CN102583216B - Microstructure for detecting mechanical properties of one-dimensional nanometer materials - Google Patents
Microstructure for detecting mechanical properties of one-dimensional nanometer materials Download PDFInfo
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- CN102583216B CN102583216B CN201210023471.5A CN201210023471A CN102583216B CN 102583216 B CN102583216 B CN 102583216B CN 201210023471 A CN201210023471 A CN 201210023471A CN 102583216 B CN102583216 B CN 102583216B
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Abstract
The invention discloses a microstructure for detecting mechanical properties of a one-dimensional nanometer material. The microstructure comprises a frame-shaped bracket, wherein two symmetrically arranged upper platforms are connected on the frame-shaped bracket by at least four symmetrical upper vertical beams; the measured nanometer material is fixed between the two upper platforms; two ends of each of the two upper platforms are respectively supported on a supporting seat of the frame-shaped bracket by a lower supporting beam; a lower platform is connected below the two upper platforms by at least four symmetrical oblique beams; and the lower platform is used for applying an external load. The preparation material of the microstructure is polycrystalline silicon, the preparation process of the microstructure is compatible with the existing silicon micromachining process, and the microstructure can be prepared in batches. The load on the one-dimensional nanometer material and the deformation situation of the nanometer material under an effect of the load can be obtained at the same time, and the properties of the nanometer material are not influenced in a detection process.
Description
Technical field
The present invention relates to micro mechanical technology and nanometer material science field, a kind of micro mechanical structure particularly, for detection of the micro-structural of monodimension nanometer material stretching and Compressive Mechanical Properties, be applicable to for detecting monodimension nanometer material Young's modulus, hot strength, fracture strength etc.
Background technology
Monodimension nanometer material, as nanotube, nano wire and nanobelt etc., is the low-dimensional nano structure material with excellent physical property, estimates will be with a wide range of applications receiving in Mechatronic Systems, gas sensor, nano-electron and field of optoelectronic devices of future.But along with reducing of scantling, in the time being reduced to nanometer, highlighting of the correlation effects such as dimensional effect, skin effect and quantum effect, is very different some physical propertys of nano material and conventional body material, occurs the feature of many novelties.The mechanical characteristics of nano material and behavior will directly have influence on its application, and the nano-device being made up of it and the function of Mechatronic Systems received, therefore, very important to the research of nano material mechanics feature and behavior.
At present, be limited to existing experiment condition and measuring technique, nano material is carried out direct Experiments of Machanics and also measured quite difficulty, the hybrid system of most of measurement means based on electronic/mechanical or heat/machinery.To the in situ detection means of the nano material in bearing load situation, comprise the tension measurement of the MEMS that utilizes static driving or heat driving, bending, compression and stretching measurement etc. that AFM is auxiliary, these measuring methods or measurement are not direct, or only can measure qualitatively.Most of qualitative, directly measuring method is for act on the load of sample and sample distortion can not be measured individually simultaneously.Can overcome the problems referred to above although utilize in the measuring method that static drives or heat drives, there is the shortcomings such as implementation cost is high, the error of calculation is large, and easily sample itself is exerted an influence.
Research work in sum, novel measurement device and measuring method need to measure monodimension nanometer material bearing load and deformation simultaneously, and on the impact of sample nothing itself.
Summary of the invention
The object of the invention is to provide a kind of micro-structural for detection of monodimension nanometer material mechanical property, this structure can obtain monodimension nanometer material bearing load and the deformation under load simultaneously, and in testing process, nano material self character is not affected.
The object of the invention is to realize by following technical proposals.
A kind of micro-structural for detection of monodimension nanometer material mechanical property of the present invention, comprises a frame support, on wherein said frame support, connects two upper platforms that are symmetrically set by least four to being much of vertical beam; The two ends of two upper platforms are supported on the bearing of frame support by lower support beam respectively; The below of described two upper platforms connects lower floor's platform by least four symmetrical cant beams.
Above-mentioned upper platform is that two ends are tip-like and needle tip is oppositely arranged the levelling bench for fixing monodimension nanometer material.
Above-mentioned between upper platform and lower floor's platform, be provided with that two groups of quantity equate and with respect to the cant beam of micro-structural vertical center line symmetry.
Described cant beam is obliquely installed to micro-structural vertical center line direction symmetry along the two ends of upper platform, or is obliquely installed along upper platform vertical center line direction to lower floor's platform upper table surface two ends symmetry.
Above-mentioned upper vertical beam and cant beam are divided into two groups of left and right, every group at least adopt two upper vertical beams and two cant beams respectively up and down each two connections support is connected with upper platform and lower floor's platform.
