CN210825445U - Flow guide device for polycrystalline silicon reduction furnace and reduction furnace with flow guide device - Google Patents
Flow guide device for polycrystalline silicon reduction furnace and reduction furnace with flow guide device Download PDFInfo
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- CN210825445U CN210825445U CN201921613616.0U CN201921613616U CN210825445U CN 210825445 U CN210825445 U CN 210825445U CN 201921613616 U CN201921613616 U CN 201921613616U CN 210825445 U CN210825445 U CN 210825445U
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Abstract
The utility model discloses a reducing furnace that is used for polycrystalline silicon reducing furnace's guiding device and has it, the reducing furnace has air inlet, gas outlet and chassis, the gas outlet forms the chassis center of reducing furnace, guiding device includes: the top of the flow guide cover is closed to prevent airflow from vertically entering the chassis to cause gas turbulence in the reduction furnace; the supporting piece extends vertically, the upper end of the supporting piece is connected with the air guide sleeve, and the lower end of the supporting piece is connected with the chassis; and a gas passing part communicated with the gas outlet is formed on the supporting piece. According to the utility model discloses a mutual convection current, the torrent condition that is used for polycrystalline silicon reduction furnace, under the condition on the chassis of not changing or reforming transform reduction furnace, carries out the water conservancy diversion to original reduction furnace interior gas through kuppe and gas portion, can optimize the flow field in the reduction furnace by a wide margin, eliminates in the reduction furnace because the chassis of air inlet, the equal perpendicular to reduction furnace in gas outlet and the feeding gas that causes and tail gas.
Description
Technical Field
The utility model belongs to the technical field of the polycrystalline silicon manufacturing technology and specifically relates to a reducing furnace that is used for guiding device of polycrystalline silicon reducing furnace and is equipped with above-mentioned guiding device that is used for polycrystalline silicon reducing furnace.
Background
In the related technology, in the field of polysilicon production, a polysilicon reduction furnace is a core device for producing polysilicon, and has the functions of mixing trichlorosilane or silicon tetrachloride gas with hydrogen, then carrying out reduction and thermal decomposition reactions in the reduction furnace, and carrying out deposition growth on the surface of a polysilicon carrier, thereby obtaining a high-purity polysilicon product. The gas flow field in the reduction furnace has great influence on various reaction conditions such as the reaction temperature of the surface of the carrier, the density of the molecular collision crystal, the crystallization speed and the like. Therefore, the uniformity and symmetry of the flow field in the reduction furnace are one of the main conditions for ensuring the controllable growth of the polycrystalline silicon and are the main basis for designing the reduction furnace. The existing various types of polysilicon reduction furnaces have the condition that polysilicon at the top of a silicon rod grows loose, and the main reason is that turbulent flow, convection and the like occur in a flow field in the furnace. To solve the flow field problem, the design of the air inlet and the air outlet of the reduction furnace needs to be improved.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model discloses an aim at provides a guiding device for polycrystalline silicon reduction furnace, a guiding device for polycrystalline silicon reduction furnace is favorable to improving the interior gas flow field of reduction furnace, guarantees polycrystalline silicon's production quality.
Another object of the utility model is to provide a reduction furnace, the reduction furnace includes above-mentioned guiding device that is used for the reduction furnace.
According to the utility model discloses a guiding device for polycrystalline silicon reduction furnace, the reduction furnace has air inlet, gas outlet and chassis, the gas outlet forms the chassis center of reduction furnace, guiding device includes: the top of the flow guide cover is closed to prevent airflow from vertically entering the chassis to cause gas turbulence in the reduction furnace; the supporting piece extends vertically, the upper end of the supporting piece is connected with the air guide sleeve, and the lower end of the supporting piece is connected with the chassis; wherein, the supporting piece is provided with a gas passing part communicated with the gas outlet.
According to the utility model discloses a mutual convection current, the torrent condition that are used for polycrystalline silicon reduction furnace, under the condition on the chassis of not changing or reforming transform reduction furnace, carry out the water conservancy diversion through kuppe and gas portion to original reduction furnace internal gas, can optimize the flow field in the reduction furnace by a wide margin, eliminate in the reduction furnace because the chassis of air inlet, the equal perpendicular to reduction furnace in gas outlet and the feeding gas that causes and tail gas.
In addition, according to the utility model discloses a guiding device for reducing furnace still has following additional technical characterstic:
according to some embodiments of the invention, the air guide sleeve is configured as a square, oval or hemispherical shape.
According to some embodiments of the invention, the air-passing portion is configured as an air-passing hole.
Further, the air passing hole is configured to be circular, elliptical or polygonal.
