient n-type Si solar cells made in production, 26
theuropean Photovoltaic Solar Energy Conference and Exhibition, 5-9September 2011, Hamburg, Germany).
Normal pressure diffusion is widely used system knot diffusion facilities during current solar cell is produced, studied.Equipment and technology is ripe, and Stability Analysis of Structures, is mainly used in the phosphorous diffusion of p-Si solar cell emitter.Adopt diffusion way to realize in the process of dissimilar doped layer, the sealing element of the diffusion furnace mouth of pipe has played the effect of exchange mutually between the inner impurity gas of relatively isolated diffusion quartz tube and ambient atmos, play the effect of ferrule, for Open tdde diffusion, play the effect of exhaust emissions simultaneously.Fig. 1 is current constant-pressure and high-temperature Open tdde diffusion stove schematic diagram, mainly comprises diffusion quartz tube 100, quartzy fire door 101, quartzy bolt 102, quartz socket tube 103, spring 104, oar fixed system 105, oar 106 and offgas duct 107.Quartzy fire door 101 diameters are greater than the external diameter of diffusion quartz tube 100, and quartzy fire door 101 is installed and is placed on oar 106 by hollow part 1010.Quartzy bolt 102 by spring 104, realizes bumper and absorbing shock by two apertures 1011 on quartzy door 100 and oar fixed system 105 interconnects, because the mutual extruding between diffusion quartz tube 100 and quartzy fire door 101 makes spring 104, there is deformation in the front limit place advancing at oar 106, the reactive force of spring 104 makes between diffusion quartz tube 100 and quartzy fire door 101 mutually closed, realizes the relative closure of doping mixed gas.Tail gas discharging pipe 107 forms an integral body with quartzy fire door 101 simultaneously, realizes the stability of equilibrium of quartzy fire door 100.This conventional Open tdde diffusion stove can be realized good doping effect for this class doped elements such as phosphorus impurities.But adulterate for boron, owing to realizing, boron substance (comprising boron oxide, boric acid and the metaboric acid etc.) fusing point generating in boron diffusion doping process is higher, beyond flat-temperature zone, near near the boron substance generating diffusion quartz tube 100 mouths of pipe, owing to meeting cold, quick cooled and solidified becomes solid, not only can cause the obstruction of offgas duct 107, interface at diffusion quartz tube 100 and quartzy fire door 101 also can form between diffusion quartz tube 100 and quartzy fire door 101 " binding agent ", makes mutually to bond between diffusion quartz tube 100 and quartzy fire door 101.Because quartzy fire door 101 is to place to be arranged on oar 106, in the process of coming out of the stove in oar 106 motions after technological process completes, can there is diffusion quartz tube 100 and be drawn out next situation, easily cause the damage of diffusion quartz tube 100, even form and produce dangerous hidden danger.Secondly, diffusion quartz tube 100 is producing interaction force in extrusion process mutually with quartzy fire door 101, the deformation of spring 104 simultaneously also can produce a reactive force, quartzy fire door 101 is under two reactive forces, due to the easy run-off the straight of unbalance stress, the boron substance having solidified makes this inclination be difficult to recover, and upper, once with the process of diffusion quartz tube 100 extruding easily causes the damage of quartzy fire door 101 or the damage of diffusion quartz tube 100.
Hence one can see that, and above-mentioned " cover plate " formula diffusion quartz tube mouth of pipe rotary island part design mode realizes boron doping for constant-pressure and high-temperature diffusion and can bring following problem and production hidden danger at present.First, the boron substance forming in diffusion process is because its fusing point is very high, easily in offgas duct, deposition is solidified, cause the obstruction of vapor pipe, not only reduce the homogeneity of diffusion layer doping, easily cause forming breaking of quartz member, and easily cause leaking of obnoxious flavour in turnover stove process, formation accident; Secondly, the curing deposition of boron substance, easily cause (such as diffusion quartz tube, quartzy fire door, oar etc.) between diffusion furnace device to be mutually bonded together, interface at the diffusion quartz tube mouth of pipe and quartzy fire door solidifies deposition, cause between quartzy fire door and diffusion quartz tube and be mutually bonded together, cause the damage of quartz member, improve production cost, also can bring loss of life and personal injury, become production safety hidden danger; The 3rd, quartzy fire door interconnects by spring and stationary installation, spring is extruded and reactive force that deformation produces quartzy fire door occurs makes to push, contact between diffusion quartz tube and quartzy fire door, realize the relative sealing of diffusive mixing gas, in this process, easily cause the inhomogeneous cover plate that causes due to reactive force to tilt, improved the probability of diffusion quartz tube and quartzy fire door extrusion damage; The 4th, silica tube inner wall smooth, especially for Open tdde diffusion, diffusing, doping mixed gas is difficult to form backflow, has reduced the effective rate of utilization of doped source; The 5th, for Open tdde diffusion, can further improve the ununiformity of doping, and stopped pipe and soft landing diffusion, the spoilage of diffusion furnace device and casualty ratio of accidents can be higher.
