Summary of the invention
Therefore the purpose of this invention is to provide a kind of optical record medium that is used for the NFR CD of gap servo control; Wherein on base material, form at least one recording layer and an optical transport layer; And wherein light is used for record and/or generating information and signal from the irradiation of optical transport layer side, and said base material satisfies Young modulus and prevents the specific (special) requirements of (the Q factor) under the high frequency of 2000 Hz.Another object of the present invention provides a kind of aforesaid optical record medium, and it comprises at least one recording layer and an optical transport layer, has the specific (special) requirements of refractive index, anti-drawing property and surfaceness.Recording layer and optical transport layer sequentially form on base material; And wherein light is used for record and/or generating information and signal from the irradiation of optical transport layer side; Wherein said base material can be made up of articles injection-moulded; And said base material has the 756-05 according to ASTM E, the Young modulus E of at least 2.15 GPa that under 25 ℃, 2000 Hz, measure and be lower than 160 the Q factor, and the property recorded of concave point/groove structure>85%.
Summary of the invention
In read in the near-field recording of gap servo control and near field, the operating distance WD of lens and optical disc surface must be reduced to far below Wavelength of Laser λ, and must be controlled in the strict limit.Therefore be strict with for the high frequency mode vibration performance of CD and for thickness, optics and the mechanical property existence of optical transport layer.The present invention shows the selection that a kind of special CD is constructed, and it utilizes suitable material to realize this point, thereby addresses the above problem.
Therefore the present invention relates to a kind of optical record medium; Wherein on base material, sequentially form at least one recording layer and an optical transport layer; Wherein light is used for record and/or generating information and signal from the emission of optical transport layer side; Said base material comprise articles injection-moulded and said base material have the Young modulus E of at least 2.15 GPa that under 25 ℃, 2000 Hz, measure according to ASTM E 756-05 and be lower than 160 the Q factor and>85% the property recorded.
Preferred the present invention is the optical record medium according to claim 1, is characterised in that base material>Tg (glass transition temperature)-30 ℃ mold temperature, preferably>Tg (glass transition temperature)-20 ℃ mold temperature molded.
The invention still further relates to a kind of the preparation as method according to the basic base material of the optical record medium of claim 1; Wherein base material carries out moulding with respect to the pressing mold that comprises concave point and/or groove under>Tg (glass transition temperature)-30 ℃ mold temperature; Through said method; Said concave point and/or groove are copied in the base material, the property recorded>85%.
The explanation of preferred embodiment
The method that changes the mode vibration of CD under the high frequency is to improve its Young modulus E (stiffness), and it makes the mode vibration to the higher frequency skew, reduces the amplitude under given preventing thus, or reduces its quality factor Q (improving it prevents) to reduce oscillation amplitude.For overcoming this problem, can improve stiffness or prevent with the form of single parameter, or improve both simultaneously.
The thickness of optical transport layer is preferably 1 nm to being lower than 3000 nm, and more preferably 200 nm are to being lower than 2000 nm and being in particular 500 nm to being lower than 1500 nm.
The explanation of substrate material
The instance that forms the suitable substrate material of base material is polymkeric substance, blend and blend (thermoplastic resin composition of filling), as long as base material satisfies the requirement of the Young modulus E and the Q factor.But the fluoropolymer resin of the present invention that is used for said base material is not limited to following instance.
Except the requirement about the Young modulus E and the Q factor, thermoplastic resin, blend or blend should have low water absorbable, high-fire resistance, and answer available method commonly used, and for example injection moulding, injection and compression molding etc. are processed as CD.
Except the requirement about the Young modulus E and the Q factor, thermoplastic resin, blend or blend should have low water absorbable, high-fire resistance, and answer available method commonly used, and for example injection moulding, injection and compression molding etc. are processed as CD.
This thermoplastic resin can be selected from polycarbonate resin, acryl resin, polystyrene resin and amorphous cycloolefin and the hydrogenated polystyrene of gathering.Thermoplastic resin also can be the blend of being made up of the different thermoplastic resin, and is the blend of one or more thermoplastic resins and filler and/or adjuvant.
Polycarbonate resin
Polycarbonate resin obtains through the solution polymerization or the melt polymerization of aromatic dihydroxy compound and carbonate precursor usually.Can accept any aromatic dihydroxy compound, as long as it satisfies above-mentioned condition.
Preferred aromatic dihydroxy compound is the compound of formula (1):
HO-Z-OH (1)
The group of Z expression (1a) wherein,
Wherein
R
1And R
2Represent H or C independently of one another
1-C
8-alkyl is preferably H or C
1-C
4-alkyl, particularly hydrogen or methyl and
X representes singly-bound, C
1-C
6-alkylidene, C
2-C
5-alkylidene radical or C
5-C
6The ring alkylidene radical, it can be by C
1-C
6-alkyl, preferable methyl or ethyl replace, and condition is if X representes 3,3,5-3-methyl cyclohexanol fork base, then R
1And R
2Expression hydrogen.
Most preferably X representes singly-bound, methylene, isopropylidene or cyclohexylidene base or 3,3,5-3-methyl cyclohexanol fork base, and particularly X representes isopropylidene or 3,3,5-3-methyl cyclohexanol fork base.
Aromatic dihydroxy compound is normally known, perhaps can be according to known usually method preparation.
The instance of aromatic dihydroxy compound comprises quinhydrones, resorcinol, 4,4'-biphenol, 1, two (4-hydroxyphenyl) ethane, 2 of 1-; Two (4-hydroxyphenyl) propane, 2 of 2-, two (4-hydroxyphenyl) butane, 1 of 2-, two (4-the hydroxyphenyl)-1-vinylbenzenes, 1 of 1-; Two (4-hydroxyphenyl) cyclohexanes, 2 of 1-, two (4-hydroxyphenyl) pentanes, 4 of 2-, 4'-(right-the phenylene diisopropylidene) diphenol, 9; Two (4-hydroxyphenyl) fluorenes, 1 of 9-, two (4-the hydroxyphenyl)-4-isopropyl cyclohexanes, 2 of 1-, two (3-methyl-4-hydroxyphenyl) propane, 1 of 2-; Two (4-hydroxyphenyl) cyclohexanes, 1 of 1-, two (the 4-hydroxyphenyl)-3,3 of 1-; 5-trimethyl-cyclohexane, 9, two (3-methyl-4-hydroxyphenyl) fluorenes and the α of 9-, between α '-two (4-hydroxyphenyl)-diisopropylbenzene (DIPB).Preferred dihydroxy compounds is 2, two (4-hydroxyphenyl) propane (bisphenol-A), 4 of 2-, 4'-(-the phenylene diisopropylidene) diphenol and 1, two (the 4-hydroxyphenyl)-3,3 of 1-, 5-trimethyl-cyclohexane.
Polycarbonate resin can be the homo-polycarbonate that obtains through the above-mentioned aromatic dihydroxy compound of homopolymerization, or the Copolycarbonate through two or more aromatic dihydroxy compounds acquisitions of copolymerization.In addition, it can be the Copolycarbonate that obtains through other dihydroxy compounds of the above-mentioned aromatic dihydroxy compound of polymerization and one or more.
Reaction by means of solution methods is generally the reaction between the dihydric phenol photoreactive gas, and in the presence of sour coupling agent and organic solvent, carries out usually.As sour coupling agent, use alkali metal hydroxide, for example NaOH or potassium hydroxide, or amines, for example pyridine.As organic solvent, use halogenated hydrocarbons, for example methylene chloride or chlorobenzene.In order to promote reaction; Also can use catalyzer; For example tertiary amine, quaternary ammonium compound or season
compound; Its example is respectively triethylamine, N-ethyl-piperidines, four-normal-butyl bromination ammonium, or four-normal-butyl bromination
.Preferably, temperature of reaction is generally 0 to 40 ℃, and the reaction time is 10 minutes to 5 hours, and the pH between the reaction period is for being not less than 9.
In polyreaction, use the endcapped agent usually.These endcapped agent of using can be mono-functional phenols.These mono-functional phenols are usually as the endcapped agent of regulating molecular weight.The polycarbonate resin that obtains has the end by the sealing of simple function phenolic group group, makes the polycarbonate resin that it is superior to not obtaining as stated aspect thermal stability.Mono-functional phenols is generally phenol or low alkyl group substituted phenol; For example phenol, p-tert-butylphenol, right-cumyl phenol, isooctyl phenol or long chain alkylphenol, for example decyl phenol, dodecyl phenol, cetyl phenol, octadecyl phenol, eicosyl phenol, docosyl phenol and melissyl phenol.
