CN102512926A - Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing - Google Patents
Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing Download PDFInfo
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- CN102512926A CN102512926A CN2011104451139A CN201110445113A CN102512926A CN 102512926 A CN102512926 A CN 102512926A CN 2011104451139 A CN2011104451139 A CN 2011104451139A CN 201110445113 A CN201110445113 A CN 201110445113A CN 102512926 A CN102512926 A CN 102512926A
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- vikane
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Abstract
The invention belongs to the technical field of gas pollutant treatment and provides a method for removing sulfuryl fluoride by coupling plasma and chemical absorbing, which is used for removing residual sulfuryl fluoride gas after fumigating. The treatment process of the method comprises: introducing a gas containing sulfuryl fluoride into a plasma reactor, wherein the sulfuryl fluoride decomposes into harmful gas products including sulfur oxide and fluoride under the action of the plasma; and introducing the gas product of the reaction into a gas liquid absorbing tower to absorb the gas by alkali liquor, and thus removing the sulfuryl fluoride waste gas in a harmless manner. The method has the advantage that after the sulfuryl fluoride is removed by coupling a plasma technique and chemical absorption, the treated gas reaches national discharge standards. Compared with discharging the sulfuryl fluoride into the atmosphere through ventilation at present, the method protects natural environment and human health. In addition, with simple process flow and low operation cost, the method is more suitable for on-site use.
Description
Technical field
The invention belongs to the gas pollutant processing technology field, mainly is the method that a kind of plasma coupling chemical absorbing removes vikane.
Background technology
Vikane substitutes Celfume as a kind of fumigant and is worldwide applied gradually, but the toxicity that vikane has can be destroyed nervous centralis, and long-term contact produces human health and has a strong impact on, even causes death.Find to show according to another current research: vikane is a kind of strong greenhouse gas.It is 4800 times of one kilogram of carbon dioxide that one kilogram of vikane is discharged in the atmosphere effect to global warming, and vikane content is just increasing with annual 5% speed in the air, and can in air, exist about 36 years.Therefore, in order to protect people's healthy and natural environment, the harmless treatment of residual fumigant vikane is very urgent.
Because vikane substitutes Celfume and is employed the time soon as fumigant; And the relevant harm of vikane does not also cause enough attention; So; At present to the unified feasible method of the harmless treatment of vikane gas, common method be adopt the mode of ventilating with residual vikane toxic emission in atmosphere.This method is contaminated environment not only, increases greenhouse effects, but also endangers the healthy of peripheral resident.Therefore, press for development new technologies and remove vikane gas.
Nonequilibrium plasma is handled the waste gas technology and is furtherd investigate, and has been used for removing NO
X, SO
2With VOCs etc., nonequilibrium plasma can be produced by gas discharge, comprises glow discharge; Corona discharge, dielectric barrier discharge, microwave discharge etc.; But when nonequilibrium plasma was handled waste gas, emission gases still contained poisonous pernicious gas composition, has the secondary pollution problem.
Summary of the invention
The object of the invention will overcome the deficiency of above-mentioned technology just; And provide a kind of plasma coupling chemical absorbing to remove the method for vikane; Be used for the innoxious residual fumigant vikane that removes, the present invention can be used for innoxious stifling back such as freighter, container, storage, building, museum, the food residual sulphur acyl fluorides gas that removes.
The present invention solves the technical scheme that its technical problem adopts: this plasma coupling chemical absorbing removes the method for vikane, and step is following:
1) regulates high voltage source, make to begin discharge in the plasma reactor;
The gas that 2) will contain vikane imports to plasma reactor through air inlet, and under action of plasma, vikane gas is decomposed to form the pernicious gas product by discharge generation high energy electron bump and comprises oxysulfide and fluoride gas product;
3) the pernicious gas product is imported in the liquid gas absorption tower through the reactant air inlet;
4) by the alkali lye absorption reaction, go out from the gas outlet by harmless gas in liquid gas absorption tower for the pernicious gas product of sulfonyl fluorine gas decomposition generation, and the liquid after the absorption is discharged from liquid outlet, thereby realizes the innoxious vikane gas that removes;
5) alkali lye is through the circulating pump absorption that circulates, and the alkali lye pH value of control alkali liquid tank the inside is greater than 8.
Described plasma reactor discharge type is dielectric barrier discharge, glow discharge and corona discharge.
Described liquid gas absorption tower is a packed tower, plate column, spray column and high-gravity rotating bed gas-liquid mass transfer (contact) equipment.
Described alkali lye is potassium hydroxide, and NaOH, calcium hydroxide and other alkali lye, alkali lye can use the circulating pump absorption that circulates, and alkali lye all can be recycled before PH is greater than 8.
The effect that the present invention is useful is: using plasma technology coupling chemical absorbing of the present invention removes vikane, and emission gases after treatment reaches discharging standards.This invention is discharged to vikane with respect to present draft type and not only protected natural environment in the atmosphere, protected human healthy simultaneously.In addition, technological process of the present invention is simple, and operating cost is low, is adapted at on-the-spot the use.
Description of drawings
Fig. 1 is a process device figure of the present invention.
Fig. 2 is a spectrogram sketch map of the present invention.
Description of reference numerals 1. air inlets, 2. plasma reactor, 3. high voltage source, 4. stainless steel bar (discharge electrode); 5. stainless iron silk screen (earthing pole), 6. reactant air inlet, 7. liquid gas absorption tower, 8. inlet; 9. gas outlet, 10. liquid outlet, 11. circulating pumps, 12. alkali liquid tanks.
The specific embodiment
In order to make the object of the invention, technical scheme and advantage clearer,, the present invention is further elaborated below in conjunction with for example.Should be appreciated that described hereinly, and be not used in qualification the present invention for example only in order to explaining the present invention.
This plasma coupling chemical absorbing of the present invention removes the method for vikane, and step is following:
1) regulates high voltage source 3, stainless steel bar (discharge electrode) 4 and stainless iron silk screen (earthing pole) 5 are arranged in the plasma reactor 3, make to begin discharge in the plasma reactor 2;
The gas that 2) will contain vikane imports to plasma reactor 2 through air inlet 1, and under action of plasma, vikane gas is decomposed to form the pernicious gas product by discharge generation high energy electron bump and comprises oxysulfide and fluoride gas product;
3) the pernicious gas product is imported in the liquid gas absorption tower 7 through reactant air inlet 6;
4) by the alkali lye absorption reaction, 9 go out from the gas outlet by harmless gas liquid gas absorption tower 7 in for the pernicious gas product that decompose to produce of vikane, and the liquid after the absorption is from liquid outlet 10 discharges, thus the innoxious vikane gas that removes;
5) alkali lye is through the absorption that circulates of circulating pump 11, inlet 8, and the alkali lye pH value of control alkali liquid tank 12 the insides is greater than 8.
Instance 1 adopts line-cartridge reactor as shown in Figure 1 at experiment ionic medium precursor reactant reactor, and discharge type adopts dielectric barrier discharge, and Gas-Liquid Absorption tower diameter is 20mm, highly is the packed tower of 740mm that concentration of lye is a 0.1mol/LNaOH solution.Wherein plasma reactor is that 35mm, wall thickness are the 2.5mm quartz ampoule by the tube internal diameter, stainless steel bar discharge electrode, the stainless steel and iron silk screen earthing pole of parcel quartz ampoule and the quartz glass pearl that is filled in the 2-4mm between two discharge electrodes.Gas-chromatography GC9790 and fourier infrared analyzer Nicolet that vikane gas, plasma discharge gaseous product and the utilization of alkali lye absorption afterproduct are furnished with the FPD detector analyze; Gas chromatographic detection sensitivity is 1ppm, is lower than discharging standards≤5ppm.
Discharge parameter: crest voltage 12kV, discharge frequency 8.0kHz, discharge length 16mm, discharge spacing 7.5mm
Technological parameter: input concentration 0.5% (background gas is an air), feed rate 400ml/min
The gained result is following:
Fig. 2 illustrates the infrared spectrum a of vikane charging; Plasma treatment afterproduct spectrogram b; Plasma coupling chemical absorbing afterproduct spectrogram c.
Consolidated statement 1 and Fig. 2 can find: the mist that under the plasma discharge effect, contains vikane 0.5% is broken down into SO
2, SiF
4And NO
2Gaseous product, gaseous product are fixed after through the alkali lye absorption reaction, and vikane can remove fully, reaches innoxious discharging.
