CN102534614A - Coating method for DLC (diamond-like carbon) coating on spinning reed and equipment - Google Patents
Coating method for DLC (diamond-like carbon) coating on spinning reed and equipment Download PDFInfo
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- CN102534614A CN102534614A CN2011104523828A CN201110452382A CN102534614A CN 102534614 A CN102534614 A CN 102534614A CN 2011104523828 A CN2011104523828 A CN 2011104523828A CN 201110452382 A CN201110452382 A CN 201110452382A CN 102534614 A CN102534614 A CN 102534614A
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- 238000000576 coating method Methods 0.000 title claims abstract description 68
- 235000014676 Phragmites communis Nutrition 0.000 title claims abstract description 67
- 239000011248 coating agent Substances 0.000 title claims abstract description 61
- 238000009987 spinning Methods 0.000 title abstract 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052799 carbon Inorganic materials 0.000 title abstract 2
- 239000002184 metal Substances 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims abstract description 26
- 238000005516 engineering process Methods 0.000 claims abstract description 14
- 238000004544 sputter deposition Methods 0.000 claims abstract description 12
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 10
- 238000009941 weaving Methods 0.000 claims description 50
- 238000000151 deposition Methods 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 24
- 230000008021 deposition Effects 0.000 claims description 20
- 239000012530 fluid Substances 0.000 claims description 15
- 238000004140 cleaning Methods 0.000 claims description 13
- 239000007888 film coating Substances 0.000 claims description 13
- 238000009501 film coating Methods 0.000 claims description 13
- 238000001816 cooling Methods 0.000 claims description 12
- 239000007789 gas Substances 0.000 claims description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 6
- 239000012528 membrane Substances 0.000 claims description 5
- 230000007704 transition Effects 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 230000000740 bleeding effect Effects 0.000 claims description 3
- 239000002019 doping agent Substances 0.000 claims description 3
- 229930195733 hydrocarbon Natural products 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 238000007733 ion plating Methods 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 238000007670 refining Methods 0.000 claims description 3
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 3
- 239000004753 textile Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 230000007797 corrosion Effects 0.000 abstract description 2
- 238000005260 corrosion Methods 0.000 abstract description 2
- 238000005299 abrasion Methods 0.000 abstract 2
- 239000002245 particle Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 244000287680 Garcinia dulcis Species 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 230000003245 working effect Effects 0.000 description 2
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- 238000000992 sputter etching Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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Abstract
The invention discloses a coating method for a DLC (diamond-like carbon) coating on a spinning reed. The coating method comprises the steps of preparing a metal depletion layer through a vacuum sputter coating or multi-arc ion beam technology and preparing the DLC coating through a vacuum ion coating technology. The invention further discloses equipment capable of applying the coating method. The invention has the outstanding effects as follows: the DLC coating is successfully applied to the spinning reed, so as to solve the problem on surface abrasion resistance of the reed and improve the film rigidity of the reed to HV0.025 2500 to 3500; and the DLC coating has the properties of abrasion resistance, corrosion resistance, high binding force and low friction coefficient, thereby effectively improving the property of the reed, prolonging the service life of the reed, improving the spinning efficiency, saving the spinning cost and ensuring the quality of textile products.
Description
Technical field
The invention belongs to plated film field, metallic surface, relate in particular to DLC coating film coating method and equipment on a kind of reed that is applied to weave.
Background technology
All disposing reed on the loom of Weaving Shop, can be various flat buttons or specialshaped button.Its main effect is the warp count of urgent weft yarn and decision grey cloth.The weaving reed is the easily-consumed products in the textile industry, has born friction damage and fatigue damage, and the reed surface imperfection has directly influenced the quality and weaving efficient of product.In general, under the effect of warp tension and tightening weft resistance, can present a horizontal polishing scratch at leisure on the reed, can cause the cracked ends phenomenon in the textile technology, influence quality product; And shorten the work-ing life of reed, influences production efficiency.