Summary of the invention
The object of the invention is to overcome the shortcoming of above-mentioned constant-pressure and high-temperature diffusion furnace equipment, proposed a kind of fire door backflow parts of diffusion furnace of simple in structure, easy realization, the present invention can not pollute technique substrate, can not affect production production capacity yet.The present invention has solved the problem mutually boning between quartzy fire door and diffusion quartz tube when realizing the sealing of constant-pressure and high-temperature boron diffusion stove, avoid the mutual bonding between diffusion furnace device, and the obstruction of having stopped offgas duct when realizing boron constant-pressure and high-temperature diffusing, doping, tail gas can be discharged in time.
For achieving the above object, the present invention adopts following technical scheme.
The fire door backflow parts of diffusion furnace of the present invention are arranged near silica tube inner spout place, are many group rotary island shape return-flow structures.
Described rotary island shape return-flow structure comprises annular choking ring and circular spoiler.
Described annular choking ring is arranged in silica tube near on the tube wall of the mouth of pipe.Annular choking ring has to outstanding projection in silica tube, and described protruding cross section is square.
Described spoiler compartment of terrain is arranged in silica tube, and described annular choking ring positioned opposite, and the quantity of spoiler at least equates with the number of described annular choking ring.The external diameter of described spoiler is slightly less than the internal diameter of annular spoiler corresponding thereto.
Described spoiler and described annular choking ring arranged concentric, leave gap between spoiler and annular choking ring, forms annular cross section of fluid channel, thereby form one group of rotary island shape return-flow structure.
Many group rotary island shape return-flow structures are spaced apart and arranged in silica tube near on the inwall of the mouth of pipe.According to the internal diameter of annular choking ring in every group of rotary island shape return-flow structure and the external diameter size of spoiler, to silica tube mouth of pipe direction interval, arrange from the inside to the outside.In every group of rotary island shape return-flow structure, described spoiler and described annular choking ring be corresponding positioned opposite one by one, and the spoiler of external diameter minimum is corresponding with the annular choking ring of internal diameter minimum, be arranged on silica tube in.The spoiler that external diameter is slightly large is arranged on outer position, the annular choking ring positioned opposite slightly large with internal diameter.The spoiler of diameter maximum is arranged on the most close silica tube mouth of pipe place, the spoiler that is positioned at the most close silica tube mouth of pipe can not arrange annular choking ring corresponding thereto, the cross section of fluid channel that slit-shaped between the described spoiler at the most close silica tube mouth of pipe and silica tube tube wall circularizes, thus form the rotary island shape return-flow structure of the close quartzy mouth of pipe.As mentioned above, the internal diameter of annular choking ring and with the external diameter of the spoiler of annular choking ring positioned opposite from the inside to the outside, to silica tube mouth of pipe direction, increase progressively successively, organize rotary island shape return-flow structure more and so arrange, form many group rotary island shape return-flow structures.
Described spoiler is comprised of circular spoiler and casing seat thereof.Described spoiler is arranged on casing seat.Described casing seat is one section of rectangular tube.On each circular spoiler, from center of circle equidistant, have identical square hole, square hole matches with square sleeve base, and is fixed with one.A square sleeve base can be installed a plurality of described spoilers, forms one group of spoiler.Spoiler on described square sleeve base is at least a slice, when the quantity of described spoiler is greater than 1, and the diameter of described spoiler or equal, or increase successively from inside to outside.
The effect of spoiler is to realize stopping and refluxing of the inner mixed gas adulterating of silica tube.
The inside dimension of described casing seat rectangular tube is identical with the outside dimension of square slurry in being arranged on silica tube.Described spoiler is sleeved on described slurry by described casing seat, keeps relative static with described oar.
Described annular choking ring and spoiler adopt high purity quartz material to make.
The present invention has following beneficial effect:
(1) between the spoiler described in and described annular choking ring, relatively having certain gap in sealing, formed passage, can guarantee that harmful tail gas can access timely discharge, avoids causing industrial accident;
(2) described spoiler is arranged on described oar, with between any parts in the external world and silica tube, do not exist directly and contact, can be because of extruding each other or unbalance stress and run-off the straight or distortion, reduced the breakage rate of quartz member, reduced production cost.