In some embodiments of the present invention, the supporting member is configured as a supporting column, the supporting column includes a plurality of supporting columns, the plurality of supporting columns are spaced apart from each other at the bottom of the air guide sleeve, and the air passing hole is defined between two adjacent supporting columns.
Optionally, the support member is configured as a support plate, the support plate includes a plurality of support plates, the plurality of support plates are spaced apart from each other at the bottom of the air guide sleeve, and the air passing hole is defined between two adjacent support plates.
In some embodiments of the present invention, the support member is configured as a support ring, and the air passing hole is formed on the support ring.
According to some embodiments of the invention, the flow guiding device is a piece of corrosion-resistant and high temperature-resistant material.
Further, the flow guide device is an alloy steel material piece.
According to some embodiments of the invention, the open area of the gas passing portion is not smaller than the area of the gas outlet.
According to the second aspect of the present invention, the reducing furnace comprises the above-mentioned deflector for the polysilicon reducing furnace.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic view of a deflector for a polycrystalline silicon reduction furnace according to an embodiment of the present invention;
fig. 2 is a schematic view of a deflector for a polycrystalline silicon reduction furnace according to another embodiment of the present invention;
fig. 3 is a schematic view of a reduction furnace according to an embodiment of the present invention, wherein the reduction furnace is provided with the above-mentioned deflector for the polysilicon reduction furnace.
Reference numerals:
a deflector 100 for a polysilicon reduction furnace,
the air guide sleeve 1, the supporting piece 2, the air passing part 21,
a reduction furnace 200 is provided, which is provided with a reduction furnace,
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.
In the related technology, the design of the gas outlet cover of the polycrystalline silicon reduction furnace is different among polycrystalline silicon factories, the main function is usually designed for protecting the tail gas port, and the function related to the diversion of the tail gas port has no corresponding design consideration and no related design principle and thought. In addition, the existing various air outlet shields are mostly constructed by adopting a screen or replacing the screen, so that the designed air flow circulation direction of the original reduction furnace is not changed to the greatest extent.
The improvement scheme of the air inlet nozzle of the reduction furnace is many at present, and the flow guide design of the air outlet is creatively provided on the basis of years of production experience and computer simulation, so that the effect of eliminating convection of air inlet and air outlet is achieved, and the production quality of polycrystalline silicon is improved. At present, the patent design related to the gas outlet cover of the polycrystalline silicon reduction furnace is designed mainly for preventing silicon blocks from falling into a gas outlet caused by lodging of a polycrystalline silicon rod, and the principle of design of the cover is that the direction of gas flow is not changed, so that the effect of blocking the silicon blocks is achieved.
A deflector 100 for a polycrystalline silicon reduction furnace according to an embodiment of the present invention will be described with reference to the accompanying drawings.
Referring to fig. 1 and 3, according to the deflector 100 for a polycrystalline silicon reduction furnace according to an embodiment of the first aspect of the present invention, the reduction furnace 200 has an air inlet 210, an air outlet 220, and a chassis 230, the air inlet 210 and the air outlet 220 may be both disposed on the chassis 230, the air inlet 210 may include a plurality of inlets, the air outlet 220 may include one inlet, the plurality of inlets 210 may be disposed around the air outlet 220, and the air outlet 220 may be formed at the center of the chassis 230 of the reduction furnace, and the deflector 100 includes: a pod 1 and a support 2.
Specifically, the top of the dome 1 is closed to prevent the gas flow from vertically entering the bottom plate 230 of the reduction furnace 200 to cause the gas turbulence in the reduction furnace 200. For example, in some alternative embodiments of the present invention, the air guide sleeve 1 may be configured in the shape of a cover body, and the air guide sleeve 1 may block the gas from flowing vertically to the bottom plate 230 of the reduction furnace 200, so as to facilitate changing the flow field of the gas flow in the reduction furnace 200 and eliminate the mutual convection and turbulence of the feed gas and the exhaust gas in the reduction furnace 200 due to the fact that the air inlet 210 and the air outlet 220 are both perpendicular to the bottom plate 230 of the reduction furnace 200.
Referring to fig. 1 and 2, the support member 2 extends in a vertical direction, and the upper end of the support member 2 is connected to the pod 1 and the lower end thereof is connected to the base plate 230. The support piece 2 in this application not only can play the effect of supporting kuppe 1, can also play certain water conservancy diversion effect.