The middle part surface of above-mentioned lower floor's platform has for the locating hole to micro mechanical structure imposed load.
Above-mentioned lower support beam is vertical beam or symmetrical inclined beams.
Described micro-structural is taked polysilicon material.
The present invention and existing equipment for detection of monodimension nanometer material have the following advantages:
1. the material of preparing of the present invention is polysilicon, and preparation technology is compatible mutually with existing miromaching, and the cost of material is low, easy to prepare, can prepare in batches.
2. the present invention, in the time carrying out monodimension nanometer material detection, can obtain being applied to load and the displacement at nano material two ends simultaneously, makes to measure directly perceived.
3. the present invention, in the time carrying out monodimension nanometer material detection, by nanometer pressure head imposed load, can not impact the characteristic of nano material itself in testing process, has guaranteed the accuracy detecting.
4. in the present invention, upper vertical beam and lower support beam are used for supporting two upper platforms, improve the rigidity of system, can effectively prevent the variation of distance between two upper platforms that the factors such as structure self gravitation cause, this design can weaken the impact of structure Action of Gravity Field on nano material mechanics performance greatly, guarantees the accuracy detecting.
5. the cant beam between two upper platforms and lower floor's platform in the present invention, for the guiding of two upper platform relative motions.By changing the incline direction of cant beam, in the time that lower floor's platform is subject to nanometer pressure head active force and moves upward, just can realize the increase of two upper platform spacing or reduce, thereby measuring the mechanical property of stretching or the compression of nano material.
6. the micro-structural containing in the present invention both can have been measured the tensile property of nano material, had again the compression performance that can measure nano material.
Accompanying drawing explanation
Fig. 1 (a) is the structural representation of the embodiment of the present invention 1, for testing the tensile property of nano material.
Fig. 1 (b) is the structural representation of the embodiment of the present invention 2, for testing the tensile property of nano material.
Fig. 2 (a) is the structural representation of the embodiment of the present invention 3, for testing the compression performance of nano material.
Fig. 2 (b) is the structural representation of the embodiment of the present invention 4, for testing the compression performance of nano material.
Fig. 3 (a)-Fig. 3 (j) makes configuration process schematic diagram of the present invention.
Fig. 4 (a)-Fig. 4 (c) is the mechanical property simulation result figure of the embodiment of the present invention 1.
In figure: 101, frame type support; 102, upper vertical beam; 103, lower support beam; 104, upper platform; 105, cant beam; 106 lower floor's platforms.
The specific embodiment
Further illustrate structure of the present invention below in conjunction with accompanying drawing 1-2.
As shown in Fig. 1 (a), for the present invention have four upper vertical beams, two lower support beams and four cant beams (with upper platform angle be 26 degree) an embodiment schematic diagram, for testing the tensile property of nano material.The micro-structural of this detection monodimension nanometer material mechanical property comprises a frame support 101, wherein be provided with six roots of sensation vertical beam, comprise the upper vertical beam 102 in four, top, two of bottoms lower support beam 103 (being vertical beam), for the supporting and location of whole micro mechanical structure, one end is connected with frame type support 101, and one end is connected with the upper platform 104 of micro mechanical structure.
Wherein, on frame support 101, connect two upper platforms that are symmetrically set 104 by four upper vertical beams 102; The two ends of two upper platforms 104 are supported in by lower support beam 103 on the bearing of frame type support 101; The below of two upper platforms 104 connects lower floor's platform 106 by four cant beams 105 respectively, two groups of cant beams 105 are obliquely installed to micro-structural vertical center line direction symmetry along the two ends of upper platform 104, the displacement of the vertical direction of lower floor's platform 106 are become to displacement and the load of upper platform 104 horizontal directions with load transfer.
Wherein, upper platform 104 is divided into symmetrical left and right two parts, and respectively with three vertical beams (comprising two upper vertical beams 102, a lower support beam 103), two cant beams 104 are connected.The upper platform 104 that is positioned at micro mechanical structure middle part is horizontally disposed with, and its end is prepared to pointed and its most advanced and sophisticated setting in pairs, for fixing tested nano material.
Wherein, between upper platform 104 and lower floor's platform 106, be provided with the cant beam 105 that has identical quantity with upper vertical beam 102.Upper vertical beam 102 and cant beam 105 are divided into two groups of left and right, upper vertical beam 102 and cant beam 105 respectively up and down each two support 101 is connected with upper platform 104 and lower floor's platform 106.
Wherein, the middle part surface of lower floor's platform 106 has for the locating hole to micro mechanical structure imposed load, for to micro mechanical structure imposed load.Load applying, in platform bottom, can produce displacement by the vertical direction.