(3) by setting, there is annular choking ring and the spoiler of different inner diameters, stopped that impurity gas moves to the mouth of pipe, impel and form impurity gas backflow, improved the homogeneity of diffusion layer doping.
Accompanying drawing explanation
Fig. 1 is the structural representation of the constant-pressure and high-temperature Open tdde diffusion stove of prior art;
Fig. 2 is the quartzy door structure schematic diagram of the constant-pressure and high-temperature switch diffusion furnace of prior art;
Fig. 3 is diffusion furnace fire door backflow parts sectional view of the present invention;
Fig. 4 is annular choking ring section of structure;
Fig. 5 is the right view of the shape choking ring shown in Fig. 4;
Fig. 6 is spoiler structural representation;
Fig. 7 is the right view of the spoiler shown in Fig. 6;
Fig. 8 is the schematic diagram of spoiler embodiment of the present invention;
Fig. 9 is the right view of the spoiler embodiment shown in Fig. 8;
Figure 10 is for being used diffusion-furnace structure schematic diagram of the present invention;
Figure 11 is the multiple spoiler structural representation of the present invention.
Embodiment
Below in conjunction with the drawings and the specific embodiments, further illustrate the present invention.
As shown in Figure 3, the fire door backflow parts of diffusion furnace of the present invention are arranged near silica tube inner spout place, are many group rotary island shape return-flow structures.Described rotary island shape return-flow structure comprises annular choking ring and circular spoiler.
As shown in Figure 4, Figure 5, described annular choking ring 2000,2001 is arranged on the inner close tube wall of the mouth of pipe of silica tube 2002.Annular choking ring is to outstanding projection in silica tube, and its cross section is square.2003 is the outer of silica tube mouth of pipe place outwardly convex, is that current diffusion quartz tube is existing, while its role is to facilitate silica tube installation, dismounting, pulls.
As shown in Figure 3, spoiler 2010,2011,2012 compartment of terrains described in a group are arranged in silica tube, and described annular choking ring positioned opposite, and the quantity of spoiler at least equates with the number of described annular choking ring.The external diameter of described spoiler is slightly less than the internal diameter of annular spoiler corresponding thereto.
Described spoiler and described annular choking ring arranged concentric, leave gap between spoiler and annular choking ring, forms annular cross section of fluid channel, thereby form one group of rotary island shape return-flow structure.
Many group rotary island shape return-flow structures are spaced apart and arranged in the inner side near the mouth of pipe of silica tube 2002.According to the internal diameter of annular choking ring in every group of rotary island shape return-flow structure and the external diameter size of spoiler, to silica tube mouth of pipe direction interval, arrange from the inside to the outside.In every group of rotary island shape return-flow structure, described spoiler and described annular choking ring be corresponding positioned opposite one by one, and the spoiler 2010 of external diameter minimum and the annular choking ring 2000 of internal diameter minimum are corresponding, be arranged on silica tube in.The spoiler 2011 that external diameter is slightly large is arranged on outer position, annular choking ring 2001 positioned opposite slightly large with internal diameter.The spoiler 2012 of diameter maximum is arranged on the most close silica tube mouth of pipe place, the spoiler 2012 that is positioned at the most close silica tube mouth of pipe can not arrange annular choking ring corresponding thereto, the cross section of fluid channel that the described spoiler 2012 at the most close silica tube mouth of pipe and the slit-shaped between silica tube tube wall circularize, thus form the rotary island shape return-flow structure of the close quartzy mouth of pipe.As mentioned above, the internal diameter of annular choking ring and with the external diameter of the spoiler of annular choking ring positioned opposite from the inside to the outside, to silica tube mouth of pipe direction, all increase progressively successively, interval is arranged, organizes rotary island shape return-flow structure more and so arranges, forms many group rotary island shape return-flow structures.
As shown in Figure 6, Figure 7, the spoiler described in a group is comprised of circular spoiler 2010b, 2011b, 2012b and casing seat 2010a, 2011a, 2012a.It is upper that the spoiler 2010b of the first spoiler 2010 is arranged on first set base 2010a, and it is upper that the spoiler 2011b of the second spoiler 2011 is arranged on the second casing seat 2011a, and the spoiler 2012b of the 3rd spoiler 2012 is arranged on the 3rd casing seat 2012a.First, second and third described casing seat is all one section of rectangular tube.On each circular spoiler, from center of circle equidistant, have the square hole that size is the same with position, the diameter of crossing square hole center on two straight flanges of square hole and spoiler is perpendicular, and described square hole matches with square sleeve base, and is fixed with one.A square sleeve base can be installed a plurality of described spoilers.The effect of spoiler is to realize stopping and refluxing of the inner mixed gas adulterating of silica tube.