For example, the support member 2 may extend in the up-down direction shown in fig. 1 or 2, an upper end of the support member 2 may be connected to the pod 1, and a lower end of the support member 2 may be connected to the chassis 230. Therefore, the flow guide cover 1 can be fixed through the support piece 2, and the operation fault caused by deviation of the original position in the operation process of the flow guide device 100 can be prevented, so that the use reliability and the stability of the flow guide device 100 are improved.
In some optional embodiments of the present invention, the supporting member 2 and the air guide sleeve 1 may be connected by welding, for example, and the present invention is not limited thereto.
Wherein, the support 2 is formed with a gas passing portion 21 communicated with the gas outlet 220. For example, the support 2 may be formed with a gas passing portion 21, and the gas passing portion 21 may communicate with the gas outlet 220. The gas passing part 21 in the present application is suitable for the process conditions of the conventional reduction furnace 200. Therefore, the gas entering the reduction furnace 200 from the gas inlet 210 can be guided and blocked by the air guide sleeve 1, and the gas is discharged from the gas outlet 220 after the flow field of the gas flow is changed by the gas passing part 21.
The utility model discloses do not injecing support piece 2's concrete structural style, support piece 2's shape must can prevent to operate the in-process fracture, and causes the gas to block that the structure drops and blocks up gas outlet 220, causes the stove to suppress pressure and produces the incident.
According to the utility model discloses a reduction furnace equipment gas outlet size, reduction furnace electrode that is used for guiding device 100 of polycrystalline silicon reduction furnace's concrete size can install as required arrange and design to verify the flow field through computer simulation.
According to the deflector 100 for the polycrystalline silicon reduction furnace of the embodiment of the present invention, the top-closed deflector 1 is used to prevent the air flow from vertically entering the chassis 230 of the reduction furnace 200 to cause the turbulent phenomenon of the gas in the reduction furnace 200. Meanwhile, by adopting an engineering simulation (for example, by Fluent software) method, the height of the flow guiding device 100 can be optimized according to different furnace types and the structures of accessories, so as to achieve a better rectification effect.
According to the utility model discloses a guiding device 100 for polycrystalline silicon reduction furnace, under the condition of the chassis 230 of not changing or reforming transform reduction furnace 200, carry out the water conservancy diversion to original reduction furnace 200 interior gas through kuppe 1 and gas passing portion 21, can optimize the flow field in the reduction furnace 200 by a wide margin, eliminate in the reduction furnace 200 because of the mutual convection current, the torrent condition of the feed gas that causes for the chassis 230 of the equal perpendicular to reduction furnace 200 of air inlet 210, gas outlet 220.
Referring to fig. 1 and 2, according to some embodiments of the present invention, the pod 1 is configured in a square, oval or hemispherical shape. For example, in some alternative embodiments of the present invention, the pod 1 may be configured as a square, oval, or hemispherical shape, etc. The utility model discloses do not injecing the concrete structure shape of kuppe 1, can set up as required adaptability among the practical application.
According to some embodiments of the present invention, in conjunction with fig. 1 and 2, the air passing portion 21 is configured as an air passing hole. For example, in some alternative embodiments of the present invention, the air passing part 21 may be configured as an air passing hole (or an air passing groove, etc.), the air passing hole may include one or more air passing holes, and when the air passing hole includes a plurality of air passing holes, the plurality of air passing holes are spaced apart. In the description of the present invention, "a plurality" means two or more.
Further, the air passing hole is configured to be circular, elliptical or polygonal. For example, in some alternative embodiments of the present invention, the air passing hole may be configured in a circular shape, an oval shape, a polygonal shape, or the like. The above description of the shape of the air passing hole is only exemplary and should not be construed as limiting the present invention, and in fact, the air passing hole may be configured to have a shape, etc., as will be understood by those skilled in the art.
In some embodiments of the present invention, the supporting member 2 is configured as a supporting column, the supporting column includes a plurality of supporting columns, the plurality of supporting columns are spaced apart from each other at the bottom of the air guide sleeve 1, and the air passing hole is defined between two adjacent supporting columns. For example, in some alternative embodiments of the present invention, the support member 2 may be configured as a support column, the support column may include a plurality of support columns, the plurality of support columns are spaced apart from each other at the bottom of the pod 1, and the air passing hole may be defined between two adjacent support columns. The present invention is not limited thereto, and in some optional embodiments of the present invention, the supporting member 2 may also be configured as a plurality of supporting plates, the supporting plates are spaced apart from each other at the bottom of the air guide sleeve 1, and the air holes may be defined between two adjacent supporting plates.
The present invention is not limited thereto, and in some embodiments of the present invention, the supporting member 2 may also be configured as a supporting ring, and the air passing hole is formed on the supporting ring.
