CN101118387A - 用于测量光刻机像场弯曲分布的装置和方法 - Google Patents
用于测量光刻机像场弯曲分布的装置和方法 Download PDFInfo
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- CN101118387A CN101118387A CNA2006100297013A CN200610029701A CN101118387A CN 101118387 A CN101118387 A CN 101118387A CN A2006100297013 A CNA2006100297013 A CN A2006100297013A CN 200610029701 A CN200610029701 A CN 200610029701A CN 101118387 A CN101118387 A CN 101118387A
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CNB2006100297013A CN100524038C (zh) | 2006-08-03 | 2006-08-03 | 用于测量光刻机像场弯曲分布的装置和方法 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102375351A (zh) * | 2010-08-11 | 2012-03-14 | 上海微电子装备有限公司 | 一种信号归一化掩模对准系统 |
CN102540742A (zh) * | 2010-12-27 | 2012-07-04 | 无锡华润上华半导体有限公司 | 曝光方法 |
CN103278179A (zh) * | 2013-05-16 | 2013-09-04 | 中国科学院长春光学精密机械与物理研究所 | 空间相机场曲检测装置及检测方法 |
WO2016188358A1 (zh) * | 2015-05-24 | 2016-12-01 | 上海微电子装备有限公司 | 曝光装置 |
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2006
- 2006-08-03 CN CNB2006100297013A patent/CN100524038C/zh active Active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102375351A (zh) * | 2010-08-11 | 2012-03-14 | 上海微电子装备有限公司 | 一种信号归一化掩模对准系统 |
CN102375351B (zh) * | 2010-08-11 | 2013-05-22 | 上海微电子装备有限公司 | 一种信号归一化掩模对准系统 |
CN102540742A (zh) * | 2010-12-27 | 2012-07-04 | 无锡华润上华半导体有限公司 | 曝光方法 |
CN102540742B (zh) * | 2010-12-27 | 2015-11-25 | 无锡华润上华科技有限公司 | 曝光方法 |
CN103278179A (zh) * | 2013-05-16 | 2013-09-04 | 中国科学院长春光学精密机械与物理研究所 | 空间相机场曲检测装置及检测方法 |
CN103278179B (zh) * | 2013-05-16 | 2015-08-19 | 中国科学院长春光学精密机械与物理研究所 | 空间相机场曲检测装置及检测方法 |
WO2016188358A1 (zh) * | 2015-05-24 | 2016-12-01 | 上海微电子装备有限公司 | 曝光装置 |
US10197921B2 (en) | 2015-05-24 | 2019-02-05 | Shanghai Micro Electronics Equipment (Group) Co., Ltd. | Exposure device |
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CN100524038C (zh) | 2009-08-05 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20131216 |
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Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20131216 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |