CN102517556A - Target-substrate distance adjusting device for magnetron sputtering plane target coating equipment - Google Patents
Target-substrate distance adjusting device for magnetron sputtering plane target coating equipment Download PDFInfo
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- CN102517556A CN102517556A CN2012100099840A CN201210009984A CN102517556A CN 102517556 A CN102517556 A CN 102517556A CN 2012100099840 A CN2012100099840 A CN 2012100099840A CN 201210009984 A CN201210009984 A CN 201210009984A CN 102517556 A CN102517556 A CN 102517556A
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Abstract
The invention relates to a target-substrate distance adjusting device for magnetron sputtering plane target coating equipment. The device consists of three parts, namely an adjustable sealing connecting device, a door plate and a target body, wherein the adjustable sealing connecting device consists of a shaft, a crescent nut, an insulation sleeve fixing block, a sealing device and a spring; and the sealing device comprises an upper shaft seal pressing block, a lower shaft seal pressing block, a support shaft sleeve, a shaft seal and a screw. By the device, the phenomenon that vacuumizing time is influenced because a vacuum chamber is exposed to air is avoided, the distance is adjusted in a vacuum state, and the problems of discontinuity of the traditional cushion block adjustment and longitudinal nonuniformity of a film layer are solved.
Description
Technical field
[0001] the invention belongs to the magnetron sputtering plating apparatus field, particularly a kind of adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment.
Background technology
In the magnetron sputtering plating apparatus field, it is many to influence coating process flow process factor, such as temperature, and plated film air pressure, plated film time, and target surface and substrate distance (claiming target-substrate distance again) etc.The big young pathbreaker of target-substrate distance influences the sedimentation rate of rete, membrane uniformity, and the quality of rete, and the substrate depositing temperature etc.At some magnetron sputtering equipment adjustable target-substrate distance device is arranged, but exist very big drawback, concerning with magnetron sputtering equipment; Need take a long time for being extracted into vacuum, so on the operation of equipment fundamental principle, reduce Vakuumkammer and expose in the middle of the air as far as possible; And tradition adjusting target-substrate distance method is under broken empty situation, to carry out; Neither linearly regulate simultaneously, just be difficult under such situation find best target-substrate distance, thereby influence film quality and plated film efficient.
Do not have adjustable target-substrate distance device at a lot of magnetron sputtering equipment, even there is tradition to need broken dummy status to operate down, its whole process is complicated, is difficult to seek the best effort distance, therefore is badly in need of a kind of adjustable target-substrate distance device.
Summary of the invention
The present invention is exactly the deficiency to technology; Proposition is used for the adjustable target-substrate distance device of magnetron sputtering planar target filming equipment; This device avoids Vakuumkammer to expose atmosphere; Influence the pumpdown time, be implemented under the vacuum state and regulate, solve the problem of vertical ununiformity of discontinuity that traditional spacer-type regulates and rete simultaneously.
The adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment according to the invention is made up of adjustable sealing coupling device, door-plate and target body three parts; Described adjustable sealing coupling device is made up of axle, crescent moon nut, insulation covering fixed block, tightness system and spring; Wherein said tightness system comprises axle envelope briquetting, lower shaft envelope briquetting, support sleeve, axle envelope and screw composition; Last axle envelope is pressed and lower shaft envelope briquetting passes through screw retention in the door-plate both sides, is disposed with support sleeve respectively between last axle envelope briquetting and the lower shaft envelope briquetting and seals with axle; The axle of described adjustable sealing coupling device passes door-plate and target body, and an end of axle is equipped with water pipe head, and axle is connected with the crescent moon nut through screw thread, is provided with the insulation covering fixed block between crescent moon nut and the tightness system; Described spring housing is contained on the axle, and places between lower shaft envelope briquetting and the target body; Described spring is fixed on target body and the lower shaft envelope briquetting; The axle at spring and target body contacting points position place is welded on the target body.
Further, described axle is a hollow, and in quill shaft, feeds cold water.
Further, described crescent moon nut is provided with an electrode and introduces fixed orifices.
Further, described crescent moon nut and insulation covering fixed block are insulated the cover parcel.
Further, the position that said target body is placed spring becomes convex, and all has one and the groove that adapts of spring diameter on bossing and the lower shaft envelope briquetting.
Beneficial effect of the present invention is: through being fixed on adjustable target-substrate distance device on door-plate and the target body; Utilize the retractility of spring; Matrix is not placed air during adjustment; Make the time of debugging out best target-substrate distance short, and can adjust, make the homogeneity of coatings be greatly improved at the target body two ends.
Description of drawings
Fig. 1 is the one-piece construction synoptic diagram that is used for the adjustable target-substrate distance device of magnetron sputtering planar target filming equipment;
Fig. 2 is the adjustable target based devices structure iron that is used for magnetron sputtering planar target filming equipment;
Among the figure: axle envelope briquetting, 11 adjustable target-substrate distance devices, 12 door-plates, 13 target bodys, 14 electrodes are introduced fixed orifices, 15, lower shaft envelope briquetting, 16 crescent moon nuts on 1 substrate, 2,3 springs, 4 envelopes, 5 support sleeves, 6 insulation covering fixed blocks, 7 screws, 8 water pipe heads, 9 insulation coverings, 10.
Embodiment
As depicted in figs. 1 and 2, the adjustable target-substrate distance device that is used for the magnetron sputtering film device according to the invention is made up of adjustable sealing coupling device 11, door-plate 12 and target body 13 3 parts; Described adjustable sealing connects 11 devices and is made up of axle 2, crescent moon nut 16, insulation covering fixed block 6, tightness system and spring 3; Wherein said tightness system comprises axle envelope briquetting 10, lower shaft envelope briquetting 15, support sleeve 5, axle envelope 4 and screw 7 compositions; Last axle envelope briquetting 10 is fixed on above the door-plate 12 through screw 7; Lower shaft envelope briquetting 15 is fixed on through screw 7 below the door-plate 12, is disposed with support sleeve 5 and axle envelope 4 respectively between last axle envelope briquetting 10 and the lower shaft envelope briquetting 15; The axle 2 of described adjustable sealing coupling device 11 passes door-plate 12 and target body 13, and an end of axle 2 is equipped with water pipe head 8, and axle 2 is connected with crescent moon nut 16 through screw thread, is provided with insulation covering fixed block 6 between crescent moon nut 16 and the tightness system; Described spring 3 is sleeved on the axle 2, and places between lower shaft envelope briquetting 15 and the target body 13; Described spring 3 is fixed on target body 13 and seals on the briquetting 15 with lower shaft; Spring 3 is welded on the target body 13 with the axle 2 at target body 13 contacting points position places.
Further, described axle 2 is a hollow, and in quill shaft, feeds cold water.
Further, described crescent moon nut 16 is provided with an electrode and introduces fixed orifices 14.
Further, described crescent moon nut 16 is insulated cover 9 parcels with insulation covering fixed block 6.
Further, the position that said target body 13 is placed springs 3 becomes convex, and all has one and the groove that adapts of spring 3 diameters on bossing and the lower shaft envelope briquetting 15.
The principle of work that is used for the adjustable target-substrate distance device of magnetron sputtering planar target filming equipment of the present invention is:
Fixed distance between substrate and the door-plate is constant; During adjustable range,, the stressed of crescent moon nut 16 is transmitted on the spring 3 through insulation covering fixed block 6 and gland seal device through rotation crescent moon nut 16; Through the elastic force adjustment door-plate 12 of spring 3 and the distance between the target body 13, realize the sealing adjusting.
Claims (5)
1. the adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment is made up of adjustable sealing coupling device, door-plate and target body three parts; Described adjustable sealing coupling device is made up of axle, crescent moon nut, insulation covering fixed block, tightness system and spring; Wherein said tightness system comprises axle envelope briquetting, lower shaft envelope briquetting, support sleeve, axle envelope and screw composition; Last axle envelope is pressed and lower shaft envelope briquetting passes through screw retention in the door-plate both sides, is disposed with support sleeve respectively between last axle envelope briquetting and the lower shaft envelope briquetting and seals with axle; The axle of described adjustable sealing coupling device passes door-plate and target body, and an end of axle is equipped with water pipe head, and axle is connected with the crescent moon nut through screw thread, is provided with the insulation covering fixed block between crescent moon nut and the tightness system; Described spring housing is contained on the axle, and places between lower shaft envelope briquetting and the target body; Described spring is fixed on target body and the lower shaft envelope briquetting; The axle at spring and target body contacting points position place is welded on the target body.