The above description of the structural form of the supporting member 2 is only exemplary, and is not to be understood as the limitation of the present invention, the present invention is not limited to the specific structural form of the supporting member 2, and can be adaptively set as required in practical applications.
According to some embodiments of the present invention, the deflector device 100 is a piece of corrosion-resistant and high temperature-resistant material. For example, in some alternative embodiments of the present invention, the material of the entire flow guiding device 100 may be made of an alloy material with hydrogen corrosion resistance, acid corrosion resistance, and high temperature resistance.
Further, the deflector 100 may be a piece of alloy steel material. Therefore, the alloy steel material piece is selected for the flow guide device 100, so that the flow guide device 100 can have certain high-temperature stability, and the flow guide device 100 is prevented from forming secondary pollution on the polycrystalline silicon product.
Specifically, the alloy material can adopt RA330 alloy, and RA330 alloy has the advantages of high temperature resistance, corrosion resistance, chloride ion corrosion cracking resistance and the like.
The RA330 alloy is a classic high-performance high-temperature resistant alloy. By adding 1.25% of silicon element, the high-temperature-resistant silicon alloy has good high-temperature strength and still has good carbonization resistance and oxidation resistance up to 1200 ℃. While RA330 is specifically designed to withstand the thermal shock of quenching. The RA330 alloy has very excellent resistance to chloride stress corrosion cracking.
According to some embodiments of the present invention, the opening area of the air passing part 21 is not smaller than the area of the air outlet 220. For example, in some alternative embodiments of the present invention, the opening area of the air passing part 21 may be greater than or equal to the area of the air outlet 220. Therefore, when the deflector 100 is applied to the reduction furnace 200, it is advantageous to ensure the pressure in the reduction furnace 200 and improve the operation stability of the reduction furnace 200.
If the opening area of the gas passing portion 21 is smaller than the area of the gas outlet 220, it means that the effective outlet area is smaller than the original design area after the flow guide device 100 is added, and the pressure in the furnace may be increased under the maximum feeding condition, which will be understood by those skilled in the art.
The utility model provides a scheme of water conservancy diversion is carried out reduction furnace chassis gas outlet. Because the operational aspect of CVD (Chemical Vapor Deposition, Chemical Vapor Deposition (CVD)) reduction furnace will be constantly adjusted according to concrete production, so can optimize the modification to each spare part in order to optimize the flow field after the reduction furnace is put into operation, and the direction of modifying often concentrates on the modification to reduction furnace air inlet nozzle, the utility model discloses the mode of water conservancy diversion is carried out at reduction furnace chassis gas outlet to the first adoption, has optimized the interior gas flow field of stove.
According to the utility model discloses a guiding device 100 for polycrystalline silicon reduction furnace, adopt the mode that shelters from, choose for use suitable corrosion-resistant high temperature resistant material, utilize engineering simulation software to optimize the argument to the stove internal gas flow field of different reduction furnaces 200, after gas outlet 220 department increases guiding device 100, the flow field in the reduction furnace 200 obtains obvious improvement, the effectual reduction furnace 200 operation in-process that has prevented, the continuous change of tolerance causes the sudden change of the interior local gas velocity of flow of stove, prevented that the interior torrent of stove from leading to the change of the gas flow direction on silicon rod surface, thereby form more even unanimous air current environment, the reaction temperature at each silicon rod position has been guaranteed, pressure, density uniformity, thereby increase substantially the fine and close material proportion of single stove, the cauliflower material has effectively been prevented, the production of pine material.
According to the utility model discloses a guiding device 100 for polycrystalline silicon reduction furnace, adopt the mode of blockking gas vertical flow to optimize the interior flow field of stove, eliminate the inside offset effect of gas from top to bottom of reduction furnace 200.
The air guide sleeve 1 can be in various shapes, such as square, oval, semi-sphere and the like, and can play a role in blocking gas flow. The air passing portion 21 is not limited to a columnar structure, a plate-like structure, a hole structure, or the like, as long as it can secure the position of the top dome 1 (air blocking portion) and ensure the flow of air. The height of the flow guide device 100 is obtained by tests and calculations applied to different reduction furnace types, and the height is determined according to the shapes of the furnace cylinders and the sizes of the air outlets of different reduction furnaces, and is not limited to the proportional size shown in the schematic diagram.
According to the utility model discloses a guiding device 100 for polycrystalline silicon reduction furnace, be applicable to the reduction furnace 200 that the chassis 230 center of reduction furnace 200 was regarded as the tail gas mouth (for example gas outlet 220), improve the interior gas flow field of reduction furnace 200 by a wide margin.