The endcapped agent is introduced with the amount that obtains suitable molecular weight.The endcapped agent can be used separately, or uses with the form of combination.
The mean molecular weight of polycarbonate or Copolycarbonate is characterized by the relative solution viscosity of the polymer solution in the methylene chloride, uses the Ubbelhode capillary viscosimeter, capillary type 0C.Polymer concentration is 5 g/l, measures and under 25 ℃, carries out.Relative solution viscosity is 1.15 to 1.30, is preferably 1.18 to 1.25, is preferably 1.19 to 1.23 especially.
Reaction by means of melting method is generally the ester exchange reaction between dihydric phenol and the carbonic ester, and through at following mixing dihydric phenol and the carbonic ester and distillate the alcohol of generation or the method for phenol is carried out in the presence of inert gas of heating.Though temperature of reaction is based on the boiling point of alcohol that for example produces or phenol and difference it typically is 120 to 350 ℃.During reaction back half the, reaction system pressure is reduced to about 1.33 * 10
3To 13.3 Pa, with the alcohol of promotion generation or the distillation of phenol.Reaction time is generally 1 to 4 hour.
In the carbonic ester; The ester that C6 to C10 aryl or aralkyl for example or C1-4 alkyl are arranged; It can be substituted sometimes, particularly diphenyl carbonate, two (chlorphenyl) esters of carbonic acid, carbonic acid dinaphthyl ester, two (xenyl) esters of carbonic acid, dimethyl carbonate, diethyl carbonate and dibutyl carbonate.Wherein diphenyl carbonate is most preferred.
In order to promote polymerization, also can use polymerization catalyst.As these polymerization catalysts; Can use those catalyzer that are generally used for esterification or ester exchange reaction; Alkali metal compound for example, for example NaOH, potassium hydroxide, or the sodium of dihydric phenol or sylvite; Alkaline earth metal compound; For example calcium hydroxide, baryta hydrate or magnesium hydroxide, nitrogenous alkali compounds, for example tetramethyl ammonium hydroxide, tetraethyl ammonium hydroxide, trimethylamine or triethylamine; The alkoxide of alkaline metal or earth alkali metal; Phosphorous alkali compounds, the acylate of tetraphenyl
phenates or alkaline metal or earth alkali metal for example, zinc compound, boron compound, aluminium compound, silicon compound, germanium compound, organo-tin compound, lead compound, osmium compound, antimonial, manganese compound, titanium compound or zirconium compounds.These catalyzer can use separately or with the form of combination.These catalyzer are with for one mole of dihydric phenol as parent material, preferred 1 * 10
-8To 1 * 10
-3Equivalent, more preferably 1 * 10
-7To 5 * 10
-4The amount of equivalent is used.
Aromatic polycarbonate resin can comprise three-or higher official can aromatic compounds or in polymkeric substance, comprise the result of branching component as isomerization reaction in the polymerization.Three-or higher official can the instance of aromatic compounds preferably include phloroglucin (phlorogrucin), penta hydroxy group biphenyl (phlorogrucide), trisphenol, for example 4,6-dimethyl-2,4; 6-three (4-hydroxyphenyl) heptene-2,2,4,6-trimethyl-2; 4,6-three (4-hydroxyphenyl) heptane, 1,3,5-three (4-hydroxyphenyl) benzene, 1; 1,1-three (4-hydroxyphenyl) ethane, 1,1,1-three (3; 5-dimethyl-4-hydroxyphenyl) ethane, 2, two (2-hydroxy-5-methyl base benzyl)-4-cresols of 6-and 4-(4-[1, two (4-hydroxyphenyl) ethyls of 1-] benzene)-α, alpha-alpha-dimethyl benzyl phenol, four (4-hydroxyphenyl) methane, two (2; The 4-dihydroxyphenyl) ketone, 1, two (4, the 4-dihydroxy trityl group) benzene of 4-, trihemellitic acid, pyromellitic acid, benzophenone tetrabasic carboxylic acid and its sour chlorite.Wherein, 1,1,1-three (4-hydroxyphenyl) ethane and 1,1,1-three (3,5-dimethyl-4-hydroxyphenyl) ethane is preferred.
Phosphorus base thermal stabilizer can join in the thermoplastic resin.Suitable phosphorus base thermal stabilizer for example is phosphorous acid, phosphoric acid, phosphonous acid (phosphonous acid), phosphonic acids and its ester.Especially; Can mention bi-ester of phosphite; For example triphenyl phosphite, tricresyl phosphite (nonyl benzene) ester, tricresyl phosphite (2; 4-two-tert-butyl-phenyl) ester, tricresyl phosphite decyl ester, tricresyl phosphite monooctyl ester, tricresyl phosphite (octadecyl) ester, phosphorous acid didecyl monophenyl, phosphorous acid dioctyl monophenyl, phosphorous acid diisopropyl monophenyl, phosphorous acid monobutyl diphenyl ester, phosphorous acid list decyl diphenyl ester, phosphorous acid list octyl group diphenyl ester, diphosphorous acid two (2; 6-two-tert-butyl group-4-aminomethyl phenyl) pentaerythritol ester, phosphorous acid 2; 2-di-2-ethylhexylphosphine oxide (4; 6-two-tert-butyl-phenyl) monooctyl ester, two (nonyl phenyl) pentaerythritol esters of diphosphorous acid and diphosphorous acid two (2; 4-two-tert-butyl-phenyl) pentaerythritol ester, and phosphate compound, for example tributyl phosphate, trimethyl phosphate, tricresyl phosphate, triphenyl phosphate, trichlorophenyl phosphate, triethyl phosphate, di(2-ethylhexyl)phosphate phenyl cresols ester, adjacent biphenyl (orthoxenyl) ester of di(2-ethylhexyl)phosphate phenyl list, tributoxyethyl phosphate, dibutylphosphoric acid ester and diisopropyl phosphate.Other phosphorus base thermal stabilizer for example is two phosphonous acid four (2,4-two-tert-butyl-phenyl)-4, the inferior biphenyl ester of 4'-, two phosphonous acid four (2,4-two-tert-butyl-phenyl)-3, the inferior biphenyl ester of 3'-and the inferior biphenyl ester of two (2,4-two-tert-butyl-phenyl)-4-of phosphonous acid.Wherein, Phosphonous acid three (nonyl benzene) ester, diphosphorous acid distearyl pentaerythritol ester, diphosphorous acid two (2; 4-two-tert-butyl-phenyl) pentaerythritol ester, tricresyl phosphite (2,4-two-tert-butyl-phenyl) ester, triphenyl phosphate, trimethyl phosphate, two phosphonous acid four (2,4-two-tert-butyl-phenyl)-4; Inferior biphenyl ester of 4'-and the inferior biphenyl ester of two (2,4-two-tert-butyl-phenyl)-4-of phosphonous acid are preferred.These thermal stabilizers can use separately or with the form of potpourri.The amount of these thermal stabilizers is preferably 0.0001 to 0.5 weight portion, more preferably 0.0005 to 0.2 weight portion with most preferably be 0.002 to 0.2 weight portion, with respect to 100 parts by weight of thermoplastic resin compositions.
Can common known antioxidant be joined in the thermoplastic resin of the present invention in case oxidation.The instance of antioxidant is a phenolic group antioxidant.The amount of antioxidant is preferably 0.0001 to 0.05 wt%, based on thermoplastic resin.
The high-grade aliphatic ester of monohydroxy alcohol or polyvalent alcohol can be chosen wantonly and join in the thermoplastic resin of the present invention.Through the high-grade aliphatic ester of blend monobasic or polyvalent alcohol, the rippability of being peeled off by mould during the molding thermoplastic resin is improved, and the peeling load in the disk substrate moulding diminishes, and can prevent the disk substrate distortion and the concave point dislocation that are caused by stripping damage thus.The fluidity of molten of thermoplastic resin also is improved.
The amount of the ester of pure and mild higher fatty acid is 0.01 to 2 wt%, is preferably 0.015 to 0.5 wt%, and 0.02 to 0.2 wt% more preferably is based on thermoplastic resin.
Adjuvant; For example other thermoplastic resin, optical stabilization agent, colorant, antistatic agent and lubricant can join in the resin of CD base material of the present invention, and condition is that the moisture absorption and the property recorded in the moisture desorption procedure of moulding disc is without prejudice with the effect that reduces warpage.