The DLC coating has high firmness, high elastic coefficient, useful friction and wear behavior and good advantages such as chemicalstability; Therefore be necessary to provide a kind of method; Utilize physical gas phase deposition technology (PVD) in reed surface deposition DLC coating, solve reed and damage the low problem with frequent shutdown replacing reed of the textile product quality of being brought.
Summary of the invention
In view of the defective that above-mentioned prior art exists, the objective of the invention is to propose DLC coating film coating method and equipment on a kind of reed that is applied to weave.
The object of the invention will be achieved through following technical scheme:
DLC coating film coating method on a kind of reed of weaving comprises the steps:
1) workpiece cleaning step is carried out ultrasonic cleaning to the weaving reed, and is dried up with nitrogen;
2) clamping step, the weaving reed that said cleaning is finished is installed on the pivoted frame in the Vakuumkammer;
3) vacuumize step, Vakuumkammer is evacuated to 5*10
-3The vacuum tightness that Pa is above;
4) heating steps is opened the well heater be positioned at Vakuumkammer and is heated, and with being heated to 100 ~ 200 degrees centigrade with the reed entity of weaving in the Vakuumkammer, and in whole coating process process, keeps constant temperature;
5) ion cleaning step feeds the high-purity argon gas of the purity more than the 5N in Vakuumkammer, vacuum chamber pressure is reached and remain on 0.1-0.5Pa, opens the ionic fluid power supply, begins the ion matting is carried out on the surface of said weaving reed; In the ion cleaning process, the WV that is applied on the ionic fluid is 1000-2000V, and working current is 50-150mA; Apply 500V ~ 2000V pulsed bias on the weaving reed, dutycycle is greater than 20%; The time of ion matting is 10-60 minute;
6) metal refining transition layer step, this step can be selected one of which for [A] or [B] mode,
[A] keeps vacuum tightness at 0.1-2Pa, opens the magnetron sputtering power supply, and current lead-through begins to carry out the deposition of intermediate metal to the magnetic control sputtering cathode that has Cr target or Ti target, is applied to direct supply power on the magnetron sputtering target during deposition greater than 1KW; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 30%; The intermediate metal depositing time is 15-60 minute;
[B] keeps vacuum tightness at 0.1-2Pa, opens the multi sphere power supply, and current lead-through begins to carry out the deposition of intermediate metal to the cathode arc source that has Cr target or Ti target, is applied to electric current on the cathode arc target during deposition greater than 60A; Apply the pulsed bias less than 500V on the weaving reed, dutycycle is greater than 30%; Intermediate metal depositing time 15-60 minute;
7) deposition DLC coating step feeds hydrocarbon type of gas in Vakuumkammer, keep vacuum tightness at 0.05-0.5Pa, opens the deposition that the ionic fluid power supply begins the DLC coating, is applied to WV on the ionic fluid greater than 1000V, and working current is 50-300mA; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 10%; Depositing time is 100-200min;
8) the cooling cooling step is closed ionic fluid power supply, grid bias power supply, gas source and heating power supply, keeps the Sprengel pump state of bleeding, and product is carried out in the Vakuumkammer accomplishing with stove cooling cooling 10-60min.
Said weaving reed is provided with the intermediate metal of vacuum sputtering coating or the preparation of multi sphere ion beam technology and the DLC coating of vacuum ion plating membrane technique preparation outward successively.
The material of said intermediate metal is Cr, Ti, and thickness is 50-800nm.
Preferably, said intermediate metal is the single or multiple lift structure, and said multilayer film is to be that bottom is than the thick 5-30% of last layer.
Said DLC coating is the pure DLC coating or the DLC coating of mixing, and dopant material comprises one or more among Si, Cr, Ti, the W.Said DLC coat-thickness is 1-3um.
Preferably, said DLC coating is the single or multiple lift structure, and said multilayer film is to be that bottom is than the thick 10-50% of last layer.