According to the utility model discloses a guiding device 100 for polycrystalline silicon reduction furnace can solve the inhomogeneous problem in the reducing furnace 200 interior flow field that current center mouth was given vent to anger, solves the problem that causes the loose, coral form growth of polycrystalline silicon rod growth form because of the flow field is inhomogeneous.
The utility model discloses the people finds through many times of actual verification: the reduction furnace product before the deflector 100 is not used, and the cauliflower material on the surface of the silicon rod and the silicon rod are expanded. And the reduction furnace 200 produced by the diversion device 100 eliminates cauliflower materials at the top of the silicon rod, and the polysilicon rods arranged in a ring shape do not have outward diffusion of outer ring silicon rods.
The reduction furnace 200 according to the second aspect of the present invention includes the above-mentioned deflector 100 for a polysilicon reduction furnace. Therefore, by arranging the deflector 100 for a polysilicon reduction furnace according to the first embodiment on the reduction furnace 200, the turbulent flow of gas in the reduction furnace 200 caused by the vertical gas flow entering the bottom plate 230 of the reduction furnace 200 can be prevented.
Other configurations and operations of the deflector 100 for a polycrystalline silicon reduction furnace and the reduction furnace having the same according to an embodiment of the present invention are known to those skilled in the art and will not be described in detail herein.
In the description of the present invention, it is to be understood that the terms "central," "vertical," "lateral," "height," "upper," "lower," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," "circumferential," and the like are used in the orientation or positional relationship indicated in the drawings for convenience and simplicity of description, and are not intended to indicate or imply that the device or element so indicated must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (11)
1. The flow guide device for the polycrystalline silicon reduction furnace is characterized in that the reduction furnace is provided with an air inlet, an air outlet and a chassis, the air outlet is formed in the center of the chassis of the reduction furnace, and the flow guide device comprises:
the top of the flow guide cover is closed to prevent airflow from vertically entering the chassis to cause gas turbulence in the reduction furnace;
the supporting piece extends vertically, the upper end of the supporting piece is connected with the air guide sleeve, and the lower end of the supporting piece is connected with the chassis;
wherein, the supporting piece is provided with a gas passing part communicated with the gas outlet.
2. The deflector for a polycrystalline silicon reduction furnace according to claim 1, wherein the deflector is configured in a square shape, an oval shape or a hemispherical shape.
3. The deflector for a polycrystalline silicon reduction furnace according to claim 1, wherein the gas passing portion is configured as a gas passing hole.
4. The deflector for a polycrystalline silicon reduction furnace according to claim 3, wherein the air passing holes are configured in a circular shape, an elliptical shape or a polygonal shape.
5. The deflector for a polycrystalline silicon reduction furnace according to claim 3, wherein the support is configured as a plurality of support columns, the plurality of support columns are spaced apart from each other at the bottom of the deflector, and the air passing holes are defined between two adjacent support columns.
6. The deflector for a polycrystalline silicon reduction furnace according to claim 3, wherein the support is configured as a plurality of support plates, the plurality of support plates are spaced apart at the bottom of the deflector, and the air passing holes are defined between adjacent two support plates.
7. The deflector for a polycrystalline silicon reduction furnace according to claim 3, wherein the supporter is configured as a support ring on which the air passing holes are formed.
8. The flow guide device for the polycrystalline silicon reduction furnace according to claim 1, wherein the flow guide device is a corrosion-resistant and high temperature-resistant material.
9. The deflector for a polycrystalline silicon reduction furnace according to claim 8, wherein the deflector is an alloy steel material.
10. The flow guide device for the polycrystalline silicon reduction furnace according to any one of claims 1 to 9, wherein an opening area of the gas passing part is not smaller than an area of the gas outlet.
11. A reduction furnace, characterized by comprising the deflector for a polycrystalline silicon reduction furnace according to any one of claims 1 to 10.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921613616.0U CN210825445U (en) | 2019-09-25 | 2019-09-25 | Flow guide device for polycrystalline silicon reduction furnace and reduction furnace with flow guide device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201921613616.0U CN210825445U (en) | 2019-09-25 | 2019-09-25 | Flow guide device for polycrystalline silicon reduction furnace and reduction furnace with flow guide device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110510615A (en) * | 2019-09-25 | 2019-11-29 | 洛阳中硅高科技有限公司 | Guiding device for polycrystalline silicon reducing furnace and the reduction furnace with it |
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2019
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110510615A (en) * | 2019-09-25 | 2019-11-29 | 洛阳中硅高科技有限公司 | Guiding device for polycrystalline silicon reducing furnace and the reduction furnace with it |
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