2. the adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment as claimed in claim 1 is characterized in that, described axle is a hollow, and in quill shaft, feeds cold water.
3. the adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment as claimed in claim 1 is characterized in that, described crescent moon nut is provided with an electrode and introduces fixed orifices.
4. the adjustable target-substrate distance device that is used for magnetron sputtering planar target filming equipment as claimed in claim 1 is characterized in that, described crescent moon nut and insulation covering fixed block are insulated the cover parcel.
5. the position that said target body is placed spring becomes convex, and all has one and the groove that adapts of spring diameter on bossing and the lower shaft envelope briquetting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100099840A CN102517556A (en) | 2012-01-13 | 2012-01-13 | Target-substrate distance adjusting device for magnetron sputtering plane target coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2012100099840A CN102517556A (en) | 2012-01-13 | 2012-01-13 | Target-substrate distance adjusting device for magnetron sputtering plane target coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102517556A true CN102517556A (en) | 2012-06-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012100099840A Pending CN102517556A (en) | 2012-01-13 | 2012-01-13 | Target-substrate distance adjusting device for magnetron sputtering plane target coating equipment |
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| CN (1) | CN102517556A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112994A (en) * | 2015-08-20 | 2015-12-02 | 重庆大学 | Extension device of situ characterization system molecular beam epitaxial growth source |
| CN107910257A (en) * | 2017-11-15 | 2018-04-13 | 上海华力微电子有限公司 | The process adjustments structures and methods of the process cavity of PVD equipment |
| CN115354284A (en) * | 2022-07-15 | 2022-11-18 | 湖南红太阳光电科技有限公司 | Rotating cathode and target base distance online adjusting method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04329876A (en) * | 1991-04-30 | 1992-11-18 | Anelva Corp | Apparatus for sputtering and method therefor |
| CN101011631A (en) * | 2007-02-02 | 2007-08-08 | 中北大学 | Meteor hammer acousto-optic target |
| CN101148752A (en) * | 2006-09-19 | 2008-03-26 | 中国科学院合肥物质科学研究院 | Sealing device used for 10(-8)Pa ultra-high vacuum round plane magnetron sputtering target |
| TW201024448A (en) * | 2008-12-30 | 2010-07-01 | Metal Ind Res & Dev Ct | Vacuum mechanical feedthrough module |
| CN102197453A (en) * | 2008-10-24 | 2011-09-21 | 应用材料公司 | Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |
-
2012
- 2012-01-13 CN CN2012100099840A patent/CN102517556A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04329876A (en) * | 1991-04-30 | 1992-11-18 | Anelva Corp | Apparatus for sputtering and method therefor |
| CN101148752A (en) * | 2006-09-19 | 2008-03-26 | 中国科学院合肥物质科学研究院 | Sealing device used for 10(-8)Pa ultra-high vacuum round plane magnetron sputtering target |
| CN101011631A (en) * | 2007-02-02 | 2007-08-08 | 中北大学 | Meteor hammer acousto-optic target |
| CN102197453A (en) * | 2008-10-24 | 2011-09-21 | 应用材料公司 | Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation |
| TW201024448A (en) * | 2008-12-30 | 2010-07-01 | Metal Ind Res & Dev Ct | Vacuum mechanical feedthrough module |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105112994A (en) * | 2015-08-20 | 2015-12-02 | 重庆大学 | Extension device of situ characterization system molecular beam epitaxial growth source |
| CN105112994B (en) * | 2015-08-20 | 2017-10-13 | 重庆大学 | A kind of extension apparatus in in-situ characterization system molecular beam epitaxial growth source |
| CN107910257A (en) * | 2017-11-15 | 2018-04-13 | 上海华力微电子有限公司 | The process adjustments structures and methods of the process cavity of PVD equipment |
| CN107910257B (en) * | 2017-11-15 | 2021-01-29 | 上海华力微电子有限公司 | Process adjusting structure and method of process chamber of PVD equipment |
| CN115354284A (en) * | 2022-07-15 | 2022-11-18 | 湖南红太阳光电科技有限公司 | Rotating cathode and target base distance online adjusting method |
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Application publication date: 20120627 |