At last, should be pointed out that above instance only is the more representational example of the present invention.Obviously, technical scheme of the present invention is not limited to above-mentioned instance, and many distortion can also be arranged, and all distortion that those of ordinary skill in the art can directly derive or associate from content disclosed by the invention all should be thought protection scope of the present invention.
Claims (4)
1. plasma coupling chemical absorbing removes the method for vikane, and it is characterized in that: step is following:
1) regulates high voltage source (3), make to begin discharge in the plasma reactor (2);
The gas that 2) will contain vikane imports to plasma reactor (2) through air inlet (1), and under action of plasma, vikane gas is decomposed to form the pernicious gas product by discharge generation high energy electron bump and comprises oxysulfide and fluoride gas product;
3) the pernicious gas product is imported in the liquid gas absorption tower (7) through reactant air inlet (6);
4) the pernicious gas product that decompose to produce of vikane liquid gas absorption tower (7) in by the alkali lye absorption reaction, harmless gas from the gas outlet (9) go out, the liquid after the absorption is from liquid outlet (10) discharge, thus the innoxious vikane gas that removes;
5) alkali lye is through circulating pump (11) absorption that circulates, and the alkali lye pH value of control alkali liquid tank (12) the inside is greater than 8.
2. plasma coupling chemical absorbing according to claim 1 removes the method for vikane, and it is characterized in that: plasma reactor (2) discharge type is dielectric barrier discharge, glow discharge and corona discharge.
3. plasma coupling chemical absorbing according to claim 1 removes the method for vikane, it is characterized in that: liquid gas absorption tower (7) is packed tower, plate column, spray column and high-gravity rotating bed gas-liquid mass transfer (contact) equipment.
4. plasma coupling chemical absorbing according to claim 1 removes the method for vikane, and it is characterized in that: described alkali lye is potassium hydroxide, NaOH, calcium hydroxide and other alkali lye.
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| CN201110445113.9A CN102512926B (en) | 2011-12-27 | 2011-12-27 | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing |
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| CN201110445113.9A CN102512926B (en) | 2011-12-27 | 2011-12-27 | Method for removing sulfuryl fluoride by coupling plasma and chemical absorbing |
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| CN102512926B CN102512926B (en) | 2014-03-12 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104128083A (en) * | 2014-05-30 | 2014-11-05 | 中国石油化工股份有限公司 | Method for degrading malodorous gas by coupling biotrickling filter with dielectric barrier discharge |
| CN109316917A (en) * | 2018-11-13 | 2019-02-12 | 西安交通大学 | A kind of integrated methane desulfurizer and method |
| CN115138187A (en) * | 2022-06-16 | 2022-10-04 | 深圳市捷晶科技股份有限公司 | Device and process for treating siloxane in VOCs (volatile organic compounds) by low-temperature plasma |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040045576A1 (en) * | 2002-09-06 | 2004-03-11 | Hobbs John Peter | Plasma cleaning gas with lower global warming potential than SF6 |
| CN101972587A (en) * | 2010-08-17 | 2011-02-16 | 浙江工业大学 | Innocent treatment method for sulfuryl fluoride gas |
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2011
- 2011-12-27 CN CN201110445113.9A patent/CN102512926B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040045576A1 (en) * | 2002-09-06 | 2004-03-11 | Hobbs John Peter | Plasma cleaning gas with lower global warming potential than SF6 |
| CN101972587A (en) * | 2010-08-17 | 2011-02-16 | 浙江工业大学 | Innocent treatment method for sulfuryl fluoride gas |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104128083A (en) * | 2014-05-30 | 2014-11-05 | 中国石油化工股份有限公司 | Method for degrading malodorous gas by coupling biotrickling filter with dielectric barrier discharge |
| CN104128083B (en) * | 2014-05-30 | 2016-08-17 | 中国石油化工股份有限公司青岛安全工程研究院 | The method of Biotrickling filter couplant barrier discharge degraded foul gas |
| CN109316917A (en) * | 2018-11-13 | 2019-02-12 | 西安交通大学 | A kind of integrated methane desulfurizer and method |
| CN115138187A (en) * | 2022-06-16 | 2022-10-04 | 深圳市捷晶科技股份有限公司 | Device and process for treating siloxane in VOCs (volatile organic compounds) by low-temperature plasma |
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| CN102512926B (en) | 2014-03-12 |
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