CN102540742B - 曝光方法 - Google Patents
曝光方法 Download PDFInfo
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- CN102540742B CN102540742B CN201010605310.8A CN201010605310A CN102540742B CN 102540742 B CN102540742 B CN 102540742B CN 201010605310 A CN201010605310 A CN 201010605310A CN 102540742 B CN102540742 B CN 102540742B
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CN201010605310.8A CN102540742B (zh) | 2010-12-27 | 2010-12-27 | 曝光方法 |
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CN201010605310.8A CN102540742B (zh) | 2010-12-27 | 2010-12-27 | 曝光方法 |
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CN102540742A CN102540742A (zh) | 2012-07-04 |
CN102540742B true CN102540742B (zh) | 2015-11-25 |
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CN201010605310.8A Active CN102540742B (zh) | 2010-12-27 | 2010-12-27 | 曝光方法 |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101118387A (zh) * | 2006-08-03 | 2008-02-06 | 上海华虹Nec电子有限公司 | 用于测量光刻机像场弯曲分布的装置和方法 |
CN101118385A (zh) * | 2006-08-01 | 2008-02-06 | 上海华虹Nec电子有限公司 | 用图像同步采集光刻成像系统的像场弯曲测量方法 |
CN101344726A (zh) * | 2007-07-09 | 2009-01-14 | 财团法人工业技术研究院 | 制作周期性图案的步进排列式干涉微影方法及其装置 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP2006235533A (ja) * | 2005-02-28 | 2006-09-07 | Nikon Corp | 露光装置及びマイクロデバイスの製造方法 |
JP2009237255A (ja) * | 2008-03-27 | 2009-10-15 | Fujifilm Corp | 露光装置、及び露光方法 |
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- 2010-12-27 CN CN201010605310.8A patent/CN102540742B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101118385A (zh) * | 2006-08-01 | 2008-02-06 | 上海华虹Nec电子有限公司 | 用图像同步采集光刻成像系统的像场弯曲测量方法 |
CN101118387A (zh) * | 2006-08-03 | 2008-02-06 | 上海华虹Nec电子有限公司 | 用于测量光刻机像场弯曲分布的装置和方法 |
CN101344726A (zh) * | 2007-07-09 | 2009-01-14 | 财团法人工业技术研究院 | 制作周期性图案的步进排列式干涉微影方法及其装置 |
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C06 | Publication | ||
PB01 | Publication | ||
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Owner name: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WUXI CSMC SEMICONDUCTOR CO., LTD. Effective date: 20140102 Free format text: FORMER OWNER: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Effective date: 20140102 |
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Effective date of registration: 20140102 Address after: 214028 Xinzhou Road, Wuxi national hi tech Industrial Development Zone, Jiangsu, China, No. 8 Applicant after: Wuxi Huarun Shanghua Technology Co., Ltd. Address before: 214028 Wuxi provincial high tech Industrial Development Zone, Hanjiang Road, No. 5, Jiangsu, China Applicant before: Wuxi CSMC Semiconductor Co., Ltd. Applicant before: Wuxi Huarun Shanghua Technology Co., Ltd. |
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