In the preparation of resin combination of the present invention, it is contemplated that at polymer solution or mechanograph for example the stage of particle or pellet is carried out mixing and/or the polycarbonate resin of polycarbonate resin and mixing of other resin.This does not have special restriction.With regard to mixed media, in the polymer solution stage, the main container that stirrer is housed that uses at mechanograph, for example the stage of particle or pellet, can use cylinder, twin-shell mixer, Nauter mixer, Banbury mixer, nip roll or extruder.Under two kinds of situation, can use any technology, and have no particular limits.
In above-mentioned resin combination, various fillers can be used as annexing ingredient to be added, to improve stiffness and oscillation damping performance.Filler can be enumerated spun glass, glass sheet, carbon fibre, milled fibre, wollastonite whisker, carbon black, CNT, silica dioxide granule, titan oxide particles, alumina particle, talcum, mica and other inorganic material.Also can use heat-resisting organic filler, for example aramid fibre, polyarylate (polyarylate) fiber, polybenzothiozole fiber and aromatic poly amide powder.Under the situation of using this type of component, talc filler and graphite packing are preferred.The addition of this component is preferably 1 to 30 wt%, based on resin combination weight.
The thermoplastic resin composition can be through by means of kneader, for example cylinder, V-mixer, Nauta mixer, Banbury mixer, kneader roller or extruder, and each component of mixed thermoplastic resin's composition prepares.More preferably, each component is by means of extruder, particularly double screw extrusion machine fusion and kneading together.
Acryl resin
Acryl resin comprises the multipolymer of polymethylmethacrylate or methyl methacrylate and one or more other comonomers.The instance of this comonomer is an alkyl acrylate; For example methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, butyl acrylate, acrylic acid pentyl ester, Hexyl 2-propenoate, 2-ethyl hexyl acrylate, 2-EHA, cyclohexyl acrylate, dodecylacrylate, acrylic acid stearyl, phenyl acrylate and benzyl acrylate; Alkyl methacrylate; For example Jia Jibingxisuanyizhi, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, methacrylic acid pentyl ester, hexyl methacrylate, 2-Propenoic acid, 2-methyl-, octyl ester, methacrylic acid 2-Octyl Nitrite, cyclohexyl methacrylate, lauryl methacrylate, methacrylic acid stearyl, phenyl methacrylate and benzyl methacrylate, and multipolymer.Also can use the potpourri of acryl resin.Polymethylmethacrylate is most preferred acryl resin.
The molecular weight M of acryl resin
w(weight average) is preferably 50,000 to 2,000,000 g/mol, and more preferably 60,000 to 1,000,000 g/mol most preferably is 70,000 to 500,000 g/mol and particularly 80,000 to 300,000 g/mol, by light scattering measurement.
These acryl resins also can be to use with the form of the blend of above polycarbonate.In this case, the amount of acryl resin preferably is lower than 50 wt%, more preferably less than 20 wt%, especially preferably is lower than 10 wt%, based on whole compositions.
With the blend of polycarbonate in, acryl resin also can be the acrylic acid resilient material.In this case, it is made up of following: as acrylate rubber component, methyl methacrylate that must component, have the alkyl acrylate of C1 to C8 alkyl and as required can with the vinyl monomer of its copolymerization as copolymer component.In this acrylic acid resilient material, in the resilient material of 100 wt%, the amount of methyl methacrylate is 15 to 65 wt%.
ACM comprises acrylic acid C2 to C10 Arrcostab and as required, as can with styrene, methyl methacrylate or the butadiene of the component of its copolymerization.
As acrylic acid C2 to C10 Arrcostab, 2-EHA and n-butyl acrylate are preferred.This alkyl acrylate preferably is included in the ACM of 100 wt% with the amount of 50 wt%.Same preferred, ACM is partial cross-linked at least.Be used for crosslinked crosslinking chemical and can for example enumerate ethylene glycol diacrylate, diacrylate butanediol ester, GDMA, allyl methacrylate and polypropyleneglycol diacrylate.Preferably, use these crosslinking chemicals of 0.01 to 3 wt% in the ACM.
Preferred form as the acrylic acid resilient material; It can be preferably nucleocapsid structure and sandwich construction, and it is based on acrylate rubber component, methyl methacrylate, the alkyl acrylate with C1 to C8 alkyl, styrene and can obtain with vinyl monomer polymerization in a plurality of layers as required of its copolymerization.The acrylic acid resilient material can be by any known method, and for example block polymerization, suspension polymerization, block-suspension polymerization, solution polymerization or emulsion polymerization prepare.Sandwich construction also can be included in the component that is not grafted in the multistep polymerization on the grafting matrix.
When using with the form of the blend of above polycarbonate, these elastomeric propylene acid resins preferably use with 10 wt% that are lower than whole compositions.More preferably their content is lower than 5 wt%.
Polystyrene resin
Suitable styrene resin is styrene homopolymers, styrol copolymer or styrenic thermoplastic elastomer or blend according to the present invention, for example the blend of polystyrene and polyphenylene oxide.Those materials exist with some forms, but major part comprises the multipolymer that comprises styrene, isoprene and butadiene.Multipolymer comprises three blocks, for example S-B-S, S-I-S, S-EB-S and S-EP-S; Replace segmented copolymer, for example (S-I); The branched block multipolymer, for example (S-B) and (S-I) with three blocks/diblock blend (for example S-B-S/S-B).
These styrene resins can prepare according to known polymeric rule and known step.Styrene polymer for example can be by Houben Weyl, Methods of Organic Chemistry (organic chemistry method), the 4th edition, XIV/1 volume, 761-841 page or leaf, the method preparation of Georg Thieme-Verlag (1961).They also are purchased with suitable form.The free radical method is preferred, but also can use the ionic polymerization method.The molecular weight M of polymkeric substance used according to the present invention
wUsually above 2000, be preferably 5000 to 5,000,000, preferred especially 20,000 to 200,000 dalton.(by determination of light scattering; Referring to Ullmann's Encyclopedia of Industrial Chemistry (Ullmann industrial chemistry encyclopaedia), the 4th edition, 15 volumes, 285-387 page or leaf, Verlag Chemie 1978).
Homopolymer and multipolymer also can be by known method preparations.(referring to H.Rauch Puntigam, Th.Volker, Acrylic and Methacrylic Compounds (acrylic acid and methacrylic compound), Springer-Verlag 1967).Although in principle can by anionic polymerisation or group transfer polymerization preparation they (also referring to people such as O.W.Webster, J.Am.Chem.Soc, 105,5706 (1983)), but the preferred form of preparation is free radical polymerization.
Styrenic thermoplastic elastomer's molecular weight M
w(weight average) is generally 10,000 to 2,000,000 usually above 2000, is preferably 20,000 to 200,000 dalton, by light scattering measurement.
In more detail, the instance of above segmented copolymer can for:
Based on vinyl aromatic compounds; Preferred polystyrene (S-block); With through polymerization 1, the polymer blocks that the 3-diolefin is made, the multipolymer of preference such as butylene, isobutylene, ethylene-butene copolymer block, ethylene-propylene copolymer block or isoprene unit.According to the present invention, homopolymerization and copolymer block are available.The gained segmented copolymer can be introduced identical or different elastomeric blocks.Elastomeric blocks, B-block for example must be fully or almost completely hydration.This segmented copolymer preferably shows the for example linear structure of S-B-S structure.The available segmented copolymer that has irradiation structure or star structure in addition or form by the linear multi-block multipolymer.Also comprise diblock copolymer, for example the S-B polymkeric substance.All said polymkeric substance can use separately or with the form of combination.Particularly preferably be styrene-ethylene/butylene-styrene triblock copolymer (S-EB-S), styrene-ethylene/propylene-diblock copolymer (S-EP) and styrene-ethylene/butylene-diblock copolymer (S-EB).
Other instance of above multipolymer comprises
The segmented copolymer of above-mentioned segmented copolymer, wherein elastomeric blocks or at least a portion elastomeric blocks are functionalized with maleic anhydride.Maleic anhydride content is preferably 0.2 to 4 wt%, based on whole segmented copolymers.Particularly preferably being anhydride content is 0.5 to 2%.