Micro-structural of the present invention is taked polysilicon material.
As shown in Fig. 1 (b), for the present invention have four upper vertical beams, two lower support beams and four cant beams (with upper platform angle be 26 degree) embodiment 2 schematic diagrames, for testing the tensile property of nano material.This structure is substantially the same manner as Example 1, and its difference is that lower support beam 103 is for symmetrical inclined beams, can make micro-structural guarantee, under the prerequisite of " reducing the test error that the factors such as gravity cause ", to reduce system stiffness, thereby improve the transformation ratio of power.
As shown in Fig. 2 (a), for the present invention have four upper vertical beams, two lower support beams and four cant beams (with upper platform angle be 26 degree) embodiment 3 schematic diagrames, for testing the compression performance of nano material.This structure is similar to Example 1, and two groups of incline directions that its difference is cant beam 105 are contrary with the incline direction of the cant beam in corresponding embodiment 1 respectively.Two groups of cant beams 105 are obliquely installed along upper platform 104 vertical center line directions to lower floor's platform 106 upper table surface two ends symmetries.According to kinematics of mechanism, in the time that lower floor's platform 106 is subject to pressure vertically upward and moves upward, the spacing of two upper platforms 104 can reduce, thereby makes nano material be compressed the effect of power.
As shown in Fig. 2 (b), for the present invention have four upper vertical beams, two lower support beams and four cant beams (with upper platform angle be 26 degree) embodiment 4 schematic diagrames, for testing the compression performance of nano material.This structure is similar to Example 2, and two groups of incline directions that its difference is cant beam 105 are contrary with the incline direction of the cant beam in corresponding embodiment 1 respectively.Two groups of cant beams 105 are obliquely installed along upper platform 104 vertical center line directions to lower floor's platform 106 upper table surface two ends symmetries.
Further illustrate preparation process of the present invention below in conjunction with accompanying drawing 3.
With reference to Fig. 3 (a), 01 is mechanical floor, material selection polysilicon, and thickness is about 10 μ m; 02 is sacrifice layer, and material is silica; 03 is silicon base; 04 is protective layer; 05 is a photoresist; 06 is secondary photoresist.
With reference to Fig. 3 (b), at mechanical floor surface-coated one deck photoresist 05.
With reference to Fig. 3 (c), etching photoresist, forms micro mechanical structure figure.
With reference to Fig. 3 (d), etching apparatus layer, forms micro mechanical structure.
With reference to Fig. 3 (e), remove photoresist.
With reference to Fig. 3 (f), at etching is good mechanical floor and protective layer coating photoresist 06.
With reference to Fig. 3 (g), etching protective layer photoresist, is of a size of watch window size.
With reference to Fig. 3 (h), etching protective layer.
With reference to Fig. 3 (i), etching substrate, forms observation window.
With reference to Fig. 3 (j), remove photoresist and protective layer, with the sacrifice layer at watch window place.
Further illustrate effect of the present invention below in conjunction with accompanying drawing 4.
In embodiment 1, between two upper platforms, place and fix a nano wire, from 0～3800N/m, (Young's modulus of equivalent nano wire is 0～2.6 × 10 to its rigidity
11pa) between, change; And apply a pressure F vertically upward in the geometric center of lower floor's platform, carry out the mechanical property of emulation embodiment 1 based on this.
As shown in Fig. 4 (a)-Fig. 4 (c), provide the analogous diagram in test nano material mechanics performance of embodiment 1.Fig. 4 (a) is the analogous diagram of power conversion coefficient, the analogous diagram that Fig. 4 (b) is displacement transformation ratio, the analogous diagram that Fig. 4 (c) is system stiffness.Herein, definition " power transformation ratio " is the axially loaded of nano wire and the ratio of F; Definition " displacement transformation ratio " is the length variations and the lower floor platform ratio in the variation of F direction top offset of nano wire; Definition " system stiffness " is F and the lower floor platform ratio in the variation of F direction top offset.
Can be found out by Fig. 4 (a), in the time that nano wire rigidity increases to 3800N/m gradually by zero, the power transformation ratio of micro-structural increases gradually, and levels off to 100%.Can be found out by Fig. 4 (b), in the time that nano wire rigidity increases gradually, the displacement transformation ratio of micro-structural slightly declines, and minimum approximately 70%.Can be found out by Fig. 4 (c), in the time that nano wire rigidity increases gradually, the system stiffness of micro-structural increases gradually.As we know from the figure, take micro-structural of the present invention to improve the rigidity of system; Can measure monodimension nanometer material bearing load and deformation simultaneously, and on the impact of sample nothing itself.
The above; only for the preferably specific embodiment of the present invention, but protection scope of the present invention is not limited to this, is anyly familiar with in technical scope that those skilled in the art disclose in the present invention; the variation that can expect easily or replacement, within all should being encompassed in protection scope of the present invention.
Claims (3)
1. the micro-structural for detection of monodimension nanometer material mechanical property, comprise a frame support (101), it is characterized in that: described frame support (101) is upper connects two upper platforms that are symmetrically set (104) by least four to being much of vertical beam (102); The two ends of two upper platforms (104) are supported on the bearing of frame support (101) by lower support beam (103) respectively; The below of described two upper platforms (104) connects lower floor's platform (106) by least four symmetrical cant beams (105);
Described upper platform (104) is that two ends are tip-like and needle tip is oppositely arranged the levelling bench for fixing monodimension nanometer material;
Between described upper platform (104) and lower floor's platform (106), be provided with that two groups of quantity equate and with respect to the cant beam (105) of micro-structural vertical center line symmetry;
Described upper vertical beam (102) and cant beam (105) are divided into two groups of left and right, and every group at least adopts two upper vertical beams (102) respectively frame support (101) to be connected with upper platform (104) and lower floor's platform (106) with two cant beams (105);
The middle part surface of described lower floor platform (106) has for the locating hole to micro-structural imposed load; Described micro-structural is taked polysilicon material.
2. a kind of micro-structural for detection of monodimension nanometer material mechanical property according to claim 1, it is characterized in that: described cant beam (105) is obliquely installed to micro-structural vertical center line direction symmetry along the two ends of upper platform (104), or be obliquely installed along upper platform (104) vertical center line direction to lower floor's platform (106) upper table surface two ends symmetry.
3. a kind of micro-structural for detection of monodimension nanometer material mechanical property according to claim 1, is characterized in that: described lower support beam (103) is vertical beam or symmetrical inclined beams.
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| CN104764660A (en) * | 2015-03-29 | 2015-07-08 | 北京工业大学 | Thermal-driving uniaxial drawing/compressive deformation device for scanning/transmission electron microscope |
| CN114608963B (en) * | 2022-03-25 | 2023-11-28 | 电子科技大学 | Device and method for measuring Young modulus of metal wire based on exhaust method |
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| JPH085656A (en) * | 1994-06-16 | 1996-01-12 | Kyowa Electron Instr Co Ltd | Acceleration converter |
| CN101109680A (en) * | 2007-08-24 | 2008-01-23 | 清华大学 | Film single-axis bidirectional decline micro-stretching device and method for measuring |
| CN101113946A (en) * | 2007-07-20 | 2008-01-30 | 北京工业大学 | Force and electrical behavior testing device under Nanometer lines in-situ compressing in transmission electron microscope |
| CN201159704Y (en) * | 2008-01-30 | 2008-12-03 | 赵宏伟 | Micro-stretching device of test piece material nano dimension mechanical property test |
| CN102221499A (en) * | 2011-03-29 | 2011-10-19 | 天津大学 | Alignment loading device used for stretching test of nanoscale, micron-size thin film materials |
| CN102230865A (en) * | 2011-04-02 | 2011-11-02 | 赵宏伟 | Trans-scale micro-nano scale in situ tension compression mechanical property test platform |
| CN202614584U (en) * | 2012-02-02 | 2012-12-19 | 西安电子科技大学 | Micro-mechanical structure for detecting nanometer material tensile and compressive mechanical properties |
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2012
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Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH085656A (en) * | 1994-06-16 | 1996-01-12 | Kyowa Electron Instr Co Ltd | Acceleration converter |
| CN101113946A (en) * | 2007-07-20 | 2008-01-30 | 北京工业大学 | Force and electrical behavior testing device under Nanometer lines in-situ compressing in transmission electron microscope |
| CN101109680A (en) * | 2007-08-24 | 2008-01-23 | 清华大学 | Film single-axis bidirectional decline micro-stretching device and method for measuring |
| CN201159704Y (en) * | 2008-01-30 | 2008-12-03 | 赵宏伟 | Micro-stretching device of test piece material nano dimension mechanical property test |
| CN102221499A (en) * | 2011-03-29 | 2011-10-19 | 天津大学 | Alignment loading device used for stretching test of nanoscale, micron-size thin film materials |
| CN102230865A (en) * | 2011-04-02 | 2011-11-02 | 赵宏伟 | Trans-scale micro-nano scale in situ tension compression mechanical property test platform |
| CN202614584U (en) * | 2012-02-02 | 2012-12-19 | 西安电子科技大学 | Micro-mechanical structure for detecting nanometer material tensile and compressive mechanical properties |
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