The present invention has also disclosed the DLC coating filming equipment on a kind of reed of weaving; Comprise a Vakuumkammer; Rotatably be located at the pivoted frame in the said Vakuumkammer through a rotating shaft; Arrange on the said pivoted frame and be provided with the support that is used for fixing the reed of weaving, the locular wall of said Vakuumkammer is furnished with controlled sputtering source/arc source and ion beam source, is provided with well heater in the said Vakuumkammer.
Preferably, said support equidistance is arranged in the circumferential direction of pivoted frame.
Outstanding effect of the present invention is: the DLC coating is successfully applied on the weaving reed, has solved the wear resistance problem on reed surface, the reed film hardness is brought up to HV
0.0252500 ~ 3500, and have performances such as wear-resisting, corrosion-resistant, high-bond, low-friction coefficient, thus effectively improve reed performance and work-ing life, improved weaving efficient to have practiced thrift the weaving cost, guaranteed the textile product quality.
Following constipation closes the embodiment accompanying drawing, and specific embodiments of the invention is done further to detail, so that technical scheme of the present invention is easier to understand, grasp.
Description of drawings
Fig. 1 is the structural representation of reed plated film Vakuumkammer of the present invention.
Fig. 2 is the vertical view of reed plated film Vakuumkammer of the present invention.
Embodiment
PVD coating technique commonly used at present mainly is divided three classes vacuum vapor plating, vacuum sputtering coating and vacuum ion membrane plating.Wherein, vacuum sputtering coating is to make during with the high-energy particle bombardment solid surface solid surface particle obtain energy and the surface of overflowing, and is deposited on the substrate.Vacuum ion membrane plating is meant under vacuum environment; The gas that is introduced under ionogenic EM field acting in conjunction by ionization; Be accelerated under the electric field action that puts on bias voltage formation on the substrate by the ion of ionization; And with the bombardment of the form of high energy particle or be deposited on the substrate, thereby accomplish technologies such as ion etching cleaning and ion beam depositing.Multi sphere ion beam technology according to the invention is a kind of peculiar, DLC coating technology efficiently, and the back literary composition details.
For solving the deficiency of prior art, the present invention has disclosed the DLC coating film coating method on a kind of reed of weaving, and comprises the steps:
1) workpiece cleaning step is carried out ultrasonic cleaning to the weaving reed, and is dried up with nitrogen;
2) clamping step, the weaving reed that said cleaning is finished is installed on the pivoted frame in the Vakuumkammer;
3) vacuumize step, Vakuumkammer is evacuated to 5*10
-3The vacuum tightness that Pa is above;
4) heating steps is opened the well heater be positioned at Vakuumkammer and is heated, and with being heated to 100 ~ 200 degrees centigrade with the reed entity of weaving in the Vakuumkammer, and in whole coating process process, keeps constant temperature;
5) ion cleaning step feeds the high-purity argon gas of the purity more than the 5N in Vakuumkammer, vacuum chamber pressure is reached and remain on 0.1-0.5Pa, opens the ionic fluid power supply, begins the ion matting is carried out on the surface of said weaving reed; In the ion cleaning process, the WV that is applied on the ionic fluid is 1000-2000V, and working current is 50-150mA; Apply 500V ~ 2000V pulsed bias on the weaving reed, dutycycle is greater than 20%; The time of ion matting is 10-60 minute;
6) metal refining transition layer step, this step can be selected one of which for [A] or [B] mode,
[A] keeps vacuum tightness at 0.1-2Pa, opens the magnetron sputtering power supply, and current lead-through begins to carry out the deposition of intermediate metal to the magnetic control sputtering cathode that has Cr target or Ti target, is applied to direct supply power on the magnetron sputtering target during deposition greater than 1KW; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 30%; The intermediate metal depositing time is 15-60 minute;
[B] keeps vacuum tightness at 0.1-2Pa, opens the multi sphere power supply, and current lead-through begins to carry out the deposition of intermediate metal to the magnetron cathode electric arc source that has Cr target or Ti target, is applied to supply current on the cathode arc target during deposition greater than the direct supply of 60A; Apply the pulsed bias less than 500V on the weaving reed, dutycycle is greater than 30%; Intermediate metal depositing time 15-60 minute;
The material of said intermediate metal is Cr, Ti, and thickness is 50-800nm.For the performance of giving full play to DLC with satisfy steel button actual performance demand, intermediate metal can be metal nitride or metallic carbide, transition layer also can be the single or multiple lift structure.Multilayer film system for bottom than the thick 5-30% of last layer, with technology thickness by this pro rata distribution to each layer, the deposition method of each individual layer is identical with the unitary film deposition method.
The multi sphere ion beam technology is a kind of peculiar, PVD film coating method efficiently, has ionization level height, high, the fast characteristics of sedimentation velocity of coating adhesion.
7) deposition DLC coating step feeds hydrocarbon type of gas in Vakuumkammer, keep vacuum tightness at 0.05-0.5Pa, opens the deposition that the ionic fluid power supply begins the DLC coating, is applied to WV on the ionic fluid greater than 1000V, and working current is 50-300mA; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 10%; Depositing time is 100-200min;
Said DLC coat-thickness is 1-3um.In order fully to satisfy steel button practical application performance requirement, said DLC coating is the pure DLC coating or the DLC coating of mixing, and dopant material comprises one or more among Si, Cr, Ti, the W.Metal-doped DLC coating can effectively reduce the internal stress of DLC coating, obtains thicker DLC coating.Simultaneously the DLC coating also can be multilayered structure, multilayer film system for bottom than the thick 10-50% of last layer, with technology thickness by this pro rata distribution to each layer, the deposition method of each individual layer is identical with the unitary film deposition method.Doping DLC coating makes that DLC coating internal stress is effectively reduced owing to introduce alloying element, and coating shows as with matrix has better bonding force, can obtain thicker coating.
8) the cooling cooling step is closed ionic fluid power supply, grid bias power supply, gas source and heating power supply, keeps the Sprengel pump state of bleeding, and product is carried out in the Vakuumkammer accomplishing with stove cooling cooling 10-60min.
In sum, said weaving reed is provided with the intermediate metal of vacuum sputtering coating or the preparation of multi sphere ion beam technology and the DLC coating of vacuum ion plating membrane technique preparation outward successively.
As depicted in figs. 1 and 2; The present invention has also disclosed the DLC coating filming equipment on a kind of reed of weaving; Comprise a Vakuumkammer 1; Rotatably be located at the pivoted frame 3 in the said Vakuumkammer through a rotating shaft 2, arrange on the said pivoted frame 3 and be provided with the support 4 that is used for fixing the reed of weaving, said support 4 equidistance are arranged in the circumferential direction of pivoted frame 3.The locular wall of said Vakuumkammer is furnished with controlled sputtering source/arc source 5 and ion beam source 6, is provided with well heater 7 in the said Vakuumkammer.
The present invention still has numerous embodiments, and all employing equivalents or equivalent transformation and all technical schemes of forming all drop within protection scope of the present invention.