According to the present invention, other instance that includes the multipolymer of use does
Olefin copolymer, for example ethylene/propylene rubber or ethylene/octene preferably use maleic anhydride functionalized.Preferably maleic anhydride content is 1 to 4%.
The unrestricted instance of the commercial copolymer of above-claimed cpd is the functionalized ethylene copolymer of maleic anhydride, for example the Exxelor VA 1801 of ExxonMobil Chemical, Exxelor VA 1803 or Exxelor VA 1840.The linear functionalization of styrene-based and ethylene/butylene copolymers three blocks-multipolymer, for example Kraton FG 1901 X and the Kraton FG1924X of Kraton Polymers.Linear three block copolymer, for example the Kraton G1651 of Kraton Polymers and Kraton G1652.Based on the polyolefin elastomer of ethylene-octene copolymer, the Engage 8411,8440,8842 of Dow Chemical for example.
The instance of polycarbonate or Copolycarbonate is Makrolon or the Apec of Bayer Materialscience AG.
According to the present invention, preferred resin combination or blend are made up of the above segmented copolymer of polycarbonate and/or Copolycarbonate and 0.2 to 30 wt% and preferred 1 to 15 wt% as stated.
Also can use polymkeric substance in addition from amorphous polyolefin.This polymkeric substance is by cyclic olefin polymerization, cycloolefin ring-opening polymerization and special hydrogenation polyolefin, and for example the hydrogenated polystyrene based polyalcohol produces.
Gather cyclic olefin resins
The polymkeric substance of cycloolefin for example can be for from the alkene with ENB structure, for example the polymerizate of ENB itself, tetracyclododecane, vinyl norbornene or norbornadiene.It also can be this alkene and the multipolymer of alkene, the for example multipolymer of ethene and ENB and ethene and tetracyclododecane with ENB structure.This product is for example at Japanese patent application Kokai (patented claim is open) 292; 601/86, Japanese patent application Kokai (patented claim is open) 26; 024/85, Japanese patent application Kokai (patented claim is open) 19; 801/87 and 19,802/87 and EP-A 317 262 and EP-A 532 337 in describe.
The hydrogenated polystyrene resin
The hydrogenated polystyrene based polyalcohol can have linear or star-branched structure.Linear-type is for example described in JP-B 7-114030, and the polymkeric substance with star-branched structure is for example described in WO 0148031.
As substrate resin, also can use the blend of above polymkeric substance.Suitable adjuvant, for example thermal stabilizer, release agent etc. and filler also can join acryl resin, polystyrene resin, gather in cyclic olefin resins and the hydrogenated polystyrene resin.
The general introduction of optical transport layer
But optical transport layer is generally the resin of UV-curable and spin coating, has the real part of at least 1.41 refractive index of under 405 nm mensuration.Resin can be by base-material and reactive viscosity reduction molecule (thinner molecule) and other adjuvant, for example UV initiating agent or solvent composition.Typical light trigger (UV initiating agent) is an alpha-alcohol ketone, and for example (Irgacure 184, and Ciba) or for example the 2-hydroxy-2-methyl-(Darocur 1173 for 1-phenyl-1-acetone for 1-hydroxyl-cyclohexyl-phenyl-ketone; Ciba); Or the monoacyl phosphine, for example 2,4; 6-trimethylbenzoyl-diphenyl-phosphine oxide (Darocur TPO, Ciba).The base-material molecule can for example be selected from urethane acrylate or polyether acrylate.Reactive viscosity reducer can be selected from ethoxylation alkyl acrylate, ethoxylation phenyl acrylate, alicyclic acrylic ester and heterocycle acrylic ester.
Optical transport layer is as the general introduction (HRI) of high refractive index layer coating A
Coating A can derive from curtain coating solution A *, and this curtain coating solution A * is applied over base material (S) or information and recording layer (B) and crosslinked.
Component A* (curtain coating solution)
Curtain coating solution A * according to the present invention comprises following component:
A1: comprise the suspending liquid of the potpourri of nano particle and water and at least a organic solvent,
A2: base-material
With optional
A3: other adjuvant.
Within the scope of the present invention, nano particle is interpreted as particle mean size (d
50) be lower than 100 nm, be preferably 0.5 to 50 nm, be preferably 1 to 40 nm especially, be preferably the particle of 5 to 30 nm very especially.Preferred nano particle has in addition and is lower than 200 nm, particularly is lower than 100 nm, especially preferably is lower than 40 nm, very especially preferably is lower than the d of 30 nm
90Value.Nano particle is preferably the single discrete form in the suspending liquid.Particle mean size d
50Be a kind of diameter, surpassing and be lower than the particle that all has 50 wt% under the situation of this diameter.d
90Value is a kind of diameter, is being lower than the particle that has 90 wt% under the situation of this diameter.Laser light scattering, or preferred operational analysis ultra centrifugal (AUC) are suitable for measuring granularity and characterize monodispersity.AUC is well known by persons skilled in the art, for example in " Particle Characterization (particle sign) ", and Part. Part. Syst. Charact., 1995,12, describe among the 148-157.
Be preparation component A1 (suspending liquid that comprises the potpourri of nano particle and water and at least a organic solvent), Al
2O
3, ZrO
2, ZnO, Y
2O
3, SnO
2, SiO
2, CeO
2, Ta
2O
5, Si
3N
4, Nb
2O
5, NbO
2, HfO
2Or TiO
2The nano particle water slurry be suitable, CeO
2The water slurry of nano particle is specially suitable.Preferred especially, the water slurry of nano particle comprises one or more acid, optimization acid RC (O) OH, wherein R=H, can choose by halogen preferred chlorine and/or the substituted C of bromine wantonly
1To C
18-alkyl perhaps can be chosen wantonly by C separately
1To C
4-alkyl and/or halogen, preferred chlorine, the substituted C of bromine
5To C
6-naphthenic base, C
6To C
20-aryl or C
7To C
12-aralkyl.R is preferably methyl, ethyl, propyl group or phenyl, is preferably ethyl especially.Nano granule suspension also can comprise mineral acid as acid, for example nitric acid, hydrochloric acid or sulfuric acid.The water slurry of nano particle preferably comprises 0.5 to 10 weight portion, and the acid of preferred especially 1 to 5 weight portion is based on the weight portion summation of acid and water.For example, available from Nyacol NanoTechn., Inc., the nano granule suspension NanoCeria CeO of USA
2-ACT is (with the stable CeO of acetate
2The water slurry of nano particle, pH value=3.0) and CeO
2-NIT is (with the stable CeO of nitric acid
2The nano particle water slurry, pH value=1.5) be suitable.
A part of water from these water slurries is substituted by at least a organic solvent.This partial solvent replacement, is for example carried out according to " cross flow (cross-flow) " method preferably through ultrafiltration through distillation or membrane filtration.The cross flow ultrafiltration is a kind of plant-scale ultrafiltration form (M.Mulder:Basic Principles of Membrane Technology (membrane technology ultimate principle); Kluwer Acad. Publ.; 1996; The solution that first published), wherein will filter (feed liquid) flows through film tangentially.Preferably use at least a solvent that is selected from alcohol, ketone, diketone, cyclic ethers, glycol, glycol ethers, diol ester, N-Methyl pyrrolidone, dimethyl formamide, dimethyl sulfoxide (DMSO), dimethyl acetamide and propylene carbonate for this solvent replacing.Preferably use the solvent mixture of at least two kinds of above-mentioned solvents, especially preferably use the solvent mixture of 1-methoxyl-2-propyl alcohol and DAA (DAA).Preferred especially usage rate is preferably 95:5 to 30:70, is preferably the 1-methoxyl-2-propyl alcohol (MOP) of 90:10 to 50:50 and the solvent mixture of DAA especially.Water may reside in the solvent of use, and amount is preferably 20 wt% at the most, more preferably 5 to 15 wt%.
In another embodiment of the invention; Through solvent replacing at least a above-mentioned organic solvent; Add the suspending liquid that another kind of solvent prepares nano particle then; This another kind of solvent is selected from alcohol, ketone, diketone, cyclic ethers; For example tetrahydrofuran or dioxane, glycol, glycol ethers, diol ester, N-Methyl pyrrolidone, dimethyl formamide, dimethyl sulfoxide (DMSO), dimethyl-acetamide, acetone contract glycerine (solketal), propylene carbonate and alkyl acetate, for example butyl acetate.Equally in this embodiment, water may reside in the solvent of use, and amount is preferably 20 wt% at the most, more preferably 5 to 15 wt%.
The preferred ultra filtration membrane of processing by the polyethers polysulfones that uses, it preferably has and is lower than 200,000 D, preferably is lower than 150,000 D, especially preferably be lower than 100,000 D by property (cut-off).Film following: hold back corresponding size (for example 200 by the property definition; 000 D and bigger) molecule; The molecule and the particle of reduced size can pass through (" Basic Principles of Membrane Technology (membrane technology ultimate principle) ", M.Mulder, Kluwer Academic Publishers simultaneously; 1996, first published).This ultra filtration membrane even under high flow capacity, hold back nano particle makes solvent pass through simultaneously.According to the present invention, solvent replacing is carried out through continuous filtration, and the water that passes through is substituted by the solvent of respective amount or solvent mixture.As substituting of thin polymer film, also can in the solvent replacing operation, use ceramic membrane.
Method of the present invention is characterised in that the ultimate value that is not less than 5 wt% in the gained nano granule suspension (component A1) by above-mentioned organic solvent or solvent mixture place of water.Preferably, make gained nano granule suspension (component A1) have 5 to 50 wt%, preferred 7 to 30 wt%, the liquid water content of preferred especially 10 to 20 wt% by organic solvent or solvent mixture place of water.The gained nano granule suspension preferably comprises 1 to 50 wt%, more preferably 5 to 40 wt%, the nano particle of preferred especially 15 to 35 wt% (being called the nano particle solid fraction hereinafter).
If in the film pond, carry out the solvent replacing of nano granule suspension for a long time, make to cause liquid water content to be lower than 5 wt%, particle aggregation then takes place, make the gained coating not satisfy the condition of the monodispersity and the high grade of transparency.On the other hand; If the liquid water content in the organic group nano granule suspension is greater than 50 wt%; The base-material that is used for subsequent step no longer dissolves in aqueous suspension and produces clear solution; Make that under both of these case promptly produce the base-material of clear solution for the nano particle of coalescence or for dissolving not, the gained coating does not satisfy the requirement of the high index of refraction n and the high grade of transparency simultaneously.
As base-material (component A2); Can use non-reacted heated drying thermoplastics; Polymethylmethacrylate (Elvacite for example; Tennants) or polyvinyl acetate (Mowilith 30, Synthomer) and after the coating can react the reactive monomer component that produces highly cross-linked polymer substrate by means of chemical reaction or photochmeical reaction.For example, crosslinkedly accomplish by the UV radiation.Considering and improve anti-drawing property, is preferred especially by means of the crosslinked of UV radiation.Reactive component is preferably UV-crosslinkable acrylatcs systems, like P.G.Garratt at " Strahlenhartung ", 1996, C.Vincentz VIg. describes in the Hanover.Base-material (component A2) is preferably selected from least a of polyvinyl acetate, polymethylmethacrylate, polyurethane and acrylic ester.Base-material (component A2) is preferably selected from least a of hexanediol diacrylate (HDDA), diacrylate tripropylene glycol ester, five acrylic acid dipentaerythritol ester, six acrylic acid dipentaerythritol ester (DPHA), tetrapropylene acid two trihydroxymethylpropanyl esters (DTMPTTA), three-(2-hydroxyethyl)-isocyanuric acid ester triacrylate, pentaerythritol triacrylate, three-(2-hydroxyethyl)-isocyanuric acid ester triacrylate and hexanediol diacrylate (HDDA) especially.
In curtain coating solution, be used as other components of additives (component A3) and be preferably at least a adjuvant that is selected from light trigger and thermal initiator.Based on the weight portion summation of each component of curtain coating solution, use 3 weight portions at the most, preferred 0.05 to 1 weight portion, the adjuvant of preferred especially 0.1 to 0.5 weight portion (component A3).Typical light trigger (UV initiating agent) be alpha-alcohol ketone (Irgacure 184, Ciba) or the monoacyl phosphine (Darocure TPO, Ciba).Causing the required energy value (energy of UV radiation) of UV polymerization is about 0.5 to 4 J/cm
2Coating surface, be preferably 2.0 to 3.0 J/cm especially
2The scope of coating surface.As other adjuvant same suitable be so-called coating additive, as being provided with title BYK by Byk/Altana (46483 Wesel, Germany), for example BYR 344.
According to the present invention, the curtain coating solution A * that is used for high refractive index coating through the organic solvent that can comprise water or solvent mixture dissolving at least a base-material (component A2) with choose other adjuvant (component A3) wantonly and prepare.Gained solution (being called base-material solution hereinafter) mixes with component A1 and optional the filtration and the degassing.In preferred embodiments, component A1 comprises identical organic solvent or solvent mixture as base-material solution.
Curtain coating solution A * preferably has following composition:
12 to 30 weight portions, preferred 13 to 25 weight portions, the nano particle solid fraction of preferred especially 14 to 19 weight portions,
2 to 8 weight portions, the base-material of preferred 2.5 to 5 weight portions,
0 to 3 weight portion, preferred 0.05 to 1 weight portion, other adjuvant (component A3) of preferred especially 0.1 to 5 weight portion,
7 to 28 weight portions, preferred 15 to 27 weight portions, the water of preferred especially 20 to 26 weight portions and
32 to 79 weight portions, preferred 42 to 70 weight portions, the organic solvent of preferred especially 50 to 63 weight portions,
The summation of the weight portion of each component is normalized to 100.
Curtain coating solution A * has 10 to 50 wt%, the solids content of preferred 14 to 28 wt% usually.The solids content of curtain coating solution A * is the summation of component A2, A3 and nano particle solid fraction.Base-material in the curtain coating solution (component A2) is preferably 40:60 to 7:93 to the ratio of nano particle solid fraction, is preferably 26:74 to 12:88 especially.
The bed thickness of coating A is 1 nm to 3000 nm, is preferably 200 nm to 2000 nm, is preferably 500 nm to 1500 nm especially.Bed thickness can be regulated by the solids content of curtain coating solution, particularly under the situation of spin-coating method.The bed thickness of coating is high if desired, then uses higher curtain coating solution solids content; Thin if desired coating is then used low curtain coating solution solids content.
The performance measurement of the coating A of coated product is following: the real part n of complex index and imaginary part k measure down at the wavelength (promptly in the wavelength coverage at blue laser) of 400 to 410 nm.Surfaceness by means of AFM (atomic force microscopy) with R
aThe form of value is measured.In order to measure anti-drawing property, on coating, move diamond pin with 50 μ m tip radius with the advanced speed of 1.5 cm/s and the weight that applies of 40 g, measure the gained scratch depth.In the part relevant with the test coated product, provide the details of each measuring method with production.
Base material S
Base material (S) is the disc goods, by above-mentioned fluoropolymer resin and following method manufacturing.Through sequentially apply at least one recording layer and an optical transport layer to base material, form optical record medium.
Produce the description of the process of the base material of optical record medium
Be base material by above-mentioned production of resins optical record medium; Use is equipped with compact disc mold and is had concave point and groove that satisfies the required specification of optical record medium and the injection machine with corresponding pressing mold of enough low surface roughness (comprising the injection pressure molding machine), forms the CD base material through injection moulding.The thickness of disk substrate is 0.3 to 2.0 mm.Injection machine can be normally used equipment, but is preferably the machine by certain made, and its machine barrel and screw rod have low adhesion, corrosion resistance and the wearing quality to resin, with generation that suppresses carbonide and the reliability that improves disk substrate.
Consider the object of the invention, the environmental optimization of molding step is clean as much as possible.It is also important that the material of wanting moulding is should be fully dry to remove water and should avoid the stop that possibly cause molten resin to decompose.
The resin of CD base material of the present invention preferably has sufficiently high flowability, helps the property recorded during injection moulding or the injection and compression molding like this.
Optical record medium can be made through at least one side of base material of the present invention, forming at least one reflective film.The material of reflective film is metal element or composite metal.Use independent Al or Au, or preferred the use comprise 0.5 to 10 wt%, the Al alloy of the Ti of preferred 3.0 to 10 wt%, or comprise the Al alloy of the Cr of 0.5 to 10 wt%.Reflective film can pass through PVD, ion beam sputtering, DC sputter or RF sputter and form.Only this metallic film (reflection horizon) is enough to satisfy the optical record medium of prerecording of the present invention; But except that the reflection horizon; Can form a recording layer (for example can repeat to write or recordable situation under phase-change thin film and dyestuff; And recordable optical recording medium, and the magnetic-optical recording film under the situation of magnetic-light optical record medium) and an optical transport layer, of the present inventionly repeat to write or recordable optical recording medium obtaining.