Size in described casing seat rectangular tube is identical with the outside dimension of square slurry in being arranged on silica tube.Described spoiler is sleeved on described slurry by described casing seat, keeps relative static with described oar.
Described spoiler is at least a slice, when the quantity of described spoiler is greater than 1, and the diameter of described spoiler or equal, or increase successively from inside to outside.
Fig. 8, Figure 9 shows that the embodiment schematic diagram of spoiler of the present invention, spoiler 2010,2011 and 2012 is arranged on the square oar 203 in diffusion quartz tube, oar 203 is connected with the stationary installation 204 outside silica tube, with fixing oar, and control the tangential movement of slurry, guaranteed relative static between oar and spoiler simultaneously.
One group of silica tube mouth of pipe backflow quartz baffle compartment of terrain is arranged in silica tube pipe through oar, by diameter, from inside to outside arrange, with described ring-shaped protrusion corresponding positioned opposite one by one, as shown in figure 10, the center of the first spoiler 2010 is corresponding with first ring shape choking ring 2000, i.e. 2010 center and 2000 the corresponding coincidence in center; The second spoiler 2011 is in the outside of the first spoiler 2010, the center superposition of the center of the second spoiler 2011 and the second choking ring 2001, and the 3rd spoiler 2012 is placed on outermost.
Figure 10 shows that the present invention organizes the embodiment schematic diagram of rotary island shape return-flow structure more, gap between annular choking ring and circular spoiler forms circulation cross section, this circulation cross section is exhaust emissions passage, the tail gas of discharge enters into the exhaust air chamber 206 that furnace mouth seal device 205 forms, and discharge enters into vent gas treatment tower thus.
In order to strengthen sealing effectiveness, spoiler of the present invention can be various structures, as shown in figure 11.The key distinction of multiple spoiler structure is that quantity, diameter and the shape of the spoiler on spoiler is different: when the quantity of described spoiler is greater than 1, and the diameter of spoiler or equal, or the slightly larger in diameter of outside spoiler is in inner side spoiler diameter.The decoration form of described choked flow catch on described spoiler can be uniform, or is " H " type structure, and the choked flow catch that is connected at casing seat two ends, as Figure 11 b; And the thickness of spoiler can be unequal.The structure of the spoiler that comparatively speaking, spoiler diameter increases is gradually more favourable for the uniform doping of improving normal pressure Open tdde diffusion.Figure 11 a is that the circular spoiler number on casing seat is only the shape schematic diagram of 1, Figure 11 b is that the quantity of circular spoiler on circular spoiler is the shape schematic diagram of 2, in order to guarantee circular spoiler stability of equilibrium in use, circular spoiler is connected in respectively the two ends of casing seat, the diameter of two circular spoilers or equal, or slightly large near the diameter of fire door one side.Situation when Figure 11 c and Figure 11 d are depicted as circular spoiler quantity and are respectively 3,4, the inhomogeneity improvement for substrate doped layer that increases of six quantity of circular group increases, diameter or equal between each circular spoiler, or increase near the diameter of fire door one side.
In diffusion technique process, the present invention has formed " barrier " that diffusion quartz tube internal mix gas outwards flows, impels and contains doped source, as boron oxide (B
2o
3), boron bromide (BBr
3), boric acid (H
3bO
3) etc. the doping mixed gas of boron product form to reflux, can improve the utilization ratio of doped source, reduce and even stop boron product stream to the amount of fire door, be reduced in the deposition dose rate of fire door, avoid bonding, breakage mutually between quartz member.
In order to strengthen the effect of the fire door backflow parts of diffusion furnace of the present invention, can increase the quantity of described annular spoiler.Correspondingly, the quantity of spoiler also should increase.On the whole, the quantity of described spoiler than the quantity of described annular spoiler many one or more.