Claims (9)
1. the DLC coating film coating method on the weaving reed is characterized in that: comprises the steps,
The workpiece cleaning step is carried out ultrasonic cleaning to the weaving reed, and is dried up with nitrogen;
Clamping step, the weaving reed that said cleaning is finished is installed on the pivoted frame in the Vakuumkammer;
Vacuumize step, Vakuumkammer is evacuated to 5*10
-3The vacuum tightness that Pa is above;
Heating steps is opened the well heater be positioned at Vakuumkammer and is heated, and with being heated to 100 ~ 200 degrees centigrade with the reed entity of weaving in the Vakuumkammer, and in whole coating process process, keeps constant temperature;
The ion cleaning step feeds the high-purity argon gas of the purity more than the 5N in Vakuumkammer, vacuum chamber pressure is reached and remain on 0.1-0.5Pa, opens the ionic fluid power supply, begins the ion matting is carried out on the surface of said weaving reed; In the ion cleaning process, the WV that is applied on the ionic fluid is 1000-2000V, and working current is 50-150mA; Apply 500V ~ 2000V pulsed bias on the weaving reed, dutycycle is greater than 20%; The time of ion matting is 10-60 minute;
Metal refining transition layer step, this step can be selected one of which for [A] or [B] mode,
[A] keeps vacuum tightness at 0.1-2Pa, opens the magnetron sputtering power supply, and current lead-through begins to carry out the deposition of intermediate metal to the magnetic control sputtering cathode that has Cr target or Ti target, is applied to direct supply power on the magnetron sputtering target during deposition greater than 1KW; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 30%; The intermediate metal depositing time is 15-60 minute;
[B] keeps vacuum tightness at 0.1-2Pa, opens the multi sphere power supply, and current lead-through begins to carry out the deposition of intermediate metal to the cathode arc source that has Cr target or Ti target, and direct supply is applied to electric current on the cathode arc target greater than 60A during deposition; Apply the pulsed bias less than 500V on the weaving reed, dutycycle is greater than 30%; Intermediate metal depositing time 15-60 minute;
Deposition DLC coating step feeds hydrocarbon type of gas in Vakuumkammer, keep vacuum tightness at 0.05-0.5Pa, opens the deposition that the ionic fluid power supply begins the DLC coating, is applied to WV on the ionic fluid greater than 1000V, and working current is 50-300mA; Apply the pulsed bias greater than 500V on the weaving reed, dutycycle is greater than 10%; Depositing time is 100-200min;
The cooling cooling step is closed ionic fluid power supply, grid bias power supply, gas source and heating power supply, keeps the Sprengel pump state of bleeding, and product is carried out in the Vakuumkammer accomplishing with stove cooling cooling 10-60min.
2. the DLC coating film coating method on the weaving reed according to claim 1 is characterized in that: said weaving reed is provided with the intermediate metal of vacuum sputtering coating or the preparation of multi sphere ion beam technology and the DLC coating of vacuum ion plating membrane technique preparation outward successively.
3. the DLC coating film coating method on the weaving reed according to claim 1 is characterized in that: the material of said intermediate metal is Cr, Ti, and thickness is 50-800nm.
4. the DLC coating film coating method on the weaving reed according to claim 3 is characterized in that: said intermediate metal is the single or multiple lift structure, and said multilayer film is to be that bottom is than the thick 5-30% of last layer.
5. the DLC coating film coating method on the weaving reed according to claim 1 is characterized in that: said DLC coating is the pure DLC coating or the DLC coating of mixing, and dopant material comprises one or more among Si, Cr, Ti, the W.
6. the DLC coating film coating method on the weaving reed according to claim 5 is characterized in that: said DLC coat-thickness is 1-3um.
7. the DLC coating film coating method on the weaving reed according to claim 6 is characterized in that: said DLC coating is the single or multiple lift structure, and said multilayer film is to be that bottom is than the thick 10-50% of last layer.
8. the DLC coating filming equipment on the weaving reed; It is characterized in that: comprise a Vakuumkammer; Rotatably be located at the pivoted frame in the said Vakuumkammer through a rotating shaft; Arrange on the said pivoted frame and be provided with the support that is used for fixing the reed of weaving, the locular wall of said Vakuumkammer is furnished with controlled sputtering source/arc source and ion beam source, is provided with well heater in the said Vakuumkammer.
9. the DLC coating filming equipment on the weaving reed according to claim 8, it is characterized in that: said support equidistance is arranged in the circumferential direction of pivoted frame.
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