Phase-change thin film recording materials layer is processed by independent chalcogen or chalcogen compound.Especially, can use Te, Se or chalcogen compound sill, for example Ge-Sb-Te, Ge-Te, In-Sb-Te, In-Se-Te-Ag, In-Se, In-Se-Tl-Co, In-Sb-Se, Bi
2Te
3, BiSe, Sb
2Se
3Or Sb
2Te
3
Perpendicular magnetization film with the magnetic-optical property that comprises Kerr effect or Faraday effect, for example the amorphous alloy film of Tb-Fe-Co is as the magnetic-optical recording thin layer.
Optical transport layer forms on recording layer.Optical transport layer is processed by the material of transmission laser, and in the overview section of optical transport layer and the general introduction as the optical transport layer of high refractive index layer coating a (HRI), more specifically describes.
The method that forms optical transport layer is more specifically described with making in the method part of optical transport layer as high refractive index layer in the method for making optical transport layer.In addition, the thickness of optical transport layer is limited in 1 nm to 3000 nm, preferred 200 nm to 2000 nm, and preferred especially 500 nm to 1500 nm, so that the inhibition sphere-and the color aberration.
The basic comprising of optical record medium of the present invention has below been described.Can dielectric layer be joined in the above-mentioned formation, with the optical property and the thermal behavior of control optical record medium.In this case, can on base material, form reflection layer, first dielectric layer, recording layer, second dielectric layer and optical transport layer with the order of mentioning.The optical record medium of the invention described above is not limited to the lamination of a unique layer of being made up of above-mentioned different layer on the base material in addition.It also can have the multilayer laminated of each free spacer layer separates, and said wall is processed by the material that also can be used for optical transport layer.
Single component injection moulding (1-K moulding) (like what use among the embodiment)
Below describe the manufacturing of the standard 1-K moulding base material of optical record medium of the present invention, said method is used in experimental section, and does not limit the scope of the invention, as long as base material satisfies the requirement of the Young modulus E and the Q factor.The Sumitomo SD 40E injection machine of mould AWM5237 and BD-ROM pressing mold is equipped with in use, is that 120 mm and thickness are the disk substrate of 1.2 mm by each pellet injection moulding diameter.In addition, use the Arburg 420 C Allrounder 1300-350 injection machines that Philips CD mould and BD-ROM pressing mold are housed.
For forming corresponding optical record medium, on 1-K moulding base material, form reflection horizon (50 nm Ag) through PVD (Leybold A1100) or DC sputter (Reuter LP 800).On the reflection horizon, form HRI type optical transport layer according to said method.
For being formed for reference test bar according to ASTM E 756-05 measuring young modulus E and quality factor Q; From corresponding optical record medium base material; Or with the base material of recording layer lamination covering or this bar of base material cutting-out that covers with recording layer lamination and optical transport layer, or by the direct 1-K injection moulding of the corresponding resin reference test bar that is used for base material of the present invention.
9. make the description of the process of optical transport layer
Through spin coating resin is applied over substrate surface or information and recording layer surface.Can for example carry out the follow-up crosslinked of resin on the UV exposure sources: for this reason, the speed that substrates coated is placed on about 1 m/min moves through on the travelling belt of UV light source (Hg lamp, 80 W).Also can repeat this method, to change every cm
2Radiation energy.At least 1 J/cm
2, preferred 2 to 10 J/cm
2Radiation dose be preferred.Coated substrate can experience hot aftertreatment then, preferably utilizes hot-air, for example continues 5 to 30 minutes down at 60 ℃ to 120 ℃.
10. make the description of the process of optical transport layer as high refractive index layer (HRI)
Can obtain coating (A) through following steps:
I) with a part of water that comprises at least a organic solvent instead of water property nano granule suspension, make gained nano granule suspension (component A1) have the liquid water content of 5 to 50 wt%,
Ii) in nano granule suspension (component A1), add at least a base-material (component A2), produce curtain coating solution (A*),
Iii) with on curtain coating solution (A*) paint base material (S) or information and the recording layer (B) and
Iv) by means of heat or the crosslinked curtain coating solution of photochemical method (A*).
Preferably, step I ii) after, residual solvent is removed from the base material (S) that covers with curtain coating solution (A*) wholly or in part, and/or step I applies hot aftertreatment to the coating of acquisition after v).
Curtain coating solution A * is optional with ultrasonic Treatment 5 minutes at the most, preferred 10 to 60 seconds, and/or via preferably having 0.2 μ m film (RC film for example, filtrator Sartorius) filters.If exist, can apply ultrasonic Treatment to destroy the nano particle agglomerated thing.
Curtain coating solution is applied over substrate surface or information and recording layer surface.Preferably remove after the excessive curtain coating solution through spin coating, the residue of curtain coating solution is retained on the base material, and the thickness of residue depends on the solids content of curtain coating solution and under the situation of spin coating, depends on the spin coating condition.Some that comprise in the curtain coating solution or whole solvent can preferably randomly be removed through thermal treatment.The follow-up crosslinked of curtain coating solution or residue carries out through hot method (for example using hot-air) or photochemical method (for example UV light).Can for example carry out photochemical crosslinking on the UV exposure sources: for this reason, the speed that substrates coated is placed on about 1 m/min moves through on the travelling belt of UV light source (Hg lamp, 80 W).Also can repeat this method, to change every cm
2Radiation energy.At least 1 J/cm
2, preferred 2 to 10 J/cm
2Radiation dose be preferred.Coated substrate can experience hot aftertreatment then, preferably utilizes hot-air, for example continues 5 to 30 minutes down at 60 ℃ to 120 ℃.
Therefore the present invention further provides a kind of method of making optical transport layer, may further comprise the steps:
I) begin preparation dispersed nano particle suspension liquid at least a organic solvent from the water nano particle suspension liquid; Remove the water that exists in the water nano particle suspension liquid; Substitute with at least a organic solvent simultaneously, make nano granule suspension have the liquid water content of 5 to 50 wt%
Ii) in nano granule suspension (component A1), add at least a base-material (component A2) and optional other adjuvant (component A3), produce curtain coating solution (A*),
Iii) will be from ii) the curtain coating solution paint base material or information and recording layer (B),
Iv) preferably through thermal treatment, some that comprise in the optional removal curtain coating solution or whole solvent produce residue on base material,
V) through heat or the crosslinked curtain coating solution of photochemical method or residue and
Vi) preferably 60 to 120 ℃ of following these coatings of optional thermal treatment.
The explanation of test procedure
Young modulus
EAnd quality factor
QMeasurement
For measuring the Young modulus of the material in about 10 Hz to 10 KHz frequency ranges
EWith the damping correlation factor
Q(quality factor), the similar installation of describing among use and the ASTM E 756-05 (Fig. 1).Measuring principle is concerned about the resonant frequency of the swing arm of material based on estimating
f n Be the excitation resonant frequency, bar be fixed on a side of piezoelectricity-Vib. that the simulating the white noise signal by range expansion to 1 mHz to 10 KHz drives.Recording bar is to the response of excitation; For example utilize laser-Doppler-vibroscope (LDV) not being fixed on the most advanced and sophisticated measured speed of bar on piezoelectricity-Vib. to frequency function, above-mentioned speed is standardized as speed on the bar end that for example is fixed on piezoelectricity-Vib. to the excitation frequency function to frequency function.According to this response curve, according to following calculating
EWith
Q:
Wherein:
EThe Young modulus of=bar material, in Pa,
f n The resonant frequency of=pattern n, in Hz,
Δ
f n Half-power under the full bandwidth of=pattern n (FWHM), in Hz,
C n The coefficient of the pattern n of=fixing (homogeneous) bar,
HBar thickness in the=orientation of oscillation, in rice,
lThe length of=bar, in rice,
n=pattern count: 1,2,3
QThe quality factor of=bar material, dimensionless,
ρThe mass density of=bar is with kg/m
3Meter.
For example, bar can downcut from the CD according to the above-mentioned steps manufacturing, perhaps can injection moulding.This explanation does not limit the mode of making bar, and observed layer structure is identical in the bar thickness direction at least.The width of selector
WBe 0.013 m, select length
lMake resonant frequency mate with the mensuration frequency range of 10 Hz to 10 kHz preferably.Use is in the mensuration that is lower than 2000 Hz
f n With the mensuration that is higher than 2000 Hz
f N+1 By formula 1 and the analog value that formula 2 extracts, calculate under 2000 Hz through linear interpolation method down,
EWith
QValue.