Claims (5)
1. diffusion furnace fire door backflow parts, is characterized in that, described fire door backflow parts are many group rotary island shape return-flow structures; Described rotary island shape return-flow structure comprises annular choking ring and circular spoiler; Described annular choking ring is arranged in silica tube near on the tube wall of the mouth of pipe, and annular choking ring has to outstanding projection in silica tube, and described protruding cross section is square; Described spoiler compartment of terrain is arranged in silica tube, and described annular choking ring positioned opposite, and the quantity of spoiler at least equates with the number of described annular choking ring; The external diameter of described spoiler is slightly less than the internal diameter of annular choking ring corresponding thereto; Described spoiler and described annular choking ring arranged concentric, leave gap between spoiler and annular choking ring, forms annular gas channel, forms one group of rotary island shape return-flow structure; Described many groups rotary island shape return-flow structure is spaced apart and arranged in a side of the close mouth of pipe in silica tube, according to the internal diameter of annular choking ring in every group of rotary island shape return-flow structure and the external diameter size of spoiler, arranges from the inside to the outside to silica tube mouth of pipe direction interval; In every group of rotary island shape return-flow structure, described spoiler and described annular choking ring be corresponding positioned opposite one by one, and the spoiler of external diameter minimum is corresponding with the annular choking ring of internal diameter minimum, be arranged on silica tube in; The spoiler that external diameter is slightly large is arranged on outer position, the annular choking ring positioned opposite slightly large with internal diameter; The spoiler of diameter maximum is arranged on the most close silica tube mouth of pipe place; Be positioned at the spoiler setting of the most close silica tube mouth of pipe or annular choking ring corresponding thereto is not set, the cross section of fluid channel that slit-shaped between the described spoiler at the most close silica tube mouth of pipe and silica tube tube wall circularizes, thus form the rotary island shape return-flow structure of the close quartzy mouth of pipe; As mentioned above, the internal diameter of annular choking ring and with the external diameter of the spoiler of annular choking ring positioned opposite from the inside to the outside, to silica tube mouth of pipe direction, increase progressively successively, organize rotary island shape return-flow structure more and so arrange, form many group rotary island shape return-flow structures; Described spoiler is comprised of circular spoiler and casing seat thereof; Described spoiler is arranged on casing seat; Described casing seat is one section of rectangular tube; On spoiler described in each, from center of circle equidistant, have identical square hole, square hole matches with described casing seat, and is fixed with one; Described spoiler is sleeved on by described casing seat on the oar of diffusion furnace, keeps relative static with described oar.
2. diffusion furnace fire door backflow parts according to claim 1, is characterized in that, the spoiler on described square sleeve base is at least a slice; When the quantity of described spoiler is greater than 1, the equal diameters of described spoiler, or increase successively from inside to outside.
3. diffusion furnace fire door backflow parts according to claim 1, is characterized in that, the square sleeve base described in is installed a plurality of described spoilers, forms one group of spoiler.
4. diffusion furnace fire door backflow parts according to claim 1, is characterized in that, described annular choking ring and spoiler adopt high purity quartz material to make.
5. diffusion furnace fire door backflow parts according to claim 1, is characterized in that, the inside dimension of described casing seat rectangular tube is identical with the outside dimension of square slurry in being arranged on silica tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210073355.4A CN102605431B (en) | 2012-03-19 | 2012-03-19 | Furnace mouth reflux part for diffusion furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210073355.4A CN102605431B (en) | 2012-03-19 | 2012-03-19 | Furnace mouth reflux part for diffusion furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102605431A CN102605431A (en) | 2012-07-25 |
| CN102605431B true CN102605431B (en) | 2014-10-15 |
Family
ID=46523179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210073355.4A Expired - Fee Related CN102605431B (en) | 2012-03-19 | 2012-03-19 | Furnace mouth reflux part for diffusion furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102605431B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928983A (en) * | 2010-07-23 | 2010-12-29 | 武汉瀚博思科技有限公司 | Method for producing polycrystalline silicon and polycrystalline silicon membrane by accelerant process |
| CN102154707A (en) * | 2010-11-30 | 2011-08-17 | 江苏顺风光电科技有限公司 | Multiplex temperature control device for diffusion furnace |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8039289B2 (en) * | 2009-04-16 | 2011-10-18 | Tp Solar, Inc. | Diffusion furnaces employing ultra low mass transport systems and methods of wafer rapid diffusion processing |
-
2012
- 2012-03-19 CN CN201210073355.4A patent/CN102605431B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928983A (en) * | 2010-07-23 | 2010-12-29 | 武汉瀚博思科技有限公司 | Method for producing polycrystalline silicon and polycrystalline silicon membrane by accelerant process |
| CN102154707A (en) * | 2010-11-30 | 2011-08-17 | 江苏顺风光电科技有限公司 | Multiplex temperature control device for diffusion furnace |
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| CN102605431A (en) | 2012-07-25 |
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