Concave point height based on AFM is measured
Measure the concave point height through atomic force microscope with puncture (tapping) pattern.
Surfaceness based on AFM
Surfaceness provides with Ra, according to ASTM E-42.14 STM/AFM, measures with the puncture pattern through atomic force microscope.
Mass density
Mass density
ρWith Mettler density equipment Mettler AT 250 H66765, at room temperature, use ethanol to measure at the sample that from CD, downcuts as steeping liq.Perhaps, from CD, downcut known width
W, known altitude
HAnd known length
lRectangle CD section.Measure the quality m that the rectangle CD is cut into slices with balance (for example Mettler AT 250) weighing, through
ρ=m/ (
LHW) calculate
ρ
The plural number refractive index
n*
=n+ i
kMeasurement
From the transmission of coating and the plural refractive index of reflectance spectrum acquisition coating
n* real part
nImaginary part with plural refractive index
k(be also referred to as absorption constant hereinafter
k).For obtaining these spectrum, apply the thick coated film of about 100 to 300 nm by dilute solution to the quartz glass carrier through spin coating.By means of the spectrophotometer available from STEAG ETA-Optik, CD-measuring system ETA-RT measures the transmission and the reflectance spectrum of this layer structure, make then the coating bed thickness with
nWith
kThe transmission and the reflectance spectrum coupling of spectral dependency and mensuration.Use spectrophotometric in house software to accomplish coupling, the quartz glass base material that it need be measured in blank measure in advance
nWith
kSpectral dependency, as follows,
kRelevant with Rossi alpha:
λBe light wavelength.
The measurement of anti-drawing property
In order to measure the anti-property of drawing of coating on the CD base material, using tip radius is the diamond pin of 50 μ m, with the weight that applies of the advanced speed of 1.5 cm/s and 40 g, radially delineating from the inside to the outside of coated substrate.Use is measured the delineation degree of depth available from the Alpha Step 500 step section plotters (step profiler) of Tencor.The delineation degree of depth measuring as anti-drawing property.The delineation depth value means that for a short time anti-the drawing property of corresponding coating is high.
The measurement of the liquid water content of coating solution
Measure the liquid water content of coating solution through Karl Fischer method.
The measurement of optical transport layer thickness
Thickness range for 1 nm to 1500 nm; Utilize the method identical with the base material that puts on optical record medium of the present invention that optical transport layer is applied on the transparent BPA-polycarbonate CD-base material, said base material is with blank pressing mold (not having concave point and groove) moulding.By means of the spectrophotometer available from STEAG ETA-Optik, CD-measuring system ETA-RT measures the transmission and the reflectance spectrum of this layer structure, makes the transmission and the reflectance spectrum coupling of coating bed thickness and mensuration then.Use spectrophotometric in house software to accomplish coupling, the polycarbonate substrate that it need be measured in blank measure in advance
nWith
kSpectral dependency and according to plural refractive index
n*=
n+ i
kMeasurement in the explanation optical transport layer measured
nWith
kThickness range for 1500 nm to 150000 nm; By means of CD-measuring system ETA-RT, use modulus " ETA-DVR Measuring System for Blu-ray/Digital Video Recording (DVR) Disks (the ETA-DVR measuring system that is used for blue light/digital video record (DVR) dish) " to measure the thickness of the optical transport layer that puts on the optical record medium base material.The real part that for this reason needs the plural refractive index of optical transport layer
n, it is according to plural refractive index
n*=
n+ i
kMeasurement in explanation measure.
The measurement of the property recorded
The concave point depth d that has the injection-molded base material that duplicates the concave point structure with AFM with the measurement of puncture pattern
RThe concave point depth d of pressing mold
SMeasure in the same way.Then through the following calculating property recorded t:
t?=?d
R/d
S?*100%
The measurement of radial missing
The angular deviation of radial missing measuring light panel surface and reference field.It is defined as perpendicular between the incident light of reference field and the reflected light in the angle of radially measuring.The radial missing of CD is measured in use available from the off-line optical disc scanner of Dr.Schenk Prometheus MT 200.
Measurement based on the Tg of dynamic mechanical analysis (DMA)
According to IEC 1006, use to be of a size of 80 * 10 * 4 mm
3Test sample, storage modulus G' and loss modulus G'' in 0 ℃ to 260 ℃ temperature range, measure shearing.The rate of heat addition is set to 20 K/min, and vibration frequency is set to 1 Hz.The point of the steepest descent of the G' of Tg from logarithm-logarithmic scale curve is obtained.
Embodiment
Embodiment
The present invention explains according to some numerical value embodiment based on experimental result now.But the base material of the present invention that forms optical record medium is not limited to following examples, as long as this base material satisfies the Young modulus E of optical record medium and the requirement of the Q factor.
Substrate material
With the substrate material that talcum is filled, embodiment number 1 to 7
Blend 1 to 7 is bisphenol-A (BPA)-polycarbonate (Makrolon OD 2015 of 1.202 by solution viscosity; Bayer MaterialScience), polymethylmethacrylate (PMMA 6N, Degussa), be 1 talcum (Finntalc MO5SL, Mondo Minerals according to the hardness of Mohs value; Helsinki/ Finland), glyceryl monostearate (Dimodan; Danisco/ is German) and optional other adjuvant, for example two (2-ethylhexyl) phosphate (CAS 298-07-7, Alfa Aesar GmbH & Co KG; Karlsruhe/ Germany), process with wt% according to following table 1.Each material passes through ZSK 25/4 extruder (Coperion Holding GmbH, Stuttgart/ Germany) compounding, and the melt line material is cooled off granulation afterwards in water-bath.
The prescription of table 1: embodiment 1 to 7
With graphite-filled substrate material, embodiment numbers 8 to 13
Blend 8 to 13 is 1.202 BPA-polycarbonate (Makrolon OD 2015 by solution viscosity; Bayer MaterialScience), polymethylmethacrylate (PMMA 6N; Degussa), the hardness according to Mohs value is graphite C ond 5/99 (the Graphit Kropfm ü hl AG of 1-2; Hauzenberg/ is German) and glyceryl monostearate (Dimodan, Danisco/ Germany), process with wt% according to following table 2.Each material passes through ZSK 25/4 extruder (Coperion Holding GmbH, Stuttgart/ Germany) compounding, and the melt line material is cooled off granulation afterwards in water-bath.
The prescription of table 2: embodiment 8 to 13
With the substrate material that aerosil is filled, embodiment numbers 14 and 15
Blend 14 and 15 is 1.202 BPA-polycarbonate (Makrolon OD 2015 by solution viscosity; Bayer Material Science), polymethylmethacrylate (PMMA 6N; Degussa), Aerosil R 9200 (Degussa, Hanau, Germany) and glyceryl monostearate (Dimodan; Danisco/ Germany), process with wt% according to following table 3.The size-grade distribution (value) of the elementary aerosil particle that uses has the d of 13 nm
50The d of value and 17 nm
90The characteristic of value.Each material passes through ZSK 25/4 extruder (Coperion Holding GmbH, Stuttgart/ Germany) compounding, and the melt line material is cooled off granulation afterwards in water-bath.
Table 3: embodiment 14 and 15 prescription
With the substrate material that barium sulphate is filled, embodiment numbers 16
Blend 16 is 1.202 BPA-polycarbonate (Makrolon OD 2015 by the solution viscosity of 95.0 wt%; Bayer MaterialScience), polymethylmethacrylate (PMMA 6N; Degussa) and 5.0 wt% according to Mohs value; The hardness of in the body sample, measuring is that 3 barium sulphate nano powder (Solvay Infra, Bad H nningen/ Germany) is processed.The size-grade distribution (value) of the barium sulphate primary nanoparticle of using has the d of 42 nm
50The characteristic of value.Each material passes through ZSK 25/4 extruder (Coperion Holding GmbH, Stuttgart/ Germany) compounding, and the melt line material is cooled off granulation afterwards in water-bath.
Other substrate material, embodiment numbers 17 to 23
Material 17 comprise relative solution viscosity be 1.20 by 4 of 50 mol%, 1 of 4'-(-phenylene diisopropylidene) diphenol and 50 mol%, two (the 4-hydroxyphenyl)-3,3 of 1-, the Copolycarbonate of 5-trimethyl-cyclohexane preparation.
Material 18 comprises the polymetylmethacrylate 6N available from Degussa.
Material 19 comprise relative solution viscosity be 1,225 by 1 of 13 wt%, two (the 4-hydroxyphenyl)-3,3 of 1-, the Copolycarbonate of the bisphenol-A preparation of 5-trimethyl-cyclohexane and 87 wt%.
Material 20 comprises that solution viscosity is 1,202 the polycarbonate by the bisphenol-A preparation.
Material 21 comprises that solution viscosity is 1,24 the polycarbonate by the bisphenol-A preparation.(2230, Kronos Dallas) fills this material with the titania of 12 wt%.
Material 22 comprise relative solution viscosity be 1,294 by 4 of 70 mol%, the Copolycarbonate of the bisphenol-A of 4'-(right-hydroxy diphenyl) and 30 mol% preparation.
Material 23 comprises the blend of material 20 and the carbon fibre of 20 wt% (carbon fibre Tenax-U model 234, Toho Tenax Europe GmbH Wuppertal Germany).
Blend polymer, embodiment 24 to 26
Following, Makrolon 2808 expressions are available from the aromatic polycarbonate based on bisphenol-A of Bayer Materialscience AG, and melt volume speed is that 10 g/ (10 min) are (according to ISO 1133; 300 ℃, 1.2 kg measure).Apec 1895 expression is available from bisphenol-A/1 of Bayer Materialscience AG, and 1-is two-(4-hydroxyphenyl)-3,3,5-trimethyl-cyclohexane Copolycarbonate, and melt volume speed is 18 (according to ISO 1133; 330 ℃, 2,16 kg measure).Apec 2095 expression is available from bisphenol-A/1 of Bayer Materialscience AG, and 1-is two-(4-hydroxyphenyl)-3,3,5-trimethyl-cyclohexane Copolycarbonate, and melt volume speed is 8 (according to ISO 1133; 330 ℃, 2,16 kg measure).Kraton 1652G representes the linear three block copolymer available from the styrene-ethylene/butylene-styrene of Kraton Polymers.Sibstar 073T representes available from the styrene of Kaneka Corp. and the segmented copolymer of isobutylene.Each blend passes through ZSK 25/4 extruder (Coperion Holding GmbH, Stuttgart/ Germany) compounding, and the melt line material is cooled off granulation afterwards in water-bath.
Material 24 comprises Apec 2095 and the Kraton G1652 of 4 wt% of Makrolon 2808,1 wt% of 95 wt%.
Material 25 comprises the Apec 1895 of 96 wt% and the Sibstar 073T of 4 wt%.
Material 26 comprises Apec 9379 and the Kraton 1652G of 4 wt% of Apec 1895,1 wt% of 95 wt%.
CD molding methods A
The Sumitomo SD 40E injection machine of mould AWM 5237 and BD-ROM pressing mold is equipped with in use, and material injection moulding diameter is that 120 mm and thickness are the disk substrate of 1.2 mm from the above mentioned.Use is with the molded parameter, referring to table 4:
Table 4: the moulding parameter that is used for different embodiment according to CD molding methods A
CD molding methods B
In addition, use the Arburg 420 C Allrounder 1300-350 injection machines that Philips CD mould and BD-ROM pressing mold are housed.Use is with the molded parameter, referring to table 5:
Table 5: the moulding parameter that is used for different embodiment according to CD molding methods B
In the table 6, the Young modulus measurement of reference test bar and the result of quality factor Q are described.Reference test bar is through direct 1-K moulding or through it is scaled off manufacturing from 1-K molded optical disk base material.
Table 6: prod
Coating examples of optical disks in following CD base materials of in the table 7 all (S) and the table 10 is the concave point structure of the Information Level of 320 nm based on orbit interval.All CDs of describing among the embodiment also show extremely low radial missing value, fully in-0.8 to+0.8 BD specification.
Table 7:1-K moulding base material (S)
Comparative Examples 20 does not satisfy required low reactance-resistance ratio, although the property recorded height, because the difference between glass transition temperature and the mold temperature is less than 30 ℃.
Comparative Examples 13 has enough low Q value, can the property recorded requirement but discontented, because the difference between glass transition temperature and the mold temperature is greater than 30 ℃.
Go up the reflection horizon (B) that forms 50 nm Ag at base material (S) through DC sputter (Reuter LP 800).
Obtain the optical transport layer on the reflection horizon on the base material (S) by following component and step:
Component A.0
Ceria CeO
2-ACT: CeO
2Water slurry: 20 wt% CeO
2Nano particle in 77 wt% water and 3 wt% acetate, the pH value of suspending liquid: 3.0, suspension CeO
2The granularity of nano particle: 10-20 nm, proportion: 1.22 g/ml, viscosity: 10 mPas, manufacturer: Nyacol Inc., Ashland, MA, the U.S..
Component A.2-1
Base-material: five/six acrylic acid dipentaerythritol ester (DPHA, Aldrich).
Component A.2-2
Base-material: hexanediol diacrylate (HDDA, Aldrich).
Component is A.2-3:
Base-material: Desmolux U 100 (urethane acrylate, Bayer Materialscience).
Component A.3
UV light trigger: Irgacure 184 (1-hydroxyl-cyclohexyl-phenyl ketone), Ciba Specialty Chemicals Inc., Basel, Switzerland.
Following component is used as the organic solvent among the embodiment:
1-methoxyl-2-propyl alcohol (MOP), manufacturer: Aldrich
DAA (DAA), manufacturer: Aldrich.
-flow ultrafiltration horizontal by means of being described below is with water-based CeO
2Nano granule suspension (component is A.0) changes into moisture and nano granule suspension (component is A.1) MOP:
Membrane module and UF diaphragm chamber (PES, MW 100,000) available from PALL (Centramate OS070C12) are used for laterally-flow ultrafiltration (UF).Infiltration is carried out under the pressure of 2.5 crust, abandons moisture exudate, substitutes the seepage remaining liquid that reduces with alcoholic solvent 1-methoxyl-2-propyl alcohol (MOP).Use 6.5 liters of components A.0.Shown in following form, finish after the circulation of three different lengths to filter, so obtain the nano granule suspension (component is A.1) in the potpourri of organic solvent MOP and water.
Table 8: component composition and performance A.1
1) by means of Karl Fischer titration determination
2) comprise 3 wt% acetate
Obtain to have the curtain coating solution (component A**) of 10 wt% liquid water contents through mixed solution A and solution B:
Solution A: under agitation, in the solvent DAA of 108 g the component of dissolving 12.4 g A.2-1 with the component of 3.1 g A.2-2 with 15.6 g A.2-3.The component of adding 2.35 g then A.3, so form clear solution.
Solution B: in glass beaker, add the solvent DAA of 54 g in A.1, stir the mixture to the component of 435 g, then obtain yellow transparent suspending liquid, with ultrasonic Treatment 30 seconds.Add the water of 32.5 g during this time.
Mixed solution A and B, and then with ultrasonic Treatment 30 seconds go up at 0.2 μ m filtrator (Minisart RC film) and to filter.The calculating of curtain coating solution (component A*) is formed as follows:
Table 9: composition and the performance of curtain coating solution component A**
1) the nano particle solid fraction that is A.1 produced by component (is CeO here
2)
2) solids content of indicating of each curtain coating solution is A.2-1+ component component nano particle solid fraction (CeO A.3+ A.2-2+ of component
2) summation.
It is 1.84 that the real part n of complex index is determined as under 405 nm, and it is 0.004 that the imaginary part k of complex index is determined as under 405 nm.
For coating solution (component A*) being applied over the reflection horizon (B) on the disc base material (S); Through following process spin coating component A*: through syringe through 2.1 seconds with the internal diameter of component A* dispensing to the slow-revving fixing substrate of 240 RPM; Through component A* being distributed in 3.5 seconds on the entire area of the CD under 750 RPM; Nursed one's health the component A* of the distribution under 10 RPM through 40 seconds, remove excessive component A*, kept high invariablenes turning speed other 14 seconds through in 20 seconds, making rotation increase to 2000 RPM from 10 RPM.Coating with mercury lamp with 5.5 J/cm
2Crosslinked.The residual bed thickness of optical transport layer is 950 nm.
Table 10: from the coating CD of 1-K moulding base material (S)